CN110467462A - 一种高致密低电阻氧化铌旋转靶材及其制备方法 - Google Patents
一种高致密低电阻氧化铌旋转靶材及其制备方法 Download PDFInfo
- Publication number
- CN110467462A CN110467462A CN201910732234.8A CN201910732234A CN110467462A CN 110467462 A CN110467462 A CN 110467462A CN 201910732234 A CN201910732234 A CN 201910732234A CN 110467462 A CN110467462 A CN 110467462A
- Authority
- CN
- China
- Prior art keywords
- powder
- target material
- niobium oxide
- rotary
- densit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013077 target material Substances 0.000 title claims abstract description 83
- 229910000484 niobium oxide Inorganic materials 0.000 title claims abstract description 74
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 title claims abstract description 74
- 238000002360 preparation method Methods 0.000 title claims abstract description 30
- 239000000843 powder Substances 0.000 claims abstract description 65
- 238000012545 processing Methods 0.000 claims abstract description 28
- 238000005245 sintering Methods 0.000 claims abstract description 28
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 15
- 239000010439 graphite Substances 0.000 claims abstract description 15
- 238000005056 compaction Methods 0.000 claims abstract description 13
- 238000003825 pressing Methods 0.000 claims abstract description 13
- 238000000498 ball milling Methods 0.000 claims abstract description 11
- 238000007731 hot pressing Methods 0.000 claims abstract description 10
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 239000000320 mechanical mixture Substances 0.000 claims abstract description 4
- 238000000465 moulding Methods 0.000 claims abstract description 4
- 238000007493 shaping process Methods 0.000 claims description 18
- 238000010792 warming Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 11
- 238000000227 grinding Methods 0.000 claims description 6
- 230000001788 irregular Effects 0.000 claims description 3
- 238000004513 sizing Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 15
- 239000011521 glass Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 238000001291 vacuum drying Methods 0.000 description 6
- 239000010955 niobium Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 238000003746 solid phase reaction Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/02—Compacting only
- B22F3/04—Compacting only by applying fluid pressure, e.g. by cold isostatic pressing [CIP]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/05—Mixtures of metal powder with non-metallic powder
- C22C1/051—Making hard metals based on borides, carbides, nitrides, oxides or silicides; Preparation of the powder mixture used as the starting material therefor
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/40—Metallic constituents or additives not added as binding phase
- C04B2235/404—Refractory metals
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5436—Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6562—Heating rate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6567—Treatment time
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/658—Atmosphere during thermal treatment
- C04B2235/6581—Total pressure below 1 atmosphere, e.g. vacuum
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/77—Density
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Metallurgy (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
一种高致密低电阻氧化铌旋转靶材及其制备方法,该靶材密度≥4.5g/cm3,电阻率≤1.4×10‑3Ω·cm,长度≥400mm,壁厚6—14mm。制备方法包括以下步骤:1)粉末混合:将氧化铌粉末与金属铌粉进行机械混合均匀;2)粉末预烧:对步骤1)中混合后粉末进行真空预烧;3)粉末处理:对预烧粉末进行球磨处理;4)冷等静压成型:对处理粉末装入模具中冷等静压预压成型旋转靶材坯体;5)坯体车削加工:对靶材坯体进行车削加工;6)真空热压烧结:对加工坯体置入石墨模具中进行热压真空烧结;7)靶坯加工:对烧结旋转靶材靶坯按尺寸加工,即得到高致密低电阻旋转氧化铌靶材。该靶材导电性较好,具有较好的物理和化学性能,有效提高靶材产品质量。
Description
技术领域
本发明有色金属材料制备技术领域,特别涉及一种高致密氧化铌低电阻氧化铌旋转靶材及其制备方法。
技术背景
氧化铌靶材由于其独特的物理和化学性而能被广泛应用于现代技术的许多领域。利用其较强的紫外线吸收能力,可用作紫外敏感材料保护膜;利用其对可见光具有较高投射性,可用在液晶显示器(LCD)、等离子显示器(PDP)、触摸屏(Touch Panel)、电至发光显示器(LED)、薄膜太阳能电池等领域。
氧化铌靶材是制备AR玻璃(减反增透玻璃),消影ITO玻璃(触摸屏玻璃)的重要材料。AR玻璃是利用溅射镀膜技术在玻璃表面上镀上氧化铌薄膜和SiO2薄膜,玻璃+高折射薄膜(氧化铌薄膜)+低折射薄膜(SiO2薄膜)有增透效果,每增加一层高折射薄膜+低折射薄膜可增透约2%;多层高折射薄膜+低折射薄膜叠加,能够有效消除玻璃本身反射,增加玻璃的透过率,使玻璃的色彩更加鲜艳真实。制备氧化铌薄膜的方法主要为磁控溅射法,其他还有电子束蒸发、离子束反应溅射法、溶胶凝胶法等。
目前市场上使用最多的为氧化铌平面靶材,虽然平面靶材制备技术日趋成熟,但是平面靶材在使用过程中利用率只有30%左右,也就是平面氧化铌靶材利用率低,大部分靶材被浪费,无形中增加了生产成本。为提高氧化铌靶材利用率,降低生产企业生产成本,各企业开始研究靶材型体,通过多年研究实验发现旋转靶材相对平面靶材利用率非常高,可达到80%以上,高利用率可降低生产及下游产品成本,同时更环保及节约有限资源。
CN104961463A中国专利介绍一种氧化铌旋转靶材及其制备方法,该方法中采用该方法采用粉体制备、粉体煅烧、喷雾造粒、冷等静压成型、气氛烧结、靶坯加工制备氧化铌旋转靶材。但该制备方法喷雾造粒工序中在粉体中加入粘结剂,后续工序未进行预烧脱粘结剂,在烧结工序中加入的粘结剂挥发降低致炉体隔热材料及发热体使用寿命;在烧结工序中冷等静压成型的旋转靶材坯体置入烧结炉内烧结,由于冷等静压成型后旋转靶材靶坯形状不规整,烧结过程由于径向及轴向自由收缩容易出现变形导致后续加工余量大、生产过程成才率低生产成本高等问题。
发明内容
本发明的目的在于解决现有加工制备氧化铌旋转靶材不足,提供一种高致密低电阻氧化铌旋转靶材及其制备方法。
一种高致密氧化铌低电阻氧化铌旋转靶材,该高致密低电阻氧化铌旋转靶材密度≥4.5g/cm3,电阻率≤1.4×10-3Ω·cm,长度≥400mm,壁厚6—14mm。
上述高致密氧化铌低电阻氧化铌旋转靶材制备方法按以下步骤进行:
1)粉末混合:将氧化铌粉末与金属铌粉进行机械混合均匀;
2)粉末预烧:对步骤1)中混合后粉末进行真空预烧;
3)粉末处理:对步骤2)中预烧粉末进行球磨处理;
4)冷等静压成型:对步骤3)中处理粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体;
5)坯体车削加工:对步骤4)中旋转靶材坯体进行车削整形加工;
6)真空热压烧结:对步骤5)中车削整形坯体置入石墨模具中进行热压真空烧结;
7)靶坯加工:对步骤6)中烧结旋转靶材靶坯进行按尺寸加工,即得到高致密低电阻旋转氧化铌靶材。
优选的是:所述步骤1)中为提高氧化铌粉末中添加金属铌粉,改变原粉烧结活性及提高烧结密度,氧化铌粉末中掺入其重量的2-8%的金属铌粉。
优选的是:所述述氧化铌粉末纯度不低于99.99wt%,粒径1-5μm;所述金属铌粉纯度不低于99.95wt%,粒径5-20μm。
优选的是:步骤2)中对步骤1中混合后粉末进行真空预烧,真空度为100-1000Pa,在预烧温度500-900℃,预烧2-5小时。
优选的是:步骤3)中对步骤2中预烧粉末进行球磨处理,粉末进行球磨4-8小时,过100-200目筛。
优选的是:步骤4)中对步骤3)中处理粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体,冷等静压压力200-350MPa。
优选的是:步骤5)中对步骤4)将冷等静压预压成型不规则旋转靶材坯体进行车削整形规则。
优选的是:步骤6)中对步骤5)中车削整形坯体置入石墨模具中进行热压真空烧结,真空度为100-1000Pa;以100-400℃/h速度升温至900℃,保温2-4小时;随后以200-500℃/h速度升温至1200-1400℃,加压至30-50MPa后,保温8-12小时,之后自然降温至室温。
优选的是:步骤6)中将冷却后旋转靶坯从石墨模具中脱出得到氧化铌旋转靶材靶坯。
优选的是:步骤7)中步骤6)中对脱模后的氧化铌旋转靶材靶坯采用内、外圆磨床进行磨削加工。
本发明具有以下有益效果:
1、本发明所制备的氧化铌旋转靶材其密度≥4.5g/cm3,电阻率≤1.5×10-3Ω·cm,导电性较好,具有较好的物理和化学性能。
2、本发明将氧化铌原粉与金属铌粉进行纳米化处理,有效降低原料粉末粒度,使金属铌粉在氧化铌原粉中分布更均匀,从而使烧结后旋转靶材结构更加均匀,降低下游产业使用过程中由于靶材结构不均匀导致靶材镀膜过程出现的靶材开裂、起弧等缺陷,有效提高氧化铌旋转靶材产品质量。
3、粉末采用冷等静压成型增密,解决由于在生产过程中真空热压烧结过程中烧缩比大及真空热压烧结设备尺寸限制导致的旋转靶材长度低问题,本发明解决生产过程中真空热压烧结过程中旋转靶材烧缩比大、设备尺寸限制问题,利用不同模具可生产不同壁厚尺寸、长度尺寸旋转靶材,靶材壁厚根据市场需求可生产6-14mm,长度可高达400mm以上。
附图说明
图1为本发明中实施例2制备的氧化铌旋转靶材截面SEM图。
具体实施方式
本发明的具体实施方式做以下说明:
本发明采用真空热压烧结法制备高致密低电阻氧化铌旋转靶材。
一种高致密氧化铌低电阻氧化铌旋转靶材及其制备方法,该高致密低电阻氧化铌旋转靶材密度≥4.5g/cm3,电阻率≤1.4×10-3Ω·cm,长度≥400mm,壁厚6—14mm。
其制备步骤包括:
1)粉末混合:将氧化铌粉末与金属铌粉进行机械混合均匀;
2)粉末预烧:对步骤1)中混合后粉末进行真空预烧;
3)粉末处理:对步骤2)中预烧粉末进行球磨处理;
4)冷等静压成型:对步骤3)中处理粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体;
5)坯体车削加工:对步骤4)中旋转靶材坯体进行车削整形加工;
6)真空热压烧结:对步骤5)中车削整形坯体置入石墨模具中进行热压真空烧结;
7)靶坯加工:对步骤6)中烧结旋转靶材靶坯进行按尺寸加工,即得到高致密低电阻旋转氧化铌靶材。
进一步地,步骤1)所述混合过程中,氧化铌粉末中掺入其重量的2-8%的金属铌粉;更进一步地,步骤1)中氧化铌粉末纯度不低于99.99wt%,粒径1-5μm;所述金属铌粉纯度不低于99.95wt%,粒径5-20μm;步骤2)所述的粉末预烧步骤中,真空度为100-1000Pa,在预烧温度500-900℃,预烧2-5小时;步骤3)所述粉末处理中,粉末进行球磨4-8小时,过100-200目筛;步骤3)所述粉末处理中,料球比3:2,在纳米研磨机中于3000-5000rpm的转速下研磨3-6小时; 步骤4)冷等静压成型中将处理粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体;更进一步地,步骤4)中冷等静压成型压力200-350MPa;步骤5)坯体车削加工中旋转靶材坯体进行车削整形加工;步骤6)真空热压烧结中将车削整形坯体置入石墨模具中进行热压真空烧结;更进一步地,热压真空烧结中真空度为100-1000Pa;以100-400℃/h速度升温至900℃,保温2-4小时;随后以200-500℃/h速度升温至1200-1400℃,加压至30-50MPa后,保温8-12小时,之后自然降温至室温;更进一步地,将冷却后旋转靶坯从石墨模具中脱出得到氧化铌旋转靶材靶坯;步骤7)靶坯加工中将脱模后的氧化铌旋转靶材靶坯采用内、外圆磨床进行磨削加工。
实施例1
一种高致密氧化铌低电阻氧化铌旋转靶材及其制备方法,其包括以下制备步骤:
1)粉末混合:将20kg纯度99.99%、粒径1μm的氧化铌粉末和0.4kg纯度99.99%、粒径5μm的金属铌粉使用V型混料机混合均匀;
2)粉末预烧:将步骤1)中混合粉体置于真空炉中,于真空度200Pa、预烧温度900℃下预烧5小时以对粉体进行预烧固相反应;
3)粉末处理:将步骤2)中预烧粉体进行球磨处理,并按料球比3:2在纳米研磨机中于3000rpm的转速下研磨3小时,过150目筛;
4)冷等静压成型:将步骤3)中处理后粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体,成型压力320MPa;
5)坯体车削加工:将步骤4)中旋转靶材坯体使用车床进行车削整形加工规整。
6)真空热压烧结:将步骤5)中车削整形坯体置入石墨模具中装入热压真空炉中,在真空度500Pa下,以150℃/h的升温速率升温至900℃,并保温2小时,随后以250℃/h的升温速率升温至1250℃,加压至45MPa后,并保温8小时,之后自然降温至室温将冷却后旋转靶坯从石墨模具中脱出得到氧化铌旋转靶材靶坯;
7)靶坯加工:将步骤6)中烧结旋转靶材靶坯进行按尺寸加工,取样测试氧化铌旋转靶材密度4.54g/cm3,电阻率为1.4×10-3Ω·cm。
实施例2
一种高致密氧化铌低电阻氧化铌旋转靶材及其制备方法,其包括以下制备步骤
1) 粉末混合:将20kg纯度99.99%、粒径3μm的氧化铌粉末和1.2kg纯度99.99%、粒径10μm的金属铌粉使用V型混料机混合均匀;
2) 粉末预烧:将步骤1)中混合粉体置于真空炉中,于真空度200Pa、预烧温度850℃下预烧5小时以对粉体进行预烧固相反应;
3) 粉末处理:将步骤2)中预烧粉体进行球磨处理,并按料球比3:2在纳米研磨机中于4000rpm的转速下研磨5小时,过150目筛;
4) 冷等静压成型:将步骤3)中处理后粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体,成型压力290MPa;
5) 坯体车削加工:将步骤4)中旋转靶材坯体使用车床进行车削整形加工规整。
6) 真空热压烧结:将步骤5)中车削整形坯体置入石墨模具中装入热压真空炉中,在真空度500Pa下,以120℃/h的升温速率升温至800℃,并保温3小时,随后以200℃/h的升温速率升温至1300℃,加压至45MPa后,并保温10小时,之后自然降温至室温将冷却后旋转靶坯从石墨模具中脱出得到氧化铌旋转靶材靶坯;
7) 靶坯加工:将步骤6)中烧结旋转靶材靶坯进行按尺寸加工,取样测试氧化铌旋转靶材密度4.57g/cm3,电阻率为1.3×10-3Ω·cm。
实施例3
一种高致密氧化铌低电阻氧化铌旋转靶材及其制备方法,其包括以下制备步骤: 1)粉末混合:将20kg纯度99.99%、粒径5μm的氧化铌粉末和1.6kg纯度99.99%、粒径20μm的金属铌粉使用V型混料机混合均匀;
2) 粉末预烧:将步骤1)中混合粉体置于真空炉中,于真空度200Pa、预烧温度800℃下预烧5小时以对粉体进行预烧固相反应;
3) 粉末处理:将步骤2)中预烧粉体进行球磨处理,并按料球比3:2在纳米研磨机中于5000rpm的转速下研磨6小时,过150目筛;
4) 冷等静压成型:将步骤3)中处理后粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体,成型压力340MPa;
5) 坯体车削加工:将步骤4)中旋转靶材坯体使用车床进行车削整形加工规整。
6) 真空热压烧结:将步骤5)中车削整形坯体置入石墨模具中装入热压真空炉中,在真空度500Pa下,以120℃/h的升温速率升温至850℃,并保温4小时,随后以250℃/h的升温速率升温至1350℃,加压至45MPa后,并保温12小时,之后自然降温至室温将冷却后旋转靶坯从石墨模具中脱出得到氧化铌旋转靶材靶坯;
7) 靶坯加工:将步骤6)中烧结旋转靶材靶坯进行按尺寸加工,取样测试氧化铌旋转靶材密度4.58g/cm3,电阻率为1.4×10-3Ω·cm。
Claims (10)
1.一种高致密低电阻氧化铌旋转靶材,其特征在于所述高致密低电阻氧化铌旋转靶材密度≥4.5g/cm3,电阻率≤1.4×10-3Ω·cm,长度≥400mm,壁厚6—14mm。
2.一种高致密低电阻氧化铌旋转靶材的制备方法,其特征在于,该制备方法包括以下步骤:
1)粉末混合:将氧化铌粉末与金属铌粉进行机械混合均匀;
2)粉末预烧:对步骤1)中混合后粉末进行真空预烧;
3)粉末处理:对步骤2)中预烧粉末进行球磨处理;
4)冷等静压成型:对步骤3)中处理粉末装入旋转靶材橡胶模具中使用冷等静压预压成型旋转靶材坯体;
5)坯体车削加工:对步骤4)中旋转靶材坯体进行车削整形加工;
6)真空热压烧结:对步骤5)中车削整形坯体置入石墨模具中进行热压真空烧结;
7)靶坯加工:对步骤6)中烧结旋转靶材靶坯进行按尺寸加工,即得到高致密低电阻旋转氧化铌靶材。
3.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤1)中,氧化铌粉末中掺入其重量的2-8%的金属铌粉。
4.按照权利要求3所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述氧化铌粉末纯度不低于99.99wt%,粒径1-5μm;所述金属铌粉纯度不低于99.95wt%,粒径5-20μm。
5.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤2)中,真空预烧的真空度为100-1000Pa,在预烧温度500-900℃,预烧2-5小时。
6.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤3)中,粉末进行球磨4-8小时,过100-200目筛。
7.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤4)中,冷等静压压力200-350MPa。
8.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤5)中,将冷等静压预压成型不规则旋转靶材坯体进行车削整形规则。
9.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤6)中,将车削整形规则后的氧化铌旋转靶材坯体置入石墨模具中进行真空热压烧结,真空度为100-1000Pa;以100-400℃/h速度升温至900℃,保温2-4小时;随后以200-500℃/h速度升温至1200-1400℃,加压至30-50MPa后,保温8-12小时,之后自然降温至室温,。
10.按照权利要求2所述一种高致密低电阻氧化铌旋转靶材制备方法,其特征在于所述步骤7)中,氧化铌旋转靶材靶坯加工采用内、外圆磨床进行磨削加工。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910732234.8A CN110467462A (zh) | 2019-08-09 | 2019-08-09 | 一种高致密低电阻氧化铌旋转靶材及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910732234.8A CN110467462A (zh) | 2019-08-09 | 2019-08-09 | 一种高致密低电阻氧化铌旋转靶材及其制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110467462A true CN110467462A (zh) | 2019-11-19 |
Family
ID=68511614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910732234.8A Pending CN110467462A (zh) | 2019-08-09 | 2019-08-09 | 一种高致密低电阻氧化铌旋转靶材及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110467462A (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110983265A (zh) * | 2019-12-24 | 2020-04-10 | 湖南欧泰稀有金属有限公司 | 异形钌产品的制备方法 |
CN111606708A (zh) * | 2020-06-03 | 2020-09-01 | 福建阿石创新材料股份有限公司 | 一种低电阻率五氧化二铌热压靶材及其制备方法 |
CN115537746A (zh) * | 2022-10-25 | 2022-12-30 | 洛阳丰联科绑定技术有限公司 | 一种铝钪合金靶材及其制备方法和应用 |
WO2024141077A1 (zh) * | 2022-12-29 | 2024-07-04 | 苏州六九新材料科技有限公司 | 一种碳化钨靶材及其制备方法和专用模具 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101705467A (zh) * | 2009-05-14 | 2010-05-12 | 上海高展金属材料有限公司 | 一种旋转陶瓷靶材的制备方法 |
CN101851740A (zh) * | 2009-04-02 | 2010-10-06 | 宜兴佰伦光电材料科技有限公司 | 用于磁控溅射镀膜的导电Nb2O5-x靶材及生产方法 |
CN103668068A (zh) * | 2013-12-25 | 2014-03-26 | 河北东同光电科技有限公司 | 一种高致密性氧化铌旋转靶材的制备方法 |
WO2014132872A1 (ja) * | 2013-02-26 | 2014-09-04 | 三菱マテリアル株式会社 | 酸化ニオブスパッタリングターゲット、その製造方法及び酸化ニオブ膜 |
CN104961463A (zh) * | 2015-07-08 | 2015-10-07 | 北京冶科纳米科技有限公司 | 一种氧化铌旋转靶材及其制备方法 |
-
2019
- 2019-08-09 CN CN201910732234.8A patent/CN110467462A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101851740A (zh) * | 2009-04-02 | 2010-10-06 | 宜兴佰伦光电材料科技有限公司 | 用于磁控溅射镀膜的导电Nb2O5-x靶材及生产方法 |
CN101705467A (zh) * | 2009-05-14 | 2010-05-12 | 上海高展金属材料有限公司 | 一种旋转陶瓷靶材的制备方法 |
WO2014132872A1 (ja) * | 2013-02-26 | 2014-09-04 | 三菱マテリアル株式会社 | 酸化ニオブスパッタリングターゲット、その製造方法及び酸化ニオブ膜 |
CN103668068A (zh) * | 2013-12-25 | 2014-03-26 | 河北东同光电科技有限公司 | 一种高致密性氧化铌旋转靶材的制备方法 |
CN104961463A (zh) * | 2015-07-08 | 2015-10-07 | 北京冶科纳米科技有限公司 | 一种氧化铌旋转靶材及其制备方法 |
Non-Patent Citations (2)
Title |
---|
彭能等: "烧结温度对Nb_2O_(5-x)靶材性能的影响", 《材料研究与应用》 * |
谭鑫等: "热压氧化铌靶材内部孔洞的形成及研究", 《世界有色金属》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110983265A (zh) * | 2019-12-24 | 2020-04-10 | 湖南欧泰稀有金属有限公司 | 异形钌产品的制备方法 |
CN110983265B (zh) * | 2019-12-24 | 2022-03-11 | 湖南欧泰稀有金属有限公司 | 异形钌产品的制备方法 |
CN111606708A (zh) * | 2020-06-03 | 2020-09-01 | 福建阿石创新材料股份有限公司 | 一种低电阻率五氧化二铌热压靶材及其制备方法 |
CN115537746A (zh) * | 2022-10-25 | 2022-12-30 | 洛阳丰联科绑定技术有限公司 | 一种铝钪合金靶材及其制备方法和应用 |
CN115537746B (zh) * | 2022-10-25 | 2024-04-19 | 洛阳丰联科绑定技术有限公司 | 一种铝钪合金靶材及其制备方法和应用 |
WO2024141077A1 (zh) * | 2022-12-29 | 2024-07-04 | 苏州六九新材料科技有限公司 | 一种碳化钨靶材及其制备方法和专用模具 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110467462A (zh) | 一种高致密低电阻氧化铌旋转靶材及其制备方法 | |
TWI645059B (zh) | 氧化銦-氧化鋅系(izo)濺鍍鈀及其製造方法 | |
CN102212781B (zh) | 一种氧化锌铝溅射靶材的制造方法 | |
JP5224073B2 (ja) | 酸化物蒸着材とその製造方法 | |
CN103833375B (zh) | 注浆成型的陶瓷旋转靶材的制备方法 | |
CN104961463B (zh) | 一种氧化铌旋转靶材及其制备方法 | |
CN108218419B (zh) | 一种铟锡氧化物陶瓷靶材的制备方法 | |
CN101786885A (zh) | 一种控制晶粒度制造ito靶材的方法 | |
JPWO2016072441A1 (ja) | Itoスパッタリングターゲット及びその製造方法並びにito透明導電膜及びito透明導電膜の製造方法 | |
CN108546109B (zh) | 氧空位可控的大尺寸azo磁控溅射靶材制备方法 | |
JP5692224B2 (ja) | 酸化亜鉛焼結体タブレットおよびその製造方法 | |
JP2006200016A (ja) | ZnO:Alターゲットおよび薄膜並びに薄膜の製造方法 | |
JP2021050411A (ja) | ニッケルドープ酸化インジウムスズターゲットおよびその製造方法 | |
CN106587940B (zh) | 一种高纯致密氧化镁靶材及其制备方法 | |
CN103739282A (zh) | 一种微量元素复合掺杂改性氧化锡锑陶瓷靶材的制备方法 | |
CN105272210A (zh) | 高透节能玻璃用tzo半导体材料的制备方法 | |
CN102180653A (zh) | 一种高密度氧化铟锡靶材的制备方法 | |
CN109678492A (zh) | 一种Nb2O5掺杂TiO2的制备工艺 | |
CN115959897A (zh) | 一种砂磨工艺制备蒸镀用低密度ito靶材的方法 | |
CN114057481B (zh) | 氧化锌靶材制备方法和氧化锌靶材 | |
JP5428872B2 (ja) | ZnO蒸着材の製造方法 | |
JP6233233B2 (ja) | スパッタリングターゲット及びその製造方法 | |
KR101322595B1 (ko) | Ito 타겟 제조방법 및 이에 의해 제조된 ito 타겟 | |
JP4934926B2 (ja) | Itoスパッタリングターゲットおよびその製造方法 | |
KR20130078156A (ko) | Izto 미세분말로 제조된 소결체 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20191119 |
|
RJ01 | Rejection of invention patent application after publication |