CN101794821A - 薄膜晶体管和显示装置 - Google Patents
薄膜晶体管和显示装置 Download PDFInfo
- Publication number
- CN101794821A CN101794821A CN201010103189A CN201010103189A CN101794821A CN 101794821 A CN101794821 A CN 101794821A CN 201010103189 A CN201010103189 A CN 201010103189A CN 201010103189 A CN201010103189 A CN 201010103189A CN 101794821 A CN101794821 A CN 101794821A
- Authority
- CN
- China
- Prior art keywords
- film
- oxide semiconductor
- semiconductor layer
- thin
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 32
- 239000010408 film Substances 0.000 claims abstract description 202
- 239000004065 semiconductor Substances 0.000 claims abstract description 118
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 54
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 31
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000012528 membrane Substances 0.000 claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 15
- 239000010410 layer Substances 0.000 claims description 156
- 229910052751 metal Inorganic materials 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 31
- 229910052750 molybdenum Inorganic materials 0.000 claims description 9
- 239000011733 molybdenum Substances 0.000 claims description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 8
- 239000012044 organic layer Substances 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- 238000010276 construction Methods 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- 230000007547 defect Effects 0.000 abstract description 13
- 230000015572 biosynthetic process Effects 0.000 abstract description 9
- 238000000034 method Methods 0.000 description 29
- 239000000463 material Substances 0.000 description 19
- 239000001301 oxygen Substances 0.000 description 17
- 229910052760 oxygen Inorganic materials 0.000 description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 15
- 239000004411 aluminium Substances 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 238000005755 formation reaction Methods 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000004806 packaging method and process Methods 0.000 description 7
- 238000005070 sampling Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 6
- 229910052733 gallium Inorganic materials 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000003795 desorption Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- -1 silicon nitrides Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910017073 AlLi Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001398 aluminium Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002751 molybdenum Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- AHLBNYSZXLDEJQ-FWEHEUNISA-N orlistat Chemical compound CCCCCCCCCCC[C@H](OC(=O)[C@H](CC(C)C)NC=O)C[C@@H]1OC(=O)[C@H]1CCCCCC AHLBNYSZXLDEJQ-FWEHEUNISA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical class [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/7869—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02554—Oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02565—Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/302—Details of OLEDs of OLED structures
- H10K2102/3023—Direction of light emission
- H10K2102/3026—Top emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009024034A JP4752925B2 (ja) | 2009-02-04 | 2009-02-04 | 薄膜トランジスタおよび表示装置 |
JP2009-024034 | 2009-02-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101794821A true CN101794821A (zh) | 2010-08-04 |
CN101794821B CN101794821B (zh) | 2012-10-03 |
Family
ID=42396943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010101031899A Active CN101794821B (zh) | 2009-02-04 | 2010-01-27 | 薄膜晶体管和显示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8247811B2 (zh) |
JP (1) | JP4752925B2 (zh) |
CN (1) | CN101794821B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102544026A (zh) * | 2010-12-08 | 2012-07-04 | 三星电子株式会社 | 薄膜晶体管阵列面板 |
CN102714160A (zh) * | 2011-01-18 | 2012-10-03 | 松下电器产业株式会社 | 薄膜晶体管器件的制造方法、薄膜晶体管以及显示装置 |
CN103000694A (zh) * | 2012-12-13 | 2013-03-27 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制作方法、阵列基板和显示装置 |
WO2013159513A1 (zh) * | 2012-04-28 | 2013-10-31 | 北京京东方光电科技有限公司 | 薄膜晶体管及其制造方法、阵列基板和显示装置 |
US9530804B2 (en) | 2013-10-22 | 2016-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
CN107452751A (zh) * | 2011-12-27 | 2017-12-08 | 株式会社半导体能源研究所 | 半导体装置及其制造方法 |
CN109103230A (zh) * | 2018-08-27 | 2018-12-28 | 上海天马有机发光显示技术有限公司 | 一种oled显示面板、oled显示面板的制作方法及显示装置 |
CN109585566A (zh) * | 2018-11-14 | 2019-04-05 | 惠科股份有限公司 | 一种阵列基板、阵列基板的制作方法和显示面板 |
CN110416063A (zh) * | 2019-06-27 | 2019-11-05 | 惠科股份有限公司 | 一种薄膜晶体管的制作方法及显示面板 |
CN110571278A (zh) * | 2013-10-22 | 2019-12-13 | 株式会社半导体能源研究所 | 半导体装置 |
CN110867469A (zh) * | 2014-03-17 | 2020-03-06 | 松下电器产业株式会社 | 有机el显示装置 |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011043164A1 (en) * | 2009-10-09 | 2011-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the semiconductor device |
WO2011052384A1 (en) | 2009-10-30 | 2011-05-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
KR102066532B1 (ko) | 2009-11-06 | 2020-01-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
WO2011055668A1 (en) | 2009-11-06 | 2011-05-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
JP5688223B2 (ja) * | 2010-02-03 | 2015-03-25 | 三菱電機株式会社 | 薄膜トランジスタ、半導体装置、及び薄膜トランジスタの製造方法 |
US8947337B2 (en) * | 2010-02-11 | 2015-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
JP5775278B2 (ja) * | 2010-09-03 | 2015-09-09 | 株式会社半導体エネルギー研究所 | 表示装置 |
TWI556317B (zh) | 2010-10-07 | 2016-11-01 | 半導體能源研究所股份有限公司 | 薄膜元件、半導體裝置以及它們的製造方法 |
US8679986B2 (en) | 2010-10-14 | 2014-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
TWI570920B (zh) | 2011-01-26 | 2017-02-11 | 半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
JPWO2012124281A1 (ja) * | 2011-03-11 | 2014-07-17 | シャープ株式会社 | 薄膜トランジスタ基板の製造方法およびその方法により製造された薄膜トランジスタ基板、表示装置 |
TWI658516B (zh) | 2011-03-11 | 2019-05-01 | 日商半導體能源研究所股份有限公司 | 半導體裝置的製造方法 |
JP2012204548A (ja) * | 2011-03-24 | 2012-10-22 | Sony Corp | 表示装置およびその製造方法 |
US8956944B2 (en) * | 2011-03-25 | 2015-02-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
US9385238B2 (en) * | 2011-07-08 | 2016-07-05 | Semiconductor Energy Laboratory Co., Ltd. | Transistor using oxide semiconductor |
KR102108572B1 (ko) * | 2011-09-26 | 2020-05-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
TWI605590B (zh) | 2011-09-29 | 2017-11-11 | 半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
WO2013047629A1 (en) | 2011-09-29 | 2013-04-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
TW201322341A (zh) * | 2011-11-21 | 2013-06-01 | Ind Tech Res Inst | 半導體元件以及其製造方法 |
KR102100425B1 (ko) * | 2011-12-27 | 2020-04-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
JP5828911B2 (ja) | 2012-01-11 | 2015-12-09 | シャープ株式会社 | 半導体装置、表示装置および半導体装置の製造方法 |
US9123691B2 (en) * | 2012-01-19 | 2015-09-01 | E Ink Holdings Inc. | Thin-film transistor and method for manufacturing the same |
KR20220088814A (ko) * | 2012-01-25 | 2022-06-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
CN102629591B (zh) * | 2012-02-28 | 2015-10-21 | 京东方科技集团股份有限公司 | 一种阵列基板的制造方法及阵列基板、显示器 |
JP6175740B2 (ja) * | 2012-03-30 | 2017-08-09 | 株式会社Joled | 薄膜トランジスタおよびその製造方法並びに表示装置および電子機器 |
CN202549848U (zh) * | 2012-04-28 | 2012-11-21 | 京东方科技集团股份有限公司 | 显示装置、阵列基板和薄膜晶体管 |
KR102551443B1 (ko) * | 2012-05-10 | 2023-07-06 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
TWI459567B (zh) | 2012-06-08 | 2014-11-01 | Au Optronics Corp | 主動元件、驅動電路結構以及顯示面板 |
US9991399B2 (en) | 2012-10-04 | 2018-06-05 | Cree, Inc. | Passivation structure for semiconductor devices |
US9812338B2 (en) | 2013-03-14 | 2017-11-07 | Cree, Inc. | Encapsulation of advanced devices using novel PECVD and ALD schemes |
US8994073B2 (en) * | 2012-10-04 | 2015-03-31 | Cree, Inc. | Hydrogen mitigation schemes in the passivation of advanced devices |
JP2014170829A (ja) | 2013-03-04 | 2014-09-18 | Sony Corp | 半導体装置およびその製造方法、並びに表示装置の製造方法および電子機器の製造方法 |
US9035301B2 (en) * | 2013-06-19 | 2015-05-19 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device |
WO2015049818A1 (ja) | 2013-10-03 | 2015-04-09 | パナソニック株式会社 | 薄膜トランジスタ基板の製造方法 |
US9082793B1 (en) * | 2013-12-19 | 2015-07-14 | Intermolecular, Inc. | IGZO devices with reduced threshhold voltage shift and methods for forming the same |
US20150177311A1 (en) * | 2013-12-19 | 2015-06-25 | Intermolecular, Inc. | Methods and Systems for Evaluating IGZO with Respect to NBIS |
TWI657488B (zh) * | 2014-03-20 | 2019-04-21 | 日商半導體能源研究所股份有限公司 | 半導體裝置、具有該半導體裝置的顯示裝置、具有該顯示裝置的顯示模組以及具有該半導體裝置、該顯示裝置和該顯示模組的電子裝置 |
JP6659255B2 (ja) * | 2014-09-02 | 2020-03-04 | 株式会社神戸製鋼所 | 薄膜トランジスタ |
JP6172395B2 (ja) * | 2015-03-30 | 2017-08-02 | 東レ株式会社 | 着色樹脂組成物、着色膜、加飾基板及びタッチパネル |
CN104916266B (zh) * | 2015-07-13 | 2017-05-03 | 京东方科技集团股份有限公司 | 一种像素驱动电路及其驱动方法、显示面板及显示装置 |
CN105552133A (zh) * | 2016-02-24 | 2016-05-04 | 深圳市华星光电技术有限公司 | 一种薄膜晶体管及其制备方法 |
KR102611981B1 (ko) * | 2017-10-19 | 2023-12-11 | 삼성전자주식회사 | 발광 장치 및 그 제조 방법 |
JP6703186B2 (ja) * | 2017-10-31 | 2020-06-03 | 株式会社アルバック | 薄膜トランジスタ及びその製造方法 |
CN112714960A (zh) * | 2018-09-18 | 2021-04-27 | 夏普株式会社 | 显示装置 |
CN111244140B (zh) * | 2020-01-15 | 2023-04-25 | 云谷(固安)科技有限公司 | 一种显示面板制作方法及显示面板 |
US11903221B2 (en) | 2020-08-17 | 2024-02-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Three dimensional semiconductor device with memory stack |
US11437474B2 (en) | 2020-08-17 | 2022-09-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Gate structures in transistors and method of forming same |
US20220285159A1 (en) * | 2021-03-04 | 2022-09-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Gate Structures in Transistors and Method of Forming Same |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002289859A (ja) * | 2001-03-23 | 2002-10-04 | Minolta Co Ltd | 薄膜トランジスタ |
JP4090716B2 (ja) * | 2001-09-10 | 2008-05-28 | 雅司 川崎 | 薄膜トランジスタおよびマトリクス表示装置 |
WO2003098699A1 (en) | 2002-05-22 | 2003-11-27 | Sharp Kabushiki Kaisha | Semiconductor device and display comprising same |
JP2006100760A (ja) * | 2004-09-02 | 2006-04-13 | Casio Comput Co Ltd | 薄膜トランジスタおよびその製造方法 |
JP5084160B2 (ja) * | 2006-03-20 | 2012-11-28 | キヤノン株式会社 | 薄膜トランジスタ及び表示装置 |
JP4200458B2 (ja) | 2006-05-10 | 2008-12-24 | ソニー株式会社 | 薄膜トランジスタの製造方法 |
KR100858088B1 (ko) * | 2007-02-28 | 2008-09-10 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조 방법 |
US8173487B2 (en) * | 2007-04-06 | 2012-05-08 | Sharp Kabushiki Kaisha | Semiconductor element, method for manufacturing same, and electronic device including same |
KR20090069806A (ko) * | 2007-12-26 | 2009-07-01 | 삼성전자주식회사 | 표시 기판, 이를 포함하는 표시 장치 및 표시 기판의 제조방법 |
JP5584960B2 (ja) * | 2008-07-03 | 2014-09-10 | ソニー株式会社 | 薄膜トランジスタおよび表示装置 |
-
2009
- 2009-02-04 JP JP2009024034A patent/JP4752925B2/ja active Active
-
2010
- 2010-01-27 CN CN2010101031899A patent/CN101794821B/zh active Active
- 2010-01-27 US US12/694,354 patent/US8247811B2/en active Active
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102544026A (zh) * | 2010-12-08 | 2012-07-04 | 三星电子株式会社 | 薄膜晶体管阵列面板 |
CN102714160A (zh) * | 2011-01-18 | 2012-10-03 | 松下电器产业株式会社 | 薄膜晶体管器件的制造方法、薄膜晶体管以及显示装置 |
CN107452751B (zh) * | 2011-12-27 | 2021-06-01 | 株式会社半导体能源研究所 | 半导体装置及其制造方法 |
CN107452751A (zh) * | 2011-12-27 | 2017-12-08 | 株式会社半导体能源研究所 | 半导体装置及其制造方法 |
WO2013159513A1 (zh) * | 2012-04-28 | 2013-10-31 | 北京京东方光电科技有限公司 | 薄膜晶体管及其制造方法、阵列基板和显示装置 |
CN103000694A (zh) * | 2012-12-13 | 2013-03-27 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制作方法、阵列基板和显示装置 |
CN103000694B (zh) * | 2012-12-13 | 2015-08-19 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制作方法、阵列基板和显示装置 |
US9530804B2 (en) | 2013-10-22 | 2016-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
CN110571278A (zh) * | 2013-10-22 | 2019-12-13 | 株式会社半导体能源研究所 | 半导体装置 |
CN110867469B (zh) * | 2014-03-17 | 2023-12-29 | 三星显示有限公司 | 有机el显示装置 |
CN110867469A (zh) * | 2014-03-17 | 2020-03-06 | 松下电器产业株式会社 | 有机el显示装置 |
CN109103230A (zh) * | 2018-08-27 | 2018-12-28 | 上海天马有机发光显示技术有限公司 | 一种oled显示面板、oled显示面板的制作方法及显示装置 |
CN109585566A (zh) * | 2018-11-14 | 2019-04-05 | 惠科股份有限公司 | 一种阵列基板、阵列基板的制作方法和显示面板 |
CN109585566B (zh) * | 2018-11-14 | 2021-05-18 | 惠科股份有限公司 | 一种阵列基板、阵列基板的制作方法和显示面板 |
CN110416063B (zh) * | 2019-06-27 | 2021-08-06 | 惠科股份有限公司 | 一种薄膜晶体管的制作方法及显示面板 |
CN110416063A (zh) * | 2019-06-27 | 2019-11-05 | 惠科股份有限公司 | 一种薄膜晶体管的制作方法及显示面板 |
Also Published As
Publication number | Publication date |
---|---|
JP2010182818A (ja) | 2010-08-19 |
JP4752925B2 (ja) | 2011-08-17 |
CN101794821B (zh) | 2012-10-03 |
US8247811B2 (en) | 2012-08-21 |
US20100193784A1 (en) | 2010-08-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101794821B (zh) | 薄膜晶体管和显示装置 | |
CN101800248B (zh) | 薄膜晶体管和显示器件 | |
CN101794823B (zh) | 薄膜晶体管和显示装置 | |
CN101740564B (zh) | 薄膜晶体管衬底和显示装置 | |
US8742418B2 (en) | Thin film transistor and display device | |
CN102214698B (zh) | 薄膜晶体管、显示装置以及电子单元 | |
CN101794770B (zh) | 显示设备及其制造方法 | |
CN102456581B (zh) | 薄膜晶体管及其制造方法 | |
CN102148258B (zh) | 薄膜晶体管、其制造方法、显示单元和电子装置 | |
CN101752426A (zh) | 薄膜晶体管、显示单元和制造薄膜晶体管的方法 | |
US9324741B2 (en) | Display device, manufacturing method of display device and electronic equipment | |
JP6175740B2 (ja) | 薄膜トランジスタおよびその製造方法並びに表示装置および電子機器 | |
CN103035737B (zh) | 显示装置、其制造方法和电子单元 | |
CN104078510A (zh) | 半导体器件,显示单元和电子设备 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: JANPAN ORGANIC RATE DISPLAY CO., LTD. Free format text: FORMER OWNER: SONY CORP Effective date: 20150819 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150819 Address after: Tokyo, Japan Patentee after: JOLED Inc. Address before: Tokyo, Japan Patentee before: Sony Corp. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20231204 Address after: Tokyo, Japan Patentee after: Japan Display Design and Development Contract Society Address before: Tokyo, Japan Patentee before: JOLED Inc. |