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WO2024012800A1
(en)
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2022-07-11 |
2024-01-18 |
Asml Netherlands B.V. |
Systems and methods for predicting post-etch stochastic variation
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WO2024013038A1
(en)
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2022-07-12 |
2024-01-18 |
Asml Netherlands B.V. |
Stochastic-aware source mask optimization based on edge placement probability distribution
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WO2024013273A1
(en)
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2022-07-14 |
2024-01-18 |
Asml Netherlands B.V. |
Determining mask rule check violations and mask design based on local feature dimension
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(en)
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2022-07-19 |
2024-01-25 |
Asml Netherlands B.V. |
Systems and methods for optimizing metrology marks
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(en)
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2022-07-28 |
2024-02-01 |
Asml Netherlands B.V. |
Training a machine learning model to generate mrc and process aware mask pattern
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WO2024037859A1
(en)
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2022-08-15 |
2024-02-22 |
Asml Netherlands B.V. |
Method for radiation spectrum aware souce mask optimization for lithography
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WO2024037837A1
(en)
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2022-08-18 |
2024-02-22 |
Asml Netherlands B.V. |
Suppressing specular reflection of mask absorber and on- resolution field stitching
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WO2024041831A1
(en)
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2022-08-25 |
2024-02-29 |
Asml Netherlands B.V. |
Modelling of multi-level etch processes
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WO2024046691A1
(en)
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2022-09-02 |
2024-03-07 |
Asml Netherlands B.V. |
Method for configuring a field of view of an inspection apparatus
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WO2024088666A1
(en)
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2022-10-26 |
2024-05-02 |
Asml Netherlands B.V. |
Simulation-assisted methods and software to guide selection of patterns or gauges for lithographic processes
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WO2024094385A1
(en)
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2022-10-31 |
2024-05-10 |
Asml Netherlands B.V. |
Source optimization for mitigating mask error impact
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