CN101142252B - 包含(甲基)丙烯酰基的芳族异氰酸酯化合物及其制备方法 - Google Patents
包含(甲基)丙烯酰基的芳族异氰酸酯化合物及其制备方法 Download PDFInfo
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- CN101142252B CN101142252B CN200680008586XA CN200680008586A CN101142252B CN 101142252 B CN101142252 B CN 101142252B CN 200680008586X A CN200680008586X A CN 200680008586XA CN 200680008586 A CN200680008586 A CN 200680008586A CN 101142252 B CN101142252 B CN 101142252B
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- 0 *C(CN)C(N)=O Chemical compound *C(CN)C(N)=O 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Cc1ccccc1 Chemical compound Cc1ccccc1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- PWECNJNOIHDVOL-UHFFFAOYSA-N O=C(OC(Cl)(Cl)Cl)OC(Cl)(Cl)[ClH+] Chemical compound O=C(OC(Cl)(Cl)Cl)OC(Cl)(Cl)[ClH+] PWECNJNOIHDVOL-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
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- C07C265/00—Derivatives of isocyanic acid
- C07C265/12—Derivatives of isocyanic acid having isocyanate groups bound to carbon atoms of six-membered aromatic rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C235/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
- C07C235/02—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C235/32—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton containing six-membered aromatic rings
- C07C235/34—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton containing six-membered aromatic rings having the nitrogen atoms of the carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
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- C—CHEMISTRY; METALLURGY
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C235/00—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms
- C07C235/02—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C235/32—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton containing six-membered aromatic rings
- C07C235/38—Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by oxygen atoms having carbon atoms of carboxamide groups bound to acyclic carbon atoms and singly-bound oxygen atoms bound to the same carbon skeleton the carbon skeleton containing six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a six-membered aromatic ring
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- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
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- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
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- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
- C08F220/365—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate containing further carboxylic moieties
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- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/44—Polycarbonates
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
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- C08G18/622—Polymers of esters of alpha-beta ethylenically unsaturated carboxylic acids
- C08G18/6225—Polymers of esters of acrylic or methacrylic acid
- C08G18/6229—Polymers of hydroxy groups containing esters of acrylic or methacrylic acid with aliphatic polyalcohols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
- C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
- C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
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- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
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- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005073223 | 2005-03-15 | ||
| JP073223/2005 | 2005-03-15 | ||
| PCT/JP2006/305620 WO2006103979A1 (en) | 2005-03-15 | 2006-03-15 | (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101142252A CN101142252A (zh) | 2008-03-12 |
| CN101142252B true CN101142252B (zh) | 2011-08-03 |
Family
ID=39137834
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200680008586XA Expired - Fee Related CN101142252B (zh) | 2005-03-15 | 2006-03-15 | 包含(甲基)丙烯酰基的芳族异氰酸酯化合物及其制备方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8044235B2 (https=) |
| KR (2) | KR100968670B1 (https=) |
| CN (1) | CN101142252B (https=) |
| TW (1) | TW200642995A (https=) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101540689B1 (ko) * | 2008-11-12 | 2015-07-31 | 주식회사 케이씨씨 | 아크릴 수지를 경화제로 포함하는 투명 도료 조성물 |
| KR20110019979A (ko) * | 2009-08-21 | 2011-03-02 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 액정표시장치 |
| KR101362869B1 (ko) * | 2010-12-29 | 2014-02-14 | 제일모직주식회사 | 광학 점착제 조성물 |
| TWI582117B (zh) * | 2012-04-03 | 2017-05-11 | Arakawa Chemical Industries Ltd | A polyfunctional thio (meth) acrylate resin, an active energy ray-hardening hard coat resin composition having a hardened film obtained by hardening it, a plastic film having a hardened film laminated thereon, and a plastic film Molding and processing products |
| KR20140052240A (ko) * | 2012-10-23 | 2014-05-07 | 동우 화인켐 주식회사 | 액정층 형성용 조성물 및 이를 이용하여 제조된 리타더 |
| JP6166939B2 (ja) * | 2013-04-19 | 2017-07-19 | 昭和電工株式会社 | 不飽和ウレタン化合物、不飽和ウレア化合物、または不飽和アミド化合物の製造方法 |
| JP6110823B2 (ja) * | 2013-09-25 | 2017-04-05 | 富士フイルム株式会社 | 固体電解質組成物および全固体二次電池用のバインダー、ならびにこれらを用いた電池用電極シートおよび全固体二次電池 |
| JP6195409B2 (ja) * | 2013-11-01 | 2017-09-13 | 昭和電工株式会社 | 不飽和ウレタン化合物、不飽和チオウレタン化合物、不飽和ウレア化合物または不飽和アミド化合物の製造方法 |
| CN106132382A (zh) * | 2014-03-31 | 2016-11-16 | 三井化学株式会社 | 牙科材料用聚合性单体 |
| CN105295812B (zh) * | 2014-07-22 | 2021-03-02 | 昭和电工材料株式会社 | 连接材料和太阳能电池模块 |
| KR102004506B1 (ko) * | 2015-09-23 | 2019-07-26 | 코오롱인더스트리 주식회사 | 광확산층 형성용 조성물 및 이를 포함하는 유기발광다이오드 |
| WO2017110326A1 (ja) * | 2015-12-25 | 2017-06-29 | 昭和電工株式会社 | 硬化性組成物、硬化物、オーバーコート膜、被覆フレキシブル配線板およびその製造方法 |
| CN105837475A (zh) * | 2016-05-17 | 2016-08-10 | 北京宇极科技发展有限公司 | 碳酰氟法制备对甲苯磺酰异氰酸酯 |
| CN107778201A (zh) * | 2016-08-27 | 2018-03-09 | 乐凯华光印刷科技有限公司 | 一种季戊四醇甲基丙烯酰氧乙基氨基甲酸酯及其制备方法 |
| KR102275295B1 (ko) * | 2017-03-17 | 2021-07-12 | 미쯔비시 케미컬 주식회사 | 우레탄(메트)아크릴레이트 중합체 |
| US11248141B2 (en) * | 2017-05-30 | 2022-02-15 | Riken Technos Corporation | Active energy curable resin composition, hard coat laminated film, and film for application to glass |
| WO2019073034A1 (de) | 2017-10-13 | 2019-04-18 | Covestro Deutschland Ag | Verfahren zur herstellung eines vernetzbaren polymers unter bildung von oxazolidinonen |
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| WO2020003169A1 (en) | 2018-06-29 | 2020-01-02 | 3M Innovative Properties Company | Orthodontic articles comprising cured free-radically polymerizable composition with improved strength in aqueous environment |
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| US11945900B2 (en) | 2018-06-29 | 2024-04-02 | 3M Innovative Properties Company | Orthodontic articles prepared using a polycarbonate diol, polymerizable compositions, and methods of making the articles |
| WO2020106815A1 (en) | 2018-11-21 | 2020-05-28 | The Regents Of The University Of California | Decomposable and recyclable epoxy thermosetting resins |
| KR102134156B1 (ko) * | 2018-12-28 | 2020-07-16 | (주)켐이 | 폴리아마이드계 화합물 및 이를 포함하는 감광성 조성물 |
| CN113767131A (zh) * | 2019-05-21 | 2021-12-07 | 3M创新有限公司 | 包含具有侧环部分的聚合的组合物的正畸制品、方法和可聚合组合物 |
| KR102821473B1 (ko) * | 2020-01-06 | 2025-06-18 | 가부시끼가이샤 레조낙 | 이소시아나토기를 갖는 (메트)아크릴산에스테르 화합물 및 그 제조 방법 |
| CN111393567A (zh) * | 2020-04-22 | 2020-07-10 | 珠海赛纳三维科技有限公司 | 一种三维成型材料及其制备方法和应用 |
| WO2022030052A1 (ja) * | 2020-08-07 | 2022-02-10 | 昭和電工マテリアルズ株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及びプリント配線板の製造方法 |
| CN112080185A (zh) * | 2020-09-29 | 2020-12-15 | 湖北奥斯鸣环保科技有限公司 | 一种水性聚氨酯工业漆及其制备方法 |
| WO2022212199A1 (en) * | 2021-03-29 | 2022-10-06 | Spero Renewables, Llc | Recyclable and decomposable epoxy resins: compositions, preparation methods and applications in carbon fiber reinforced composites |
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| US2821544A (en) * | 1954-04-26 | 1958-01-28 | Bayer Ag | Production of alkylisocyanate esters of 2-alkenoic acids |
| US5213934A (en) * | 1991-01-07 | 1993-05-25 | Xerox Corporation | Microcapsule toner compositions |
| JPH09316046A (ja) * | 1996-05-28 | 1997-12-09 | Kuraray Co Ltd | t−ブトキシカルボニルアミノ基を有するエチレン性芳香族化合物およびその重合体 |
| JPH10316759A (ja) | 1997-05-16 | 1998-12-02 | Kuraray Co Ltd | グラフト共重合体、その製造方法およびその用途 |
| KR100334426B1 (ko) * | 1998-07-31 | 2002-05-03 | 기타지마 요시토시 | 감광성 수지 조성물 및 컬러 필터 |
| JP2000086302A (ja) | 1998-09-09 | 2000-03-28 | Takeda Chem Ind Ltd | 光ファイバ被覆用樹脂組成物 |
| JP4315507B2 (ja) | 1999-01-08 | 2009-08-19 | ナブテスコ株式会社 | 耐熱性に優れる光硬化性樹脂組成物 |
| JP2001200007A (ja) | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
| US6646156B2 (en) * | 2000-04-17 | 2003-11-11 | Showa Denko Kabushiki Kaisha | (Meth)acryloyl-group-containing carbamoyl halides and production process therefor |
| JP2003012632A (ja) | 2001-06-27 | 2003-01-15 | Mitsui Chemicals Inc | イソシアネート類の製造方法 |
| JP4053821B2 (ja) | 2002-06-07 | 2008-02-27 | 矢崎総業株式会社 | コンビネーションスイッチ、並びにこれを用いたワイパースイッチ及びランプスイッチ |
| US7632965B2 (en) * | 2004-03-25 | 2009-12-15 | Showa Denko K.K. | Method for producing (meth)acrylate derivative having isocyanate group |
| WO2005114331A1 (ja) | 2004-05-21 | 2005-12-01 | Mitsubishi Gas Chemical Company, Inc. | レジスト化合物およびレジスト組成物 |
| EP1812381B1 (en) * | 2004-11-04 | 2011-02-16 | Showa Denko K.K. | Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth)acrylate polymer and its use |
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2006
- 2006-03-15 TW TW095108907A patent/TW200642995A/zh not_active IP Right Cessation
- 2006-03-15 US US11/886,487 patent/US8044235B2/en not_active Expired - Fee Related
- 2006-03-15 KR KR1020077023483A patent/KR100968670B1/ko not_active Expired - Fee Related
- 2006-03-15 CN CN200680008586XA patent/CN101142252B/zh not_active Expired - Fee Related
- 2006-03-15 KR KR1020097017932A patent/KR100996011B1/ko not_active Expired - Fee Related
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| Title |
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| JP特开平10-316759A 1998.12.02 |
| JP特开平9-316046A 1997.12.09 |
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| TWI322799B (https=) | 2010-04-01 |
| KR20090097969A (ko) | 2009-09-16 |
| US8044235B2 (en) | 2011-10-25 |
| TW200642995A (en) | 2006-12-16 |
| KR100996011B1 (ko) | 2010-11-22 |
| KR100968670B1 (ko) | 2010-07-06 |
| KR20070119687A (ko) | 2007-12-20 |
| CN101142252A (zh) | 2008-03-12 |
| US20090054543A1 (en) | 2009-02-26 |
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