CN101068845B - 组合物、固化物和物品 - Google Patents
组合物、固化物和物品 Download PDFInfo
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- CN101068845B CN101068845B CN2005800411741A CN200580041174A CN101068845B CN 101068845 B CN101068845 B CN 101068845B CN 2005800411741 A CN2005800411741 A CN 2005800411741A CN 200580041174 A CN200580041174 A CN 200580041174A CN 101068845 B CN101068845 B CN 101068845B
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004350658 | 2004-12-03 | ||
| JP350658/2004 | 2004-12-03 | ||
| PCT/JP2005/022150 WO2006059702A1 (ja) | 2004-12-03 | 2005-12-02 | 組成物、硬化物および物品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101068845A CN101068845A (zh) | 2007-11-07 |
| CN101068845B true CN101068845B (zh) | 2010-05-26 |
Family
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| Application Number | Title | Priority Date | Filing Date |
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| CN2005800411741A Expired - Fee Related CN101068845B (zh) | 2004-12-03 | 2005-12-02 | 组合物、固化物和物品 |
Country Status (6)
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| DE102005002960A1 (de) | 2005-01-21 | 2006-08-03 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität |
| JP2006257190A (ja) * | 2005-03-16 | 2006-09-28 | Nippon Kayaku Co Ltd | 光硬化性樹脂組成物 |
| DE102006033280A1 (de) * | 2006-07-18 | 2008-01-24 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Kompositzusammensetzung für mikrostrukturierte Schichten |
| JP5048304B2 (ja) * | 2006-11-02 | 2012-10-17 | リケンテクノス株式会社 | ハードコートフィルムおよび反射防止フィルム |
| US20100040871A1 (en) * | 2007-03-08 | 2010-02-18 | Kimoto Co., Ltd. | Hard coat film and layered material |
| JP5016368B2 (ja) * | 2007-05-09 | 2012-09-05 | 株式会社ブリヂストン | 光硬化性転写シート、これを用いた光情報記録媒体の製造方法、及び光情報記録媒体 |
| JP5332166B2 (ja) * | 2007-09-28 | 2013-11-06 | 三菱化学株式会社 | 重合体、組成物、硬化物および光記録媒体 |
| KR101553079B1 (ko) * | 2008-04-28 | 2015-09-14 | 미쓰비시 가가꾸 가부시키가이샤 | 활성 에너지선 경화성 수지 조성물, 경화막, 적층체, 광 기록 매체 및 경화막의 제조 방법 |
| JP2010168509A (ja) * | 2009-01-26 | 2010-08-05 | Mitsubishi Paper Mills Ltd | ポリオルガノシロキサングラフト重合体および光重合性樹脂組成物 |
| EP2439230A4 (en) * | 2009-06-01 | 2013-09-11 | Tsujiden Co Ltd | CURED DIGITAL IMPRESSION FILM AND METHOD FOR PRODUCING THE SAME; DISPLAY, TOUCH SCREEN, AND ELECTRONIC DEVICE USING THE SAME |
| CN101909410A (zh) * | 2009-06-03 | 2010-12-08 | 鸿富锦精密工业（深圳）有限公司 | 具有光源的电子设备 |
| WO2011040490A1 (ja) * | 2009-09-29 | 2011-04-07 | 電気化学工業株式会社 | 重合性組成物、接着剤、分子遮蔽性膜及び太陽電池モジュール用保護シート |
| JP5424410B2 (ja) * | 2010-04-15 | 2014-02-26 | 学校法人東京理科大学 | エポキシ樹脂硬化用微粒子 |
| US20110300367A1 (en) * | 2010-06-07 | 2011-12-08 | Ching-Kee Chien | Optical Fiber With Photoacid Coating |
| JP5859449B2 (ja) * | 2010-10-13 | 2016-02-10 | 三菱瓦斯化学株式会社 | Ｔｎ液晶表示装置の前面板 |
| CN102250279B (zh) * | 2011-05-20 | 2013-05-08 | 锦州惠发天合化学有限公司 | 一种自交联型氟硅丙烯酸树脂及其制备方法 |
| TW201317315A (zh) * | 2011-08-26 | 2013-05-01 | Denki Kagaku Kogyo Kk | 固化性樹脂組成物 |
| JP2013068693A (ja) * | 2011-09-21 | 2013-04-18 | Panasonic Corp | 光学部材 |
| US20130164543A1 (en) * | 2011-12-26 | 2013-06-27 | Asahi Glass Company, Limited | Front panel for touch sensor |
| US10858539B2 (en) | 2012-06-12 | 2020-12-08 | Korea Advanced Institute Of Science And Technology | Siloxane hard-coating resin composition |
| US9617449B2 (en) | 2012-06-12 | 2017-04-11 | Korea Advanced Institute Of Science And Technology | Siloxane hard coating resin |
| WO2014126599A1 (en) | 2013-02-15 | 2014-08-21 | Momentive Performance Materials Inc. | Antifouling system comprising silicone hydrogel |
| JP5580917B2 (ja) * | 2013-05-17 | 2014-08-27 | 三菱製紙株式会社 | ポリオルガノシロキサングラフト重合体および光重合性樹脂組成物 |
| WO2015020099A1 (ja) * | 2013-08-09 | 2015-02-12 | 東亞合成株式会社 | プラスチック製フィルム又はシート用活性エネルギー線硬化型接着剤組成物 |
| JP2015078339A (ja) * | 2013-09-10 | 2015-04-23 | 昭和電工株式会社 | 有機無機複合体の製造方法、硬化性組成物、硬化性組成物の製造方法、硬化性組成物の硬化物、ハードコート材、及びハードコート膜 |
| KR101671430B1 (ko) * | 2013-11-25 | 2016-11-01 | 주식회사 엘지화학 | 플라스틱 필름 및 이의 제조방법 |
| JP6322985B2 (ja) * | 2013-12-09 | 2018-05-16 | セイコーエプソン株式会社 | インクジェット記録方法及びインクジェット記録装置 |
| KR102232773B1 (ko) * | 2014-06-24 | 2021-03-26 | 삼성디스플레이 주식회사 | 표시 장치용 커버 윈도우, 이를 포함하는 표시 장치, 및 표시 장치용 커버 윈도우의 제조 방법 |
| US9829606B2 (en) * | 2014-06-26 | 2017-11-28 | Fujifilm Corporation | Method of manufacturing hard coat film, hard coat film, polarizing plate, and liquid crystal display device |
| JP6335827B2 (ja) * | 2014-06-26 | 2018-05-30 | 富士フイルム株式会社 | ハードコートフィルムの製造方法、ハードコートフィルム、偏光板、及び液晶表示装置 |
| JP6470768B2 (ja) * | 2015-02-06 | 2019-02-13 | 富士フイルム株式会社 | ハードコートフィルム、偏光板、液晶表示装置およびハードコートフィルムの製造方法 |
| CN104830025B (zh) * | 2015-04-28 | 2017-02-01 | 中科院广州化学有限公司 | 一种led无机有机杂化复合封装材料及其制备方法 |
| US10729623B2 (en) * | 2015-05-08 | 2020-08-04 | Nisshinbo Holdings, Inc. | Method for producing elliptical, needle-shaped, or rod-shaped polymer particles |
| JP6388570B2 (ja) * | 2015-09-29 | 2018-09-12 | 富士フイルム株式会社 | 積層フィルムおよびその製造方法、偏光板、液晶パネル、ならびに液晶表示装置 |
| CN108367560B (zh) * | 2016-02-18 | 2021-02-19 | 富士胶片株式会社 | 装饰膜、图像显示装置、触摸面板以及装饰膜的制造方法 |
| CN106380915A (zh) * | 2016-08-29 | 2017-02-08 | 常熟市诺信达机械设备有限公司 | 工业生产用摆布机 |
| TWI636832B (zh) * | 2017-08-09 | 2018-10-01 | 勤美信實業有限公司 | Method for forming strong curing film |
| KR20200079231A (ko) * | 2017-11-21 | 2020-07-02 | 도레이 카부시키가이샤 | 실록산 수지 조성물, 경화막 및 표시장치 |
| CN111656277A (zh) * | 2018-01-31 | 2020-09-11 | 东丽株式会社 | 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置以及其制造方法 |
| WO2019163638A1 (ja) | 2018-02-21 | 2019-08-29 | デクセリアルズ株式会社 | 活性エネルギー線硬化性樹脂組成物、防曇防汚積層体、及びその製造方法、物品、並びに防曇方法 |
| WO2020121735A1 (ja) * | 2018-12-10 | 2020-06-18 | 信越化学工業株式会社 | 紫外線硬化型シリコーン粘着剤組成物およびその硬化物 |
| JP7345107B2 (ja) * | 2019-04-15 | 2023-09-15 | パナソニックＩｐマネジメント株式会社 | 光硬化性組成物 |
| JP7473811B2 (ja) * | 2020-09-08 | 2024-04-24 | セントラル硝子株式会社 | 光硬化性組成物、その硬化物、電子デバイスおよび光学部材 |
| CN117801775B (zh) * | 2024-01-15 | 2024-09-13 | 华中科技大学 | 氟化硅氧烷封装剂及其制备方法和应用 |
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| CN1432601A (zh) * | 2002-01-17 | 2003-07-30 | 佳能株式会社 | 环氧树脂组合物、表面处理方法、液体喷射记录头和液体喷射记录装置 |
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| JPH0684495B2 (ja) | 1986-06-03 | 1994-10-26 | 旭硝子株式会社 | 表面改質剤 |
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| US5609990A (en) * | 1995-02-08 | 1997-03-11 | Imation Corp. | Optical recording disk having a sealcoat layer |
| JPH11189622A (ja) | 1997-07-07 | 1999-07-13 | Asahi Glass Co Ltd | 含フッ素エポキシ共重合体、該共重合体を含む硬化性組成物 |
| JPH11293159A (ja) | 1998-04-09 | 1999-10-26 | Toray Ind Inc | 光記録媒体用ハードコート剤および光記録媒体 |
| JP4271840B2 (ja) | 1999-11-10 | 2009-06-03 | パナソニック株式会社 | 光ディスク |
| JP2002234906A (ja) | 2001-02-08 | 2002-08-23 | Mitsubishi Chemicals Corp | 紫外線硬化性樹脂組成物 |
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| JP4175620B2 (ja) | 2002-01-17 | 2008-11-05 | キヤノン株式会社 | エポキシ樹脂組成物、及び液体噴射記録ヘッド |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1412255A (zh) * | 2001-10-09 | 2003-04-23 | 三菱化学株式会社 | 活性能量射线固化型抗静电涂料组合物 |
| CN1432601A (zh) * | 2002-01-17 | 2003-07-30 | 佳能株式会社 | 环氧树脂组合物、表面处理方法、液体喷射记录头和液体喷射记录装置 |
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| CN101068845A (zh) | 2007-11-07 |
| US8017211B2 (en) | 2011-09-13 |
| JP4872670B2 (ja) | 2012-02-08 |
| TW200634043A (en) | 2006-10-01 |
| KR101215805B1 (ko) | 2012-12-26 |
| KR20070093080A (ko) | 2007-09-17 |
| JPWO2006059702A1 (ja) | 2008-06-05 |
| WO2006059702A1 (ja) | 2006-06-08 |
| US20100129587A1 (en) | 2010-05-27 |
| TWI379845B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2012-12-21 |
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