CN100591483C - 用于化学机械抛光的多层抛光垫材料 - Google Patents

用于化学机械抛光的多层抛光垫材料 Download PDF

Info

Publication number
CN100591483C
CN100591483C CN200480016709A CN200480016709A CN100591483C CN 100591483 C CN100591483 C CN 100591483C CN 200480016709 A CN200480016709 A CN 200480016709A CN 200480016709 A CN200480016709 A CN 200480016709A CN 100591483 C CN100591483 C CN 100591483C
Authority
CN
China
Prior art keywords
polishing pad
layer
polishing
workpiece
transmissive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN200480016709A
Other languages
English (en)
Chinese (zh)
Other versions
CN1805826A (zh
Inventor
阿班纳沙瓦·普拉萨德
罗兰·K·塞维利亚
迈克尔·S·莱西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMC Materials LLC
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of CN1805826A publication Critical patent/CN1805826A/zh
Application granted granted Critical
Publication of CN100591483C publication Critical patent/CN100591483C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/008Abrasive bodies without external bonding agent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28Resins or natural or synthetic macromolecular compounds
    • B24D3/32Resins or natural or synthetic macromolecular compounds for porous or cellular structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
CN200480016709A 2003-06-17 2004-06-03 用于化学机械抛光的多层抛光垫材料 Expired - Lifetime CN100591483C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/463,680 2003-06-17
US10/463,680 US6884156B2 (en) 2003-06-17 2003-06-17 Multi-layer polishing pad material for CMP

Publications (2)

Publication Number Publication Date
CN1805826A CN1805826A (zh) 2006-07-19
CN100591483C true CN100591483C (zh) 2010-02-24

Family

ID=33517127

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200480016709A Expired - Lifetime CN100591483C (zh) 2003-06-17 2004-06-03 用于化学机械抛光的多层抛光垫材料

Country Status (11)

Country Link
US (1) US6884156B2 (enExample)
EP (2) EP2025469B1 (enExample)
JP (1) JP5090732B2 (enExample)
KR (1) KR101109367B1 (enExample)
CN (1) CN100591483C (enExample)
AT (1) ATE416881T1 (enExample)
DE (1) DE602004018321D1 (enExample)
MY (1) MY134466A (enExample)
SG (1) SG149719A1 (enExample)
TW (1) TWI295949B (enExample)
WO (1) WO2005000527A2 (enExample)

Families Citing this family (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100465649B1 (ko) * 2002-09-17 2005-01-13 한국포리올 주식회사 일체형 연마 패드 및 그 제조 방법
JP2004303983A (ja) * 2003-03-31 2004-10-28 Fuji Photo Film Co Ltd 研磨パッド
EP1466699A1 (en) * 2003-04-09 2004-10-13 JSR Corporation Abrasive pad, method and metal mold for manufacturing the same, and semiconductor wafer polishing method
US20040209066A1 (en) * 2003-04-17 2004-10-21 Swisher Robert G. Polishing pad with window for planarization
KR100541545B1 (ko) * 2003-06-16 2006-01-11 삼성전자주식회사 화학기계적 연마 장비의 연마 테이블
US7435161B2 (en) 2003-06-17 2008-10-14 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
JP2005007520A (ja) * 2003-06-19 2005-01-13 Nihon Micro Coating Co Ltd 研磨パッド及びその製造方法並びに研磨方法
US20040259479A1 (en) * 2003-06-23 2004-12-23 Cabot Microelectronics Corporation Polishing pad for electrochemical-mechanical polishing
US8066552B2 (en) * 2003-10-03 2011-11-29 Applied Materials, Inc. Multi-layer polishing pad for low-pressure polishing
US7654885B2 (en) * 2003-10-03 2010-02-02 Applied Materials, Inc. Multi-layer polishing pad
US6951803B2 (en) * 2004-02-26 2005-10-04 Taiwan Semiconductor Manufacturing Co., Ltd. Method to prevent passivation layer peeling in a solder bump formation process
US7059936B2 (en) * 2004-03-23 2006-06-13 Cabot Microelectronics Corporation Low surface energy CMP pad
US7204742B2 (en) * 2004-03-25 2007-04-17 Cabot Microelectronics Corporation Polishing pad comprising hydrophobic region and endpoint detection port
CN100424830C (zh) * 2004-04-23 2008-10-08 Jsr株式会社 用于抛光半导体晶片的抛光垫、层叠体和方法
US7252871B2 (en) * 2004-06-16 2007-08-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad having a pressure relief channel
US7189156B2 (en) * 2004-08-25 2007-03-13 Jh Rhodes Company, Inc. Stacked polyurethane polishing pad and method of producing the same
US20060089094A1 (en) * 2004-10-27 2006-04-27 Swisher Robert G Polyurethane urea polishing pad
US20060089095A1 (en) * 2004-10-27 2006-04-27 Swisher Robert G Polyurethane urea polishing pad
US20060089093A1 (en) * 2004-10-27 2006-04-27 Swisher Robert G Polyurethane urea polishing pad
JP2006346805A (ja) * 2005-06-15 2006-12-28 Toyo Tire & Rubber Co Ltd 積層研磨パッド
TW200709892A (en) * 2005-08-18 2007-03-16 Rohm & Haas Elect Mat Transparent polishing pad
TWI378844B (en) * 2005-08-18 2012-12-11 Rohm & Haas Elect Mat Polishing pad and method of manufacture
US20070111644A1 (en) * 2005-09-27 2007-05-17 Spencer Preston Thick perforated polishing pad and method for making same
JP2007307885A (ja) * 2005-11-04 2007-11-29 Ricoh Co Ltd 画像処理方法、記録物、プログラム、画像処理装置、画像形成装置及び画像形成システム、画像形成方法及びインク
KR100741984B1 (ko) * 2006-02-17 2007-07-23 삼성전자주식회사 화학기계적 연마 장치의 연마 패드 및 그의 제조방법
US20070212979A1 (en) * 2006-03-09 2007-09-13 Rimpad Tech Ltd. Composite polishing pad
JP5022635B2 (ja) * 2006-05-31 2012-09-12 ニッタ・ハース株式会社 研磨パッド
JP5033357B2 (ja) * 2006-05-31 2012-09-26 ニッタ・ハース株式会社 研磨パッド
JP5033356B2 (ja) * 2006-05-31 2012-09-26 ニッタ・ハース株式会社 研磨パッド
JP5371251B2 (ja) * 2007-01-30 2013-12-18 東レ株式会社 研磨パッド
JP2008221367A (ja) * 2007-03-09 2008-09-25 Toyo Tire & Rubber Co Ltd 研磨パッド
US8087975B2 (en) * 2007-04-30 2012-01-03 San Fang Chemical Industry Co., Ltd. Composite sheet for mounting a workpiece and the method for making the same
US20080274674A1 (en) * 2007-05-03 2008-11-06 Cabot Microelectronics Corporation Stacked polishing pad for high temperature applications
TWI411495B (zh) * 2007-08-16 2013-10-11 Cabot Microelectronics Corp 拋光墊
JP5078527B2 (ja) * 2007-09-28 2012-11-21 富士紡ホールディングス株式会社 研磨布
US8491360B2 (en) * 2007-10-26 2013-07-23 Innopad, Inc. Three-dimensional network in CMP pad
KR101281076B1 (ko) * 2008-05-15 2013-07-09 세미퀘스트, 인코포레이티드 종결점 윈도우를 구비하는 연마 패드와, 이 연마 패드를 이용하는 시스템 및 방법
JP5585081B2 (ja) * 2008-05-16 2014-09-10 東レ株式会社 研磨パッド
US7645186B1 (en) * 2008-07-18 2010-01-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad manufacturing assembly
US7820005B2 (en) * 2008-07-18 2010-10-26 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multilayer chemical mechanical polishing pad manufacturing process
JP5222070B2 (ja) * 2008-09-17 2013-06-26 富士紡ホールディングス株式会社 研磨パッド
US8083570B2 (en) * 2008-10-17 2011-12-27 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad having sealed window
TWI465315B (zh) * 2008-11-12 2014-12-21 Bestac Advanced Material Co Ltd 可導電之拋光墊及其製造方法
TWI370758B (en) * 2008-12-15 2012-08-21 Bestac Advanced Material Co Ltd Method for making polishing pad
US8192249B2 (en) * 2009-03-12 2012-06-05 Hitachi Global Storage Technologies Netherlands, B.V. Systems and methods for polishing a magnetic disk
TWM367052U (en) 2009-04-24 2009-10-21 Bestac Advanced Material Co Ltd Polishing pad and polishing device
KR101352235B1 (ko) 2009-05-27 2014-01-15 로저스코포레이션 연마 패드, 이를 위한 폴리우레탄층, 및 규소 웨이퍼의 연마 방법
DE102009030297B3 (de) * 2009-06-24 2011-01-20 Siltronic Ag Verfahren zum Polieren einer Halbleiterscheibe
US9017140B2 (en) 2010-01-13 2015-04-28 Nexplanar Corporation CMP pad with local area transparency
TWI510328B (zh) * 2010-05-03 2015-12-01 Iv Technologies Co Ltd 基底層、包括此基底層的研磨墊及研磨方法
US9156124B2 (en) 2010-07-08 2015-10-13 Nexplanar Corporation Soft polishing pad for polishing a semiconductor substrate
TWI481470B (zh) * 2010-10-13 2015-04-21 San Fang Chemical Industry Co 吸附墊片及其製造方法
US8357446B2 (en) * 2010-11-12 2013-01-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Hollow polymeric-silicate composite
KR101602544B1 (ko) * 2010-11-18 2016-03-10 캐보트 마이크로일렉트로닉스 코포레이션 투과성 영역을 포함하는 연마 패드
US20120302148A1 (en) 2011-05-23 2012-11-29 Rajeev Bajaj Polishing pad with homogeneous body having discrete protrusions thereon
DE102011114750A1 (de) 2011-09-29 2013-04-04 Giesecke & Devrient Gmbh Verfahren zur Herstellung eines Mikrostrukturträgers
DE102011115125B4 (de) 2011-10-07 2021-10-07 Giesecke+Devrient Currency Technology Gmbh Herstellung einer mikrooptischen Darstellungsanordnung
US9067297B2 (en) * 2011-11-29 2015-06-30 Nexplanar Corporation Polishing pad with foundation layer and polishing surface layer
US9067298B2 (en) 2011-11-29 2015-06-30 Nexplanar Corporation Polishing pad with grooved foundation layer and polishing surface layer
SG10201508090WA (en) * 2011-11-29 2015-10-29 Nexplanar Corp Polishing pad with foundation layer and polishing surface layer
JP5893413B2 (ja) * 2012-01-17 2016-03-23 東洋ゴム工業株式会社 積層研磨パッドの製造方法
US10022842B2 (en) 2012-04-02 2018-07-17 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material
US11090778B2 (en) 2012-04-02 2021-08-17 Thomas West, Inc. Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US10722997B2 (en) * 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
US9156125B2 (en) 2012-04-11 2015-10-13 Cabot Microelectronics Corporation Polishing pad with light-stable light-transmitting region
US9597769B2 (en) * 2012-06-04 2017-03-21 Nexplanar Corporation Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer
JP2014113644A (ja) * 2012-12-06 2014-06-26 Toyo Tire & Rubber Co Ltd 研磨パッド
US9186772B2 (en) 2013-03-07 2015-11-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith
EP3036759A4 (en) * 2013-08-22 2017-05-31 Cabot Microelectronics Corporation Polishing pad with porous interface and solid core, and related apparatus and methods
TWI556910B (zh) * 2013-10-01 2016-11-11 三芳化學工業股份有限公司 複合硏磨墊及其製造方法
SG10201807026VA (en) * 2014-02-20 2018-09-27 Thomas West Inc Method and systems to control optical transmissivity of a polish pad material
CN106575613B (zh) * 2014-05-07 2019-12-17 嘉柏微电子材料股份公司 用于化学机械抛光的多层抛光垫
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
CN113579992A (zh) 2014-10-17 2021-11-02 应用材料公司 使用加成制造工艺的具复合材料特性的cmp衬垫建构
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
JP7066608B2 (ja) * 2015-09-25 2022-05-13 シーエムシー マテリアルズ,インコーポレイティド 化学機械的研磨パッド、基板を化学機械的に研磨する方法、及び化学機械的研磨パッドを製造する方法
CN105364731B (zh) * 2015-09-28 2020-11-03 沈阳市盛世磨料磨具有限公司 一种重负荷砂轮的加工方法
EP3362224B1 (en) * 2015-10-16 2024-08-14 Applied Materials, Inc. Method and apparatus for forming advanced polishing pads using an additive manufacturing process
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US10213894B2 (en) * 2016-02-26 2019-02-26 Applied Materials, Inc. Method of placing window in thin polishing pad
DE102016222063A1 (de) * 2016-11-10 2018-05-17 Siltronic Ag Verfahren zum beidseitigen Polieren einer Halbleiterscheibe
US11072050B2 (en) * 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
KR101924566B1 (ko) * 2017-09-04 2018-12-03 에스케이씨 주식회사 고단차 제거용 다층 연마패드
KR102718259B1 (ko) * 2019-07-23 2024-10-16 케이피엑스케미칼 주식회사 탄성 패드 및 그 제조 방법
JP7105334B2 (ja) * 2020-03-17 2022-07-22 エスケーシー ソルミックス カンパニー,リミテッド 研磨パッドおよびこれを用いた半導体素子の製造方法
JP2024525530A (ja) * 2021-07-06 2024-07-12 アプライド マテリアルズ インコーポレイテッド 化学機械研磨のための音響窓を含む研磨パッド
TR2021017346A2 (tr) 2021-11-08 2021-11-22 T C Erciyes Ueniversitesi Rezonans hasarlarini önleyen, öngeri̇lmesi̇z ve etri̇yesi̇z, yekpare, sürdürülebi̇li̇r beton travers
CN117381657B (zh) * 2023-10-30 2025-10-17 安徽禾臣新材料有限公司 一种高孔隙率高模量抛光层的抛光垫及其制备方法
CN118650542A (zh) * 2024-06-03 2024-09-17 陈湛 一种碳化硅抛光的方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001045900A1 (en) * 1999-12-23 2001-06-28 Rodel Holdings, Inc. Self-leveling pads and methods relating thereto
CN1316939A (zh) * 1998-07-10 2001-10-10 卡伯特微电子公司 半导体基材的抛光垫
US6328642B1 (en) * 1997-02-14 2001-12-11 Lam Research Corporation Integrated pad and belt for chemical mechanical polishing
CN1336861A (zh) * 1999-01-21 2002-02-20 罗德尔控股公司 改进的抛光垫及其抛光方法
US20020026752A1 (en) * 1996-09-11 2002-03-07 Minnesota Mining And Manufacturing Company Abrasive article and method of making
US20020115385A1 (en) * 2001-02-16 2002-08-22 Sudhanshu Misra Composite polishing pads for chemical-mechanical polishing
EP1306163A1 (en) * 2001-10-26 2003-05-02 JSR Corporation Window member for chemical mechanical polishing and polishing pad

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3504457A (en) * 1966-07-05 1970-04-07 Geoscience Instr Corp Polishing apparatus
US3581439A (en) * 1968-04-04 1971-06-01 Geoscience Instr Corp Buff apparatus and method of manufacturing buffs
US5257478A (en) * 1990-03-22 1993-11-02 Rodel, Inc. Apparatus for interlayer planarization of semiconductor material
US5196353A (en) 1992-01-03 1993-03-23 Micron Technology, Inc. Method for controlling a semiconductor (CMP) process by measuring a surface temperature and developing a thermal image of the wafer
US6614529B1 (en) 1992-12-28 2003-09-02 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US5658183A (en) 1993-08-25 1997-08-19 Micron Technology, Inc. System for real-time control of semiconductor wafer polishing including optical monitoring
US5433651A (en) 1993-12-22 1995-07-18 International Business Machines Corporation In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing
JP3270282B2 (ja) 1994-02-21 2002-04-02 株式会社東芝 半導体製造装置及び半導体装置の製造方法
US5489233A (en) 1994-04-08 1996-02-06 Rodel, Inc. Polishing pads and methods for their use
JP3313505B2 (ja) 1994-04-14 2002-08-12 株式会社日立製作所 研磨加工法
US5893796A (en) * 1995-03-28 1999-04-13 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US5964643A (en) 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
US5838447A (en) 1995-07-20 1998-11-17 Ebara Corporation Polishing apparatus including thickness or flatness detector
US5605760A (en) * 1995-08-21 1997-02-25 Rodel, Inc. Polishing pads
US5910846A (en) * 1996-05-16 1999-06-08 Micron Technology, Inc. Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers
US5872633A (en) 1996-07-26 1999-02-16 Speedfam Corporation Methods and apparatus for detecting removal of thin film layers during planarization
US5692950A (en) * 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6287185B1 (en) * 1997-04-04 2001-09-11 Rodel Holdings Inc. Polishing pads and methods relating thereto
AU7138198A (en) * 1997-04-18 1998-11-13 Cabot Corporation Polishing pad for a semiconductor substrate
US6108091A (en) * 1997-05-28 2000-08-22 Lam Research Corporation Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing
JP2000071167A (ja) * 1998-08-28 2000-03-07 Toray Ind Inc 研磨パッド
US6908374B2 (en) * 1998-12-01 2005-06-21 Nutool, Inc. Chemical mechanical polishing endpoint detection
US6089963A (en) * 1999-03-18 2000-07-18 Inland Diamond Products Company Attachment system for lens surfacing pad
EP1176630B1 (en) * 1999-03-31 2007-06-27 Nikon Corporation Polishing body, polisher, method for adjusting polisher, method for measuring thickness of polished film or end point of polishing, method for producing semiconductor device
US6224460B1 (en) * 1999-06-30 2001-05-01 Vlsi Technology, Inc. Laser interferometry endpoint detection with windowless polishing pad for chemical mechanical polishing process
US6171181B1 (en) * 1999-08-17 2001-01-09 Rodel Holdings, Inc. Molded polishing pad having integral window
US6524164B1 (en) * 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US6358130B1 (en) * 1999-09-29 2002-03-19 Rodel Holdings, Inc. Polishing pad
JP2001162510A (ja) * 1999-09-30 2001-06-19 Hoya Corp 研磨方法並びに磁気記録媒体用ガラス基板の製造方法及び磁気記録媒体の製造方法
DE10004578C1 (de) * 2000-02-03 2001-07-26 Wacker Siltronic Halbleitermat Verfahren zur Herstellung einer Halbleiterscheibe mit polierter Kante
JP2001319901A (ja) * 2000-05-08 2001-11-16 Nikon Corp 研磨パッド、化学機械研磨装置、基板表面の平坦化方法、及び半導体デバイス製造方法
US6428386B1 (en) 2000-06-16 2002-08-06 Micron Technology, Inc. Planarizing pads, planarizing machines, and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies
JP2002001647A (ja) * 2000-06-19 2002-01-08 Rodel Nitta Co 研磨パッド
JP3788729B2 (ja) * 2000-08-23 2006-06-21 東洋ゴム工業株式会社 研磨パッド
JP2002124496A (ja) * 2000-10-18 2002-04-26 Hitachi Ltd 研磨加工の終点検出計測方法及びその装置、並びにそれを用いた半導体デバイスの製造方法及びその製造装置
JP2002170799A (ja) * 2000-11-30 2002-06-14 Nikon Corp 測定装置、研磨状況モニタ装置、研磨装置、半導体デバイス製造方法、並びに半導体デバイス
JP2002178257A (ja) * 2000-12-12 2002-06-25 Nikon Corp 研磨面観測装置及び研磨装置
US6632129B2 (en) * 2001-02-15 2003-10-14 3M Innovative Properties Company Fixed abrasive article for use in modifying a semiconductor wafer
US6722249B2 (en) * 2001-11-06 2004-04-20 Rodel Holdings, Inc Method of fabricating a polishing pad having an optical window
JP2003220550A (ja) * 2002-01-24 2003-08-05 Sumitomo Bakelite Co Ltd 研磨用パッドおよびその製造方法
US6524176B1 (en) * 2002-03-25 2003-02-25 Macronix International Co. Ltd. Polishing pad
US6913517B2 (en) * 2002-05-23 2005-07-05 Cabot Microelectronics Corporation Microporous polishing pads
KR100465649B1 (ko) * 2002-09-17 2005-01-13 한국포리올 주식회사 일체형 연마 패드 및 그 제조 방법
JP2005001083A (ja) * 2003-06-13 2005-01-06 Sumitomo Bakelite Co Ltd 研磨用積層体および研磨方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020026752A1 (en) * 1996-09-11 2002-03-07 Minnesota Mining And Manufacturing Company Abrasive article and method of making
US6328642B1 (en) * 1997-02-14 2001-12-11 Lam Research Corporation Integrated pad and belt for chemical mechanical polishing
CN1316939A (zh) * 1998-07-10 2001-10-10 卡伯特微电子公司 半导体基材的抛光垫
CN1336861A (zh) * 1999-01-21 2002-02-20 罗德尔控股公司 改进的抛光垫及其抛光方法
WO2001045900A1 (en) * 1999-12-23 2001-06-28 Rodel Holdings, Inc. Self-leveling pads and methods relating thereto
US20020115385A1 (en) * 2001-02-16 2002-08-22 Sudhanshu Misra Composite polishing pads for chemical-mechanical polishing
EP1306163A1 (en) * 2001-10-26 2003-05-02 JSR Corporation Window member for chemical mechanical polishing and polishing pad

Also Published As

Publication number Publication date
JP2006527923A (ja) 2006-12-07
EP2025469A1 (en) 2009-02-18
ATE416881T1 (de) 2008-12-15
EP2025469B1 (en) 2013-05-01
TW200513348A (en) 2005-04-16
EP1651388B1 (en) 2008-12-10
SG149719A1 (en) 2009-02-27
DE602004018321D1 (de) 2009-01-22
KR101109367B1 (ko) 2012-01-31
CN1805826A (zh) 2006-07-19
TWI295949B (en) 2008-04-21
US6884156B2 (en) 2005-04-26
WO2005000527A3 (en) 2005-06-02
EP1651388A2 (en) 2006-05-03
KR20060023562A (ko) 2006-03-14
US20040259484A1 (en) 2004-12-23
MY134466A (en) 2007-12-31
WO2005000527A2 (en) 2005-01-06
JP5090732B2 (ja) 2012-12-05

Similar Documents

Publication Publication Date Title
CN100591483C (zh) 用于化学机械抛光的多层抛光垫材料
KR101281982B1 (ko) Cmp용 다층 연마 패드 재료
JP4991294B2 (ja) 引っ込んだ窓を有する研磨パッド
TWI411495B (zh) 拋光墊
KR101195276B1 (ko) 소수성 영역 및 종말점 검출구를 포함하는 연마 패드
JP4908207B2 (ja) 光透過領域を有する研磨パッドを製造するための超音波溶接法
KR100986935B1 (ko) 낮은 표면 에너지 cmp 패드
JP2007531276A (ja) 成分を満たした複数の孔を有するcmp多孔質パッド
KR102440303B1 (ko) Cmp용 다층 연마 패드

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: Illinois, USA

Patentee after: CMC Materials Co.,Ltd.

Address before: Illinois, USA

Patentee before: CABOT MICROELECTRONICS Corp.

CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: Illinois, USA

Patentee after: CMC Materials Co.,Ltd.

Address before: Illinois, USA

Patentee before: CMC Materials Co.,Ltd.

CP01 Change in the name or title of a patent holder
CX01 Expiry of patent term

Granted publication date: 20100224

CX01 Expiry of patent term