CN100507719C - 曝光装置和器件制造方法 - Google Patents

曝光装置和器件制造方法 Download PDF

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Publication number
CN100507719C
CN100507719C CNB2004100817502A CN200410081750A CN100507719C CN 100507719 C CN100507719 C CN 100507719C CN B2004100817502 A CNB2004100817502 A CN B2004100817502A CN 200410081750 A CN200410081750 A CN 200410081750A CN 100507719 C CN100507719 C CN 100507719C
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CN
China
Prior art keywords
substrate
temperature
liquid
temperature adjustment
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2004100817502A
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English (en)
Chinese (zh)
Other versions
CN1637610A (zh
Inventor
時田俊伸
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Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1637610A publication Critical patent/CN1637610A/zh
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Publication of CN100507719C publication Critical patent/CN100507719C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B61—RAILWAYS
    • B61D—BODY DETAILS OR KINDS OF RAILWAY VEHICLES
    • B61D27/00—Heating, cooling, ventilating, or air-conditioning
    • B61D27/0018—Air-conditioning means, i.e. combining at least two of the following ways of treating or supplying air, namely heating, cooling or ventilating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
    • B60H1/00—Heating, cooling or ventilating [HVAC] devices
    • B60H1/00507—Details, e.g. mounting arrangements, desaeration devices
    • B60H1/00585—Means for monitoring, testing or servicing the air-conditioning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
    • B60H1/00—Heating, cooling or ventilating [HVAC] devices
    • B60H1/00642—Control systems or circuits; Control members or indication devices for heating, cooling or ventilating devices
    • B60H1/00985—Control systems or circuits characterised by display or indicating devices, e.g. voice simulators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60Y—INDEXING SCHEME RELATING TO ASPECTS CROSS-CUTTING VEHICLE TECHNOLOGY
    • B60Y2200/00—Type of vehicle
    • B60Y2200/30—Railway vehicles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T30/00—Transportation of goods or passengers via railways, e.g. energy recovery or reducing air resistance

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
CNB2004100817502A 2004-01-07 2004-12-28 曝光装置和器件制造方法 Expired - Fee Related CN100507719C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004002058A JP4429023B2 (ja) 2004-01-07 2004-01-07 露光装置及びデバイス製造方法
JP2004002058 2004-01-07

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CNA2008101733911A Division CN101408734A (zh) 2004-01-07 2004-12-28 曝光装置和器件制造方法

Publications (2)

Publication Number Publication Date
CN1637610A CN1637610A (zh) 2005-07-13
CN100507719C true CN100507719C (zh) 2009-07-01

Family

ID=34709026

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB2004100817502A Expired - Fee Related CN100507719C (zh) 2004-01-07 2004-12-28 曝光装置和器件制造方法
CNA2008101733911A Pending CN101408734A (zh) 2004-01-07 2004-12-28 曝光装置和器件制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNA2008101733911A Pending CN101408734A (zh) 2004-01-07 2004-12-28 曝光装置和器件制造方法

Country Status (5)

Country Link
US (1) US7528930B2 (enExample)
JP (1) JP4429023B2 (enExample)
KR (2) KR100717689B1 (enExample)
CN (2) CN100507719C (enExample)
TW (1) TWI308673B (enExample)

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CN1637610A (zh) 2005-07-13
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