KR100717689B1 - 노광장치 및 디바이스제조방법 - Google Patents

노광장치 및 디바이스제조방법 Download PDF

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Publication number
KR100717689B1
KR100717689B1 KR1020050001019A KR20050001019A KR100717689B1 KR 100717689 B1 KR100717689 B1 KR 100717689B1 KR 1020050001019 A KR1020050001019 A KR 1020050001019A KR 20050001019 A KR20050001019 A KR 20050001019A KR 100717689 B1 KR100717689 B1 KR 100717689B1
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South Korea
Prior art keywords
temperature
substrate
liquid
optical system
exposure apparatus
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Expired - Fee Related
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KR1020050001019A
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English (en)
Korean (ko)
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KR20050072685A (ko
Inventor
도키타도시노부
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20050072685A publication Critical patent/KR20050072685A/ko
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Publication of KR100717689B1 publication Critical patent/KR100717689B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
KR1020050001019A 2004-01-07 2005-01-06 노광장치 및 디바이스제조방법 Expired - Fee Related KR100717689B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004002058A JP4429023B2 (ja) 2004-01-07 2004-01-07 露光装置及びデバイス製造方法
JPJP-P-2004-00002058 2004-01-07

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020070021718A Division KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Publications (2)

Publication Number Publication Date
KR20050072685A KR20050072685A (ko) 2005-07-12
KR100717689B1 true KR100717689B1 (ko) 2007-05-11

Family

ID=34709026

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020050001019A Expired - Fee Related KR100717689B1 (ko) 2004-01-07 2005-01-06 노광장치 및 디바이스제조방법
KR1020070021718A Expired - Fee Related KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020070021718A Expired - Fee Related KR100727516B1 (ko) 2004-01-07 2007-03-06 노광장치 및 디바이스 제조방법

Country Status (5)

Country Link
US (1) US7528930B2 (enExample)
JP (1) JP4429023B2 (enExample)
KR (2) KR100717689B1 (enExample)
CN (2) CN101408734A (enExample)
TW (1) TWI308673B (enExample)

Families Citing this family (162)

* Cited by examiner, † Cited by third party
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TWI308673B (en) 2009-04-11
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