JP2005197447A - 露光装置及びデバイス製造方法 - Google Patents
露光装置及びデバイス製造方法 Download PDFInfo
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- JP2005197447A JP2005197447A JP2004002058A JP2004002058A JP2005197447A JP 2005197447 A JP2005197447 A JP 2005197447A JP 2004002058 A JP2004002058 A JP 2004002058A JP 2004002058 A JP2004002058 A JP 2004002058A JP 2005197447 A JP2005197447 A JP 2005197447A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B61—RAILWAYS
- B61D—BODY DETAILS OR KINDS OF RAILWAY VEHICLES
- B61D27/00—Heating, cooling, ventilating, or air-conditioning
- B61D27/0018—Air-conditioning means, i.e. combining at least two of the following ways of treating or supplying air, namely heating, cooling or ventilating
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
- B60H1/00—Heating, cooling or ventilating [HVAC] devices
- B60H1/00507—Details, e.g. mounting arrangements, desaeration devices
- B60H1/00585—Means for monitoring, testing or servicing the air-conditioning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
- B60H1/00—Heating, cooling or ventilating [HVAC] devices
- B60H1/00642—Control systems or circuits; Control members or indication devices for heating, cooling or ventilating devices
- B60H1/00985—Control systems or circuits characterised by display or indicating devices, e.g. voice simulators
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60Y—INDEXING SCHEME RELATING TO ASPECTS CROSS-CUTTING VEHICLE TECHNOLOGY
- B60Y2200/00—Type of vehicle
- B60Y2200/30—Railway vehicles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T30/00—Transportation of goods or passengers via railways, e.g. energy recovery or reducing air resistance
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Abstract
【解決手段】 レチクルのパターンを基板に投影する投影光学系を備え、前記投影光学系の最も前記基板側に配置された光学素子と前記基板との間に充填された液体を介して前記基板を露光する露光装置において、前記光学素子の温度の調整を行うことによって、前記液体の温度を調整する温度調整装置を有することを特徴とする構成とした。
【選択図】 図1
Description
2 基板チャック
2a ピン
2b 水路
3 基板ステージ
4 ステージ定盤
5 投影光学系
5a 最終レンズ
5b 支持部
6 液体
7 液体ノズル
8 温度調整装置
8a 温度調整管
9 制御部
Claims (13)
- レチクルのパターンを基板に投影する投影光学系を備え、前記投影光学系の最も前記基板側に配置された光学素子と前記基板との間に充填された液体を介して前記基板を露光する露光装置において、
前記光学素子の温度の調整を行うことによって、前記液体の温度を調整する温度調整装置を有することを特徴とする露光装置。 - 前記光学素子を支持する支持部材を有し、
前記温度調整装置は、前記支持部材が持つ流路に、温度を調整した流体を供給することを特徴とする請求項1記載の露光装置。 - 前記支持部材が持つ流路は、該支持部材の周囲及び/又は該支持部材の内部に設けられていることを特徴とする請求項2記載の露光装置。
- 前記温度調整装置は、前記光学素子に、温度を調整した流体を吹き付けることを特徴とする請求項1記載の露光装置。
- 前記温度調整装置は、露光位置情報に基づいて、前記流体の温度を調整することを特徴とする請求項2〜4のいずれか一項記載の露光装置。
- 前記温度調整装置は、露光光照射情報に基づいて、前記流体の温度を調整することを特徴とする請求項2〜5のいずれか一項記載の露光装置。
- 前記基板を保持する保持部材が持つ流路に、温度を調整した流体を供給する温度調整装置を更に有することを特徴とする請求項1記載の露光装置。
- レチクルのパターンを基板に投影する投影光学系と前記基板を保持する保持部材とを備え、前記投影光学系と前記基板との間に充填された液体を介して前記基板を露光する露光装置において、
前記保持部材が持つ流路に、温度を調整した流体を供給する温度調整装置を有することを特徴とする露光装置。 - 前記流路は、複数の分割した流路を有することを特徴とする請求項8記載の露光装置。
- 前記温度調整装置は、前記複数の分割した流路の夫々を流れる前記流体の温度を独立に調整することを特徴とする請求項9記載の露光装置。
- 前記温度調整装置は、露光位置情報に基づいて、前記複数の分割した流路毎にその流路を流れる前記流体の温度を調整することを特徴とする請求項9又は10記載の露光装置。
- 前記流体は、水、ヘリウム、窒素のいずれかであることを特徴とする請求項2〜11のいずれか一項記載の露光装置。
- 請求項1〜12のいずれか一項記載の露光装置を用いて基板を露光するステップと、該露光された基板を現像するステップとを有することを特徴とするデバイス製造方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
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JP2004002058A JP4429023B2 (ja) | 2004-01-07 | 2004-01-07 | 露光装置及びデバイス製造方法 |
CNB2004100817502A CN100507719C (zh) | 2004-01-07 | 2004-12-28 | 曝光装置和器件制造方法 |
CNA2008101733911A CN101408734A (zh) | 2004-01-07 | 2004-12-28 | 曝光装置和器件制造方法 |
TW094100087A TWI308673B (en) | 2004-01-07 | 2005-01-03 | Exposure apparatus and device manufacturing method |
US11/029,674 US7528930B2 (en) | 2004-01-07 | 2005-01-04 | Exposure apparatus and device manufacturing method |
KR1020050001019A KR100717689B1 (ko) | 2004-01-07 | 2005-01-06 | 노광장치 및 디바이스제조방법 |
KR1020070021718A KR100727516B1 (ko) | 2004-01-07 | 2007-03-06 | 노광장치 및 디바이스 제조방법 |
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JP2004002058A JP4429023B2 (ja) | 2004-01-07 | 2004-01-07 | 露光装置及びデバイス製造方法 |
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JP2009262064A Division JP2010034605A (ja) | 2009-11-17 | 2009-11-17 | 露光装置及びデバイス製造方法 |
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JP2005197447A true JP2005197447A (ja) | 2005-07-21 |
JP2005197447A5 JP2005197447A5 (ja) | 2009-09-17 |
JP4429023B2 JP4429023B2 (ja) | 2010-03-10 |
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US (1) | US7528930B2 (ja) |
JP (1) | JP4429023B2 (ja) |
KR (2) | KR100717689B1 (ja) |
CN (2) | CN100507719C (ja) |
TW (1) | TWI308673B (ja) |
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JP2007005571A (ja) * | 2005-06-24 | 2007-01-11 | Nikon Corp | 露光装置及びデバイス製造方法 |
WO2007066692A1 (ja) * | 2005-12-06 | 2007-06-14 | Nikon Corporation | 露光方法、露光装置、及びデバイス製造方法 |
JP2007147988A (ja) * | 2005-11-28 | 2007-06-14 | Nikon Corp | 液浸観察方法、液浸顕微鏡装置、及び検査装置 |
JP2007519238A (ja) * | 2004-01-20 | 2007-07-12 | カール・ツアイス・エスエムテイ・アーゲー | マイクロリソグラフィ投影露光装置および投影レンズのための測定装置 |
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Also Published As
Publication number | Publication date |
---|---|
US20050146694A1 (en) | 2005-07-07 |
CN101408734A (zh) | 2009-04-15 |
TW200527162A (en) | 2005-08-16 |
JP4429023B2 (ja) | 2010-03-10 |
TWI308673B (en) | 2009-04-11 |
KR20070039894A (ko) | 2007-04-13 |
KR100727516B1 (ko) | 2007-06-14 |
CN1637610A (zh) | 2005-07-13 |
CN100507719C (zh) | 2009-07-01 |
KR100717689B1 (ko) | 2007-05-11 |
US7528930B2 (en) | 2009-05-05 |
KR20050072685A (ko) | 2005-07-12 |
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