CN100362619C - 真空反应室的射频匹配耦合网络及其配置方法 - Google Patents
真空反应室的射频匹配耦合网络及其配置方法 Download PDFInfo
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- CN100362619C CN100362619C CNB2005100285647A CN200510028564A CN100362619C CN 100362619 C CN100362619 C CN 100362619C CN B2005100285647 A CNB2005100285647 A CN B2005100285647A CN 200510028564 A CN200510028564 A CN 200510028564A CN 100362619 C CN100362619 C CN 100362619C
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- frequency
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
- H03H7/40—Automatic matching of load impedance to source impedance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
Description
Claims (26)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2005100285647A CN100362619C (zh) | 2005-08-05 | 2005-08-05 | 真空反应室的射频匹配耦合网络及其配置方法 |
US11/350,022 US7868556B2 (en) | 2005-08-05 | 2006-02-08 | RF matching network of a vacuum processing chamber and corresponding configuration methods |
JP2006213916A JP2007080811A (ja) | 2005-08-05 | 2006-08-04 | 真空反応室のrfマッチングネットワーク及びその配置方法 |
US12/987,538 US8334657B2 (en) | 2005-08-05 | 2011-01-10 | RF matching network of a vacuum processing chamber and corresponding configuration methods |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2005100285647A CN100362619C (zh) | 2005-08-05 | 2005-08-05 | 真空反应室的射频匹配耦合网络及其配置方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1909184A CN1909184A (zh) | 2007-02-07 |
CN100362619C true CN100362619C (zh) | 2008-01-16 |
Family
ID=37700237
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CNB2005100285647A Active CN100362619C (zh) | 2005-08-05 | 2005-08-05 | 真空反应室的射频匹配耦合网络及其配置方法 |
Country Status (3)
Country | Link |
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US (2) | US7868556B2 (zh) |
JP (1) | JP2007080811A (zh) |
CN (1) | CN100362619C (zh) |
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CN103648230A (zh) * | 2010-03-23 | 2014-03-19 | 中微半导体设备(上海)有限公司 | 可切换的射频功率源系统 |
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- 2006-08-04 JP JP2006213916A patent/JP2007080811A/ja active Pending
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US6897155B2 (en) * | 2002-08-14 | 2005-05-24 | Applied Materials, Inc. | Method for etching high-aspect-ratio features |
CN1495283A (zh) * | 2002-09-10 | 2004-05-12 | ��ʽ���簮������� | 匹配箱、使用匹配箱的真空装置及真空处理方法 |
US20050039682A1 (en) * | 2003-08-22 | 2005-02-24 | Raj Dhindsa | Multiple frequency plasma etch reactor |
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US20070030091A1 (en) | 2007-02-08 |
US7868556B2 (en) | 2011-01-11 |
US8334657B2 (en) | 2012-12-18 |
JP2007080811A (ja) | 2007-03-29 |
CN1909184A (zh) | 2007-02-07 |
US20110309748A1 (en) | 2011-12-22 |
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