BRPI0511437B1 - anodo para evolução de oxigênio, método para sua produção e processo eletroquímico - Google Patents
anodo para evolução de oxigênio, método para sua produção e processo eletroquímico Download PDFInfo
- Publication number
- BRPI0511437B1 BRPI0511437B1 BRPI0511437A BRPI0511437A BRPI0511437B1 BR PI0511437 B1 BRPI0511437 B1 BR PI0511437B1 BR PI0511437 A BRPI0511437 A BR PI0511437A BR PI0511437 A BRPI0511437 A BR PI0511437A BR PI0511437 B1 BRPI0511437 B1 BR PI0511437B1
- Authority
- BR
- Brazil
- Prior art keywords
- layer
- anode
- titanium
- substrate
- copper
- Prior art date
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 26
- 239000001301 oxygen Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000010936 titanium Substances 0.000 claims abstract description 18
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 16
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- 239000010949 copper Substances 0.000 claims abstract description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052718 tin Inorganic materials 0.000 claims abstract description 10
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 7
- 238000011282 treatment Methods 0.000 claims abstract description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 5
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 12
- 229910052787 antimony Inorganic materials 0.000 claims description 8
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 8
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 6
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 6
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- 230000001680 brushing effect Effects 0.000 claims description 4
- 238000005554 pickling Methods 0.000 claims description 4
- 238000005488 sandblasting Methods 0.000 claims description 4
- 230000008030 elimination Effects 0.000 claims description 3
- 238000003379 elimination reaction Methods 0.000 claims description 3
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 2
- 238000005422 blasting Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000003643 water by type Substances 0.000 claims description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 claims 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical class Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims 1
- 239000008235 industrial water Substances 0.000 claims 1
- 239000004576 sand Substances 0.000 claims 1
- 229910000510 noble metal Inorganic materials 0.000 abstract description 6
- 230000001681 protective effect Effects 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 229910000476 molybdenum oxide Inorganic materials 0.000 abstract 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical class [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 abstract 1
- 238000010992 reflux Methods 0.000 abstract 1
- 239000011135 tin Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 26
- 239000000243 solution Substances 0.000 description 6
- 239000002243 precursor Substances 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 4
- 229910000410 antimony oxide Inorganic materials 0.000 description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 4
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical class [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- JFZXRCRTVWIYCM-UHFFFAOYSA-N [Cl].[Cl].[Cl].[Cl].[Cl].[Cl].[Pt] Chemical group [Cl].[Cl].[Cl].[Cl].[Cl].[Cl].[Pt] JFZXRCRTVWIYCM-UHFFFAOYSA-N 0.000 description 1
- YJZATOSJMRIRIW-UHFFFAOYSA-N [Ir]=O Chemical class [Ir]=O YJZATOSJMRIRIW-UHFFFAOYSA-N 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical class [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- -1 platinum hexachlorobromic acid Chemical compound 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
- C25B1/04—Hydrogen or oxygen by electrolysis of water
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Metals (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Prevention Of Electric Corrosion (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT001006A ITMI20041006A1 (it) | 2004-05-20 | 2004-05-20 | Anodo per sviluppo ossigeno |
| PCT/EP2005/005453 WO2005113861A1 (en) | 2004-05-20 | 2005-05-19 | Anode for oxygen evolution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BRPI0511437A BRPI0511437A (pt) | 2007-12-26 |
| BRPI0511437B1 true BRPI0511437B1 (pt) | 2016-06-14 |
Family
ID=34968743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0511437A BRPI0511437B1 (pt) | 2004-05-20 | 2005-05-19 | anodo para evolução de oxigênio, método para sua produção e processo eletroquímico |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US8083921B2 (enExample) |
| EP (1) | EP1756333B1 (enExample) |
| JP (1) | JP5059605B2 (enExample) |
| KR (1) | KR101201689B1 (enExample) |
| CN (1) | CN1957112B (enExample) |
| AU (1) | AU2005245599B2 (enExample) |
| BR (1) | BRPI0511437B1 (enExample) |
| ES (1) | ES2581210T3 (enExample) |
| IT (1) | ITMI20041006A1 (enExample) |
| MX (1) | MXPA06013444A (enExample) |
| MY (1) | MY142728A (enExample) |
| RU (1) | RU2388850C2 (enExample) |
| TW (1) | TWI265214B (enExample) |
| WO (1) | WO2005113861A1 (enExample) |
| ZA (1) | ZA200609264B (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20061947A1 (it) * | 2006-10-11 | 2008-04-12 | Industrie De Nora Spa | Catodo per processi elettrolitici |
| CN100412233C (zh) * | 2006-10-13 | 2008-08-20 | 扬州大学 | 一种电化学氧化处理含苯酚废水的工艺方法 |
| JP2010095764A (ja) * | 2008-10-16 | 2010-04-30 | Japan Carlit Co Ltd:The | 電解用電極及びその製造方法 |
| CN103119017B (zh) | 2010-09-24 | 2015-07-08 | 挪威船级社 | 用于二氧化碳的电化学还原的方法和装置 |
| CN102320683B (zh) * | 2011-06-03 | 2013-03-06 | 大连海事大学 | 钛基锡锑铂氧化物电极材料及其制备方法 |
| ITMI20111132A1 (it) * | 2011-06-22 | 2012-12-23 | Industrie De Nora Spa | Anodo per evoluzione di ossigeno |
| ITMI20122035A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
| RU2577402C1 (ru) * | 2014-09-30 | 2016-03-20 | Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" | Анод для выделения кислорода и способ его изготовления |
| CN105154913B (zh) * | 2015-07-02 | 2017-05-31 | 北京师范大学 | 一种水处理用电催化电极中层的制备方法 |
| CN108299868A (zh) * | 2016-08-25 | 2018-07-20 | 先丰通讯股份有限公司 | 触媒涂料及使用其的阳极 |
| US11668017B2 (en) * | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| CN109868464A (zh) * | 2019-03-11 | 2019-06-11 | 江阴安诺电极有限公司 | 具有贵金属涂层的阳极板 |
| JP2020153000A (ja) * | 2019-03-22 | 2020-09-24 | 株式会社豊田中央研究所 | 電気化学反応デバイス |
| CN114272920B (zh) * | 2021-11-22 | 2023-10-03 | 广东省科学院资源利用与稀土开发研究所 | 一种有机污染物降解用复合氧化物涂层电极及其制备方法 |
| CN114351179A (zh) * | 2021-12-02 | 2022-04-15 | 江苏友诺环保科技有限公司 | 一种具有中间层的铱钽锰涂层钛阳极板及其制备方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2596776B1 (fr) * | 1986-04-03 | 1988-06-03 | Atochem | Cathode pour electrolyse et un procede de fabrication de ladite cathode |
| JPS62284095A (ja) * | 1986-06-02 | 1987-12-09 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
| JP2574699B2 (ja) * | 1989-04-21 | 1997-01-22 | ダイソー 株式会社 | 酸素発生陽極及びその製法 |
| AT397436B (de) * | 1990-07-26 | 1994-04-25 | Avl Verbrennungskraft Messtech | Anode einer elektrochemischen sensoranordnung und verfahren zu deren herstellung |
| CA2061390A1 (en) * | 1991-03-01 | 1992-09-02 | Oronzio De Nora | Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes |
| JP3212327B2 (ja) * | 1991-08-30 | 2001-09-25 | ペルメレック電極株式会社 | 電解用電極 |
| NL9101753A (nl) * | 1991-10-21 | 1993-05-17 | Magneto Chemie Bv | Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging. |
| JP3236653B2 (ja) * | 1992-02-25 | 2001-12-10 | ペルメレック電極株式会社 | 電解用電極 |
| LU88516A1 (de) * | 1993-07-21 | 1996-02-01 | Furukawa Electric Co Ltd | Sauerstoff erzeugende Elektrode und Verfahren dieselbe herzustellen |
| RU2069239C1 (ru) * | 1994-02-08 | 1996-11-20 | Научно-исследовательский физико-технический институт при Дальневосточном государственном университете | Способ изготовления электрода для электрохимических процессов |
| JP2925938B2 (ja) * | 1994-04-04 | 1999-07-28 | 古河電気工業株式会社 | 酸素発生用電極とその製造方法 |
| JPH11221570A (ja) * | 1998-02-05 | 1999-08-17 | Matsushita Electric Ind Co Ltd | 有機汚水の分解電極及びそれを用いた有機汚水の分解方法、及びそれを用いた有機汚水の分解装置 |
| JP2931812B1 (ja) * | 1998-04-24 | 1999-08-09 | ティーディーケイ株式会社 | 電解用電極およびその製造方法 |
| US7247229B2 (en) * | 1999-06-28 | 2007-07-24 | Eltech Systems Corporation | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
| IL151415A0 (en) * | 2000-02-25 | 2003-04-10 | Lattice Energy L L C | Electrical cells, components and methods |
| ITMI20020535A1 (it) | 2002-03-14 | 2003-09-15 | De Nora Elettrodi Spa | Anodo per sviluppo di ossigeno e relativo substrato |
| ITMI20021128A1 (it) * | 2002-05-24 | 2003-11-24 | De Nora Elettrodi Spa | Elettrodo per sviluppo di gas e metodo per il suo ottenimento |
-
2004
- 2004-05-20 IT IT001006A patent/ITMI20041006A1/it unknown
-
2005
- 2005-05-13 TW TW094115470A patent/TWI265214B/zh not_active IP Right Cessation
- 2005-05-17 MY MYPI20052225A patent/MY142728A/en unknown
- 2005-05-19 ZA ZA200609264A patent/ZA200609264B/en unknown
- 2005-05-19 ES ES05745776.4T patent/ES2581210T3/es not_active Expired - Lifetime
- 2005-05-19 JP JP2007517088A patent/JP5059605B2/ja not_active Expired - Lifetime
- 2005-05-19 US US11/587,842 patent/US8083921B2/en active Active
- 2005-05-19 EP EP05745776.4A patent/EP1756333B1/en not_active Expired - Lifetime
- 2005-05-19 CN CN2005800161445A patent/CN1957112B/zh not_active Expired - Lifetime
- 2005-05-19 AU AU2005245599A patent/AU2005245599B2/en not_active Ceased
- 2005-05-19 KR KR1020067024281A patent/KR101201689B1/ko not_active Expired - Fee Related
- 2005-05-19 WO PCT/EP2005/005453 patent/WO2005113861A1/en not_active Ceased
- 2005-05-19 BR BRPI0511437A patent/BRPI0511437B1/pt not_active IP Right Cessation
- 2005-05-19 MX MXPA06013444A patent/MXPA06013444A/es active IP Right Grant
- 2005-05-19 RU RU2006145304/15A patent/RU2388850C2/ru not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2005245599A1 (en) | 2005-12-01 |
| EP1756333A1 (en) | 2007-02-28 |
| ES2581210T3 (es) | 2016-09-02 |
| JP5059605B2 (ja) | 2012-10-24 |
| CN1957112B (zh) | 2011-01-12 |
| RU2006145304A (ru) | 2008-06-27 |
| EP1756333B1 (en) | 2016-04-06 |
| TWI265214B (en) | 2006-11-01 |
| ZA200609264B (en) | 2008-05-28 |
| US8083921B2 (en) | 2011-12-27 |
| RU2388850C2 (ru) | 2010-05-10 |
| MXPA06013444A (es) | 2007-03-01 |
| KR20070012721A (ko) | 2007-01-26 |
| MY142728A (en) | 2010-12-31 |
| TW200540297A (en) | 2005-12-16 |
| US20080023341A1 (en) | 2008-01-31 |
| WO2005113861A1 (en) | 2005-12-01 |
| JP2007538152A (ja) | 2007-12-27 |
| CN1957112A (zh) | 2007-05-02 |
| KR101201689B1 (ko) | 2012-11-15 |
| AU2005245599B2 (en) | 2009-12-17 |
| ITMI20041006A1 (it) | 2004-08-20 |
| BRPI0511437A (pt) | 2007-12-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| BRPI0511437B1 (pt) | anodo para evolução de oxigênio, método para sua produção e processo eletroquímico | |
| BRPI1107135A2 (pt) | eletrodo de àxido de metal misturado de méltiplas camadas e mÉtodo para produÇço dos mesmos | |
| JPH03193889A (ja) | 酸素発生用電極及びその製造方法 | |
| EP0243302A1 (en) | An electrode with a platinum metal catalyst in surface film and its use | |
| US3684543A (en) | Recoating of electrodes | |
| BR112012031909B1 (pt) | eletrodo para célula eletrolítica, método para a produção de um eletrodo e célula eletroquímica para a produção de hipoclorito de metal alcalino | |
| US4297195A (en) | Electrode for use in electrolysis and process for production thereof | |
| ITMI20102193A1 (it) | Anodo per evoluzione elettrolitica di cloro | |
| BR112017008387B1 (pt) | Eletrodo para uso em células de eletrocloração, método para a produção de um eletrodo, e processo de tratamento biocida sobre uma solução aquosa de cloreto de sódio | |
| PT1507899E (pt) | Electrodo para o desenvolvimento de gas e metodo para a sua produção | |
| JP2007538152A5 (enExample) | ||
| BR112015012134B1 (pt) | Eletrodo adequado para evolução de oxigênio em processos eletrolíticos, método para a fabricação de um eletrodo, e processo de eletrodeposição catódica de metais a partir de uma solução aquosa | |
| RU2689985C2 (ru) | Каталитическое покрытие и способ его изготовления | |
| FI63604B (fi) | Stabil elektrod foer elektrokemiska tillaempningar | |
| JPH0689470B2 (ja) | 造膜性金属基材とルテニウムを含有する触媒的酸化物被覆とより成る酸素発生陽極の製造 | |
| CN104005047A (zh) | 新型的电解低温海水防污用混合金属氧化物电极 | |
| US3763002A (en) | Method of forming protective coatings by electrolysis | |
| KR890003514B1 (ko) | 전해용 음극과 그 제조방법 | |
| JPH0343353B2 (enExample) | ||
| IT202000031802A1 (it) | Electrolyser for electrochlorination processes and a self-cleaning electrochlorination system elettrolizzatore per processi di elettroclorazione e sistema di elettroclorazione autopulente | |
| PT96360B (pt) | Electrodos metalicos para processos electromecanicos | |
| JP3497707B2 (ja) | 防食用電極及びその使用方法 | |
| JPH11335887A (ja) | 高耐久性電極の製造方法 | |
| BR112020016427B1 (pt) | Eletrodo para processos de eletrocloração | |
| JPH02145788A (ja) | 撥水性電極 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B25A | Requested transfer of rights approved |
Owner name: INDUSTRIE DE NORA S.P.A (IT) |
|
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 14/06/2016, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 15A ANUIDADE. |
|
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: REFERENTE AO DESPACHO 21.6 PUBLICADO NA RPI 2567 DE 2020-03-17 |