CN1957112B - 用于氧气析出的阳极 - Google Patents

用于氧气析出的阳极 Download PDF

Info

Publication number
CN1957112B
CN1957112B CN2005800161445A CN200580016144A CN1957112B CN 1957112 B CN1957112 B CN 1957112B CN 2005800161445 A CN2005800161445 A CN 2005800161445A CN 200580016144 A CN200580016144 A CN 200580016144A CN 1957112 B CN1957112 B CN 1957112B
Authority
CN
China
Prior art keywords
middle layer
anode
titanium
base material
skin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2005800161445A
Other languages
English (en)
Other versions
CN1957112A (zh
Inventor
P·罗西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Industrie de Nora SpA
Original Assignee
De Nora Elettrodi SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Nora Elettrodi SpA filed Critical De Nora Elettrodi SpA
Publication of CN1957112A publication Critical patent/CN1957112A/zh
Application granted granted Critical
Publication of CN1957112B publication Critical patent/CN1957112B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225Deposition of multilayers of inorganic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/02Hydrogen or oxygen
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/02Hydrogen or oxygen
    • C25B1/04Hydrogen or oxygen by electrolysis of water
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Prevention Of Electric Corrosion (AREA)

Abstract

一种用于高过电压氧气阳极析出的电极,包括钛或其它阀金属基材、包含阀金属氧化物的第一保护中间层、包含铂或其它贵金属的第二中间层以及包含锡、铜和锑的氧化物的外层。本发明的电极可以在废水处理中用作阳极。

Description

用于氧气析出的阳极
本发明涉及用于在水溶液中高过电压氧气析出(evolution),例如用于破坏废水中的有机物的阳极。在通常的水处理中,以及特别是在当必须将有机或生物物质减少到非常低水平时的废水处理中,氧气的阳极析出是一种非常常用的反应。在破坏有机物质中,初生氧的有效性主要取决于阳极析出电位,其必须尽可能的高,优选不需要使用过量的电流密度。其它工业过程,例如有机电合成领域可以得益于在本发明的阳极上以高电位析出氧气,尽管如此氧化水溶液中有机物质无疑代表其最普遍和经济学上相关的用途。
现有技术中用于高过电压氧气析出的阳极通常在例如基于用其它元素不同改性的二氧化锡的陶瓷基材上获得,主要是为了赋予充足的导电性;二氧化铅也代表通常用于该目的的材料。但是这种基材类型的几何局限性已经促使研发基于阀金属的具有高氧气过电压的电极,其具有优选的结构,包括钛或钛合金基材、例如基于氧化钛和氧化钽的保护陶瓷中间层以及其中二氧化锡同样代表主要组分,通常与其它元素,例如铜、铱和锑成混合物的低催化活性外层;这种电极也包括主要含有氧化钽和氧化铱的中间催化剂层,公开于WO03/100135的实施例6中。虽然WO03/100135的电极能够在指明的应用中提供有吸引力的初始性能,但是由于其在含硫溶液中以略微高于2V的电位和100A/m2的电流析出氧气,其寿命相当不令人满意。实际上,即使以上阳极装备有低催化活性外层,在普通工业操作条件中,氧气析出电位和有机物质去除效率也倾向于在几百小时内突然下降。另外,从WO03/100135的说明书中可以很快注意到有关电极的制备方法对于大规模生产来说相当复杂,因为必须应用两种不同前体的大量替代层(在实施例中,每两个涂层十个替代层)。
本发明的一个目的是提供一种氧气析出阳极,其在不超过几百A/m2的电流密度下,在高于2V(NHB)的高过电压下工作,克服了现有技术的局限同时在工业工作条件中提供更长的寿命。
本发明的另一个目的是提供一种生产高过电压氧气析出阳极的方法,特征在于便利的工业实用性。
在第一方面,本发明包括一种在陶瓷基材上或者优选在钛、钛合金或其它阀金属基材上得到的阳极,所述阳极包括基于本领域已知的阀金属氧化物的第一保护中间层,基于贵金属的第二保护中间层和包含锡、铜和锑氧化物的外层。
在一个优选的实施方案中,根据本发明活化的钛或钛合金基材预先例如通过喷砂以及后续的硫酸蚀刻具有合适的粗糙外观。
在另一个优选的实施方案中,第一中间层包括钛和钽氧化物的混合物;在另一个优选的实施方案中,基于贵金属的第二中间层包含铂,更优选包含10-24g/m2的铂。
外层包含锡、铜和锑氧化物,任选与其它元素结合。锡含量优选为5-25g/m2,锑含量为0.4-2g/m2,铜含量为0.2-1g/m2;在一个更加优选的实施方案中,锡以全部金属含量的至少90重量%的量存在。
在另一个方面,本发明包括一种生产高过电压氧气析出阳极的方法,所述方法包括在陶瓷或阀金属基材上后续施加基于阀金属氧化物的第一保护中间层,基于贵金属的第二中间层和包含锡、铜和锑氧化物的外层。在一个优选的实施方案中,基材为例如通过喷砂接着通过硫酸蚀刻预先加以处理,以便赋予适合的粗糙外观的钛或钛合金,如03/076693中公开的。但是可能进行其它类型的处理,例如热或等离子体喷涂处理或用其它腐蚀剂蚀刻。在一个优选的实施方案中,第一中间层通过施加前体,例如钛和钽氯化物,然后在例如450-600℃之间进行热分解得到;如本领域已知的,该前体施加可以由例如喷涂、刷涂或辊涂的不同的单一或组合技术实施。在一个优选的实施方案中,第二中间层通过在400-600℃温度下热分解六氯铂酸得到,但是也可以进行其它形式的贵金属施加,例如通过电化步骤。在形成第二中间层的过程中,可以包括其它贵金属的前体,但是特别优选存在铂。
在一个特别优选的实施方案中,使用含有锡、铜和锑氧化物的前体,例如相应的氯化物的单一溶液施加外层。溶液根据现有技术施加,并且优选在450-600℃之间分解。
本发明的阳极能够在几百A/m2的电流密度下,在电位明显高于2V(NHE)的高过电压下析出氧气,比WO03/100135的阳极或者现有技术的其它阳极具有长得多的寿命。不希望本发明束缚于特定理论,就WO03/100135而论,假定阳极倾向于在涂布中形成裂纹或裂缝,虽然其使有限扩展的一些区域剥离,但是具有高铱含量或者在任何情况下具有明显较低的氧气过电压。就本发明的阳极而论,可能形成的裂纹或裂缝将使富铂区域剥离,在其上氧气过电压仍然相当高。
这种说明由附图中公开的数据证实。
图1显示与本发明阳极上的氧气析出相应的极化曲线。
特别地,图1中的曲线表示在pH5和25℃下硫酸钠中的氧气析出。
(1)表示与本发明阳极相应的极化曲线,(2)表示与仅具有分别基于钛和钽氧化物以及基于铂的两个中间层的本发明阳极的极化曲线,(3)表示与仅具有基于钛和钽氧化物的第一中间层和基于铱和钽氧化物的外层的阳极的极化曲线。实际上,曲线(2)模拟其中基于锡、铜和锑氧化物的外层完全破坏的本发明阳极的行为,而曲线(3)模拟WO03/100135的阳极的最外层全部破坏的情况。
本发明将进一步由以下实施例阐明,并不希望本发明的范围限于以下实施例,而是仅由附加的权利要求加以限定。
实施例
在87℃温度下,用金刚砂喷砂以及用含有10g/l溶解钛的25%硫酸蚀刻45cm×60cm尺寸和2mm厚度的根据ASTM B265的1级钛板。通过静电喷涂,接着辊涂将溶液施加于以0.11M Ti和0.03M Ta的浓度含有钛和钽氯化物的片材上。施涂四层溶液涂层,直到得到0.87g/m2的沉积总载荷,在50℃下在一个涂层和下一个涂层之间干燥10分钟,以及随后在520℃热分解15分钟。
由此得到第一中间层,在其上施涂包括20g/m2Pt的第二中间层。通过刷涂分散在丁香酚中的六氯铂酸,以及通过在每个涂布之后在500℃热分解10分钟,以三个涂层进行施涂。
最后施涂来源于锡(IV)(相当于全部金属含量的94重量%)、铜(II)(相当于全部金属含量的2重量%)和锑(相当于全部金属含量的4重量%)氯化物的外层。通过刷涂16层涂层,使用在每个涂层之后在50℃干燥和在520℃分解,进行施涂。
在pH5和25℃下根据硫酸钠中的氧气析出对由此得到的本发明电极进行极化测试,以及结果公开在图1中的作为(1)标明的曲线。图1中也公开了以相同条件用不含外层的相同电极,和用装备有相同第一中间层的电极,以及用含有24g/m2的钽(35重量%)和铱(65重量%)氧化物的外层得到的极化数据。这种数据公开在分别作为(2)和(3)标明的曲线中。
最后,对本发明电极进行加速寿命测试,其中该测试在60℃和20kA/m2的电流密度下,在浓度为150g/l的硫酸中的氧气析出下进行。加速测试500小时之后,在500A/m2电流密度测量pH5和25℃下硫酸钠中的氧气析出电位:得到的测定电位等于2.15V(NHE)。对根据WO03/100135制备的阳极进行相同测试,在相同条件下显示1.74V(NHE)的氧气析出电位。
对于本领域技术人员显而易见的是,本发明可以相对于列举的实施例实际进行其它变化或改进。
前述说明书目的并不在于限制本发明,本发明可以根据不脱离其范围的不同实施方案加以应用,并且其范围仅由附加的权利要求唯一限定。
贯穿本申请的说明书和权利要求,措词“包括”及其变化,例如“包含”和“含有”并不用来排除存在其它元素或附加组分。

Claims (15)

1.用于高过电压氧气析出的阳极,包含阀金属或陶瓷基材,施加于所述基材的基于阀金属氧化物的第一中间层,施加于所述第一中间层的铂中间层,含有锡、铜和锑的氧化物的外层。
2.权利要求1所述的阳极,其中所述阀金属基材由钛或钛合金制成。
3.权利要求2所述的阳极,其中所述钛或钛合金的基材具有粗糙外观,该粗糙外观通过包括任选在先进行喷砂的硫酸蚀刻的处理加以控制。
4.权利要求1所述的阳极,其中所述第一中间层包括钛和钽氧化物。
5.权利要求1所述的阳极,其中所述铂中间层包括10-24g/m2的铂。
6.前述权利要求中任一项所述的阳极,其中所述外层包括5-25g/m2的锡,0.4-2g/m2的锑和0.2-1g/m2的铜。
7.权利要求6所述的阳极,其中锡以不低于全部金属含量的90重量%的量存在于所述外层中。
8.生产用于高过电压氧气析出的阳极的方法,包括向阀金属或陶瓷基材施涂基于阀金属氧化物的第一中间层,向所述第一中间层施涂铂中间层,以及施涂含有锡、铜和锑的氧化物的外层。
9.权利要求8所述的方法,其中所述基材为钛或钛合金基材,具有通过喷砂以及后续硫酸蚀刻得到的受控的粗糙外观。
10.权利要求8或9所述的方法,其中所述第一中间层通过选自喷涂、刷涂和辊涂的至少一种方法,由来自钛和钽的氯化物的溶液开始,以及随后在450-600℃下热分解进行施加。
11.权利要求8或9所述的方法,其中所述铂中间层通过在400-600℃之间热分解含有六氯铂酸的溶液进行施加。
12.权利要求8或9所述的方法,其中所述外层由来自含有锡、锑和铜的氯化物的溶液开始,以及随后在450-600℃下热分解以多层涂层进行施加。
13.电化学方法,包括在权利要求1-7中任一项所述的阳极上以高于2V/NHE的电位进行阳极氧气析出。
14.权利要求13所述的方法,包括工业水处理。
15.权利要求14所述的方法,其中所述处理包括从废水中除去有机分子。
CN2005800161445A 2004-05-20 2005-05-19 用于氧气析出的阳极 Active CN1957112B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI2004A001006 2004-05-20
IT001006A ITMI20041006A1 (it) 2004-05-20 2004-05-20 Anodo per sviluppo ossigeno
PCT/EP2005/005453 WO2005113861A1 (en) 2004-05-20 2005-05-19 Anode for oxygen evolution

Publications (2)

Publication Number Publication Date
CN1957112A CN1957112A (zh) 2007-05-02
CN1957112B true CN1957112B (zh) 2011-01-12

Family

ID=34968743

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800161445A Active CN1957112B (zh) 2004-05-20 2005-05-19 用于氧气析出的阳极

Country Status (15)

Country Link
US (1) US8083921B2 (zh)
EP (1) EP1756333B1 (zh)
JP (1) JP5059605B2 (zh)
KR (1) KR101201689B1 (zh)
CN (1) CN1957112B (zh)
AU (1) AU2005245599B2 (zh)
BR (1) BRPI0511437B1 (zh)
ES (1) ES2581210T3 (zh)
IT (1) ITMI20041006A1 (zh)
MX (1) MXPA06013444A (zh)
MY (1) MY142728A (zh)
RU (1) RU2388850C2 (zh)
TW (1) TWI265214B (zh)
WO (1) WO2005113861A1 (zh)
ZA (1) ZA200609264B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20061947A1 (it) * 2006-10-11 2008-04-12 Industrie De Nora Spa Catodo per processi elettrolitici
CN100412233C (zh) * 2006-10-13 2008-08-20 扬州大学 一种电化学氧化处理含苯酚废水的工艺方法
JP2010095764A (ja) * 2008-10-16 2010-04-30 Japan Carlit Co Ltd:The 電解用電極及びその製造方法
WO2012040503A2 (en) 2010-09-24 2012-03-29 Det Norske Veritas As Method and apparatus for the electrochemical reduction of carbon dioxide
CN102320683B (zh) * 2011-06-03 2013-03-06 大连海事大学 钛基锡锑铂氧化物电极材料及其制备方法
ITMI20111132A1 (it) * 2011-06-22 2012-12-23 Industrie De Nora Spa Anodo per evoluzione di ossigeno
ITMI20122035A1 (it) * 2012-11-29 2014-05-30 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
RU2577402C1 (ru) * 2014-09-30 2016-03-20 Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" Анод для выделения кислорода и способ его изготовления
CN105154913B (zh) * 2015-07-02 2017-05-31 北京师范大学 一种水处理用电催化电极中层的制备方法
CN108299868A (zh) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 触媒涂料及使用其的阳极
US11668017B2 (en) * 2018-07-30 2023-06-06 Water Star, Inc. Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
CN109868464A (zh) * 2019-03-11 2019-06-11 江阴安诺电极有限公司 具有贵金属涂层的阳极板
JP2020153000A (ja) * 2019-03-22 2020-09-24 株式会社豊田中央研究所 電気化学反応デバイス
CN114272920B (zh) * 2021-11-22 2023-10-03 广东省科学院资源利用与稀土开发研究所 一种有机污染物降解用复合氧化物涂层电极及其制备方法
CN114351179A (zh) * 2021-12-02 2022-04-15 江苏友诺环保科技有限公司 一种具有中间层的铱钽锰涂层钛阳极板及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2596776B1 (fr) * 1986-04-03 1988-06-03 Atochem Cathode pour electrolyse et un procede de fabrication de ladite cathode
JPS62284095A (ja) * 1986-06-02 1987-12-09 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
JP2574699B2 (ja) * 1989-04-21 1997-01-22 ダイソー 株式会社 酸素発生陽極及びその製法
AT397436B (de) * 1990-07-26 1994-04-25 Avl Verbrennungskraft Messtech Anode einer elektrochemischen sensoranordnung und verfahren zu deren herstellung
CA2061390A1 (en) * 1991-03-01 1992-09-02 Oronzio De Nora Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes
JP3212327B2 (ja) * 1991-08-30 2001-09-25 ペルメレック電極株式会社 電解用電極
NL9101753A (nl) * 1991-10-21 1993-05-17 Magneto Chemie Bv Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging.
JP3236653B2 (ja) * 1992-02-25 2001-12-10 ペルメレック電極株式会社 電解用電極
LU88516A1 (de) 1993-07-21 1996-02-01 Furukawa Electric Co Ltd Sauerstoff erzeugende Elektrode und Verfahren dieselbe herzustellen
JP2925938B2 (ja) * 1994-04-04 1999-07-28 古河電気工業株式会社 酸素発生用電極とその製造方法
JPH11221570A (ja) * 1998-02-05 1999-08-17 Matsushita Electric Ind Co Ltd 有機汚水の分解電極及びそれを用いた有機汚水の分解方法、及びそれを用いた有機汚水の分解装置
JP2931812B1 (ja) * 1998-04-24 1999-08-09 ティーディーケイ株式会社 電解用電極およびその製造方法
US7247229B2 (en) 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
ITMI20020535A1 (it) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa Anodo per sviluppo di ossigeno e relativo substrato
ITMI20021128A1 (it) * 2002-05-24 2003-11-24 De Nora Elettrodi Spa Elettrodo per sviluppo di gas e metodo per il suo ottenimento

Also Published As

Publication number Publication date
WO2005113861A1 (en) 2005-12-01
JP2007538152A (ja) 2007-12-27
AU2005245599B2 (en) 2009-12-17
BRPI0511437A (pt) 2007-12-26
CN1957112A (zh) 2007-05-02
MY142728A (en) 2010-12-31
RU2388850C2 (ru) 2010-05-10
RU2006145304A (ru) 2008-06-27
US8083921B2 (en) 2011-12-27
MXPA06013444A (es) 2007-03-01
AU2005245599A1 (en) 2005-12-01
JP5059605B2 (ja) 2012-10-24
KR101201689B1 (ko) 2012-11-15
ES2581210T3 (es) 2016-09-02
EP1756333B1 (en) 2016-04-06
BRPI0511437B1 (pt) 2016-06-14
ITMI20041006A1 (it) 2004-08-20
EP1756333A1 (en) 2007-02-28
TWI265214B (en) 2006-11-01
KR20070012721A (ko) 2007-01-26
TW200540297A (en) 2005-12-16
US20080023341A1 (en) 2008-01-31
ZA200609264B (en) 2008-05-28

Similar Documents

Publication Publication Date Title
CN1957112B (zh) 用于氧气析出的阳极
CN102443818B (zh) 多层混合金属氧化物电极及其制造方法
JP2007538152A5 (zh)
KR102524693B1 (ko) 전해 공정용 전극
TW200427871A (en) Electrocatalytic coating with lower platinum group metals and electrode made therefrom
RU2326991C2 (ru) Электрод для выделения газа и способ его изготовления
EP0243302A1 (en) An electrode with a platinum metal catalyst in surface film and its use
KR101789358B1 (ko) 전기 화학적 산업 공정에 있어서 산소를 발생시키기 위한 전극
JPS59150091A (ja) 耐久性を有する電解用電極及びその製造方法
CA1058552A (en) Electrodes
KR900001552B1 (ko) 전해용 산화납 피복 전극 및 그 제조방법
FI64954B (fi) Elektroder foer elektrolytiska processer
IL277070B1 (en) Electrode for electrochlorination processes
EP0955395B1 (en) Electrolyzing electrode and process for the production thereof
RU2689985C2 (ru) Каталитическое покрытие и способ его изготовления
JPH0790665A (ja) 酸素発生用電極
JP3724096B2 (ja) 酸素発生用電極とその製造方法
JPH01312096A (ja) 電解用電極及びその製造方法
JPH06306670A (ja) 酸素発生用電極の製法
JPS6357792A (ja) 酸化鉛被覆電解用電極及びその製造方法
JPS6357791A (ja) 酸化鉛被覆電解用電極及びその製造方法
RS20060678A (en) Activated mixed metal oxide coated electrodes
TH85B (th) การฉาบขั้วไฟฟ้าชนิดที่มีขึ้นป้องกันปรับปรุงใหม่

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: IND DE NORA S. P. A.

Free format text: FORMER OWNER: DE NORA ELETTRODI S.P.A.

Effective date: 20130116

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20130116

Address after: Milan Italy

Patentee after: Ind de Nora S. P. A.

Address before: Milan Italy

Patentee before: DE Nora Electrodi S. P. A.