RU2006145304A - Анод для выделения кислорода - Google Patents
Анод для выделения кислорода Download PDFInfo
- Publication number
- RU2006145304A RU2006145304A RU2006145304/15A RU2006145304A RU2006145304A RU 2006145304 A RU2006145304 A RU 2006145304A RU 2006145304/15 A RU2006145304/15 A RU 2006145304/15A RU 2006145304 A RU2006145304 A RU 2006145304A RU 2006145304 A RU2006145304 A RU 2006145304A
- Authority
- RU
- Russia
- Prior art keywords
- intermediate layer
- anode
- antimony
- outer layer
- tin
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/04—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
- C25B1/04—Hydrogen or oxygen by electrolysis of water
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Ceramic Engineering (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Metals (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Prevention Of Electric Corrosion (AREA)
Claims (18)
1. Анод для выделения кислорода при высоком перенапряжении, содержащий подложку из вентильного металла или керамики, первый промежуточный слой на основе оксидов вентильных металлов, нанесенный на упомянутую подложку, второй промежуточный слой на основе благородных металлов, нанесенный на упомянутый первый промежуточный слой, внешний слой, содержащий оксиды олова, меди и сурьмы.
2. Анод по п.1, в котором упомянутая подложка из вентильного металла выполнена из титана или титанового сплава.
3. Анод по п.2, в котором упомянутая подложка из титана или титанового сплава имеет профиль шероховатости, контролируемый посредством обработки, содержащей травление серной кислотой, которому необязательно предшествует пескоструйная обработка.
4. Анод по п.1, в котором упомянутый первый промежуточный слой содержит оксиды титана и тантала.
5. Анод по п.1, в котором упомянутый второй промежуточный слой содержит от 10 до 24 г/м2 платины.
6. Анод по любому из предшествующих пунктов, в котором упомянутый внешний слой содержит от 5 до 25 г/м2 олова, от 0,4 до 2 г/м2 сурьмы и от 0,2 до 1 г/м2 меди.
7. Анод по п.6, в котором олово присутствует в упомянутом внешнем слое в количестве не менее 90% по массе от суммарного содержания всех металлов.
8. Способ изготовления анода для выделения кислорода при высоком перенапряжении, включающий в себя нанесение первого промежуточного слоя на основе оксидов вентильных металлов на подложку из вентильного металла или керамики, нанесение второго промежуточного слоя на основе благородных металлов на упомянутый первый промежуточный слой, нанесение внешнего слоя, содержащего оксиды олова, меди и сурьмы.
9. Способ по п.8, в котором упомянутая подложка представляет собой подложку из титана или титанового сплава с контролируемым профилем шероховатости, полученным пескоструйной обработкой и последующим травлением серной кислотой.
10. Способ по п.8, в котором упомянутый первый промежуточный слой наносят посредством по меньшей мере одного способа, выбранного из распыления, нанесения кистью и нанесения валиком, исходя из раствора хлоридов титана и тантала, с последующим термическим разложением при температуре, находящейся в интервале между 450 и 600°С.
11. Способ по любому из пп.8-10, в котором упомянутый второй промежуточный слой наносят термическим разложением раствора, содержащего гексахлороплатиновую кислоту, при температуре, находящейся в интервале между 400 и 600°С.
12. Способ по п.8, в котором упомянутый внешний слой наносят в несколько этапов, исходя из раствора, содержащего хлориды олова, сурьмы и меди, с последующим термическим разложением при температуре, находящейся в интервале между 450 и 600°С.
13. Способ по п.9, в котором упомянутый внешний слой наносят в несколько этапов, исходя из раствора, содержащего хлориды олова, сурьмы и меди, с последующим термическим разложением при температуре, находящейся в интервале между 450 и 600°С.
14. Способ по п.10, в котором упомянутый внешний слой наносят в несколько этапов, исходя из раствора, содержащего хлориды олова, сурьмы и меди, с последующим термическим разложением при температуре, находящейся в интервале между 450 и 600°С.
15. Способ по п.11, в котором упомянутый внешний слой наносят в несколько этапов, исходя из раствора, содержащего хлориды олова, сурьмы и меди, с последующим термическим разложением при температуре, находящейся в интервале между 450 и 600°С.
16. Электрохимический процесс, включающий в себя анодное выделение кислорода при потенциале выше 2 В (СВЭ) на электроде по любому из пп.1-7.
17. Процесс по п.16, включающий в себя промышленную обработку вод.
18. Процесс по п.17, в котором упомянутая обработка включает в себя удаление органических молекул из сточных вод.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT001006A ITMI20041006A1 (it) | 2004-05-20 | 2004-05-20 | Anodo per sviluppo ossigeno |
ITMI2004A001006 | 2004-05-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
RU2006145304A true RU2006145304A (ru) | 2008-06-27 |
RU2388850C2 RU2388850C2 (ru) | 2010-05-10 |
Family
ID=34968743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
RU2006145304/15A RU2388850C2 (ru) | 2004-05-20 | 2005-05-19 | Анод для выделения кислорода |
Country Status (15)
Country | Link |
---|---|
US (1) | US8083921B2 (ru) |
EP (1) | EP1756333B1 (ru) |
JP (1) | JP5059605B2 (ru) |
KR (1) | KR101201689B1 (ru) |
CN (1) | CN1957112B (ru) |
AU (1) | AU2005245599B2 (ru) |
BR (1) | BRPI0511437B1 (ru) |
ES (1) | ES2581210T3 (ru) |
IT (1) | ITMI20041006A1 (ru) |
MX (1) | MXPA06013444A (ru) |
MY (1) | MY142728A (ru) |
RU (1) | RU2388850C2 (ru) |
TW (1) | TWI265214B (ru) |
WO (1) | WO2005113861A1 (ru) |
ZA (1) | ZA200609264B (ru) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2574562C2 (ru) * | 2010-06-11 | 2016-02-10 | ТюссенКрупп Уде ГмбХ | Покрытие подложки, нанесенное на одну или более сторон |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITMI20061947A1 (it) * | 2006-10-11 | 2008-04-12 | Industrie De Nora Spa | Catodo per processi elettrolitici |
CN100412233C (zh) * | 2006-10-13 | 2008-08-20 | 扬州大学 | 一种电化学氧化处理含苯酚废水的工艺方法 |
JP2010095764A (ja) * | 2008-10-16 | 2010-04-30 | Japan Carlit Co Ltd:The | 電解用電極及びその製造方法 |
WO2012040503A2 (en) | 2010-09-24 | 2012-03-29 | Det Norske Veritas As | Method and apparatus for the electrochemical reduction of carbon dioxide |
CN102320683B (zh) * | 2011-06-03 | 2013-03-06 | 大连海事大学 | 钛基锡锑铂氧化物电极材料及其制备方法 |
ITMI20111132A1 (it) * | 2011-06-22 | 2012-12-23 | Industrie De Nora Spa | Anodo per evoluzione di ossigeno |
ITMI20122035A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
RU2577402C1 (ru) * | 2014-09-30 | 2016-03-20 | Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" | Анод для выделения кислорода и способ его изготовления |
CN105154913B (zh) * | 2015-07-02 | 2017-05-31 | 北京师范大学 | 一种水处理用电催化电极中层的制备方法 |
CN108299868A (zh) * | 2016-08-25 | 2018-07-20 | 先丰通讯股份有限公司 | 触媒涂料及使用其的阳极 |
CN109868464A (zh) * | 2019-03-11 | 2019-06-11 | 江阴安诺电极有限公司 | 具有贵金属涂层的阳极板 |
JP2020153000A (ja) * | 2019-03-22 | 2020-09-24 | 株式会社豊田中央研究所 | 電気化学反応デバイス |
CN114272920B (zh) * | 2021-11-22 | 2023-10-03 | 广东省科学院资源利用与稀土开发研究所 | 一种有机污染物降解用复合氧化物涂层电极及其制备方法 |
CN114351179A (zh) * | 2021-12-02 | 2022-04-15 | 江苏友诺环保科技有限公司 | 一种具有中间层的铱钽锰涂层钛阳极板及其制备方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2596776B1 (fr) * | 1986-04-03 | 1988-06-03 | Atochem | Cathode pour electrolyse et un procede de fabrication de ladite cathode |
JPS62284095A (ja) * | 1986-06-02 | 1987-12-09 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
JP2574699B2 (ja) * | 1989-04-21 | 1997-01-22 | ダイソー 株式会社 | 酸素発生陽極及びその製法 |
AT397436B (de) * | 1990-07-26 | 1994-04-25 | Avl Verbrennungskraft Messtech | Anode einer elektrochemischen sensoranordnung und verfahren zu deren herstellung |
CA2061390A1 (en) * | 1991-03-01 | 1992-09-02 | Oronzio De Nora | Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes |
JP3212327B2 (ja) | 1991-08-30 | 2001-09-25 | ペルメレック電極株式会社 | 電解用電極 |
NL9101753A (nl) * | 1991-10-21 | 1993-05-17 | Magneto Chemie Bv | Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging. |
JP3236653B2 (ja) * | 1992-02-25 | 2001-12-10 | ペルメレック電極株式会社 | 電解用電極 |
LU88516A1 (de) | 1993-07-21 | 1996-02-01 | Furukawa Electric Co Ltd | Sauerstoff erzeugende Elektrode und Verfahren dieselbe herzustellen |
JP2925938B2 (ja) * | 1994-04-04 | 1999-07-28 | 古河電気工業株式会社 | 酸素発生用電極とその製造方法 |
JPH11221570A (ja) * | 1998-02-05 | 1999-08-17 | Matsushita Electric Ind Co Ltd | 有機汚水の分解電極及びそれを用いた有機汚水の分解方法、及びそれを用いた有機汚水の分解装置 |
JP2931812B1 (ja) * | 1998-04-24 | 1999-08-09 | ティーディーケイ株式会社 | 電解用電極およびその製造方法 |
US7247229B2 (en) * | 1999-06-28 | 2007-07-24 | Eltech Systems Corporation | Coatings for the inhibition of undesirable oxidation in an electrochemical cell |
ITMI20020535A1 (it) * | 2002-03-14 | 2003-09-15 | De Nora Elettrodi Spa | Anodo per sviluppo di ossigeno e relativo substrato |
ITMI20021128A1 (it) * | 2002-05-24 | 2003-11-24 | De Nora Elettrodi Spa | Elettrodo per sviluppo di gas e metodo per il suo ottenimento |
-
2004
- 2004-05-20 IT IT001006A patent/ITMI20041006A1/it unknown
-
2005
- 2005-05-13 TW TW094115470A patent/TWI265214B/zh not_active IP Right Cessation
- 2005-05-17 MY MYPI20052225A patent/MY142728A/en unknown
- 2005-05-19 CN CN2005800161445A patent/CN1957112B/zh active Active
- 2005-05-19 US US11/587,842 patent/US8083921B2/en active Active
- 2005-05-19 MX MXPA06013444A patent/MXPA06013444A/es active IP Right Grant
- 2005-05-19 AU AU2005245599A patent/AU2005245599B2/en not_active Ceased
- 2005-05-19 WO PCT/EP2005/005453 patent/WO2005113861A1/en active Application Filing
- 2005-05-19 BR BRPI0511437A patent/BRPI0511437B1/pt not_active IP Right Cessation
- 2005-05-19 ZA ZA200609264A patent/ZA200609264B/en unknown
- 2005-05-19 JP JP2007517088A patent/JP5059605B2/ja active Active
- 2005-05-19 RU RU2006145304/15A patent/RU2388850C2/ru not_active IP Right Cessation
- 2005-05-19 KR KR1020067024281A patent/KR101201689B1/ko active IP Right Grant
- 2005-05-19 ES ES05745776.4T patent/ES2581210T3/es active Active
- 2005-05-19 EP EP05745776.4A patent/EP1756333B1/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2574562C2 (ru) * | 2010-06-11 | 2016-02-10 | ТюссенКрупп Уде ГмбХ | Покрытие подложки, нанесенное на одну или более сторон |
Also Published As
Publication number | Publication date |
---|---|
KR101201689B1 (ko) | 2012-11-15 |
ZA200609264B (en) | 2008-05-28 |
MY142728A (en) | 2010-12-31 |
BRPI0511437A (pt) | 2007-12-26 |
US20080023341A1 (en) | 2008-01-31 |
KR20070012721A (ko) | 2007-01-26 |
ES2581210T3 (es) | 2016-09-02 |
EP1756333B1 (en) | 2016-04-06 |
ITMI20041006A1 (it) | 2004-08-20 |
MXPA06013444A (es) | 2007-03-01 |
EP1756333A1 (en) | 2007-02-28 |
TWI265214B (en) | 2006-11-01 |
JP2007538152A (ja) | 2007-12-27 |
WO2005113861A1 (en) | 2005-12-01 |
AU2005245599B2 (en) | 2009-12-17 |
CN1957112A (zh) | 2007-05-02 |
RU2388850C2 (ru) | 2010-05-10 |
JP5059605B2 (ja) | 2012-10-24 |
AU2005245599A1 (en) | 2005-12-01 |
US8083921B2 (en) | 2011-12-27 |
BRPI0511437B1 (pt) | 2016-06-14 |
TW200540297A (en) | 2005-12-16 |
CN1957112B (zh) | 2011-01-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
RU2006145304A (ru) | Анод для выделения кислорода | |
FI57132C (fi) | Elektrod avsedd foer anvaendning vid elektrokemiska processer | |
US7247229B2 (en) | Coatings for the inhibition of undesirable oxidation in an electrochemical cell | |
CN1324155C (zh) | 钛材料及其制备方法 | |
JP2007538152A5 (ru) | ||
JP5686456B2 (ja) | 酸素発生用陽極の製造方法 | |
EP3314041B1 (en) | Electrode for electrolytic processes | |
TWI579410B (zh) | 電化製法中之釋氧用電極及其製法 | |
EA020408B1 (ru) | Электрод для электролитических применений | |
EP2617876B1 (en) | Electrolysis electrode, anode for electrolytic production of ozone or persulfate, and anode for electrolytic oxidation of chromium | |
CN111926309B (zh) | 一种金属氧化物电极用钛基的防钝化涂层及其制备方法 | |
RU2001115940A (ru) | Электрод с прочно нанесенным наружным каталитическим слоем | |
US6231731B1 (en) | Electrolyzing electrode and process for the production thereof | |
ATE517424T1 (de) | Elektroden für elektrolytkondensatoren und deren herstellungsverfahren | |
JPS63235493A (ja) | 酸素発生用電極及びその製造方法 | |
CN107557820A (zh) | 一种三元复合氧化物惰性阳极的制备方法 | |
CN104532291B (zh) | 钽保护层电极加工工艺 | |
RU2689985C2 (ru) | Каталитическое покрытие и способ его изготовления | |
JP2005163096A5 (ru) | ||
TH74903A (th) | แอโนดสำหรับการปลดปล่อยออกซิเจนออก | |
JPH01312096A (ja) | 電解用電極及びその製造方法 | |
TH52105B (th) | แอโนดสำหรับการปลดปล่อยออกซิเจนออก | |
JP2012112033A (ja) | 金属電解採取方法 | |
CN117987674A (zh) | 一种钛基电极及其制备方法 | |
JPS62170495A (ja) | 電解用電極の製造法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20160520 |