BRPI0511437A - anodo para evolução de oxigênio - Google Patents

anodo para evolução de oxigênio

Info

Publication number
BRPI0511437A
BRPI0511437A BRPI0511437-3A BRPI0511437A BRPI0511437A BR PI0511437 A BRPI0511437 A BR PI0511437A BR PI0511437 A BRPI0511437 A BR PI0511437A BR PI0511437 A BRPI0511437 A BR PI0511437A
Authority
BR
Brazil
Prior art keywords
anode
oxygen evolution
electrode
layer containing
evolution
Prior art date
Application number
BRPI0511437-3A
Other languages
English (en)
Inventor
Paolo Rossi
Original Assignee
De Nora Elettrodi Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Nora Elettrodi Spa filed Critical De Nora Elettrodi Spa
Publication of BRPI0511437A publication Critical patent/BRPI0511437A/pt
Publication of BRPI0511437B1 publication Critical patent/BRPI0511437B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Prevention Of Electric Corrosion (AREA)

Abstract

ANODO PARA EVOLUçãO DE OXIGêNIO. é descrito um eletrodo para evolução anódica de oxigênio a alta sobretensão compreendendo um substrato titânio ou outro metal válvula, uma primeira pré-camada protetora contendo óxidos de metal válvula, uma segunda pré-camada contendo platina ou outro metal nobre, e uma camada externa que compreende óxidos de estanho, cobre e molibdênio. O eletrodo da invenção pode ser utilizado como anodo para o tratamento de águas refluídas.
BRPI0511437A 2004-05-20 2005-05-19 anodo para evolução de oxigênio, método para sua produção e processo eletroquímico BRPI0511437B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001006A ITMI20041006A1 (it) 2004-05-20 2004-05-20 Anodo per sviluppo ossigeno
PCT/EP2005/005453 WO2005113861A1 (en) 2004-05-20 2005-05-19 Anode for oxygen evolution

Publications (2)

Publication Number Publication Date
BRPI0511437A true BRPI0511437A (pt) 2007-12-26
BRPI0511437B1 BRPI0511437B1 (pt) 2016-06-14

Family

ID=34968743

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0511437A BRPI0511437B1 (pt) 2004-05-20 2005-05-19 anodo para evolução de oxigênio, método para sua produção e processo eletroquímico

Country Status (15)

Country Link
US (1) US8083921B2 (pt)
EP (1) EP1756333B1 (pt)
JP (1) JP5059605B2 (pt)
KR (1) KR101201689B1 (pt)
CN (1) CN1957112B (pt)
AU (1) AU2005245599B2 (pt)
BR (1) BRPI0511437B1 (pt)
ES (1) ES2581210T3 (pt)
IT (1) ITMI20041006A1 (pt)
MX (1) MXPA06013444A (pt)
MY (1) MY142728A (pt)
RU (1) RU2388850C2 (pt)
TW (1) TWI265214B (pt)
WO (1) WO2005113861A1 (pt)
ZA (1) ZA200609264B (pt)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20061947A1 (it) * 2006-10-11 2008-04-12 Industrie De Nora Spa Catodo per processi elettrolitici
CN100412233C (zh) * 2006-10-13 2008-08-20 扬州大学 一种电化学氧化处理含苯酚废水的工艺方法
JP2010095764A (ja) * 2008-10-16 2010-04-30 Japan Carlit Co Ltd:The 電解用電極及びその製造方法
WO2012040503A2 (en) 2010-09-24 2012-03-29 Det Norske Veritas As Method and apparatus for the electrochemical reduction of carbon dioxide
CN102320683B (zh) * 2011-06-03 2013-03-06 大连海事大学 钛基锡锑铂氧化物电极材料及其制备方法
ITMI20111132A1 (it) * 2011-06-22 2012-12-23 Industrie De Nora Spa Anodo per evoluzione di ossigeno
ITMI20122035A1 (it) * 2012-11-29 2014-05-30 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
RU2577402C1 (ru) * 2014-09-30 2016-03-20 Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" Анод для выделения кислорода и способ его изготовления
CN105154913B (zh) * 2015-07-02 2017-05-31 北京师范大学 一种水处理用电催化电极中层的制备方法
CN108299868A (zh) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 触媒涂料及使用其的阳极
CN109868464A (zh) * 2019-03-11 2019-06-11 江阴安诺电极有限公司 具有贵金属涂层的阳极板
JP2020153000A (ja) * 2019-03-22 2020-09-24 株式会社豊田中央研究所 電気化学反応デバイス
CN114272920B (zh) * 2021-11-22 2023-10-03 广东省科学院资源利用与稀土开发研究所 一种有机污染物降解用复合氧化物涂层电极及其制备方法
CN114351179A (zh) * 2021-12-02 2022-04-15 江苏友诺环保科技有限公司 一种具有中间层的铱钽锰涂层钛阳极板及其制备方法

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
FR2596776B1 (fr) * 1986-04-03 1988-06-03 Atochem Cathode pour electrolyse et un procede de fabrication de ladite cathode
JPS62284095A (ja) * 1986-06-02 1987-12-09 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
JP2574699B2 (ja) * 1989-04-21 1997-01-22 ダイソー 株式会社 酸素発生陽極及びその製法
AT397436B (de) * 1990-07-26 1994-04-25 Avl Verbrennungskraft Messtech Anode einer elektrochemischen sensoranordnung und verfahren zu deren herstellung
CA2061390A1 (en) * 1991-03-01 1992-09-02 Oronzio De Nora Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes
JP3212327B2 (ja) 1991-08-30 2001-09-25 ペルメレック電極株式会社 電解用電極
NL9101753A (nl) * 1991-10-21 1993-05-17 Magneto Chemie Bv Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging.
JP3236653B2 (ja) * 1992-02-25 2001-12-10 ペルメレック電極株式会社 電解用電極
LU88516A1 (de) 1993-07-21 1996-02-01 Furukawa Electric Co Ltd Sauerstoff erzeugende Elektrode und Verfahren dieselbe herzustellen
JP2925938B2 (ja) * 1994-04-04 1999-07-28 古河電気工業株式会社 酸素発生用電極とその製造方法
JPH11221570A (ja) * 1998-02-05 1999-08-17 Matsushita Electric Ind Co Ltd 有機汚水の分解電極及びそれを用いた有機汚水の分解方法、及びそれを用いた有機汚水の分解装置
JP2931812B1 (ja) * 1998-04-24 1999-08-09 ティーディーケイ株式会社 電解用電極およびその製造方法
US7247229B2 (en) * 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
ITMI20020535A1 (it) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa Anodo per sviluppo di ossigeno e relativo substrato
ITMI20021128A1 (it) * 2002-05-24 2003-11-24 De Nora Elettrodi Spa Elettrodo per sviluppo di gas e metodo per il suo ottenimento

Also Published As

Publication number Publication date
KR101201689B1 (ko) 2012-11-15
ZA200609264B (en) 2008-05-28
MY142728A (en) 2010-12-31
US20080023341A1 (en) 2008-01-31
KR20070012721A (ko) 2007-01-26
RU2006145304A (ru) 2008-06-27
ES2581210T3 (es) 2016-09-02
EP1756333B1 (en) 2016-04-06
ITMI20041006A1 (it) 2004-08-20
MXPA06013444A (es) 2007-03-01
EP1756333A1 (en) 2007-02-28
TWI265214B (en) 2006-11-01
JP2007538152A (ja) 2007-12-27
WO2005113861A1 (en) 2005-12-01
AU2005245599B2 (en) 2009-12-17
CN1957112A (zh) 2007-05-02
RU2388850C2 (ru) 2010-05-10
JP5059605B2 (ja) 2012-10-24
AU2005245599A1 (en) 2005-12-01
US8083921B2 (en) 2011-12-27
BRPI0511437B1 (pt) 2016-06-14
TW200540297A (en) 2005-12-16
CN1957112B (zh) 2011-01-12

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