JP5059605B2 - 酸素放出のためのアノード - Google Patents

酸素放出のためのアノード Download PDF

Info

Publication number
JP5059605B2
JP5059605B2 JP2007517088A JP2007517088A JP5059605B2 JP 5059605 B2 JP5059605 B2 JP 5059605B2 JP 2007517088 A JP2007517088 A JP 2007517088A JP 2007517088 A JP2007517088 A JP 2007517088A JP 5059605 B2 JP5059605 B2 JP 5059605B2
Authority
JP
Japan
Prior art keywords
oxide
intermediate layer
anode
titanium
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2007517088A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007538152A5 (enExample
JP2007538152A (ja
Inventor
ロッシ，パオロ
Original Assignee
インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ filed Critical インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ
Publication of JP2007538152A publication Critical patent/JP2007538152A/ja
Publication of JP2007538152A5 publication Critical patent/JP2007538152A5/ja
Application granted granted Critical
Publication of JP5059605B2 publication Critical patent/JP5059605B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
JP2007517088A 2004-05-20 2005-05-19 酸素放出のためのアノード Expired - Lifetime JP5059605B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT001006A ITMI20041006A1 (it) 2004-05-20 2004-05-20 Anodo per sviluppo ossigeno
ITMI2004A001006 2004-05-20
PCT/EP2005/005453 WO2005113861A1 (en) 2004-05-20 2005-05-19 Anode for oxygen evolution

Publications (3)

Publication Number Publication Date
JP2007538152A JP2007538152A (ja) 2007-12-27
JP2007538152A5 JP2007538152A5 (enExample) 2011-07-14
JP5059605B2 true JP5059605B2 (ja) 2012-10-24

Family

ID=34968743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007517088A Expired - Lifetime JP5059605B2 (ja) 2004-05-20 2005-05-19 酸素放出のためのアノード

Country Status (15)

Country Link
US (1) US8083921B2 (enExample)
EP (1) EP1756333B1 (enExample)
JP (1) JP5059605B2 (enExample)
KR (1) KR101201689B1 (enExample)
CN (1) CN1957112B (enExample)
AU (1) AU2005245599B2 (enExample)
BR (1) BRPI0511437B1 (enExample)
ES (1) ES2581210T3 (enExample)
IT (1) ITMI20041006A1 (enExample)
MX (1) MXPA06013444A (enExample)
MY (1) MY142728A (enExample)
RU (1) RU2388850C2 (enExample)
TW (1) TWI265214B (enExample)
WO (1) WO2005113861A1 (enExample)
ZA (1) ZA200609264B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20061947A1 (it) * 2006-10-11 2008-04-12 Industrie De Nora Spa Catodo per processi elettrolitici
CN100412233C (zh) * 2006-10-13 2008-08-20 扬州大学 一种电化学氧化处理含苯酚废水的工艺方法
JP2010095764A (ja) * 2008-10-16 2010-04-30 Japan Carlit Co Ltd:The 電解用電極及びその製造方法
CA3048786C (en) 2010-09-24 2020-11-03 Dnv Gl As Method and apparatus for the electrochemical reduction of carbon dioxide
CN102320683B (zh) * 2011-06-03 2013-03-06 大连海事大学 钛基锡锑铂氧化物电极材料及其制备方法
ITMI20111132A1 (it) * 2011-06-22 2012-12-23 Industrie De Nora Spa Anodo per evoluzione di ossigeno
ITMI20122035A1 (it) * 2012-11-29 2014-05-30 Industrie De Nora Spa Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali
RU2577402C1 (ru) * 2014-09-30 2016-03-20 Акционерное общество "Ордена Трудового Красного Знамени научно-исследовательский физико-химический институт им. Л.Я. Карпова" Анод для выделения кислорода и способ его изготовления
CN105154913B (zh) * 2015-07-02 2017-05-31 北京师范大学 一种水处理用电催化电极中层的制备方法
CN108299868A (zh) * 2016-08-25 2018-07-20 先丰通讯股份有限公司 触媒涂料及使用其的阳极
US11668017B2 (en) * 2018-07-30 2023-06-06 Water Star, Inc. Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
CN109868464A (zh) * 2019-03-11 2019-06-11 江阴安诺电极有限公司 具有贵金属涂层的阳极板
JP2020153000A (ja) * 2019-03-22 2020-09-24 株式会社豊田中央研究所 電気化学反応デバイス
CN114272920B (zh) * 2021-11-22 2023-10-03 广东省科学院资源利用与稀土开发研究所 一种有机污染物降解用复合氧化物涂层电极及其制备方法
CN114351179A (zh) * 2021-12-02 2022-04-15 江苏友诺环保科技有限公司 一种具有中间层的铱钽锰涂层钛阳极板及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2596776B1 (fr) * 1986-04-03 1988-06-03 Atochem Cathode pour electrolyse et un procede de fabrication de ladite cathode
JPS62284095A (ja) * 1986-06-02 1987-12-09 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
JP2574699B2 (ja) * 1989-04-21 1997-01-22 ダイソー 株式会社 酸素発生陽極及びその製法
AT397436B (de) * 1990-07-26 1994-04-25 Avl Verbrennungskraft Messtech Anode einer elektrochemischen sensoranordnung und verfahren zu deren herstellung
CA2061390A1 (en) * 1991-03-01 1992-09-02 Oronzio De Nora Metal anodes for electrolytic acid solutions containing fluorides or fluoroanionic complexes
JP3212327B2 (ja) * 1991-08-30 2001-09-25 ペルメレック電極株式会社 電解用電極
NL9101753A (nl) * 1991-10-21 1993-05-17 Magneto Chemie Bv Anodes met verlengde levensduur en werkwijzen voor hun vervaardiging.
JP3236653B2 (ja) * 1992-02-25 2001-12-10 ペルメレック電極株式会社 電解用電極
LU88516A1 (de) 1993-07-21 1996-02-01 Furukawa Electric Co Ltd Sauerstoff erzeugende Elektrode und Verfahren dieselbe herzustellen
RU2069239C1 (ru) * 1994-02-08 1996-11-20 Научно-исследовательский физико-технический институт при Дальневосточном государственном университете Способ изготовления электрода для электрохимических процессов
JP2925938B2 (ja) * 1994-04-04 1999-07-28 古河電気工業株式会社 酸素発生用電極とその製造方法
JPH11221570A (ja) * 1998-02-05 1999-08-17 Matsushita Electric Ind Co Ltd 有機汚水の分解電極及びそれを用いた有機汚水の分解方法、及びそれを用いた有機汚水の分解装置
JP2931812B1 (ja) * 1998-04-24 1999-08-09 ティーディーケイ株式会社 電解用電極およびその製造方法
US7247229B2 (en) 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
EP1257688A4 (en) * 2000-02-25 2005-04-06 Lattice Energy Llc ELECTRICAL CELLS, COMPONENTS AND METHOD
ITMI20020535A1 (it) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa Anodo per sviluppo di ossigeno e relativo substrato
ITMI20021128A1 (it) * 2002-05-24 2003-11-24 De Nora Elettrodi Spa Elettrodo per sviluppo di gas e metodo per il suo ottenimento

Also Published As

Publication number Publication date
AU2005245599B2 (en) 2009-12-17
US8083921B2 (en) 2011-12-27
KR20070012721A (ko) 2007-01-26
TWI265214B (en) 2006-11-01
TW200540297A (en) 2005-12-16
EP1756333B1 (en) 2016-04-06
MY142728A (en) 2010-12-31
MXPA06013444A (es) 2007-03-01
ITMI20041006A1 (it) 2004-08-20
BRPI0511437A (pt) 2007-12-26
ES2581210T3 (es) 2016-09-02
EP1756333A1 (en) 2007-02-28
ZA200609264B (en) 2008-05-28
RU2388850C2 (ru) 2010-05-10
RU2006145304A (ru) 2008-06-27
CN1957112B (zh) 2011-01-12
AU2005245599A1 (en) 2005-12-01
KR101201689B1 (ko) 2012-11-15
US20080023341A1 (en) 2008-01-31
CN1957112A (zh) 2007-05-02
JP2007538152A (ja) 2007-12-27
BRPI0511437B1 (pt) 2016-06-14
WO2005113861A1 (en) 2005-12-01

Similar Documents

Publication Publication Date Title
JP5059605B2 (ja) 酸素放出のためのアノード
CN102443818B (zh) 多层混合金属氧化物电极及其制造方法
JP5553605B2 (ja) 電解プロセス用陰極
JP5250663B2 (ja) 電解用陽極及び電解用陽極の製造方法
RU2326991C2 (ru) Электрод для выделения газа и способ его изготовления
JP2007538152A5 (enExample)
CN1764743A (zh) 具有铂族金属的电催化涂层和由其制造的电极
CN102918184A (zh) 用于电解氯化的电极
KR20120051723A (ko) 산업적 전해 공정에서의 산소 발생용 전극
JP6404226B2 (ja) 工業上の電気化学プロセスにおける酸素発生用の電極、当該電極を製造するための方法、及び、当該電極を用い、水溶液から金属を陰極電着させる方法
EP0955395B1 (en) Electrolyzing electrode and process for the production thereof
CN102165102B (zh) 用于次氯酸盐电解槽的阴极部件和双极板
JPH0790665A (ja) 酸素発生用電極
US12305300B2 (en) Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
JP3724096B2 (ja) 酸素発生用電極とその製造方法
JPS6134519B2 (enExample)
JPH0499294A (ja) 酸素発生用陽極及びその製法
JPH02179891A (ja) 酸素発生用陽極
JPH01312096A (ja) 電解用電極及びその製造方法
JPH0417573Y2 (enExample)
JP2008156684A (ja) 塩酸電解用の陽極電極
CN120077166A (zh) 延长寿命的阳极涂层
JP2021050376A (ja) 電解用電極
JP2006233302A (ja) 酸素発生用電極とその製造法
TH74903A (th) แอโนดสำหรับการปลดปล่อยออกซิเจนออก

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080409

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20090521

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110217

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110517

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20110517

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120403

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120613

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120704

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120802

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150810

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5059605

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term