ATE465491T1 - Prozess zur herstellung eines originaldatenträgers für einen optischen datenträger und originaldatenträger für einen optischen datenträger - Google Patents
Prozess zur herstellung eines originaldatenträgers für einen optischen datenträger und originaldatenträger für einen optischen datenträgerInfo
- Publication number
- ATE465491T1 ATE465491T1 AT04799948T AT04799948T ATE465491T1 AT E465491 T1 ATE465491 T1 AT E465491T1 AT 04799948 T AT04799948 T AT 04799948T AT 04799948 T AT04799948 T AT 04799948T AT E465491 T1 ATE465491 T1 AT E465491T1
- Authority
- AT
- Austria
- Prior art keywords
- media
- resist layer
- inorganic resist
- original
- optical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/007—Arrangement of the information on the record carrier, e.g. form of tracks, actual track shape, e.g. wobbled, or cross-section, e.g. v-shaped; Sequential information structures, e.g. sectoring or header formats within a track
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/266—Sputtering or spin-coating layers
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003401836 | 2003-12-01 | ||
PCT/JP2004/018098 WO2005055224A1 (ja) | 2003-12-01 | 2004-11-30 | 光ディスク用原盤の製造方法および光ディスク用原盤 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE465491T1 true ATE465491T1 (de) | 2010-05-15 |
Family
ID=34649989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04799948T ATE465491T1 (de) | 2003-12-01 | 2004-11-30 | Prozess zur herstellung eines originaldatenträgers für einen optischen datenträger und originaldatenträger für einen optischen datenträger |
Country Status (9)
Country | Link |
---|---|
US (2) | US20070105055A1 (zh) |
EP (1) | EP1691362B1 (zh) |
JP (1) | JP4655937B2 (zh) |
KR (1) | KR101059492B1 (zh) |
CN (2) | CN102332276A (zh) |
AT (1) | ATE465491T1 (zh) |
DE (1) | DE602004026769D1 (zh) |
TW (1) | TWI268505B (zh) |
WO (1) | WO2005055224A1 (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4678325B2 (ja) * | 2006-04-18 | 2011-04-27 | ソニー株式会社 | 光ディスク原盤の製造方法 |
JP4954638B2 (ja) * | 2006-08-18 | 2012-06-20 | ソニー株式会社 | 無機レジスト・パターンの形成方法、光ディスク原盤の製造方法、光ディスク・スタンパの製造方法及び光ディスク基板の製造方法 |
FR2909797B1 (fr) * | 2006-12-08 | 2009-02-13 | Commissariat Energie Atomique | Formation de zones en creux profondes et son utilisation lors de la fabrication d'un support d'enregistrement optique |
ATE476737T1 (de) * | 2007-03-02 | 2010-08-15 | Singulus Mastering B V | Steuerungsverfahren für ein integrales mastering- system |
JP2008269720A (ja) * | 2007-04-23 | 2008-11-06 | Canon Inc | 透光性スタンパ、透光性スタンパの製造方法及び多層光記録媒体の製造方法 |
US20090065351A1 (en) * | 2007-09-11 | 2009-03-12 | Ovonyx, Inc. | Method and apparatus for deposition |
JP2009146515A (ja) * | 2007-12-14 | 2009-07-02 | Sony Corp | 記憶媒体製造方法、情報記憶原盤製造装置 |
EP2286980A4 (en) * | 2008-06-05 | 2011-07-13 | Asahi Glass Co Ltd | NANO-PRINTING MOLD, METHOD FOR MANUFACTURING THE SAME, AND PROCESSES FOR PRODUCING A MOLDED RESIN HAVING A FINE ROUGH STRUCTURE ON A SURFACE AND FOR PRODUCING A METAL GRID POLARIZER |
US20120135353A1 (en) * | 2009-07-03 | 2012-05-31 | Hoya Corporation | Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pattern, and inorganic resist and method for forming the same |
JP6105219B2 (ja) * | 2012-07-05 | 2017-03-29 | 旭化成株式会社 | レジスト基板の保管方法 |
WO2015059850A1 (ja) * | 2013-10-24 | 2015-04-30 | 株式会社Joled | 薄膜トランジスタの製造方法 |
JP6295429B2 (ja) * | 2014-07-11 | 2018-03-20 | パナソニックIpマネジメント株式会社 | 反応性スパッタリング形成方法 |
EP4147269A1 (en) * | 2020-05-06 | 2023-03-15 | Inpria Corporation | Multiple patterning with organometallic photopatternable layers with intermediate freeze steps |
Family Cites Families (39)
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US3971874A (en) * | 1973-08-29 | 1976-07-27 | Matsushita Electric Industrial Co., Ltd. | Optical information storage material and method of making it |
JPS5182601A (zh) * | 1975-01-17 | 1976-07-20 | Sony Corp | |
US4091171A (en) * | 1975-11-18 | 1978-05-23 | Matsushita Electric Industrial Co., Ltd. | Optical information storage material and method of making it |
JPS563442A (en) * | 1979-06-20 | 1981-01-14 | Toshiba Corp | Optical memory disk and its manufacture |
JPS59140638A (ja) * | 1983-01-31 | 1984-08-13 | Canon Inc | 情報記録方法 |
JPS59185048A (ja) * | 1983-04-01 | 1984-10-20 | Matsushita Electric Ind Co Ltd | 光学情報記録部材及び記録方法 |
JPS6095741A (ja) * | 1983-10-29 | 1985-05-29 | Daikin Ind Ltd | レジストマスタ−盤の原盤 |
JPH0630177B2 (ja) * | 1984-02-21 | 1994-04-20 | 松下電器産業株式会社 | 光デイスクの製造方法 |
US4645685A (en) * | 1984-03-26 | 1987-02-24 | Kuraray Co., Ltd. | Method for producing an optical recording medium by a chalcogenide suboxide |
JPH0648546B2 (ja) * | 1984-07-14 | 1994-06-22 | 日本ビクター株式会社 | 情報記録担体の製造法 |
JPS6174148A (ja) * | 1984-09-20 | 1986-04-16 | Nec Corp | 光記録媒体 |
JPS61142541A (ja) * | 1984-12-13 | 1986-06-30 | Kuraray Co Ltd | カルコゲナイド系酸化物からなる光記録媒体 |
DE3582149D1 (de) * | 1984-12-13 | 1991-04-18 | Kuraray Co | Aus chalkogenoxid gebildetes optisches aufzeichnungsmedium und verfahren zu dessen herstellung. |
JPS61190734A (ja) * | 1985-02-19 | 1986-08-25 | Matsushita Electric Ind Co Ltd | 情報記録媒体 |
JPH0695395B2 (ja) * | 1985-09-10 | 1994-11-24 | 松下電器産業株式会社 | 平板状情報記録担体の基板作成方法 |
JPS62157340A (ja) * | 1985-12-28 | 1987-07-13 | Matsushita Electric Ind Co Ltd | 情報担体デイスク及びその製造方法 |
JPS6323235A (ja) * | 1986-07-16 | 1988-01-30 | Matsushita Electric Ind Co Ltd | 光学式情報記録担体 |
JPH01201836A (ja) * | 1988-02-05 | 1989-08-14 | Toshiba Corp | 情報記録媒体 |
JPH0229955A (ja) * | 1988-07-18 | 1990-01-31 | Nec Corp | 光ディスク製造方法 |
JP2527362B2 (ja) * | 1988-11-28 | 1996-08-21 | 富士通株式会社 | 光記録媒体 |
JPH02238457A (ja) * | 1989-03-10 | 1990-09-20 | Nec Corp | 厚膜フォトレジストパターンの形成方法 |
JPH038141A (ja) * | 1989-06-05 | 1991-01-16 | Matsushita Electric Ind Co Ltd | 光学記録担体及びその製造方法 |
JP2794467B2 (ja) * | 1989-10-04 | 1998-09-03 | 同和鉱業株式会社 | 光ディスクおよびその製造法 |
JP3014065B2 (ja) * | 1991-10-29 | 2000-02-28 | 日本ビクター株式会社 | 光ディスク,ガラスマスタ,ガラススタンパ,ガラス基板,それらの製造方法 |
JPH0636287A (ja) * | 1992-07-20 | 1994-02-10 | Ricoh Co Ltd | 光ディスク原盤及び原盤露光装置 |
JPH06150395A (ja) * | 1992-11-12 | 1994-05-31 | Matsushita Electric Ind Co Ltd | 光ディスク原盤の製造方法 |
JPH0773509A (ja) * | 1993-09-03 | 1995-03-17 | Fujitsu Ltd | 露光装置 |
JPH0845116A (ja) * | 1994-08-03 | 1996-02-16 | Ricoh Co Ltd | 光ディスクパターン形成方法及び光ディスク |
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JPH08180468A (ja) * | 1994-12-22 | 1996-07-12 | Ricoh Co Ltd | 光ディスク原盤 |
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KR100694036B1 (ko) * | 2000-06-01 | 2007-03-12 | 삼성전자주식회사 | 그루브와 피트의 깊이가 다른 디스크 및 그 제조방법 |
US6768710B2 (en) * | 2000-12-18 | 2004-07-27 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, method for producing the same, and method and apparatus for recording information thereon |
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JP4055543B2 (ja) | 2002-02-22 | 2008-03-05 | ソニー株式会社 | レジスト材料及び微細加工方法 |
US7670514B2 (en) * | 2002-10-10 | 2010-03-02 | Sony Corporation | Method of producing optical disk-use original and method of producing optical disk |
GB0226076D0 (en) * | 2002-11-08 | 2002-12-18 | Rp Scherer Technologies Inc | Improved formulations containing substituted imidazole derivatives |
-
2004
- 2004-11-30 EP EP04799948A patent/EP1691362B1/en not_active Expired - Fee Related
- 2004-11-30 CN CN2011101976667A patent/CN102332276A/zh active Pending
- 2004-11-30 JP JP2005516008A patent/JP4655937B2/ja not_active Expired - Fee Related
- 2004-11-30 WO PCT/JP2004/018098 patent/WO2005055224A1/ja not_active Application Discontinuation
- 2004-11-30 US US10/579,211 patent/US20070105055A1/en not_active Abandoned
- 2004-11-30 DE DE602004026769T patent/DE602004026769D1/de active Active
- 2004-11-30 AT AT04799948T patent/ATE465491T1/de active
- 2004-11-30 CN CN2004800356877A patent/CN1890733B/zh not_active Expired - Fee Related
- 2004-11-30 KR KR1020067009433A patent/KR101059492B1/ko not_active IP Right Cessation
- 2004-12-01 TW TW093137065A patent/TWI268505B/zh not_active IP Right Cessation
-
2012
- 2012-01-27 US US13/360,291 patent/US20120128917A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE602004026769D1 (de) | 2010-06-02 |
CN1890733B (zh) | 2011-09-14 |
EP1691362A1 (en) | 2006-08-16 |
JP4655937B2 (ja) | 2011-03-23 |
JPWO2005055224A1 (ja) | 2007-06-28 |
WO2005055224A1 (ja) | 2005-06-16 |
CN1890733A (zh) | 2007-01-03 |
US20070105055A1 (en) | 2007-05-10 |
EP1691362B1 (en) | 2010-04-21 |
KR101059492B1 (ko) | 2011-08-25 |
TW200529219A (en) | 2005-09-01 |
US20120128917A1 (en) | 2012-05-24 |
EP1691362A4 (en) | 2008-10-29 |
TWI268505B (en) | 2006-12-11 |
KR20060117323A (ko) | 2006-11-16 |
CN102332276A (zh) | 2012-01-25 |
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