ATE465435T1 - Verfahren zur bereitstellung einer eingegrenzten flüssigkeit für die immersionslithographie - Google Patents
Verfahren zur bereitstellung einer eingegrenzten flüssigkeit für die immersionslithographieInfo
- Publication number
- ATE465435T1 ATE465435T1 AT04756062T AT04756062T ATE465435T1 AT E465435 T1 ATE465435 T1 AT E465435T1 AT 04756062 T AT04756062 T AT 04756062T AT 04756062 T AT04756062 T AT 04756062T AT E465435 T1 ATE465435 T1 AT E465435T1
- Authority
- AT
- Austria
- Prior art keywords
- providing
- immersion lithography
- confined liquid
- substrate
- meniscus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- ing And Chemical Polishing (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/606,022 US7252097B2 (en) | 2002-09-30 | 2003-06-24 | System and method for integrating in-situ metrology within a wafer process |
US10/834,548 US7367345B1 (en) | 2002-09-30 | 2004-04-28 | Apparatus and method for providing a confined liquid for immersion lithography |
PCT/US2004/020332 WO2005003864A2 (en) | 2003-06-24 | 2004-06-23 | Apparatus and method for providing a confined liquid for immersion lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE465435T1 true ATE465435T1 (de) | 2010-05-15 |
Family
ID=33568007
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04756062T ATE465435T1 (de) | 2003-06-24 | 2004-06-23 | Verfahren zur bereitstellung einer eingegrenzten flüssigkeit für die immersionslithographie |
Country Status (9)
Country | Link |
---|---|
US (2) | US7367345B1 (de) |
EP (1) | EP1636654B1 (de) |
JP (1) | JP4612630B2 (de) |
KR (1) | KR101117052B1 (de) |
AT (1) | ATE465435T1 (de) |
DE (1) | DE602004026725D1 (de) |
MY (1) | MY139592A (de) |
TW (1) | TWI289734B (de) |
WO (1) | WO2005003864A2 (de) |
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2004
- 2004-04-28 US US10/834,548 patent/US7367345B1/en not_active Expired - Fee Related
- 2004-06-23 KR KR1020057024769A patent/KR101117052B1/ko not_active IP Right Cessation
- 2004-06-23 JP JP2006517635A patent/JP4612630B2/ja not_active Expired - Fee Related
- 2004-06-23 AT AT04756062T patent/ATE465435T1/de not_active IP Right Cessation
- 2004-06-23 WO PCT/US2004/020332 patent/WO2005003864A2/en active Search and Examination
- 2004-06-23 EP EP04756062A patent/EP1636654B1/de not_active Not-in-force
- 2004-06-23 TW TW093118068A patent/TWI289734B/zh not_active IP Right Cessation
- 2004-06-23 DE DE602004026725T patent/DE602004026725D1/de active Active
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Also Published As
Publication number | Publication date |
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KR101117052B1 (ko) | 2012-02-22 |
JP2007525007A (ja) | 2007-08-30 |
KR20060025189A (ko) | 2006-03-20 |
WO2005003864A3 (en) | 2005-04-14 |
US7749689B2 (en) | 2010-07-06 |
EP1636654A2 (de) | 2006-03-22 |
EP1636654B1 (de) | 2010-04-21 |
DE602004026725D1 (de) | 2010-06-02 |
MY139592A (en) | 2009-10-30 |
TW200510961A (en) | 2005-03-16 |
US7367345B1 (en) | 2008-05-06 |
WO2005003864A2 (en) | 2005-01-13 |
US20080171292A1 (en) | 2008-07-17 |
TWI289734B (en) | 2007-11-11 |
JP4612630B2 (ja) | 2011-01-12 |
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