ATE441831T1 - Interferometer zur bestimmung von eigenschaften einer objektoberfläche - Google Patents
Interferometer zur bestimmung von eigenschaften einer objektoberflächeInfo
- Publication number
- ATE441831T1 ATE441831T1 AT06718763T AT06718763T ATE441831T1 AT E441831 T1 ATE441831 T1 AT E441831T1 AT 06718763 T AT06718763 T AT 06718763T AT 06718763 T AT06718763 T AT 06718763T AT E441831 T1 ATE441831 T1 AT E441831T1
- Authority
- AT
- Austria
- Prior art keywords
- electromagnetic radiation
- detector
- test
- different
- test surface
- Prior art date
Links
- 230000005670 electromagnetic radiation Effects 0.000 abstract 5
- 238000000572 ellipsometry Methods 0.000 abstract 1
- 238000005286 illumination Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/021—Interferometers using holographic techniques
- G01B9/023—Interferometers using holographic techniques for contour producing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02041—Interferometers characterised by particular imaging or detection techniques
- G01B9/02043—Imaging of the Fourier or pupil or back focal plane, i.e. angle resolved imaging
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02041—Interferometers characterised by particular imaging or detection techniques
- G01B9/02044—Imaging in the frequency domain, e.g. by using a spectrometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
- G01B9/02074—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer of the detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02084—Processing in the Fourier or frequency domain when not imaged in the frequency domain
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02088—Matching signals with a database
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Mathematical Physics (AREA)
- Databases & Information Systems (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US64544805P | 2005-01-20 | 2005-01-20 | |
PCT/US2006/001740 WO2006078718A1 (en) | 2005-01-20 | 2006-01-19 | Interferometer for determining characteristics of an object surface |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE441831T1 true ATE441831T1 (de) | 2009-09-15 |
Family
ID=36218638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06718763T ATE441831T1 (de) | 2005-01-20 | 2006-01-19 | Interferometer zur bestimmung von eigenschaften einer objektoberfläche |
Country Status (8)
Country | Link |
---|---|
US (4) | US7428057B2 (de) |
EP (2) | EP1853874B1 (de) |
JP (2) | JP4768754B2 (de) |
KR (2) | KR101006423B1 (de) |
AT (1) | ATE441831T1 (de) |
DE (1) | DE602006008896D1 (de) |
TW (2) | TWI428582B (de) |
WO (1) | WO2006078718A1 (de) |
Families Citing this family (158)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US7324214B2 (en) | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US7102758B2 (en) | 2003-05-06 | 2006-09-05 | Duke University | Fourier domain low-coherence interferometry for light scattering spectroscopy apparatus and method |
KR101185473B1 (ko) * | 2003-09-15 | 2012-10-02 | 지고 코포레이션 | 표면에 대한 간섭 측정의 분석 |
TWI335417B (en) | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
US7286243B2 (en) * | 2004-04-19 | 2007-10-23 | Arist Instruments, Inc. | Beam profile complex reflectance system and method for thin film and critical dimension measurements |
WO2005114096A2 (en) * | 2004-05-18 | 2005-12-01 | Zygo Corporation | Methods and systems for determining optical properties using low-coherence interference signals |
GB0415766D0 (en) * | 2004-07-14 | 2004-08-18 | Taylor Hobson Ltd | Apparatus for and a method of determining a characteristic of a layer or layers |
EP1853874B1 (de) * | 2005-01-20 | 2009-09-02 | Zygo Corporation | Interferometer zur bestimmung von eigenschaften einer objektoberfläche |
US7884947B2 (en) | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
DE102005022819A1 (de) * | 2005-05-12 | 2006-11-16 | Nanofocus Ag | Verfahren zur Bestimmung der absoluten Dicke von nicht transparenten und transparenten Proben mittels konfokaler Messtechnik |
US20070002336A1 (en) * | 2005-06-30 | 2007-01-04 | Asml Netherlands B.V. | Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method |
US20080296477A1 (en) * | 2005-08-31 | 2008-12-04 | U.S.A. as represented by the Administrator of the National Aeronautics and Space Adm. | Optical system for inducing focus diversity |
US8537366B2 (en) * | 2005-10-11 | 2013-09-17 | Duke University | Systems and methods for endoscopic angle-resolved low coherence interferometry |
AU2006302086B2 (en) * | 2005-10-11 | 2011-08-18 | Duke University | Systems and method for endoscopic angle-resolved low coherence interferometry |
US7636168B2 (en) * | 2005-10-11 | 2009-12-22 | Zygo Corporation | Interferometry method and system including spectral decomposition |
CN1971256A (zh) * | 2005-11-25 | 2007-05-30 | 鸿富锦精密工业(深圳)有限公司 | 透光薄膜瑕疵的检验方法 |
US8882270B2 (en) | 2006-01-20 | 2014-11-11 | Clarity Medical Systems, Inc. | Apparatus and method for operating a real time large diopter range sequential wavefront sensor |
US8356900B2 (en) * | 2006-01-20 | 2013-01-22 | Clarity Medical Systems, Inc. | Large diopter range real time sequential wavefront sensor |
EP2013570A1 (de) * | 2006-04-28 | 2009-01-14 | Micronic Laser Systems Ab | Verfahren und vorrichtung zum aufzeichnen von bildern und studieren von oberflächen |
DE102006028238B3 (de) * | 2006-06-20 | 2007-07-19 | Benecke-Kaliko Ag | Verfahren zur Analyse der Reflexionseigenschaften |
AU2007275018A1 (en) * | 2006-07-21 | 2008-01-24 | Oncoscope, Inc. | Protective probe tip, particularly for use on a fiber-optic probe used in an endoscopic application |
WO2008080127A2 (en) * | 2006-12-22 | 2008-07-03 | Zygo Corporation | Apparatus and method for measuring characteristics of surface features |
US7889355B2 (en) | 2007-01-31 | 2011-02-15 | Zygo Corporation | Interferometry for lateral metrology |
US8213021B2 (en) * | 2007-06-29 | 2012-07-03 | Veeco Metrology, Inc. | Interferometric measurement of non-homogeneous multi-material surfaces |
TWI336767B (en) | 2007-07-05 | 2011-02-01 | Ind Tech Res Inst | Method for calibration of image and apparatus for acquiring image |
US7619746B2 (en) * | 2007-07-19 | 2009-11-17 | Zygo Corporation | Generating model signals for interferometry |
EP2188587A4 (de) * | 2007-09-13 | 2017-01-18 | Duke University | Vorrichtungen, systeme und verfahren zur interferometrie mit niedriger kohärenz (lci) |
US8072611B2 (en) | 2007-10-12 | 2011-12-06 | Zygo Corporation | Interferometric analysis of under-resolved features |
KR100917912B1 (ko) * | 2007-11-13 | 2009-09-16 | 한국표준과학연구원 | 단일 편광자 초점 타원계측기 |
WO2009064670A2 (en) | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
KR20090049951A (ko) * | 2007-11-14 | 2009-05-19 | 한국표준과학연구원 | 선형 초점 타원계측기 |
FR2923905B1 (fr) * | 2007-11-19 | 2014-09-05 | Centre Nat Etd Spatiales | Procede et dispositif pour l'inversion interferometrique a echantillonnage libre |
WO2009079334A2 (en) | 2007-12-14 | 2009-06-25 | Zygo Corporation | Analyzing surface structure using scanning interferometry |
US20090177094A1 (en) * | 2008-01-08 | 2009-07-09 | Oncoscope, Inc. | Systems and methods for tissue examination, diagnostic, treatment, and/or monitoring |
KR100988454B1 (ko) * | 2008-01-31 | 2010-10-18 | 에스엔유 프리시젼 주식회사 | 두께 측정방법 |
US8248617B2 (en) * | 2008-04-22 | 2012-08-21 | Zygo Corporation | Interferometer for overlay measurements |
US7986412B2 (en) * | 2008-06-03 | 2011-07-26 | Jzw Llc | Interferometric defect detection and classification |
WO2009149103A1 (en) | 2008-06-03 | 2009-12-10 | Jeong Hwan J | Interferometric defect detection and classification |
US7864334B2 (en) * | 2008-06-03 | 2011-01-04 | Jzw Llc | Interferometric defect detection |
JP5336772B2 (ja) | 2008-06-04 | 2013-11-06 | オリンパス株式会社 | 顕微鏡システム、及び、変倍方法 |
BRPI0913786A2 (pt) * | 2008-09-25 | 2015-10-20 | Koninkl Philips Electronics Nv | sistema de detecção e método de detecção |
US8120781B2 (en) | 2008-11-26 | 2012-02-21 | Zygo Corporation | Interferometric systems and methods featuring spectral analysis of unevenly sampled data |
US8130904B2 (en) | 2009-01-29 | 2012-03-06 | The Invention Science Fund I, Llc | Diagnostic delivery service |
US8111809B2 (en) | 2009-01-29 | 2012-02-07 | The Invention Science Fund I, Llc | Diagnostic delivery service |
US8107084B2 (en) * | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
TWI447351B (zh) * | 2009-02-24 | 2014-08-01 | Univ Nat Taipei Technology | 正交偏極式Mirau干涉術以及其分光模組與干涉系統 |
EP2403396B1 (de) | 2009-03-04 | 2019-08-14 | Elie Meimoun | Vorrichtung und verfahren zur überprüfung von wellenfrontanalysen |
JP5087186B1 (ja) * | 2009-06-19 | 2012-11-28 | ザイゴ コーポレーション | 等光路干渉計 |
US8189202B2 (en) * | 2009-08-04 | 2012-05-29 | Zygo Corporation | Interferometer for determining overlay errors |
US8559014B2 (en) * | 2009-09-25 | 2013-10-15 | Hwan J. Jeong | High-resolution, common-path interferometric imaging systems and methods |
TWI408331B (zh) * | 2009-12-17 | 2013-09-11 | Ind Tech Res Inst | 雙面光學膜片量測裝置與方法 |
DE102010015944B4 (de) * | 2010-01-14 | 2016-07-28 | Dusemund Pte. Ltd. | Dünnungsvorrichtung mit einer Nassätzeinrichtung und einer Überwachungsvorrichtung sowie Verfahren für ein in-situ Messen von Waferdicken zum Überwachen eines Dünnens von Halbleiterwafern |
AU2011207444A1 (en) | 2010-01-22 | 2012-08-09 | Duke University | Multiple window processing schemes for spectroscopic optical coherence tomography (OCT) and fourier domain low coherence interferometry |
US9823127B2 (en) | 2010-01-22 | 2017-11-21 | Duke University | Systems and methods for deep spectroscopic imaging of biological samples with use of an interferometer and spectrometer |
TWI398623B (zh) * | 2010-03-11 | 2013-06-11 | Chroma Ate Inc | Measurement method of interference system |
TWI407078B (zh) * | 2010-06-08 | 2013-09-01 | Chung Shan Inst Of Science | Micro - lens array surface profile detection system and its detection method |
KR101174274B1 (ko) | 2010-09-13 | 2012-08-16 | 케이맥(주) | 간섭계와 2차원-반사광도계의 측정이 가능한 복합시편 표면특성 측정장치 |
US8854628B2 (en) | 2010-09-22 | 2014-10-07 | Zygo Corporation | Interferometric methods for metrology of surfaces, films and underresolved structures |
DE102010041556A1 (de) | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung |
TWI448789B (zh) * | 2010-10-07 | 2014-08-11 | Innolux Corp | 光配向製程與使用此光配向製程的液晶顯示裝置 |
US20120089365A1 (en) * | 2010-10-08 | 2012-04-12 | Zygo Corporation | Data interpolation methods for metrology of surfaces, films and underresolved structures |
JP2012122768A (ja) * | 2010-12-06 | 2012-06-28 | National Central Univ | 光学マルチ波長インターフェロメトリーを使用した薄膜素子測定方法 |
JP5794664B2 (ja) * | 2011-01-20 | 2015-10-14 | キヤノン株式会社 | 断層画像生成装置及び断層画像生成方法 |
US9086483B2 (en) | 2011-03-28 | 2015-07-21 | Northrop Grumman Guidance And Electronics Company, Inc. | Systems and methods for detecting and/or identifying materials |
JP5821029B2 (ja) * | 2011-07-22 | 2015-11-24 | パナソニックIpマネジメント株式会社 | 偏光解析装置 |
KR20130028370A (ko) * | 2011-09-09 | 2013-03-19 | 삼성전자주식회사 | 영상 모델링 시스템에서 형상 정보, 재질 정보 및 조명 정보를 획득하는 장치 및 방법 |
TW201326737A (zh) * | 2011-12-30 | 2013-07-01 | Metal Ind Res & Dev Ct | 孔洞表面形貌量測系統及方法 |
JP5965167B2 (ja) | 2012-03-16 | 2016-08-03 | 株式会社ミツトヨ | 白色光干渉測定装置 |
US9121705B2 (en) * | 2012-04-20 | 2015-09-01 | Massachusetts Institute Of Technology | Sensor for simultaneous measurement of thickness and lateral position of a transparent object |
EP2662661A1 (de) * | 2012-05-07 | 2013-11-13 | Leica Geosystems AG | Messgerät mit einem Interferometer und einem ein dichtes Linienspektrum definierenden Absorptionsmedium |
US20130301056A1 (en) * | 2012-05-10 | 2013-11-14 | Robert E. Parks | Noncontact interferometric sensor and method of use |
US8896827B2 (en) | 2012-06-26 | 2014-11-25 | Kla-Tencor Corporation | Diode laser based broad band light sources for wafer inspection tools |
US9036157B2 (en) * | 2012-10-19 | 2015-05-19 | National Applied Research Laboratories | System of computing surface reconstruction, in-plane and out-of-plane displacements and strain distribution |
US9879977B2 (en) | 2012-11-09 | 2018-01-30 | Kla-Tencor Corporation | Apparatus and method for optical metrology with optimized system parameters |
JP2014095642A (ja) * | 2012-11-09 | 2014-05-22 | Mitsutoyo Corp | 干渉対物レンズ光学系及び当該干渉対物レンズ光学系を備えた光干渉測定装置 |
US11099068B2 (en) * | 2016-03-04 | 2021-08-24 | Filmetrics, Inc. | Optical instrumentation including a spatially variable filter |
US20180252518A1 (en) * | 2013-01-16 | 2018-09-06 | Scott A. Chalmers | Optical profilometer |
US20170314914A1 (en) * | 2016-04-28 | 2017-11-02 | Scott A. Chalmers | Optical profilometer |
EP2965039A4 (de) * | 2013-03-07 | 2016-11-02 | Univ Nanyang Tech | Optische bildgebungsvorrichtung und verfahren zur abbildung einer probe |
US9909982B2 (en) * | 2013-03-08 | 2018-03-06 | Kla-Tencor Corporation | Pupil plane calibration for scatterometry overlay measurement |
WO2014138522A1 (en) * | 2013-03-08 | 2014-09-12 | Kla-Tencor Corporation | Pupil plane calibration for scatterometry overlay measurement |
DE102013005187A1 (de) * | 2013-03-20 | 2014-09-25 | Carl Zeiss Microscopy Gmbh | Verfahren zur Ermittlung von Rauheit- und/oder Topographiedaten von Oberflächen in der Materialmikroskopie |
DE102013205115A1 (de) * | 2013-03-22 | 2014-09-25 | Leica Microsystems Cms Gmbh | SPIM-Anordnung |
US9619878B2 (en) * | 2013-04-16 | 2017-04-11 | Kla-Tencor Corporation | Inspecting high-resolution photolithography masks |
JP2015031649A (ja) | 2013-08-06 | 2015-02-16 | セイコーエプソン株式会社 | 測色装置 |
KR102102020B1 (ko) * | 2013-08-09 | 2020-04-17 | 케이엘에이 코포레이션 | 향상된 검출 감도를 위한 멀티 스팟 조명 |
US9857160B1 (en) | 2013-09-24 | 2018-01-02 | TVS Holdings, LLC | Multi-mode frequency sweeping interferometer and method of using same |
KR101479249B1 (ko) * | 2013-11-08 | 2015-01-05 | 한국표준과학연구원 | 간섭성 구조조명 이미징 방법 및 간섭성 구조조명 현미경 시스템 |
US9851433B2 (en) | 2013-12-19 | 2017-12-26 | DSCG Solutions, Inc. | Single laser LIDAR system |
EP3092459B1 (de) | 2014-01-09 | 2018-05-02 | Zygo Corporation | Messung der topografie von asphärischen und anderen nicht-ebenen flächen |
US9335146B1 (en) | 2014-01-29 | 2016-05-10 | The United States Of America As Represented By The Secretary Of The Navy | Dimensional measurement apparatus for a cylindrical object |
US9651356B1 (en) | 2014-01-29 | 2017-05-16 | The United States Of America As Represented By The Secretary Of The Navy | Measuremental evaluation of dimensional tolerancing compliance of a cylindrical object |
ES2662124T3 (es) * | 2014-02-21 | 2018-04-05 | Abb Schweiz Ag | Sensor interferométrico |
TWI479119B (zh) * | 2014-03-06 | 2015-04-01 | Nat Univ Chung Hsing | Optical measuring device and optical measuring method |
KR102345196B1 (ko) * | 2014-04-07 | 2021-12-29 | 노바 메주어링 인스트루먼츠 엘티디. | 광학 위상 측정 방법 및 시스템 |
WO2015183994A1 (en) | 2014-05-28 | 2015-12-03 | Santec Corporation | Non-invasive optical measurement of blood analyte |
CN104034271B (zh) * | 2014-06-19 | 2016-08-24 | 清华大学 | 一种横向分辨率达到1nm的干涉旋转映射检测方法 |
TWI599758B (zh) * | 2014-08-12 | 2017-09-21 | 賽格股份有限公司 | 校正掃描干涉術成像系統之方法、掃描干涉術成像系統、非暫態電腦可讀取媒體、以及校正具有寬頻光源之掃描干涉術成像系統之方法 |
GB2529251A (en) * | 2014-08-15 | 2016-02-17 | Taylor Hobson Ltd | Apparatus for and a method of determining a characteristic of a sample |
KR101711192B1 (ko) | 2014-08-19 | 2017-03-14 | 삼성전자 주식회사 | 전기-광학 변조기, 및 그 전기-광학 변조기를 포함한 검사 장치 |
US9976947B1 (en) | 2014-11-24 | 2018-05-22 | TVS Holdings, LLC | Position measurement device |
EP3588061B1 (de) | 2014-12-23 | 2023-04-19 | Apple Inc. | Optisches untersuchungssystem und verfahren mit berücksichtigung von unterschieden in den optischen weglängen innerhalb einer probe |
US10548520B2 (en) | 2015-04-01 | 2020-02-04 | Santec Corporation | Non-invasive optical measurement of blood analyte |
WO2016183210A1 (en) * | 2015-05-11 | 2016-11-17 | Board Of Regents, The University Of Texas System | Optical-coherence-tomography guided additive manufacturing and laser ablation of 3d-printed parts |
JP6713149B2 (ja) | 2015-06-01 | 2020-06-24 | サンテック株式会社 | 2つの波長を合成する光コヒーレンストモグラフィーシステム |
EP3317651A1 (de) * | 2015-06-30 | 2018-05-09 | Corning Incorporated | Interferometrische abrollmessung mit statischem streifenmuster |
KR102615932B1 (ko) | 2015-09-01 | 2023-12-21 | 애플 인크. | 물질의 비접촉 감지를 위한 레퍼런스 스위치 아키텍처 |
WO2017053812A1 (en) | 2015-09-23 | 2017-03-30 | Kla-Tencor Corporation | Method and system for focus adjustment a multi-beam scanning electron microscopy system |
DE102015118483B3 (de) * | 2015-10-29 | 2017-05-04 | Leica Microsystems Cms Gmbh | Interferenzobjektiv nach Mirau |
US9574992B1 (en) * | 2016-01-22 | 2017-02-21 | Kla-Tencor Corporation | Single wavelength ellipsometry with improved spot size capability |
JP6692658B2 (ja) * | 2016-02-25 | 2020-05-13 | 株式会社ミツトヨ | 内壁測定装置及びオフセット量算出方法 |
GB2550539A (en) | 2016-03-21 | 2017-11-29 | Res Center Pharmaceutical Engineering Gmbh | Monitoring dissolution of a dosage form in progress during dissolution by low coherence interferometry |
US10107615B2 (en) | 2016-04-20 | 2018-10-23 | Quality Vision International, Inc. | Remote probe for optical measuring machine |
CN114719977A (zh) | 2016-04-21 | 2022-07-08 | 苹果公司 | 用于参考切换的光学系统 |
US10677580B2 (en) | 2016-04-27 | 2020-06-09 | Santec Corporation | Optical coherence tomography system using polarization switching |
GB2551968A (en) | 2016-06-28 | 2018-01-10 | Oclaro Tech Ltd | Optical locker |
JP6767790B2 (ja) * | 2016-06-30 | 2020-10-14 | 株式会社ディスコ | 計測装置及び色収差光学系 |
US9993153B2 (en) | 2016-07-06 | 2018-06-12 | Santec Corporation | Optical coherence tomography system and method with multiple apertures |
JP6730125B2 (ja) * | 2016-08-01 | 2020-07-29 | 株式会社ディスコ | 計測装置 |
JP6730124B2 (ja) * | 2016-08-01 | 2020-07-29 | 株式会社ディスコ | 厚み計測装置 |
US10890428B2 (en) * | 2016-11-18 | 2021-01-12 | Zygo Corporation | Interferometric method and apparatus using calibration information relating a focus setting to a test object position |
US10288408B2 (en) * | 2016-12-01 | 2019-05-14 | Nanometrics Incorporated | Scanning white-light interferometry system for characterization of patterned semiconductor features |
JP6905357B2 (ja) * | 2017-03-09 | 2021-07-21 | 株式会社ディスコ | ウエーハのうねり検出方法及び研削装置 |
US10107614B1 (en) | 2017-04-18 | 2018-10-23 | Quality Vision International, Inc. | Optical pen for interferometric measuring machine |
US10422700B1 (en) * | 2017-04-24 | 2019-09-24 | Apre Instruments, Inc. | Optical alignment based on spectrally-controlled interferometry |
US10426337B2 (en) | 2017-06-01 | 2019-10-01 | Santec Corporation | Flow imaging in an optical coherence tomography (OCT) system |
US10408600B2 (en) * | 2017-06-22 | 2019-09-10 | Santec Corporation | Optical coherence tomography with a fizeau-type interferometer |
US10206567B2 (en) | 2017-07-12 | 2019-02-19 | Santec Corporation | Dual wavelength resampling system and method |
DE102017115922C5 (de) * | 2017-07-14 | 2023-03-23 | Precitec Gmbh & Co. Kg | Verfahren und Vorrichtung zur Messung und Einstellung eines Abstands zwischen einem Bearbeitungskopf und einem Werkstück sowie dazugehöriges Verfahren zur Regelung |
US10705105B2 (en) | 2017-07-21 | 2020-07-07 | Applied Concepts, Inc. | Absolute speed detector |
US11579080B2 (en) | 2017-09-29 | 2023-02-14 | Apple Inc. | Resolve path optical sampling architectures |
US10948284B1 (en) * | 2017-10-06 | 2021-03-16 | Filmetrics, Inc. | Optical profilometer with color outputs |
US10502546B2 (en) | 2017-11-07 | 2019-12-10 | Santec Corporation | Systems and methods for variable-range fourier domain imaging |
WO2019160949A1 (en) | 2018-02-13 | 2019-08-22 | Masseta Technologies Llc | Integrated photonics device having integrated edge outcouplers |
US11213200B2 (en) | 2018-03-22 | 2022-01-04 | Santec Corporation | Topographical imaging using combined sensing inputs |
US10838047B2 (en) | 2018-04-17 | 2020-11-17 | Santec Corporation | Systems and methods for LIDAR scanning of an environment over a sweep of wavelengths |
US11067671B2 (en) | 2018-04-17 | 2021-07-20 | Santec Corporation | LIDAR sensing arrangements |
US11262191B1 (en) * | 2018-07-12 | 2022-03-01 | Onto Innovation Inc. | On-axis dynamic interferometer and optical imaging systems employing the same |
KR102613120B1 (ko) * | 2018-07-16 | 2023-12-13 | 막스-플랑크-게젤샤프트 츄어 푀르더룽 데어 비쎈샤프텐 에.파우. | 전자기장의 수색성 간섭 중첩을 이용한 간섭법 |
DE102018211853A1 (de) | 2018-07-17 | 2020-01-23 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
US10295476B1 (en) * | 2018-08-14 | 2019-05-21 | Applied Materials Israel Ltd. | System and method for multiple mode inspection of a sample |
JP2020122930A (ja) * | 2019-01-31 | 2020-08-13 | キヤノン株式会社 | 計測装置、露光装置及び物品の製造方法 |
JP7296844B2 (ja) * | 2019-10-08 | 2023-06-23 | 株式会社ミツトヨ | 解析装置、解析方法、干渉測定システム、およびプログラム |
US11507020B2 (en) | 2019-11-14 | 2022-11-22 | Industrial Technology Research Institute | Optical measurement system for obtaining and analyzing surface topography of object |
TWI733442B (zh) * | 2019-11-14 | 2021-07-11 | 財團法人工業技術研究院 | 光學量測系統 |
JP7469867B2 (ja) * | 2019-11-26 | 2024-04-17 | 三星電子株式会社 | エリプソメータ及び半導体装置の検査装置 |
JP7277610B2 (ja) * | 2019-12-12 | 2023-05-19 | 株式会社エビデント | 試料構造測定装置及び試料構造測定方法 |
US11530952B2 (en) | 2020-01-17 | 2022-12-20 | Spectrove Inc. | MEMS device for interferometric spectroscopy |
JP7420667B2 (ja) | 2020-07-03 | 2024-01-23 | 三星電子株式会社 | エリプソメータ及び半導体装置の検査装置 |
JP7471938B2 (ja) | 2020-07-03 | 2024-04-22 | 三星電子株式会社 | エリプソメータ及び半導体装置の検査装置 |
KR20220032922A (ko) | 2020-09-08 | 2022-03-15 | 삼성전자주식회사 | 퓨필 타원 편광 계측 장치 및 방법, 및 그 방법을 이용한 반도체 소자 제조방법 |
WO2022056142A1 (en) | 2020-09-09 | 2022-03-17 | Apple Inc. | Optical system for noise mitigation |
KR102305193B1 (ko) * | 2021-01-28 | 2021-09-27 | 에이치비솔루션(주) | 백색광주사간섭계를 이용한 투명막 굴절률 측정 방법 |
US11761753B2 (en) | 2021-07-30 | 2023-09-19 | Svarog LLC | Thin films and surface topography measurement using polarization resolved interferometry |
US20230236125A1 (en) * | 2022-01-21 | 2023-07-27 | Onto Innovation Inc. | Dynamic phase-shift interferometer utilizing a synchronous optical frequency-shift |
TWI827032B (zh) * | 2022-04-30 | 2023-12-21 | 合盈光電科技股份有限公司 | 光學元件相位疊合系統 |
Family Cites Families (189)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2612074A (en) | 1949-03-30 | 1952-09-30 | Prec Mecanique Paris Soc | Interferometer |
US4199219A (en) * | 1977-04-22 | 1980-04-22 | Canon Kabushiki Kaisha | Device for scanning an object with a light beam |
US4188122A (en) * | 1978-03-27 | 1980-02-12 | Rockwell International Corporation | Interferometer |
US4340306A (en) | 1980-02-04 | 1982-07-20 | Balasubramanian N | Optical system for surface topography measurement |
US4355903A (en) * | 1980-02-08 | 1982-10-26 | Rca Corporation | Thin film thickness monitor |
DE3145633A1 (de) * | 1981-11-17 | 1983-08-11 | Byk-Mallinckrodt Chemische Produkte Gmbh, 4230 Wesel | Vorrichtung zur farbmessung |
JPS58208610A (ja) * | 1982-05-17 | 1983-12-05 | ブリティッシュ・テクノロジー・グループ・リミテッド | 物体の表面検査装置 |
US4523846A (en) | 1982-09-10 | 1985-06-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Integrated optics in an electrically scanned imaging Fourier transform spectrometer |
JPS60127403A (ja) * | 1983-12-13 | 1985-07-08 | Anritsu Corp | 厚み測定装置 |
US4618262A (en) | 1984-04-13 | 1986-10-21 | Applied Materials, Inc. | Laser interferometer system and method for monitoring and controlling IC processing |
US4710642A (en) * | 1985-08-20 | 1987-12-01 | Mcneil John R | Optical scatterometer having improved sensitivity and bandwidth |
US4639139A (en) | 1985-09-27 | 1987-01-27 | Wyko Corporation | Optical profiler using improved phase shifting interferometry |
US4818110A (en) * | 1986-05-06 | 1989-04-04 | Kla Instruments Corporation | Method and apparatus of using a two beam interference microscope for inspection of integrated circuits and the like |
US4806018A (en) * | 1987-07-06 | 1989-02-21 | The Boeing Company | Angular reflectance sensor |
US4869593A (en) | 1988-04-22 | 1989-09-26 | Zygo Corporation | Interferometric surface profiler |
US4923301A (en) | 1988-05-26 | 1990-05-08 | American Telephone And Telegraph Company | Alignment of lithographic system |
US5151752A (en) * | 1988-06-16 | 1992-09-29 | Asahi Kogaku Kogyo K.K. | Method of measuring refractive indices of lens and sample liquid |
US4964726A (en) * | 1988-09-27 | 1990-10-23 | General Electric Company | Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy |
US4948253A (en) | 1988-10-28 | 1990-08-14 | Zygo Corporation | Interferometric surface profiler for spherical surfaces |
GB8903725D0 (en) * | 1989-02-18 | 1989-04-05 | Cambridge Consultants | Coherent tracking sensor |
US5042949A (en) | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
US5042951A (en) | 1989-09-19 | 1991-08-27 | Therma-Wave, Inc. | High resolution ellipsometric apparatus |
US4999014A (en) | 1989-05-04 | 1991-03-12 | Therma-Wave, Inc. | Method and apparatus for measuring thickness of thin films |
US5073018A (en) | 1989-10-04 | 1991-12-17 | The Board Of Trustees Of The Leland Stanford Junior University | Correlation microscope |
DE3942896A1 (de) | 1989-12-23 | 1991-06-27 | Zeiss Carl Fa | Interferometrischer sensor zur messung von abstandsaenderungen einer kleinen flaeche |
US5112129A (en) * | 1990-03-02 | 1992-05-12 | Kla Instruments Corporation | Method of image enhancement for the coherence probe microscope with applications to integrated circuit metrology |
US5135307A (en) | 1990-05-30 | 1992-08-04 | Hughes Danbury Optical System, Inc. | Laser diode interferometer |
US5241369A (en) | 1990-10-01 | 1993-08-31 | Mcneil John R | Two-dimensional optical scatterometer apparatus and process |
EP0566657B1 (de) * | 1991-01-11 | 1998-08-05 | Rudolph Research Corporation | Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode |
US5129724A (en) * | 1991-01-29 | 1992-07-14 | Wyko Corporation | Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample |
US5164790A (en) * | 1991-02-27 | 1992-11-17 | Mcneil John R | Simple CD measurement of periodic structures on photomasks |
EP0502679B1 (de) | 1991-03-04 | 2001-03-07 | AT&T Corp. | Herstellungsverfahren von integrierten Halbleiterschaltungen unter Anwendung von latenten Bildern |
DE4108944A1 (de) | 1991-03-19 | 1992-09-24 | Haeusler Gerd | Verfahren und einrichtung zur beruehrungslosen erfassung der oberflaechengestalt von diffus streuenden objekten |
US5153669A (en) | 1991-03-27 | 1992-10-06 | Hughes Danbury Optical Systems, Inc. | Three wavelength optical measurement apparatus and method |
JPH04313006A (ja) * | 1991-04-10 | 1992-11-05 | Toyobo Co Ltd | 膜厚測定方法 |
US5194918A (en) * | 1991-05-14 | 1993-03-16 | The Board Of Trustees Of The Leland Stanford Junior University | Method of providing images of surfaces with a correlation microscope by transforming interference signals |
US5173746A (en) | 1991-05-21 | 1992-12-22 | Wyko Corporation | Method for rapid, accurate measurement of step heights between dissimilar materials |
US5133601A (en) * | 1991-06-12 | 1992-07-28 | Wyko Corporation | Rough surface profiler and method |
US5204734A (en) * | 1991-06-12 | 1993-04-20 | Wyko Corporation | Rough surface profiler and method |
JPH05304627A (ja) | 1991-08-19 | 1993-11-16 | Fuji Photo Film Co Ltd | ビデオカメラのサイドグリップ |
US5181080A (en) | 1991-12-23 | 1993-01-19 | Therma-Wave, Inc. | Method and apparatus for evaluating the thickness of thin films |
US5390023A (en) | 1992-06-03 | 1995-02-14 | Zygo Corporation | Interferometric method and apparatus to measure surface topography |
US5402234A (en) | 1992-08-31 | 1995-03-28 | Zygo Corporation | Method and apparatus for the rapid acquisition of data in coherence scanning interferometry |
US5539571A (en) * | 1992-09-21 | 1996-07-23 | Sdl, Inc. | Differentially pumped optical amplifer and mopa device |
US5384717A (en) * | 1992-11-23 | 1995-01-24 | Ford Motor Company | Non-contact method of obtaining dimensional information about an object |
US5398113A (en) * | 1993-02-08 | 1995-03-14 | Zygo Corporation | Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms |
US5777742A (en) | 1993-03-11 | 1998-07-07 | Environmental Research Institute Of Michigan | System and method for holographic imaging with discernible image of an object |
DE4309056B4 (de) | 1993-03-20 | 2006-05-24 | Häusler, Gerd, Prof. Dr. | Verfahren und Vorrichtung zur Ermittlung der Entfernung und Streuintensität von streuenden Punkten |
US5386119A (en) | 1993-03-25 | 1995-01-31 | Hughes Aircraft Company | Apparatus and method for thick wafer measurement |
JPH074922A (ja) | 1993-06-21 | 1995-01-10 | Jasco Corp | 半導体多層薄膜膜厚測定装置およびその測定方法 |
EP0767361B1 (de) | 1993-07-22 | 2000-02-23 | Applied Spectral Imaging Ltd. | Verfahren und Vorrichtung zur Spektralen Bilderfassung |
US5856871A (en) * | 1993-08-18 | 1999-01-05 | Applied Spectral Imaging Ltd. | Film thickness mapping using interferometric spectral imaging |
US5481811A (en) | 1993-11-22 | 1996-01-09 | The Budd Company | Universal inspection workpiece holder |
US5483064A (en) * | 1994-01-21 | 1996-01-09 | Wyko Corporation | Positioning mechanism and method for providing coaxial alignment of a probe and a scanning means in scanning tunneling and scanning force microscopy |
US5459564A (en) * | 1994-02-18 | 1995-10-17 | Chivers; James T. | Apparatus and method for inspecting end faces of optical fibers and optical fiber connectors |
US5471303A (en) | 1994-04-29 | 1995-11-28 | Wyko Corporation | Combination of white-light scanning and phase-shifting interferometry for surface profile measurements |
US5633714A (en) * | 1994-12-19 | 1997-05-27 | International Business Machines Corporation | Preprocessing of image amplitude and phase data for CD and OL measurement |
US5555471A (en) | 1995-05-24 | 1996-09-10 | Wyko Corporation | Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shifting interferometry |
US5589938A (en) * | 1995-07-10 | 1996-12-31 | Zygo Corporation | Method and apparatus for optical interferometric measurements with reduced sensitivity to vibration |
US5703692A (en) | 1995-08-03 | 1997-12-30 | Bio-Rad Laboratories, Inc. | Lens scatterometer system employing source light beam scanning means |
US5748318A (en) | 1996-01-23 | 1998-05-05 | Brown University Research Foundation | Optical stress generator and detector |
US5602643A (en) * | 1996-02-07 | 1997-02-11 | Wyko Corporation | Method and apparatus for correcting surface profiles determined by phase-shifting interferometry according to optical parameters of test surface |
US5640270A (en) | 1996-03-11 | 1997-06-17 | Wyko Corporation | Orthogonal-scanning microscope objective for vertical-scanning and phase-shifting interferometry |
GB9610471D0 (en) * | 1996-05-18 | 1996-07-24 | Univ Nottingham | Optical measurement |
US5880838A (en) * | 1996-06-05 | 1999-03-09 | California Institute Of California | System and method for optically measuring a structure |
JP3459327B2 (ja) | 1996-06-17 | 2003-10-20 | 理化学研究所 | 積層構造体の層厚および屈折率の測定方法およびその測定装置 |
US5923423A (en) * | 1996-09-12 | 1999-07-13 | Sentec Corporation | Heterodyne scatterometer for detecting and analyzing wafer surface defects |
US5956141A (en) | 1996-09-13 | 1999-09-21 | Olympus Optical Co., Ltd. | Focus adjusting method and shape measuring device and interference microscope using said focus adjusting method |
US5757502A (en) * | 1996-10-02 | 1998-05-26 | Vlsi Technology, Inc. | Method and a system for film thickness sample assisted surface profilometry |
US5774224A (en) * | 1997-01-24 | 1998-06-30 | International Business Machines Corporation | Linear-scanning, oblique-viewing optical apparatus |
US5777740A (en) * | 1997-02-27 | 1998-07-07 | Phase Metrics | Combined interferometer/polarimeter |
US5867276A (en) * | 1997-03-07 | 1999-02-02 | Bio-Rad Laboratories, Inc. | Method for broad wavelength scatterometry |
US5784164A (en) | 1997-03-20 | 1998-07-21 | Zygo Corporation | Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means |
JP3275797B2 (ja) | 1997-09-10 | 2002-04-22 | 松下電器産業株式会社 | 低圧水銀蒸気放電ランプ |
US20020015146A1 (en) * | 1997-09-22 | 2002-02-07 | Meeks Steven W. | Combined high speed optical profilometer and ellipsometer |
US6392749B1 (en) * | 1997-09-22 | 2002-05-21 | Candela Instruments | High speed optical profilometer for measuring surface height variation |
US6031615A (en) * | 1997-09-22 | 2000-02-29 | Candela Instruments | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness |
US6665078B1 (en) | 1997-09-22 | 2003-12-16 | Candela Instruments | System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers |
US5912741A (en) * | 1997-10-10 | 1999-06-15 | Northrop Grumman Corporation | Imaging scatterometer |
US5963329A (en) | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
US5900633A (en) * | 1997-12-15 | 1999-05-04 | On-Line Technologies, Inc | Spectrometric method for analysis of film thickness and composition on a patterned sample |
US6124141A (en) | 1998-01-07 | 2000-09-26 | International Business Machines Corporation | Non-destructive method and device for measuring the depth of a buried interface |
US6028670A (en) * | 1998-01-19 | 2000-02-22 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US5953124A (en) | 1998-01-19 | 1999-09-14 | Zygo Corporation | Interferometric methods and systems using low coherence illumination |
US6407816B1 (en) | 1998-02-23 | 2002-06-18 | Zygo Corporation | Interferometer and method for measuring the refractive index and optical path length effects of air |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
DE19814057B4 (de) * | 1998-03-30 | 2009-01-02 | Carl Zeiss Meditec Ag | Anordnung zur optischen Kohärenztomographie und Kohärenztopographie |
US6242739B1 (en) * | 1998-04-21 | 2001-06-05 | Alexander P. Cherkassky | Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry |
US6275297B1 (en) | 1998-08-19 | 2001-08-14 | Sc Technology | Method of measuring depths of structures on a semiconductor substrate |
USH1972H1 (en) * | 1998-10-06 | 2001-07-03 | Nikon Corporation | Autofocus system using common path interferometry |
JP2000121317A (ja) | 1998-10-12 | 2000-04-28 | Hitachi Electronics Eng Co Ltd | 光干渉計の干渉位相検出方式 |
US6159073A (en) * | 1998-11-02 | 2000-12-12 | Applied Materials, Inc. | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing |
JP3569726B2 (ja) | 1998-12-15 | 2004-09-29 | 独立行政法人理化学研究所 | 試料の幾何学的厚さおよび屈折率測定装置およびその測定方法 |
US6184984B1 (en) | 1999-02-09 | 2001-02-06 | Kla-Tencor Corporation | System for measuring polarimetric spectrum and other properties of a sample |
KR100290086B1 (ko) | 1999-03-23 | 2001-05-15 | 윤덕용 | 백색광주사간섭법을 이용한 투명한 박막층의 3차원 두께 형상 측정 및 굴절률 측정 방법 및 그 기록매체 |
US6449066B1 (en) | 1999-04-29 | 2002-09-10 | Kaiser Optical Systems, Inc. | Polarization insensitive, high dispersion optical element |
US6888638B1 (en) | 1999-05-05 | 2005-05-03 | Zygo Corporation | Interferometry system having a dynamic beam steering assembly for measuring angle and distance |
TW477897B (en) * | 1999-05-07 | 2002-03-01 | Sharp Kk | Liquid crystal display device, method and device to measure cell thickness of liquid crystal display device, and phase difference plate using the method thereof |
US6507405B1 (en) * | 1999-05-17 | 2003-01-14 | Ultratech Stepper, Inc. | Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
US6249351B1 (en) | 1999-06-03 | 2001-06-19 | Zygo Corporation | Grazing incidence interferometer and method |
US6381009B1 (en) | 1999-06-29 | 2002-04-30 | Nanometrics Incorporated | Elemental concentration measuring methods and instruments |
US6160621A (en) | 1999-09-30 | 2000-12-12 | Lam Research Corporation | Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
US6259521B1 (en) | 1999-10-05 | 2001-07-10 | Advanced Micro Devices, Inc. | Method and apparatus for controlling photolithography parameters based on photoresist images |
JP3642996B2 (ja) | 1999-11-18 | 2005-04-27 | 独立行政法人科学技術振興機構 | 光干渉法による測定対象物の屈折率と厚さの同時測定方法及びそのための装置 |
US6545761B1 (en) * | 1999-11-30 | 2003-04-08 | Veeco Instruments, Inc. | Embedded interferometer for reference-mirror calibration of interferometric microscope |
AU2001260975A1 (en) | 2000-01-25 | 2001-08-20 | Zygo Corporation | Optical systems for measuring form and geometric dimensions of precision engineered parts |
JP4673955B2 (ja) | 2000-03-24 | 2011-04-20 | オリンパス株式会社 | 光学装置 |
US6429943B1 (en) * | 2000-03-29 | 2002-08-06 | Therma-Wave, Inc. | Critical dimension analysis with simultaneous multiple angle of incidence measurements |
LU90580B1 (fr) * | 2000-05-08 | 2001-11-09 | Europ Economic Community | M-thode d'identification d'un objet |
US6449048B1 (en) | 2000-05-11 | 2002-09-10 | Veeco Instruments, Inc. | Lateral-scanning interferometer with tilted optical axis |
US6597460B2 (en) * | 2000-05-19 | 2003-07-22 | Zygo Corporation | Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum |
US6417109B1 (en) | 2000-07-26 | 2002-07-09 | Aiwa Co., Ltd. | Chemical-mechanical etch (CME) method for patterned etching of a substrate surface |
EP1303778A2 (de) | 2000-07-27 | 2003-04-23 | Zetetic Institute | Differentiell-interferometrische konfokale nahfeld-rastermikroskopie |
EP1373959A2 (de) | 2000-07-27 | 2004-01-02 | Zetetic Institute | Mehrfachquellenanordnungen mit resonanzhohlräumen für verbesserte optische transmission |
US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
JP2002093094A (ja) * | 2000-09-11 | 2002-03-29 | Hitachi Electronics Eng Co Ltd | 磁気ヘッド浮上量測定装置 |
US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
US6694284B1 (en) | 2000-09-20 | 2004-02-17 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least four properties of a specimen |
US6950196B2 (en) | 2000-09-20 | 2005-09-27 | Kla-Tencor Technologies Corp. | Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
US6798511B1 (en) | 2000-10-18 | 2004-09-28 | Regents Of The University Of Minnesota | Imaging ellipsometry |
DE60141848D1 (de) * | 2000-11-02 | 2010-05-27 | Zygo Corp | Verfahren und vorrichtung zur höhenabtastenden interferometrie mit phasendifferenz-analyse |
US6633389B1 (en) | 2000-11-28 | 2003-10-14 | Nanometrics Incorporated | Profiling method |
US6909509B2 (en) | 2001-02-20 | 2005-06-21 | Zygo Corporation | Optical surface profiling systems |
US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
US6624894B2 (en) * | 2001-06-25 | 2003-09-23 | Veeco Instruments Inc. | Scanning interferometry with reference signal |
US7382447B2 (en) * | 2001-06-26 | 2008-06-03 | Kla-Tencor Technologies Corporation | Method for determining lithographic focus and exposure |
US6867866B1 (en) | 2001-08-10 | 2005-03-15 | Therma-Wave, Inc. | CD metrology analysis using green's function |
US6741357B2 (en) | 2001-08-14 | 2004-05-25 | Seagate Technology Llc | Quadrature phase shift interferometer with unwrapping of phase |
US7286242B2 (en) * | 2001-09-21 | 2007-10-23 | Kmac | Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same |
US6714307B2 (en) | 2001-10-16 | 2004-03-30 | Zygo Corporation | Measurement of complex surface shapes using a spherical wavefront |
KR100437024B1 (ko) * | 2001-10-18 | 2004-06-23 | 엘지전자 주식회사 | 박막 검사 방법 및 그 장치 |
US6630982B2 (en) * | 2001-10-18 | 2003-10-07 | Motorola, Inc. | Color and intensity tunable liquid crystal device |
KR100354613B1 (ko) * | 2001-11-06 | 2002-10-11 | 박헌휘 | 교체 가능한 침지형 중공사막 모듈 |
US7030995B2 (en) * | 2001-12-10 | 2006-04-18 | Zygo Corporation | Apparatus and method for mechanical phase shifting interferometry |
US6856384B1 (en) | 2001-12-13 | 2005-02-15 | Nanometrics Incorporated | Optical metrology system with combined interferometer and ellipsometer |
US6934035B2 (en) * | 2001-12-18 | 2005-08-23 | Massachusetts Institute Of Technology | System and method for measuring optical distance |
KR100434445B1 (ko) * | 2001-12-28 | 2004-06-04 | (주) 인텍플러스 | 3차원 형상/표면조도 측정장치 |
GB2385417B (en) | 2002-03-14 | 2004-01-21 | Taylor Hobson Ltd | Surface profiling apparatus |
US7385707B2 (en) | 2002-03-14 | 2008-06-10 | Taylor Hobson Limited | Surface profiling apparatus |
US7068376B2 (en) * | 2002-04-19 | 2006-06-27 | Zygo Corporation | Interferometry method and apparatus for producing lateral metrology images |
JP2005524832A (ja) | 2002-05-02 | 2005-08-18 | ザイゴ コーポレーション | 走査干渉計用位相ずれ分析 |
WO2003106921A1 (en) * | 2002-06-17 | 2003-12-24 | Zygo Corporation | Interferometric optical system and methods providing simultaneously scanned optical path length and focus |
JP2005530146A (ja) * | 2002-06-17 | 2005-10-06 | ザイゴ コーポレーション | 分散光源と共に使用するための結合空洞構造を有する干渉測定方法およびシステム |
WO2004003463A2 (en) * | 2002-07-01 | 2004-01-08 | Lightgage, Inc. | Interferometer system of compact configuration |
JP2004069651A (ja) * | 2002-08-09 | 2004-03-04 | Omron Corp | 膜厚測定装置 |
JP4313006B2 (ja) | 2002-08-30 | 2009-08-12 | コニカミノルタビジネステクノロジーズ株式会社 | 画像形成方法 |
KR101223195B1 (ko) * | 2002-09-09 | 2013-01-21 | 지고 코포레이션 | 박막 구조의 특징화를 포함하여, 타원편광 측정, 반사 측정 및 산란 측정을 위한 간섭측정 방법 및 장치 |
US7139081B2 (en) * | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
US7869057B2 (en) * | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
US6925860B1 (en) | 2003-02-21 | 2005-08-09 | Nanometrics Incorporated | Leveling a measured height profile |
US7271918B2 (en) | 2003-03-06 | 2007-09-18 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
US7106454B2 (en) * | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
WO2004079294A2 (en) * | 2003-03-06 | 2004-09-16 | Zygo Corporation | Characterizing and profiling complex surface structures using scanning interferometry |
US7324214B2 (en) | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
US6985232B2 (en) | 2003-03-13 | 2006-01-10 | Tokyo Electron Limited | Scatterometry by phase sensitive reflectometer |
US7049156B2 (en) * | 2003-03-19 | 2006-05-23 | Verity Instruments, Inc. | System and method for in-situ monitor and control of film thickness and trench depth |
US6999180B1 (en) * | 2003-04-02 | 2006-02-14 | Kla-Tencor Technologies Corporation | Optical film topography and thickness measurement |
DE10327019A1 (de) | 2003-06-12 | 2004-12-30 | Carl Zeiss Sms Gmbh | Verfahren zur Bestimmung der Abbildungsgüte eines optischen Abbildungssystems |
US7102761B2 (en) | 2003-06-13 | 2006-09-05 | Zygo Corporation | Scanning interferometry |
US6956716B2 (en) | 2003-07-30 | 2005-10-18 | Hitachi Global Storage Technologies Netherlands, B.V. | Magnetic head having multilayer heater for thermally assisted write head and method of fabrication thereof |
FI20031143A0 (fi) | 2003-08-08 | 2003-08-08 | Wallac Oy | Optinen fokusointimenetelmä ja -järjestely |
US7061623B2 (en) * | 2003-08-25 | 2006-06-13 | Spectel Research Corporation | Interferometric back focal plane scatterometry with Koehler illumination |
KR101185473B1 (ko) * | 2003-09-15 | 2012-10-02 | 지고 코포레이션 | 표면에 대한 간섭 측정의 분석 |
TWI335417B (en) * | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
JP4790632B2 (ja) * | 2004-01-06 | 2011-10-12 | ザイゴ コーポレーション | 多軸干渉計ならびに多軸干渉計を用いる方法およびシステム |
US20050179911A1 (en) * | 2004-02-17 | 2005-08-18 | Digital Optics Corporation | Aspheric diffractive reference for interferometric lens metrology |
US7492469B2 (en) | 2004-03-15 | 2009-02-17 | Zygo Corporation | Interferometry systems and methods using spatial carrier fringes |
US7286243B2 (en) * | 2004-04-19 | 2007-10-23 | Arist Instruments, Inc. | Beam profile complex reflectance system and method for thin film and critical dimension measurements |
US7277183B2 (en) * | 2004-04-22 | 2007-10-02 | Zygo Corporation | Vibration resistant interferometry |
US7177030B2 (en) * | 2004-04-22 | 2007-02-13 | Technion Research And Development Foundation Ltd. | Determination of thin film topography |
WO2005114096A2 (en) | 2004-05-18 | 2005-12-01 | Zygo Corporation | Methods and systems for determining optical properties using low-coherence interference signals |
US7119909B2 (en) | 2004-06-16 | 2006-10-10 | Veeco Instruments, Inc. | Film thickness and boundary characterization by interferometric profilometry |
US20060012582A1 (en) * | 2004-07-15 | 2006-01-19 | De Lega Xavier C | Transparent film measurements |
US20060066842A1 (en) * | 2004-09-30 | 2006-03-30 | Saunders Winston A | Wafer inspection with a customized reflective optical channel component |
EP1853874B1 (de) * | 2005-01-20 | 2009-09-02 | Zygo Corporation | Interferometer zur bestimmung von eigenschaften einer objektoberfläche |
US7884947B2 (en) * | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
JP2006214856A (ja) | 2005-02-03 | 2006-08-17 | Canon Inc | 測定装置及び方法 |
EP1883781B1 (de) | 2005-05-19 | 2019-08-07 | Zygo Corporation | Verfahren und system zum ausmessen von dünnschichtstrukturen mittels niedrigkohärenzinterferometrie |
US7595891B2 (en) * | 2005-07-09 | 2009-09-29 | Kla-Tencor Corporation | Measurement of the top surface of an object with/without transparent thin films in white light interferometry |
EP1946412A2 (de) | 2005-10-11 | 2008-07-23 | Clear Align LLC | Vorrichtung und verfahren zur erzeugung kurzer optischer impulse |
US7636168B2 (en) * | 2005-10-11 | 2009-12-22 | Zygo Corporation | Interferometry method and system including spectral decomposition |
US7408649B2 (en) * | 2005-10-26 | 2008-08-05 | Kla-Tencor Technologies Corporation | Method and apparatus for optically analyzing a surface |
US20070127036A1 (en) * | 2005-12-07 | 2007-06-07 | Chroma Ate Inc. | Interference measurement system self-alignment method |
US7612891B2 (en) * | 2005-12-15 | 2009-11-03 | Veeco Instruments, Inc. | Measurement of thin films using fourier amplitude |
WO2007101026A2 (en) * | 2006-02-24 | 2007-09-07 | The General Hospital Corporation | Methods and systems for performing angle-resolved fourier-domain optical coherence tomography |
WO2008011510A2 (en) * | 2006-07-21 | 2008-01-24 | Zygo Corporation | Compensation of systematic effects in low coherence interferometry |
WO2008080127A2 (en) * | 2006-12-22 | 2008-07-03 | Zygo Corporation | Apparatus and method for measuring characteristics of surface features |
US7619746B2 (en) * | 2007-07-19 | 2009-11-17 | Zygo Corporation | Generating model signals for interferometry |
WO2009064670A2 (en) * | 2007-11-13 | 2009-05-22 | Zygo Corporation | Interferometer utilizing polarization scanning |
-
2006
- 2006-01-19 EP EP06718763A patent/EP1853874B1/de active Active
- 2006-01-19 KR KR1020097009642A patent/KR101006423B1/ko active IP Right Grant
- 2006-01-19 WO PCT/US2006/001740 patent/WO2006078718A1/en active Application Filing
- 2006-01-19 KR KR1020077019011A patent/KR101006422B1/ko active IP Right Grant
- 2006-01-19 TW TW101144263A patent/TWI428582B/zh active
- 2006-01-19 EP EP09164936.8A patent/EP2108919B1/de active Active
- 2006-01-19 US US11/334,949 patent/US7428057B2/en active Active
- 2006-01-19 TW TW095102023A patent/TWI409451B/zh active
- 2006-01-19 US US11/335,873 patent/US7446882B2/en active Active
- 2006-01-19 US US11/335,871 patent/US7616323B2/en active Active
- 2006-01-19 DE DE602006008896T patent/DE602006008896D1/de active Active
- 2006-01-19 AT AT06718763T patent/ATE441831T1/de not_active IP Right Cessation
- 2006-01-19 JP JP2007552232A patent/JP4768754B2/ja active Active
-
2009
- 2009-10-15 US US12/579,626 patent/US7952724B2/en not_active Expired - Fee Related
- 2009-11-26 JP JP2009268962A patent/JP5107331B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US7952724B2 (en) | 2011-05-31 |
JP4768754B2 (ja) | 2011-09-07 |
JP5107331B2 (ja) | 2012-12-26 |
US7446882B2 (en) | 2008-11-04 |
KR101006423B1 (ko) | 2011-01-06 |
US20060158657A1 (en) | 2006-07-20 |
TWI409451B (zh) | 2013-09-21 |
EP2108919B1 (de) | 2015-03-11 |
US20060158658A1 (en) | 2006-07-20 |
US20060158659A1 (en) | 2006-07-20 |
KR101006422B1 (ko) | 2011-01-06 |
EP2108919A3 (de) | 2010-05-05 |
WO2006078718A1 (en) | 2006-07-27 |
TW201312094A (zh) | 2013-03-16 |
JP2008528972A (ja) | 2008-07-31 |
JP2010101898A (ja) | 2010-05-06 |
US20100134786A1 (en) | 2010-06-03 |
TW200632306A (en) | 2006-09-16 |
TWI428582B (zh) | 2014-03-01 |
US7616323B2 (en) | 2009-11-10 |
EP1853874B1 (de) | 2009-09-02 |
US7428057B2 (en) | 2008-09-23 |
EP2108919A2 (de) | 2009-10-14 |
EP1853874A1 (de) | 2007-11-14 |
KR20070104615A (ko) | 2007-10-26 |
KR20090073221A (ko) | 2009-07-02 |
DE602006008896D1 (de) | 2009-10-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE441831T1 (de) | Interferometer zur bestimmung von eigenschaften einer objektoberfläche | |
WO2007044786A3 (en) | Interferometry method and system including spectral decomposition | |
WO2006127190A3 (en) | Use of optical skin measurements to determine cosmetic skin properties | |
TW200606399A (en) | Inspection method, and inspection device for surface shape | |
TW200951430A (en) | Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process | |
ATE535841T1 (de) | Vorrichtung zur beurteilung einer reifenfläche | |
TW200517638A (en) | Surface profiling using an interference pattern matching template | |
WO2007063448A3 (en) | Position detection of an electromagnetic beam projection | |
WO2009064670A3 (en) | Interferometer utilizing polarization scanning | |
TWI266872B (en) | Unevenness defect inspection method and device of pattern | |
ATE545002T1 (de) | Vorrichtung und verfahren zur bestimmung von oberflächeneigenschaften | |
BR112015018748A2 (pt) | inspeção de recipiente | |
TW200632583A (en) | A method for measuring information about a substrate, and a substrate for use in a lithographic apparatus | |
DE102004017232A1 (de) | Interferometrische Messvorrichtung | |
ATE508427T1 (de) | Vorrichtung zur messung von erhöhungen und/oder vertiefungen einer oberfläche | |
DE602004021637D1 (de) | Oberflächenprüfung unter verwendung einer nicht vibrierenden kontaktpotenzialsonde | |
JP2011040547A5 (de) | ||
RU2011148604A (ru) | Способ и устройство для выполнения оптического сравнения между по меньшей мере двумя образцами, предпочтительно путем сравнения выбираемых участков, а также применение устройства для выполнения способа | |
TW200712480A (en) | Unevenness inspecting apparatus and unevenness inspecting method | |
DE502007000136D1 (de) | Verfahren und Vorrichtung zur Erfassung der Oberflächenform einer teilspiegelnden Oberfläche | |
ATE492799T1 (de) | Verfahren zur optischen kontrolle einer auf einer farblich gemusterten oberfläche aufgebrachten durchsichtigen schutzschicht | |
DE60217989D1 (de) | Verwendung eines spektroskopischen Ellipsometers | |
DE502007005281D1 (de) | Vorrichtung zur Erfassung der Formatgenauigkeit einer Wellpappebahn | |
ATE545856T1 (de) | Verfahren und vorrichtung zur polarisationsabhängigen und ortsaufgelösten untersuchung einer oberfläche oder einer schicht | |
WO2008034070A3 (en) | Improved method for biomolecular detection and system thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |