ATE296455T1 - Entspiegelungsschicht sowie verfahren zur herstellung derselben - Google Patents

Entspiegelungsschicht sowie verfahren zur herstellung derselben

Info

Publication number
ATE296455T1
ATE296455T1 AT98906800T AT98906800T ATE296455T1 AT E296455 T1 ATE296455 T1 AT E296455T1 AT 98906800 T AT98906800 T AT 98906800T AT 98906800 T AT98906800 T AT 98906800T AT E296455 T1 ATE296455 T1 AT E296455T1
Authority
AT
Austria
Prior art keywords
structures
antireflective
producing
presents
coating
Prior art date
Application number
AT98906800T
Other languages
German (de)
English (en)
Inventor
Andreas Gombert
Hansjoerg Lerchenmueller
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Application granted granted Critical
Publication of ATE296455T1 publication Critical patent/ATE296455T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
AT98906800T 1997-03-04 1998-01-14 Entspiegelungsschicht sowie verfahren zur herstellung derselben ATE296455T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19708776A DE19708776C1 (de) 1997-03-04 1997-03-04 Entspiegelungsschicht sowie Verfahren zur Herstellung derselben
PCT/DE1998/000117 WO1998039673A1 (de) 1997-03-04 1998-01-14 Entspiegelungsschicht sowie verfahren zur herstellung derselben

Publications (1)

Publication Number Publication Date
ATE296455T1 true ATE296455T1 (de) 2005-06-15

Family

ID=7822196

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98906800T ATE296455T1 (de) 1997-03-04 1998-01-14 Entspiegelungsschicht sowie verfahren zur herstellung derselben

Country Status (6)

Country Link
US (1) US6359735B1 (https=)
EP (1) EP0965059B1 (https=)
JP (1) JP2001517319A (https=)
AT (1) ATE296455T1 (https=)
DE (2) DE19708776C1 (https=)
WO (1) WO1998039673A1 (https=)

Families Citing this family (120)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19813690A1 (de) * 1998-03-27 2000-05-04 Fresnel Optics Gmbh Optisch aktives Element und Verfahren zu seiner Herstellung
DE19845423A1 (de) * 1998-10-02 2000-04-13 Fraunhofer Ges Forschung Heißer Strahler
HK1044960A1 (zh) * 1999-10-19 2002-11-08 Rolic Ag 拓撲結構化的聚合物塗層
US6641767B2 (en) 2000-03-10 2003-11-04 3M Innovative Properties Company Methods for replication, replicated articles, and replication tools
US6627356B2 (en) * 2000-03-24 2003-09-30 Kabushiki Kaisha Toshiba Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask
DE10020877C1 (de) * 2000-04-28 2001-10-25 Alcove Surfaces Gmbh Prägewerkzeug, Verfahren zum Herstellen desselben, Verfahren zur Strukturierung einer Oberfläche eines Werkstücks und Verwendung einer anodisch oxidierten Oberflächenschicht
US7066234B2 (en) 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
DE10038749A1 (de) 2000-08-09 2002-02-28 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Herstellung einer optisch antireflektierenden Oberfläche
DE10039208A1 (de) 2000-08-10 2002-04-18 Fraunhofer Ges Forschung Verfahren zur Herstellung eines Werkzeugs, das zur Schaffung optisch wirksamer Oberflächenstrukturen im sub-mum Bereich einsetzbar ist, sowie ein diesbezügliches Werkzeug
JP2004506547A (ja) * 2000-08-18 2004-03-04 リフレキサイト・コーポレーション 差別的に硬化した材料およびその材料の形成方法
US7230764B2 (en) * 2000-08-18 2007-06-12 Reflexite Corporation Differentially-cured materials and process for forming same
US20040190102A1 (en) * 2000-08-18 2004-09-30 Mullen Patrick W. Differentially-cured materials and process for forming same
JP2002122702A (ja) * 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd 光学フィルム、及び表示素子
US7145721B2 (en) 2000-11-03 2006-12-05 Mems Optical, Inc. Anti-reflective structures
US6627892B2 (en) * 2000-12-29 2003-09-30 Honeywell International Inc. Infrared detector packaged with improved antireflection element
NZ528644A (en) * 2001-03-08 2005-05-27 Boehringer Ingelheim Ca Ltd A method for identifying a potential inhibitor of the binding between a HCV NS5B RNA-dependent RNA polymerase and an appropriate primer-template
GB0123744D0 (en) * 2001-10-03 2001-11-21 Qinetiq Ltd Coated optical components
US6958207B1 (en) 2002-12-07 2005-10-25 Niyaz Khusnatdinov Method for producing large area antireflective microtextured surfaces
US6888676B2 (en) * 2003-03-20 2005-05-03 Nokia Corporation Method of making polarizer and antireflection microstructure for mobile phone display and window
DE502004004729D1 (de) * 2003-03-21 2007-10-04 Ovd Kinegram Ag Verfahren zur Herstellung von zwei überlagernden Mikrostrukturen
DE10318105B4 (de) * 2003-03-21 2007-09-20 Ovd Kinegram Ag Verfahren zur Herstellung von Mikrostrukturen
JP2004303545A (ja) * 2003-03-31 2004-10-28 Toyota Industries Corp 面状発光デバイス及びその製造方法、このデバイスを備えた光学デバイス
DE10318566B4 (de) * 2003-04-15 2005-11-17 Fresnel Optics Gmbh Verfahren und Werkzeug zur Herstellung transparenter optischer Elemente aus polymeren Werkstoffen
JP4495722B2 (ja) * 2003-04-22 2010-07-07 オーファオデー キネグラム アーゲー ミクロ構造の作成方法
EP1625430A2 (en) * 2003-05-02 2006-02-15 Reflexite Corporation Light-redirecting optical structures
JP2005135899A (ja) * 2003-10-06 2005-05-26 Omron Corp 面光源装置及び表示装置
US7030506B2 (en) * 2003-10-15 2006-04-18 Infineon Technologies, Ag Mask and method for using the mask in lithographic processing
US7252869B2 (en) * 2003-10-30 2007-08-07 Niyaz Khusnatdinov Microtextured antireflective surfaces with reduced diffraction intensity
CA2545927A1 (en) * 2003-11-14 2005-06-02 Aprilis, Inc. Holographic data storage media with structure surfaces
CN100381904C (zh) * 2004-05-10 2008-04-16 辅祥实业股份有限公司 应用面函数控制的直下式背光源模组
CN1950724A (zh) * 2004-05-12 2007-04-18 松下电器产业株式会社 光学元件及其制造方法
DE102004042983A1 (de) * 2004-09-01 2006-03-09 X3D Technologies Gmbh Anordnung zur dreidimensional wahrnehmbaren Darstellung
KR100893251B1 (ko) 2004-12-03 2009-04-17 샤프 가부시키가이샤 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법
US7690814B2 (en) * 2005-03-10 2010-04-06 Honeywell International Inc. Luminaire with a one-sided diffuser
DE102005013974A1 (de) * 2005-03-26 2006-09-28 Krauss-Maffei Kunststofftechnik Gmbh Verfahren und Vorrichtung zur Herstellung mikro- bzw. nanostrukturierter Bauteile
US20060228892A1 (en) * 2005-04-06 2006-10-12 Lazaroff Dennis M Anti-reflective surface
US20070116934A1 (en) * 2005-11-22 2007-05-24 Miller Scott M Antireflective surfaces, methods of manufacture thereof and articles comprising the same
TW200746123A (en) * 2006-01-11 2007-12-16 Pentax Corp Optical element having anti-reflection coating
JP5105771B2 (ja) * 2006-05-15 2012-12-26 パナソニック株式会社 反射防止構造体及びそれを備えた光学装置
JP2007304466A (ja) * 2006-05-15 2007-11-22 Matsushita Electric Ind Co Ltd 光吸収性反射防止構造体、それを備えた光学ユニット及びレンズ鏡筒ユニット、並びにそれらを備えた光学装置
JP4794351B2 (ja) 2006-05-15 2011-10-19 パナソニック株式会社 反射防止構造体及びそれを備えた光学装置
WO2008001662A1 (en) * 2006-06-30 2008-01-03 Panasonic Corporation Optical member and optical device comprising the same
US20080080056A1 (en) * 2006-08-29 2008-04-03 Micron Technology, Inc. Method and apparatus for reducing microlens surface reflection
CN102360092B (zh) * 2007-06-19 2014-05-07 阿尔卑斯电气株式会社 光学元件及其制造方法
JP4971061B2 (ja) * 2007-07-23 2012-07-11 東洋鋼鈑株式会社 光反射板及びその製造方法及び光反射装置
RU2429514C1 (ru) * 2007-08-09 2011-09-20 Шарп Кабусики Кайся Жидкокристаллическое устройство отображения
CN101796434B (zh) * 2007-09-03 2012-03-14 松下电器产业株式会社 防反射构造体、光学单元及光学装置
JP5201913B2 (ja) * 2007-09-03 2013-06-05 パナソニック株式会社 反射防止構造体及びそれを備えた光学装置
US20090071537A1 (en) * 2007-09-17 2009-03-19 Ozgur Yavuzcetin Index tuned antireflective coating using a nanostructured metamaterial
DE102007059721A1 (de) * 2007-12-12 2009-06-18 Böck, Klaus Abdeckfolie für Silo
JP5157435B2 (ja) * 2007-12-28 2013-03-06 王子ホールディングス株式会社 凹凸パターンシートの製造方法、及び光学シートの製造方法
EP2091043A1 (en) * 2008-02-07 2009-08-19 DPHI, Inc. A method for examining an optical stamper
WO2009104414A1 (ja) 2008-02-22 2009-08-27 シャープ株式会社 表示装置
FI20080248A7 (fi) * 2008-03-28 2009-09-29 Savcor Face Group Oy Kemiallinen kaasufaasipinnoite ja menetelmä kaasufaasipinnoitteen muodostamiseksi
DE102008024678A1 (de) 2008-05-21 2009-11-26 Daimler Ag Lichtschacht mit reflexionshemmender Oberfläche und entsprechendes Herstellungsverfahren
RU2468397C2 (ru) * 2008-05-27 2012-11-27 Шарп Кабусики Кайся Пленка для предотвращения отражения и дисплейное устройство
JP4583506B2 (ja) * 2008-06-06 2010-11-17 シャープ株式会社 反射防止膜、および反射防止膜を備える光学素子、ならびに、スタンパ、およびスタンパの製造方法、ならびに反射防止膜の製造方法
DE202008017478U1 (de) 2008-07-17 2009-09-17 Schott Ag Photovoltaik-Modul mit teilvorgespannter gläserner Abdeckscheibe mit Innengravur
JP5616009B2 (ja) 2008-09-22 2014-10-29 アズビル株式会社 反射型光電センサおよび物体検出方法
JP2010078803A (ja) * 2008-09-25 2010-04-08 Canon Inc 光学素子及びそれを有する光学系
TW201023379A (en) * 2008-12-03 2010-06-16 Ind Tech Res Inst Light concentrating module
JP4531131B1 (ja) 2008-12-26 2010-08-25 シャープ株式会社 型の製造方法および型を用いた反射防止膜の製造方法
KR20110110240A (ko) * 2008-12-30 2011-10-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 반사방지 용품 및 이의 제조 방법
CN102325719A (zh) 2008-12-30 2012-01-18 3M创新有限公司 纳米结构化制品和制备纳米结构化制品的方法
US20110278770A1 (en) 2009-01-30 2011-11-17 Akinobu Isurugi Mold, mold manufacturing method and method for manufacturing anti-reflection film using the mold
CN102105624B (zh) * 2009-03-05 2012-12-26 夏普株式会社 模具的制造方法及其所用的电极结构
JP4648995B2 (ja) 2009-04-09 2011-03-09 シャープ株式会社 型およびその製造方法
EP2423714A4 (en) * 2009-04-24 2018-05-02 Sharp Kabushiki Kaisha Antireflection film, method for manufacturing antireflection film, and display apparatus
BRPI1011897A2 (pt) 2009-04-30 2016-04-12 Sharp Kk "molde e método de fabricação do mesmo"
EP2426520A4 (en) 2009-06-12 2012-11-14 Sharp Kk ANTIREFLECTION FILM, DISPLAY DEVICE, AND LIGHT TRANSMISSION ELEMENT
EP2474650B1 (en) 2009-09-04 2017-10-04 Sharp Kabushiki Kaisha Method for forming anodized layer, method for producing mold, method for producing antireflective film, and mold and antireflective film
CN102575372B (zh) 2009-10-09 2014-05-28 夏普株式会社 模具和模具的制造方法以及防反射膜
BR112012008635A2 (pt) * 2009-10-14 2016-04-19 Sharp Kk matriz e método para fabricar matriz, e revestimento anti-reflexão
US9366785B2 (en) 2009-10-28 2016-06-14 Sharp Kabushiki Kaisha Mold, method for manufacturing a mold, and antireflective film
JP5753186B2 (ja) 2009-12-10 2015-07-22 アルコン リサーチ， リミテッド カット面を有する光学要素を利用するマルチスポットレーザー手術用プローブ
JP5053465B2 (ja) 2010-02-24 2012-10-17 シャープ株式会社 型および型の製造方法ならびに反射防止膜の製造方法
RU2519411C1 (ru) 2010-03-08 2014-06-10 Шарп Кабусики Кайся Способ обработки смазкой для пресс-формы, пресс-форма, способ изготовления антиотражающей пленки, устройство для обработки смазкой для пресс-формы и устройство для промывки/просушки пресс-формы
CN102791909B (zh) 2010-03-09 2015-05-20 夏普株式会社 阳极氧化层的形成方法、模具的制造方法以及防反射膜的制造方法
JP5027346B2 (ja) 2010-03-31 2012-09-19 シャープ株式会社 型および型の製造方法ならびに反射防止膜の製造方法
WO2011125367A1 (ja) 2010-04-06 2011-10-13 シャープ株式会社 光学素子、反射防止構造体及びその製造方法
JP5027347B2 (ja) 2010-04-28 2012-09-19 シャープ株式会社 型および型の製造方法
US8790503B2 (en) 2010-04-28 2014-07-29 Sharp Kabushiki Kaisha Method for forming anodized layer
EP2573545B1 (en) 2010-05-19 2019-07-03 Sharp Kabushiki Kaisha Die inspection method
EP2585862B8 (en) 2010-06-25 2017-10-11 Andrew Richard Parker Optical effect structures
US8524134B2 (en) 2010-07-12 2013-09-03 Graham J. Hubbard Method of molding polymeric materials to impart a desired texture thereto
KR101250450B1 (ko) * 2010-07-30 2013-04-08 광주과학기술원 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법
JP5616969B2 (ja) 2010-08-30 2014-10-29 シャープ株式会社 型の製造方法および反射防止材の製造方法
WO2012046808A1 (ja) 2010-10-08 2012-04-12 シャープ株式会社 陽極酸化膜の製造方法
WO2012073819A1 (ja) 2010-11-29 2012-06-07 シャープ株式会社 導光体および導光体を有する照明装置ならびに表示装置
CN102097535A (zh) * 2010-11-30 2011-06-15 中国科学院半导体研究所 用于太阳电池表面抗反射的蛾眼结构的制备方法
WO2012073820A1 (ja) 2010-11-30 2012-06-07 シャープ株式会社 電極構造、基材保持装置および陽極酸化層の形成方法
US9512535B2 (en) 2011-04-01 2016-12-06 Sharp Kabushiki Kaisha Mold production method
JP2012226353A (ja) * 2011-04-19 2012-11-15 Agency For Science Technology & Research 反射防止階層構造
CN104024489A (zh) * 2011-12-27 2014-09-03 三菱丽阳株式会社 压模及其制造方法、以及成型体的制造方法
WO2013146656A1 (ja) 2012-03-26 2013-10-03 シャープ株式会社 離型処理方法および反射防止膜の製造方法
JP5797334B2 (ja) 2012-06-06 2015-10-21 シャープ株式会社 型基材、型基材の製造方法、型の製造方法および型
JP5376029B1 (ja) 2012-09-28 2013-12-25 大日本印刷株式会社 反射防止物品
JP5488667B2 (ja) 2012-09-28 2014-05-14 大日本印刷株式会社 反射防止物品
JP2016001201A (ja) * 2012-10-17 2016-01-07 旭硝子株式会社 反射防止性を有するガラスの製造方法
JP2013083997A (ja) * 2012-12-13 2013-05-09 Oji Holdings Corp 凹凸パターンシート、及び光学装置
US20140200566A1 (en) * 2013-01-15 2014-07-17 Alcon Research, Ltd. Multi-spot laser probe with micro-structured distal surface
JP6201684B2 (ja) * 2013-11-26 2017-09-27 凸版印刷株式会社 Ｅｌ素子、照明装置、ディスプレイ装置、及び液晶ディスプレイ装置
DE102014201885A1 (de) * 2014-02-03 2015-08-06 Johnson Controls Automotive Electronics Gmbh Abdeckscheibe für mindestens ein Anzeigeinstrument in einem Fahrzeug
JP6309081B2 (ja) 2014-04-14 2018-04-11 シャープ株式会社 型の製造方法および反射防止膜の製造方法
JP6059695B2 (ja) 2014-09-01 2017-01-11 デクセリアルズ株式会社 光学体の製造方法
JP6415590B2 (ja) 2014-11-06 2018-10-31 シャープ株式会社 型の製造方法および反射防止膜の製造方法
US10675788B2 (en) 2014-11-12 2020-06-09 Sharp Kabushiki Kaisha Method for producing mold
JP6482120B2 (ja) * 2015-03-31 2019-03-13 デクセリアルズ株式会社 原盤の製造方法、光学体の製造方法、光学部材の製造方法、および表示装置の製造方法
JP6689576B2 (ja) 2015-03-31 2020-04-28 デクセリアルズ株式会社 原盤の製造方法、原盤、及び光学体
AT517019B1 (de) * 2015-04-02 2017-02-15 Zkw Group Gmbh Beleuchtungsvorrichtung sowie Kraftfahrzeugscheinwerfer
WO2017115670A1 (ja) 2015-12-28 2017-07-06 シャープ株式会社 印刷用凹版、印刷用凹版の製造方法、印刷物の作製方法および印刷物
JP6737613B2 (ja) 2016-03-25 2020-08-12 デクセリアルズ株式会社 光学体及び発光装置
US11493669B2 (en) 2016-11-21 2022-11-08 Otsuka Techno Corporation Anti-reflective body, camera unit, mobile device, and method for manufacturing anti-reflective body
US11686881B2 (en) * 2017-10-20 2023-06-27 Ii-Vi Delaware, Inc. Partially etched reflection-modification layer
US11491672B2 (en) * 2018-09-21 2022-11-08 Dexerials Corporation Microfabrication device, microfabrication method, transfer mold, and transfer object
DE102018221189A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element
CN110204981A (zh) * 2019-06-13 2019-09-06 天津市朗威柏丽科技有限公司 消光透明的防水涂料
JP6843400B1 (ja) 2019-10-18 2021-03-17 大塚テクノ株式会社 反射防止構造体
CN119409423A (zh) * 2023-02-24 2025-02-11 重庆鑫景特种玻璃有限公司 一种微晶玻璃及显示玻璃盖板
CN117865498B (zh) * 2023-02-24 2024-11-26 重庆鑫景特种玻璃有限公司 一种具有类蛾眼结构的微晶玻璃及制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1462618A (en) * 1973-05-10 1977-01-26 Secretary Industry Brit Reducing the reflectance of surfaces to radiation
US4114983A (en) * 1977-02-18 1978-09-19 Minnesota Mining And Manufacturing Company Polymeric optical element having antireflecting surface
DE3121785A1 (de) * 1981-06-02 1982-12-16 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum entspiegeln einer glasoberflaeche
US4511614A (en) 1983-10-31 1985-04-16 Ball Corporation Substrate having high absorptance and emittance black electroless nickel coating and a process for producing the same
GB8621468D0 (en) * 1986-09-05 1986-10-15 Philips Nv Display device
DE3831503A1 (de) * 1988-09-16 1990-03-22 Ver Glaswerke Gmbh Transparente deckschicht mit reflexionsvermindernder eigenschaft fuer durchsichtige glas- oder kunststoffsubstrate
US5120605A (en) * 1988-09-23 1992-06-09 Zuel Company, Inc. Anti-reflective glass surface
US4944986A (en) * 1988-09-23 1990-07-31 Zuel Company Anti-reflective glass surface
WO1995031737A1 (en) * 1994-05-18 1995-11-23 Dai Nippon Printing Co., Ltd. Glare-proof film

Also Published As

Publication number Publication date
DE19708776C1 (de) 1998-06-18
WO1998039673A1 (de) 1998-09-11
DE59812817D1 (de) 2005-06-30
JP2001517319A (ja) 2001-10-02
US6359735B1 (en) 2002-03-19
EP0965059B1 (de) 2005-05-25
EP0965059A1 (de) 1999-12-22

Similar Documents

Publication Publication Date Title
ATE296455T1 (de) Entspiegelungsschicht sowie verfahren zur herstellung derselben
ATE295443T1 (de) Vernetzbare polymere zur herstellung von vernetzbaren polymeren
TW200504403A (en) Optical safety element and system for visualizing hidden information
DE50312803D1 (de) Datenträger mit einer optisch variablen struktur
CA2111808A1 (en) Method for Forming a Bragg Grating in an Optical Medium
DE69712764D1 (de) Herstellung optischer wellenleitergitter
DE502005010446D1 (de) Datenträger mit einer optisch variablen struktur
EP1341019A3 (en) Three-dimensional optical waveguide and method of manufacturing same
ATE268412T1 (de) Strassenmarkierungen mit verbesserter helligkeit im nass- und trocken-zustand und verfahren zur herstellung derselben
ATE208047T1 (de) Geformte ultraflexible retroreflektierende würfeleckige zusammengesetzte folie mit optischen zieleigenschaften und verfahren zu deren herstellung
DE69831331D1 (de) Lichtausstrahlende retroflektierende folie und verfahren zur herstellung
ATE424784T1 (de) Verfahren zur herstellung einer gefärbten kontaktlinse
ATE483592T1 (de) Sicherheitselement mit einer optisch variablen struktur
BR0207523B1 (pt) artigo de proteÇço.
DE69824624D1 (de) Kombiniertes verfahren zur herstellung von kaskadepolymeroberflächen
CN107085262B (zh) 一种光纤光栅及其制造方法
WO2002067020A3 (en) Optical element and method of manufacturing such an optical element
DE69106177D1 (de) Optischer Modul mit einer Umhüllung und Verfahren zur Herstellung derselben.
EP1213600A3 (en) Optical diffusion film and process of producing optical diffusion film
ATE242902T1 (de) Sicherheitselement für dokumente und verfahren zu seiner herstellung
DE50015723D1 (de) Leuchte
ATE316251T1 (de) Optisches element mit einer spiegel- oberflächenbeschichtung und verfahren zur herstellung dieser beschichtung
DK1439962T3 (da) Blækstråleregistrerende materiale
TR199600365A2 (tr) Kendiliginden kivrilan iki komponentli polimer fiberlerin üretim yöntemi.
ATE309309T1 (de) Silikon-klebstoffkomplex mit durch elektronenbestrahlung modulierbarer trennkraft an der schichtgrenze

Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee