JP2001517319A - 反射防止膜とその製法 - Google Patents
反射防止膜とその製法Info
- Publication number
- JP2001517319A JP2001517319A JP53803498A JP53803498A JP2001517319A JP 2001517319 A JP2001517319 A JP 2001517319A JP 53803498 A JP53803498 A JP 53803498A JP 53803498 A JP53803498 A JP 53803498A JP 2001517319 A JP2001517319 A JP 2001517319A
- Authority
- JP
- Japan
- Prior art keywords
- antireflection
- reflection
- macro
- coating
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000011248 coating agent Substances 0.000 title claims description 18
- 238000000576 coating method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 230000005855 radiation Effects 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 12
- 230000000737 periodic effect Effects 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 33
- 229920002120 photoresistant polymer Polymers 0.000 claims description 21
- 238000004080 punching Methods 0.000 claims description 11
- 230000001427 coherent effect Effects 0.000 claims description 8
- 239000012780 transparent material Substances 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 239000006117 anti-reflective coating Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 238000007788 roughening Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- 238000003848 UV Light-Curing Methods 0.000 claims description 2
- 230000003667 anti-reflective effect Effects 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 238000007493 shaping process Methods 0.000 claims description 2
- 229920001169 thermoplastic Polymers 0.000 claims description 2
- 239000004416 thermosoftening plastic Substances 0.000 claims description 2
- 238000003631 wet chemical etching Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000001723 curing Methods 0.000 claims 1
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 238000001746 injection moulding Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010297 mechanical methods and process Methods 0.000 claims 1
- 230000005226 mechanical processes and functions Effects 0.000 claims 1
- 238000005488 sandblasting Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 9
- 238000011282 treatment Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- ROGDGDPDLIVQFZ-OGFXRTJISA-N (2r)-2-(4-chloro-2-methylphenoxy)propanoic acid;n-methylmethanamine Chemical compound CNC.OC(=O)[C@@H](C)OC1=CC=C(Cl)C=C1C ROGDGDPDLIVQFZ-OGFXRTJISA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19708776A DE19708776C1 (de) | 1997-03-04 | 1997-03-04 | Entspiegelungsschicht sowie Verfahren zur Herstellung derselben |
| DE19708776.0 | 1997-03-04 | ||
| PCT/DE1998/000117 WO1998039673A1 (de) | 1997-03-04 | 1998-01-14 | Entspiegelungsschicht sowie verfahren zur herstellung derselben |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001517319A true JP2001517319A (ja) | 2001-10-02 |
| JP2001517319A5 JP2001517319A5 (https=) | 2005-07-14 |
Family
ID=7822196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53803498A Ceased JP2001517319A (ja) | 1997-03-04 | 1998-01-14 | 反射防止膜とその製法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6359735B1 (https=) |
| EP (1) | EP0965059B1 (https=) |
| JP (1) | JP2001517319A (https=) |
| AT (1) | ATE296455T1 (https=) |
| DE (2) | DE19708776C1 (https=) |
| WO (1) | WO1998039673A1 (https=) |
Cited By (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002122702A (ja) * | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | 光学フィルム、及び表示素子 |
| JP2006520923A (ja) * | 2003-04-22 | 2006-09-14 | オーファオデー キネグラム アーゲー | ミクロ構造およびミクロ構造の形成方法 |
| EP1857840A2 (en) | 2006-05-15 | 2007-11-21 | Matsushita Electric Industrial Co., Ltd. | Antireflection Structure and Optical Device Including the Same |
| JP2007304466A (ja) * | 2006-05-15 | 2007-11-22 | Matsushita Electric Ind Co Ltd | 光吸収性反射防止構造体、それを備えた光学ユニット及びレンズ鏡筒ユニット、並びにそれらを備えた光学装置 |
| JP2007304468A (ja) * | 2006-05-15 | 2007-11-22 | Matsushita Electric Ind Co Ltd | 反射防止構造体及びそれを備えた光学装置 |
| WO2008156009A1 (ja) * | 2007-06-19 | 2008-12-24 | Alps Electric Co., Ltd. | 光学素子及びその製造方法 |
| JP2009058887A (ja) * | 2007-09-03 | 2009-03-19 | Panasonic Corp | 反射防止構造体及びそれを備えた光学装置 |
| JP2009162831A (ja) * | 2007-12-28 | 2009-07-23 | Oji Paper Co Ltd | 凹凸パターンシート及びその製造方法、光学シートの製造方法、並びに光学装置 |
| WO2009104414A1 (ja) | 2008-02-22 | 2009-08-27 | シャープ株式会社 | 表示装置 |
| EP2166374A2 (en) | 2008-09-22 | 2010-03-24 | Yamatake Corporation | Reflective photoelectric sensor and object detecting method |
| JP2010078803A (ja) * | 2008-09-25 | 2010-04-08 | Canon Inc | 光学素子及びそれを有する光学系 |
| WO2010073636A1 (ja) | 2008-12-26 | 2010-07-01 | シャープ株式会社 | 型の製造方法および型を用いた反射防止膜の製造方法 |
| WO2010100894A1 (ja) * | 2009-03-05 | 2010-09-10 | シャープ株式会社 | 型の製造方法およびそれに用いられる電極構造 |
| WO2010116728A1 (ja) | 2009-04-09 | 2010-10-14 | シャープ株式会社 | 型およびその製造方法 |
| WO2010122924A1 (ja) | 2009-04-24 | 2010-10-28 | シャープ株式会社 | 反射防止膜、反射防止膜の製造方法、及び、表示装置 |
| WO2010125795A1 (ja) | 2009-04-30 | 2010-11-04 | シャープ株式会社 | 型およびその製造方法 |
| US7835080B2 (en) | 2004-12-03 | 2010-11-16 | Sharp Kabushiki Kaisha | Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper |
| WO2010143503A1 (ja) | 2009-06-12 | 2010-12-16 | シャープ株式会社 | 反射防止膜、表示装置及び透光部材 |
| WO2011027746A1 (ja) | 2009-09-04 | 2011-03-10 | シャープ株式会社 | 陽極酸化層の形成方法、型の製造方法、反射防止膜の製造方法、型、および反射防止膜 |
| WO2011043464A1 (ja) | 2009-10-09 | 2011-04-14 | シャープ株式会社 | 型および型の製造方法ならびに反射防止膜 |
| WO2011052652A1 (ja) | 2009-10-28 | 2011-05-05 | シャープ株式会社 | 型および型の製造方法ならびに反射防止膜 |
| WO2011105206A1 (ja) | 2010-02-24 | 2011-09-01 | シャープ株式会社 | 型および型の製造方法ならびに反射防止膜の製造方法 |
| WO2011111669A1 (ja) | 2010-03-08 | 2011-09-15 | シャープ株式会社 | 離型処理方法、型、反射防止膜の製造方法、離型処理装置および型の洗浄乾燥装置 |
| WO2011125486A1 (ja) | 2010-03-31 | 2011-10-13 | シャープ株式会社 | 型および型の製造方法ならびに反射防止膜の製造方法 |
| WO2011136229A1 (ja) | 2010-04-28 | 2011-11-03 | シャープ株式会社 | 陽極酸化層の形成方法 |
| WO2011135976A1 (ja) | 2010-04-28 | 2011-11-03 | シャープ株式会社 | 型および型の製造方法 |
| WO2011145625A1 (ja) | 2010-05-19 | 2011-11-24 | シャープ株式会社 | 型の検査方法 |
| USRE43694E1 (en) | 2000-04-28 | 2012-10-02 | Sharp Kabushiki Kaisha | Stamping tool, casting mold and methods for structuring a surface of a work piece |
| JP2012226353A (ja) * | 2011-04-19 | 2012-11-15 | Agency For Science Technology & Research | 反射防止階層構造 |
| JP2013083997A (ja) * | 2012-12-13 | 2013-05-09 | Oji Holdings Corp | 凹凸パターンシート、及び光学装置 |
| WO2013099935A1 (ja) * | 2011-12-27 | 2013-07-04 | 三菱レイヨン株式会社 | スタンパとその製造方法、および成形体の製造方法 |
| US8529075B2 (en) | 2007-09-03 | 2013-09-10 | Panasonic Corporation | Antireflection structure, optical unit, and optical device |
| WO2014061614A1 (ja) * | 2012-10-17 | 2014-04-24 | 旭硝子株式会社 | 反射防止性を有するガラスの製造方法 |
| KR20150010789A (ko) | 2012-06-06 | 2015-01-28 | 샤프 가부시키가이샤 | 형 기재, 형 기재의 제조 방법, 형의 제조 방법 및 형 |
| US8999133B2 (en) | 2010-08-30 | 2015-04-07 | Sharp Kabushiki Kaisha | Method for forming anodized layer and mold production method |
| JP2015103413A (ja) * | 2013-11-26 | 2015-06-04 | 凸版印刷株式会社 | Ｅｌ素子、照明装置、ディスプレイ装置、及び液晶ディスプレイ装置 |
| US9108351B2 (en) | 2010-03-09 | 2015-08-18 | Sharp Kabushiki Kaisha | Method for forming anodized layer, method for producing mold and method for producing antireflective film |
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| US9158040B2 (en) | 2012-09-28 | 2015-10-13 | Dai Nippon Printing Co., Ltd. | Anti-reflection article |
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| US9427894B2 (en) | 2012-09-28 | 2016-08-30 | Dai Nippon Printing Co., Ltd. | Anti-reflection article |
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| DE19813690A1 (de) * | 1998-03-27 | 2000-05-04 | Fresnel Optics Gmbh | Optisch aktives Element und Verfahren zu seiner Herstellung |
| DE19845423A1 (de) * | 1998-10-02 | 2000-04-13 | Fraunhofer Ges Forschung | Heißer Strahler |
| HK1044960A1 (zh) * | 1999-10-19 | 2002-11-08 | Rolic Ag | 拓撲結構化的聚合物塗層 |
| US6641767B2 (en) | 2000-03-10 | 2003-11-04 | 3M Innovative Properties Company | Methods for replication, replicated articles, and replication tools |
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| DE10318105B4 (de) * | 2003-03-21 | 2007-09-20 | Ovd Kinegram Ag | Verfahren zur Herstellung von Mikrostrukturen |
| JP2004303545A (ja) * | 2003-03-31 | 2004-10-28 | Toyota Industries Corp | 面状発光デバイス及びその製造方法、このデバイスを備えた光学デバイス |
| DE10318566B4 (de) * | 2003-04-15 | 2005-11-17 | Fresnel Optics Gmbh | Verfahren und Werkzeug zur Herstellung transparenter optischer Elemente aus polymeren Werkstoffen |
| EP1625430A2 (en) * | 2003-05-02 | 2006-02-15 | Reflexite Corporation | Light-redirecting optical structures |
| JP2005135899A (ja) * | 2003-10-06 | 2005-05-26 | Omron Corp | 面光源装置及び表示装置 |
| US7030506B2 (en) * | 2003-10-15 | 2006-04-18 | Infineon Technologies, Ag | Mask and method for using the mask in lithographic processing |
| US7252869B2 (en) * | 2003-10-30 | 2007-08-07 | Niyaz Khusnatdinov | Microtextured antireflective surfaces with reduced diffraction intensity |
| CA2545927A1 (en) * | 2003-11-14 | 2005-06-02 | Aprilis, Inc. | Holographic data storage media with structure surfaces |
| CN100381904C (zh) * | 2004-05-10 | 2008-04-16 | 辅祥实业股份有限公司 | 应用面函数控制的直下式背光源模组 |
| CN1950724A (zh) * | 2004-05-12 | 2007-04-18 | 松下电器产业株式会社 | 光学元件及其制造方法 |
| DE102004042983A1 (de) * | 2004-09-01 | 2006-03-09 | X3D Technologies Gmbh | Anordnung zur dreidimensional wahrnehmbaren Darstellung |
| US7690814B2 (en) * | 2005-03-10 | 2010-04-06 | Honeywell International Inc. | Luminaire with a one-sided diffuser |
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| US20060228892A1 (en) * | 2005-04-06 | 2006-10-12 | Lazaroff Dennis M | Anti-reflective surface |
| US20070116934A1 (en) * | 2005-11-22 | 2007-05-24 | Miller Scott M | Antireflective surfaces, methods of manufacture thereof and articles comprising the same |
| TW200746123A (en) * | 2006-01-11 | 2007-12-16 | Pentax Corp | Optical element having anti-reflection coating |
| WO2008001662A1 (en) * | 2006-06-30 | 2008-01-03 | Panasonic Corporation | Optical member and optical device comprising the same |
| US20080080056A1 (en) * | 2006-08-29 | 2008-04-03 | Micron Technology, Inc. | Method and apparatus for reducing microlens surface reflection |
| JP4971061B2 (ja) * | 2007-07-23 | 2012-07-11 | 東洋鋼鈑株式会社 | 光反射板及びその製造方法及び光反射装置 |
| RU2429514C1 (ru) * | 2007-08-09 | 2011-09-20 | Шарп Кабусики Кайся | Жидкокристаллическое устройство отображения |
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Also Published As
| Publication number | Publication date |
|---|---|
| DE19708776C1 (de) | 1998-06-18 |
| WO1998039673A1 (de) | 1998-09-11 |
| DE59812817D1 (de) | 2005-06-30 |
| US6359735B1 (en) | 2002-03-19 |
| EP0965059B1 (de) | 2005-05-25 |
| ATE296455T1 (de) | 2005-06-15 |
| EP0965059A1 (de) | 1999-12-22 |
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