JP5797334B2 - 型基材、型基材の製造方法、型の製造方法および型 - Google Patents
型基材、型基材の製造方法、型の製造方法および型 Download PDFInfo
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Description
まず、本発明による実施形態の型基材が有するアルミニウム合金層およびその形成方法を説明する。
次に、本発明の実施形態による型基材、型基材の製造方法、モスアイ用型の製造方法およびモスアイ用型を説明する。例示する実施形態の型基材は、反射防止膜を形成するためのモスアイ用型の製造に用いられる。上述したように、円筒状(ロール状)のモスアイ用型は、反射防止膜をロール・ツー・ロール方式によって効率よく製造できるという利点を有している。円筒状の型基材の例は後述する。
陽極酸化工程:シュウ酸水溶液:0.025mol/L、温度:10℃、化成電圧:45V、陽極酸化時間(通電時間):3分30秒
エッチング工程:燐酸水溶液:1mol/L、温度:30℃、エッチング時間:20分
2 チャンバー
3 ターゲット
4 載置台
5 絶縁基板
6 ガス導入口
7 排気口
10 型基材
12 支持体
13 有機絶縁層
14 無機下地層
16 緩衝層
18 アルミニウム合金層
18s 表面
20 ポーラスアルミナ層
22 凹部
32 硬化物層
32’ 紫外線硬化樹脂
42 被加工物
50 コア材
62 支持ローラ
70 ターゲット
72m メタルスリーブ(金属基材)
100、100a、100A モスアイ用型
Claims (15)
- ポーラスアルミナ層を表面に有する型の製造に用いられる型基材であって、
基材と、前記基材上に形成されたアルミニウム合金層とを有し、
前記アルミニウム合金層は、アルミニウムと、アルミニウム以外の金属元素と、窒素とを含む、型基材。 - 前記アルミニウム合金層を構成する結晶粒の、前記アルミニウム合金層の法線方向から見たときの平均粒径は、100nm以下であり、前記アルミニウム合金層の最大表面粗さRmaxは60nm以下である、請求項1に記載の型基材。
- 前記アルミニウム合金層に含まれる前記窒素の含有率は、0.5質量%以上5.7質量%以下である、請求項1または2に記載の型基材。
- 前記金属元素の標準電極電位とアルミニウムの標準電極電位との差の絶対値は0.64V以下であり、前記アルミニウム合金層中の前記金属元素の含有率は、1.0質量%以上1.9質量%以下である、請求項1から3のいずれかに記載の型基材。
- 前記金属元素は、TiまたはNdである、請求項1から4のいずれかに記載の型基材。
- 前記基材は、金属基材であって、
前記金属基材と前記アルミニウム合金層との間に形成された無機下地層をさらに有する、請求項1から5のいずれかに記載の型基材。 - 前記金属基材と前記無機下地層との間に有機絶縁層をさらに有する、請求項6に記載の型基材。
- 前記無機下地層と前記アルミニウム合金層との間に、緩衝層をさらに有し、前記緩衝層は、アルミニウムと、前記金属元素と、酸素または窒素とを含む、請求項6または7に記載の型基材。
- 前記金属基材は円筒状であり、前記無機下地層は前記金属基材の円筒の外周面に形成されている、請求項6から8のいずれかに記載の型基材。
- 請求項1から9のいずれかに記載の型基材であって、前記基材が円筒状である型基材の製造方法であって、
(a)円筒状の基材を、少なくとも円筒の軸を中心に自転が可能なように、成膜室内に配置する工程と、
(b)前記成膜室内に窒素ガスを混合した雰囲気下で、前記基材を自転させながら、アルミニウムと、アルミニウム以外の金属元素とを含むターゲットを用いて、DCマグネトロンスパッタ法で、前記基材の外周面上に、前記アルミニウム合金層を堆積する工程と、を包含する、型基材の製造方法。 - 前記工程(a)は、複数の円筒状の基材のそれぞれを、各円筒の軸を中心に自転が可能で、且つ、前記複数の基材のそれぞれの前記軸が同一の円周上を公転できるように配置する工程であって、
前記工程(b)において、前記複数の基材のそれぞれは、各円筒の軸を中心に自転しつつ、公転している、請求項10に記載の型基材の製造方法。 - 前記工程(a)は、前記複数の基材の間に、遮蔽材を配置する工程を包含する、請求項11に記載の型基材の製造方法。
- 表面の法線方向から見たときの2次元的な大きさが10nm以上500nm未満の複数の凹部を有する、反転されたモスアイ構造を表面に有する型の製造方法であって、
(a)請求項1から9のいずれかに記載の型基材を用意する工程と、
(b)前記アルミニウム合金層を部分的に陽極酸化することによって、複数の微細な凹部を有するポーラスアルミナ層を形成する工程と、
(c)前記工程(b)の後に、前記ポーラスアルミナ層を、エッチング液に接触させることによって、前記ポーラスアルミナ層の前記複数の微細な凹部を拡大させる工程と、
(d)前記工程(c)の後に、さらに陽極酸化することによって、前記複数の微細な凹部を成長させる工程と
を包含する、型の製造方法。 - 基材と、前記基材上に形成されたポーラスアルミナ層とを有し、
前記ポーラスアルミナ層は、表面の法線方向から見たときの2次元的な大きさが10nm以上500nm未満の複数の凹部を有し、且つ、前記ポーラスアルミナ層は、窒素を含み、反転されたモスアイ構造を表面に有する型。 - 前記基材と前記ポーラスアルミナ層との間に、アルミニウム合金層を有し、
前記アルミニウム合金層は、アルミニウムと、アルミニウム以外の金属元素と、窒素とを含む、請求項14に記載の型。
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