ZA815985B - Multiple cell photoresponsive amorphous alloys and devices - Google Patents
Multiple cell photoresponsive amorphous alloys and devicesInfo
- Publication number
- ZA815985B ZA815985B ZA815985A ZA815985A ZA815985B ZA 815985 B ZA815985 B ZA 815985B ZA 815985 A ZA815985 A ZA 815985A ZA 815985 A ZA815985 A ZA 815985A ZA 815985 B ZA815985 B ZA 815985B
- Authority
- ZA
- South Africa
- Prior art keywords
- devices
- multiple cell
- amorphous alloys
- photoresponsive amorphous
- cell photoresponsive
- Prior art date
Links
- 229910045601 alloy Inorganic materials 0.000 title 1
- 239000000956 alloy Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
- H01L31/076—Multiple junction or tandem solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1604—Amorphous materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic Table
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
- Photoreceptors In Electrophotography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/185,520 US4342044A (en) | 1978-03-08 | 1980-09-09 | Method for optimizing photoresponsive amorphous alloys and devices |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA815985B true ZA815985B (en) | 1982-11-24 |
Family
ID=22681321
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA815986A ZA815986B (en) | 1980-09-09 | 1981-08-28 | Method for optimizing photoresponsive amorphous alloys and devices |
ZA815982A ZA815982B (en) | 1980-09-09 | 1981-08-28 | Method for grading the band gaps of amorphous alloys and devices |
ZA815984A ZA815984B (en) | 1980-09-09 | 1981-08-28 | Method of making photoresponsive amorphous germanium alloys and devices |
ZA815985A ZA815985B (en) | 1980-09-09 | 1981-08-28 | Multiple cell photoresponsive amorphous alloys and devices |
ZA815983A ZA815983B (en) | 1980-09-09 | 1981-08-28 | Method for increasing the band gap in photoresponsive amorphous alloys and devices |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA815986A ZA815986B (en) | 1980-09-09 | 1981-08-28 | Method for optimizing photoresponsive amorphous alloys and devices |
ZA815982A ZA815982B (en) | 1980-09-09 | 1981-08-28 | Method for grading the band gaps of amorphous alloys and devices |
ZA815984A ZA815984B (en) | 1980-09-09 | 1981-08-28 | Method of making photoresponsive amorphous germanium alloys and devices |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA815983A ZA815983B (en) | 1980-09-09 | 1981-08-28 | Method for increasing the band gap in photoresponsive amorphous alloys and devices |
Country Status (18)
Country | Link |
---|---|
US (1) | US4342044A (xx) |
JP (5) | JPS5779674A (xx) |
KR (1) | KR860002031B1 (xx) |
AU (1) | AU541974B2 (xx) |
BR (1) | BR8105745A (xx) |
CA (1) | CA1192818A (xx) |
DE (1) | DE3135393C2 (xx) |
ES (1) | ES8304612A1 (xx) |
FR (1) | FR2490016B1 (xx) |
GB (1) | GB2083702B (xx) |
IE (1) | IE52205B1 (xx) |
IL (1) | IL63752A (xx) |
IN (1) | IN157589B (xx) |
IT (1) | IT1195053B (xx) |
NL (1) | NL190256C (xx) |
PH (2) | PH19596A (xx) |
SE (1) | SE455553B (xx) |
ZA (5) | ZA815986B (xx) |
Families Citing this family (101)
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IL61678A (en) * | 1979-12-13 | 1984-04-30 | Energy Conversion Devices Inc | Programmable cell and programmable electronic arrays comprising such cells |
US4400409A (en) * | 1980-05-19 | 1983-08-23 | Energy Conversion Devices, Inc. | Method of making p-doped silicon films |
IN157458B (xx) * | 1980-09-09 | 1986-04-05 | Energy Conversion Devices Inc | |
NL8104138A (nl) * | 1980-09-09 | 1982-04-01 | Energy Conversion Devices Inc | Amorfe meercellige fotoresponsie-inrichting. |
US4522663A (en) * | 1980-09-09 | 1985-06-11 | Sovonics Solar Systems | Method for optimizing photoresponsive amorphous alloys and devices |
GB2086135B (en) * | 1980-09-30 | 1985-08-21 | Nippon Telegraph & Telephone | Electrode and semiconductor device provided with the electrode |
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US4441113A (en) * | 1981-02-13 | 1984-04-03 | Energy Conversion Devices, Inc. | P-Type semiconductor material having a wide band gap |
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JPS58128778A (ja) * | 1982-01-28 | 1983-08-01 | Seiko Epson Corp | 半導体装置 |
JPS58192044A (ja) * | 1982-05-06 | 1983-11-09 | Konishiroku Photo Ind Co Ltd | 感光体 |
JPS5955077A (ja) * | 1982-09-22 | 1984-03-29 | Sanyo Electric Co Ltd | 光起電力装置 |
JPS5954274A (ja) * | 1982-09-22 | 1984-03-29 | Sanyo Electric Co Ltd | 光起電力装置 |
JPS5954276A (ja) * | 1982-09-22 | 1984-03-29 | Sanyo Electric Co Ltd | 光起電力装置 |
US4520039A (en) * | 1982-09-23 | 1985-05-28 | Sovonics Solar Systems | Compositionally varied materials and method for synthesizing the materials |
JPS5961078A (ja) * | 1982-09-29 | 1984-04-07 | Sanyo Electric Co Ltd | 光起電力装置の製造方法 |
US4490733A (en) * | 1982-10-15 | 1984-12-25 | Sperry Corporation | Josephson device with tunneling barrier having low density of localized states and enhanced figures of merit |
NL8204056A (nl) * | 1982-10-21 | 1984-05-16 | Oce Nederland Bv | Fotogeleidend element voor toepassing in elektrofotografische kopieerprocessen. |
JPH077843B2 (ja) * | 1982-11-01 | 1995-01-30 | 鐘淵化学工業株式会社 | アモルフアス多元系半導体素子 |
JPH0588390A (ja) * | 1982-11-01 | 1993-04-09 | Kanegafuchi Chem Ind Co Ltd | 感光体用半導体素子 |
JPS5983916A (ja) * | 1982-11-01 | 1984-05-15 | Kanegafuchi Chem Ind Co Ltd | アモルフアス多元系半導体 |
JPS5990959A (ja) * | 1982-11-16 | 1984-05-25 | Sanyo Electric Co Ltd | アモルフアスシリコン電界効果型トランジスタ |
JPH0644638B2 (ja) * | 1982-12-29 | 1994-06-08 | 圭弘 濱川 | 異質単位セル同士のスタック形光起電力素子 |
GB2137810B (en) * | 1983-03-08 | 1986-10-22 | Agency Ind Science Techn | A solar cell of amorphous silicon |
DE3308269A1 (de) * | 1983-03-09 | 1984-09-13 | Licentia Patent-Verwaltungs-Gmbh | Solarzelle |
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JPH0614553B2 (ja) * | 1983-04-26 | 1994-02-23 | 日本電装株式会社 | アモルファス炭化シリコン系半導体およびその製造方法 |
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JPS6046079A (ja) * | 1983-08-23 | 1985-03-12 | Daihen Corp | 光起電力素子の製造方法 |
JPS6046078A (ja) * | 1983-08-23 | 1985-03-12 | Daihen Corp | 光起電力素子及びその製造方法 |
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JPH0658970B2 (ja) * | 1983-08-31 | 1994-08-03 | 工業技術院長 | 半導体装置 |
JPS6062166A (ja) * | 1983-09-14 | 1985-04-10 | Kanegafuchi Chem Ind Co Ltd | 光導電材料 |
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KR20070119613A (ko) * | 2005-01-31 | 2007-12-20 | 가부시키가이샤 아키타덴시시스테무즈 | 골전도 스피커 세트, 전자 기기, 전자 번역 시스템, 청각지원 시스템, 내비게이션 장치 및 휴대 전화기 |
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-
1980
- 1980-09-09 US US06/185,520 patent/US4342044A/en not_active Expired - Lifetime
-
1981
- 1981-08-28 ZA ZA815986A patent/ZA815986B/xx unknown
- 1981-08-28 ZA ZA815982A patent/ZA815982B/xx unknown
- 1981-08-28 ZA ZA815984A patent/ZA815984B/xx unknown
- 1981-08-28 ZA ZA815985A patent/ZA815985B/xx unknown
- 1981-08-28 ZA ZA815983A patent/ZA815983B/xx unknown
- 1981-09-07 GB GB8126965A patent/GB2083702B/en not_active Expired
- 1981-09-07 IT IT23826/81A patent/IT1195053B/it active
- 1981-09-07 FR FR8116954A patent/FR2490016B1/fr not_active Expired
- 1981-09-07 ES ES505266A patent/ES8304612A1/es not_active Expired
- 1981-09-07 PH PH26164A patent/PH19596A/en unknown
- 1981-09-07 JP JP56140836A patent/JPS5779674A/ja active Granted
- 1981-09-07 IL IL63752A patent/IL63752A/xx not_active IP Right Cessation
- 1981-09-07 IN IN1001/CAL/81A patent/IN157589B/en unknown
- 1981-09-07 JP JP56140830A patent/JPS5778183A/ja active Pending
- 1981-09-07 KR KR1019810003326A patent/KR860002031B1/ko active
- 1981-09-07 JP JP56140835A patent/JPS5779673A/ja active Pending
- 1981-09-07 SE SE8105275A patent/SE455553B/sv not_active IP Right Cessation
- 1981-09-07 DE DE3135393A patent/DE3135393C2/de not_active Expired
- 1981-09-07 JP JP56140834A patent/JPS5779672A/ja active Pending
- 1981-09-07 JP JP56140831A patent/JPS5778184A/ja active Pending
- 1981-09-07 NL NLAANVRAGE8104137,A patent/NL190256C/xx not_active IP Right Cessation
- 1981-09-07 IE IE2061/81A patent/IE52205B1/en not_active IP Right Cessation
- 1981-09-08 AU AU75017/81A patent/AU541974B2/en not_active Expired
- 1981-09-08 BR BR8105745A patent/BR8105745A/pt not_active IP Right Cessation
- 1981-09-08 CA CA000385391A patent/CA1192818A/en not_active Expired
-
1984
- 1984-03-06 PH PH30345A patent/PH19569A/en unknown
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