KR830008404A - 광반응 특성을 지니는 비결정 게르마늄 합금을 제조하는 방법과 장치 - Google Patents

광반응 특성을 지니는 비결정 게르마늄 합금을 제조하는 방법과 장치 Download PDF

Info

Publication number
KR830008404A
KR830008404A KR1019810003326A KR810003326A KR830008404A KR 830008404 A KR830008404 A KR 830008404A KR 1019810003326 A KR1019810003326 A KR 1019810003326A KR 810003326 A KR810003326 A KR 810003326A KR 830008404 A KR830008404 A KR 830008404A
Authority
KR
South Korea
Prior art keywords
alloy
component
photoreaction
density
band
Prior art date
Application number
KR1019810003326A
Other languages
English (en)
Other versions
KR860002031B1 (ko
Inventor
오브신스키 스탠포드
이주 마사추구
Original Assignee
오브신스키 스탠포드
에너지 컨버션 디바이시즈, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오브신스키 스탠포드, 에너지 컨버션 디바이시즈, 인코포레이티드 filed Critical 오브신스키 스탠포드
Publication of KR830008404A publication Critical patent/KR830008404A/ko
Application granted granted Critical
Publication of KR860002031B1 publication Critical patent/KR860002031B1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/075Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
    • H01L31/076Multiple junction or tandem solar cells
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0026Activation or excitation of reactive gases outside the coating chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
    • H01L29/1604Amorphous materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0376Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
    • H01L31/03762Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

내용 없음

Description

광반응 특성을 지니는 비결정 게르마늄 합금을 제조하는 방법과 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제5도는 활성화수소를 이전에 석출된 비결정 합금속에 확산하는 실시하는 장치를 도시하는 도면
제6도는 본 발명의 방법에 의해서 제조된 비정질 반도체 광수입 합금의 한 실시를 도시하도록 쇼트키 장벽 태양전지의 실시예의 부분 단면도.
제7도는 본 발명의 방법에 의해서 제조된 도우핑 비결정 반도체 합금을 지니는 p-n 접합 태양 전지 장치의 부분 단면도.
제8도는 본 발명의 방법에 의해서 제조된 비결정 반도체 합금을 지니는 광검출장치의 부분 단면도.
제9도는 본 발명의 방법에 의하여 제조된 비결정 반도체 합금을 지니는 제로스식 드럼의 부분 단면도.
제10도는 p-i-n 접합 태양전지 장치의 부분 단면도.
제11도는 n-i-p 접합 태양전지 장치의 부분 단면도.
제12도는 비결정 합금을 석출하는 플라즈마 활성 증기 석출장치와 이와 결합되는 본 발명의 조절 요소부를 도시하는 도면.

Claims (35)

  1. 적어도 실리콘을 지니는 재료를 기질위에 석출시키고 적어도 하나의 밀도의 상태 감소 성분을 상기 재료에 결합시키는 방법에 있어서, 특수한 광반응 파장기능을 위해 조절되는 밴드 간격을 지니는 합금을 생성시키도록 밴드 간격속의 상태를 증가시키지 않고 적어도 하나의 밴드 간격 조절성분을 상기 재료속에 주입시키는 것을 특징으로 하는 개선된 광반응 비결정 합금을 제조하는 방법.
  2. 상기 조절 성분이 게르마늄인 것을 특징으로 하는 1항의 방법.
  3. 상기 합금이 적어도 SiF4, H2및 GeH4의 혼합물로부터 글로우 방전 석출되는 것을 특징으로 하는 1항의 방법.
  4. 상기 혼합물이 1퍼센트 이상의 GeH4를 지니는 3항의 방법.
  5. 상기 SiF4및 H2의 혼합물이 4대 1내지 10대 1의 비율을 지니는 4항의 방법.
  6. 상기 합금이 활성 광반응 영역을 지니며 석출되고 상기 조절 성분이 적어도 상기 영역속에 주입되는 1항 내지 5항의 어느 것의 방법.
  7. 상기 재료속에 수소인 제2밀도의 상태 감소성분을 주입시키는 것을 특징으로 하는 1항 내지 6항중 어느 것의 방법.
  8. 상기의 2개의 밀도의 상태 감소성분이 상기 밴드 간격 조절 성분과 함께 동시에 상기 석출 합금속에 결합되는 것을 특징으로 하는 7항의 방법.
  9. 상기 감소성분이 석출후에 상기 합금속에 결합되는 것을 특징으로 하는 1항 내지 9항중 어느 것의 방법.
  10. 상기 조절성분이 불연속층의 상기 합금속에 주입되는 것을 특징으로 하는 1항 내지 9항중 하나의 방법.
  11. 상기 조절성분이 변화된 양으로 상기 합금속에 주입되는 것을 특징으로 하는 1항 내지 9항중 어느 것의 방법.
  12. 상기 조절성분이 상기 합금속으로 주입되기 전에 증발시키는 것을 특징으로 하는 1항 내지 11항중 어느 것의 방법.
  13. 상기 조절성분이 상기 합금속에 주입될때 플라즈마 활성화되는 것을 특징으로 하는 1항 내지 12항중 어느 것의 방법.
  14. 상기 조절성분을 플라즈마 활성 증기 석출에 의해서 활성화되는 것을 특징으로 하는 13항의 방법.
  15. 상기 합금이 1항 내지 14항의 방법중 어느 것에 따라 제조되는 것을 특징으로 하는 비결정 합금.
  16. 실리콘을 지니고 적어도 하나의 밀도의 상태 감소성분을 결합시키며 사이성분이 불소인 합금에 있어서, 간격속의 상태를 증가시키지 않고 밴드간격 조절성분을 지니며, 특수한 광반응 파장 기능을 위해서 조절된 밴드 간격을 지니는 합금(146, 168, 180, 194, 206, 208, 210, 214, 216, 218, 220).
  17. 상기 조절성분이 게르마늄인 것을 특징으로 하는 16항의 합금.
  18. 상기 합금이 활성 광반응 영역(150, 170, 172, 180, 186, 194, 208, 216) 을 지니며 상기 조절 성분이 적어도 상기 영역을 지니는 것을 특징으로 하는 16항 또는 17항의 합금.
  19. 제2의 밀도의 상태 감소성분이 수소인 것을 특징으로 하는 16항 내지 18항중어느 것의 합금.
  20. 상기 합금이 글로우 방전 석출에 의해서 석출되는 것을 특징으로 하는 16항 내지19항중 어느 것의 합금.
  21. 상기 조절성분이 불연속층 속에 석출되는 것을 특징으로 하는 16항 내지 20항중 어느 것의 합금.
  22. 상기 조절성분이 변화하는 양으로 함유되는 것을 특징으로 하는 16항 내지 21항중 어느 것의 합금.
  23. 전하 반송파를 발생시키기 위해 방사능이 층돌하는 밴드 간격을 지니는 활서 광반응 영역을 지니는 비결정 반도체 합금 몸체를 지니는 여러기지 재료의 적재층을 지니고 상기 비결정 합금이 적어도 하나의 밀도의 상태 감소성분을 지니며 상기 성분이 불소인 개선된 광반응 장치에 있어서, 간격속의 상태를 즐가시키지 않고 방사능 흡수를 증진시키도록 적어도 상기 광반응 영역(150,170,172,180,186,194,208,216)속의 밴드간격 조절성분을 지니고 상기 합금의 밴드간격이 특수한 광반응 파장기능을 위하여 조절되는 것을 특징으로 하는 합금(146, 168, 180, 194, 206, 2.8, 210, 214, 216, 218,220).
  24. 상기 광반응 영역의 밴드 간격이 1.6aV이하인 것을 특징으로 하는 23항의 장치.
  25. 상기 조절성분이 게르마늄인 것을 특징으로 하는 23항 또는 24항의 장치.
  26. 제2도의 밀도의 상태 감소성분이 수소인 것을 특징으로 하는 23항 내지 25항 중 어느 것의 장치.
  27. 상기 합금 몸체(146, 168, 180, 194, 206, 2.8, 210, 214, 216, 218,220)가 글로우 방전석출에 의해서 석출되는 23항 내지 26항중 어느 것의 장치.
  28. 상기 합금 몸체가 불연속층 속에 상기의 조절성분을 지니는 것을 특징으로 하는 23항 내지 27항중 어느 것의 장치.
  29. 상기 합금 몸체가 변화되는 양으로 상기 조절성분을 지니는 23항 내지 28항중 어느 것의 장치.
  30. 상기 합금 몸체가 쇼트키 장벽 태양 전지(142)의 일부를 형성하는 것을 특징으로 하는 23항 내지 25항중 어느 것의 장치.
  31. 상기 합금 몸체가 MIS 태양전지(142)의 일부를 형성하는 것을 특징으로 하는 29항 내지 31항중 어느 것의 장치.
  32. 상기 합금 몸체가 p-n접합장치(164,118,166)의 일부를 형성하는 것을 특징으로 하는 23항 내지 25항중 것의 장치.
  33. 상기 합금 몸체가 p-i-n장치(198,212)의 일부를 옇성하는 것을 특징으로 하는 23항 내지 29항중 어느 것의 장치.
  34. 상기 합금 몸체가 광검출기(178)의 일부를 형성하는 것을 특징으로 하는 23항 내지 29항중 어느 것의 장치.
  35. 상기 합금 몸체가 정전기상 발생장치(192)의 일부를 형성하는 23항 내지 29항중 어느 것의 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019810003326A 1980-09-09 1981-09-07 광응답 비정질 합금을 최적화하는 방법 및 디바이스 KR860002031B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/185,520 US4342044A (en) 1978-03-08 1980-09-09 Method for optimizing photoresponsive amorphous alloys and devices
US185520 1980-09-09

Publications (2)

Publication Number Publication Date
KR830008404A true KR830008404A (ko) 1983-11-18
KR860002031B1 KR860002031B1 (ko) 1986-11-15

Family

ID=22681321

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019810003326A KR860002031B1 (ko) 1980-09-09 1981-09-07 광응답 비정질 합금을 최적화하는 방법 및 디바이스

Country Status (18)

Country Link
US (1) US4342044A (ko)
JP (5) JPS5779673A (ko)
KR (1) KR860002031B1 (ko)
AU (1) AU541974B2 (ko)
BR (1) BR8105745A (ko)
CA (1) CA1192818A (ko)
DE (1) DE3135393C2 (ko)
ES (1) ES8304612A1 (ko)
FR (1) FR2490016B1 (ko)
GB (1) GB2083702B (ko)
IE (1) IE52205B1 (ko)
IL (1) IL63752A (ko)
IN (1) IN157589B (ko)
IT (1) IT1195053B (ko)
NL (1) NL190256C (ko)
PH (2) PH19596A (ko)
SE (1) SE455553B (ko)
ZA (5) ZA815983B (ko)

Families Citing this family (100)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4492810A (en) * 1978-03-08 1985-01-08 Sovonics Solar Systems Optimized doped and band gap adjusted photoresponsive amorphous alloys and devices
IL61678A (en) * 1979-12-13 1984-04-30 Energy Conversion Devices Inc Programmable cell and programmable electronic arrays comprising such cells
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
DE3135353A1 (de) * 1980-09-09 1982-07-08 Energy Conversion Devices Inc Fotoempfindliche amorphe mehrfachzellen-anordnung
US4522663A (en) * 1980-09-09 1985-06-11 Sovonics Solar Systems Method for optimizing photoresponsive amorphous alloys and devices
NL8104140A (nl) * 1980-09-09 1982-04-01 Energy Conversion Devices Inc Werkwijze voor het vervaardigen van amorfe halfgeleiderinrichtingen met verbeterde fotogevoelige eigenschappen alsmede als zodanig verkregen inrichtingen.
GB2086135B (en) * 1980-09-30 1985-08-21 Nippon Telegraph & Telephone Electrode and semiconductor device provided with the electrode
JPS5772370A (en) * 1980-10-23 1982-05-06 Canon Inc Photoelectric converter
US4499557A (en) * 1980-10-28 1985-02-12 Energy Conversion Devices, Inc. Programmable cell for use in programmable electronic arrays
US4891074A (en) * 1980-11-13 1990-01-02 Energy Conversion Devices, Inc. Multiple cell photoresponsive amorphous alloys and devices
US4441113A (en) * 1981-02-13 1984-04-03 Energy Conversion Devices, Inc. P-Type semiconductor material having a wide band gap
JPS57160123A (en) * 1981-03-30 1982-10-02 Hitachi Ltd Semiconductor device
US4523214A (en) * 1981-07-03 1985-06-11 Fuji Photo Film Co., Ltd. Solid state image pickup device utilizing microcrystalline and amorphous silicon
US4407710A (en) * 1981-10-15 1983-10-04 Exxon Research And Engineering Co. Hybrid method of making an amorphous silicon P-I-N semiconductor device
US4379943A (en) * 1981-12-14 1983-04-12 Energy Conversion Devices, Inc. Current enhanced photovoltaic device
JPS58128778A (ja) * 1982-01-28 1983-08-01 Seiko Epson Corp 半導体装置
JPS58192044A (ja) * 1982-05-06 1983-11-09 Konishiroku Photo Ind Co Ltd 感光体
JPS5954276A (ja) * 1982-09-22 1984-03-29 Sanyo Electric Co Ltd 光起電力装置
JPS5954274A (ja) * 1982-09-22 1984-03-29 Sanyo Electric Co Ltd 光起電力装置
JPS5955077A (ja) * 1982-09-22 1984-03-29 Sanyo Electric Co Ltd 光起電力装置
US4520039A (en) * 1982-09-23 1985-05-28 Sovonics Solar Systems Compositionally varied materials and method for synthesizing the materials
JPS5961078A (ja) * 1982-09-29 1984-04-07 Sanyo Electric Co Ltd 光起電力装置の製造方法
US4490733A (en) * 1982-10-15 1984-12-25 Sperry Corporation Josephson device with tunneling barrier having low density of localized states and enhanced figures of merit
NL8204056A (nl) * 1982-10-21 1984-05-16 Oce Nederland Bv Fotogeleidend element voor toepassing in elektrofotografische kopieerprocessen.
JPH0588390A (ja) * 1982-11-01 1993-04-09 Kanegafuchi Chem Ind Co Ltd 感光体用半導体素子
JPS5983916A (ja) * 1982-11-01 1984-05-15 Kanegafuchi Chem Ind Co Ltd アモルフアス多元系半導体
JPH077843B2 (ja) * 1982-11-01 1995-01-30 鐘淵化学工業株式会社 アモルフアス多元系半導体素子
JPS5990959A (ja) * 1982-11-16 1984-05-25 Sanyo Electric Co Ltd アモルフアスシリコン電界効果型トランジスタ
JPH0644638B2 (ja) * 1982-12-29 1994-06-08 圭弘 濱川 異質単位セル同士のスタック形光起電力素子
GB2137810B (en) * 1983-03-08 1986-10-22 Agency Ind Science Techn A solar cell of amorphous silicon
DE3308269A1 (de) * 1983-03-09 1984-09-13 Licentia Patent-Verwaltungs-Gmbh Solarzelle
US4471155A (en) * 1983-04-15 1984-09-11 Energy Conversion Devices, Inc. Narrow band gap photovoltaic devices with enhanced open circuit voltage
JPH0614553B2 (ja) * 1983-04-26 1994-02-23 日本電装株式会社 アモルファス炭化シリコン系半導体およびその製造方法
FR2545275B1 (fr) * 1983-04-27 1987-03-06 Rca Corp Photodetecteur tandem
JPS59204274A (ja) * 1983-05-06 1984-11-19 Seiko Instr & Electronics Ltd 薄膜トランジスタ
US4532198A (en) * 1983-05-09 1985-07-30 Canon Kabushiki Kaisha Photoconductive member
ES8602301A1 (es) * 1983-07-18 1985-11-01 Energy Conversion Devices Inc Una aleacion amorfa mejorada de separacion de bandas estrecha, para aplicaciones fotovoltaicas
JPS6046079A (ja) * 1983-08-23 1985-03-12 Daihen Corp 光起電力素子の製造方法
JPS6046078A (ja) * 1983-08-23 1985-03-12 Daihen Corp 光起電力素子及びその製造方法
US4569697A (en) * 1983-08-26 1986-02-11 Energy Conversion Devices, Inc. Method of forming photovoltaic quality amorphous alloys by passivating defect states
JPH0658970B2 (ja) * 1983-08-31 1994-08-03 工業技術院長 半導体装置
JPS6062166A (ja) * 1983-09-14 1985-04-10 Kanegafuchi Chem Ind Co Ltd 光導電材料
US4860069A (en) * 1983-09-24 1989-08-22 Semiconductor Energy Laboratory Co., Ltd. Non-single-cry stal semiconductor light emitting device
US4598164A (en) * 1983-10-06 1986-07-01 Exxon Research And Engineering Co. Solar cell made from amorphous superlattice material
JPS60107872A (ja) * 1983-11-16 1985-06-13 Kanegafuchi Chem Ind Co Ltd 光起電力装置
JPS60152971A (ja) * 1984-01-20 1985-08-12 Fuji Electric Corp Res & Dev Ltd 半導体放射線検出器
JPS60214572A (ja) * 1984-04-11 1985-10-26 Matsushita Electric Ind Co Ltd 薄膜太陽電池およびその製造方法
US4547621A (en) * 1984-06-25 1985-10-15 Sovonics Solar Systems Stable photovoltaic devices and method of producing same
JPS61133676A (ja) * 1984-12-03 1986-06-20 Showa Alum Corp a−Si太陽電池用基板
US4728998A (en) * 1984-09-06 1988-03-01 Fairchild Semiconductor Corporation CMOS circuit having a reduced tendency to latch
US4603471A (en) * 1984-09-06 1986-08-05 Fairchild Semiconductor Corporation Method for making a CMOS circuit having a reduced tendency to latch by controlling the band-gap of source and drain regions
US4849315A (en) * 1985-01-21 1989-07-18 Xerox Corporation Processes for restoring hydrogenated and halogenated amorphous silicon imaging members
JPS61232685A (ja) * 1985-04-09 1986-10-16 Agency Of Ind Science & Technol アモルフアスシリコン太陽電池およびその製造方法
JPH0624238B2 (ja) * 1985-04-16 1994-03-30 キヤノン株式会社 フォトセンサアレイの製造方法
JPS62111477A (ja) * 1985-11-09 1987-05-22 Agency Of Ind Science & Technol アモルフアスシリコン太陽電池
GB2185758B (en) * 1985-12-28 1990-09-05 Canon Kk Method for forming deposited film
US4725889A (en) * 1986-07-15 1988-02-16 Ovonic Imaging Systems, Inc. Photosensitive line imager utilizing a movable scanning arm
JPS6384075A (ja) * 1986-09-26 1988-04-14 Sanyo Electric Co Ltd 光起電力装置
JPH07105516B2 (ja) * 1988-11-05 1995-11-13 太陽誘電株式会社 非晶質半導体太陽電池
US5180690A (en) * 1988-12-14 1993-01-19 Energy Conversion Devices, Inc. Method of forming a layer of doped crystalline semiconductor alloy material
JP2647969B2 (ja) * 1989-06-20 1997-08-27 三洋電機株式会社 光起電力装置
JP2999280B2 (ja) * 1991-02-22 2000-01-17 キヤノン株式会社 光起電力素子
US5246506A (en) * 1991-07-16 1993-09-21 Solarex Corporation Multijunction photovoltaic device and fabrication method
US6114739A (en) * 1998-10-19 2000-09-05 Agilent Technologies Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode
US6774300B2 (en) * 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
JPWO2006080517A1 (ja) * 2005-01-31 2008-06-19 株式会社アキタ電子システムズ 骨導スピーカセット、電子機器、電子翻訳システム、聴覚支援システム、ナビゲーション装置、携帯電話機
EP1882275A1 (en) * 2005-05-17 2008-01-30 Interuniversitair Microelektronica Centrum Vzw Method for the production of photovoltaic cells
FR2893765A1 (fr) * 2005-11-21 2007-05-25 St Microelectronics Sa Circuit integre photosensible muni d'une couche reflective et procede de fabrication correspondant
JP2007281916A (ja) * 2006-04-07 2007-10-25 Nittetsu Elex Co Ltd イヤホンマイク
KR101363327B1 (ko) * 2007-08-16 2014-02-14 주성엔지니어링(주) 박막형 태양전지 및 그 제조방법
TW201017900A (en) * 2008-08-11 2010-05-01 Tg Solar Corp Solar cell and method for fabricating the same
FR2936241B1 (fr) * 2008-09-24 2011-07-15 Saint Gobain Electrode avant pour cellule solaire avec revetement antireflet.
US20100077649A1 (en) * 2008-09-26 2010-04-01 Giacobbe Michael J Fishing rod with real fish skin adornment and method of making
JP4764469B2 (ja) * 2008-10-31 2011-09-07 三菱重工業株式会社 光電変換装置及び光電変換装置の製造方法
KR20110013989A (ko) * 2009-08-04 2011-02-10 삼성전자주식회사 태양전지 모듈 및 그 제조방법
US9012766B2 (en) 2009-11-12 2015-04-21 Silevo, Inc. Aluminum grid as backside conductor on epitaxial silicon thin film solar cells
US20120006390A1 (en) * 2009-12-08 2012-01-12 Yijie Huo Nano-wire solar cell or detector
US9214576B2 (en) 2010-06-09 2015-12-15 Solarcity Corporation Transparent conducting oxide for photovoltaic devices
US9773928B2 (en) 2010-09-10 2017-09-26 Tesla, Inc. Solar cell with electroplated metal grid
US9800053B2 (en) 2010-10-08 2017-10-24 Tesla, Inc. Solar panels with integrated cell-level MPPT devices
US8668984B2 (en) * 2010-10-14 2014-03-11 Wnc Solar, Llc Multilayer composite
DE102011000502A1 (de) * 2011-02-04 2012-08-09 Solibro Gmbh Abscheidevorrichtung und Verfahren zur Herstellung eines Tiegels hierfür
US9054256B2 (en) 2011-06-02 2015-06-09 Solarcity Corporation Tunneling-junction solar cell with copper grid for concentrated photovoltaic application
FR2993087B1 (fr) * 2012-07-06 2014-06-27 Wysips Dispositif pour ameliorer la qualite d'une image recouverte d'un film photovoltaique semi-transparent
AU2013326971B2 (en) 2012-10-04 2016-06-30 Tesla, Inc. Photovoltaic devices with electroplated metal grids
US9865754B2 (en) 2012-10-10 2018-01-09 Tesla, Inc. Hole collectors for silicon photovoltaic cells
US9281436B2 (en) 2012-12-28 2016-03-08 Solarcity Corporation Radio-frequency sputtering system with rotary target for fabricating solar cells
US9219174B2 (en) 2013-01-11 2015-12-22 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US10074755B2 (en) 2013-01-11 2018-09-11 Tesla, Inc. High efficiency solar panel
US9412884B2 (en) 2013-01-11 2016-08-09 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US9624595B2 (en) 2013-05-24 2017-04-18 Solarcity Corporation Electroplating apparatus with improved throughput
US10309012B2 (en) 2014-07-03 2019-06-04 Tesla, Inc. Wafer carrier for reducing contamination from carbon particles and outgassing
US9899546B2 (en) 2014-12-05 2018-02-20 Tesla, Inc. Photovoltaic cells with electrodes adapted to house conductive paste
US9947822B2 (en) 2015-02-02 2018-04-17 Tesla, Inc. Bifacial photovoltaic module using heterojunction solar cells
US9761744B2 (en) 2015-10-22 2017-09-12 Tesla, Inc. System and method for manufacturing photovoltaic structures with a metal seed layer
US9842956B2 (en) 2015-12-21 2017-12-12 Tesla, Inc. System and method for mass-production of high-efficiency photovoltaic structures
US9496429B1 (en) 2015-12-30 2016-11-15 Solarcity Corporation System and method for tin plating metal electrodes
US10115838B2 (en) 2016-04-19 2018-10-30 Tesla, Inc. Photovoltaic structures with interlocking busbars
US10672919B2 (en) 2017-09-19 2020-06-02 Tesla, Inc. Moisture-resistant solar cells for solar roof tiles
US11190128B2 (en) 2018-02-27 2021-11-30 Tesla, Inc. Parallel-connected solar roof tile modules

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4196438A (en) * 1976-09-29 1980-04-01 Rca Corporation Article and device having an amorphous silicon containing a halogen and method of fabrication
US4109271A (en) * 1977-05-27 1978-08-22 Rca Corporation Amorphous silicon-amorphous silicon carbide photovoltaic device
US4217374A (en) * 1978-03-08 1980-08-12 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors
US4226898A (en) * 1978-03-16 1980-10-07 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process
JPS558002A (en) * 1978-06-30 1980-01-21 Fujitsu Ltd Semi-conductor base plate heating method
JPS5511329A (en) * 1978-07-08 1980-01-26 Shunpei Yamazaki Semiconductor device
JPS5513938A (en) * 1978-07-17 1980-01-31 Shunpei Yamazaki Photoelectronic conversion semiconductor device and its manufacturing method
GB2038086A (en) * 1978-12-19 1980-07-16 Standard Telephones Cables Ltd Amorphous semiconductor devices
JPS5511397A (en) * 1979-06-05 1980-01-26 Shunpei Yamazaki Semiconductor device with continuous connection and its production method

Also Published As

Publication number Publication date
IE812061L (en) 1982-03-09
ZA815986B (en) 1982-11-24
CA1192818A (en) 1985-09-03
SE455553B (sv) 1988-07-18
JPS5779674A (en) 1982-05-18
GB2083702A (en) 1982-03-24
FR2490016B1 (fr) 1985-11-29
JPS5779672A (en) 1982-05-18
PH19596A (en) 1986-05-26
IT1195053B (it) 1988-10-12
NL190256C (nl) 1993-12-16
IL63752A (en) 1984-07-31
ZA815985B (en) 1982-11-24
IN157589B (ko) 1986-05-03
AU7501781A (en) 1982-03-18
FR2490016A1 (fr) 1982-03-12
US4342044A (en) 1982-07-27
NL190256B (nl) 1993-07-16
JPS5778183A (en) 1982-05-15
SE8105275L (sv) 1982-03-10
GB2083702B (en) 1985-07-03
PH19569A (en) 1986-05-21
JPS6226196B2 (ko) 1987-06-08
AU541974B2 (en) 1985-01-31
DE3135393A1 (de) 1982-09-30
JPS5779673A (en) 1982-05-18
ZA815984B (en) 1982-10-27
ZA815983B (en) 1982-10-27
DE3135393C2 (de) 1985-10-10
BR8105745A (pt) 1982-05-25
NL8104137A (nl) 1982-04-01
ES505266A0 (es) 1983-02-01
IE52205B1 (en) 1987-08-05
ZA815982B (en) 1982-10-27
IL63752A0 (en) 1981-12-31
IT8123826A0 (it) 1981-09-07
KR860002031B1 (ko) 1986-11-15
ES8304612A1 (es) 1983-02-01
JPS5778184A (en) 1982-05-15

Similar Documents

Publication Publication Date Title
KR830008404A (ko) 광반응 특성을 지니는 비결정 게르마늄 합금을 제조하는 방법과 장치
KR830008406A (ko) 무정형 합금 및 소자의 밴드갭을 조절하는 방법
Rahman et al. Advances in surface passivation of c-Si solar cells
US4402762A (en) Method of making highly stable modified amorphous silicon and germanium films
KR840004825A (ko) 산소를 갖는 광대역 갭 p 비결정 실리콘 합금 및 이를 이용한 소자
GB2030766A (en) Laser treatment of semiconductor material
KR830008407A (ko) 증가된 밴드간격을 지니는 비경정 합금을 제조하는 방법과 장치
IE57299B1 (en) Microwave system and method of making semiconductor members and improved semiconductive members made thereby
GB2038086A (en) Amorphous semiconductor devices
Street Model for growth of a-Si: H and its alloys
US5391893A (en) Nonsingle crystal semiconductor and a semiconductor device using such semiconductor
JPS60189274A (ja) 半導体素子の製造方法
KR970012026A (ko) 수광 부재
KR830008405A (ko) 광반응 특성을 지니는 비결정 게르마늄 합금을 제조하는 방법과 장치
DE3447687C2 (ko)
DE3432480C2 (ko)
Honma et al. Optical and electronic properties of reactively sputtered amorphous GeN x: H
Irrera On the correlation among photodegradation, charged dangling bonds and microstructure in hydrogenated amorphous silicon
JPS6091362A (ja) 光導電部材
JPH0821546B2 (ja) 薄膜の製造方法
JP3099957B2 (ja) 光導電部材
US3975555A (en) Method of making electrical contacts having a low optical absorption
JPS61110152A (ja) 感光体
JPS62148966A (ja) 電子写真用感光体
Matsuda Control of plasma and surface conditions for low defect density a-Si: H at high growth rates