WO2022054828A1 - 光学積層体の製造方法 - Google Patents

光学積層体の製造方法 Download PDF

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Publication number
WO2022054828A1
WO2022054828A1 PCT/JP2021/032991 JP2021032991W WO2022054828A1 WO 2022054828 A1 WO2022054828 A1 WO 2022054828A1 JP 2021032991 W JP2021032991 W JP 2021032991W WO 2022054828 A1 WO2022054828 A1 WO 2022054828A1
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WIPO (PCT)
Prior art keywords
layer
optical
antifouling
optical functional
optical laminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/032991
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
智明 小林
臻 黄
克利 鈴木
嗣人 鈴木
祐子 木伏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dexerials Corp
Original Assignee
Dexerials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dexerials Corp filed Critical Dexerials Corp
Priority to KR1020247037154A priority Critical patent/KR102942402B1/ko
Priority to US18/044,295 priority patent/US12496792B2/en
Priority to KR1020227044279A priority patent/KR102730596B1/ko
Priority to CN202180054441.8A priority patent/CN116075750A/zh
Priority to EP21866787.1A priority patent/EP4212922A4/en
Publication of WO2022054828A1 publication Critical patent/WO2022054828A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0073—Optical laminates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00865—Applying coatings; tinting; colouring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16—Antifouling paints; Underwater paints
    • C09D5/1681—Antifouling coatings characterised by surface structure, e.g. for roughness effect giving superhydrophobic coatings or Lotus effect
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16—Antifouling paints; Underwater paints
    • C09D5/1693—Antifouling paints; Underwater paints as part of a multilayer system
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

Definitions

  • the thickness of the transparent substrate 11 is not particularly limited, but is preferably 25 ⁇ m or more, for example.
  • the film thickness of the transparent substrate 11 is more preferably 40 ⁇ m or more.
  • the thickness of the transparent base material 11 is 25 ⁇ m or more, the rigidity of the base material itself is ensured, and wrinkles are less likely to occur even if stress is applied to the optical laminate 10.
  • the thickness of the transparent base material 11 is 25 ⁇ m or more, even if the hard coat layer 12 is continuously formed on the transparent base material 11, wrinkles are less likely to occur and there is less concern in manufacturing, which is preferable.
  • the thickness of the transparent base material 11 is 40 ⁇ m or more, wrinkles are less likely to occur, which is preferable.
  • an adhesion layer forming step for forming the adhesion layer 13 and an optical functional layer forming step for forming the optical functional layer 14 are performed on the hard coat layer 12.
  • an antifouling layer forming step of forming the antifouling layer 15 on the optical functional layer 14 is performed.
  • the thin-film deposition source 43 is arranged to face the transparent base material 11 whose surface of the optical functional layer 14 has been treated, which is conveyed substantially horizontally between two adjacent guide rolls 22.
  • the thin-film deposition source 43 supplies an evaporative gas made of a material to be the antifouling layer 15 onto the optical functional layer 14.
  • the orientation of the vapor deposition source 43 can be arbitrarily set.
  • the heating device 53 heats the material to be the antifouling layer 15 to a vapor pressure temperature.
  • the heating device 53 one that heats by a resistance heating method, a heater heating method, an induction heating method, an electron beam method, or the like can be used.
  • a first surface treatment step is performed as a pretreatment for the surfaces on which the adhesion layer 13 and the optical functional layer 14 are formed.
  • the first surface treatment step is performed on the transparent base material 11 on which the hard coat layer 12 is formed.
  • the can roll 26 and the guide roll 22 are rotated to transport the transparent base material 11 on which the hard coat layer 12 is formed at a predetermined transport speed, and the hard is run on the can roll 26.
  • the surface of the coat layer 12 is treated.
  • the film thickness of the hard coat layer is the same, but the element of the antifouling layer of the optical laminate in which the antifouling layer is formed under the same vapor deposition conditions without going through the second surface treatment step.
  • the conditions for the second surface treatment are appropriately adjusted so that a predetermined rate of change is obtained. Examples of the surface treatment condition include the integrated output of glow discharge.
  • the optical functional layer forming step and the antifouling layer forming step are continuously performed under reduced pressure.
  • the optical functional layer forming step and the prevention are performed.
  • the foul layer forming step is continuously performed in-line while maintaining the reduced pressure state.
  • the in-line means that the antifouling layer forming step is performed without exposing the optical functional layer 14 formed in the optical functional layer forming step to the atmosphere.
  • optical laminates produced in the following Examples and Comparative Examples are examples of functions as an antireflection film, and the gist of the present invention is not limited thereto.
  • optical laminates of Examples 6 to 8 have a lower hue change ⁇ E (SCI) of 10 or less after the alkali resistance test as compared with Comparative Example 8 in which an antifouling layer is formed by coating, and the residual ratio of fluorine is low. It was also high at 85% or more, which was good.
  • SCI hue change

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Electroluminescent Light Sources (AREA)
PCT/JP2021/032991 2020-09-10 2021-09-08 光学積層体の製造方法 Ceased WO2022054828A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020247037154A KR102942402B1 (ko) 2020-09-10 2021-09-08 광학 적층체의 제조 방법
US18/044,295 US12496792B2 (en) 2020-09-10 2021-09-08 Production method for optical laminate
KR1020227044279A KR102730596B1 (ko) 2020-09-10 2021-09-08 광학 적층체의 제조 방법
CN202180054441.8A CN116075750A (zh) 2020-09-10 2021-09-08 光学层叠体的制造方法
EP21866787.1A EP4212922A4 (en) 2020-09-10 2021-09-08 PRODUCTION METHOD FOR OPTICAL LAMINATE

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020151806 2020-09-10
JP2020-151806 2020-09-10

Publications (1)

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WO2022054828A1 true WO2022054828A1 (ja) 2022-03-17

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PCT/JP2021/032991 Ceased WO2022054828A1 (ja) 2020-09-10 2021-09-08 光学積層体の製造方法
PCT/JP2021/032978 Ceased WO2022054827A1 (ja) 2020-09-10 2021-09-08 光学積層体、物品、光学積層体の製造方法

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PCT/JP2021/032978 Ceased WO2022054827A1 (ja) 2020-09-10 2021-09-08 光学積層体、物品、光学積層体の製造方法

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US (2) US12496792B2 (https=)
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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023167531A (ja) * 2022-05-12 2023-11-24 デクセリアルズ株式会社 光学積層体及び物品
WO2025177961A1 (ja) * 2024-02-19 2025-08-28 デクセリアルズ株式会社 光学積層体、光学積層体の製造方法及び物品
CN120366699B (zh) * 2025-06-20 2025-09-16 吉林省巨程智造光电技术有限公司 一种半导体制造用纳米光学镜片的多层镀膜方法及应用

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242970B2 (https=) 1985-04-02 1990-09-26
JP2000308846A (ja) * 1999-04-26 2000-11-07 Toppan Printing Co Ltd 防汚層の形成方法
JP2005301208A (ja) 2004-03-17 2005-10-27 Seiko Epson Corp 防汚性光学物品の製造方法
JP2006175438A (ja) 2005-12-22 2006-07-06 Toppan Printing Co Ltd 防汚層の形成方法
JP2009109850A (ja) * 2007-10-31 2009-05-21 Toppan Printing Co Ltd 反射防止フィルム及びその製造方法並びに反射防止フィルムを用いた偏光板及びその製造方法
JP2010191144A (ja) * 2009-02-18 2010-09-02 Toppan Printing Co Ltd 反射防止フィルム
CN105835465A (zh) * 2015-01-13 2016-08-10 南昌欧菲光学技术有限公司 增透防指纹叠层及其制作方法
JP2016224443A (ja) * 2015-05-27 2016-12-28 デクセリアルズ株式会社 積層薄膜、及び積層薄膜の製造方法
JP2017227898A (ja) * 2016-06-17 2017-12-28 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
WO2018193742A1 (ja) * 2017-04-20 2018-10-25 信越化学工業株式会社 反射防止部材及びその製造方法
WO2019064969A1 (ja) * 2017-09-28 2019-04-04 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
WO2019078313A1 (ja) 2017-10-19 2019-04-25 Ａｇｃ株式会社 透明基板積層体およびその製造方法
WO2020027037A1 (ja) * 2018-07-31 2020-02-06 日本電産株式会社 コーティング方法、光学部品、及びレンズアッセンブリ
JP2020151806A (ja) 2019-03-20 2020-09-24 株式会社東芝 研磨装置及び研磨方法
WO2021106797A1 (ja) * 2019-11-25 2021-06-03 日東電工株式会社 反射防止フィルムおよび画像表示装置
WO2021177348A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体の製造方法
WO2021177350A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体、物品、光学積層体の製造方法

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3360898B2 (ja) 1993-10-05 2003-01-07 日東電工株式会社 反射防止部材の製造方法及び偏光板
JPH10133001A (ja) 1996-11-01 1998-05-22 Nikon Corp 新規な撥水処理されたレンズ
JP3604055B2 (ja) 1997-05-07 2004-12-22 株式会社ダイオー 表面処理方法およびエチレン−テトラフルオロエチレン系共重合体成形体
EP0974560B2 (en) * 1997-12-09 2015-12-30 Nippon Sheet Glass Co., Ltd. Antireflection glass plate, process for producing the same, and antireflection coating composition
JP4733798B2 (ja) 1998-01-31 2011-07-27 凸版印刷株式会社 防汚剤、防汚層の形成方法、光学部材、反射防止光学部材、光学機能性部材及び表示装置
JPH11258405A (ja) 1998-03-12 1999-09-24 Toppan Printing Co Ltd 反射防止フィルム
JP2002243906A (ja) * 2001-02-21 2002-08-28 Toppan Printing Co Ltd 反射防止積層体及びその製造方法
JP4765185B2 (ja) 2001-03-28 2011-09-07 Ｔｄｋ株式会社 物体表面の防汚処理方法及び防汚処理された物体
JP4834939B2 (ja) 2001-08-28 2011-12-14 ソニー株式会社 反射防止フィルム
JP2004021550A (ja) 2002-06-14 2004-01-22 Sony Corp タッチパネル、表示体、反射防止フィルム及びこれらの製造方法
JP2004138662A (ja) 2002-10-15 2004-05-13 Fuji Photo Film Co Ltd 反射防止膜、反射防止フィルムおよび画像表示装置
JP2004170962A (ja) 2002-11-06 2004-06-17 Pentax Corp 反射防止眼鏡レンズ及びその製造方法
JP2004170500A (ja) 2002-11-18 2004-06-17 Seiko Epson Corp プラスチックレンズ及びその製造方法
JP2004258469A (ja) 2003-02-27 2004-09-16 Konica Minolta Holdings Inc 反射防止フィルム、反射防止フィルムの製造方法、偏光板及び表示装置
US7217440B2 (en) 2003-06-13 2007-05-15 Essilor International Compagnie Generale D'optique Process for replacing an initial outermost coating layer of a coated optical lens with a different coating layer or by depositing thereon a different coating layer
TWI388876B (zh) 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置
JP2006220733A (ja) * 2005-02-08 2006-08-24 Fuji Photo Film Co Ltd 反射防止フィルム、偏光板、及びそれを用いた画像表示装置
US8945684B2 (en) 2005-11-04 2015-02-03 Essilor International (Compagnie Generale D'optique) Process for coating an article with an anti-fouling surface coating by vacuum evaporation
JP2007194109A (ja) 2006-01-20 2007-08-02 Toppan Printing Co Ltd 導電性積層体、光学機能性フィルタおよび光学表示装置
JP2008062460A (ja) 2006-09-06 2008-03-21 Konica Minolta Holdings Inc 光学フィルムとそれを用いた画像表示素子
JP4964021B2 (ja) 2007-05-15 2012-06-27 旭化成ケミカルズ株式会社 防汚層の形成方法
JP5217887B2 (ja) 2008-01-28 2013-06-19 セイコーエプソン株式会社 光学物品
US8399110B2 (en) 2008-05-29 2013-03-19 Corning Incorporated Adhesive, hermetic oxide films for metal fluoride optics and method of making same
JP2011013654A (ja) 2008-10-23 2011-01-20 Seiko Epson Corp 多層反射防止層およびその製造方法、プラスチックレンズ
JP5245893B2 (ja) * 2009-02-13 2013-07-24 凸版印刷株式会社 多層フィルムおよびその製造方法
CN102012532B (zh) * 2009-09-03 2015-05-20 株式会社巴川制纸所 光学层叠体、偏振片及使用其的显示装置
JP5523066B2 (ja) * 2009-11-17 2014-06-18 ホーヤ レンズ マニュファクチャリング フィリピン インク 光学物品の製造方法
KR20120120264A (ko) 2010-01-29 2012-11-01 아사히 가라스 가부시키가이샤 불소 수지 성형체의 표면 처리 방법 및 불소 수지 성형체
US8709582B2 (en) * 2010-07-30 2014-04-29 Essilor International Optical article including an antireflecting coating having antifog properties and process for making same
CN103582829B (zh) * 2011-05-27 2015-12-02 柯尼卡美能达株式会社 防眩膜、其制造方法、偏振片、图像显示装置、及触摸面板用部件
KR101362967B1 (ko) * 2012-01-11 2014-02-13 정상희 플라즈마 처리된 옵티컬 본딩용 실리콘 점착 시트 및 그 제조 방법
JP5938280B2 (ja) 2012-06-22 2016-06-22 日華化学株式会社 パーフルオロポリエーテル変性シラン化合物、防汚性被膜形成用組成物、防汚性被膜、およびこの被膜を有する物品
KR20150118156A (ko) * 2013-02-22 2015-10-21 아사히 가라스 가부시키가이샤 광학 부품
JPWO2014199991A1 (ja) * 2013-06-11 2017-02-23 日本電気硝子株式会社 カバー部材、表示装置及びカバー部材の製造方法
WO2015159839A1 (ja) 2014-04-15 2015-10-22 旭硝子株式会社 反射防止積層体およびその製造方法
JP6661286B2 (ja) 2014-06-30 2020-03-11 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． 樹脂膜、光学部材および偏光部材
WO2016068112A1 (ja) 2014-10-30 2016-05-06 旭硝子株式会社 防汚膜付き基体
KR101807208B1 (ko) 2015-08-18 2017-12-08 주식회사 엘지화학 저굴절층 및 이를 포함하는 반사 방지 필름
WO2017030046A1 (ja) 2015-08-19 2017-02-23 旭硝子株式会社 積層体
US9733488B2 (en) 2015-11-16 2017-08-15 Younger Mfg. Co. Composite constructed optical lens
WO2017126300A1 (ja) 2016-01-19 2017-07-27 株式会社ニコン・エシロール 眼鏡レンズ
JP6787673B2 (ja) 2016-02-15 2020-11-18 デクセリアルズ株式会社 反射防止フィルム、及び反射防止フィルムの製造方法
JP2017161893A (ja) * 2016-03-03 2017-09-14 日東電工株式会社 光学積層体
JP6934308B2 (ja) 2016-04-01 2021-09-15 日東電工株式会社 光透過性フィルム
CN105779943A (zh) 2016-05-05 2016-07-20 厦门建霖工业有限公司 一种物理气相沉积氟硅烷制备疏水膜的方法
JP2018004921A (ja) 2016-06-30 2018-01-11 ホヤ レンズ タイランド リミテッドＨＯＹＡ Ｌｅｎｓ Ｔｈａｉｌａｎｄ Ｌｔｄ 眼鏡レンズ及び眼鏡レンズの製造方法
JP6746410B2 (ja) 2016-07-13 2020-08-26 大日本印刷株式会社 光学積層体
WO2018208760A1 (en) 2017-05-08 2018-11-15 Corning Incorporated Glass, glass-ceramic and ceramic articles with durable lubricious anti-fingerprint coatings over optical and scratch-resistant coatings and methods of making the same
WO2019035398A1 (ja) 2017-08-15 2019-02-21 大日本印刷株式会社 光学フィルム、偏光板、および画像表示装置
JP2020148787A (ja) 2018-06-06 2020-09-17 Ａｇｃ株式会社 透明部材
JP6999370B2 (ja) 2017-11-06 2022-01-18 日東電工株式会社 反射防止層付偏光板およびその製造方法
JP7121479B2 (ja) 2017-11-14 2022-08-18 株式会社トッパンＴｏｍｏｅｇａｗａオプティカルフィルム 光学積層体、偏光板及び表示装置
CN111183374B (zh) 2017-11-29 2022-05-03 日东电工株式会社 硬涂薄膜、光学层叠体及图像显示装置
CN208110086U (zh) 2018-01-25 2018-11-16 江苏新光镭射包装材料股份有限公司 耐指纹高遮蔽率的光学反射膜
JP2020037248A (ja) 2018-09-03 2020-03-12 住友化学株式会社 積層体及びその製造方法
JP6542970B2 (ja) * 2018-10-10 2019-07-10 デクセリアルズ株式会社 反射防止膜の製造方法
JP7089609B2 (ja) 2020-03-04 2022-06-22 デクセリアルズ株式会社 光学積層体、物品、光学積層体の製造方法
EP4183573A4 (en) 2020-07-17 2025-05-07 Dexerials Corporation METHOD FOR PRODUCING AN OPTICAL MULTILAYER BODY

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0242970B2 (https=) 1985-04-02 1990-09-26
JP2000308846A (ja) * 1999-04-26 2000-11-07 Toppan Printing Co Ltd 防汚層の形成方法
JP2005301208A (ja) 2004-03-17 2005-10-27 Seiko Epson Corp 防汚性光学物品の製造方法
JP2006175438A (ja) 2005-12-22 2006-07-06 Toppan Printing Co Ltd 防汚層の形成方法
JP2009109850A (ja) * 2007-10-31 2009-05-21 Toppan Printing Co Ltd 反射防止フィルム及びその製造方法並びに反射防止フィルムを用いた偏光板及びその製造方法
JP2010191144A (ja) * 2009-02-18 2010-09-02 Toppan Printing Co Ltd 反射防止フィルム
CN105835465A (zh) * 2015-01-13 2016-08-10 南昌欧菲光学技术有限公司 增透防指纹叠层及其制作方法
JP2016224443A (ja) * 2015-05-27 2016-12-28 デクセリアルズ株式会社 積層薄膜、及び積層薄膜の製造方法
JP2017227898A (ja) * 2016-06-17 2017-12-28 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
WO2018193742A1 (ja) * 2017-04-20 2018-10-25 信越化学工業株式会社 反射防止部材及びその製造方法
WO2019064969A1 (ja) * 2017-09-28 2019-04-04 日東電工株式会社 反射防止フィルムおよびその製造方法、ならびに反射防止層付き偏光板
WO2019078313A1 (ja) 2017-10-19 2019-04-25 Ａｇｃ株式会社 透明基板積層体およびその製造方法
WO2020027037A1 (ja) * 2018-07-31 2020-02-06 日本電産株式会社 コーティング方法、光学部品、及びレンズアッセンブリ
JP2020151806A (ja) 2019-03-20 2020-09-24 株式会社東芝 研磨装置及び研磨方法
WO2021106797A1 (ja) * 2019-11-25 2021-06-03 日東電工株式会社 反射防止フィルムおよび画像表示装置
WO2021177348A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体の製造方法
WO2021177350A1 (ja) * 2020-03-04 2021-09-10 デクセリアルズ株式会社 光学積層体、物品、光学積層体の製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4212922A4

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