Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
  • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
  • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
  • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
  • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
  • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
  • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/20—Exposure; Apparatus therefor
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/20—Exposure; Apparatus therefor
  • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
  • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
  • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
  • H05B33/00—Electroluminescent light sources
  • H05B33/02—Details
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
  • H05B33/00—Electroluminescent light sources
  • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
  • H05B33/00—Electroluminescent light sources
  • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
• • H—ELECTRICITY
  • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
  • H05B33/00—Electroluminescent light sources
  • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
  • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Definitions

• the present invention relates to a photosensitive resin composition.
• the present invention relates to a high-sensitivity black positive photosensitive resin composition and a partition wall or an insulating film of an organic EL display element using the same.
• a partition material is used at intervals of colored patterns in the display area, edges of the periphery of the display area, and the like in order to improve display characteristics.
• OLED organic EL display
• a partition material is used at intervals of colored patterns in the display area, edges of the periphery of the display area, and the like in order to improve display characteristics.
• a partition is formed, and the pixel of the organic material is formed between the partitions.
• This partition is generally formed by photolithography using a photosensitive resin composition. Specifically, the photosensitive resin composition is applied onto a substrate using a coating apparatus, and after removing volatile components by means of heating or the like, it is exposed through a mask.
• Patent Document 1 proposes a method of coloring a partition material using a radiation-sensitive resin composition containing a pigment.
• Patent Document 2 as a radiation-sensitive resin composition having high resolution and exhibiting light-shielding properties by heat treatment after exposure, a heat-sensitive dye is added to a positive radiation-sensitive resin composition containing an alkali-soluble resin and a quinonediazide compound.
• a composition to which is added has been proposed.
• the thermal dye since the thermal dye is unreacted and not in a colored state before exposure, the resin composition itself does not have light-shielding properties and radiation sensitivity is deteriorated. There is nothing. Therefore, a high-definition pattern can be formed, and the thermal dye reacts with the heat treatment after exposure to exhibit light shielding properties.
• the heat-sensitive dye used has a light-shielding property after heating, it is not black, and in an actual panel, the influence of the hue on the peripheral members is large, and the image quality may be deteriorated.
• the material for forming the pattern has high sensitivity in consideration of productivity and the like.
• a black photosensitive resin composition containing a black colorant when used, it causes exposure failure under normally used exposure conditions. For example, it is necessary to lengthen the exposure time, thereby reducing productivity. It was a factor.
• the present invention has been made on the basis of the above-described circumstances, and the purpose thereof is, for example, a high-sensitivity photosensitive material that can be used even under normal exposure conditions while being a black photosensitive resin composition. It is providing a functional resin composition.
• a quinonediazide adduct of a phenol compound having three or more phenolic hydroxyl groups hereinafter sometimes referred to as “a trivalent or higher phenol compound”
• a binder resin a binder resin
• a black colorant a quinonediazide adduct of a phenol compound having three or more phenolic hydroxyl groups
• a specific quinonediazide adduct is used in a black photosensitive resin composition containing a high-sensitivity, even if the photosensitive resin composition is black, the sensitivity of the pattern is increased by, for example, photolithography using normal exposure conditions. It has been found that the formability can be improved.
• the present invention includes the following aspects.
• (B) The quinonediazide adduct is (B1) a quinonediazide adduct in which one of the phenolic hydroxyl groups of a trihydric or higher phenolic compound is substituted with a structure represented by the formula (I) or (II); A quinonediazide adduct in which two of the phenolic hydroxyl groups of the phenolic compound are substituted with a structure represented by the formula (I) or (II);
• the photosensitive resin composition whose sum total of (b1) and (b2) is 60 mol% or more of the whole (B).
• R a to R d each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, and * represents a bonding portion with an aromatic ring of a trivalent or higher valent phenol compound. Is shown.
• the binder resin (A) is From the group consisting of (a1) an alkali-soluble copolymer of a polymerizable monomer having an alkali-soluble functional group and another polymerizable monomer, and (a2) an alkali-soluble resin having an epoxy group and a phenolic hydroxyl group. 5.
• the photosensitive resin composition according to any one of items 1 to 4, comprising at least one selected.
• Item 7 An organic EL device partition comprising a cured product of the photosensitive resin composition according to any one of Items 1 to 6.
• the binder resin (A) used in the photosensitive resin composition of the present invention is not particularly limited, but preferably has an alkali-soluble functional group and is alkali-soluble.
• the alkali-soluble functional group of the binder resin is not particularly limited, and examples thereof include a carboxyl group, an alcoholic hydroxyl group, a phenolic hydroxyl group, a sulfo group, a phosphoric acid group, and an acid anhydride group.
• a resin having both groups may be used.
• the binder resin include acrylic resin, styrene resin, epoxy resin, amide resin, phenol resin, and polyamic acid resin. These can be used alone or in combination of two or more kinds of resins.
• alkali-soluble resin examples include alkali-soluble copolymers (a1) of the following polymerizable monomers having an alkali-soluble group and other polymerizable monomers, alkali-soluble resins having an epoxy group and a phenolic hydroxyl group (a2) ) (Also referred to as “component (a2)”) and other alkali-soluble resins (a3) (also referred to as “component (a3)”) can be used.
• alkali-soluble means that it can be dissolved in an alkali solution, for example, a 2.38 mass% tetramethylammonium hydroxide aqueous solution.
• (A1) Alkali-soluble copolymer of polymerizable monomer having alkali-soluble group and other polymerizable monomer
• binder resin (A) of the present invention a polymerizable monomer having an alkali-soluble group and others It is preferable to contain the alkali-soluble copolymer (a1) of the polymerizable monomer.
• the alkali-soluble group of the copolymer (a1) include a carboxyl group, an alcoholic hydroxyl group, a phenolic hydroxyl group, a sulfo group, a phosphoric acid group, and an acid anhydride group.
• a copolymer of a polymerizable monomer having an alkali-soluble group and another polymerizable monomer is, for example, a polymerizable monomer having an alkali-soluble group and another polymerizable monomer, a polymerization initiator and It can be produced by radical polymerization with a RAFT agent (Reversible Addition Fragment Transfer) or the like. Alternatively, an alkali-soluble group may be added after the copolymer is synthesized by radical polymerization.
• the polymerizable functional group possessed by the polymerizable monomer include radically polymerizable functional groups.
• Examples of the polymerizable monomer having an alkali-soluble group include 4-hydroxystyrene, (meth) acrylic acid, ⁇ -bromo (meth) acrylic acid, ⁇ -chloro (meth) acrylic acid, ⁇ -furyl (meth).
• Examples include 4-hydroxyphenyl methacrylate, 3,5-dimethyl-4-hydroxybenzylacrylamide, 4-hydroxyphenylacrylamide, 4-hydroxyphenylmaleimide, 3-maleimidopropionic acid, 4-maleimidobutyric acid, and 6-maleimidohexanoic acid.
• polymerizable monomers examples include polymerizable styrene derivatives such as styrene, vinyl toluene, ⁇ -methyl styrene, p-methyl styrene, and p-ethyl styrene, acrylamide, acrylonitrile, vinyl n-butyl ether, and the like.
• Vinyl alcohol ethers (meth) acrylic acid alkyl ester, (meth) acrylic acid tetrahydrofurfuryl ester, (meth) acrylic acid dimethylaminoethyl ester, (meth) acrylic acid diethylaminoethyl ester, (meth) acrylic acid glycidyl ester (Meth) acrylic acid esters such as 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, isobornyl (meth) acrylate, maleic anhydride, Fe Rumareimido include N- substituted maleimide and cyclohexyl maleimide.
• the component (a1) has one or more kinds of cyclic structures such as an alicyclic structure, an aromatic structure, a polycyclic structure, an inorganic cyclic structure, and a heterocyclic structure. It is preferable to have.
• the polymerizable monomer having an alkali-soluble group (Wherein R 1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and r represents an integer of 1 to 5).
• R 1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and r represents an integer of 1 to 5).
• the polymerizable monomer having an alkali-soluble group capable of forming the monomer unit 4-hydroxyphenyl methacrylate is particularly preferable.
• R 2 and R 3 are each independently a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, a fully or partially fluorinated alkyl group having 1 to 3 carbon atoms, or a halogen atom
• R 4 represents a hydrogen atom, a linear or cyclic alkyl group having 1 to 6 carbon atoms, a phenyl group, or a hydroxy group, an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms.
• the polymerization initiator for producing an alkali-soluble copolymer of a polymerizable monomer having an alkali-soluble group and another polymerizable monomer by radical polymerization is not limited to the following, but 2,2 ′ -Azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), dimethyl 2,2'-azobis (2-methylpropionate), 4,4'-azobis (4-cyanovalerian) Acid), 2,2′-azobis (2,4-dimethylvaleronitrile) (AVN) and other azo polymerization initiators, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) ) Hexane, tert-butyl cumyl peroxide, di-tert-butyl peroxide, 1,1,3,3-tetramethylbutyl hydroperoxide, cumene ha Peroxide polymerization initiators such as dropper oxide having a 10-hour
• the amount of the polymerization initiator used is generally 0.01 parts by mass or more, 0.05 parts by mass or more, 0.5 parts by mass or more, 40 parts by mass or less, and 100 parts by mass with respect to 100 parts by mass of the polymerizable monomer mixture. It is preferable that it is less than or equal to 15 parts by mass.
• the RAFT agent is not limited to the following, but thiocarbonylthio compounds such as dithioesters, dithiocarbamates, trithiocarbonates, xanthates can be used.
• the RAFT agent can be used in the range of 0.005 to 20 parts by mass and preferably in the range of 0.01 to 10 parts by mass with respect to 100 parts by mass of the total amount of polymerizable monomers.
• the weight average molecular weight (Mw) of the alkali-soluble copolymer (a1) of the polymerizable monomer having an alkali-soluble group and another polymerizable monomer is 5,000 to 80,000, It is preferably 70,000, more preferably 7,000 to 60,000.
• the number average molecular weight (Mn) is in the range of 1000 to 30,000, preferably in the range of 3000 to 25,000, and more preferably in the range of 5,000 to 20,000.
• the polydispersity (Mw / Mn) is 1.0 to 3.0, preferably 1.1 to 2.8, and more preferably 1.2 to 2.5. When the weight average molecular weight, number average molecular weight, and polydispersity are in this range, the alkali solubility and developability are excellent.
• the shape maintaining property and developability can be improved and the outgas can be reduced.
• the reaction temperature and reaction time in the production of the alkali-soluble copolymer (a1) of a polymerizable monomer having an alkali-soluble group and another polymerizable monomer is 50 to 150 ° C.
• the temperature is preferably 60 to 130 ° C, more preferably 70 to 120 ° C.
• the polymerization time is preferably 2 to 24 hours, more preferably 3 to 12 hours, and further preferably 4 to 8 hours.
• the binder resin (A) of the present invention includes the following (a2) alkali-soluble resin (also referred to as component (a2)) having an epoxy group and a phenolic hydroxyl group, and other alkali-soluble resins ( a3) (also referred to as component (a3)).
• the binder resin (A) of the present invention also includes an alkali-soluble resin having an epoxy group and a phenolic hydroxyl group.
• the alkali-soluble resin reacts, for example, an epoxy group of a compound having at least two epoxy groups in one molecule (hereinafter sometimes referred to as “epoxy compound”) with a carboxyl group of hydroxybenzoic acids. Can be obtained.
• epoxy compound a compound having at least two epoxy groups in one molecule
• reaction formula 1 An example of a reaction in which one of the epoxy groups of the epoxy compound and a carboxyl group of hydroxybenzoic acid react to form a compound having a phenolic hydroxyl group is shown in the following reaction formula 1.
• Examples of the compound having at least two epoxy groups in one molecule include phenol novolac type epoxy resins, cresol novolac type epoxy resins, bisphenol type epoxy resins, biphenol type epoxy resins, naphthalene skeleton-containing epoxy resins, and heterocyclic epoxy resins. Etc. These epoxy compounds only need to have two or more epoxy groups in one molecule and can be used alone, but may be used in combination of two or more. In addition, since these compounds are a thermosetting type, it cannot be uniquely described from the difference in the presence or absence of an epoxy group, the kind of functional group, a polymerization degree, etc. as common knowledge of those skilled in the art.
• An example of the structure of the novolac type epoxy resin is shown in Formula (1).
• R 5 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
• q represents an integer of 0 to 50.
• phenol novolac type epoxy resin examples include EPICLON (registered trademark) N-770 (manufactured by DIC Corporation), jER (registered trademark) -152 (manufactured by Mitsubishi Chemical Corporation), and the like.
• cresol novolac type epoxy resin examples include EPICLON (registered trademark) N-695 (manufactured by DIC Corporation), EOCN (registered trademark) -102S (manufactured by Nippon Kayaku Co., Ltd.), and the like.
• bisphenol type epoxy resins examples include bisphenol A type epoxy resins such as jER (registered trademark) 828, jER (registered trademark) 1001 (manufactured by Mitsubishi Chemical Corporation), and YD-128 (trade name, manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.).
• Bisphenol F type epoxy resin such as JER (registered trademark) 806 (manufactured by Mitsubishi Chemical Corporation), YDF-170 (trade name, manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), and the like.
• biphenol type epoxy resin examples include jER (registered trademark) YX-4000, jER (registered trademark) YL-6121H (manufactured by Mitsubishi Chemical Corporation), and the like.
• naphthalene skeleton-containing epoxy resin examples include NC-7000 (trade name, manufactured by Nippon Kayaku Co., Ltd.), EXA-4750 (trade name, manufactured by DIC Corporation), and the like.
• Examples of the alicyclic epoxy resin include EHPE (registered trademark) -3150 (manufactured by Daicel Chemical Industries, Ltd.).
• heterocyclic epoxy resin examples include TEPIC (registered trademark), TEPIC-L, TEPIC-H, and TEPIC-S (manufactured by Nissan Chemical Industries, Ltd.).
• “Hydroxybenzoic acid” refers to a compound in which at least one of the 2-6 positions of benzoic acid is substituted with a hydroxyl group.
• a hydroxyl group For example, salicylic acid, 4-hydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 2,4 -Dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,4-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, 2-hydroxy-5-nitrobenzoic acid, 3-hydroxy Examples thereof include -4-nitrobenzoic acid and 4-hydroxy-3-nitrobenzoic acid, and dihydroxybenzoic acids are preferable from the viewpoint of enhancing alkali developability. These hydroxybenzoic acids can be used alone or in combination of two or more.
• the hydroxybenzoic acid is preferably 0.20 to 0.90 equivalent, more preferably 1 equivalent to 1 equivalent of the epoxy group of the epoxy compound. Is used in an amount of 0.25 to 0.85 equivalents, more preferably 0.30 to 0.80 equivalents. If hydroxybenzoic acid is 0.2 equivalent or more, sufficient alkali solubility is expressed, and if it is 0.9 equivalent or less, increase in molecular weight due to side reaction can be suppressed.
• a catalyst may be used to promote the reaction.
• the amount of the catalyst used is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the reaction raw material mixture comprising the epoxy compound and hydroxybenzoic acid.
• the reaction temperature is preferably 60 to 150 ° C., and the reaction time is preferably 3 to 30 hours.
• the catalyst used in this reaction include triethylamine, benzyldimethylamine, triethylammonium chloride, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, chromium octoate, and zirconium octoate.
• the number average molecular weight of the alkali-soluble resin (a2) having an epoxy group and a phenolic hydroxyl group is preferably in the range of 500 to 8000, more preferably in the range of 1000 to 6000, and in the range of 1500 to 4000. Is more preferable. If the molecular weight is 500 or more, the solubility in an alkaline aqueous solution is appropriate, so that the resin of the photosensitive material is good. If the molecular weight is 8000 or less, the coatability and developability are good.
• alkali-soluble resins include, for example, phenol novolak resins, cresol novolak resins, triphenylmethane type phenol resins, phenol aralkyl resins, biphenyl aralkyl phenol resins, and phenol-dicyclopentadiene.
• Well-known phenol resins, such as copolymer resin, are mentioned.
• a polyalkenylphenol resin obtained by converting these hydroxyl groups into alkenyl ethers and further rearranging the alkenyl ether groups may be used as the binder resin (A).
• alkali-soluble resin examples include a hydroxypolystyrene resin derivative having a structure of the formula (2). By containing such a resin, it is possible to improve the development characteristics of the resulting photosensitive resin composition and to contribute to the reduction of outgas.
• R 6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms
• m represents an integer of 1 to 4
• n represents an integer of 1 to 4
• m + n is within a range of 2 to 5.
• R 7 represents at least one selected from the group consisting of a hydrogen atom, a methyl group, an ethyl group, and a propyl group.
• a hydroxypolystyrene resin derivative As the binder resin (A) of the photosensitive resin composition of the present invention, it is represented by the monomer unit represented by the formula (2) and the formula (3) from the viewpoint of alkali developability and outgassing.
• a copolymer having a monomer unit is preferred.
• R 8 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and p represents an integer of 1 to 5)
• Examples of the monomer unit represented by the general formula (3) include phenols such as p-hydroxystyrene, m-hydroxystyrene, o-hydroxystyrene, p-isopropenylphenol, m-isopropenylphenol, and o-isopropenylphenol.
• aromatic vinyl compounds having a functional hydroxyl group a polymer or a copolymer obtained by polymerizing one or two or more kinds by a known method is allowed to react with formaldehyde by a known method, or an alcohol. It is obtained by reacting with
• aromatic vinyl compound having a phenolic hydroxyl group p-hydroxystyrene and m-hydroxystyrene are preferably used.
• the preferred number average molecular weight is in the range of 1000 to 20000, more preferably in the range of 3000 to 10,000. preferable.
• the molecular weight is 1000 or more, the alkali solubility is appropriate, so that it is suitable as a resin for the photosensitive material.
• the molecular weight is 20000 or less, the coating property and the developability are good.
• a component (a1) corresponds also to alkali-soluble resin (a2) which has an epoxy group and a phenolic hydroxyl group
• the component (a2) falls under other alkali-soluble resin (a3), it is handled as the component (a2). That is, the alkali-soluble resin (a2) having an epoxy group and a phenolic hydroxyl group and the other alkali-soluble resin (a3) exclude those corresponding to the component (a1).
• the binder resin (A) one type of resin may be used alone, or two or more types of resins may be used in combination.
• the binder resin (A) contains at least one selected from the group represented by the component (a2) and the component (a3) in addition to the component (a1), the binder resin (A) is 100 parts by mass.
• the total amount of at least one component selected from the group represented by component (a2) and component (a3) is preferably 1 to 100 parts by mass, more preferably 10 to 100 parts by mass, and still more preferably 30 to 100 parts by mass.
• component (a2) and component (a3) are contained within this range, the heat resistance of the photosensitive resin composition is good.
• the photosensitive resin composition of the present invention is a quinonediazide adduct of trivalent or higher phenolic compound as a radiation sensitive compound. Containing.
• the quinonediazide adduct is, for example, a trivalent phenol compound represented by the formula (III): At least one of the three phenolic hydroxyl groups of the phenolic compound is substituted with a group having a quinonediazide structure, for example, a naphthoquinonediazidesulfonate group (the hydroxyl group of the phenolic compound is esterified (sulfonated) with a quinonediazidesulfonic acid halide) I) The following compounds are meant.
• the quinonediazide adduct (B) (naphthoquinonediazide sulfonate ester) of the present invention is known to generate a carboxyl group through the reaction shown in the following reaction formula (2) when exposed to ultraviolet light or the like. .
• the exposed portion (film) can be dissolved in alkaline water, and alkali developability is exhibited.
• the quinonediazide adduct (B) of a trivalent or higher valent phenol compound used in the present invention has a structure in which one of the phenolic hydroxyl groups of the trivalent or higher valent phenol compound is represented by the formula (I) or (II).
• (B1) a quinonediazide addition product in which two of the phenolic hydroxyl groups of a trivalent or higher valent phenol compound are substituted with the structure represented by formula (I) or (II)
• the sum of (b1) and (b2) may be 60 mol% or more, preferably 65 mol% or more, more preferably 70 mol% or more of the whole (B).
• R a to R d each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, and * represents a bonding portion with an aromatic ring of a trivalent or higher valent phenol compound. Is shown.
• the present inventors have adopted a quinonediazide adduct (B) in which the quinonediazide adducts (b1) and (b2) are contained in the above-mentioned specific ratio as the radiation-sensitive compound, so that the black color is highly sensitive while being black. It has been found that a photosensitive resin composition, in particular, a black positive photosensitive resin composition can be obtained.
• high sensitivity means a case where a resist pattern formed using the photosensitive resin composition is exposed at 150 mJ / cm 2 and no defect occurs in the resist pattern.
• a quinonediazide adduct in which the proportion of the photosensitive naphthoquinonediazide group is increased as much as possible.
• a radiation-sensitive material having a high proportion of quinonediazide adducts in which all of the three hydroxyl groups of the phenol compound are naphthoquinonediazidesulfonic acid esters.
• the sensitivity was not improved even when such a radiation sensitive material was used.
• the quinonediazide adduct (B) used in the present invention is a quinonediazide adduct in which one or two phenolic hydroxyl groups of a trivalent or higher phenol compound are photosensitive naphthoquinonediazidesulfonic acid esters, that is, as described above.
• the black photosensitive resin layer containing the quinonediazide adduct (B) of the present invention since the radiation-sensitive material having relatively low photosensitivity is uniformly distributed in the layer, the light to be exposed is It is considered that the entire black photosensitive resin layer can be efficiently exposed by reaching the inside of the layer without being completely absorbed near the surface layer of the photosensitive resin layer.
• the trivalent or higher valent phenol compound preferably has a molecular weight of 250 or more, or more preferably 300 or more, and the upper limit of the molecular weight is not particularly limited, but is 1000 or less, 800 or less, or 600 or less. be able to. Although it does not specifically limit as such a phenolic compound, The thing in which a phenolic compound has three or more aromatic rings is preferable. Specific examples include compounds represented by the following formulas (III) to (VI). (Hereafter, it may be expressed as “TS”), (Hereafter, it may be expressed as “CNB”), (Hereafter, it may be expressed as “TEKP”), (Hereafter, it may be described as “HP”.) Etc.
• the quinonediazide adduct (b1) or (b2) of a trivalent or higher valent phenol compound is obtained, for example, by subjecting a hydroxyl group of a trivalent or higher valent phenol compound to a compound represented by the formula (Ia) or (IIa).
• R a to R d each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, and X represents a halogen atom or OH.
• R a to R d are each independently preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or an alkoxy group, more preferably a hydrogen atom, a methyl group, or a methoxy group, and even more preferably a hydrogen atom.
• X is preferably a chlorine atom.
• Specific examples include 1,2-naphthoquinonediazide-5-sulfonic acid chloride, 1,2-naphthoquinonediazide-4-sulfonic acid chloride, and the like. Of these, 1,2-naphthoquinonediazide-5-sulfonic acid chloride is preferable.
• the content of (A) binder resin is 100 to 1000 parts by mass, preferably 150 to 1000 parts by mass, more preferably 100 parts by mass of (B) quinonediazide adduct. Is 170 to 500 parts by mass, or more preferably 200 to 400 parts by mass, and (C) the content of the black colorant is 15 to 750 parts by mass, preferably 30 to 350 parts by mass, or more preferably 60 to 260 parts by mass. It may be included in a range.
• the ratio (A / B) of (A) binder resin and (B) quinonediazide adduct is preferably 1.7 to 5.0 or more preferably 2.0 to 4.0.
• (C) Black coloring The ratio of the agent to (B) quinonediazide adduct (C / B) is preferably 0.3 to 3.5 or more preferably 0.6 to 2.6. Within such a range, alkali developability and sensitivity can be further improved.
• (C) Black colorant As the black colorant of the present invention, for example, a black dye (c1) defined by the color index (CI) of Solvent Black 27 to 47 can be used.
• the black dye is preferably C.I. of Solvent Black 27, 29 or 34. I. It is stipulated in. Solvent Black 27-47 C.I. I.
• the optical density (OD value) per 1 ⁇ m thickness of the film of the photosensitive resin composition after baking is set to 0.1 to 3.0. Can maintain a color closer to black.
• the optical density (OD value) per 1 ⁇ m of film thickness can be measured using a transmission densitometer and a film thickness measuring device. From this advantage, when the photosensitive resin composition of the present invention is used as a partition material for a display device such as an organic EL display, the visibility of the display device can be improved.
• Content of the black dye (c1) in the photosensitive resin composition in this invention is (A) binder resin, (B) quinonediazide compound, (C) black dye, and other solid content (except for black dye).
• the total amount is 100% by mass, preferably 0.1 to 50% by mass, more preferably 5 to 40% by mass.
• the content is 0.1% by mass or more, the OD value per 1 ⁇ m thickness of the cured film after firing can be in the range of 0.1 to 3.0, and black color can be maintained even when heated. .
• it is 50% by mass or less the remaining film ratio, heat resistance, sensitivity, and the like are good.
• the black pigment (c2) can also be used as the black colorant of the present invention.
• the black pigment include black pigments such as carbon black, carbon nanotube, acetylene black, graphite, iron black, aniline black, and titanium black. These may be used alone or in combination of two or more.
• the black pigment can be used in the form of a dispersion.
• the black pigment is preferably titanium black or carbon black, and more preferably titanium black.
• the titanium black used in the present invention is not particularly limited, but a method of heating and reducing a mixture of titanium dioxide and metal titanium in a reducing atmosphere (JP-A 49-5432), high-temperature hydrolysis of titanium tetrachloride.
• JP-A 49-5432 a method of heating and reducing a mixture of titanium dioxide and metal titanium in a reducing atmosphere
• JP-A 49-5432 high-temperature hydrolysis of titanium tetrachloride.
• a method of reducing ultrafine titanium dioxide obtained in the above in a reducing atmosphere containing hydrogen Japanese Patent Laid-Open No. 57-205322
• a method of reducing titanium dioxide or titanium hydroxide at high temperature in the presence of ammonia Japanese Patent Laid-Open No.
• JP-A-61-201610 a method of attaching a vanadium compound to titanium dioxide or titanium hydroxide and reducing it at high temperature in the presence of ammonia
• Examples of commercially available titanium black include Titanium Black 10S, 12S, 13R, 13M, 13M-C, 13-MT, 16M, UF-8 manufactured by Mitsubishi Materials Corporation, and Tilac D manufactured by Ako Kasei Co., Ltd. Can be mentioned. These titanium blacks may be used alone or in combination of two or more.
• the titanium black is preferably 3 to 30 parts by mass, more preferably 5 to 20 parts by mass, and still more preferably 8 to 15 parts by mass based on 100 parts by mass of the binder resin (A). If the content of titanium black is 3 to 30 parts by mass based on 100 parts by mass of the binder resin (A), the desired OD value (optical density) can be obtained.
• the average particle diameter D50 (volume basis) of titanium black in the dispersion is preferably 5 to 100 nm. When the average particle diameter D50 is 5 to 100 nm, high light shielding properties can be obtained.
• the average particle diameter D50 can be measured using a laser diffraction / scattering particle diameter distribution measuring apparatus Microtrac wave (Nikkiso Co., Ltd.).
• a black colorant when a black dye defined by the color index (CI) of Solvent Black 27 to 47, titanium black is adopted, it is particularly excellent in heat resistance, so even after a high temperature treatment at 200 ° C. or higher, The photosensitive resin composition containing the black colorant can maintain black and maintain high light shielding properties.
• CI color index
• the photosensitive resin composition of this invention can add a dispersing agent, another coloring agent, a thermosetting agent, surfactant, a solvent etc. as an arbitrary component.
• the optional component is defined as not applicable to any of (A) to (C).
• Dispersant may be used to disperse a pigment such as titanium black.
• known ones can be used.
• trade names DISPERBYK-110, DISPERBYK-111 manufactured by Big Chemie Japan Co., Ltd.
• trade names such as Disparon (registered trademark) PW-36, Disparon (registered trademark) DA -375 (manufactured by Enomoto Kasei Co., Ltd.)
• phosphoric acid esters such as phosphoric acid esters, polyphosphoric acid esters, phosphoric acid polyesters, polyether phosphoric acid esters
• Floren G-700, Floren G-900 Carboxyl group-containing polymer dispersants such as Floren GW-1500 (manufactured by Kyoeisha Chemical Co., Ltd.), higher fatty acid ester dispersions such as trade names Ajisper (registered trademark) PN411, Azisper (registered trademark) PA111
• a dispersant having no graft chain in the skeleton for example, trade names DISPERBYK-110, DISPERBYK-111 (manufactured by Big Chemie Japan Co., Ltd.) and the like are preferably used.
• the dispersant is preferably contained in an amount of 1 to 40 parts by weight, more preferably 2 to 30 parts by weight, and further preferably 3 to 20 parts by weight with respect to 100 parts by weight of the black pigment (c2). If the dispersant is 1 to 40 parts by mass with respect to 100 parts by mass of the black pigment (c2), the particles can be dispersed well.
• the photosensitive resin composition of the present invention may further contain other colorants as optional components.
• examples of such a colorant include dyes, organic pigments, and inorganic pigments, which can be used according to the purpose.
• the dye examples include azo dye, benzoquinone dye, naphthoquinone dye, anthraquinone dye, cyanine dye, squarylium dye, croconium dye, merocyanine dye, stilbene dye, diphenylmethane dye, triphenylmethane dye, fluorane dye, spiropyran dye, phthalocyanine dye, Examples include indigo dyes, fulgide dyes, nickel complex dyes, and azulene dyes.
• C.I. I. Pigment Yellow 20 24, 86, 93, 109, 110, 117, 125, 137, 138, 147, 148, 153, 154, 166, C.I. I. Pigment orange 36, 43, 51, 55, 59, 61, C.I. I. Pigment Red 9, 97, 122, 123, 149, 168, 177, 180, 192, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, C.I. I. Pigment violet 19, 23, 29, 30, 37, 40, 50, C.I. I. Pigment Blue 15, 15: 1, 15: 4, 22, 60, 64, C.I. I. Pigment green 7, C.I. I. And CI pigment brown 23, 25, 26.
• thermosetting agent it is preferable to contain a thermosetting agent in the photosensitive resin composition of the present invention because the composition can be cured by heating.
• a thermal radical generator can be used.
• the thermal radical generator include organic peroxides, and specifically include dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, and tert-butyl.
• Organic peroxides such as cumyl peroxide, di-tert-butyl peroxide, 1,1,3,3-tetramethylbutyl hydroperoxide, cumene hydroperoxide, etc. having a 10-hour half-life temperature of 100 to 170 ° C. Can be mentioned.
• thermosetting agent is based on 100 parts by mass of the total amount of the binder resin (A), the quinonediazide compound (B), the black colorant (C), and other solids (excluding the thermosetting agent). 0.1 to 5 parts by mass, more preferably 0.5 to 3 parts by mass.
• the photosensitive resin composition of the present invention can further contain, as an optional component, for example, a surfactant in order to improve applicability or developability of the coating film.
• a surfactant in order to improve applicability or developability of the coating film.
• surfactants include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, and polyoxyethylene oleyl ether; polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether Polyoxyethylene aryl ethers such as polyoxyethylene dilaurate, nonoxy surfactants such as polyoxyethylene dialkyl esters such as polyoxyethylene distearate; Megafac® F-251, F-281, F-430, F-444, R-40, F-553, F-554, F-555, F-556, F-557, F-558, F-559 ( Above, product name, manufactured by DIC Corporation), -Fluorosurfact
• Such a surfactant is based on a total amount of 100 parts by mass of the binder resin (A), the quinonediazide compound (B), the black colorant (C), and other solids (excluding the surfactant).
• the amount is preferably 2 parts by mass or less, more preferably 1 part by mass or less.
• the photosensitive resin composition of the present invention is preferably dissolved in a solvent and used in the form of a solution from the viewpoint of applicability to a substrate.
• a binder resin is dissolved in a solvent, and a quinonediazide compound, a black colorant and, if necessary, additives such as a thermosetting agent and a surfactant are mixed in a certain ratio, so that a photosensitivity in a solution state is obtained.
• Resin composition can be prepared.
• an appropriate solid content concentration can be adopted.
• the solid content concentration can be 1 to 60% by mass, preferably 3 to 50% by mass, and more preferably 5 to 40% by mass.
• the solvent examples include glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, and ethylene glycol monoethyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, diethylene glycol monomethyl ether, Diethylene glycols such as diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol monoethyl ether and diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate and other propylene glycol Glycol ethers, aromatic hydrocarbons such as toluene and xylene, ketones such as methyl ethyl ketone, methyl amyl ketone, cyclohe
• the binder resin (A), the quinonediazide compound (B), the black colorant (C), and other components as necessary are dissolved or dispersed in the solvent and mixed.
• an appropriate solid content concentration can be adopted, and for example, the solid content concentration can be 10 to 60% by mass.
• the prepared solution of the composition is usually filtered before use. Examples of the filtration means include a membrane filter having a pore diameter of 0.05 to 1.0 ⁇ m.
• the photosensitive resin composition of the present invention thus prepared is also excellent in long-term storage stability.
• the pigment dispersion can be produced by mixing a pigment, a solvent, and, if necessary, a dispersant.
• a disperser used to disintegrate or disperse the pigments.
• Ball types such as ball mills, sand mills, bead mills, paint shakers, rocking mills, blades such as kneaders, paddle mixers, planetary mixers, Henschel mixers, etc.
• Examples thereof include a roll type such as a mold and a three-roll mixer, and other examples include a crushing machine, a colloid mill, an ultrasonic wave, a homogenizer, and a rotation / revolution mixer.
• a ball type that can stably and finely disperse in a short time is preferable.
• the material of the ball used in the ball mold include glass, silicon nitride, alumina, zircon, zirconia, and steel.
• As the bead diameter a general shape having a diameter of 0.03 to 25 mm can be used, but a small diameter of 5 mm or less is preferable from the viewpoint of miniaturization.
• the order of addition when preparing the dispersion is not particularly limited, but the following order is desirable in order to obtain a good dispersion.
• the solvent and the dispersant are uniformly dispersed.
• uniformly dispersing the solvent and the dispersant in advance it is possible to suppress problems such as partial aggregation of particles caused by areas with a high concentration of the dispersant.
• the required amount of pigment is then placed in the previously prepared solution and finally the beads.
• preliminary dispersion may be performed.
• a binder resin or other resin component may be used for the purpose of compatibility with the resin and suppression of reaggregation of the pigment.
• a photosensitive resin composition in a solution state can be prepared by mixing additives such as a thermosetting agent and a surfactant in a predetermined ratio.
• the stirrer for mixing the pigment dispersion, binder resin, quinonediazide compound, and optional components is not particularly limited.
• Ball types such as ball mill, sand mill, bead mill, paint shaker, rocking mill, kneader, paddle mixer And blade types such as planetary mixers and Henschel mixers, and roll types such as three roll mixers.
• Other examples include crushing machines, colloid mills, ultrasonic waves, homogenizers, rotation / revolution mixers, and mechanical stirrers. When used at a laboratory level, a mechanical stirrer is preferable because it can be stably mixed in a short time.
• the stirring blade used at the time of stirring can be appropriately selected from a fan, a propeller, a cross, a turbine, a dragonfly type, and the like.
• a resin composition can be obtained by mixing a pigment dispersion or a binder resin solution and stirring at room temperature for 1 to 10 minutes at a rotation speed of 10 to 1000 rpm. It is preferable to filter the prepared composition liquid before use. Examples of the filtration means include a membrane filter having a pore diameter of 0.05 to 1.0 ⁇ m.
• the photosensitive resin composition of the present invention thus prepared is also excellent in long-term storage stability.
• the photosensitive resin composition of the present invention When the photosensitive resin composition of the present invention is used for, for example, positive type radiation lithography, first, the photosensitive resin composition of the present invention dissolved in a solvent is applied to the substrate surface, and the solvent is heated by means such as heating. Can be removed to form a coating film.
• the method for applying the photosensitive resin composition to the substrate surface is not particularly limited, and various methods such as a spray method, a roll coating method, a slit method, and a spin coating method can be employed.
• the solvent is usually dried by heating (pre-baking) to form a coating film.
• the heating conditions vary depending on the type of each component, the blending ratio, etc., but it is usually applied by heating at 70 to 130 ° C. for a predetermined time, for example, 1 to 20 minutes on a hot plate or 3 to 60 minutes in an oven.
• a membrane can be obtained.
• the pre-baked coating film is irradiated with radiation (eg, visible light, ultraviolet light, far ultraviolet light, etc.) through a mask having a predetermined pattern (exposure process), and then developed with a developer to remove unnecessary portions.
• radiation eg, visible light, ultraviolet light, far ultraviolet light, etc.
• Exposure process e.g., a predetermined pattern
• developer process e.g., a developer to remove unnecessary portions.
• preferable radiation is ultraviolet to visible light having a wavelength of 250 to 450 nm.
• Examples of the developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia; primary amines such as ethylamine and n-propylamine; Secondary amines such as n-propylamine; tertiary amines such as triethylamine and methyldiethylamine; alcohol amines such as dimethylethanolamine and triethanolamine; tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline Quaternary ammonium salts such as pyrrole, piperidine, cyclic amines such as 1,8-diazabicyclo [5.4.0] -7-undecene, 1,5-diazabicyclo [4.3.0] -5-nonane Use aqueous solutions of alkalis such as It can be.
• inorganic alkalis such as sodium hydroxide, potassium hydro
• the concentration is not particularly limited but is preferably 0.5 to 5.0% by mass.
• An aqueous solution obtained by adding an appropriate amount of a water-soluble organic solvent such as methanol or ethanol, a surfactant or the like to the alkaline aqueous solution can also be used as a developer.
• the developing time is usually 30 to 180 seconds, and the developing method may be any of a liquid filling method, a shower method, a dipping method and the like. After development, washing with running water is performed for 30 to 90 seconds, unnecessary portions are removed, and the pattern is formed by air drying with compressed air or compressed nitrogen. Thereafter, this pattern can be heat-treated at a predetermined temperature, for example, 120 to 350 ° C. for 20 to 200 minutes with a heating device such as a hot plate or an oven, but a coating film can be obtained. (Heat treatment process).
• the present invention includes (1) a coating process in which the photosensitive resin composition is dissolved in a solvent and applied to a substrate; (2) a drying process in which the solvent in the coated photosensitive resin composition is removed; 3) An exposure process of irradiating radiation through a photomask; (4) a development process of forming a pattern by alkali development; and (5) a heat treatment process of heating at a temperature of 100 to 350 ° C. Can be adopted. This method can be used, for example, for forming partition walls and insulating films of organic EL elements.
• a partition wall of an organic EL element made of a cured product of the photosensitive resin composition can be obtained.
• an insulating film of an organic EL element made of a cured product of the photosensitive resin composition can be obtained.
• an organic EL device containing a cured product of the photosensitive resin composition can be obtained.
• reaction liquid a1-1 This was dissolved in ⁇ -butyrolactone to obtain a resin liquid having a solid content of 20% by mass (resin liquid a1-1).
• the number average molecular weight of the obtained reaction product was 12400, and the weight average molecular weight was 21100.
• the obtained solution was dropped into 240 g of 1-methoxy-2-propyl acetate (manufactured by Daicel Corporation) in a 500 mL three-necked flask heated to 85 ° C. in a nitrogen gas atmosphere over 2 hours. The reaction was carried out at 0 ° C. for 3 hours. The reaction solution cooled to room temperature was dropped into 1800 g of toluene to precipitate a polymer. The precipitated polymer was recovered by filtration and vacuum dried at 80 ° C. for 15 hours to recover 129.7 g of a light yellow powder. This was dissolved in ⁇ -butyrolactone to obtain a resin liquid having a solid content of 20% by mass (resin liquid a1-2). The number average molecular weight of the obtained reaction product was 7500, and the weight average molecular weight was 11300.
• the obtained solution was dropped into 72.0 g of 1-methoxy-2-propyl acetate (manufactured by Daicel Corporation) heated to 85 ° C. under a nitrogen gas atmosphere in a 500 mL three-neck flask over 2 hours. Thereafter, the reaction was carried out at 85 ° C. for 5 hours.
• the reaction solution cooled to room temperature was dropped into 960 g of toluene to precipitate a polymer.
• the precipitated polymer was collected by filtration and vacuum dried at 90 ° C. for 9 hours to collect 37.8 g of white powder. This was dissolved in ⁇ -butyrolactone to obtain a resin liquid having a solid content of 20% by mass (resin liquid a1-3).
• the number average molecular weight of the obtained reaction product was 7400, and the weight average molecular weight was 14100.
• the weight average molecular weight and the number average molecular weight were calculated using a calibration curve prepared using a polystyrene standard substance under the following measurement conditions.
• Device name Shodex (registered trademark) GPC-101
• Binder resin As the binder resin, resin liquids a1-1 to a1-3, a2-1 to a2-3 synthesized according to Production Examples 1 to 6, and novolak phenol resin BRG-558 ( Resin liquid x1 prepared by adjusting the solid content to 20 mass% with ⁇ -butyrolactone was used.
• Table 1 shows materials other than the binder resin.
• Table 2 shows the ratio of the naphthoquinone diazide sulfonesulfonate group (DNQ) substituted with the phenolic hydroxyl group of the trivalent or higher valent phenol compound in the (B) quinone diazide adduct used.
• DNQ naphthoquinone diazide sulfonesulfonate group
• Examples 2 to 8, Comparative Examples 1 to 4 A positive photosensitive resin composition was prepared in the same manner as in Example 1 except that the composition shown in Table 3 was used.
• the unit of the numerical value of each component of the Example described in Table 3 is “g”
• the amount in parentheses is the amount of solid content (g).
• the positive photosensitive resin compositions prepared in each Example and each Comparative Example were evaluated for alkali developability, pattern formability, and OD value (optical density). The results are shown in Table 3.
• the evaluation method is as follows.
• the exposed coating film was subjected to alkali development with a 2.38 mass% tetramethylammonium hydroxide aqueous solution for 60 seconds using a spin developing device (AD-1200, manufactured by Takizawa Sangyo Co., Ltd.), and evaluated for alkali developability.
• a spin developing device AD-1200, manufactured by Takizawa Sangyo Co., Ltd.
• Alkali developability By observation using an optical microscope (VH-Z250, manufactured by Keyence Corporation), the case where there was no residue after alkali development was judged as “good”, and the case where there was a residue was judged as “impossible”.
• Evaluation of pattern formability was performed by measuring the line width of the pattern after alkali development. Using an optical microscope (VH-Z250, manufactured by Keyence Co., Ltd.), it was carried out by confirming the locations where the line width of the photomask line & space pattern was 10 ⁇ m. If the line width of the pattern line and the space pattern after alkali development is 1: 1, the line width of the line part is within ⁇ 10%, and other than “good” is “OK”, The pattern forming property was evaluated as “impossible”. In addition, in the item of pattern formability, those that were “impossible” in the evaluation of alkali developability were determined as “impossible to judge”.
• Each of the positive photosensitive resin compositions of Examples 1 to 8 and Comparative Examples 1 to 4 was applied to a glass substrate (size 100 mm ⁇ 100 mm ⁇ 0.7 mm) so as to have a thickness of about 1.3 ⁇ m.
• the solvent was dried by heating at 120 ° C. for 80 seconds.
• the coating film was obtained by making it harden
• the cured coating film was measured with a transmission densitometer (BMT-1, manufactured by Sakata Inx Engineering Co., Ltd.) and converted to an OD value per 1 ⁇ m.
• the thickness of the coating film was measured using an optical film thickness measuring device (F-20NIR, manufactured by Filmetrics Co., Ltd.).
• the black photosensitive resin composition of the present invention has high sensitivity, it can be suitably used for, for example, positive type radiation lithography.
• the organic EL element provided with the partition and insulating film formed from the black photosensitive resin composition of this invention is used suitably as an electronic component of the display apparatus which shows favorable contrast.

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