WO2017208525A1 - ボンディング装置、ボンディング方法及びボンディング制御プログラム - Google Patents
ボンディング装置、ボンディング方法及びボンディング制御プログラム Download PDFInfo
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- WO2017208525A1 WO2017208525A1 PCT/JP2017/006583 JP2017006583W WO2017208525A1 WO 2017208525 A1 WO2017208525 A1 WO 2017208525A1 JP 2017006583 W JP2017006583 W JP 2017006583W WO 2017208525 A1 WO2017208525 A1 WO 2017208525A1
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- 238000000034 method Methods 0.000 title claims description 25
- 230000007246 mechanism Effects 0.000 claims abstract description 89
- 238000000926 separation method Methods 0.000 claims abstract description 79
- 230000008569 process Effects 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 description 49
- 238000010586 diagram Methods 0.000 description 10
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 230000006870 function Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/10—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating making use of vibrations, e.g. ultrasonic welding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/26—Auxiliary equipment
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/78—Apparatus for connecting with wire connectors
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
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- H01L2224/78001—Calibration means
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/78251—Means for applying energy, e.g. heating means in the lower part of the bonding apparatus, e.g. in the apparatus chuck
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
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- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/78343—Means for applying energy, e.g. heating means by means of pressure by ultrasonic vibrations
- H01L2224/78347—Piezoelectric transducers
- H01L2224/78349—Piezoelectric transducers in the upper part of the bonding apparatus, e.g. in the capillary or wedge
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- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/78343—Means for applying energy, e.g. heating means by means of pressure by ultrasonic vibrations
- H01L2224/78353—Ultrasonic horns
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- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/788—Means for moving parts
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- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/788—Means for moving parts
- H01L2224/78801—Lower part of the bonding apparatus, e.g. XY table
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- H01L2224/78—Apparatus for connecting with wire connectors
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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- H01L2224/852—Applying energy for connecting
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
Definitions
- the present invention relates to a bonding apparatus, a bonding method, and a bonding control program for bonding parts to be bonded having three or more surfaces in different directions using bonding wires.
- the first bonding point and the second bonding point are mutually Located on a parallel plane.
- the first bonding point and the second bonding point may be located on a plane perpendicular to each other. Bonding was not possible with the device.
- the first bonding is performed by holding the semiconductor element on a stage and performing first bonding.
- An assembly apparatus capable of performing second bonding by rotating the stage 90 degrees after bonding is disclosed. As a result, even if the second bonding surface is substantially orthogonal to the first bonding surface, the first bonding surface and the second bonding surface can be bonded by rotating the stage by 90 degrees, so that mass production of semiconductor elements is possible. Can be achieved.
- Patent Document 2 discloses a wire bonding apparatus that performs reattachment / removal of a workpiece when performing a plurality of wire bondings between pads and leads on surfaces perpendicular to each other.
- the capillary is lifted after the wire is first bonded on the surface parallel to the stage by the capillary, and then the stage is rotated 90 degrees around the axis parallel to the stage passing through the inversion center of the stage.
- the second bonding is performed on the surface perpendicular to the workpiece stage by the capillary.
- the capillary is raised and stopped so that the lower end of the capillary is located near the inversion center. Thereafter, the stage is reversely rotated 90 degrees about an axis parallel to the stage passing through the inversion center, and returned to the original position.
- the stage is rotated by a predetermined angle while the work is in a horizontal state around the axis perpendicular to the stage, and the predetermined position on the work is positioned below the capillary by the rotation. Bond direction.
- the workpiece when performing vertical bonding on both surfaces of the workpiece as in a flat filter, the workpiece is rotated 180 degrees horizontally by the stage after the vertical bonding on one surface is completed, and the vertical bonding is performed on the opposite surface. be able to.
- Patent Document 3 discloses a method for connecting each sample in a light emitting diode array unit in which a surface light emitting diode array is mounted vertically or substantially perpendicularly to a base surface on which a driving IC or the like is mounted by wire bonding.
- a mounting apparatus for a light emitting diode array unit comprising: a rotation mechanism for rotating the sample stage 90 degrees about the longitudinal direction; and a mechanism for moving the stage in two directions perpendicular to the rotation axis in order to adjust the position of the rotation axis Is disclosed.
- Patent Document 4 discloses a method and apparatus relating to a three-axis sensor chip package.
- a sensor package includes a base, a first sensor die attached to the base, and a plurality of metal pads electrically coupled to the first active sensor circuit and the first active sensor circuit.
- a second sensor die attached to the base has a second active sensor circuit disposed on the first surface of the second sensor die and a second surface of the second sensor die.
- a second plurality of metal pads electrically coupled to the two active sensor circuits.
- the second sensor die is positioned so that the second active sensor circuit is oriented orthogonal to the first active sensor circuit and is perpendicular to the base.
- the second surface of the second sensor die is adjacent to the first surface and is angled with respect to the plane of the first surface.
- the triaxial sensor chip package is coupled by wire bonding interconnecting the first plurality of metal pads of the first sensor die with the second plurality of metal pads of the second sensor die.
- Patent Documents 1 to 4 are based on the premise that the height positions of a plurality of bonding locations of the parts to be bonded are aligned at the same height position.
- the movement distance of the bonding means with respect to the bonding location is set to a common movement distance.
- a semiconductor laser chip may have a plurality of bonding points having different heights disposed on three or more surfaces of the chip, and a plurality of bonding points having different heights disposed on the three or more surfaces. It is desired to develop a bonding apparatus capable of effectively performing a bonding process with a bonding means without complicating the mechanism of the bonding apparatus.
- an object of the present invention is to provide a reference for bonded parts in order to meet the demand for effective bonding processing with bonding means without complicating the mechanism of the bonding apparatus at a plurality of bonding locations having different heights.
- An object of the present invention is to provide a bonding apparatus that performs a bonding process on a plurality of bonding points having different distances to the (origin) position without changing the moving distance of the bonding means.
- a bonding apparatus includes a bonding means for bonding to a plurality of bonding points of a part to be bonded, a work holder that holds the part to be bonded on a mounting surface and has a reference posture facing the bonding means.
- a bonding stage having a rotation mechanism that rotates the work holder around the rotation axis from the reference posture, and a control unit that controls the rotation of the work holder, and the bonding means is in the reference posture. It is provided so as to be movable with respect to the mounting surface of the work holder, and has a reference position serving as a movement reference for the bonding means in the moving direction, and the parts to be bonded are attached to the plurality of bonding points.
- Bonding points having different separation distances from the reference position are included, and the control unit controls the rotation of the work holder according to the difference in the separation distances of the bonding points, thereby The difference between the separation distances of the bonding points is corrected.
- the rotation mechanism unit of the bonding apparatus is configured to be capable of rotating the work holder in the reference posture in the forward and reverse directions around the rotation axis.
- the bonding stage of the bonding apparatus includes a heat plate on which the part to be bonded can be mounted, and a heat block capable of heating the heat plate.
- a distance correction means for moving the component to be bonded to or away from the reference position.
- heat plate and the heat block of the bonding apparatus according to the present invention are divided and configured.
- the bonding apparatus further includes an ultrasonic wave generation unit capable of applying an ultrasonic vibration in the bonding unit, and the torque for suppressing the vibration caused by the ultrasonic wave generation unit is rotated. It has a torque generating means to be applied to the shaft.
- the component to be bonded of the bonding apparatus according to the present invention is provided in the vicinity of the rotating shaft of the bonding stage.
- the rotation mechanism portion of the bonding stage of the bonding apparatus is configured to be positioned below the rotation shaft, and the upper portion is configured so that the bonding head as the bonding means enters the bonding surface. Further, the movable range of the bonding head is widened.
- a bonding method in which bonding is performed by bonding means on a bonding point of a part to be bonded placed on a work holder placement surface of a bonding stage so that the work holder faces the bonding means.
- a reference position that is rotatable around a rotation axis from a reference posture and that the bonding means is movable with respect to the mounting surface of the work holder in the reference posture and serves as a reference for movement of the bonding means in the moving direction.
- the bonding points include a plurality of bonding points with different separation distances from the reference position along the moving direction in a state where the parts to be bonded are held by a work holder in a reference posture. And the difference in the separation distance between the bonding points. Flip by controlling the rotation of the workpiece holder, and correcting a difference of the distance of said plurality of bonding points.
- the bonding control program according to the present invention is the bonding control program for controlling the bonding process by the bonding means to the bonding point of the part to be bonded placed on the work holder placement surface of the bonding stage. It can be rotated around a rotation axis from a reference posture facing directly to the bonding means, and the bonding means is provided so as to be movable with respect to a mounting surface of the work holder in the reference posture. A plurality of bonding points having different separation distances from the reference position along the moving direction in a state where the component is held by the work holder in the reference posture are included, and the bonding means moves on the moving direction of the bonding means.
- the base serving as a movement reference for the bonding means A function of setting a position, and a function of correcting the difference of the separation distances of the plurality of bonding points by controlling the rotation of the work holder in accordance with the difference of the separation distances of the bonding points. It is made to perform.
- the bonding stage is rotated around the rotation axis to correct the separation distance of the bonding portion of the bonded component with respect to the bonding means, whereby the reference (origin) position of the bonded component is corrected.
- the bonding process can be performed on a plurality of bonding locations having different separation distances without changing the moving distance of the bonding means.
- the bonding stage rotates around the rotation axis, it is expected that the posture of the bonding stage with respect to the bonding means becomes a problem when the bonding process is performed. Therefore, according to the present invention, it is possible to stabilize the bonding posture by applying a torque to the bonding stage using a rotating mechanism for rotating the bonding stage.
- the present invention by adopting a simple mechanism of rotating the bonding stage without changing the moving distance of the bonding means, a plurality of different heights can be obtained without complicating the mechanism of the bonding apparatus.
- a plurality of bonding locations having different heights are disposed on three or more surfaces of the chip, they are disposed on these three or more surfaces. Bonding processing can be effectively performed at a plurality of bonding locations having different heights.
- the bonding head provided with the rotation mechanism is positioned as low as possible so that the bonding head is positioned above the bonding head.
- the movable range of the bonding head can be widened so that it can enter the bonding surface.
- the work holder can be rotated around the rotation axis from the reference posture facing the bonding means, and the bonding means is provided to be movable with respect to the mounting surface of the work holder in the reference posture.
- a reference position serving as a movement reference for the bonding means is set in the direction.
- a direction in which the bonding means moves in the vertical direction (Z direction) is assumed.
- the bonding points include a plurality of bonding points having different separation distances from the reference position along the moving direction in a state where the parts to be bonded are held by a work holder in a reference posture.
- the difference in the separation distances of the plurality of bonding points is corrected by controlling the rotation of the work holder in accordance with the difference in the separation distances of the bonding points.
- the bonding position refers to a bonding point having a different separation distance from the reference position along the moving direction in a state where the part to be bonded is held by the work holder in the reference posture.
- distance described in FIGS. 5, 6, 8, 10, 13, 14, 15, and 17 means “separation distance”.
- a bonding apparatus that bonds three or more surfaces to be bonded in different directions of the bonding surface moves not only the bonding head but also the stage side, so that the bonding position is stable. Desired. For this reason, it is necessary to position the mounting position of the part to be bonded in the vicinity of the rotation axis and to suppress vibration of the rotation mechanism.
- the bonding apparatus of the present invention can perform stable bonding by applying a large torque to the rotating shaft to stabilize the rotating mechanism and suppress vibration. For this reason, it becomes possible to position the mounting position of the part to be bonded in the vicinity of the rotation axis and to suppress the vibration of the rotation mechanism unit.
- FIG. 15 is a diagram showing a continuation of the flowchart showing the bonding operation shown in FIG. 14.
- FIG. 17 It is a figure which shows the positional relationship of the bonding point of the to-be-bonded components and the bonding tool in the wire bonding operation
- the present invention controls the rotation of the work holder in accordance with the difference in the separation distance of the bonding position with respect to the bonding component of the bonding head as a bonding means, thereby reducing the difference in the separation distance of the bonding position with respect to a plurality of bonding points of the bonding head. It is possible to correct and perform bonding.
- the rotation mechanism unit 70 (shown in FIG. 3) is such that the relative position of the bonding surface with respect to the bonding tool in a part to be bonded such as a semiconductor laser package having three or more bonding surfaces in different directions is located immediately above the bonding tool. When the distance on the bonding surface is different, the difference in the separation distance between the bonding positions is corrected so that bonding can be performed. Thereby, bonding of a semiconductor laser package or the like having three or more bonding surfaces in different directions can be performed, and productivity can be greatly improved.
- FIG. 1 is a perspective view showing a configuration of a wire bonding apparatus as a bonding apparatus according to the present invention.
- FIG. 2 is a block diagram showing the configuration of the control unit and drive unit of the wire bonding apparatus as the bonding apparatus of the present invention, and
- FIG. 3 shows the bonding stage (bonding rotation stage) of the wire bonding apparatus as the bonding apparatus of the present invention.
- FIG. 4 is a block diagram illustrating a configuration of a control unit and a drive unit of the rotation mechanism unit. As shown in FIGS.
- the wire bonding apparatus 1 includes a bonding head 3 and an XY as a positioning unit that mounts the bonding head 3 and moves it two-dimensionally in the X direction and / or the Y direction.
- a stage 18 and a bonding stage (bonding rotation stage) 50 on which a bonding component 44 mounted with a semiconductor laser chip or the like is mounted and a bonding operation is performed by the bonding tool 6 are provided.
- the control unit and the drive unit of the wire bonding apparatus 1 include a control unit 20 including a computer 21, an XY axis control unit 35, a Z axis control unit 36, and a rotation axis control unit 37, and XY.
- the XY axis control unit 35 designates the XY axis position control designation signal of the XY stage 18, the Z axis control unit 36 designates the Z axis position control designation signal of the bonding head 3, and the rotation axis control.
- the unit 37 generates a command signal for rotation control of the rotating shaft of the bonding stage (bonding rotary stage) 50 and outputs it to the drive unit 39. Since the bonding stage 50 is configured to be able to perform bonding work by rotating a part to be bonded, in the following description, the bonding stage 50 will be described as the bonding rotation stage 50.
- a bonding head 3 as a bonding means includes an ultrasonic transducer (not shown), an ultrasonic horn 5 having a capillary 6 as a bonding tool 6 at one end, and the other connected to a support shaft (not shown).
- the ultrasonic transducer, the ultrasonic horn 5 and the drive circuit (not shown) constitute an ultrasonic generation means.
- the motor for driving the bonding arm 4 is not limited to a linear motor, and may be another type of motor.
- the bonding head 3 grips the wire 40, and is fixed to the bonding arm 4, and a clamp 7 (holding means) that moves up and down and interlocks with the capillary 6. It has.
- a tension clamp 8 (shown in FIG. 2) is provided that blows air onto the wire 40 extending in the vertical direction via the capillary 6 and the clamp 7 to apply tension.
- the tension clamp 8 positioned on the clamp 7 is fixed to the bonding head 3 without interlocking with the capillary 6.
- the opening / closing mechanism of the clamp 7 that holds the wire 40 and the tension clamp 8 are controlled by the control unit 20 via the drive unit 39.
- the bonding head 3 has a discharge electrode 17 for melting the wire 40 by discharge to form a ball at the tip of the capillary 6.
- the control unit 20 includes a computer 21 having a CPU (not shown), a memory 22, and an input / output unit (not shown).
- the CPU of the computer 21 stores a program stored in the memory 22. This is executed to control the bonding apparatus 1.
- the memory 22 of the computer 21 can store data and the like in addition to programs.
- the memory 22 of the computer 21 stores a bonding control program for controlling the bonding process by the bonding means to the bonding points of the parts to be bonded mounted on the work holder mounting surface of the bonding stage.
- the work holder 52 can rotate around the rotation axis from a reference posture in which the work holder 52 faces the bonding means, and the bonding means moves relative to the mounting surface of the work holder 52 in the reference posture.
- the bonding points include a plurality of bonding points having different separation distances from the reference position along the moving direction in a state where the part to be bonded is held by the work holder in the reference posture.
- the work holder Based on the included configuration, the work holder according to the function of setting the reference position as a movement reference of the bonding means in the movement direction of the bonding means and the difference in the separation distance of the bonding points
- a device for correcting the difference in the separation distance of the plurality of bonding points by controlling the rotation of the plurality of bonding points Is a program for executing the door to the computer.
- This bonding control program is stored in the memory 22, and the CPU of the computer 21 reads out the bonding control program stored in the memory 22, thereby controlling the operation of the bonding apparatus of the present invention and controlling the bonding apparatus.
- the bonding method of the present invention is executed.
- an external input device 34 such as a keyboard is connected to the computer 21, and the vertical movement amount of the capillary 6 input via the external input device 34, the coordinates of the XY axes of the bonding points on the XY stage 18, the workpiece
- the rotation data of the rotation mechanism 70 of the holder 52 is stored in the memory 22.
- the bonding point refers to a position where an electrode, a terminal, or the like is to be bonded.
- the position of the capillary 6 in bonding is indicated by the distance in the Z-axis (vertical) direction from the origin position of the capillary 6.
- the origin position of the capillary 6 means the position of the capillary 6 when the origin is detected by the encoder.
- the position of the capillary 6 when the ball located at the tip of the capillary 6 contacts the bonding point corresponds to the vertical distance from the origin position of the capillary 6 at the time of contact.
- the origin position of the capillary 6 is set in advance. In the following description, the origin position of the capillary 6 is referred to as an origin o. Further, the origin position of the capillary 6 may be set differently for different surfaces of the parts to be bonded.
- an area in the XYZ axes where the bonding tool 6 such as the capillary 6 can be moved and bonded is referred to as a bondable area.
- the region on the XY axis where bonding is possible is defined by the movable range of the XY stage 18, and the region on the Z axis where bonding is possible is defined by the movable range of the bonding tool 6. Therefore, as will be described later, the bonding apparatus according to the present invention has a wide movable range of the bonding tool 6 so that bonding to a bonded component having three or more bonding surfaces in different directions can be easily performed. Has been.
- FIG. 3 is a perspective view showing the configuration of the bonding rotary stage of the wire bonding apparatus as the bonding apparatus of the present invention.
- the bonding rotary stage 50 includes a work holder 52 that holds and heats the component 44 to be bonded and a work holder 52 on which the component 44 to be bonded is placed at the position of the component 44 to be bonded.
- 3 has a rotating mechanism 70 (shown on the right side shown in FIG. 3) that rotates to the front side or the back side, and a slide mechanism (not shown) that holds and releases the workpiece 44 of the work holder 52. ing.
- the work holder 52 is provided below the heat plate 53, the heat plate 53 for placing and heating the component to be bonded 44, the heat block 54 for heating the heat plate 53, the heat insulating part 57 for blocking heat, and the heat insulating part 57. And a support portion 58 that supports the heat block 54 and the like, and a work presser 65 that holds the component 44 to be bonded.
- the heat plate 53 according to the present invention and the heat block 54 that heats the heat plate 53 are configured separately. By dividing the heat plate 53, the heat plate 53 can be replaced.
- the heat plate 53 mounts the component to be bonded 44 as a mounting surface, and heats the component to be bonded 44 with heat from the heat block 54.
- the heat plate 53 has a surface that is in close contact with the lower part of the component to be bonded 44 so as to efficiently transmit heat to the component to be bonded 44. Bonding is performed by placing the part to be bonded 44 on the heat plate 53.
- the heat plate 53 has distance correction means for correcting the bonding positions of the parts to be bonded having different distances so as to approach or separate from the distance positions where the bonding head 3 as a bonding means can be bonded.
- the distance correction means of the heat plate 53 separates the bonding positions in the Z-axis direction so that the bonding distances of the bonding parts of the bonding parts are the bonding distances that can be bonded by the bonding head 3 for each bonding part.
- the bonding process can be carried out without changing the moving distance of the bonding means for a plurality of bonding points having different distances from the reference (origin) position of the part to be bonded.
- the heat plate 53 can be provided with a suction hole for vacuum suction for sucking and fixing the component 44 to be bonded.
- the heat plate 53 according to the present invention is configured to be divided from the heat block 54 and, for example, is replaced with a heat plate 53 having a different thickness according to the height of the electrode of the component 44 to be bonded. Further, a mechanism for changing the height position of the surface of the heat plate 53 may be provided to automatically adjust the position.
- a heat block 54 is provided below the heat plate 53.
- the heat block 54 has a built-in heater, and the heater is controlled so that the temperature of the heat block 54 is detected by a temperature detection sensor and the heat block 54 maintains a predetermined temperature.
- suction holes for vacuum suction inside the heat block 54.
- the suction hole of the heat block 54 and the suction hole of the heat plate 53 are connected, and a metal tube 55 for vacuum suction piping is provided on the side surface of the heat block 54 to perform vacuum suction.
- a heat insulating portion 57 made of a heat insulating material is provided in the lower part of the heat block 54.
- the heat insulating part 57 blocks heat so that heat from the heat block 54 is not transmitted to the lower part.
- a support portion 58 is provided on the lower surface of the heat insulating portion 57.
- the support part 58 provided at the lower part of the heat insulating part 57 supports the heat plate 53, the heat block 54 and the heat insulating part 57 located at the upper part.
- support members 60 connected by springs such as elastic bodies are provided at both left and right ends of the support portion 58.
- Support members 60 positioned at both left and right ends of the support portion 58 are rotatably attached to a swing member 73 having a U shape of the rotation mechanism portion 70.
- the end portions of a pair of work pressers 65 provided on the left and right sides are fixed to the upper end surface of the support member 60.
- the support member 60 rotates about a portion attached to the swing member 73 by a slide mechanism (not shown) as a support shaft, and the upper end moves to the left and right.
- the work retainer 65 is slid to the left and right to be fixed so as to press the part to be bonded 44 on the heat plate 53, or the fixation is released.
- the work presser 65 may be moved up and down by moving up and down instead of moving the support member 60 left and right.
- the work retainer 65 moves upward to release the pressed part 44 to be bonded, and the work retainer 65 moves from top to bottom so that a part or side of the surface of the part 44 to be bonded is pressed and fixed. To do.
- the rotation mechanism unit 70 of the bonding rotation stage 50 is formed of a swing member 73 that is a substantially U-shaped rod-shaped member, and has rotation shafts 74 (shafts) at both ends of the swing member 73. . Further, a flat plate (not shown) for coupling and holding the work holder 52 is provided in the vicinity of the center position of the swing member 73 having a substantially U shape and a rod-like member.
- Rotating shafts 74 at both ends of the swing member 73 are attached to side plates 90 provided on the left and right via bearings 77. Further, the rotation shafts 74 at both ends are provided such that a virtual line (center line) connecting the centers of the rotation shafts 74 is parallel to the X-axis direction (or Y-axis direction) of the XY stage 18.
- both ends of the rotation shaft 74 of the rotation mechanism unit 70 are supported by the bearings 77 attached to the outside of the left and right side plates 90 and are rotatable.
- the heat plate 53, the heat block 54, the heat insulation part 57, and the support part 58 provided in the work holder 52 are integrally coupled in the vertical direction and attached to the rotation mechanism part 70.
- the work holder 52 is coupled and fixed via the support portion 58 and the flat plate of the swing member 73 having a substantially U shape of the rotation mechanism portion 70 and having a rod shape.
- the rotation of the rotation shaft 74 of the rotation mechanism unit 70 causes the work holder 52 fixed to the flat plate of the swing member 73 near the center of the substantially U shape to rotate.
- the space above the rotation shaft 74 is widely opened, so that the movable range of the bonding head is increased. It becomes the composition which becomes wide. As a result, bonding can be easily performed to a part to be bonded having three or more bonding surfaces in different directions.
- the rotation mechanism unit 70 sets the work holder 52 on which the component 44 to be bonded is placed in front of the center of the position of the component 44 to be bonded, and the forward direction (F direction) thereafter. Alternatively, it rotates in the reverse direction (hereinafter referred to as “R direction”), and can rotate continuously from 0 degree to 180 degrees. Note that the time when the rotation mechanism unit 70 rotates in the F direction is set to 0 degree to 90 degrees, and the time when the rotation mechanism unit 70 rotates in the R direction is set to 0 degree to -90 degrees.
- the component 44 to be bonded is bonded to the bonding rotary stage so that the rotation center of the rotation shaft 74 in the rotation mechanism unit 70 is located within the range from the bottom surface of the component 44 to be bonded to the separation distance of the bonding position of the bonding surface.
- the bonding point whose position is determined by the rotation is positioned in the bondable region so as to be in the vicinity of the 50 rotation shafts 74.
- the rotation mechanism unit 70 in the bonding rotation stage 50 is rotationally driven by a motor 85 via gears 80, 81, and 82.
- a gear 80 which is 32 spur gears in the present invention, is fixed to the rotation shaft of the motor 85, and the rotation of the motor 85 is rotated via a gear (spur gear) attached to three parallel shafts.
- the rotary shaft 74 is driven to rotate.
- the gear ratio of each gear for transmitting the rotation of the motor 85 to the rotation shaft 74 is set so that the gear ratio between the gear 80 and the gear 82 of the motor 85 is increased, and the gear 81 of the second shaft, 90 in the present invention, is set.
- the gear ratio between the spur gear and the third-axis gear 82 which is 110 spur gears in the present invention, is 1 or more (the gear ratio between the gear 80 and the gear 82 of the present invention is 1: 3.4). Is set.
- the intermediate gear 81 is for power transmission, and the gear ratio is set by the ratio of the gear 80 and the gear 82.
- the third-axis gear 82 is fixed to one rotation shaft 74 of the rotation mechanism unit 70.
- the motor 85 rotates
- the second-axis gear 81 rotates
- the second-axis gear 81 rotates.
- Is transmitted to the third-axis gear 82 and the third-axis gear 82 rotates to drive the rotation shaft 74 of the rotation mechanism unit 70 to rotate.
- the third-axis gear 82 attached to the rotating shaft 74 does not need to have a tooth surface with a central angle of 360 degrees, and has, for example, a tooth surface with a central angle of 200 degrees.
- the motor 85 has high torque and can be rotated at high speed.
- the gear 80 attached to the rotation shaft of the motor 85 is rotated, and a rotational force is applied to the rotation shaft 74 of the rotation mechanism unit 70 through the gears 81 and 82 having different gear ratios, and the rotation is driven with a large torque. .
- the motor 85 has a high holding force by generating a large torque with the gear 80, the gear 81, and the gear 82, vibration generated in the rotation mechanism unit 70 due to the rotation stop of the motor 85 can be suppressed.
- the motor 85, the gear 80, the gear 81, the gear 82, and the rotation mechanism unit 70 constitute torque generating means.
- the motor 85 is preferably a step (pulse) motor 85 that can control the rotation speed, rotation angle, and the like.
- the motor 85 is not limited to the step (pulse) motor 85 and may be another motor 85.
- the bonding apparatus has torque generating means for applying a large torque to the rotating shaft 74 of the rotating mechanism unit 70, and suppresses vibration during rotation of the work holder by the torque generating means. Bonds to the parts to be bonded.
- the three-axis gear ratio including the gear 80 of the motor 85 and the resolution of the motor 85 (per pulse)
- the motor 85 is rotated by the number of pulses obtained from the rotation angle.
- a signal (origin signal) indicating a horizontal state in which the rotation mechanism unit 70 is in the reference posture is detected by a sensor attached to the side plate 90 of the bonding rotation stage 50. For example, when the rotation mechanism unit 70 is in the horizontal state in the reference posture, an “ON” signal is output from the sensor.
- the rotation axis control unit 37 that controls the motor 85 determines the rotation direction and the number of pulses so as to rotate the rotation mechanism unit 70 at a predetermined angle with reference to the origin signal.
- the reference posture is set to the horizontal state.
- the reference posture is not limited to the horizontal state, and may be an inclined posture in which the horizontal posture is broken.
- a limit signal is output from the sensor.
- the rotation of the motor 85 is stopped by the limit signal so that the rotation mechanism unit 70 does not rotate beyond 0 to 180 degrees ( ⁇ 90 degrees to 0 degrees, 0 degrees to 90 degrees).
- the rotation mechanism unit 70 of the bonding rotary stage 50 mounts the work holder 52 including the heat plate 53, the heat block 54, and the work holder 65 on which the component 44 to be bonded is placed, and the rotation shaft 74 is centered. In addition, it can be rotated from 0 degrees to 180 degrees ( ⁇ 90 degrees) when viewed from the right side.
- the rotation mechanism unit 70 can rotate the work holder 52 on which the part 44 to be bonded 44 is placed around the rotation shaft 74 from 0 to more than 180 degrees in terms of structure. In order to prevent interference with the bonding tool 6 and the like, the rotation is controlled from 0 degrees to 180 degrees ( ⁇ 90 degrees).
- General-purpose bonding equipment does not change the attitude of the bonding stage, so even if the distance in the height direction of the bonding position of the part to be bonded to the bonding stage is different, the bonding stage should be adjusted as a reference.
- the bonding position separation distance is set based on the bonding stage as in a general-purpose bonding apparatus. It is difficult to adjust.
- the bonding apparatus 1 is configured so that the bonding target component 44 having bonding points on the plane that is the reference posture and the surface that is perpendicular to the plane does not change the moving distance of the bonding tool 6. Rotation is performed by the unit 70 to perform bonding.
- the present invention rotates the rotating mechanism portion 70 of the bonding stage (bonding rotation stage) so that bonding can be performed to the bonded components having three or more bonding surfaces in different directions. Bonding is performed by correcting the difference in the separation distance between the bonding positions of the components.
- the bonding rotary stage 50 shown in FIG. 3 has a slide mechanism (not shown) for driving a claw-shaped work presser 65 that holds the workpiece 44 mounted on the heat plate 53 from the left and right.
- the slide mechanism slides the support member 60 that supports the work presser 65 left and right to move the work presser 65.
- This slide mechanism operates independently of the rotation mechanism unit 70 and is fixed to the housing of the bonding rotation stage 50.
- the slide mechanism is composed of a cylinder or the like, and moves the work retainer 65 to the left and right by a signal from the drive unit 39.
- the part to be bonded 44 to be bonded by the bonding apparatus 1 according to the present invention is a semiconductor laser package or the like having three or more surfaces in different directions.
- a semiconductor laser package that emits laser light has a structure in which a semiconductor laser chip is mounted on a pedestal of the package, electrodes and the like of the semiconductor laser chip and lead terminals are connected by wires and covered with a cap.
- oscillation light is emitted from the side surface of the semiconductor laser chip.
- the semiconductor laser chip is mounted on the side surface of the support portion.
- One electrode of the semiconductor laser chip is provided on the surface of the semiconductor laser chip. For this reason, each of the three or more surfaces in different directions of the semiconductor laser chip is rotated to separate the bonding positions of the parts to be bonded. The difference is corrected and bonding is performed.
- the part to be bonded 44 is not limited to a semiconductor laser package having three or more bonding surfaces in different directions.
- the bonding distance between the bonding positions in the same surface is the same, different, or mixed. Also good.
- the wire bonding apparatus as the bonding apparatus 1 has the XY stage 18 movable in the X-axis and Y-axis directions, and the bonding tool 6 mounted on the XY stage 18 and movable in the Z-axis direction.
- the bonding head 3 includes a bonding rotary stage 50 that includes a rotation shaft 74 parallel to the X axis (or Y axis) of the XY stage 18 and includes a rotation mechanism unit 70 that rotates the component 44 to be bonded. .
- the wire bonding apparatus as the bonding apparatus 1 has a bonding position information input unit 30 for inputting a bonding position of a part to be bonded.
- the bonding position information input unit 30 inputs the position coordinates of the XY axis and the Z axis by teaching by an operator or the like.
- the wire bonding apparatus further includes a rotation stage angle rotation information input unit 31 for inputting the rotation angle of the rotation shaft of the rotation mechanism unit 70.
- the rotation stage angle rotation information input unit 31 inputs a rotation angle including the rotation direction of the part to be bonded at the time of bonding. That is, the rotation angle for correcting the difference between the separation distances of a plurality of bonding positions in the plane of the bonding point is input.
- the bonding position (bonding point) in the plane is the X-axis and Y-axis position coordinates on the XY stage 18, the Z-axis position coordinates on the bonding tool 6, and the rotation angle of the rotation shaft 74 of the rotation mechanism unit 70. Specified by.
- the position data for each bonding point is stored in the memory 22 of the control unit 20.
- the control unit 20 reads position data stored in the memory 22 and outputs rotation angle data to the rotation axis control unit 37 during bonding.
- the rotation axis control unit 37 controls the drive unit 39 so that the motor 85 performs a predetermined rotation operation.
- the rotation of the motor 85 is transmitted to the rotation shaft 74 through the gears 80, 81, and 82, and the rotation shaft 74 rotates. Since the gear ratio between the gear 80 attached to the rotation shaft of the motor 85 and the gear 82 that drives the rotation shaft 74 is a large value, applying a large torque to the rotation shaft 74 stabilizes the rotation mechanism unit, Stable bonding can be performed while suppressing vibration. For this reason, it becomes possible to position the mounting position of the part to be bonded in the vicinity of the rotation axis and to suppress the vibration of the rotation mechanism unit.
- FIG. 5 is a flowchart showing a teaching operation of a bonding apparatus for bonding parts to be bonded having electrodes with different separation distances of bonding positions in the first surface.
- FIG. 6 is a flowchart showing a bonding operation of a bonding apparatus for bonding components to be bonded having electrodes having different distances of bonding positions in the first surface.
- FIG. 7 is a diagram showing the positional relationship between the bonding points of the parts to be bonded and the bonding tool in the teaching and bonding operations shown in FIGS. 7 is an enlarged view showing the positional relationship between the part to be bonded 44 near the work holder 52 and the bonding tool 6.
- FIG. 7 is a diagram showing the positional relationship between the bonding points of the parts to be bonded and the bonding tool in the teaching and bonding operations shown in FIGS. 7 is an enlarged view showing the positional relationship between the part to be bonded 44 near the work holder 52 and the bonding tool 6.
- the X, Y position data of the rotation center of the bonding rotary stage 50 and the distance data of the Z axis are inputted, and the data is stored in the memory (step S1 shown in FIG. 5).
- the rotation center data of the bonding rotary stage 50 is used to calculate a new bonding position associated with the rotation for correcting the difference in the separation distance between the bonding positions.
- the input is performed when the bonding apparatus is started up.
- a semiconductor laser package 44 as a part to be bonded on which a semiconductor laser chip 45 is mounted is placed on a heat plate 53 of a work holder 52.
- the work holder 52 includes a heat plate 53, a heat block 54, a heat insulating portion 57, and a support portion 58.
- FIG. 7A shows a state in which the semiconductor laser chip 45 is mounted and the semiconductor laser package 44 having leads (not shown) underneath is placed on the heat plate 53.
- the bonding surface has three surfaces in different directions, and each surface is defined as a first surface BS1, a second surface BS2, and a third surface BS3.
- bonding points a, b, c, and d are located on the first surface BS1 (step S2 shown in FIG. 5).
- the X and Y position data of the bonding points a and b and the distance data La and Lb of the Z axis are input.
- the distance data La refers to the distance between the origin o, which is the origin position of the capillary 6 (reference position), and the bonding point a.
- the distance data Lb refers to the distance between the origin o and the bonding point b.
- step S4 information on the rotation direction and rotation angle ⁇ a for correcting the difference in the separation distance of the bonding position is acquired from the distance data La and Lb of the bonding points a and b in accordance with the difference in the separation distance of the bonding position. .
- the acquired rotation direction and rotation angle ⁇ a are stored in the memory (step S4 shown in FIG. 5).
- the X and Y position data of the bonding points c and d and the Z axis distance data Lc and Ld are input.
- the distance data Lc is the distance from the origin o to the bonding point c
- the distance data Ld is the distance from the origin o to the bonding point d.
- the X and Y position data of the bonding points c and d and the Z axis distance data Lc and Ld are stored in the memory (step S5 shown in FIG. 5).
- step S6 information on the rotation direction and rotation angle ⁇ b for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position from the distance data Lc and Ld of the bonding points c and d is acquired.
- the acquired rotation direction and rotation angle ⁇ b are stored in the memory (step S6 shown in FIG. 5).
- step S6 information on the rotation direction and rotation angle for correcting the difference of the separation distance of a bonding position from the distance data of a bonding point at the time of teaching operation.
- Information on the direction and rotation angle may be acquired. Thus, when teaching is performed, information on the rotation direction and rotation angle is acquired, and the distance is corrected.
- the bonding of the first surface BS1 shown in FIG. the information on the rotation direction and the rotation angle stored in the memory is read by teaching, and the bonding process is performed based on the information.
- position data of bonding points a, b, c, and d and Z-axis distance data are read from the memory (step S10 shown in FIG. 6).
- data on the rotation direction and rotation angle ⁇ a at the bonding points a and b is read from the memory (step S11 shown in FIG. 6).
- the rotation shaft 74 of the rotation mechanism unit 70 is rotated in the F direction at the read rotation angle ⁇ a.
- the distances and positions of the bonding points a and b after rotation are corrected, and bonding between the bonding points a and b is performed (step S13 shown in FIG. 6).
- the correction of the distance is a fine adjustment of the distance accompanying the rotation of the bonding point, and is similarly executed in the bonding process described below.
- step S14 data of the rotation direction and rotation angle ⁇ b at the bonding points c and d is read from the memory (step S14 shown in FIG. 6).
- the rotation shaft 74 of the rotation mechanism unit 70 is rotated in the R direction at the read rotation angle ⁇ b.
- step S16 The distance and position of the bonding points c and d after rotation are corrected, and bonding between the bonding points c and d is performed (step S16 shown in FIG. 6).
- the bonding points a, b, c, and d of the first surface BS1 in the semiconductor laser package 44 are bonded.
- the distance is changed as the rotation axis is rotated, so that the distance correction, which is a fine adjustment, is executed.
- FIG. 8 is a flowchart showing teaching and bonding operations of a part to be bonded having electrodes with different separation distances of bonding positions in the second surface.
- FIG. 9 is a diagram showing the positional relationship between the bonding points of the parts to be bonded and the bonding tool in the teaching and bonding operations shown in FIG.
- the bonding points e and f are the side surfaces of the semiconductor laser chip 45.
- the second surfaces BS2 of the bonding points e and f of the semiconductor laser package 44 are positioned horizontally.
- the distance data Le is the distance from the origin o to the bonding point e
- the distance data Lf is the distance from the origin o to the bonding point f.
- step S22 information on the rotation direction and the rotation angle ⁇ c for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position is obtained from the distance data Le and Lf of the bonding points e and f. .
- the acquired rotation direction and rotation angle ⁇ c are stored in the memory (step S22 shown in FIG. 8). Note that the teaching operation is performed only once in the case of the same semiconductor laser package 44.
- step S23 position data of bonding points e and f and Z-axis distance data Le and Lf are read from the memory (step S23 shown in FIG. 8). Further, data of the rotation direction and rotation angle ⁇ c at the bonding points e and f are read from the memory (step S24 shown in FIG. 8).
- the rotation shaft 74 of the rotation mechanism unit is rotated in the F direction at the read rotation angle ⁇ c.
- FIG. 10 is a flowchart showing teaching and bonding operations of a part to be bonded having electrodes with different separation distances of bonding positions in the third plane.
- FIG. 11 is a diagram showing the positional relationship between the bonding points of the parts to be bonded and the bonding tool in the teaching and bonding operations shown in FIG.
- the semiconductor laser package 44 is moved in the F direction by the rotation mechanism unit 70.
- the teaching operation is performed by rotating 90 degrees (90 degrees) (step S30 shown in FIG. 10).
- the third surface BS3 of the bonding points g and h is positioned horizontally.
- the X and Y position data of the bonding points g and h and the Z axis distance data Lg and Lh are inputted and stored in the memory (step S31 shown in FIG. 10).
- the distance data Lg is the distance from the origin o to the bonding point g
- the distance data Lh is the distance from the origin o to the bonding point h.
- step S32 information on the rotation direction and the rotation angle ⁇ d for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position is obtained from the distance data Lg and Lh of the bonding points g and h. .
- the acquired rotation direction and rotation angle ⁇ d are stored in the memory (step S32 shown in FIG. 10). Note that the teaching operation is performed only once in the case of the same semiconductor laser package 44.
- step S33 position data of bonding points g and h and distance data Lg and Lh on the Z axis are read from the memory. Further, data of the rotation direction and the rotation angle ⁇ d at the bonding points g and h is read from the memory (step S34 shown in FIG. 10).
- step S35 Lh (step S35 shown in FIG. 10). Correction of the distance and position of the bonding points g and h after the rotation is executed, and bonding between the bonding points g and h is performed (step S36 shown in FIG. 10).
- the bonding points g and h of the third surface BS3 in the semiconductor laser package 44 are bonded.
- the conventional bonding apparatus rotates only in the back side (R direction) of the bonding apparatus, but the bonding apparatus of the present invention can rotate the work holder to the front side (F direction) up to 90 degrees. Therefore, bonding to the three surfaces is possible with the component 44 to be bonded placed on the heat plate 53.
- FIG. 12 is a diagram for explaining the correction of the difference in the separation distance between the bonding positions of the parts to be bonded having different separation distances between the bonding positions.
- the part to be bonded has terminals a, b, c, and d having different bonding positions on one surface BS1.
- the bonding positions of the terminals a, b, c, and d by teaching, that is, the X-axis and Y-axis position data and the Z-axis distance data are input by the bonding position information input unit 30, and the data is stored in the memory.
- the distance data of the terminals a, b, c, and d are La, Lb, Lc, and Ld.
- the distance data La is the distance from the origin o to the terminal a
- the distance data Lb is the distance from the origin o to the terminal b
- the distance data Lc is the distance from the origin o to the terminal c
- the distance data Ld is from the origin o. This is the distance between terminals d.
- information on the rotation direction and rotation angle ⁇ a for correcting the difference in the separation distance of the bonding position is acquired from the distance data La and Lb of the bonding points a and b in accordance with the difference in the separation distance of the bonding position.
- information on the rotation direction and the rotation angle ⁇ b for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position from the distance data Lc and Ld of the bonding points c and d is acquired.
- the acquired rotation direction and rotation angles ⁇ a and ⁇ b are stored in the memory.
- the rotation shaft of the rotation mechanism unit is rotated at the rotation angle ⁇ a read from the memory.
- the rotation shaft of the rotation mechanism unit is rotated at the rotation angle ⁇ b read from the memory.
- the bonding points a, b, c, and d of the first surface BS1 in the semiconductor laser package 44 are bonded.
- the bonding apparatus controls the rotation of the work holder in accordance with the difference in the separation distance between the bonding positions with respect to the parts to be bonded that have different bonding positions at a plurality of bonding points in the plane. Therefore, in order to correct the difference in the separation distance of the bonding position with respect to a plurality of bonding points, the moving distance of the bonding means is not changed for a plurality of bonding points having different distances to the reference (origin) position of the part to be bonded.
- the bonding process can be performed and the movable range of the bonding tool can be narrowed to improve the bonding accuracy.
- FIG. 13 is a flowchart showing a teaching operation of a wire bonding apparatus for wire bonding a part to be bonded having a bonding surface on a plane and a surface perpendicular to the plane in a reference posture
- FIG. 14 is a reference posture.
- FIG. 15 is a flowchart showing a bonding operation of a wire bonding apparatus for wire bonding a bonding target having a bonding surface on a flat surface and a surface perpendicular to the plane in a horizontal state
- FIG. 15 is a flowchart showing the bonding operation shown in FIG.
- FIG. 16 is a diagram showing the positional relationship between the bonding point of the part to be bonded and the bonding tool in the wire bonding operation shown in FIGS.
- the component to be bonded (semiconductor laser package) 44 has three surfaces BS1, BS2, and BS3 in different directions of bonding surfaces, and BS1 includes bonding points a, b, c, d, the bonding point a and the bonding point b are connected by a wire or the like, and the bonding point c and the bonding point d are connected by a wire or the like.
- BS2 has bonding points e and f, the bonding point e and the bonding point f are connected by a wire or the like, and BS3 has bonding points g and h, and the bonding point g and the bonding point h. Are connected with a wire or the like.
- the semiconductor laser package 44 as a part to be bonded is placed on the heat plate 53, the work holder is operated, and the semiconductor laser package 44 is moved. Fix it.
- the rotation axis is rotated 90 degrees in the R direction so that BS2 of the part to be bonded 44 is in a horizontal state (step S40 shown in FIG. 13).
- the X and Y position data of the bonding points e and f located on the BS 2 and the Z axis distance data Le and Lf are input and stored in the memory (step S41 shown in FIG. 13).
- the distance data Le is the distance from the origin o to the bonding point e
- the distance data Lf is the distance from the origin o to the bonding point f.
- the information of the rotation direction and the rotation angle ⁇ c for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position is acquired from the distance data Le and Lf of the bonding points e and f.
- the acquired rotation direction and rotation angle ⁇ c are stored in the memory (step S42 shown in FIG. 13).
- the rotation axis is rotated 180 degrees in the F direction so that BS3 of the part to be bonded 44 is in a horizontal state (step S43 shown in FIG. 13).
- the X and Y position data of the bonding points g and h located on the BS 3 and the Z axis distance data Lg and Lh are inputted and stored in the memory (step S44 shown in FIG. 13).
- the distance data Lg is the distance from the origin o to the bonding point g
- the distance data Lh is the distance from the origin o to the bonding point h.
- step S45 information on the rotation direction and the rotation angle ⁇ d for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position is obtained from the distance data Lg and Lh of the bonding points g and h. .
- the acquired rotation direction and rotation angle ⁇ d are stored in the memory (step S45 shown in FIG. 13).
- the rotating shaft is rotated 90 degrees in the R direction so that BS1 of the part to be bonded 44 is in the horizontal state as the reference posture (step S46 shown in FIG. 13).
- the X and Y position data of the bonding points a, b, c and d located on the BS 1 and the Z axis distance data La, Lb, Lc and Ld are inputted and stored in the memory (step S47 shown in FIG. 13).
- the distance data La, Lb, Lc, and Ld of each bonding point refers to the distance between the bonding points from the origin o.
- step S48 information on the rotation direction and rotation angle ⁇ a for correcting the difference in the separation distance of the bonding position is acquired from the distance data La and Lb of the bonding points a and b in accordance with the difference in the separation distance of the bonding position. .
- the acquired rotation direction and rotation angle ⁇ a are stored in the memory (step S48 shown in FIG. 13).
- step S49 information on the rotation direction and rotation angle ⁇ b for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position from the distance data Lc and Ld of the bonding points c and d is acquired.
- the acquired rotation direction and rotation angle ⁇ b are stored in the memory (step S49 shown in FIG. 13).
- the teaching operation for wire bonding a part to be bonded having a bonding surface on a flat surface and a surface perpendicular to the flat surface in the reference posture state is completed.
- the teaching operation is performed only once for the same part to be bonded.
- the bonding operation will be described.
- the semiconductor laser package 44 as the part to be bonded 44 is placed on the heat plate 53, the work holder is operated, and the semiconductor laser package 44 is fixed.
- the position data of the bonding points a, b, c, d, e, f, g, h and the Z-axis distance data are read from the memory (step S60 shown in FIG. 14). Further, data of the rotation direction and rotation angle ⁇ c at the bonding points e and f is read from the memory (step S61 shown in FIG. 14).
- the rotation axis of the rotation mechanism section is rotated (90- ⁇ c) degrees in the R direction at the read rotation angle ⁇ c.
- step S64 shown in FIG. 14 the rotation direction and rotation angle ⁇ d data at the bonding points g and h are read from the memory (step S64 shown in FIG. 14).
- the rotation axis is rotated in the F direction by (180 ⁇ ( ⁇ c + ⁇ d)) degrees at the read rotation angle ⁇ d.
- step S67 data of the rotation direction and rotation angle ⁇ a at the bonding points a and b is read from the memory (step S67 shown in FIG. 14).
- the rotation axis is rotated in the R direction (90 ⁇ d ⁇ a) degrees at the read rotation angle ⁇ a.
- step S70 the data of the rotation direction and the rotation angle ⁇ b at the bonding points c and d are read from the memory (step S70 shown in FIG. 15).
- the rotation axis is rotated in the R direction by ( ⁇ b + ⁇ a) degrees (not shown) at the read rotation angle ⁇ b.
- the bonding point a, the bonding point b, the bonding point c, and the bonding point d of BS1 are connected by a wire or the like.
- the bonding point e and the bonding point f of BS2 are connected by a wire or the like
- the bonding point g and BS3 of BS3 are connected by a wire or the like.
- the order of bonding is not limited. For example, in-plane bonding is performed so that position data is read and position data does not cause interference with a bonded wire or the like in the in-plane bonding. Is determined. For example, based on the bonding position, the path along the straight line between two points to be bonded, the height of the wire in the loop formation, etc., the interference area in bonding is determined so that other bonding points are not affected. The order of bonding may be determined.
- FIG. 17 is a flowchart showing teaching and bonding operations of a bonded component having a bonding surface inclined with respect to the reference posture state
- FIG. 18 is a bonding point and bonding of the bonded component in the bonding operation shown in FIG. It is a figure which shows the positional relationship with a tool.
- bonding points x and y having different bonding positions are arranged on the surface BS4, and the surface of the bonding point y has an inclined surface.
- the rotation axis is adjusted so that the BS 4 is in the reference posture (step S80 shown in FIG. 17).
- the X and Y position data of the bonding points x and y and the Z axis distance data Lx and Ly are input and stored in the memory (step S81 shown in FIG. 17).
- the distance data Lx is the distance between the origin o and the bonding point x
- the distance data Ly is the distance between the origin o and the bonding point y.
- step S82 information on the rotation direction and the rotation angle ⁇ x for correcting the difference in the separation distance of the bonding position according to the difference in the separation distance of the bonding position is obtained from the distance data Lx and Ly of the bonding points x and y. .
- the acquired rotation direction and rotation angle ⁇ x are stored in the memory (step S82 shown in FIG. 17). This completes the teaching operation.
- the bonding operation will be described.
- the semiconductor laser package 44 as the part to be bonded 44 is placed on the heat plate 53, the work holder is operated, and the semiconductor laser package 44 is fixed.
- step S83 The position data of the bonding points x and y and the distance data Lx and Ly of the Z axis are read from the memory (step S83 shown in FIG. 17).
- step S84 the rotation direction and rotation angle ⁇ x data at the bonding points x and y are read from the memory (step S84 shown in FIG. 17).
- the bonding apparatus of the present invention is not limited to a wire bonding apparatus, and can be applied to, for example, a die bonder for mounting tics on a package, a bump bonder for forming bumps on a bonding surface, and the like.
- the bonding process can be carried out without changing the moving distance of the bonding means for a plurality of bonding locations having different distances to each other.
- the bonding stage rotates around the rotation axis, it is expected that the posture of the bonding stage with respect to the bonding means becomes a problem when the bonding process is performed. Therefore, according to the present invention, it is possible to stabilize the bonding posture by applying a torque to the bonding stage using a rotating mechanism for rotating the bonding stage.
- the bonded component is horizontally bonded after bonding one opposing surface. Then, the operator re-installed the machine after rotating 180 degrees, and the reversing mechanism was rotated to bond the other facing surface. According to the present invention, it is not necessary to perform re-installation for bonding the other facing surface by an operator in bonding of a part to be bonded having a bonding surface on a flat surface and a surface perpendicular to the flat surface. Can be improved and productivity can be increased. That is, according to the present invention, unlike the case where the conventional bonding apparatus is remounted, it is not necessary to pay attention to interference with the already bonded portion, and uniform bonding accuracy can be achieved.
- a bonding apparatus for bonding a part to be bonded having three or more surfaces in different directions of bonding surfaces is different from a conventional bonding apparatus in that not only the bonding head but also the stage side is moved relatively.
- the stability of the bonding position is required. For this reason, it is necessary to position the mounting position of the part to be bonded in the vicinity of the rotation axis and to suppress vibration of the rotation mechanism.
- the bonding apparatus of the present invention can perform stable bonding by applying a large torque to the rotating shaft to stabilize the rotating mechanism and suppress vibration. For this reason, it becomes possible to position the mounting position of the part to be bonded in the vicinity of the rotation axis and to suppress the vibration of the rotation mechanism unit.
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Abstract
Description
また、必要に応じてヒートプレート53に、被ボンディング部品44を吸着固定するための真空吸着用の吸着孔を設けることも可能である。
図7は、図5、図6に示すティーチング、ボンディングの動作における被ボンディング部品のボンディング点とボンディングツールとの位置関係を示す図である。なお、図7における一点鎖線で示す円は、ワークホルダ52付近の被ボンディング部品44とボンディングツール6との位置関係を示す拡大図である。
このとき、回転軸74は、半導体レーザパッケージ44の底面とヒートプレート53の表面とが接する位置を回転中心75として回転する。図9(a)に示すように、ワークホルダ52が90度回転することにより半導体レーザパッケージ44のボンディング点e、fの第2の面BS2が水平に位置する。その後、ボンディング点e、fのX、Y位置データ、Z軸の距離データLe、Lfを入力し、メモリに記憶する(図8に示すステップS21)。距離データLeは、原点oからボンディング点e間の距離、距離データLfは、原点oからボンディング点f間の距離をいう。
以上により、半導体レーザパッケージ44における第2の面BS2のボンディング点e、fのボンディングが行われる。
図16(f)に示すように、読み出した回転角θdで回転軸をF方向に(180-(θc+θd))度回転する。このとき、ボンディング点eの距離データは、Lg’=Lhである(図14に示すステップS65)。回転後のボンディング点g、hの距離、位置の補正を実行して、第3の面BS3におけるボンディング点g、h間のボンディングを行う(図14に示すステップS66)。
読み出した回転角θbで回転軸をR方向に(θb+θa)度回転する(図示せず)。このとき、ボンディング点dの距離データは、Ld’=Lcである(図15に示すステップS71)。回転後のボンディング点c、dの距離、位置の補正を実行して、ボンディング点c、d間のボンディングを行う(図15に示すステップS72)。
図18(a)に示すように、BS4が基準姿勢の状態となるように回転軸を調整する(図17に示すステップS80)。次に、ボンディング点x、yのX、Yの位置データ、Z軸の距離データLx、Lyを入力して、メモリに記憶する(図17に示すステップS81)。距離データLxは、原点oからボンディング点x間の距離、距離データLyは、原点oからボンディング点y間の距離をいう。
次に、メモリからボンディング点x、yにおける回転方向、回転角θxのデータを読み出す(図17に示すステップS84)。
また、図18(c)に示すように、他のボンディング点についてもボンディングを行う(図17に示すステップS87)。
3 ボンディングヘッド
4 ボンディングアーム
5 超音波ホーン
6 ボンディングツール(キャピラリ)
7 クランプ(把持手段)
8 テンションクランプ
17 放電電極
18 XYステージ
20 コントロールユニット
21 コンピュータ
22 メモリ
30 ボンディング位置情報入力部
31 回転ステージ角回転情報入力部
34 外部入力装置
35 XY軸制御部
36 Z軸制御部
37 回転軸制御部
39 駆動ユニット
40 ワイヤ
41 ボール
44 被ボンディング部品(半導体レーザパッケージ)
45 半導体レーザチップ
47 リード
50 ボンディングステージ(ボンディング回転ステージ)
52 ワークホルダ
53 ヒートプレート
54 ヒートブロック(加熱手段)
55 真空吸着配管用の金属チューブ
57 断熱部
58 支持部
60 支持部材
65 ワーク押え
70 回転機構部
73 スイング部材
74 回転軸
75 回転中心
77 軸受
80、81、82 ギア
85 モータ
90 側板
Claims (9)
- 被ボンディング部品の複数のボンディング点にボンディングを行うボンディング手段と、
前記被ボンディング部品を載置面で保持するとともに、前記ボンディング手段と正対する基準姿勢を有するワークホルダと、前記ワークホルダを前記基準姿勢から回転軸周りに回転させる回転機構部とを有するボンディングステージと、
前記ワークホルダの回転を制御する制御部と、を備え、
前記ボンディング手段は、前記基準姿勢にあるワークホルダの載置面に対して移動可能に設けられるとともに、当該移動方向上に前記ボンディング手段の移動基準となる基準位置を有しており、
前記複数のボンディング点には、前記被ボンディング部品が基準姿勢にあるワークホルダに保持された状態での前記移動方向に沿った前記基準位置からの離間距離が異なったボンディング点が含まれており、
前記制御部は、前記各ボンディング点の前記離間距離の差に応じて前記ワークホルダの回転を制御することにより、前記複数のボンディング点の前記離間距離の差分を補正する
ことを特徴とするボンディング装置。 - 前記回転機構部は、前記基準姿勢にあるワークホルダを前記回転軸周りに正逆方向に回転可能に構成されていることを特徴とする請求項1に記載のボンディング装置。
- 前記ボンディングステージは、前記被ボンディング部品を装着可能なヒートプレートと、該ヒートプレートを加熱することが可能なヒートブロックとを有しており、
前記ヒートプレートは、被ボンディング部品が前記基準姿勢のワークホルダに載置された状態で、前記被ボンディング部品を前記基準位置に接近または離反させる距離補正手段を有する
ことを特徴とする請求項1に記載のボンディング装置。 - 前記ヒートプレートと前記ヒートブロックとは、分割されて構成されたことを特徴とする請求項3に記載のボンディング装置。
- 超音波振動を印加させることが可能な超音波発生手段を前記ボンディング手段に有し、
前記超音波発生手段で引き起こされる振動を抑制するためのトルクを前記回転軸に付与するトルク発生手段を有することを特徴とする請求項1に記載のボンディング装置。 - 前記被ボンディング部品は、前記ボンディングステージの前記回転軸近傍に設けられてなることを特徴とする請求項1に記載のボンディング装置。
- 前記ボンディングステージの回転機構部は、前記回転軸よりも下方に位置するよう構成し、上方は前記ボンディング手段としてのボンディングヘッドがボンディング面内に進入するようにして、前記ボンディングヘッドの可動範囲を広くする構成としたことを特徴とする請求項1に記載のボンディング装置。
- ボンディングステージのワークホルダの載置面に載置した被ボンディング部品のボンディング点にボンディング手段でボンディングを行うボンディング方法において、
前記ワークホルダを前記ボンディング手段と正対する基準姿勢から回転軸周りに回転可能とし、前記ボンディング手段を前記基準姿勢にあるワークホルダの載置面に対して移動可能に設けるとともに、当該移動方向上に前記ボンディング手段の移動基準となる基準位置を設定し、
前記ボンディング点には、前記被ボンディング部品が基準姿勢にあるワークホルダに保持された状態での前記移動方向に沿った前記基準位置からの離間距離が異なった複数のボンディング点が含まれており、
前記各ボンディング点の前記離間距離の差に応じて前記ワークホルダの回転を制御することにより、前記複数のボンディング点の前記離間距離の差分を補正する
ことを特徴とするボンディング方法。 - ボンディングステージのワークホルダの載置面に載置した被ボンディング部品のボンディング点へのボンディング手段によるボンディング処理を制御するボンディング制御プログラムにおいて、
前記ワークホルダが前記ボンディング手段と正対する基準姿勢から回転軸周りに回転可能であり、前記ボンディング手段が前記基準姿勢にあるワークホルダの載置面に対して移動可能に設けられ、前記ボンディング点には、前記被ボンディング部品が前記基準姿勢にあるワークホルダに保持された状態での前記移動方向に沿った前記基準位置からの離間距離が異なった複数のボンディング点が含まれており、
前記ボンディング手段の移動方向上に前記ボンディング手段の移動基準となる前記基準位置を設定する機能と、
前記各ボンディング点の前記離間距離の差に応じて前記ワークホルダの回転を制御することにより、前記複数のボンディング点の前記離間距離の差分を補正する機能と、
をコンピュータに実行させることを特徴とするボンディング制御プログラム。
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CN108352335B (zh) | 2021-07-13 |
TW201743386A (zh) | 2017-12-16 |
US11273515B2 (en) | 2022-03-15 |
CN108352335A (zh) | 2018-07-31 |
KR20180072755A (ko) | 2018-06-29 |
US20200238433A1 (en) | 2020-07-30 |
JP2017216417A (ja) | 2017-12-07 |
US20180326531A1 (en) | 2018-11-15 |
TWI614820B (zh) | 2018-02-11 |
JP6316340B2 (ja) | 2018-04-25 |
US11173567B2 (en) | 2021-11-16 |
KR102144376B1 (ko) | 2020-08-14 |
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