WO2012073990A1 - 表示パネル装置のための静電容量型タッチセンサ積層体 - Google Patents
表示パネル装置のための静電容量型タッチセンサ積層体 Download PDFInfo
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- WO2012073990A1 WO2012073990A1 PCT/JP2011/077615 JP2011077615W WO2012073990A1 WO 2012073990 A1 WO2012073990 A1 WO 2012073990A1 JP 2011077615 W JP2011077615 W JP 2011077615W WO 2012073990 A1 WO2012073990 A1 WO 2012073990A1
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- touch sensor
- capacitive touch
- refractive index
- film
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/045—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
Definitions
- the present invention relates to a touch sensor laminate used for a display panel device having a touch input function.
- the present invention relates to a capacitive touch sensor laminate for a display device.
- a display panel device provided with a touch panel for touch input is disclosed in many documents. For example, in Japanese Patent Application Laid-Open No. 2002-40243 (Patent Document 1), Japanese Patent Application Laid-Open No. 2002-55780 (Patent Document 2), and Japanese Patent Application Laid-Open No. 2002-156920 (Patent Document 3), touching above the display panel plate is performed.
- a display panel device in which a touch panel for input is arranged is disclosed.
- the touch panels described in these patent documents are both of the resistive film type, and two transparent electrodes are arranged to face each other with a gap between them, and one transparent electrode arranged on the viewing side of the display panel device is pushed to the other. By touching the transparent electrode, touch input is sensed.
- Patent Document 1 shows a configuration in which a touch panel is combined with a reflective liquid crystal display device
- Patent Document 2 shows that it can be applied to both a liquid crystal display device and an organic EL display device
- Patent Document 3 shows an example of an organic EL display device.
- Patent Document 4 discloses a capacitive touch input device.
- the touch sensor described in Patent Document 4 has an electrode portion formed of a conductive layer patterned on both sides of a base film formed as a single film.
- the single film includes a configuration including a functional film that is formed on one or both surfaces of the film body so as not to be separated by sputtering or the like.
- an index matching film is described as an example of the functional film
- FIG. 4A shows a plurality of high refractive index films and a low refractive index film alternately arranged in the thickness direction on the surface of the film body.
- a film structure comprising a refractive index film is shown.
- Patent Document 4 also shows a film structure composed of a single layer of low refractive index film formed on the surface of the base film in FIG.
- the index matching film and the low refractive index film described in Patent Document 4 are described as having a function of preventing the reflectance from greatly changing between a region having an electrode portion and a region having no electrode portion. Yes.
- a protective cover functioning as an input surface is adhered to one surface by an adhesive layer, and the other surface is adhered to a display device configured as a flat panel display. Bonded by the agent layer.
- Patent Document 5 A touch sensor having electrodes formed on both sides of a dielectric film layer is also described in FIG. 5 of Japanese Patent Application Laid-Open No. 2009-76432 (Patent Document 5). Further, Patent Document 5 forms a transparent electrode layer on one surface of a film substrate via an undercoat layer, and bonds the other surface of the film substrate to a second film substrate via an adhesive layer. And the double-sided electrode type touch sensor which formed the 2nd transparent electrode layer in this 2nd film base material through the 2nd undercoat layer is described in FIG. In Patent Document 5, it is stated that the difference between the refractive index of the undercoat layer and the refractive index of the transparent electrode layer is preferably 0.1 or more.
- Patent Document 5 refers to forming two or more undercoat layers, but the thickness relationship is not particularly described, and the refractive index relationship between the undercoat layers when two layers are formed, Not specifically described.
- Patent Document 6 discloses that electrode portions made of a patterned conductive film are formed on both surfaces of a transparent base material such as PET, and the outside of both electrode portions.
- a touch sensor is described in which a protective layer is formed on one side and a sensitivity adjustment layer is formed on the other side.
- the sensitivity adjustment layer is for preventing the fluctuation of the potential of the ground conduction pattern of the touch sensor by setting the film thickness to a predetermined thickness.
- Patent Document 4 The pattern formation of the transparent electrode used for the touch sensor is illustrated in FIG. 3 of Patent Document 4, and some examples are described in detail in International Publication WO2006 / 126604 (Patent Document 7). Yes.
- Patent Document 8 JP-A-3-9323 (Patent Document 8) teaches it.
- Patent Document 9 Japanese Patent No. 352838 (Patent Document 9) and Japanese Patent No. 3563557 (Patent Document 10) describe the use of an optically isotropic resin material for a conductive transparent sheet for a touch panel.
- Patent Documents 8 and 9 polycarbonate resins, polyethersulfone resins, polysulfone resins, and polyarylate resins are listed as recommended optically isotropic resin materials.
- Patent Documents 4 and 5 both of the base material layer and the electrode are used in order to reduce the appearance of the pattern of the electrode part from the viewing side due to the difference in refractive index between the base material and the electrode part. And providing a layer for adjusting the refractive index between the two portions.
- the recommended methods are different between Patent Document 4 and Patent Document 5, and it is not shown in any document that the object has been sufficiently achieved by the teaching method.
- the transparent electrode is directly formed on the base material layer, and there is no countermeasure against the electrode pattern being visible from the viewing side.
- the base material used in this type of touch sensor is provided with a hard coat layer on the base material surface for the purpose of preventing scratches on the base material surface. It is often done.
- This hard coat layer is thicker than the above-described refractive index adjusting layer, and has a great influence on warpage deformation. None of the above-mentioned patent documents discuss the problem of such warp deformation, nor does it teach an appropriate countermeasure.
- the present invention can prevent the display quality from being deteriorated due to the internal reflection of light as much as possible, and can change the temperature and humidity conditions.
- a main problem is to obtain a configuration that can suppress warpage deformation.
- the present invention provides, in one form thereof, a capacitive touch sensor laminate used for a display panel device having a touch input function.
- the touch sensor laminate includes a dielectric central substrate structure having flat surfaces formed on both sides of a transparent resin material, and a coating layer of at least one transparent material formed on each of the flat surfaces. And a transparent conductive layer formed adjacent to the coating layer.
- the at least one coat layer includes at least one refractive index adjustment layer that suppresses the pattern appearance of the electrode formed by the transparent conductive layer, and the coat formed on each of the flat surfaces.
- the thickness of the layers is determined so that the layers on both sides of the dielectric central substrate structure are symmetric with respect to the dielectric central substrate structure.
- the refractive index adjusting layer is formed on the first refractive index adjusting undercoat layer disposed on the side close to the dielectric central substrate structure and the first refractive index adjusting undercoat layer.
- the second refractive index adjusting undercoat layer, and the first refractive index adjusting undercoat layer has a higher refractive index than the second refractive index adjusting undercoat layer. Is preferred.
- the at least one coat layer includes a hard coat layer disposed on the side close to the dielectric central substrate structure, and at least one refractive index adjusting undercoat layer formed on the hard coat layer. And can be formed from In this case, the at least one refractive index adjusting undercoat layer includes the first refractive index adjusting undercoat layer disposed on the side close to the hard coat layer, and the first refractive index adjusting undercoat layer. A second refractive index adjusting undercoat layer formed on the layer, wherein the first refractive index adjusting undercoat layer has a higher refractive index than the second refractive index adjusting undercoat layer. Preferably.
- the thickness of the first undercoat layer is 35 nm or less, and the thickness of the second undercoat layer is smaller than the thickness of the first undercoat layer.
- the thickness of the second undercoat layer is preferably 1 ⁇ 2 or less of the thickness of the first undercoat layer.
- the dielectric central substrate structure has the first and second transparent base material layers made of the same material having the same thickness bonded to each other via the transparent adhesive material layer.
- each of the first and second transparent base material layers is preferably bonded to the transparent adhesive layer via a second hard coat layer.
- the dielectric central substrate structure can be composed of a single transparent resin material layer.
- the single transparent resin material layer can be formed of an optically isotropic material, or can be configured as a quarter wavelength retardation layer.
- examples of the adhesive that forms the transparent adhesive layer include adhesives such as acrylic adhesives, silicone adhesives, polyester adhesives, rubber adhesives, and polyurethane adhesives.
- Agents can be used.
- An adhesive agent can be used individually or in combination of 2 or more types.
- an acrylic polymer containing a (meth) acrylic acid alkyl ester having 1 to 18 carbon atoms in the alkyl group [(meth) acrylic acid C1-18 alkyl ester] as a main monomer component is contained as a main component or a base polymer.
- Examples of the (meth) acrylic acid C1-18 alkyl ester include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, Isobutyl (meth) acrylate, s-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, (meth) acrylic (Meth) acrylates such as octyl acid, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, dodecy
- a monomer component (copolymerizable monomer) having a copolymerizability with respect to the (meth) acrylic acid C1-18 alkyl ester may be used.
- a monomer for modifying the acrylic pressure-sensitive adhesive is used as the copolymerizable monomer.
- a modifying monomer for example, any of various monomers known as modifying monomers for acrylic pressure-sensitive adhesives can be used.
- a copolymerizable monomer can be used individually or in combination of 2 or more types.
- examples of the copolymerizable monomer include vinyl esters such as vinyl acetate; cyano group-containing copolymerizable monomers such as (meth) acrylonitrile; (meth) acrylamide, N, N-dimethyl (meth) acrylamide.
- Amide group-containing copolymerizable monomers such as 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 6-hydroxyhexyl (meth) acrylate Copolymerizable monomer; epoxy group-containing copolymerizable monomer such as glycidyl (meth) acrylate; amino group-containing copolymerizable monomer such as N, N-dimethylaminoethyl (meth) acrylic acid alkyl ester; (meth) acrylic acid; Crotonic acid, itaconic acid, maleic acid, maleic anhydride Copolymerizable monomers (functional group-containing copolymerizable monomers) having various functional groups (particularly polar groups) such as carboxyl group-containing copolymerizable monomers such as inacid and fumaric acid, and styrene such as styrene -Based monomers;
- the functional group-containing copolymerizable monomer can be used, and among these, a hydroxyl group-containing copolymerizable monomer and a carboxyl group-containing copolymerizable monomer are preferable, and acrylic acid is particularly preferable.
- the acrylic polymer can be crosslinked using a functional group (particularly a polar group) derived from the modifying monomer.
- Polymerization methods for obtaining acrylic polymers include solution polymerization methods using emulsion initiators such as azo compounds and peroxides, emulsion polymerization methods and bulk polymerization methods, and light and radiation using photoinitiators. A polymerization method performed by irradiation may be employed.
- a polyfunctional melamine compound As the crosslinking agent, a polyfunctional melamine compound, a polyfunctional epoxy compound, or a polyfunctional isocyanate compound is particularly preferable.
- a crosslinking agent can be used individually or in mixture of 2 or more types.
- the polyfunctional melamine compound include methylated trimethylol melamine and butylated hexamethylol melamine.
- diglycidyl aniline, glycerol diglycidyl ether, etc. are mentioned, for example.
- the amount of the polyfunctional melamine compound and / or polyfunctional epoxy compound used is, for example, in the range of 0.001 to 10 parts by weight, preferably 0.01 to 5 parts by weight with respect to 100 parts by weight of the polymer. .
- polyfunctional isocyanate compound examples include tolylene diisocyanate, hexamethylene diisocyanate, polymethylene polyphenyl isocyanate, diphenylmethane diisocyanate, diphenylmethane diisocyanate duplex, reaction product of trimethylolpropane and tolylene diisocyanate, and trimethylol.
- a reaction product of propane and hexamethylene diisocyanate, polyether polyisocyanate, polyester polyisocyanate and the like can be mentioned.
- the amount of the polyfunctional isocyanate compound to be used is, for example, 0.01 to 20 parts by weight, preferably 0.05 to 15 parts by weight with respect to 100 parts by weight of the polymer.
- the adhesive layer preferably has high transparency.
- the total light transmittance (according to JIS K 7136) in the visible light wavelength region is 85% or more (preferably 87% or more, more preferably 90). % Or more) is desirable.
- the haze of the double-sided pressure-sensitive adhesive sheet 1 can be selected from a range of 2.0% or less (preferably 1.0% or less, more preferably 0.5% or less), for example. it can.
- the first and second base material layers can be formed of a polyethylene terephthalate (PET) film or a light isotropic material.
- PET polyethylene terephthalate
- the undercoat layer is intended to prevent internal reflection, and usable materials and antireflection functions are described in detail in Patent Document 5. Also in this invention, the material described in patent document 5 can be used for an undercoat layer.
- the touch sensor laminate used in the display panel device having a touch input function it is possible to suppress warpage deformation that occurs in the laminate due to the influence of changes in temperature and humidity conditions. it can. Furthermore, the problem that the pattern of the transparent conductive layer of the touch sensor laminate can be seen from the viewing side due to internal reflection of light and display quality is deteriorated can be largely prevented. Furthermore, according to the present invention, it is possible to obtain a touch sensor laminate for a static display panel device that has a thin layer structure and is easy to handle.
- FIG. 7 It is process drawing which shows the process of manufacturing the sheet
- the coating and bonding apparatus for the process shown in FIG. 7 is shown, (a) is the schematic of the whole apparatus, (b) is a schematic sectional drawing of the adhesive laminated body after bonding.
- the process for manufacturing a polarizer laminated body is shown, Comprising: (a) is the schematic of the whole apparatus, (b) is a schematic sectional drawing of the polarizer laminated body obtained.
- the manufacturing process of a polarizing function laminated body is shown, (a) is a block diagram of the whole process, (b) is a schematic sectional drawing which shows the laminated body obtained.
- FIG. 1 shows a process of forming an undercoat layer on a base material that is a constituent material of a touch sensor laminate, wherein (a) is a schematic block diagram of the process, and (b) is a base material coated with an undercoat layer. It is sectional drawing shown.
- the process which forms a conductive layer in the base material which has an undercoat layer is shown, Comprising: (a) is a block diagram of a process, (b) is sectional drawing of the electroconductive laminated body obtained, (c) is electroconductive. It is sectional drawing of the electroconductive laminated body with an adhesive layer obtained by laminating
- (A) is the schematic of the process of forming a conductive laminated body
- (b) is the schematic which shows the process of laminating
- (c) is the touch sensor obtained
- a touch sensor laminate 3 includes a first conductive layer 31 that is optically transparent and a second conductive layer 32 that is optically transparent.
- the first conductive layer 31 is disposed on the optically transparent substrate layer 35 via the optically transparent undercoat layer 33 and the hardcoat layer 34.
- the undercoat layer 33 is disposed on the conductor side
- the hard coat layer 34 is disposed on the base material layer side.
- the second conductive layer 32 is disposed on the base material layer 35 via an optically transparent undercoat layer 36 and hard coat layer 37.
- the first and second transparent conductive layers 31 and 32 are deposited on the conductor-side undercoat layers 33 and 36, for example, by sputtering.
- This touch sensor laminate 3 constitutes a capacitive touch input sensor unit.
- the first and second conductive layers 31, 32 are patterned into a desired pattern.
- the base material layer 35 is formed as a single layer of, for example, an optically isotropic resin material, and hard coat layers 34 and 37 are made of the same material on both sides. Are formed to the same thickness.
- the base material layer 35 can be configured as a quarter-wave retardation layer. In this configuration, for example, when a wearer of polarized sunglasses uses a display device including a touch sensor according to this embodiment, it is possible to block internal reflected light from appearing on the viewing side.
- undercoat layers 33 and 36 are formed on the outer surfaces of the hard coat layers 34 and 37 with the same thickness using the same material.
- Each of the undercoat layers 33 and 36 functions as a refractive index adjustment layer for suppressing the electrode pattern from being seen from the viewing side.
- the hard coat layers 34 and 37 on both sides of the base material layer 35 are formed of the same material and have the same thickness, and the undercoat layers 33 and 36 are also formed of the same material.
- the transparent conductive layers 31 and 32 are formed to the same thickness and outside thereof. That is, the touch sensor laminate 3 has a configuration that is symmetrical in the thickness direction with respect to the center plane of the base material layer 35 that passes through the center of the base material layer 35 in the thickness direction. By adopting such a symmetrical configuration, it is possible to effectively suppress warpage deformation that may occur with changes in temperature and humidity conditions.
- FIG. 2 shows another embodiment of the touch sensor laminate according to the present invention.
- the base material layer 35 is made of a PET film, and hard coat layers 34 and 37 are formed on both sides thereof. Are formed respectively.
- the undercoat layers 33 and 36 formed on the outer sides of the hard coat layers 34 and 37 are the first refractive index adjusting undercoat layers 33a and 36a on the hard coat layers 34 and 37 side and the first outer coat layers 33 and 36 formed on the outer sides thereof. 2 refractive index adjusting undercoat layers 33b and 36b.
- Conductive layers 31 and 32 are formed outside the second undercoat layers 33b and 36b, respectively.
- the first refractive index adjusting undercoat layers 33a and 36a have a higher refractive index than the second refractive index adjusting undercoat layers 33b and 36b.
- the first refractive index adjusting undercoat layers 33a and 36a preferably have a thickness of 35 nm or less, and the second refractive index adjusting undercoat layers 33b and 36b are the first refractive index adjusting undercoat layers.
- the thickness is smaller than that of the coat layers 33a and 36a.
- the thickness of the second refractive index adjusting undercoat layers 33b and 36b is set to 1 ⁇ 2 or less of the thickness of the first refractive index adjusting undercoat layers 33a and 36a. This configuration is very effective for suppressing the appearance of the electrode pattern.
- Each of the conductor-side undercoat layers 33 and 36 is patterned in the same manner as the corresponding conductive layers 31 and 32.
- the conductor-side undercoat layers 33 and 36 are made of a material having a refractive index smaller than that of the corresponding base-side hard coat layers 34 and 37.
- the conductor-side undercoat layers 33 and 36 are configured to be thinner than the corresponding base-side hard coats 34 and 37. Due to the above-described relationship between the refractive index and thickness between the conductor-side undercoat layer 33 and the substrate-side hard coat layer 34, the reflected light from the first conductive layer 31 disposed on the viewing side causes The problem of pattern appearance that the pattern of the first conductive layer is visible through the window is greatly reduced.
- FIG. 3 shows an embodiment of a display device using a touch sensor laminate according to an embodiment of the present invention.
- the dielectric central substrate structure includes a first transparent substrate layer 35 and a second transparent substrate layer 38.
- a hard coat layer 35a is formed on the surface of the first transparent substrate layer 35, and an undercoat layer 33 is formed on the hard coat layer 35a.
- a first transparent conductive layer 31 is formed on the undercoat layer 33.
- a hard coat layer 38a is formed on the surface of the second transparent base layer 38, and an undercoat layer 36 is formed on the hard coat layer 38a.
- a second transparent conductive layer 32 is formed on the undercoat layer 36.
- the first transparent conductive layer 31 and the second transparent conductive layer 38 are the hard coat layer 35 b and the second transparent conductive layer 38 formed on the inner surface of the first transparent conductive layer 31.
- the touch sensor laminate 3 is configured by being bonded to each other by an optically transparent adhesive layer 39 via a hard coat layer 38b formed on the inner surface.
- the polarizer film 51 is bonded to the touch sensor laminate 3 via the adhesive layer 21 on the first transparent conductive layer 31 side.
- a space between the polarizer film 51 and the window 7 is filled with an optically transparent adhesive layer 9. That is, the window 7 is bonded to the touch sensor laminate 3 by the adhesive layer 9 over the entire surface.
- the window 7 is provided with a border print 13 along the edge of the inner surface, and the border print 13 forms a stepped portion as can be seen from the figure.
- the entire surface of the window 7 is bonded to the touch sensor laminate 3 via the adhesive layer 9, so that the stepped portion by the border printing 13 is filled with the adhesive of the adhesive layer 9. It will be.
- the display panel 5 is constituted by a liquid crystal display panel, and the polarizing film layer 52 is bonded to the liquid crystal display panel plate. The display panel 5 is bonded to the second base material layer 38 through the adhesive layer 11.
- FIG. 6 shows an embodiment in which an organic EL display panel is used as the display panel 5 and polyethylene terephthalate (PET) resin is used for the transparent base layers 35 and 38 of the touch sensor laminate 3.
- the touch sensor laminate 3 includes a first transparent conductive layer 31 disposed via an undercoat layer 34 on a first transparent substrate layer 35 made of PET, and a second transparent substrate made of PET.
- a second transparent conductive layer 32 disposed on the layer 38 via an undercoat layer 37, and on the first transparent substrate layer 35, the side opposite to the transparent conductive layer 31.
- the oligomer prevention layer 35c is disposed on the surface, and the oligomer prevention layer 38c is disposed on the surface opposite to the transparent conductive layer 32 on the second transparent base layer 38.
- a circular polarization functional laminate 115 is disposed between the touch sensor laminate 3 and the display panel 5.
- the circularly polarizing functional laminate 115 includes a polarizing film layer 115a and a ⁇ / 4 retardation film layer 115b bonded to the polarizing film layer 115a.
- the polarizing film layer 115a is touched by the adhesive layer 11.
- a ⁇ / 4 retardation film layer 115 c is bonded to the sensor laminate 3 via the adhesive layer 53 and to the display panel 5.
- an undercoat layer is provided between the undercoat layers 34 and 37 and the conductive layers 31 and 32 in the same manner as in the embodiment of FIG. Patterning can be performed in the same manner as 32 to reduce the problem of pattern appearance.
- FIG. 7 is a process diagram showing an example of a method for forming an optically transparent adhesive layer used in the present invention.
- a monomer as a basic constituent material of an adhesive and a polymerization initiator were mixed and stirred together with a solvent.
- a solvent a solvent for a monomer component.
- the monomer component a mixture of 70 parts by weight of 2-methoxyethyl acrylate, 29 parts by weight of 2-ethylhexyl acrylate, and 1 part by weight of 4-hydroxybutyl acrylate was used.
- a polymerization initiator 0.2 part by weight of 2,2′-azobisisobutyronitrile was used, and as a polymerization solvent, 100 parts by weight of ethyl acetate was used. These materials were put into a separable flask and stirred for 1 hour while introducing nitrogen gas (S5-1). After removing oxygen in the polymerization system in this way, the temperature was raised to 63 ° C. and reacted for 10 hours (S5-2), and toluene was added to obtain an acrylic polymer solution having a solid content concentration of 25% by weight. (S5-3). This acrylic polymer solution may be referred to as “acrylic polymer solution A”.
- the acrylic polymer contained in this acrylic polymer solution A may be called the acrylic polymer A, and the weight average molecular weight Mw was 1.5 million.
- the weight average molecular weight Mw can be measured by a gel permeation chromatograph (GPC) method.
- GPC gel permeation chromatograph
- the product name “HLC-8120GPC” manufactured by Tosoh Corporation can be used as a GPC measuring apparatus, and the weight average molecular weight Mw can be determined by measuring under the following GPC measuring conditions using a polystyrene equivalent value.
- FIG. 8A is a schematic view showing this coating process.
- the release liner 60 is prepared in a roll form 60 a and is sent to a dryer 62 through a guide roll 61. On the release liner 60 fed out from the roll 60a, the adhesive solution adjusted in the above-described process is applied in a layer form by the coating device 63 on the way to the guide roll 61.
- the release liner 60 a film of 38 ⁇ m thick polyethylene terephthalate (PET) whose surface was subjected to mold release treatment was used.
- PET polyethylene terephthalate
- the adhesive solution was applied to the release treatment surface of the release liner 60 so that the thickness after drying was 25 ⁇ m.
- the release liner 60 to which the adhesive solution has been applied is passed through a dryer 62 to evaporate the solvent of the adhesive solution.
- the release liner 60 exiting the dryer 62 is passed through a pair of nip rolls 64a and 64b.
- the second release liner 65 fed from the second roll 66 is sent to the nip rolls 64a and 64b so as to overlap the layered adhesive formed on the first release liner 60, and the nip rolls are fed.
- the second release liner 65 is composed of the same film as the first release liner 60, but the adhesive layer has a lighter peeling force than that in the first release liner 60.
- a mold release treatment is performed on the surface to be bonded to.
- the laminated body that has come out of the first nip rolls 64a and 64b has a structure in which the first and second release liners 60 and 63 are bonded to both sides of the adhesive layer 67 as shown in FIG. 8B. And wound up as a roll 68.
- the drying process is shown in step S5-6, and the bonding process of the second release liner 65 is shown in step S5-7.
- the manufactured adhesive laminate 69 is shipped through product inspection (S5-8) (S5-9).
- FIG. 9 is a schematic diagram showing the manufacturing process of the polarizer film.
- the film 71 as a raw material is made of a polymer material mainly composed of polyvinyl alcohol (PVA) resin, and is prepared in the form of a roll 72.
- the PVA film 71 fed out from the roll 72 is immersed in water in the water tank 73 and swollen with water.
- the PVA film 71 swollen with water is passed through a dyeing tank 74 having a dyeing solution containing iodine, and the tank 74 is impregnated with iodine.
- the PVA film 71 impregnated with iodine is then passed through first and second crosslinking tanks 75 and 76.
- a crosslinking bath containing potassium iodide and boric acid is formed in the crosslinking tanks 75 and 76, and the crosslinking treatment proceeds here.
- the PVA film 71 is stretched. This stretching is performed by setting the driving speed of the roll for feeding the PVA film 71 through the crosslinking tanks 75 and 76 so that the outlet side is higher than the inlet side.
- the PVA film 71 that has undergone the stretching step is washed with water in a washing tank 77, and protective films 78a and 78b are bonded to both surfaces to form a laminate 79 as shown in FIG. 9b.
- the retardation film can be adjusted by controlling the stretching ratio and stretching temperature of the resin film.
- the draw ratio can be appropriately determined according to the desired retardation, the thickness of the film necessary for optical compensation of the retardation film, the type of resin used, the thickness of the film used, the stretching temperature, and the like.
- the production of such a retardation film is well known.
- the quarter-wave retardation film used in the present invention is adjusted by using this known method so that a phase difference corresponding to a quarter-lambda phase is generated.
- FIG. 10A shows a bonding process of the polarizer laminate 79 and the 1 ⁇ 4 ⁇ retardation film.
- a dyeing process in which a PVA film serving as a substrate of the polarizer film is dyed with iodine.
- S8-1 and the stretching step (S8-2) the polarizer film 71 shown in FIG. 9 is obtained and sent to the bonding step (S8-3) for bonding to the protective films 78a and 78b.
- the protective films 78a and 78b are bonded to both surfaces of the polarizer film 71.
- an adhesive is applied to one surface of the polarizer film 71 (S8-4).
- the polarizer film 71 coated with the adhesive is cut into a dimension corresponding to the dimension of the display panel device in which the polarizer film is used, for example, by punching (S8-5).
- punching S8-5.
- the 1 / 4 ⁇ retardation film is subjected to adhesive coating (S8-6), and then cut into dimensions corresponding to the dimensions of the display panel device (S8-7). As in the case of the polarizer film laminate 79, this cutting step is omitted when the display panel device is used in the form of a long roll.
- the retardation film that has been cut as necessary is bonded to the laminate 79 by the adhesive layer on the polarizer film laminate 79 (S8-8).
- the obtained product is subjected to necessary finishing processing such as edge molding (S8-9), undergoes product inspection (S8-10), and is sent to the next step.
- 16B shows the obtained polarization functional laminate 81, and the polarizer film laminate 79 is bonded to the 1 ⁇ 4 ⁇ retardation film 80 via the adhesive layer 79 a.
- An adhesive layer 80 a exists on the outer surface of the 1 ⁇ 4 ⁇ retardation film 80.
- a release liner (not shown) is bonded to the adhesive layer 80a on the outer surface of the 1 / 4 ⁇ retardation film 80.
- This polarizing functional laminate 81 has a circularly polarizing function by combining the polarizer film laminate 79 and the 1 / 4 ⁇ retardation film 80 in this order as viewed from the viewing side.
- the basic constituent layers of the touch sensor laminate 3 are a transparent base material layer, an undercoat layer, an adhesive layer, and a transparent conductive layer.
- a material which comprises a base material layer The various plastic film which has transparency can be used.
- the material for the base layer include polyester resins, acetate resins, polyether sulfone resins, polycarbonate resins, polyamide resins, polyimide resins, polyolefin resins, (meth) acrylic resins, and polyvinyl chloride resins.
- Patent Document 5 describes in detail, and any of the materials described herein can be used, but a polyethylene terephthalate (PET) film is generally used.
- PET polyethylene terephthalate
- a PET film provided with an oligomer prevention layer for preventing oligomers generated by heat received during the lamination process is available.
- the base material layer may be formed of a polycarbonate resin or norbornene resin material having optical isotropy instead of PET. preferable.
- the undercoat layer can be formed by any of the methods described in Patent Document 5.
- FIG. 11A shows an undercoat layer coating process.
- a material for the undercoat layer for example, a mixture in which a melamine resin, an alkyd resin, and an organosilane condensate are mixed at a weight ratio of 2: 2: 1 is used. This mixture has a solids weight ratio of 30% and is available from Momentive Performance Materials under the trade name SHC900.
- a liquid solvent for dilution is added to the undercoat raw material mixture, and the mixture is diluted and stirred (S9-1).
- the solvent may be a mixture of cyclopentanone, toluene, and methyl ethyl ketone in a weight ratio of 4: 3: 3.
- the mixing ratio of the solvent is determined so that the solid content of the undercoat raw material mixture is 1.5% by weight.
- the diluted undercoat raw material mixture is applied to the surface of the PET film having the oligomer prevention layer formed in advance on one side where the oligomer prevention layer is not formed (S9-2).
- an undercoat laminate 90 in which the oligomer prevention layer 92 is formed on one surface of the PET film 91 and the undercoat layer 93 is formed on the other surface is formed.
- a second undercoat layer can be formed on the undercoat layer 93.
- reference numerals 93a and 93b are shown in parentheses in order to represent an undercoat layer composed of two layers.
- FIG. 12A is a block diagram showing an example of this sputtering process. Sputtering of 90% by weight of indium oxide and 10% by weight of tin oxide in a vacuum atmosphere with respect to the surface of the undercoat layer 93b outside the undercoat laminate 90 formed by the process of FIG.
- the target material is sputtered in a plasma state with an introduced gas composed of 98% by volume of argon and 2% by volume of oxygen (S10-1). In this way, the conductive laminate 100 in which the conductive layer 101 shown in FIG. 12B is formed on the outer undercoat layer 93b is obtained.
- FIG. 12C shows the conductive layer laminate 104 with an adhesive layer obtained by this step.
- the conductive layer laminate 104 with adhesive layer has a first undercoat layer 93 a and a second undercoat layer 93 b in this order on one surface of the base material layer 91.
- the conductive layer 101 is further formed on the second undercoat layer 93b, and the release liner 103 is formed on the surface of the base material layer 91 opposite to the undercoat layer 93a via the adhesive layer 102. It is the laminated structure joined.
- FIG. 13A is a diagram showing a bonding process of the adhesive layer 102 in FIG.
- the conductive laminate 100 and the adhesive laminate 69 formed in the step shown in FIG. 8 are fed out from the respective rolls and passed between the pair of nip rolls 110a and 110b.
- the conductive laminate 100 is supplied from a roll so that the oligomer prevention layer 92 formed thereon faces the adhesive laminate 69.
- the adhesive laminate 69 is similarly prepared in a roll form, and the exposed adhesive layer faces the conductive laminate 100 while the release liner 60 provided on one side is peeled off by the release roll 111.
- the nip rolls 110a and 110b are supplied.
- the conductive layer laminated body 104 with an adhesive layer shown in FIG.12 (c) is obtained.
- This conductive laminate 104 with an adhesive layer is wound into a roll as shown in FIG.
- the conductive laminate 100 shown in FIG. 12B is bonded to the laminate 104 with adhesive to form the touch sensor laminate 3.
- FIG. 13B is a schematic view showing the bonding step.
- the electroconductive laminated body 100 is prepared with a roll form. The conductive laminate 100 is fed from the roll and sent between the pair of nip rolls 112a and 112b in a state where the oligomer prevention layer 92 on the base material layer 91 is on the lower side.
- the conductive laminate 104 with adhesive is fed out from the roll with the release liner 103 on the upper side, and the release liner 103 is peeled off by the release roll 113, so that the exposed adhesive layer 102 becomes the conductive laminate 100.
- it is fed between the nip rolls 112a and 112b.
- the laminates 100 and 104 are pressed and bonded to each other by the nip rolls 112a and 112b to form a touch sensor laminate.
- the conductive layers 101 on both surfaces of the touch sensor laminate are heated and crystallized by a method such as passing through a drying oven, and then patterned into a desired pattern by a known etching process.
- FIG. 14 shows an example of a film forming apparatus 200 that can form a transparent conductive layer on both surfaces of a base material layer 35 made of a single film.
- the film forming apparatus 200 includes a first roll chamber W1, a second roll chamber W2, a third roll chamber W3, and a first roll that can accommodate a long base material film 210 wound in a roll shape.
- the first film forming chamber 241 provided between the chamber W1 and the third roll chamber W3, the second film forming chamber 242 provided between the third roll chamber W3 and the second roll chamber W2, the first roll chamber W1 and the first roll chamber W1.
- heating chamber 231 provided between the film forming chambers 241, plasma processing apparatuses 240 and 240 ′ provided between the heating chamber 231 and the first film forming chamber 241, and a switching roll for changing the path of the substrate 210 283, 283 ′ are included.
- the base material film 210 While the base material film 210 is conveyed in the first direction A from the first roll chamber W ⁇ b> 1 to the second roll chamber W ⁇ b> 2, the base material film 210 remains the same until it reaches the switching roll 283. Move along the route. After reaching the switching roll 283, the base material film 210 is reversed by the switching roll 283 ′ as shown by the broken line when passing through the first transport path, so that the second film forming chamber 242 is opened.
- the second film forming chamber 242 When passing along the second direction B from the second roll chamber W2 to the first roll chamber W1, while passing through the second transfer path, the second film forming chamber 242 is moved through the second film forming chamber 242 as shown by the solid line. 1 along the direction A.
- the apparatus 200 of FIG. 14 can be used for any method such as vacuum deposition, sputtering, chemical vapor deposition (CVD), and the like.
- sputtering method large-area uniform sputtering is possible, continuous productivity is high, stability is good, and a dense thin film can be formed.
- damage to the substrate can be suppressed by forming a magnetic field on the target surface and confining electrons. These processes are performed in a state where each chamber is evacuated.
- a partition 214 is provided between the chambers of the apparatus 1.
- Each partition 214 is provided with a gap 213 through which the base material film 210 passes.
- load lock mechanisms 213 and 213 ' can be provided at predetermined positions in order to effectively maintain the vacuum state of the chambers other than the work space. Since the load lock mechanism is well known, description thereof is omitted here.
- the base material film 210 used in the present method may be various resin films such as a PET film. However, the base material film 210 is elongated as a whole, has flexibility, and can be wound into a roll. At the time of film formation, the base material film 210 uses a plurality of arranged guide rolls 229 and the like to move from the first roll chamber W1 to the second roll chamber W2 between the roll chambers W1 to W3. It can be conveyed in the direction A or the second direction B from the second roll chamber W2 to the first roll chamber W1.
- the first roll chamber W1 is provided with a first feeding / winding roll 221 and the second roll chamber W2 is provided with a second feeding / winding roll 222, respectively. It has been.
- the first feeding / winding roll 221 performs feeding and the second feeding / winding roll 222 performs winding.
- the second feeding / winding roll 222 performs feeding, and the first feeding / winding roll 221 performs winding.
- the base material film 210 is heated, and the base material film 210 is subjected to degassing treatment or annealing treatment.
- the base material film 210 is heated before film formation in the first film formation chamber 241 so that the base material film 210 is heated.
- moisture may be generated from the base material film 210, but this moisture greatly affects the composition of the film to be deposited.
- the heating chamber 231 is provided at the above position, moisture can be removed and the influence can be reduced.
- the base material film 210 on which film formation has been performed in the second film formation chamber 242 is made. Heating can be performed, whereby the transparent conductive film material formed on the base material film 210 can be annealed to form crystal grains in which the atomic arrangement of the film is regularly arranged.
- a heating chamber may be provided between the first film formation chamber 241 and the second film formation chamber 242 as necessary. However, the same effect can be obtained without providing a heating chamber by utilizing a heating function or the like by a rotating drum of the film forming chamber described later.
- Plasma processing apparatuses 240 and 240 ′ are used for plasma processing the substrate material film 210. By performing the plasma treatment, the surface of the base material film 210 can be activated and cleaned, whereby subsequent film formation can be performed more effectively.
- the position where the plasma processing apparatus is provided is not particularly limited. For example, if plasma processing apparatuses 240 and 240 ′ provided between the heating chamber 231 and the first film formation chamber 241 are used, the base material film 210 is subjected to plasma treatment before film formation in the first film formation chamber 241. It can be carried out. Further, for example, a plasma processing apparatus can be provided between the first film formation chamber 241 and the second film formation chamber 242 as necessary.
- an additional film formation chamber may be provided.
- the position where the additional film formation chamber is provided is not particularly limited as long as it is between the first roll chamber W1 and the second roll chamber W2, and for example, even between the heating chamber 231 and the first film formation chamber 241. Good.
- the film material formed in these film forming chambers is a transparent conductive layer.
- the first film forming chamber 241 includes a first rotating drum 251 and a first cathode electrode 261.
- the first rotating drum 251 can rotate so as to convey the base material film 210 in the first direction A or the second direction B, and the base material film 210 passes through the periphery of the base material film 210 in the first direction A or the second direction B. 2 in the direction B.
- the first rotating drum 251 may have a function of heating the base material film 210.
- the effect obtained by the heating function of the first rotating drum 210 may be considered to be the same as that of the heating chamber. Therefore, the heating function of the heating chamber can be replaced by the first rotating drum 251. Conversely, the heating function of the first rotating drum 251 can be replaced by the heating function of the heating chamber.
- a plurality of first cathode electrodes 261 are provided for the first rotating drum 251.
- Each of the plurality of first cathode electrodes 261 is arranged in a movable state so as to face the first rotating drum 251 while supporting a target for forming a predetermined film material such as ITO.
- ⁇ Thickness of each layer About the thing which has thickness of 1 micrometer or more, such as a film base material, a transparent base
- the thickness of the dielectric layer and the ITO film was calculated based on the waveform of the interference spectrum using an instantaneous multi-photometry system “MCPD2000” (trade name) manufactured by Otsuka Electronics.
- ⁇ Reflection characteristics> Using the integrating sphere measurement mode of the spectrophotometer “U-4100” (trade name) manufactured by Hitachi High-Tech, the incident angle to the ITO film is 2 degrees, and the pattern portion and the pattern opening in the wavelength range of 380 nm to 780 nm The reflectance immediately below was measured at intervals of 5 nm. Next, an average reflectance directly under the pattern portion and the pattern opening was calculated, and a reflectance difference ⁇ R between the pattern portion and immediately below the pattern opening was calculated from the average reflectance value.
- the refractive index n 21 of the first undercoat layer was 1.54.
- silica sol manufactured by Colcoat Co., Colcoat P
- ethanol so that the solid content concentration is 2% by weight
- a second undercoat layer made of a dielectric layer having a thickness of 10 nm was formed.
- the refractive index n 22 of the second undercoat layer was 1.46.
- a transparent conductive layer of a transparent conductive film is coated with a striped photoresist, dried and cured, and then immersed in hydrochloric acid (aqueous hydrogen chloride) at 25 ° C. for 1 minute. Etching of the ITO film was performed. Thereafter, the photoresist was removed.
- hydrochloric acid aqueous hydrogen chloride
- Example 2 In the same manner as in Example 1, a first undercoat layer made of a dielectric layer, a second undercoat layer made of a dielectric layer, and an ITO film were formed on one surface of the PET film, and the touch sensor laminate Got.
- the second undercoat layer made of a dielectric layer is etched by immersing in a 2 wt% sodium hydroxide aqueous solution at 45 ° C. for 3 minutes with the photoresist laminated. After that, the photoresist was removed.
- Examples 3 and 4 touch sensor laminates having a pattern portion and a pattern opening were produced in the same manner as in Examples 1 and 2, respectively.
- the thickness of the first undercoat layer made of a dielectric layer was 35 nm
- the thickness of the second undercoat layer made of a dielectric layer was 5 nm. It was different from Examples # 1 and # 2.
- Example 5 and 6 touch sensor laminates having pattern openings and pattern openings were produced in the same manner as in Examples 1 and 2, respectively. However, in Examples 5 and 6, the thickness of the first undercoat layer made of a dielectric layer was 30 nm, and the thickness of the second undercoat layer made of a dielectric layer was 15 nm. It was different from 2.
- Comparative Example 1 In Comparative Example 1, a touch sensor laminate having a pattern portion and a pattern opening was produced in the same manner as in Example 1. However, Comparative Example 1 differs from Example 1 in that the thickness of the first undercoat layer made of a dielectric layer is 45 nm and the thickness of the second undercoat layer made of a dielectric layer is 10 nm. It was.
- Comparative Example 2 In Comparative Example 2, a touch sensor laminate having a pattern portion and a pattern opening was produced in the same manner as in Example 1. However, Comparative Example 2 is different from Example 1 in that the thickness of the first undercoat layer made of the dielectric layer is 30 nm and the thickness of the second undercoat layer made of the dielectric layer is 30 nm. It was.
- Comparative Example 3 In Comparative Example 3, a touch sensor laminate having a pattern portion and a pattern opening was produced in the same manner as in Example 1. However, Comparative Example 3 differs from Example 1 in that the thickness of the first undercoat layer made of a dielectric layer is 40 nm and the thickness of the second undercoat layer made of a dielectric layer is 30 nm. It was.
- Comparative Example 4 In the comparative example, a touch sensor laminate having a pattern portion and a pattern opening was produced in the same manner as in Example 1. However, in Comparative Example 4, the first undercoat layer made of a dielectric layer was formed as described below, and the thickness of the second undercoat layer made of the dielectric layer was set to 35 nm. It was different from Example 1.
- the refractive index of the first undercoat layer made of this dielectric layer was 1.70.
- Table 1 shows the evaluation results of the touch sensor laminates of the examples and comparative examples.
- the touch sensor laminate of the present invention has a low reflectance difference and a color difference between the pattern portion and the pattern opening even when the transparent conductive layer is patterned, so that the pattern is hardly visible.
- the second undercoat layer is patterned in the same manner as the transparent conductive layer, it can be said that the pattern is less visible and the appearance is good.
- PET film polyethylene terephthalate film
- an ultraviolet curable resin (“Unidic 17-806” manufactured by DIC) made of isocyanuric acid acrylate, pentaerythritol triacrylate, and isophorone diisocyanate polyurethane per 100 parts of resin solids, What added 5 parts of photopolymerization initiator (“Irgacure 907” manufactured by Ciba Specialty Chemicals) was mixed with butyl acetate / ethyl acetate 2/3 so that the solid concentration would be 50%. A hard coat layer forming material prepared by dilution was used.
- thermosetting resin composition having a weight ratio of 2: 2: 1 of melamine resin: alkyd resin: organosilane condensate was applied to both sides of the transparent film substrate on which both sides of the hard coat layer were formed, Then, it dried and hardened and formed the 1st undercoat layer which consists of a 20-nm-thick dielectric layer.
- the refractive index n31 of the first undercoat layer was 1.54.
- silica sol (Colcoat P, Colcoat P) is diluted with ethanol so that the solid content concentration is 2% by weight on both sides of the transparent film substrate coated with the first dielectric layer on both sides.
- a silica undercoat method was applied, followed by drying and curing to form a second undercoat composed of a dielectric layer having a thickness of 10 nm.
- the refractive index n32 of the second undercoat layer was 1.46.
- a protective layer made of a polyester film is attached to one transparent conductive layer of the touch sensor laminate, a photoresist patterned in a stripe shape is applied to the other transparent conductive layer, dried and cured,
- the ITO film was etched by immersing in 1% by weight hydrochloric acid (aqueous hydrogen chloride solution) for 1 minute. Thereafter, the photoresist was removed to form a first transparent electrode pattern. Next, the first transparent electrode pattern was protected by a protective layer, and the same operation as described above was performed to form a second transparent electrode pattern.
- Example 7 In Example 7, the same operation as Example 7 was performed except that the hard coat layer on one side was not applied and the undercoat layer was not applied to obtain a touch sensor laminate.
- Example 6 In Example 7, the same operation as Example 7 was performed except that the undercoat layer on one side was not applied to obtain a touch sensor laminate.
- Display panel device 3 Touch sensor laminate 5: Display panel 7: Window 11: Adhesive layer 13: Border printing 115: Circular polarization functional laminate 115a: Polarizing film layer 115b: ⁇ / 4 retardation film 31: No. 1 transparent conductive layer 32: second transparent conductive layer 33, 36: conductor-side undercoat layer 34, 37: substrate-side undercoat layer 35: first transparent substrate layer 38: second transparent group Material layer 39: Adhesive layer 51, 52: Polarizer film
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Abstract
Description
また、両面粘着シート1のヘイズ(JIS K 7136に準じる)としては、例えば、2.0%以下(好ましくは1.0%以下、さらに好ましくは0.5%以下)の範囲から選択することができる。
図7は、本発明に使用される光学的に透明な接着剤層を形成する方法の一例を示す工程図である。先ず接着剤の基本構成材料となるモノマーと重合開始剤とを、溶剤とともに混合攪拌した。モノマー成分としては、アクリル酸2-メトキシエチル70重量部とアクリル酸2-エチルヘキシル29重量部、アクリル酸4-ヒドロキシブチル1重量部からなる混合物を用いた。重合開始剤としては、2,2’-アゾビスイソブチロニトリル0.2重量部を用い、重合溶媒として、酢酸エチル100重量部を用いた。これらの材料をセパラブルフラスコに投入して、窒素ガスを導入しながら1時間攪拌した(S5-1)。このようにして、重合系内の酸素を除去した後、63℃に昇温し、10時間反応させて(S5-2)、トルエンを加え、固形分濃度25重量%のアクリル系ポリマー溶液を得た(S5-3)。このアクリル系ポリマー溶液は、「アクリル系ポリマー溶液A」と呼ばれることがある。また、このアクリル系ポリマー溶液Aに含まれるアクリル系ポリマーは、アクリル系ポリマーAと呼ばれることがあり、その重量平均分子量Mwは、150万であった。重量平均分子量Mwは、ゲルパーミエーションクロマトグラフ(GPC)法により測定することができる。具体的には、GPC測定装置として、東ソー株式会社製造の商品名「HLC-8120GPC」を使用し、ポリスチレン換算値により、次のGPC測定条件で測定して重量平均分子量Mwを求めることができる。
GPC測定条件
サンプル濃度:0.2重量%(テトラヒドロフラン溶液)
サンプル注入量:10μl
溶離液:テトラヒドロフラン(THF)
流量(流速):0.6ml/分
カラム温度(測定温度):40℃
カラム:商品名「TSKgelSuperHM-H/H4000/H3000/H2000(東ソー株式会社)
検出器:示差屈折計(RI)
重合後のアクリル系ポリマーに、架橋剤と添加剤を配合して接着剤組成物を得た(S5-4)。架橋剤として、多官能イソシアネート化合物(日本ポリウレタン工業株式会社製の商品名「コロネートL」)を、アクリル系ポリマー溶液A100重量部(アクリル系ポリマーA100重量部)に対して0.3重量部加えて溶液状の接着剤組成物を調整した。このようにして得られた接着剤組成物を、剥離ライナーに塗工した(S5-5)。図8(a)は、この塗工工程を示す概略図であり、剥離ライナー60は、ロール形態60aで準備され、案内ロール61を経て乾燥機62に送られる。ロール60aから繰り出された剥離ライナー60には、案内ロール61に至る途中で塗工装置63により、上述の工程で調整された接着剤溶液が層状に塗布される。
図9に偏光子フィルムの製造工程を概略図で示す。原材料となるフィルム71は、ポリビニルアルコール(PVA)系樹脂を主成分とする高分子材料からなり、ロール72の形態で準備される。ロール72から繰り出されたPVAフィルム71は、水槽73において水に浸漬され、水により膨潤される。次いで、水により膨潤したPVAフィルム71は、ヨウ素を含む染色液を有する染色槽74に通され、該槽74でヨウ素が含浸させられる。ヨウ素が含浸されたPVAフィルム71は、次に、第1及び第2の架橋槽75、76に通される。架橋槽75、76にはヨウ化カリウム及びホウ酸を含む架橋浴が形成されており、ここで架橋処理が進行する。この架橋処理の過程で、PVAフィルム71には延伸が施される。この延伸は、架橋槽75、76を通してPVAフィルム71を送るロールの駆動速度を、入口側より出口側が高くなるように定めることにより行われる。延伸工程を経たPVAフィルム71は、水洗槽77で水洗され、両面に保護フィルム78a、78bが貼り合わされて、図9bに示すような積層体79となる。
位相差フィルムは、樹脂フィルムの延伸倍率と延伸温度を制御することにより、調整することができる。延伸倍率は、所望の位相差、位相差フィルムの光学補償に必要なフィルムの厚さ、使用される樹脂の種類、使用されるフィルムの厚さ、延伸温度等に応じて適宜定めることができる。このような位相差フィルムの製造は、周知である。本発明において使用される1/4λ位相差フィルムは、この周知の方法を用いて、1/4λ位相分の位相差が生じるように調整される。
上述のようにして形成される1/4λ位相差フィルムを、図9(b)に示す偏光子積層体79に貼り合せることにより、本発明において使用される偏光機能積層体が得られる。図10(a)は、偏光子積層体79と1/4λ位相差フィルムとの貼り合わせ工程を示すもので、先ず、偏光子フィルムの基材となるPVAフィルムが、ヨウ素による染色を行う染色工程(S8-1)、延伸工程(S8-2)を経て図9に示す偏光子フィルム71となり、保護フィルム78a、78bと貼り合せるための貼り合わせ工程(S8-3)に送られる。貼り合わせ工程(S8-3)では、偏光子フィルム71の両面に保護フィルム78a、78bが貼り合わされる。次いで、偏光子フィルム71の一方の面に接着剤が塗工される(S8-4)。接着剤が塗工された偏光子フィルム71は、必要に応じて、該偏光子フィルムが使用される表示パネル装置の寸法に対応する寸法に、例えば打ち抜きにより裁断される(S8-5)。表示パネル装置が長尺のロール状の形態で、表示パネル板との連続的貼りあわせ工程に使用される場合には、この裁断工程は省略される。
タッチセンサ積層体3の基本的構成層は、透明基材層と、アンダーコート層、接着剤層、及び透明導電性層である。基材層を構成する材料としては、特に制限はなく、透明性を有する各種のプラスチックフィルムを用いることができ。基材層材料として、例えば、ポリエステル系樹脂、アセテート系樹脂、ポリエーテルスルホン系樹脂、ポリカーボネート系樹脂、ポリアミド系樹脂、ポリイミド系樹脂、ポリオレフィン系樹脂、(メタ)アクリル系樹脂、ポリ塩化ビニル系樹脂、ポリ塩化ビニリデン系樹脂、ポリスチレン系樹脂、ポリビニルアルコール系樹脂、ポリアリレート系樹脂、ポリフェニレンサルファイド系樹脂等が挙げられる。これらの中で特に好ましい材料は、ポリエステル系樹脂、ポリカーボネート系樹脂、ポリオレフィン系樹脂である。基材層材料については、特許文献5に詳細な記載がり、ここに記載された材料のいずれも使用できるが、ポリエチレンテレフタレート(PET)フィルムが一般的に使用されている。市販のPETフィルムとしては、三菱ポリエステル株式会社製のフィルムがあり、1085mm幅で、厚さ23μmのものと50μmのものが入手できる。積層工程中に受ける熱により発生するオリゴマーを防止するためのオリゴマー防止層を付与したPETフィルムを入手可能である。視認側からみて偏光機能積層体より内側にタッチセンサ積層体が配置される構成では、基材層は、PETではなく、光等方性を有するポリカーボネート系樹脂、ノルボルネン系樹脂材料により形成することが好ましい。
[検査方法]
<屈折率>
各層の屈折率は、アタゴ社製のアッべ屈折率計を用い、各種測定面に対して測定光(ナトリウムD線)を入射させるようにして、該屈折率に示される規定の測定方法により測定を行った。
フィルム基材、透明基体、ハードコート層、接着剤層等の、1μm以上の厚みを有するものに関しては、ミツトヨ社製マイクロゲージ式厚み計にて測定を行った。ハードコート層、接着剤層等の直接厚みを計測することが困難な層については、各層を設けた基材の総厚みを測定して、基材の厚みを差し引くことで膜厚を計算した。
日立ハイテク社製の分光光度計「U-4100」(商品名)の積分球測定モードを用いて、ITO膜への入射角を2度として、波長380nm~780nmの領域におけるパターン部とパターン開口部の直下の反射率を5nm間隔で測定した。次いで、パターン部とパターン開口部の直下の平均反射率を算出し、これらの平均反射率の値からパターン部とパターン開口部の直下との間の反射率差ΔRを算出した。なお、前記測定は、タッチセンサ積層体(サンプル)の裏面側(PETフィルム側)に黒色スプレーを用いて遮光層を形成し、サンプルの裏面からの反射や裏面側からの光の入射が殆ど無い状態で測定を行った。また、D65光源を用いて、パターン部及びパターン開口部の直下のそれぞれの反射光のL*、a*、b*を算出し、以下の式を用いてパターン部の反射光とパターン開口部の直下の反射光の色差ΔEを算出した。
ΔE={(ΔL*)2+(Δa*)2+(Δb*)2}0.5
(アンダーコート層の形成)
厚み25μのポリエチレンテレフタレートフィルム(以下、PETフィルムという)からなる透明フィルム基材(屈折率n1=1.65)の一方の面に、メラミン樹脂:アルキド樹脂:有機シラン縮合物の重量比2:2:1が熱硬化型樹脂組成物を塗布し、その後、乾燥、硬化させて、膜厚20nmの誘電体層から成る第1のアンダーコート層を形成した。この例において、第1のアンダーコート層の屈折率n21は1.54であった。
次に、第2のアンダーコート層上に、アルゴンガス98%と酸素ガス2%とからなる0.4Paの雰囲気中で、酸化インジウム97重量%、酸化スズ3重量%の焼結体材料を用いた反応性スパッタリング法により、厚み23nmのITO膜(屈折率n3=2.00)を形成して、タッチセンサ積層体を得た。
透明導電性フィルムの透明導電層に、ストライプ状にパターン化されているフォトレジストを塗布し、乾燥、硬化した後、25℃、5重量%の塩酸(塩化水素水溶液)に、1分間浸漬して、ITO膜のエッチングを行った。その後、フォトレジストを除去した。
ITO膜のエッチングを行った後、140℃で90分間の加熱処理を行って、ITO膜を結晶化した。
実施例1と同様にして、PETフィルムの一方の面に誘電体層から成る第1のアンダーコート層、誘電体層から成る第2のアンダーコート層およびITO膜を形成して、タッチセンサ積層体を得た。
タッチセンサ積層体の透明導電膜に、ストライプ状にパターン化されているフォトレジストを塗布し、乾燥、硬化した後、25℃、5重量%の塩酸に、1分間浸漬して、ITO膜のエッチングを行った。
ITO膜のエッチングを行った後、引き続きフォトレジストを積層したまま、45℃、2重量%の水酸化ナトリウム水溶液に、3分間浸漬して、誘電体層から成る第2のアンダーコート層のエッチングを行い、その後、フォトレジストを除去した。
ITO膜および誘電体層から成る第2のアンダーコート層をパターン化した後、140℃で90分間の加熱処理を行って、ITO膜を結晶化した。
実施例3および4においては、それぞれ実施例1および実施例2と同様にして、パターン部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、実施例♯3および♯4においては、誘電体層から成る第1のアンダーコート層の厚みを35nm、誘電体層から成る第2のアンダーコート層の厚みを5nmとした点においては、実施例♯1および♯2とは異なっていた。
実施例5および6においては、それぞれ実施例1および実施例2と同様にしてパターン開口部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、実施例5及び6においては、誘電体層から成る第1のアンダーコート層の厚みを30nm、誘電体層から成る第2のアンダーコート層の厚みを15nmとした点において、実施例1および2とは異なっていた。
比較例1においては、実施例1と同様にして、パターン部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、比較例1においては、誘電体層から成る第1のアンダーコート層の厚みを45nm、誘電体層から成る第2のアンダーコート層の厚みを10nmとした点において、実施例1とは異なっていた。
比較例2においては、実施例1と同様にして、パターン部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、比較例2においては、誘電体層から成る第1のアンダーコート層の厚みを30nm、誘電体層から成る第2のアンダーコート層の厚みを30nmとした点において、実施例1とは異なっていた。
比較例3においては、実施例1と同様にして、パターン部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、比較例3においては、誘電体層から成る第1のアンダーコート層の厚みを40nm、誘電体層から成る第2のアンダーコート層の厚みを30nmとした点において、実施例1とは異なっていた。
比較例においては、実施例1と同様にして、パターン部とパターン開口部とを有するタッチセンサ積層体を作製した。ただし、比較例4においては、誘電体層から成る第1のアンダーコート層が下記のように形成された点、および誘電体層から成る第2のアンダーコート層の厚みを35nmとした点において、実施例1とは異なっていた。
厚みを25μmのPETフィルム基材(屈折率n1=1.65)の一方の面に、誘電体層から成る第1のアンダーコート層として、膜厚20nmのシリコン錫酸化物をスパッタリング法により形成した。この誘電体層から成る第1のアンダーコート層の屈折率は1.70であった。
(ハードコート層の形成)
基材として厚み25μのポリエチレンテレフタレートフィルム(以下、PETフィルムという)からなる透明フィルム基材(屈折率n1=1.65)を使用した。また、ハードコート層形成材料として、イソシアヌル酸系アクリレート、ペンタエリスリトールトリアクリレート、イソホロンジイソシアネートポリウレタンからなる紫外線硬化型樹脂(DIC社製の「ユニディック17-806」)に、樹脂固形分100部当り、光重合開始剤(チバ・スペシャルティ・ケミカルズ社製の「イルガキュア907」)5部を加えたものを、酢酸ブチル/酢酸エチルが2/3の混合溶媒により、固形分濃度が50%となるように希釈して調製したハードコート層形成材料を使用した。
次いで両面にハードコート層が形成された透明フィルム基材の両方の面に、メラミン樹脂:アルキド樹脂:有機シラン縮合物の重量比2:2:1とした熱硬化型樹脂組成物を塗布し、その後、乾燥、硬化させて、膜厚20nmの誘電体層から成る第1のアンダーコート層を形成した。この例において、第1のアンダーコート層の屈折率n31は1.54であった。
次に、第2のアンダーコート層上に、アルゴンガス98%と酸素ガス2%とからなる0.4Paの雰囲気中で、酸化インジウム97重量%、酸化スズ3重量%の焼結体材料を用いた反応性スパッタリング法により、厚み23nmのITO膜(屈折率n4=2.00)を形成して、タッチセンサ積層体を得た。
次いで、反対側の面にも同じ操作を繰り返してITO膜を成膜し、両側にITO膜を成膜したタッチセンサ積層体を得た。
タッチセンサ積層体の一方の透明導電層にポリエステルフィルムによる保護層を貼りつけ、他方の透明導電層にストライプ状にパターン化されているフォトレジストを塗布し、乾燥、硬化した後、25℃、5重量%の塩酸(塩化水素水溶液)に、1分間浸漬して、ITO膜のエッチングを行った。その後、フォトレジストを除去し、第1透明電極パターンを形成した。次いで、第1透明電極パターンを保護層により保護し、前記と同様の操作を行い、第2透明電極パターンを形成した。
上記ITO膜のエッチングを行った後、140℃で90分間の加熱処理を行って、ITO膜を結晶化した。
実施例7において、片側のハードコート層を塗工せず、かつアンダーコート層を塗工しなかった事以外は、実施例7と同じ操作を行いタッチセンサ積層体を得た。
[比較例6]
実施例7において、片側のアンダーコート層を塗工しなかった事以外は、実施例7と同じ操作を行いタッチセンサ積層体を得た。
フィルムを10cm×10cmに切り出して、フィルムの反りを評価した。
○:反り変形が小さい(4隅の平均反り変形の高さが5mm未満)
×:反り変形が大きい(4隅の平均反り変形の高さが5mm以上)
(見映え評価)
第1透明電極パターンを視認側にして、目視で評価を行った。
○:両面のパターン見えが均一(ΔRが1%未満)
×:両面のパターン見えが不均一(ΔRが1%以上)
結果を表2に示す。
3:タッチセンサ積層体
5:表示パネル
7:ウインドウ
11:接着剤層
13:縁取り印刷
115:円偏光機能積層体
115a:偏光フィルム層
115b:λ/4位相差フィルム
31:第1の透明導電性層
32:第2の透明導電性層
33、36:導電体側アンダーコート層
34、37:基材側アンダーコート層
35:第1の透明基材層
38:第2の透明基材層
39:接着剤層
51、52:偏光子フィルム
Claims (11)
- タッチ入力機能を有する表示パネル装置に使用される静電容量型タッチセンサ積層体であって、
透明樹脂材料により形成された平坦な面を両側に有する誘電性中央基体構造と、
前記平坦な面の各々の上に形成された少なくとも1層の透明材料のコート層と、
前記コート層の上に隣接して形成された透明導電性層と、
からなり、
前記少なくとも1層のコート層は、前記透明導電性層により形成される電極のパターン見えを抑制する屈折率調整層を少なくとも1層含むものであり、
前記平坦な面のそれぞれに形成された前記コート層の厚みは、前記誘電性中央基体構造の両側の層が、該誘電性中央基体構造を挟んで互いに対称となるように定められた
ことを特徴とする静電容量型タッチセンサ積層体。 - 請求項1に記載した静電容量型タッチセンサ積層体であって、前記屈折率調整層は、前記誘電性中央基体構造に近い側に配置された第1の屈折率調整用アンダーコート層と、前記第1の屈折率調整用アンダーコート層の上に形成された第2の屈折率調整用アンダーコート層とを含み、前記第1の屈折率調整用アンダーコート層は、前記第2の屈折率調整用アンダーコート層よりも高い屈折率を有することを特徴とする静電容量型タッチセンサ積層体。
- 請求項1に記載した静電容量型タッチセンサ積層体であって、前記少なくとも1層のコート層は、前記誘電性中央基体構造に近い側に配置されたハードコート層と、前記ハードコート層の上に形成された少なくとも1層の屈折率調整用アンダーコート層とからなることを特徴とする静電容量型タッチセンサ積層体。
- 請求項3に記載された静電容量型タッチセンサ積層体であって、前記少なくとも1層の屈折率調整用アンダーコート層は、前記ハードコート層に近い側に配置された第1の屈折率調整用アンダーコート層と、前記第1の屈折率調整用アンダーコート層の上に形成された第2の屈折率調整用アンダーコート層とを含み、前記第1の屈折率調整用アンダーコート層は、前記第2の屈折率調整用アンダーコート層よりも高い屈折率を有することを特徴とする静電容量型タッチセンサ積層体。
- 請求項2又は請求項4に記載した静電容量型タッチセンサ積層体であって、前記第1のアンダーコート層は、厚みが35nm以下であり、前記第2のアンダーコート層の厚みは前記第1のアンダーコート層の厚みより小さいことを特徴とする静電容量型タッチセンサ積層体。
- 請求項5に記載した静電容量型タッチセンサ積層体であって、前記第2のアンダーコート層の厚みは前記第1のアンダーコート層の厚みの1/2以下であることを特徴とする静電容量型タッチセンサ積層体。
- 請求項1から請求項6までのいずれか1項に記載した静電容量型タッチセンサ積層体であって、前記誘電性中央基体構造は、同じ厚みを有する同じ材料からなる第1及び第2の透明基材層が透明接着材料層を介して互いに接合されたものであることを特徴とする静電容量型タッチセンサ積層体。
- 請求項7に記載した静電容量型タッチセンサ積層体であって、前記第1及び第2の透明基材層の各々は、第2のハードコート層を介して前記透明接着剤層に接合されたことを特徴とする静電容量型タッチセンサ積層体。
- 請求項1から請求項6までのいずれか1項に記載した静電容量型タッチセンサ積層体であって、前記誘電性中央基体構造は、単一の透明樹脂材料層により構成されたことを特徴とする静電容量型タッチセンサ積層体。
- 請求項9に記載した静電容量型タッチセンサ積層体であって、前記単一の透明樹脂材料層は、光学的等方性材料により構成されたことを特徴とする静電容量型タッチセンサ積層体。
- 請求項9に記載した静電容量型タッチセンサ積層体であって、前記単一の透明樹脂材料層は、1/4波長位相差層として構成されたことを特徴とする静電容量型タッチセンサ積層体。
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Also Published As
Publication number | Publication date |
---|---|
JPWO2012073990A1 (ja) | 2014-05-19 |
EP2648080B1 (en) | 2016-08-03 |
KR20140139126A (ko) | 2014-12-04 |
CN103238127A (zh) | 2013-08-07 |
EP2648080A1 (en) | 2013-10-09 |
EP2648079A4 (en) | 2016-05-04 |
US20140036170A1 (en) | 2014-02-06 |
KR101583203B1 (ko) | 2016-01-06 |
KR101684488B1 (ko) | 2016-12-08 |
WO2012073964A1 (ja) | 2012-06-07 |
US9207482B2 (en) | 2015-12-08 |
EP2648079A1 (en) | 2013-10-09 |
TWI605951B (zh) | 2017-11-21 |
JPWO2012073964A1 (ja) | 2014-05-19 |
TWI541701B (zh) | 2016-07-11 |
KR20150002877A (ko) | 2015-01-07 |
US9116380B2 (en) | 2015-08-25 |
KR20150005653A (ko) | 2015-01-14 |
US20130258570A1 (en) | 2013-10-03 |
KR101525953B1 (ko) | 2015-06-09 |
TW201238763A (en) | 2012-10-01 |
KR20130096296A (ko) | 2013-08-29 |
EP2648080A4 (en) | 2015-03-11 |
JP5900890B2 (ja) | 2016-04-06 |
KR101582282B1 (ko) | 2016-01-06 |
CN103250120A (zh) | 2013-08-14 |
TW201241719A (en) | 2012-10-16 |
KR20130100355A (ko) | 2013-09-10 |
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