WO2010113835A1 - イミド酸化合物の製造方法 - Google Patents
イミド酸化合物の製造方法 Download PDFInfo
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- WO2010113835A1 WO2010113835A1 PCT/JP2010/055508 JP2010055508W WO2010113835A1 WO 2010113835 A1 WO2010113835 A1 WO 2010113835A1 JP 2010055508 W JP2010055508 W JP 2010055508W WO 2010113835 A1 WO2010113835 A1 WO 2010113835A1
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- 239000002253 acid Substances 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 150000001875 compounds Chemical class 0.000 title claims abstract description 18
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 67
- 150000007530 organic bases Chemical class 0.000 claims abstract description 62
- 150000003839 salts Chemical class 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 32
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 28
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
- 238000006243 chemical reaction Methods 0.000 claims description 60
- -1 phosphoryl halide Chemical class 0.000 claims description 52
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 46
- 150000003949 imides Chemical class 0.000 claims description 22
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 14
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 11
- 150000002367 halogens Chemical class 0.000 claims description 11
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 10
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 10
- 229910052794 bromium Inorganic materials 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 10
- 229910052801 chlorine Inorganic materials 0.000 claims description 10
- 239000011630 iodine Substances 0.000 claims description 10
- 229910052740 iodine Inorganic materials 0.000 claims description 10
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 10
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 9
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 6
- 150000003512 tertiary amines Chemical class 0.000 claims description 6
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 claims description 5
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 claims description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
- 125000001188 haloalkyl group Chemical group 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 5
- 230000033444 hydroxylation Effects 0.000 claims 1
- 238000005805 hydroxylation reaction Methods 0.000 claims 1
- 125000000879 imine group Chemical group 0.000 claims 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 abstract description 10
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 abstract description 9
- 239000006227 byproduct Substances 0.000 abstract description 8
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 abstract description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 48
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 239000002904 solvent Substances 0.000 description 20
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 16
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 13
- 239000005935 Sulfuryl fluoride Substances 0.000 description 12
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 description 12
- 150000003863 ammonium salts Chemical class 0.000 description 10
- 239000005457 ice water Substances 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 8
- CPRMKOQKXYSDML-UHFFFAOYSA-M rubidium hydroxide Chemical compound [OH-].[Rb+] CPRMKOQKXYSDML-UHFFFAOYSA-M 0.000 description 8
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical compound NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 6
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 6
- 229910052700 potassium Inorganic materials 0.000 description 6
- 239000011591 potassium Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 6
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- BWZVCCNYKMEVEX-UHFFFAOYSA-N 2,4,6-Trimethylpyridine Chemical compound CC1=CC(C)=NC(C)=C1 BWZVCCNYKMEVEX-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- FFUQCRZBKUBHQT-UHFFFAOYSA-N phosphoryl fluoride Chemical compound FP(F)(F)=O FFUQCRZBKUBHQT-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002466 imines Chemical group 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- 125000005499 phosphonyl group Chemical group 0.000 description 3
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 3
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 3
- 150000003222 pyridines Chemical class 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-Me3C6H3 Natural products CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 2
- NURQLCJSMXZBPC-UHFFFAOYSA-N 3,4-dimethylpyridine Chemical compound CC1=CC=NC=C1C NURQLCJSMXZBPC-UHFFFAOYSA-N 0.000 description 2
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- NBPGPQJFYXNFKN-UHFFFAOYSA-N 4-methyl-2-(4-methylpyridin-2-yl)pyridine Chemical group CC1=CC=NC(C=2N=CC=C(C)C=2)=C1 NBPGPQJFYXNFKN-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 229910000792 Monel Inorganic materials 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- WRJWRGBVPUUDLA-UHFFFAOYSA-N chlorosulfonyl isocyanate Chemical compound ClS(=O)(=O)N=C=O WRJWRGBVPUUDLA-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- PVMUVDSEICYOMA-UHFFFAOYSA-N n-chlorosulfonylsulfamoyl chloride Chemical compound ClS(=O)(=O)NS(Cl)(=O)=O PVMUVDSEICYOMA-UHFFFAOYSA-N 0.000 description 2
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 2
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- ODNBVEIAQAZNNM-UHFFFAOYSA-N 1-(6-chloroimidazo[1,2-b]pyridazin-3-yl)ethanone Chemical compound C1=CC(Cl)=NN2C(C(=O)C)=CN=C21 ODNBVEIAQAZNNM-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- UWKQJZCTQGMHKD-UHFFFAOYSA-N 2,6-di-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CC(C(C)(C)C)=N1 UWKQJZCTQGMHKD-UHFFFAOYSA-N 0.000 description 1
- IYOPLBUKBYKFGV-UHFFFAOYSA-N 2,7-dimethyl-1,10-phenanthroline Chemical compound C1=CN=C2C3=NC(C)=CC=C3C=CC2=C1C IYOPLBUKBYKFGV-UHFFFAOYSA-N 0.000 description 1
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 1
- YSAANLSYLSUVHB-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]ethanol Chemical compound CN(C)CCOCCO YSAANLSYLSUVHB-UHFFFAOYSA-N 0.000 description 1
- BZUDVELGTZDOIG-UHFFFAOYSA-N 2-ethyl-n,n-bis(2-ethylhexyl)hexan-1-amine Chemical compound CCCCC(CC)CN(CC(CC)CCCC)CC(CC)CCCC BZUDVELGTZDOIG-UHFFFAOYSA-N 0.000 description 1
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 1
- AGHKTFCBPXFFGE-UHFFFAOYSA-N 3-(1h-imidazol-2-yl)-n,n-dimethylpropan-1-amine Chemical compound CN(C)CCCC1=NC=CN1 AGHKTFCBPXFFGE-UHFFFAOYSA-N 0.000 description 1
- DHDHJYNTEFLIHY-UHFFFAOYSA-N 4,7-diphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=CN=C21 DHDHJYNTEFLIHY-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- OXMSMRJQZMTIMT-UHFFFAOYSA-N 4-phenyl-2-(4-phenylpyridin-2-yl)pyridine Chemical group C1=CC=CC=C1C1=CC=NC(C=2N=CC=C(C=2)C=2C=CC=CC=2)=C1 OXMSMRJQZMTIMT-UHFFFAOYSA-N 0.000 description 1
- BRPQDJPJBCQFSR-UHFFFAOYSA-N 5,6-dimethyl-1,10-phenanthroline Chemical compound C1=CC=C2C(C)=C(C)C3=CC=CN=C3C2=N1 BRPQDJPJBCQFSR-UHFFFAOYSA-N 0.000 description 1
- PTRATZCAGVBFIQ-UHFFFAOYSA-N Abametapir Chemical group N1=CC(C)=CC=C1C1=CC=C(C)C=N1 PTRATZCAGVBFIQ-UHFFFAOYSA-N 0.000 description 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K Antimony trifluoride Inorganic materials F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VIZQREHVDDPWOK-UHFFFAOYSA-N IP(I)(I)=O Chemical compound IP(I)(I)=O VIZQREHVDDPWOK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- DJEQZVQFEPKLOY-UHFFFAOYSA-N N,N-dimethylbutylamine Chemical compound CCCCN(C)C DJEQZVQFEPKLOY-UHFFFAOYSA-N 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- CQXADFVORZEARL-UHFFFAOYSA-N Rilmenidine Chemical compound C1CC1C(C1CC1)NC1=NCCO1 CQXADFVORZEARL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- WCZVZNOTHYJIEI-UHFFFAOYSA-N cinnoline Chemical compound N1=NC=CC2=CC=CC=C21 WCZVZNOTHYJIEI-UHFFFAOYSA-N 0.000 description 1
- LVZUJXAQTSIESB-UHFFFAOYSA-N ctk1a2360 Chemical compound ClP(=N)=O LVZUJXAQTSIESB-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 description 1
- 150000002244 furazanes Chemical class 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 210000002816 gill Anatomy 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- DTKANQSCBACEPK-UHFFFAOYSA-N n',n'-bis[3-(dimethylamino)propyl]-n,n-dimethylpropane-1,3-diamine Chemical compound CN(C)CCCN(CCCN(C)C)CCCN(C)C DTKANQSCBACEPK-UHFFFAOYSA-N 0.000 description 1
- SWVGZFQJXVPIKM-UHFFFAOYSA-N n,n-bis(methylamino)propan-1-amine Chemical compound CCCN(NC)NC SWVGZFQJXVPIKM-UHFFFAOYSA-N 0.000 description 1
- MXHTZQSKTCCMFG-UHFFFAOYSA-N n,n-dibenzyl-1-phenylmethanamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 MXHTZQSKTCCMFG-UHFFFAOYSA-N 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- KTQDYGVEEFGIIL-UHFFFAOYSA-N n-fluorosulfonylsulfamoyl fluoride Chemical compound FS(=O)(=O)NS(F)(=O)=O KTQDYGVEEFGIIL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- UKODFQOELJFMII-UHFFFAOYSA-N pentamethyldiethylenetriamine Chemical compound CN(C)CCN(C)CCN(C)C UKODFQOELJFMII-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- UXCDUFKZSUBXGM-UHFFFAOYSA-N phosphoric tribromide Chemical compound BrP(Br)(Br)=O UXCDUFKZSUBXGM-UHFFFAOYSA-N 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical compound N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- WPFGFHJALYCVMO-UHFFFAOYSA-L rubidium carbonate Chemical compound [Rb+].[Rb+].[O-]C([O-])=O WPFGFHJALYCVMO-UHFFFAOYSA-L 0.000 description 1
- 229910000026 rubidium carbonate Inorganic materials 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- USPTVMVRNZEXCP-UHFFFAOYSA-N sulfamoyl fluoride Chemical compound NS(F)(=O)=O USPTVMVRNZEXCP-UHFFFAOYSA-N 0.000 description 1
- NBNBICNWNFQDDD-UHFFFAOYSA-N sulfuryl dibromide Chemical compound BrS(Br)(=O)=O NBNBICNWNFQDDD-UHFFFAOYSA-N 0.000 description 1
- TWPVZKPFIMFABN-UHFFFAOYSA-N sulfuryl diiodide Chemical compound IS(I)(=O)=O TWPVZKPFIMFABN-UHFFFAOYSA-N 0.000 description 1
- GFYHSKONPJXCDE-UHFFFAOYSA-N sym-collidine Natural products CC1=CN=C(C)C(C)=C1 GFYHSKONPJXCDE-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- ABVVEAHYODGCLZ-UHFFFAOYSA-N tridecan-1-amine Chemical compound CCCCCCCCCCCCCN ABVVEAHYODGCLZ-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/34—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of amides of sulfuric acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/06—Phosphorus compounds without P—C bonds
- C07F9/22—Amides of acids of phosphorus
- C07F9/26—Amides of acids of phosphorus containing P-halide groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/02—Catalysts comprising hydrides, coordination complexes or organic compounds containing organic compounds or metal hydrides
- B01J31/0234—Nitrogen-, phosphorus-, arsenic- or antimony-containing compounds
- B01J31/0235—Nitrogen containing compounds
- B01J31/0252—Nitrogen containing compounds with a metal-nitrogen link, e.g. metal amides, metal guanidides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/086—Compounds containing nitrogen and non-metals and optionally metals containing one or more sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
- C01B21/093—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/097—Compounds containing nitrogen and non-metals and optionally metals containing phosphorus atoms
- C01B21/0975—Compounds containing nitrogen and non-metals and optionally metals containing phosphorus atoms containing also one or more sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/04—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups
- C07C209/06—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of halogen atoms
- C07C209/12—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of halogen atoms with formation of quaternary ammonium compounds
Definitions
- the present invention relates to an imidic acid compound useful as a pharmaceutical, an agrochemical intermediate, a battery electrolyte, and an acid catalyst, specifically, a method for producing a bis (halogenated sulfonyl) imide or a bis (dihalogenated phosphonyl) imidic acid compound.
- a bis (halogenated sulfonyl) imide or a bis (dihalogenated phosphonyl) imidic acid compound is about.
- the bis (halogenated sulfonyl) imide and bis (dihalogenated phosphonyl) imidic acid compounds that have been widely known are useful substances as battery electrolyte solvents, acid catalysts, ionic liquids, and antistatic agents.
- Patent Document 1 discloses a method for producing bis (fluorosulfonyl) imide acid by reacting urea (NH 2 —CO—NH 2 ) with fluorosulfonic acid
- non-patent Document 1 discloses a production method for obtaining bis (fluorosulfonyl) imidic acid by reacting bis (chlorosulfonyl) imidic acid with a metal fluoride.
- Patent Document 2 discloses a method in which chloro (sulfonic acid) (ClSO 3 H) and chlorosulfonyl isocyanate (ClSO 2 NCO) are reacted to obtain bis (chlorosulfonyl) imidic acid.
- Non-Patent Document 3 discloses a method of reacting chlorosulfonic acid (ClSO 3 H) and N-sulfonyltrichlorophosphazene (ClSO 2 NPCl 3 ) to obtain bis (chlorosulfonyl) imidic acid.
- Non-Patent Document 4 discloses reacting LiN (SiMe 3 ) 2 which is a silazane metal compound with phosphoryl trifluoride (POF 3 ) to produce bis (difluorophosphonyl).
- LiN (SiMe 3 ) 2 which is a silazane metal compound with phosphoryl trifluoride (POF 3 ) to produce bis (difluorophosphonyl).
- PPF 3 phosphoryl trifluoride
- Non-patent documents 5 and 6 are reacted with sulfuryl chloride or sulfuryl fluoride and anhydrous ammonia to obtain sulfamide (H 2 NSO 2 NH 2 ).
- Patent Document 3 discloses a production method in which a tertiary amine such as a silazane derivative and a halogenated sulfuryl are reacted to obtain a bis (halogenated sulfonyl) imidic acid derivative.
- Patent Document 1 In the method of Patent Document 1, it is difficult to separate bis (fluorosulfonyl) imidic acid and fluorosulfonic acid obtained by this reaction using fluorosulfonic acid having high toxicity and corrosivity, and low yield. Therefore, it is difficult to adopt as an industrial manufacturing method.
- the methods of Non-Patent Documents 1 and 2 are disadvantageous for industrial mass production because they use arsenic trifluoride and antimony trifluoride, which are highly toxic and expensive.
- Patent Document 2 and Non-Patent Document 3 are disadvantageous in that relatively expensive chlorosulfonyl isocyanate (ClSO 2 NCO) or N-sulfonyltrichlorophosphazene (ClSO 2 NPCl 3 ) is used.
- chlorosulfonyl isocyanate ClSO 2 NCO
- N-sulfonyltrichlorophosphazene ClSO 2 NPCl 3
- R is a halosulfonyl group (—SO 2 X 1 ; X 1 is a halogen (fluorine, chlorine, bromine, iodine)) or a dihalophosphoryl group (—POX 2 X 3 ; X 2 , X 3 represents the same or different halogen (fluorine, chlorine, bromine, iodine)).
- B represents an organic base.
- X 6 X 7 X 8 : X 6 , X 7 , X 8 represent the same or different halogen (fluorine, chlorine, bromine, iodine) And the same or different from the above-mentioned X 2 and X 3 ), and by reacting with ammonia, the “salt or complex comprising imide acid and organic base” represented by the formula [1] is highly selective. And the knowledge which can be manufactured with a high yield was acquired, and this invention was completed.
- [Invention 1] A process for producing a “salt or complex comprising an imide acid and an organic base” represented by the formula [1], characterized by reacting sulfuryl halide or phosphoryl halide with ammonia in the presence of an organic base.
- the organic base is a tertiary amine represented by the formula [2]
- R 1 , R 2 , and R 3 are the same or different and each represents a linear or branched alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, or an aryl group (aryl A part or all of the hydrogen atoms of the group are halogen (fluorine, chlorine, bromine, iodine), an alkyl group having 1 to 10 carbon atoms, a haloalkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, And may be substituted with an amino group, a nitro group, an acetyl group, a cyano group, or a hydroxyl group. ], Nitrogen-containing aromatic heterocyclic compound, or the following imine skeleton —C ⁇ N—C— The method according to any one of
- Invention 5 The method according to any one of Inventions 1 to 4, wherein the organic base is trimethylamine, triethylamine, diisopropylethylamine, tri-n-propylamine, tributylamine, or pyridine.
- invention 6 6. The method according to any one of inventions 1 to 5, wherein the amount of the organic base is 1 to 50 mol with respect to 1 mol of ammonia.
- invention 7 The method according to any one of inventions 1 to 3, wherein the amount of the sulfuryl halide or phosphoryl halide used is 1 mol to 10 mol with respect to 1 mol of ammonia.
- the “salt or complex comprising imide acid and organic base” obtained by the method according to any one of Inventions 1 to 8 includes an alkali metal hydroxide or carbonate, or an alkaline earth metal hydroxide.
- a metal imidate represented by the formula [3], characterized by reacting with a carbonate [In the formula [3], R is the same as defined above.
- M represents an alkali metal or an alkaline earth metal.
- n represents an integer equal to the valence of the corresponding metal. ] Manufacturing method.
- the present invention is characterized by “reacting halogenated sulfuryl or halogenated phosphoryl and ammonia in the presence of an organic base”.
- a compound called “sulfamide” is produced.
- This document also discloses that a large amount of by-products are produced in addition to sulfamide (see Scheme 1).
- Patent Document 3 discloses that a corresponding imide compound can be produced by reacting a sulfuryl halide with an amine such as a silazane derivative.
- the method of Patent Document 3 is applied to the present invention.
- SO 2 F 2 sulfuryl fluoride
- the target product “salt or complex composed of bisfluorosulfonylimide acid and organic base” is hardly obtained, and by-products such as sulfamide are obtained. (See scheme 2 below).
- the present inventors coexisted with an organic base in addition to ammonia in the reaction system, so that almost no sulfamide was produced, and a high conversion rate and high selectivity were obtained with a “salt comprising imidic acid and an organic base or It was found that a “complex” was obtained (see Scheme 3 below).
- the present invention has found preferable conditions for the method of introducing the reagent into the reaction system in carrying out the present invention.
- the order of addition into the reaction system that is, by adding an organic base and sulfuryl fluoride into the system, and then introducing ammonia into the reaction system, high selectivity and high yield can be obtained.
- the present inventors have found extremely useful knowledge that the object can be obtained.
- the “salt or complex comprising bis (halogenated sulfonyl) imidic acid and an organic base” can be easily expressed by reacting an alkali metal hydroxide or an alkaline earth metal hydroxide with the formula [3]. It was also found that a bis (halogenated sulfonyl) imidic acid metal salt represented by
- the present invention is capable of producing a target imidic acid derivative in a high yield while significantly suppressing the production of by-products, using sulfuryl halide or phosphoryl halide that is inexpensive and suitable for handling a large amount. There is an effect.
- the present invention is a process for producing a “salt or complex comprising an imidic acid and an organic base” represented by the formula [1], wherein sulfuryl halide or phosphoryl halide and ammonia are reacted in the presence of an organic base. It is the manufacturing method of "the salt or complex which consists of an imide acid and an organic base” characterized by the above-mentioned.
- halogenated sulfuryl examples include sulfuryl fluoride, sulfuryl chloride, sulfuryl bromide and sulfuryl iodide
- halogenated phosphoryl examples include phosphoryl fluoride, phosphoryl chloride, phosphoryl bromide and phosphoryl iodide.
- sulfuryl fluoride, sulfuryl chloride, phosphoryl fluoride, and phosphoryl chloride are particularly preferred.
- the amount of sulfuryl halide or phosphoryl halide is usually 1 to 10 mol, preferably 1 to 8 mol, more preferably 1 to 5 mol per mol of ammonia.
- the organic base used in the present invention is a tertiary amine represented by the formula [2], a nitrogen-containing aromatic heterocyclic compound, or the following imine skeleton —C ⁇ N—C— Specific examples of each compound will be described below.
- (A) Tertiary amine trimethylamine, triethylamine, N-ethyldiisopropylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, trioctylamine, tridecylamine, triphenylamine, tribenzylamine, Tris (2-ethylhexyl) amine, N, N-dimethyldecylamine, N-benzyldimethylamine, N-butyldimethylamine, N, N-dimethylcyclohexylamine, N, N, N ′, N′-tetramethyl Ethylenediamine, N, N-dimethylaniline, N, N-diethylaniline, 1,4-diazabicyclo [2.2.2] octane, N-methylpyrrolidine, N-methylpiperidine, N-methylmorpholine, N-ethylmorpholine, N, N'-dimethyl
- Nitrogen-containing aromatic heterocyclic compounds pyridine, 2,4,6-trimethylpyridine, 4-dimethylaminopyridine, lutidine, pyrimidine, pyridazine, pyrazine, oxazole, isoxazole, thiazole, isothiazole, imidazole, 1 , 2-dimethylimidazole, 3- (dimethylamino) propylimidazole, pyrazole, furazane, pyrazine, quinoline, isoquinoline, purine, 1H-indazole, quinazoline, cinnoline, quinoxaline, phthalazine, pteridine, phenanthridine, 2,6-di -T-butylpyridine, 2,2'-bipyridine, 4,4'-dimethyl-2,2'-bipyridyl, 4,4'-dimethyl-2,2'-bipyridyl, 5,5'
- tertiary amines such as trimethylamine, triethylamine, diisopropylethylamine, tripropylamine, tributylamine, secondary amines such as diisopropylamine, pyridine, 2,3-lutidine, 2,4-lutidine, 2,6-lutidine, Nitrogen-containing aromatic heterocyclic compounds such as 3,4-lutidine, 3,5-lutidine, 2,4,6-collidine, 3,5,6-collidine and the like are preferable, trimethylamine, triethylamine, diisopropylethylamine, tripropylamine , Tributylamine, pyridine and the like are more preferable.
- the amount of organic base used is stoichiometrically 3 moles per mole of ammonia and 1.5 moles per mole of sulfuryl halide or phosphoryl halide. As shown, it is preferable to use more than the stoichiometric amount in order to allow the reaction to proceed smoothly.
- the organic base is used in an amount of 1 to 50 moles (preferably 1 to 10 moles) per mole of ammonia, and 1.5 to 10 moles (preferably 1 mole of the sulfuryl or phosphoryl). Is 2 to 5 mol).
- the reaction can be carried out in the presence of an organic solvent or water.
- the organic solvent means an inert organic compound that does not directly participate in the reaction of the present invention.
- Reaction solvents include aliphatic hydrocarbons such as n-hexane, cyclohexane and n-heptane, aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene, halogens such as methylene chloride, chloroform and 1,2-dichloroethane.
- Hydrocarbons such as diethyl ether, tetrahydrofuran and tert-butyl methyl ether, esters such as ethyl acetate and butyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone and the like
- esters such as ethyl acetate and butyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone and the like
- Examples include amides, nitriles such as acetonitrile and propionitrile, and dimethyl sulfoxide.
- esters such as ethyl acetate and butyl acetate, amides such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone, nitriles such as acetonitrile and propionitrile, and dimethyl sulfoxide are preferable. Nitriles such as acetonitrile and propionitrile are more preferable.
- the amount of the organic solvent or water used is not particularly limited, but it is sufficient to use 0.1 L (liter) or more with respect to 1 mol of ammonia, usually 0.1 to 20 L is preferable, particularly 0.1 to 10L is more preferable.
- organic base when the above-mentioned organic base is a liquid, since these organic bases (for example, triethylamine etc.) also serve as a solvent, they can be used in excess to function as a solvent.
- organic bases for example, triethylamine etc.
- the temperature condition is not particularly limited, but may be in the range of ⁇ 50 to 150 ° C. Usually, ⁇ 20 to 100 ° C. is preferable, and ⁇ 10 to 70 ° C. is more preferable. If the temperature is lower than ⁇ 50 ° C., the reaction rate is slow, and if the temperature exceeds 150 ° C., decomposition of the product may occur.
- the pressure condition is not particularly limited, and can be performed under normal pressure conditions (0.1 MPa (absolute pressure; the same applies hereinafter)) or under reduced pressure conditions or pressurized conditions using a reactor that can withstand the pressure. . That is, it may be performed in the range of 0.01 MPa to 2 MPa, but is preferably 0.01 MPa to 1.5 MPa, more preferably 0.1 MPa to 1 MPa.
- reaction vessel used in the reaction examples include a pressure-resistant reaction vessel lined with Monel, Hastelloy, nickel, or a fluorine resin such as these metals, polytetrafluoroethylene, or perfluoropolyether resin.
- the reaction time is not particularly limited, but may be in the range of 0.1 to 48 hours. Since the reaction time varies depending on the substrate and reaction conditions, the progress of the reaction can be performed by analytical means such as gas chromatography, liquid chromatography, and NMR. It is preferable that the end point is the time when the raw material is almost disappeared by tracking the situation.
- a “salt or complex consisting of an imidic acid and an organic base” represented by the formula [1] is obtained.
- an organic solvent, an organic base, a halogenated sulfuryl or a halogenated phosphoryl is added to a pressure-resistant reaction vessel such as an autoclave, and then add ammonia, and then close the vessel for reaction.
- the reaction is preferably performed with 2 to 5 mol of sulfuryl halide or phosphoryl halide and 3 to 10 mol of organic base with respect to 1 mol of ammonia.
- the amount of the organic solvent used is preferably 0.1 to 20 L with respect to 1 mol of ammonia, and the temperature condition is preferably 0 to 100 ° C.
- the pressure condition is preferably 0.1 MPa to 1.5 MPa.
- the “salt or complex consisting of imido acid and an organic base”, which is the target product is itself a compound insoluble in water, but the following by-product in the reaction system, XSO 2 NHSO 2 NHSO 2 X May be produced in trace amounts.
- by-products can be removed by a simple operation (such as washing with water).
- the operation of adding water and washing is one of the preferred embodiments from the viewpoint of improving the chemical purity of the “salt or complex comprising imide acid and organic base” which is the target product.
- alkali metal hydroxide examples include lithium hydroxide (LiOH), potassium hydroxide (KOH), rubidium hydroxide (RbOH), and cesium hydroxide (CsOH).
- alkali metal carbonate examples include lithium carbonate (Li 2).
- alkali metal hydroxides or carbonates, or alkaline earth metal hydroxides or carbonates may be used alone or in combination of two or more.
- a combination of the same alkali metal hydroxide and carbonate for example, potassium hydroxide and potassium carbonate
- the same alkaline earth metal hydroxide and carbonate for example, hydroxide
- the amount of alkali metal hydroxide or carbonate, or alkaline earth metal hydroxide or carbonate used is preferably 1 to 5 moles per mole of “salt or complex comprising imide acid and organic base” More preferably, it is 1 mol to 3 mol.
- an amount exceeding 5 mol that is, an excessive amount of base is reacted, the reaction proceeds, but the “salt or complex composed of imido acid and organic base” is decomposed, and the yield may be reduced. For this reason, it is not preferable to use an excessive amount of base.
- the amount is less than 1 mol, the conversion rate decreases, which is not preferable.
- a solvent When reacting an alkali metal hydroxide or carbonate or an alkaline earth metal hydroxide or carbonate, a solvent can be used.
- water when water is used as a solvent, water is added so that the base concentration is usually 10% by mass to 70% by mass, preferably 20% by mass to 60% by mass, more preferably 30% by mass to 60% by mass. And good. If the amount of water is too small, stirring in the reaction system becomes difficult, and if it is too large, processing after the reaction becomes complicated and a reaction container larger than usual is required.
- An organic solvent other than water can also be used.
- Solvents such as ethers such as diethyl ether, dioxane, tetrahydrofuran and ethylene glycol dimethyl ether can be used. It can also be used in combination with water.
- the amount of the solvent to be used is appropriately selected from the range of usually 0.5 to 10 times, preferably 1 to 7 times the volume of “a salt or complex comprising imide acid and organic base”. However, since the reaction proceeds sufficiently even if water is used, there is little merit in using an organic solvent other than water.
- the reaction temperature is not particularly limited, but is usually ⁇ 10 ° C. to 110 ° C., preferably 25 to 80 ° C. If the temperature is lower than ⁇ 10 ° C., the reaction does not proceed sufficiently and causes a decrease in yield, which is economically disadvantageous, or causes a problem that the reaction rate decreases and it takes a long time to complete the reaction. There is a case. On the other hand, when the temperature exceeds 110 ° C., by-products are likely to be generated, and excessive heating is not energy efficient.
- the reaction time is not particularly limited, but it may usually be within a range of 24 hours.
- the progress of the reaction is traced by an analytical means such as ion chromatography or NMR, and the end point when the raw material substrate has almost disappeared. Is preferable.
- the reactor used in this process is made of metal containers such as stainless steel, Hastelloy, Monel, tetrafluoroethylene resin, chlorotrifluoroethylene resin, vinylidene fluoride resin, PFA resin, polypropylene resin, polyethylene resin, and glass.
- a reactor capable of sufficiently performing a reaction under normal pressure or pressure can be used, such as one lined inside.
- a liter autoclave was charged with 184 g of acetonitrile and 184 g (1.82 mol) of triethylamine, cooled to 5 ° C. with ice water, and 153 g (1.50 mol) of sulfuryl fluoride was introduced. After introducing sulfuryl fluoride, 9.1 g (0.53 mol) of anhydrous ammonia was subsequently introduced over 1 hour. The reactor was warmed to room temperature and stirred for 48 hours. The production ratio of this reaction was 99.2%, and 0.8% of FSO 2 NHSO 2 NHSO 2 F was produced. The solvent of this reaction solution was distilled off, and ether and water were added to the residue, followed by extraction and washing with water.
- a 1 L autoclave was charged with 384 g of acetonitrile and 158 g (2.00 mol) of pyridine, cooled to 5 ° C. with ice water, and 132 g (1.29 mol) of sulfuryl fluoride was introduced. After introducing sulfuryl fluoride, 9.8 g (0.58 mol) of anhydrous ammonia was introduced over 1 hour. The reactor was warmed to room temperature and stirred for 48 hours. The production ratio of this reaction was 99.0%, and 1.0% of FSO 2 NHSO 2 NHSO 2 F was produced. The solvent of this reaction solution was distilled off, and ether and water were added to the residue, followed by extraction and washing with water. Next, the organic layer was separated and the solvent was distilled off to obtain 127 g of bisfluorosulfonylimide pyridine salt (note that the pyridine salt was used in the next reaction as it was without isolation and purification). .
- a 200 mL autoclave was charged with 105 g of acetonitrile and 21.2 g (210 mmol) of triethylamine, cooled to 5 ° C. with ice water, and 1.2 g (70 mmol) of anhydrous ammonia was added. Next, 15.5 g (152 mmol) of sulfuryl fluoride was introduced. The reactor was warmed to room temperature and stirred for 12 hours. The production ratio of this reaction was 82.3%, and 17.7% of FSO 2 NHSO 2 NHSO 2 F was produced. The solvent of this reaction solution was distilled off, and ether and water were added to the residue, followed by extraction and washing with water.
- a 1 L autoclave was charged with 200 g of acetonitrile and 72 g (0.71 mol) of triethylamine, cooled to 5 ° C. with ice water, and 57.4 g (0.374 mol) of phosphoryl chloride was introduced. Subsequently, anhydrous ammonia (3.0 g, 0.176 mol) was introduced over 1 hour. The reactor was warmed to room temperature and stirred for 48 hours. The production ratio of this reaction was 98% for the production of bis (dichlorophosphoryl) imide, and 2% of the intermediate chlorophosphorylamide remained.
- this white solid was sulfamide (H 2 NSO 2 NH 2 ), and this white solid contained 3 wt% of fluorosulfonylamide (FSO 2 NH 2 ), and the bisfluorosulfonylimide ammonium salt was It contained only 0.3 wt%. (Yield 0.1%) Thus, it can be seen that when the organic base is not present, the target ammonium salt is hardly obtained.
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Abstract
Description
の製造方法であって、有機塩基存在下、ハロゲン化スルフリル(SO2X4X5、:X4、X5は同一、又は異なるハロゲン(フッ素、塩素、臭素、ヨウ素)を表し、前述のX1と同一、又は異なる。)もしくはハロゲン化ホスホリル(P(=O)X6X7X8:X6、X7、X8は同一、又は異なるハロゲン(フッ素、塩素、臭素、ヨウ素)を表し、前述のX2、X3と同一、又は異なる。)、及びアンモニアを反応させることにより、式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」を、高選択率かつ高収率で製造できる知見を得、本発明を完成した。
式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」の製造方法であって、有機塩基存在下、ハロゲン化スルフリルもしくはハロゲン化ホスホリル、及びアンモニアを反応させることを特徴とする、式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」の製造方法。
式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」の製造方法であって、有機塩基存在下、ハロゲン化スルフリル、及びアンモニアを反応させることを特徴とする、式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」の製造方法。
有機塩基、及びハロゲン化スルフリルもしくはハロゲン化ホスホリルを反応系内に共存させた後、続けてアンモニアを反応させることにより行うことを特徴とする、発明1又は2に記載の方法。
有機塩基が、式[2]で表される3級アミン
-C=N-C-
を有する化合物である、発明1乃至3の何れか1つに記載の方法。
有機塩基がトリメチルアミン、トリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリブチルアミン、又はピリジンである、発明1乃至4の何れか1つに記載の方法。
有機塩基の量が、アンモニア1モルに対して、1モル~50モルであることを特徴とする、発明1乃至5の何れか1つに記載の方法。
ハロゲン化スルフリルもしくはハロゲン化ホスホリルの使用量が、アンモニア1モルに対して、1モル~10モルであることを特徴とする、発明1乃至3の何れか1つに記載の方法。
有機塩基存在下、ハロゲン化スルフリルもしくはハロゲン化ホスホリル、及びアンモニアを反応させる際、反応温度が、-50℃~150℃であることを特徴とする、発明1乃至7の何れか1つに記載の方法。
発明1乃至8の何れか1つに記載の方法で得られた「イミド酸と有機塩基からなる塩又は錯体」に、アルカリ金属の水酸化物もしくは炭酸塩、又はアルカリ土類金属の水酸化物もしくは炭酸塩を反応させることを特徴とする、式[3]で表されるイミド酸金属塩
の製造方法。
FSO2NHSO2NHSO2F
が微量得られることもあるが、簡便な水洗操作により完全に除去することが可能である。
-C=N-C-
を有する化合物であるが、それぞれの化合物の具体的な例を、以下、明示する。
XSO2NHSO2NHSO2X
が微量、生成することがある。その際、簡便な操作(水洗など)により副生成物を除去することが可能である。例えば、本実施例に示すように、水を加えて洗浄する操作は、該目的物である「イミド酸と有機塩基からなる塩又は錯体」の化学純度を向上させるという点でも、好ましい態様の一つである。
以下、実施例により本発明を詳細に説明するが、本発明はこれらの実施例に限定されるものではない。ここで、組成分析値の「%」とは、特に記述のない場合、反応混合物を核磁気共鳴スペクトル(NMR)によって得られた組成の「モル%」を表す。
このように、有機溶媒を実施例3より多く加えることで、収率をより向上させることが可能である。
200mLオートクレーブにアセトニトリルを50g仕込み、氷水で5℃に冷却し、無水アンモニアを12.4g(729 mol)導入した。続いて、フッ化スルフリルを23.3g(228 mmol)導入した。反応器を室温まで昇温させ、48時間攪拌した。この反応液を濾過し、溶媒を留去して、白色固体を10.1 g得た。この白色固体の主成分はスルファミド(H2NSO2NH2)であることを確認し、この白色固体にフルオロスルホニルアミド(FSO2NH2)が3wt%含まれ、ビスフルオロスルホニルイミドアンモニウム塩は、0.3wt%しか含有していなかった。(収率0.1%)
このように、有機塩基を共存させない場合、目的物である該アンモニウム塩が殆ど得られないことがわかる。
200mLオートクレーブにアセトニトリルを50g仕込み、氷水で5℃に冷却し、塩化スルフリルを27.0g(200 mmol)導入した。続いて、無水アンモニアを12.0g(705 mmol)導入した。反応器を室温まで昇温させ、48時間攪拌した。この反応液を濾過し、溶媒を留去して、白色固体を9.8 g得た。この白色固体の主成分はスルファミド(H2NSO2NH2)であることを確認し、この白色固体に、ビス(クロロスルホニル)イミドアンモニウム塩は、含有していなかった。
このように、有機塩基を共存させない場合、目的物である該アンモニウム塩が得られないことがわかる。
Claims (9)
- 式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」
の製造方法において、有機塩基存在下、ハロゲン化スルフリル(SO2X4X5、:X4、X5は同一、又は異なるハロゲン(フッ素、塩素、臭素、ヨウ素)を表し、前述のX1と同一、又は異なる。)もしくはハロゲン化ホスホリル(P(=O)X6X7X8:X6、X7、X8は同一、又は異なるハロゲン(フッ素、塩素、臭素、ヨウ素)を表し、前述のX2、X3と同一、又は異なる。)と、アンモニアとを反応させることを特徴とする、式[1]で表される、「イミド酸と有機塩基からなる塩又は錯体」の製造方法。 - 有機塩基、及びハロゲン化スルフリルもしくはハロゲン化ホスホリルを反応系内に共存させた後、続けてアンモニアを反応させることにより行うことを特徴とする、請求項1又は2に記載の方法。
- 有機塩基がトリメチルアミン、トリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリブチルアミン、又はピリジンである、請求項1乃至4の何れか1項に記載の方法。
- 有機塩基の量が、アンモニア1モルに対して、1モル~50モルであることを特徴とする、請求項1乃至5の何れか1項に記載の方法。
- ハロゲン化スルフリルもしくはハロゲン化ホスホリルの使用量が、アンモニア1モルに対して、1モル~10モルであることを特徴とする、請求項1乃至3の何れか1項に記載の方法。
- 有機塩基存在下、ハロゲン化スルフリルもしくはハロゲン化ホスホリル、及びアンモニアを反応させる際、反応温度が、-50℃~150℃であることを特徴とする、請求項1乃至7の何れか1項に記載の方法。
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WO2012160280A2 (fr) | 2011-05-24 | 2012-11-29 | Arkema France | Procede de preparation de bis(fluorosulfonyl)imidure de lithium ou sodium |
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Also Published As
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CN102378755B (zh) | 2014-04-16 |
US8815199B2 (en) | 2014-08-26 |
JP5630048B2 (ja) | 2014-11-26 |
EP2415757A1 (en) | 2012-02-08 |
EP2415757A4 (en) | 2013-04-10 |
US20120020867A1 (en) | 2012-01-26 |
KR20110130505A (ko) | 2011-12-05 |
EP2415757B1 (en) | 2014-07-23 |
JP2010254554A (ja) | 2010-11-11 |
KR101317294B1 (ko) | 2013-10-14 |
CN102378755A (zh) | 2012-03-14 |
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