WO2009041694A1 - ＺｎＯ蒸着材とその製造方法、およびＺｎＯ膜 - Google Patents

ＺｎＯ蒸着材とその製造方法、およびＺｎＯ膜 Download PDF

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Publication number
WO2009041694A1
WO2009041694A1 PCT/JP2008/067685 JP2008067685W WO2009041694A1 WO 2009041694 A1 WO2009041694 A1 WO 2009041694A1 JP 2008067685 W JP2008067685 W JP 2008067685W WO 2009041694 A1 WO2009041694 A1 WO 2009041694A1
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WIPO (PCT)
Prior art keywords
zno
vapor deposition
additive elements
deposition material
producing
Prior art date
Application number
PCT/JP2008/067685
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English (en)
French (fr)
Inventor
Yoshitaka Mayuzumi
Original Assignee
Mitsubishi Materials Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008245303A external-priority patent/JP5418751B2/ja
Priority claimed from JP2008245299A external-priority patent/JP5418747B2/ja
Priority claimed from JP2008245306A external-priority patent/JP5516838B2/ja
Priority claimed from JP2008245300A external-priority patent/JP5418748B2/ja
Priority claimed from JP2008245301A external-priority patent/JP5418749B2/ja
Priority claimed from JP2008245304A external-priority patent/JP5499453B2/ja
Priority claimed from JP2008245305A external-priority patent/JP5418752B2/ja
Priority claimed from JP2008245302A external-priority patent/JP5418750B2/ja
Priority to US12/733,897 priority Critical patent/US8231812B2/en
Priority to KR1020127022931A priority patent/KR101342721B1/ko
Application filed by Mitsubishi Materials Corporation filed Critical Mitsubishi Materials Corporation
Priority to CN2008801088239A priority patent/CN101809186B/zh
Priority to EP08834432.0A priority patent/EP2194158B1/en
Publication of WO2009041694A1 publication Critical patent/WO2009041694A1/ja
Priority to US13/360,001 priority patent/US8409477B2/en

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Abstract

　透明導電膜等の成膜に用いられるＺｎＯ蒸着材であって、Ｃｅ、Ｌａ、Ｙ、Ｐｒ、Ｎｄ、Ｐｍ、Ｓｍから選択される一種又は二種以上の第一添加元素、および、Ａｌ、Ｇａ、Ｓｃ、Ｂから選択される一種又は二種以上の第二添加元素を含み、第一添加元素の含有量は第二添加元素の含有量より多く、第一添加元素の含有量が０.１～１４.９質量％、第二添加元素の含有量が０.１～１０質量％の範囲内であるＺｎＯ多孔質焼結体を主体とする。該焼結体は３～５０％の気孔率を有する。
PCT/JP2008/067685 2007-09-27 2008-09-29 ＺｎＯ蒸着材とその製造方法、およびＺｎＯ膜 WO2009041694A1 (ja)

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EP08834432.0A EP2194158B1 (en) 2007-09-27 2008-09-29 ZnO VAPOR DEPOSITION MATERIAL AND PROCESS FOR PRODUCING THE SAME
CN2008801088239A CN101809186B (zh) 2007-09-27 2008-09-29 ZnO蒸镀材料和其制造方法、和ZnO膜
US12/733,897 US8231812B2 (en) 2007-09-27 2008-09-29 ZnO vapor deposition material, process for producing the same, and ZnO film
KR1020127022931A KR101342721B1 (ko) 2007-09-27 2008-09-29 ＺｎＯ 증착재와 그 제조 방법, 및 ＺｎＯ 막
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JP2008245302A JP5418750B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材とその製造方法、およびそのＺｎＯ膜形成方法
JP2008245303A JP5418751B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材とその製造方法、およびそのＺｎＯ膜形成方法
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JP2008245305A JP5418752B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材とその製造方法、およびそのＺｎＯ膜形成方法
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JP2008-245300 2008-09-25
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JP2008245300A JP5418748B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材とその製造方法、およびそのＺｎＯ膜形成方法
JP2008245306A JP5516838B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材の製造方法
JP2008245299A JP5418747B2 (ja) 2007-09-27 2008-09-25 ＺｎＯ蒸着材とその製造方法、およびそのＺｎＯ膜形成方法
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KR20150005357A (ko) 2013-07-05 2015-01-14 삼성디스플레이 주식회사 컬러필터 기판 및 그 제조방법과 이를 포함하는 표시장치 및 그 제조 방법
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