WO2008063609A2 - Diimide-based semiconductor materials and methods of preparing and using the same - Google Patents
Diimide-based semiconductor materials and methods of preparing and using the same Download PDFInfo
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- WO2008063609A2 WO2008063609A2 PCT/US2007/024189 US2007024189W WO2008063609A2 WO 2008063609 A2 WO2008063609 A2 WO 2008063609A2 US 2007024189 W US2007024189 W US 2007024189W WO 2008063609 A2 WO2008063609 A2 WO 2008063609A2
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- 0 **(C([C@]1C2=CC=CC(C(*(*)C3=O)=O)=CC3=CC=C1)=O)C2=O Chemical compound **(C([C@]1C2=CC=CC(C(*(*)C3=O)=O)=CC3=CC=C1)=O)C2=O 0.000 description 8
- NOQFTPYFCQMFSL-UHFFFAOYSA-N Cc(cc(cc1)[IH]C2=CCC(C)=CC=C2)c1P Chemical compound Cc(cc(cc1)[IH]C2=CCC(C)=CC=C2)c1P NOQFTPYFCQMFSL-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
- C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
- C07D471/06—Peri-condensed systems
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
- C07D487/06—Peri-condensed systems
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- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
- C09B5/62—Cyclic imides or amidines of peri-dicarboxylic acids of the anthracene, benzanthrene, or perylene series
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/08—Naphthalimide dyes; Phthalimide dyes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the electronic structure of most organic semiconductors consists of delocalized ⁇ orbitals within a molecular/polymeric ⁇ framework that mainly constitutes sp hybridized carbon atoms and to some extent, heteroatoms such as sulfur, selenium, nitrogen, and oxygen.
- the primary mechanism for charge transport in organic solids is based on efficient molecular/polymer chain stacking which results in ⁇ - ⁇ orbital interaction, allowing the charge carriers injected at the electrical contacts to migrate from molecule to molecule (chain to chain).
- n-type organic materials are mainly p-type (where holes are the majority charge carriers) semiconductors due to their enhanced environmental stability.
- n-type organic materials are limited to a handful of small molecules and polymers.
- most of them suffer from serious drawbacks including poor stability in air and poor solubility in common organic solvents, which limit the type of manufacturing processes (e.g., printing deposition) that can be used with these n- type semiconducting compounds.
- the present teachings provide organic semiconductor compounds and materials that are based on N-functionalized diimides. It has been found that these compounds can afford useful electrical properties while offering a range of properties that can be suitable for solution-phase processing.
- the present teachings provide compounds having the formula:
- present teachings also provide various compositions, articles of manufacture, structures, and devices that include the compounds disclosed herein.
- Figure 1 is an ultraviolet-visible (UV-vis) absorption spectrum of a compound of the present teachings (PDIPhIl-CN 2 ) in chloroform.
- Figure 2 is a UV -vis absorption spectrum of a compound of the present teachings (PDIPhPh8-CN 2 ) in chloroform.
- Figure 3 is a UV-vis absorption spectrum of a compound of the present teachings (PDIlPh-CN 2 ) in chloroform.
- Figure 4 is a representative transfer plot of a compound of the present teachings (PDIPhPh-CN 2 ). The semiconductor material was deposited from solution.
- Figure 5 is a representative transfer plot of a compound of the present teachings (PDIPhPhS-CN 2 ). The semiconductor material was deposited from solution.
- Figure 6 is a representative transfer plot of a compound of the present teachings (PDIPhO-CN 2 ). The semiconductor material was deposited from solution.
- Figure 7 is a representative transfer plot of a compound of the present teachings (PDIPhPhCHr-CN 2 ). The semiconductor material was deposited from solution.
- Figure 8 is a representative transfer plot of a compound of the present teachings (PDIPhCUr-CN 2 ). The semiconductor material was deposited from solution.
- Figure 9 is a representative output plot of a compound of the present teachings (PDIPhCitr-CN 2 ). The semiconductor material was deposited from solution.
- Figure 10 is a representative output plot of a compound of the present teachings (PDIPhPh-CN 2 ). The semiconductor material was deposited from solution.
- Figure 11 is a representative output plot of a compound of the present teachings (PDIPhH-CN 2 ). The semiconductor material was deposited from solution.
- Figure 12 is a representative output plot of a compound of the present teachings (PDIPhPhCitr-CN ⁇ ). The semiconductor material was deposited from solution.
- Figure 13 is a representative output plot of a compound of the present teachings (PDIPhIZ-CN 2 ). The semiconductor material was deposited from the vapor phase.
- Figure 14 is the Wide Angle X-Ray Diffraction (WAXRD) ⁇ /2 ⁇ scan (and rocking curve of the 001 reflection) of a 50 nm-thick film of a compound of the present teachings (PDIlPh4-CN 2 ).
- WAXRD Wide Angle X-Ray Diffraction
- Figures 15A is a WAXRD ⁇ /2 ⁇ scan for a vapor-phase deposited film of a compound of the present teachings (PDIPhPh-CN 2 ).
- Figure 15B is a WAXRD ⁇ /2 ⁇ scan for a solution-phase deposited film of a compound of the present teachings (PDIPhPh-CN 2 ).
- Figure 16A is a representative transfer plot measured in air for a spin- coated film from chloroform of a compound of the present teachings (PDI8-CN 2 ).
- Figure 16B is a representative transfer plot measured in air for a spin- coated film from chloroform of a compound of the present teachings (PDI2EH-
- the present teachings relate to compounds, for example, organic semiconducting compounds, methods for preparing the same, as well as to compositions, materials, articles of manufacture, structures, and devices that include such compounds.
- the present teachings provide vapor-deposited and solution-processable, e.g., spin-coatable and printable, organic semiconductor materials (including compounds and compositions) that exhibit useful electrical properties that can be used to fabricate various organic electronic articles, structures and devices.
- organic semiconductor materials disclosed herein can be useful as n-type semiconductor materials (where the charge carriers are substantially electrons) and can be used, among other applications, to build complementary circuits with a p- type semiconductor (where the charge carriers are substantially holes) that is either inorganic or organic.
- the present teachings provide various diimides where the nitrogen atoms are substituted with functional groups that can enhance the solubility of the compound as a whole. These compounds typically have at least some solubility in one or more common solvents and can be stable in ambient conditions. Without wishing to be bound to any particular theory, it is believed that suitable functionalization at the nitrogen atom also can enhance microstructural ordering within the films which promotes charge mobility. In certain embodiments, functionalization of the imide nitrogens of compounds of the present teachings with a 2-alkyl substituted alkyl group results in compositions that when spin-coated afford an unexpected increase in the electron mobility and current I on :I Off ratio of the resulting devices.. The present teachings also provide compositions, articles of manufacture, structures, and devices that include one or more of these compounds.
- compositions are described as having, including, or comprising specific components, or where processes are described as having, including, or comprising specific process steps, it is contemplated that compositions of the present teachings also consist essentially of, or consist of, the recited components, and that the processes of the present teachings also consist essentially of, or consist of, the recited processing steps.
- solution-processable refers to compounds, materials, or compositions that can be used in various solution-phase processes including spin- coating, printing (e.g., inkjet printing, screen printing, gravure, flexography), spray coating, electrospray coating, drop casting, dip coating, and blade coating.
- fused ring moiety refers to a polycyclic ring system having at least two rings where at least one of the rings is aromatic and such aromatic ring (carbocyclic or heterocyclic) has a bond in common with at least one other ring that can be aromatic or non-aromatic, and carbocyclic or heterocyclic.
- aromatic ring carbocyclic or heterocyclic
- These polycyclic ring systems can be highly ⁇ -conjugated and can include, without limitation, rylenes having the formula:
- b can be an integer in the range of 0-4.
- imide refers to a -C(O)-NH-C(O)- group, where the nitrogen atom can be substituted as disclosed herein.
- halo or halogen refers to fluoro, chloro, bromo, and iodo.
- alkyl refers to a straight-chain or branched saturated hydrocarbon group.
- alkyl groups include methyl (Me), ethyl (Et), propyl (e.g., n-propyl and isopropyl), butyl (e.g., n-butyl, isobutyl, sec-butyl, tert- butyl), pentyl groups (e.g., n-pentyl, isopentyl, neopentyl), and the like.
- an alkyl group can have 1 to 20 carbon atoms, i.e., a Ci -20 alkyl group.
- an alkyl group can have 1 to 6 carbon atoms, and can be referred to as a "lower alkyl group.”
- lower alkyl groups include methyl, ethyl, propyl (e.g., n-propyl and isopropyl), and butyl groups (e.g., n-butyl, isobutyl, sec-butyl, tert-butyl).
- alkyl groups can be substituted with up to four independently selected R b groups, where R b is as disclosed herein.
- 2-alkyl substituted alkyl refers to an alkyl group substituted at its 2-position with an alkyl group.
- a 2-alkyl substituted alkyl group is present on an imide nitrogen, for example, as R 1 in formulae depicted herein, the second carbon atom removed from the imide nitrogen is substituted with an alkyl group.
- a 2-substituted alkyl group can have 3 to 20 carbon atoms, i.e., be a C 3-20 alkyl group.
- the 2-substituted alkyl group can have 3 to 10 carbon atoms (i.e., a C 3 - 10 alkyl group) or 3 to 8 carbon atoms (i.e., a C 3-8 alkyl group).
- a substituent alkyl group can have 1 to 20 carbon atoms, i.e., be a Ci -20 alkyl group.
- the substituent alkyl group can have 1 to 10 carbon atoms (i.e., a Ci -I0 alkyl group), 1 to 8 carbon atoms (i.e., a Ci -8 alkyl group), or 1 to 6 carbon atoms (i.e., a Ci -6 alkyl group), and in the latter example can be referred to as a "lower alkyl group.”
- a Ci -I0 alkyl group 1 to 8 carbon atoms
- Ci -8 alkyl group i.e., a Ci -8 alkyl group
- 1 to 6 carbon atoms i.e., a Ci -6 alkyl group
- each of the specific examples of alkyl groups are contemplated as being individually recited in the various specific combinations of the 2-substituted alkyl group and the substituent alkyl group.
- the 2-substituted alkyl group can be n-propyl, n-butyl, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, or a decyl group.
- the substituent alkyl group in combination with each of these 2- substituted alkyl groups can be methyl, ethyl, propyl (e.g., n-propyl and isopropyl), butyl groups (e.g., n-butyl, isobutyl, sec-butyl, tert-butyl), pentyl groups (e.g., n- pentyl, isopentyl, neopentyl), hexyl groups, heptyl groups, octyl groups, nonyl groups, decyl groups, and the like.
- propyl e.g., n-propyl and isopropyl
- butyl groups e.g., n-butyl, isobutyl, sec-butyl, tert-butyl
- pentyl groups e.g., n- pentyl, isopentyl, neopenty
- the 2-alkyl substituted alkyl group can be 2-methylhexyl, 2-ethylhexyl, 2-propylhexyl, 2- butylhexyl, 2-pentylhexyl, or 2-hexylhexyl. It should be understood that 2-alkyl substituted alkyl groups can be di- or tri-substituted provided that substitution occurs at the third carbon atom or higher.
- 3-alkyl substituted alkyl refers to an alkyl group substituted at its 3-position with an alkyl group.
- a 3-alkyl substituted alkyl group is present on an imide nitrogen, for example, as R 1 in formulae depicted herein, the third carbon atom removed from the imide nitrogen is substituted with an alkyl group.
- the various embodiments of 3-alkyl substituted alkyl groups are similar to those described above for the 2-alkyl substituted alkyl groups but for the different carbon atom where the substitution occurs. It should be understood that 3-alkyl substituted alkyl groups can be di- or tri-substituted provided that substitution occurs at the fourth carbon atom or higher.
- alkoxy refers to -O-alkyl group.
- An alkoxy group can have 1 to 20 carbon atoms, for example, 1 to 10 carbon atoms (i.e., a Ci -I0 alkoxy group).
- alkoxy groups include, but are not limited to, methoxy, ethoxy, propoxy (e.g., n-propoxy and isopropoxy), t-butoxy groups, and the like.
- alkylthio refers to an -S-alkyl group.
- alkylthio groups include, but are not limited to, methylthio, ethylthio, propylthio (e.g., n-propylthio and isopropylthio), t-butylthio groups, and the like.
- haloalkyl refers to an alkyl group having one or more halogen substituents.
- haloalkyl groups include, but are not limited to, CF 3 , C 2 F 5 , CHF 2 , CH 2 F, CCl 3 , CHCl 2 , CH 2 Cl, C 2 Cl 5 , and the like.
- Perhaloalkyl groups i.e., alkyl groups wherein all of the hydrogen atoms are replaced with halogen atoms (e.g.
- haloalkyl a Ci -20 haloalkyl group can have the formula -C n X 2n+ i or -C n H2n+i-tXt, wherein X is F, Cl, Br, or I, n is an integer in the range of 1 to 20, and t is an integer in the range of 0 to 41 , provided that t is less than or equal to 2n+l .
- arylalkyl refers to an -alkyl-aryl group, wherein the arylalkyl group is covalently linked to the defined chemical structure via the alkyl group.
- An arylalkyl group is within the definition of an -L-C 6-I4 aryl group, -L'- C 6-J4 aryl group, or a -Y-C 6- I 4 aryl group, where L, L' and Y are independently divalent Ci -20 alkyl groups.
- An example of an arylalkyl group is a benzyl group (- CH 2 -C 6 H 5 ).
- the aryl group of the arylalkyl group can be optionally substituted as disclosed herein.
- -L-Ar'-R 2 and -L'-Ar 2 -R 3 can be independently a -Ci -20 alkyl-C 6- i 4 aryl group, where R 2 and R 3 are H and the C 6-I4 aryl group can be optionally substituted with 1-4 R d groups, and R d is as defined herein.
- Such optionally substituted arylalkyl groups can be represented by the formula:
- R d is as defined herein.
- alkenyl refers to a straight-chain or branched alkyl group having one or more carbon-carbon double bonds.
- alkenyl groups include, but are not limited to, ethenyl, propenyl, butenyl, pentenyl, hexenyl, butadienyl, pentadienyl, hexadienyl groups, and the like.
- the one or more carbon- carbon double bonds can be internal (such as in 2-butene) or terminal (such as in 1 - butene).
- an alkenyl group can have 2 to 20 carbon atoms, i.e., a C 2-2O alkenyl group.
- alkenyl groups can be substituted with up to four independently selected R groups, where R is as disclosed herein.
- alkynyl refers to a straight-chain or branched alkyl group having one or more triple carbon-carbon bonds.
- alkynyl groups include, but are not limited to, ethynyl, propynyl, butynyl, pentynyl, and the like.
- the one or more triple carbon-carbon bonds can be internal (such as in 2-butyne) or terminal (such as in 1-butyne).
- an alkynyl group can have 2 to 20 carbon atoms, i.e., a C 2 - 20 alkynyl group.
- alkynyl groups can be substituted with up to four independently selected R b groups, where R b is as disclosed herein.
- cycloalkyl refers to a non-aromatic carbocyclic group including cyclized alkyl, alkenyl, and alkynyl groups.
- a cycloalkyl group can be monocyclic (e.g., cyclohexyl) or polycyclic (e.g., containing fused, bridged, and/or spiro ring systems), wherein the carbon atoms are located inside or outside of the ring system. Any suitable ring position of the cycloalkyl group can be covalently linked to the defined chemical structure.
- cycloalkyl groups include, but are not limited to, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclopentenyl, cyclohexenyl, cyclohexadienyl, cycloheptatrienyl, norbornyl, norpinyl, norcaryl, adamantyl, and spiro[4.5]decanyl groups, as well as their homologs, isomers, and the like.
- a cycloalkyl group can have 3 to 14 carbon atoms, including 3 to 10 carbon atoms (i.e., a C 3-I0 cycloalkyl group).
- cycloalkyl groups can be substituted with up to four independently selected R groups, where R b is as disclosed herein.
- R b is as disclosed herein.
- heteroatom refers to an atom of any element other than carbon or hydrogen and includes, for example, nitrogen, oxygen, silicon, sulfur, phosphorus, and selenium.
- cycloheteroalkyl refers to a non-aromatic cycloalkyl group that contains at least one ring heteroatom selected from O, N, S and Se, and optionally contains one or more double or triple bonds.
- a cycloheteroalkyl group can have 3 to 20 ring atoms, including 3 to 14 ring atoms (i.e., a 3-14 membered cycloheteroalkyl group).
- N or S atoms in a cycloheteroalkyl ring may be oxidized (e.g., morpholine N-oxide, thiomorpholine S- x oxide, thiomorpholine S,S-dioxide).
- nitrogen atoms of cycloheteroalkyl groups can bear a substituent, for example, a hydrogen atom, an alkyl group, or other substituents as described herein.
- Cycloheteroalkyl groups can also contain one or more oxo groups, such as oxopiperidyl, oxooxazolidyl, dioxo- (lH,3H)-pyrimidyl, oxo-2(lH)-pyridyl, and the like.
- oxo groups such as oxopiperidyl, oxooxazolidyl, dioxo- (lH,3H)-pyrimidyl, oxo-2(lH)-pyridyl, and the like.
- cycloheteroalkyl groups include, among others, morpholinyl, thiomorpholinyl, pyranyl, imidazolidinyl, imidazolinyl, oxazolidinyl, pyrazolidinyl, pyrazolinyl, pyrrolidinyl, pyrrolinyl, tetrahydrofuranyl, tetrahydrothiophenyl, piperidinyl, piperazinyl, and the like.
- cycloheteroalkyl groups can be substituted with up to four independently selected R b groups, where R b is as disclosed herein.
- aryl refers to an aromatic monocyclic hydrocarbon ring system or a polycyclic ring system in which two or more aromatic hydrocarbon rings are fused (i.e., having a bond in common with) together or at least one aromatic monocyclic hydrocarbon ring is fused to one or more cycloalkyl and/or cycloheteroalkyl rings.
- An aryl group can have from 6 to 14 carbon atoms in its ring system, which can include multiple fused rings.
- a polycyclic aryl group can have from 7 to 14 carbon atoms. Any suitable ring position of the aryl group can be covalently linked to the defined chemical structure.
- aryl groups having only aromatic carbocyclic ring(s) include, but are not limited to, phenyl, 1-naphthyl (bicyclic), 2-naphthyl (bicyclic), anthracenyl (tricyclic), phenanthrenyl (tricyclic), and like groups.
- polycyclic ring systems in which at least one aromatic carbocyclic ring is fused to one or more cycloalkyl and/or cycloheteroalkyl rings include, among others, benzo derivatives of cyclopentane (i.e., an indanyl group, which is a 5,6-bicyclic cycloalkyl/aromatic ring system), cyclohexane (i.e., a tetrahydronaphthyl group, which is a 6,6-bicyclic cycloalkyl/aromatic ring system), imidazoline (i.e., a benzimidazolinyl group, which is a 5,6-bicyclic cycloheteroalkyl/aromatic ring system), and pyran (i.e., a chromenyl group, which is a 6,6-bicyclic cycloheteroalkyl/aromatic ring system).
- aryl groups include, but are not limited to, benzodioxanyl, benzodioxolyl, chromanyl, indolinyl groups, and the like.
- aryl groups can be substituted with up to four groups independently selected from R a or R d groups as disclosed herein.
- an aryl group is substituted with another aryl group and can be referred to as a biaryl group.
- Each of the aryl groups in the biaryl group can be substituted with up to four R groups as disclosed herein.
- heteroaryl refers to an aromatic monocyclic ring system containing at least 1 ring heteroatom selected from oxygen (O), nitrogen (N), sulfur (S), and selenium (Se), or a polycyclic ring system where at least one of the rings present in the ring system is aromatic and contains at least 1 ring heteroatom.
- Polycyclic heteroaryl groups include two or more heteroaryl rings fused together and monocyclic heteroaryl rings fused to one or more aromatic carbocyclic rings, non- aromatic carbocyclic rings, and/or non-aromatic cycloheteroalkyl rings.
- a heteroaryl group as a whole, can have, for example, from 5 to 14 ring atoms and contain 1-5 ring heteroatoms.
- the heteroaryl group can be attached to the defined chemical structure at any heteroatom or carbon atom that results in a stable structure.
- heteroaryl rings do not contain O-O, S-S, or S-O bonds.
- one or more N or S atoms in a heteroaryl group can be oxidized (e.g., pyridine N-oxide, thiophene S-oxide, thiophene S,S-dioxide).
- heteroaryl groups include, for example, the 5-membered monocyclic and 5-6 bicyclic ring systems shown below:
- T is O, S, NH, N-alkyl, N-aryl, or N-(arylalkyl) (e.g., N-benzyl).
- heteroaryl groups include pyrrolyl, furyl, thienyl, pyridyl, pyrimidyl, pyridazinyl, pyrazinyl, triazolyl, tetrazolyl, pyrazolyl, imidazolyl, isothiazolyl, thiazolyl, thiadiazolyl, isoxazolyl, oxazolyl, oxadiazolyl, indolyl, isoindolyl, benzofuryl, benzothienyl, quinolyl, 2-methylquinolyl, isoquinolyl, quinoxalyl, quinazolyl, benzotriazolyl, benzimidazolyl, benzothiazolyl, benzisothiazolyl, benzisoxazo
- heteroaryl groups include, but are not limited to, 4,5,6, 7-tetrahydroindolyl, tetrahydroquinolyl, benzothienopyridyl, benzofuropyridyl, and the like.
- heteroaryl groups can be substituted with up to four R a or R d groups as disclosed herein.
- Compounds of the present teachings can include a "divalent group” defined herein as a linking group capable of forming a covalent bond with two other moieties.
- compounds of the present teachings can include a divalent Ci -20 alkyl group, such as, for example, a methylene group.
- substituents of compounds are disclosed in groups or in ranges. It is specifically intended that the description include each and every individual subcombination of the members of such groups and ranges.
- Cj -6 alkyl is specifically intended to individually disclose C 1 , C 2 , C 3 , C 4 , C 5 , C 6 , C 1 -C 6 , C-C 5 , C 1 -C 4 , C-C 3 , C 1 -C 2 , C 2 - C 6 , C 2 -C 5 , C 2 -C 4 , C 2 -C 3 , C 3 -C 6 , C 3 -C 5 , C 3 -C 4 , C 4 -C 6 , C 4 -C 5 , and C 5 -C 6 alkyl.
- an integer in the range of 0 to 40 is specifically intended to individually disclose 0, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, and 40, and an integer in the range of 1 to 20 is specifically intended to individually disclose 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 and 20.
- Compounds described herein can contain an asymmetric atom (also referred as a chiral center), and some of the compounds can contain one or more asymmetric atoms or centers, which can thus give rise to optical isomers
- optical isomers enantiomers
- diastereomers geometric isomers
- optical isomers can be obtained in enantiomerically enriched or pure form by standard procedures known to those skilled in the art, which include, for example, chiral separation, diastereomeric salt formation, kinetic resolution, and asymmetric synthesis.
- the present teachings also encompass cis and trans isomers of compounds containing alkenyl moieties (e.g., alkenes and imines).
- the compounds of the present teachings encompass all possible regioisomers in pure form and mixtures thereof. It may be possible to separate such isomers, for example, using standard separation procedures known to those skilled in the art, for example, column chromatography, thin-layer chromatography, simulated moving-bed chromatography, and high-performance liquid chromatography. However, mixtures of regioisomers can be used similar to the uses of a specific compound of the present teachings as described herein and/or known by a skilled artisan. That is, it specifically is contemplated that the rylene compounds of the present teachings and their uses include each of the regioisomers of the rylene compounds in their pure form and mixtures thereof.
- compounds, compositions, and devices of the present teachings can include any rylene compound in its pure form or mixtures of regio- or other isomers thereof, where the rylene compounds can be substituted with 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 1 1, or 12 substituents.
- the rylene compounds can include compounds having the moiety:
- Y at each occurrence, can be H or R a , where R a is as defined herein.
- two of the Y groups can be H and the other two Y groups independently can be R a . Accordingly, in the embodiments where two of Y groups are H and the other two are R a , compounds of the present teachings can have regioisomers having the formulae:
- compounds of the present teachings can include compounds having the formula: and mixtures thereof, where Y independently can be R a and R a is as defined herein, for example, a halogen such as Br or a CN group.
- a "p-type semiconducting material” or a “p-type semiconductor” refers to a semiconducting material having holes as the majority current carriers.
- a p-type semiconducting material when deposited on a substrate, it can provide a hole mobility in excess of about 10 "5 cm /Vs.
- a p-type semiconductor can also exhibit a current on/off ratio of greater than about 10.
- an "n-type semiconducting material” or an “n-type semiconductor” refers to a semiconducting material having electrons as the majority current carriers.
- an n-type semiconducting material when deposited on a substrate, it can provide an electron mobility in excess of about 10 "5 cm /Vs.
- an n-type semiconductor can also exhibit a current on/off ratio of greater than about 10.
- One aspect of the present teachings provides a compound having the formula:
- Q is a fused ring moiety optionally substituted with 1-4 R a groups
- R a at each occurrence, is independently a) a halogen, b) -CN, c) -NO 2 , d) oxo, e) -OH, f) a C 1.20 alkyl group, g) a C 2-20 alkenyl group, h) a C 2-20 alkynyl group, i) a Ci -20 alkoxy group, j) a Ci -2O alkylthio group, k) a Ci -20 haloalkyl group, 1) -Y-a C 3 .
- io cycloalkyl group m) -Y-a C 6-I4 aryl group, n) a -Y-3-12 membered cycloheteroalkyl group, or o) a -Y-5-14 membered heteroaryl group, wherein each of the Ci -20 alkyl group, the C 2-20 alkenyl group, the C 2-20 alkynyl group, the C 3-I0 cycloalkyl group, the C 6-H aryl group, the 3-12 membered cycloheteroalkyl group, and the 5-14 membered heteroaryl group is optionally substituted with 1-4 R groups;
- R b at each occurrence, is independently a) a halogen, b) -CN, c) -NO 2 , d) oxo, e) -OH, f) -NH 2 , g) -NH(C -20 alkyl), h) -N(C -20 alkyl) 2 , i) -N(C 1-20 alkyl)-Y-C 6- i 4 aryl, j) -N(-Y-C 6 -i4 aryl) 2 , k) -S(O) 1n H 9 1) -S(O) 111 -C 1-20 alkyl, m) -S(O) 2 OH, n) -S(O) 111 -OC 1-20 alkyl, o) -S(O) 01 -O-Y-C 6-14 aryl, p) -CHO, q) -C(O)-C,-
- SiH 3 ao) -SiH(C 1-20 alkyl) 2 , ap) -SiH 2 (C -20 alkyl), ar) -Si(C -20 alkyl) 3 , as) a C 1-20 alkyl group, at) a C 2-20 alkenyl group, au) a C 2-20 alkynyl group, av) a C.
- Ci -6 haloalkyl group or a covalent bond
- m is 0, 1, or 2;
- R 1 at each occurrence, is independently a branched C 3-20 alkyl group, a branched C 3 . 20 alkenyl group, a branched C 3-20 haloalkyl group, -L-Ar'-R 2 , or -L-Ar'-Ar'-R 2 ;
- L at each occurrence, is -Y-O-Y-, -Y-S-Y-, -Y-S(O)-Y-, -Y-C(O)-Y-, -Y-O-C(O)-Y-, -Y-NR C C(O)-Y- -Y-C(O)NR C -Y- -Y-NR C -Y- -Y- [SiR c 2 ]-Y-, a divalent Ci -20 alkyl group, a divalent Ci -20 haloalkyl group, or a covalent bond;
- R c at each occurrence, is H, a Ci -6 alkyl group, or a -Y-C 6 - I4 aryl group;
- Ar 1 at each occurrence, is independently a C 6-H aryl group or a 5-14 membered heteroaryl group, each optionally substituted with 1-4 R d groups; wherein: R d , at each occurrence, is independently selected from a halogen, -CN, a Ci -6 alkyl group, a Ci -6 alkoxy group, and a Ci -6 haloalkyl group; and R 2 , at each occurrence, is H, a halogen, a Ci -20 alkyl group, a C 2-20 alkenyl group, a Ci- 20 haloalkyl group, a Ci -20 alkoxy group, -L '-Ar -R , or -L'- Ar 2 -Ar 2 -R 3 ; wherein:
- L' is -Y-O 7 Y-, -Y-S-Y-, -Y-S(O)-Y-, -Y-C(O)-Y-, -Y-O-C(O)-Y-, -Y-NR C C(O)-Y- -Y-C(O)NR C -Y- -Y-NR C -Y- -Y ⁇ [SiR c 2 ]-Y- a divalent Ci -20 alkyl group, a divalent Ci -20 haloalkyl group, or a covalent bond;
- Ar 2 at each occurrence, is independently a C 6-I4 aryl group or a 5-14 membered heteroaryl group, each optionally substituted with 1-4 R d groups; and
- R at each occurrence, is H, a halogen, a Ci -20 alkyl group, a C 2-20 alkenyl group, a Ci -20 haloalkyl group, or a Ci -20 alkoxy group.
- Q can be:
- a, b, c, d, e, f, g and h are independently CH, CR a , SiH, SiR a , N or P; and R a is as defined herein.
- a, b, c, d, e, f, g and h can be independently CH, C(Br), or C(CN).
- a compound of the present teachings can have the formula:
- each R 1 independently can be a 3 -alkyl substituted alkyl group or a 3 -alkyl substituted alkenyl group such as the 3,7-dialkyl substituted alkyl group and the 3,7-dialkyl substituted alkenyl group, respectively, depicted below:
- each R 1 independently can be a 2-alkyl substituted alkyl group.
- each R 1 independently can be a 2-Ci -20 alkyl group(C 3 . 20 alkyl group), a 2-Ci -20 alkyl group(C 3- io alkyl group), a 2-Ci -20 alkyl group(C 3-8 alkyl group), a 2-Ci -I0 alkyl group(C 3-20 alkyl group), a 2-C M o alkyl group(C 3 .i 0 alkyl group), a 2-C M o alkyl group(C 3-8 alkyl group), a 2-Ci -8 alkyl group(C 3 .
- alkyl group 20 alkyl group), a 2-Ci -8 alkyl group(C 3- io alkyl group), a 2-Ci -8 alkyl group(C 3-8 alkyl group), a 2-Ci -6 alkyl group(C 3-2 o alkyl group), a 2-Ci -6 alkyl group(C 3- i 0 alkyl group), or a 2-Ci -6 alkyl group(C 3-8 alkyl group.
- each R independently can be 2- methylpropyl, 2-ethylpropyl, 2-propylpropyl, 2-butylpropyl, 2-pentylpropyl, 2- hexylpropyl, 2-methylbutyl, 2-ethylbutyl, 2-propylbutyl, 2-butylbutyl, 2-pentylbutyl, 2-hexylbutyl, 2-methylpentyl, 2-ethylpentyl, 2-propylpentyl, 2-butylpentyl, 2- pentylpentyl, 2-hexylpentyl, 2-methylhexyl, 2-ethylhexyl, 2-propylhexyl, 2- butylhexyl, 2-pentylhexyl, 2-hexylhexyl, 2-methylheptyl, 2-ethylheptyl, 2- propylheptyl, 2-butylheptyl,
- the intermolecular core-core stacking of the individual rylene imide compounds is important for efficient charge transport. It is further believed that by functionalizing the imide groups with relatively rigid aromatic units (e.g., Ar 1 , Ar ) connected to the core and/or to each other by relatively flexible linkers (e.g., L and L'), the solubility as well as the microstructural ordering of these rylene imide compounds can be enhanced. Without wishing to be bound to any particular theory, enhanced microstructural order is believed to promote charge mobility.
- relatively rigid aromatic units e.g., Ar 1 , Ar
- relatively flexible linkers e.g., L and L'
- each R can be -L-Ar -R or -L- Ar'-Ar'-R 2 ; where L, Ar 1 and R 2 are as defined herein.
- each R 1 can be:
- i, j, k, 1, o, r, s and u independently can be CH, CR d , SiH, SiR d , N or P
- w can be CH, CR 2 , SiH, SiR 2 , N or P
- L, R 2 and R d are as defined herein.
- i, j, k, 1, o, r, s and u independently can be CH, CF, or N
- w can be CR 2 .
- each R 1 can be:
- L and R 2 are as defined herein.
- L can be a divalent Ci -I0 alkyl group, a divalent Ci -I0 haloalkyl group, or a covalent bond.
- R 2 can be H, F, a Ci -20 alkyl group, a C 2-20 alkenyl group, a Ci -20 haloalkyl group, or a Ci -20 alkoxy group.
- R 2 can be a straight chain Ci -20 alkyl group, a branched C 3-20 alkyl group, a branched C 3-20 alkenyl group, a Ci -20 fluoroalkyl group, or a Ci -20 alkoxy group.
- each R 2 can be an n-butyl group, a sec-butyl group, a hexyl group, an octyl group, a dodecanyl group, a tridecanyl group, a decenyl group, an -O- dodecanyl group, or an -O-tridecanyl group.
- each R 2 can be:
- each R 2 can be -L'-Ar 2 -R 3 or -L'-Ar 2 -Ar 2 -R 3 ; where L', Ar 2 and R 3 are as defined herein.
- each R 1 can be:
- i', j', k', I 1 , o 1 , r', s', and u 1 independently can be CH, CR d , SiH, SiR d , N or P; W can be CH, CR 3 , SiH, SiR 3 , N or P, and i, j, k, 1, o, r, s, u, w, L, L 1 , R 3 and R d are as defined herein.
- i, j, k, 1, o, r, s, u, i', j', k', o', r', s', and u' independently can be CH, CF or N; and w' can be CR 3 .
- each R 1 can be: where L, L', and R 3 are as defined herein.
- L can be a divalent Ci -I0 alkyl group, a divalent Ci -I0 haloalkyl group, or a covalent bond; and L' can be - C(O)-, -O-, -S-, or -S(O)-, a divalent Ci -I0 alkyl group, a divalent Ci -I0 haloalkyl group, or a covalent bond.
- R can be H, F, a Ci -20 alkyl group, a C 2-20 alkenyl group, a Ci -20 haloalkyl group, or a Ci -20 alkoxy group.
- R 3 can be a straight chain Ci -20 alkyl group, a branched C 3-20 alkyl group, a branched C 3-20 alkenyl group, a Ci -20 fluoroalkyl group, or a C] -20 alkoxy group.
- each R 3 can be an n-butyl group, a sec-butyl group, a hexyl group, an octyl group, a dodecanyl group, a tridecanyl group, a decenyl group, an -O- dodecanyl group, or an -O-tridecanyl group.
- each R can be:
- each R 1 can be an aryl group, a biaryl group, an arylalkyl group, or a biarylalkyl group, where each of the aryl groups can be optionally substituted with 1-4 groups independently selected from R d and R 2 group.
- each R 1 can have the formula below:
- R 2 and R d are as defined herein.
- each R 1 can be a benzyl group, a biphenyl group/or a fluoro-substituted biphenyl group as shown below:
- the benzyl group, the biphenyl group, and the fluoro-substituted biphenyl group can be further substituted with an -L '-aryl group or an -L '-biaryl group, where each of the aryl groups can be optionally substituted with 1-4 R d groups and an R 3 group.
- each R 1 can be selected from:
- R 1 can be:
- R can be F
- p can be 0, 1 or 2
- each q independently can be 0 or 4
- L' can be -CH 2 -, -CH 2 CH 2 -, -C(O)-, -O-, -S-, or -S(O)-
- R 3 can be H, F, or a methyl group.
- each imide group can be different, in most embodiments, the two imide groups are substituted with R 1 groups that are the same.
- Compounds of the present teachings include, but are not limited to, the compounds presented in Tables 1 and 2 below.
- Z can be O, S, S(O), C(O) or CR e R f ; and R e and R f are independently a) H, b) a halogen, c) -(CH 2 CH 2 O) x H, d) -(CH 2 CH 2 O) x -CH 3 , e) a C -20 alkoxy group, f) a Ci -20 alkyl group, g) a C 2-20 alkenyl group, h) a C 2-20 alkynyl group, i) a -Y-C 3-I0 cycloalkyl group, j) a -Y-C 6-I4 aryl group, k) a -Y-3-12 membered cycloheteroalkyl group, or 1) a - Y-5-14 membered heteroaryl group, where each of the Ci -20 alkyl group, the C 2-20 alkenyl group, the C 2-20 alkynyl group,
- compounds of the present teachings can offer processing advantages when used to fabricate electrical devices, optical devices, and optoelectronic devices such as thin film transistors, field-effect devices, organic light emitting diodes (OLEDs), organic photovoltaics, photodetectors, capacitors, and sensors.
- a compound can be considered soluble in a solvent when at least 1 mg of the compound is soluble in 1 mL of the solvent.
- Examples of common organic solvents include petroleum ethers; acetonitrile; aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene; linear and cyclic ketones, such as acetone, methyl ethyl ketone, and cyclopentanone; ethers, such as tetrahydrofuran, dioxane, bis(2-methoxyethyl) ether, diethyl ether, di-isopropyl ether, and t-butyl methyl ether; alcohols, such as methanol, ethanol, butanol, and isopropyl alcohol; aliphatic hydrocarbons, such as hexanes; acetates, such as methyl acetate, ethyl acetate, methyl formate, ethyl formate, isopropyl acetate, and butyl acetate; halogenated aliphatic and aromatic hydrocarbons, such as dich
- compositions that comprise one or more compounds disclosed herein dissolved or dispersed in a liquid medium, for example, an organic solvent, an inorganic solvent, or combinations thereof (e.g., a mixture of organic solvents, inorganic solvents, or organic and inorganic solvents).
- a liquid medium for example, an organic solvent, an inorganic solvent, or combinations thereof (e.g., a mixture of organic solvents, inorganic solvents, or organic and inorganic solvents).
- such compositions can include one or more compounds disclosed herein, for example, one or more different compounds of the present teachings can be dissolved in an organic solvent to prepare a composition for deposition.
- the composition can include two or more regioisomers, for example, compounds having the formulae:
- each Y independently can be CN or a halogen such as Br.
- the devices described herein also can comprise more or more compounds of the present teachings, for example, two or more regioisomers as described herein.
- composition can include two or more regioisomers having the formulae:
- each R 1 independently is a 2-alkyl substituted alkyl group as discussed and defined above.
- each R 1 independently can be 2-methylpentyl, 2-ethylpentyl, 2-propylpentyl, 2- butylpentyl, 2-pentylpentyl, 2-hexylpentyl, 2-methylhexyl, 2-ethylhexyl, 2- propylhexyl, 2-butylhexyl, 2-pentylhexyl, 2-hexylhexyl, 2-methylheptyl, 2- ethylheptyl, 2-propylheptyl, 2-butylheptyl, 2-pentylheptyl, or 2-hexylheptyl.
- the present teachings further provide methods of preparing a semiconductor such as a thin film semiconductor or a semiconductor material.
- the methods can include preparing a composition that includes one or more compounds (e.g., a mixture of regioisomers) disclosed herein in a liquid medium such as an organic solvent, an inorganic solvent or a mixture of solvents, and depositing the composition on a substrate to provide a semiconductor that includes one or more compounds disclosed herein.
- a liquid medium such as an organic solvent, an inorganic solvent or a mixture of solvents
- Various articles of manufacture including electronic devices, optical devices, and optoelectronic devices such as field effect transistors (e.g., thin film transistors), photovoltaics, organic light emitting diodes (OLEDs), complementary metal oxide semiconductors (CMOSs), complementary inverters, D flip-flops, rectifiers, and ring oscillators, that make use of the compounds disclosed herein also are within the scope of the present teachings as are methods of making the same.
- field effect transistors e.g., thin film transistors
- OLEDs organic light emitting diodes
- CMOSs complementary metal oxide semiconductors
- D flip-flops D flip-flops
- rectifiers and ring oscillators
- the present teachings provide articles of manufacture such as the various devices described herein that include a composite, which has one or more compounds of the present teachings deposited on a substrate.
- the article of manufacture can include a dielectric component.
- the substrate can be selected from materials including doped silicon, an indium tin oxide (ITO), ITO-coated glass, ITO-coated polyimide or other plasties, aluminum or other metals alone or coated on a polymer or other substrate, a doped polythiophene, and the like.
- the dielectric component can be prepared from inorganic dielectric materials such as various oxides (e.g., SiO 2 , Al 2 O 3 , HfO 2 ), organic dielectric materials such as various polymeric materials (e.g., the crosslinked polymer blends described in U.S. Patent Application Serial Nos. 11/315,076, 60/816,952, and 60/861,308, the entire disclosure of each of which is incorporated by reference herein) and a self- assembled superlattice/self-assembled nanodielectric (SAS/SAND) material (described in Yoon, M-H.
- inorganic dielectric materials such as various oxides (e.g., SiO 2 , Al 2 O 3 , HfO 2 )
- organic dielectric materials such as various polymeric materials (e.g., the crosslinked polymer blends described in U.S. Patent Application Serial Nos. 11/315,076, 60/816,952, and 60/861,308, the entire disclosure of each of which is incorporated by reference here
- the composite also can include one or more electrical contacts.
- Suitable materials for the source, drain, and gate electrodes include metals (e.g., Au, Al, Ni, Cu), transparent conducting oxides (e.g., ITO, IZO, ZITO, GZO, GIO, GITO), and conducting polymers (e.g., poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS), polyaniline (PANI), polypyrrole (PPy)).
- metals e.g., Au, Al, Ni, Cu
- transparent conducting oxides e.g., ITO, IZO, ZITO, GZO, GIO, GITO
- conducting polymers e.g., poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS), polyaniline (PANI), polypyrrole (PPy)).
- One or more of the composites described herein can be embodied within various organic electronic, optical, and optoelectronic devices such as organic thin film transistors (OTFTs), specifically, organic field effect transistors (OFETs), as well as sensors, solar cells, capacitors, complementary circuits (e.g., inverter circuits), and the like.
- OFTs organic thin film transistors
- OFETs organic field effect transistors
- sensors solar cells
- capacitors capacitors
- complementary circuits e.g., inverter circuits
- Another article of manufacture in which compounds of the present teachings are useful is photovoltaics or solar cells.
- Compounds of the present teachings can exhibit relatively broad optical absorption and/or a positively shifted reduction potential making them desirable for such applications.
- the compounds described herein can be used as a n-type semiconductor in a photovoltaic design, which includes an adjacent p-type semiconducting material that forms a p-n junction.
- the compounds can be in the form of a thin film semiconductor, which can be a composite of the thin film semiconductor deposited on a substrate. Exploitation of compounds of the present teachings in such devices is within the knowledge of the skilled artisan.
- another aspect of the present teachings relates to methods of fabricating an organic field effect transistor that incorporates a semiconductor material of the present teachings.
- the semiconductor materials of the present teachings can be used to fabricate various types of organic field effect transistors including top-gate top-contact capacitor structures, top-gate bottom-contact capacitor structures, bottom-gate top-contact capacitor structures, and bottom-gate bottom-contact capacitor structures.
- OTFT devices can be fabricated with the present compounds on doped silicon substrates, using SiO 2 as the dielectric, in top-contact geometries.
- the active semiconducting layer which incorporates at least a compound of the present teachings can be deposited by vacuum vapor deposition at room temperature or at an elevated temperature.
- the active semiconducting layer which incorporates at least a compound of the present teachings can be applied by spin-coating or jet printing.
- metallic contacts can be patterned on top of the films using shadow masks.
- Example 1 Preparation of N,N'-bis[(35)-3,7-dimethyl-6-octenyl]-l,7- dicyanoperylene-3,4:9,10-bis(dicarboxiamide) (PDICUr-CN 2 )
- Citronellylamine (5.00 g, 31.8 mmol) was added to a suspension of 1,7- dibromoperylene-3,4:9,10-dianhydride (PDABr 2 ) (4.37 g, 7.95 mmol) in propionic acid (50 mL). The reaction mixture was heated under reflux for 12 hours. After cooling to room temperature, the resulting solid was collected by filtration, washed with propionic acid and several times with methanol (MeOH), and finally dried overnight.
- PDABr 2 1,7- dibromoperylene-3,4:9,10-dianhydride
- the crude product (4.71 g) was purified by chromatography on silica gel (dichloromethane, CH 2 Cl 2 ) to give N,N'-bis[(35)-3,7-dimethyl-6-octenyl]-l,7- dibromoperylene-3,4:9,10-bis(dicarboxiamide) as a red solid (0.70 g, 0.85 mmol, 10.7% yield).
- Part B Preparation of NJST-Ms[O 1 SyS, 7-dimethyl-6-octenyl]-l,7-dicvanoperylene- 3.4:9J0-bis(dicarboxiamide) (PDICitr-CN 2 )
- Part A Preparation of N,N'-bis(4- ⁇ -hexylphenylVl,7-dibromoperylene-3,4:9J0- bisrdicarboxiamide) (PDIPh ⁇ -Br?)
- the crude product (4.38 g) was purified by chromatography on silica gel (chloroform: acetone - 50:50) to give N,N'-bis(4- «-hexylphenyl)-l,7-dibromoperylene-3,4:9,10- bis(dicarboxiamide) as a red solid (1.49 g, 1.72 mmol, 36.0% yield).
- Part B Preparation of N,N'-bis(4-»-hexylphenyl>l J-dicyanoperylene-3,4:9J0- bis(dicarboxiamide) (PDIPh6-CN?)
- Part A Preparation of N,N'-bis(4-n-dodecyIphenyl)-l,7-dibromoperylene-3,4:9,10- bis(dicarboxiamideUPDIPhl2-Br7')
- the crude product (3.25 g) was extracted using a Soxhlet extractor with chloroform (CHCl 3 , 500 mL) over 2 days and the resulting solid was purified by chromatography on silica gel (CH 2 Cl 2 ) to afford N,N'-bis(4-n-dodecylphenyl)-l ,7-dibromoperylene- 3,4:9, l ⁇ -bis(dicarboxiamide) as a red solid (1.20 g, 1.11 mmol, 24.2% yield).
- Part B Preparation of NJS['-bis(4-n-dodecylphenyr)-L7-dicyanoperylene-3,4:9,10- bisfdicarboxiamideUPDIPhl2-CN 2 )
- Figure 1 provides the UV-vis absorption spectra in chloroform of N 5 N 1 - bis(4-n-dodecylphenyl)-l,7-dicyanoperylene-3,4:9,10-bis(dicarboxiamide)
- Citronellylmagnesium bromide [from 5-citronellylbromide (14.46 g, 66 mmol) and magnesium (3.20 g, 132 mmol)] in THF (80 mL) was added to a suspension of 4-iodoaniline (4.38 g, 20 mmol) and [1,1'- bis(diphenylphosphino)ferrocene] dichloropalladium(II) (PdCl 2 (dppf), 0.150 g, 0.2 mmol) in THF (25 mL) maintained at -78°C under a nitrogen atmosphere.
- Part B Preparation of N,N'-bis(4-r(35)-3,7-dimethyl-6-octenyllphenyll-l ,7- dibromoperylene-3,4:9, 10-bis(dicarboxiamide) (PDIPhCitr-Br?)
- the crude product (6.68 g) was purified by chromatography on silica gel (CH 2 Cl 2 ) to give N,N'-bis ⁇ 4-[(35)-3,7-dimethyl-6- octenyl]phenyl ⁇ -l,7-dibromoperylene-3,4:9,10-bis(dicarboxiamide) as a red solid (1.41 g, 1.44 mmol, 26.4% yield).
- the crude product (3.45 g) was purified by chromatography on silica gel (CH 2 Cl 2 ) to give N,N'-bis(4-heptyloxyphenyl)-l,7-dibromoperylene-3,4:9,10- bis(dicarboxiamide) as a red solid (0.28 g, 0.31 mmol, 5.7% yield).
- Part B Preparation of N,N'-bis(4-heptyloxyphenyl ' )-l,7-dicvanoperylene-3,4:9,10- bisfdicarboxiamideUPDIPhO7-CN 2 )
- Example 7 Preparation of N,N'-bis[4-(4'-n-octylbiphenylyl)]-l,7- dicyanoperylene-3,4:9,10-bis(dicarboxiamide) (PDIPhPh8-CN 2 )
- n-Butyllithium (BuLi, 1.6 M in hexanes, 2.4 mL, 3.8 mmol) was added dropwise to a stirred solution of p-n-octyliodobenzene (1.0 g, 3.2 mmol) in dry THF (15 mL) at -78 0 C under nitrogen. After stirring for 30 minutes and maintaining the temperature at -78 0 C, trimethylborate (0.4 g, 3.8 mmol) was added dropwise. The system was allowed to return to room temperature after 1 hour and was left stirring under nitrogen overnight. Concentrated HCl (8 mL) and water (15 mL) were then added and stirring was continued for 2 hours.
- Part D Preparation of N,N'-bis[4-(4'-n-octylbiphenylyl)1-U-dibromoperylene- 3,4:9 ⁇ O-bis(dicarboxiamide) (PDIPhPh8-Br ? )
- Figure 2 provides the UV-vis absorption spectra in chloroform of N 5 N 1 - bis[4-(4'-n-octylbiphenylyl)]-l,7-dicyanoperylene-3,4:9,10-bis(dicarboxiamide)
- Part B Preparation of 4-[(351-3,7-dimethyl-6-octenyl]phenylboronic acid
- Part D Preparation of 4-[(35>3 J-dimethyl-6-octenyl]-4'-aminobiphenyl
- Part E Preparation of N,N'-bis ⁇ 4-[4'-((3S)-3J-dimethyl-6-octenyllbiphenylvU-l,7- dibromoperylene-3,4:9,10-bis(dicarboxiamide) (PDIPhPhCitr-Br?)
- Part B Preparation of 4-amino-2',3',4',5',6'-pentafluorobiphenyl
- Part D Preparation of N.N'-bisr4-(2'.3'.4'.5'.6'-pentafluorobiphenvm-lJ- dibromoperylene-3,4:9q ⁇ -bis(dicarboxiamideUPDIPhPh F -CN7)
- Lithium (2.86 g, 0.412 mol) ribbons were rinsed with hexane and then with diethyl ether and finally cut into small pieces ( ⁇ 5 mm in length) and placed into a 250-mL three-necked air-free flask equipped with an additional funnel under nitrogen atmosphere.
- Anhydrous diethyl ether (40 mL) was added using a syringe into the flask.
- Approximately 3 mL of a solution of n-C 8 Hi 7 Br (32.04 g, 0.166 mol) in anhydrous diethyl ether (37.5 mL) were added from a second funnel. The reaction mixture was stirred at room temperature until the lithium particles assumed a bright shiny appearance.
- the mixture was then cooled to approximately -1O 0 C using a dry ice-acetone bath.
- the remainder of the n-CgHi 7 Br solution was added dropwise over a period of 1.5 hours while the temperature was maintained at -1O 0 C.
- the reaction mixture was allowed to warm up to 1O 0 C and stirred for an additional hour.
- the supernatant was removed by a cold cannula and used in the next step.
- Part B Preparation of 4-amino-4'-n-octyl-2',3',5',6'-tetrafluorobiphenyl
- Example 11 Preparation of N,N'-bis[4-(4'-n-octyl-2,3 5 5,6-tetrafluorobiphenyI)]- l,7-dicyanoperyIene-3,4:9,10-bis(dicarboxiamide) (PDIPhPh F 8-CN 2 ) Part A: Preparation of 1 -iodo-4-octylbenzene
- Part B Preparation of 4,4,5, 5-tetramethyl-2-(4-octylphenyl)-l,3,2-dioxaborolane
- n-BuLi (16.6 mL, 1.6 M in hexanes) was added over 10 minutes to a solution of l-iodo-4-octylbenzene from Part A (6.9 g, 21.8 mmol) in dry THF (100 mL) at -78 0 C under a nitrogen atmosphere. The mixture was stirred for another 10 minutes at -78 0 C.
- 2-Isopropoxy-4,4,5,5-tetramethyl[l,3,2]dioxaborolane (6.2ImL, 30.4 mmol) was subsequently added dropwise to the mixture and stirring was continued at room temperature overnight. The reaction was then quenched with distilled water, and THF was removed under vacuum.
- Part D Preparation of N,N'-bis[4-( ' 4'-n-octyl-2,3.5,6-tetrafluorobiphenvni-L7- dicvanoperylene-3,4:9,10-bis(dicarboxiamide) (PDIPhPh F 8-CN?)
- N,N'-Bis[4-(4'-n-octyl-2,3,5,6-tetrafluorobiphenyl)]-l,7- dicyanoperylene-3,4:9,10-bis(dicarboxiamide) (PDIPhPh F 8-CN 2 ) can be prepared following procedures analogous to thouse described in Example 10, Parts C and D.
- Example 12 Preparation of N,N'-bis(benzyl)-l,7-dicyanoperylene-3,4:9,10- bis(dicarboxiamide) (PDIlPh-CN 2 ) Part A: Preparation of N,N'-bis(benzyl)-h7-dibromoperylene-3,4:9J0- bis(dicarboxiamide) (PDI 1 Ph-Br?)
- Part B Preparation of N,N'-bis(benzyl)-l,7-dicyanoperylene-3,4:9,10- bis(dicarboxiamide) CPDIlPh-CN 7 )
- the crude solid was purified by multiple crystallizations from DMF-toluene to give N,N'-bis(benzyl)- 1 ,7-dicyanoperylene-3 ,4 : 9, 10-bis(dicarboxiamide) (PDI 1 Ph-CN 2 ) as a red solid (0.46 g, 0.733 mmol, 86.3% yield).
- Figure 3 provides the UV-vis absorption spectra in chloroform of N 5 N'- bis(benzyl)- 1 ,7-dicyanoperylene-3,4:9, 10-bis(dicarboxiamide) (PDIl Ph-CN 2 ).
- Example 13 Preparation of N,N'-bis(4- «-butylbenzyl)-l,7-dicyanoperylene- 3,4:9,10-bis(dicarboximide) (PDIlPh4-CN 2 )
- Part B Preparation of N,N'- bis(4-n-butylbenzyl)-L7-dicyanoperylene-3,4:9J0- bis(dicarboximide) (PDIlPh4-CN z )
- Example 14 Preparation of N,N'-bis(4- s f ec-butylphenyl)-l,7-dicyanoperylene- 3,4:9,10-bis(dicarboxiamide) (PDIPh*4-CN 2 )
- Part A Preparation of N,N'-bis(4- ⁇ ec-butyl)phenyl)-U-dibromoperylene-3,4:9J0- bis(dicarboxiamide) (PDIPhs4-Br?)
- Part B Preparation of N,N'-bis(4- ,yec-butylphenyl)-lj-dic ⁇ anoperylene-3,4:9,10- bis(dicarboxiamide) (TDIPh ⁇ -CN?)
- Example 15 Preparation of N,N'-bis ⁇ 4-[(3S)-3,7-dimethyl-6- octenyloxy]benzyl ⁇ -l,7-dicyanoperylene-3,4:9,10-bis(dicarboxiamide) (PDIlPhOCUr-CN 2 )
- Part D Preparation of N,N'-bis(4-IY3»SV3 J-dimethyl-6-octenyloxyibenzylH J- dicvanoperylene-3,4:9J0-bis(dicarboxiamide) (PDIlPhOCitr-CN z )
- the crude solid was purified by multiple crystallization from DMF-toluene to give N,N'-bis ⁇ 4-[(3S)-3,7-dimethyl-6- octenyloxy]benzyl ⁇ -l,7-dicyanoperylene-3,4:9,10-bis(dicarboxiamide) as a red solid (2.21 g, 2.38 mmol, 88.0% yield).
- Example 16 Preparation of N,N'-bis(4-benzylphenyl)-l,7-dicyanoperylene- 3,4:9,10-bis(dicarboxiamide) (PDIPhIPh-CN 2 ) Part A: Preparation of N,N'-bis(4-benzylphenylVl,7-dibromoperylene-3,4:9,10- bis(dicarboxiamide) (PDIPhIPh-BM
- Part B Preparation of N,N'-bis(4-benzylphenyl>l,7-dicvanoperylene-3,4:9,10- bis(dicarboxiamide) (PDIPh 1 Ph-CN 2 )
- Example 17 Preparation of N,N'-bis ⁇ 4-[l-(2-phenylethyl)]phenyl ⁇ -l,7- dicyanoperylene-3,4:9,10-bis(dicarboxiamide) (PDIPh2Ph-CN 2 )
- Part A Preparation of N,N'-bis ⁇ 4-[l-(2-phenylethyl)]phenyU-l,7-dibromoperylene- 3.4:9,10-bis(dicarboxiamide) (PDIPh2Ph-Br z )
- the crude product (6.08 g) was purified by chromatography on silica gel (CHCl 3 :acetone - 50:50) to give N,N'-bis ⁇ 4-[l-(2-phenylethyl)]phenyl ⁇ -l,7-dibromoperylene- 3,4:9, l ⁇ -bis(dicarboxiamide) as a red solid (0.725 g, 0.80 mmol, 16.7% yield).
- Part B Preparation of N,N'-bis ⁇ 4-[l-(2-phenylethyl)1phenyl ⁇ -lJ-dicyanoperylene- 3,4:9,1 Q-bis(dicarboxiamide) (PDIPh2Ph-CN z )
- Example 18 Preparation of N,N'-bis(4-n-benzoylphenyl)-l,7-dicyanoperylene- 3,4:9,10-bis(dicarboxiamide) (PDIPhCOPh-CN 2 )
- Part A Preparation of N,N'-bis(4-benzoylphenyl)-l,7-dibromoperylene-3,4:9,10- bis(dicarboxiamide) (PDIPhCOPh-Br 2 )
- the crude product (3.48 g) was purified by chromatography on silica gel (CH2C12) to give N,N'-bis(4-benzoylphenyl)-l,7-dibromoperylene-3,4:9,10-bis(dicarboxiamide) as a red solid (0.67 g, 0.74 mmol, 13.6% yield).
- Part B Preparation of N,N'-bis(4-n-benzoylphenyl)-l,7-dicvanoperylene-3,4:9,10- bis(dicarboxiamide) (PDIPhCOPh-CN 2 )
- Example 19 Preparation of N,N'- ⁇ 4-[(3S)-3,7-dimethyl-6- octenyl]phenyl ⁇ -2,6-dicyanonapthalene-l,4:5,8-tetracarboxylicdiimide
- Example 20 Preparation of N,N'-bis ⁇ 4-[(3S)-3,7-dimethyl-6-octeny.]phenyl ⁇ - 2,3:6,7-anthracenedicarboximide
- Sodium iodide (3.7 g) was added to a solution of 1,2,4,5- tetrakis(dibromomethyl)benzene (1.92 g, 2.50 mmol) and N- ⁇ 4-[(3S>3,7-dimethyl- 6-octenyl] ⁇ phenylmaleimide (1.56 g, 5.00 mmol) in N,N-dimethylacetamide (15 mL).
- Example 21 Preparation of N,N'-bis(2-ethylhexyl)-l,7-dicyanoperylene- 3,4:9,10-bis(dicarboxiamide) (PDI2EH-CN 2 ) Part A: Preparation of N.N'-bis(2-ethylhexylVl,7-dibromoperylene-3,4:9.10- bis(dicarboxiamide) (PDI2EH-Br z )
- Part B Preparation of N,N'-bis(2-ethylhexyl)-L7-dicvanoperylene-3,4:9J0- bis(dicarboxiamide) (PDI2EH-CN?)
- Part C Preparation of N,N'-bis(2-methylhexyl)-l,7-dibromoperylene-3,4:9J0- bis(dicarboxiamideUPDI2MH-Br9)
- PDIPhPh8-CN 2 25-100 1-2 2-3
- PDIPhPhCitr-CN 2 25-100 8-12 10-12
- PDIlPhOCitr-CN 2 25-100 12-20 15-25
- Organic semiconductor thin films were fabricated by vapor deposition and solution phase deposition. Evaporated films were prepared in a Denton DV-502 vacuum deposition apparatus (10 " -10 “7 Torr) on substrates kept at 25-120°C.
- Organic semiconductor films were deposited on the following substrates: n + -Si-(300 nm)SiO 2 (Process Specialties Inc.), ITO, ITO-(100-600 nm) CPB dielectric (Polyera Corporation), PET-Al-(100-600 nm) CPB dielectric (Polyera Corporation). These were rinsed with water, methanol, and acetone before CPB or organic semiconductor film deposition. Silane functionalization of the Si/SiO 2 surface was carried out by exposing the silicon-oxide wafers to hexamethyldisilazane (HMDS) and octadecyltrichlorosilane (OTS) vapor at room temperature in a closed container under nitrogen.
- HMDS hexamethyldisilazane
- OTS octadecyltrichlorosilane
- the growth rate of the films (0.1-0.4 A/s) was controlled by adjusting the crucible temperature. A calibrated quartz-crystal microbalance was used to control the growth rate and film thickness.
- top-contact electrodes (500 A) ⁇ 5 were deposited by evaporating gold (pressure ⁇ 10 " Torr) on top of the gate (Si, ITO, Al)-dielectric (SiO2, CPB)-organic semiconductor samples.
- TFT device channel dimensions are 50-500 ⁇ m (L) by 0.5-4.0 mm (W).
- the capacitance of the employed insulators are 4-11 nF/cm 2 .
- Electrical measurements were performed using a home-built coaxial probe station employing a Keithley 6430 subfemtoammeter and Keithley 2400 source meter, operated by a local Labview program and GPIB communication. Triaxial and/or coaxial shielding was incorporated into the Signaton probe station to minimize noise.
- (lDs)sa. (WCj / 2L) ⁇ (V G - V t ) 2 0)
- L and W are the device channel length and width, respectively
- Cj is the capacitance of the oxide insulator (1 x 10 "8 F/cm 2 for 300 nm SiO 2 )
- V t is the threshold voltage
- Table 4 summarizes electron mobilities and current I on :I Off ratios for representative compounds of the present teachings having been drop-casted and/or vapor-phase deposited to form thin film semiconductors.
- rylene compounds having 2-alkyl substituted alkyl group functionalization of the imide nitrogens showed an unexpected increase in current I on :I off ratio compared to similar compounds having a common known linear alkyl group substitution (PDI8-CN 2 ) and a branched alkenyl group having a methyl group at its 3-position (PDICitr-CN 2 ).
- Example 27 Field effect transistor (FET) fabrication by spin-coating
- the representative compound (which may be a mixture of regioisomers) (4-8 mg) was dissolved in CHCl 3 (0.5-2 mL) and the solution was spin-coated (1500 rpm) on an OTS-treated Si-SiO 2 substrate. The film was then annealed at 80-120 0 C in a vacuum-oven for 30 min-5 h. The FET device structure was completed by evaporation of the Au source/drain contacts.
- Figure 16A is a representative transfer plot measured in air for a spin- coated film from chloroform of a compound of the present teachings (PDI8-CN 2 ).
- Figure 16B is a representative transfer plot measured in air for a spin-coated film from chloroform of a compound of the present teachings (PDI2EH-CN 2 ).
- Table 5 summarizes electron mobilities and current I 0n :I o ff ratios spin- coated films of representative PDI-CN 2 core compounds of the present teachings.
- the compounds having 2-alkyl substituted alkyl group functionalization of the imide nitrogens (PDI2MH-CN 2 and PDI2EH-CN 2 ) showed an unexpected increase in electron mobility and current I on :I off ratio compared to a similar compound having a common known linear alkyl group substitution (PDIS-CN 2 ).
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Family Cites Families (107)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2087133A (en) * | 1933-04-15 | 1937-07-13 | Gen Aniline Works Inc | Dyestuffs of the naphthalene-1.4.5.8-tetracarboxylic acid dhmide series |
| DE1522385C3 (de) | 1966-06-08 | 1973-09-20 | Agfa-Gevaert Ag, 5090 Leverkusen | Lichtempflindliche Materialien |
| FR2237922A1 (en) | 1973-06-29 | 1975-02-14 | Ugine Kuhlmann | Coloured polyurethane prepd. in presence of dye - contg. terminal reactive gps. |
| DE2951349A1 (de) | 1979-12-20 | 1981-07-02 | Bayer Ag, 5090 Leverkusen | Naphthalintetracarbonsaeurediimide als elektrische halbleiter und photoleiter |
| US4378302A (en) * | 1980-12-16 | 1983-03-29 | General Electric Company | Red perylene dichroic dye containing liquid crystal formulations |
| US4611385A (en) * | 1982-06-18 | 1986-09-16 | At&T Bell Laboratories | Devices formed utilizing organic materials |
| US4667036A (en) | 1983-08-27 | 1987-05-19 | Basf Aktiengesellschaft | Concentration of light over a particular area, and novel perylene-3,4,9,10-tetracarboxylic acid diimides |
| DE3535496A1 (de) | 1985-10-04 | 1987-04-16 | Bayer Ag | Verfahren zur fluoreszenzloeschung und neue kationische naphthalin-peri-dicarbonsaeureimid-derivate |
| DE3620332A1 (de) | 1986-06-18 | 1987-12-23 | Bayer Ag | Verfahren zur herstellung von tetrachlornaphthalintetracarbonsaeuredianhydrid und -diimid, sowie die neue verbindung 2.3.6.7-tetrachlornaphthalin-1.4.5.8.- tetracarbonsaeurediimid |
| DE3631678A1 (de) * | 1986-09-18 | 1988-03-24 | Basf Ag | Tetrachlorperylen-3,4,9,10-tetracarbonsaeurediimidpigment und dessen verwendung |
| DE3703131A1 (de) | 1987-02-03 | 1988-08-11 | Bayer Ag | 2.3.6.7-tetrafluornaphthalintetracarbonsaeurebisimide, verfahren zu ihrer herstellung und ihre verwendung |
| DE3934329A1 (de) | 1989-10-13 | 1991-04-18 | Basf Ag | Polymerisierbare perylen-3,4,9,10-tetracarbonsaeurebisimide sowie deren polymerisate |
| DE4018830A1 (de) | 1990-06-12 | 1991-12-19 | Langhals Heinz | Synthese und verwendung von nicht-symmetrisch substituierten perylen-fluoreszenzfarbstoffen |
| JPH0525174A (ja) | 1991-07-16 | 1993-02-02 | Kao Corp | 新規ナフタレンテトラカルボン酸ジイミド化合物 |
| JPH0527459A (ja) | 1991-07-19 | 1993-02-05 | Kao Corp | 電子写真感光体 |
| DE4236885A1 (de) * | 1992-10-31 | 1994-05-05 | Basf Ag | Quaterrylentetracarbonsäureimide |
| EP0697027B1 (de) * | 1993-05-04 | 1997-07-02 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Tetraaroxyperylen-3,4,9,10-tetracarbonsäurepolyimide |
| US5539100A (en) * | 1993-07-01 | 1996-07-23 | The United States Of America As Represented By The United States Department Of Energy | Organic solid state switches incorporating porphyrin compounds and method for producing organic solid state optical switches |
| DE4325247A1 (de) * | 1993-07-28 | 1995-02-02 | Basf Ag | Pigmentzubereitungen mit Perylenderivaten als Dispergiermitteln |
| DE4338784A1 (de) | 1993-11-12 | 1995-05-18 | Langhals Heinz | Perylen-3,4-dicarbonsäureimide - neue hoch lichtechte Fluoreszenzfarbstoffe |
| DE4440242A1 (de) | 1994-11-10 | 1996-05-15 | Langhals Heinz | Verfahren zur Darstellung von Perylenfarbstoffen aus Formamiden und neue di- und trichromophore Perylenfarbstoffe |
| WO1996022332A1 (de) * | 1995-01-20 | 1996-07-25 | Basf Aktiengesellschaft | Substituierte quaterrylentetracarbonsäurediimide |
| DE19501737A1 (de) | 1995-01-20 | 1996-07-25 | Basf Ag | Verfahren zur Herstellung und Reinigung von Perylen-3,4-dicarbonsäureimiden |
| DE19547209A1 (de) * | 1995-12-18 | 1997-06-19 | Basf Ag | 1,7-Diaroxy-oder -arylthiosubstituierte Perylen-3,4,9,10-tetracarbonsäuren, deren Dianhydride und Diimide |
| DE19547210A1 (de) * | 1995-12-18 | 1997-06-19 | Basf Ag | 1,7-Disubstituierte Perylen-3,4,9-10-tetracarbonsäuren, deren Dianhydride und Diimide |
| DE19601752A1 (de) * | 1996-01-19 | 1997-07-24 | Basf Ag | Für Wasserbasislacke geeignetes N,N'-Dimethylperylen-3,4,9,10-tetracarbonsäurediimidpigment |
| DE19622673A1 (de) | 1996-06-05 | 1997-12-11 | Basf Ag | Verfahren zur Herstellung von Perylen-3,4-dicarbonsäureimiden |
| JPH11513075A (ja) * | 1996-07-09 | 1999-11-09 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | 半導体ポリマー |
| US5645965A (en) | 1996-08-08 | 1997-07-08 | Xerox Corporation | Symmetrical perylene dimers |
| DE19632204A1 (de) * | 1996-08-09 | 1998-02-12 | Basf Ag | Verfahren zur Herstellung von N,N'-Dialkylperylen-3,4,9,10-tetracarbonsäurediimiden |
| DE19651712A1 (de) | 1996-12-12 | 1998-06-18 | Langhals Heinz | Pyrrolo- und Thiophenoperylenimide - stark fluoreszierende Heterocylen |
| US5683842A (en) | 1997-02-26 | 1997-11-04 | Xerox Corporation | Unsymmetrical perylene dimers in electrophotography |
| DE19709008A1 (de) | 1997-03-05 | 1998-09-10 | Langhals Heinz | Perylenfarbstoff-Kronenether: Fluoreszenz-Komplexbildner für Metallionen |
| EP0977754B1 (en) * | 1997-04-29 | 2008-01-16 | Ciba SC Holding AG | Writable and erasable high-density optical storage media |
| EP0896964B1 (de) | 1997-07-24 | 2006-03-08 | Ciba SC Holding AG | Perylenhydrazidimide als Carbonylderivatisierungsreagenzien |
| JP3695095B2 (ja) | 1997-10-17 | 2005-09-14 | 富士ゼロックス株式会社 | 電子写真感光体 |
| DE19805121A1 (de) * | 1998-02-09 | 1999-08-12 | Basf Ag | Verfahren zur Herstellung farbstoffenthaltender, wässriger Polymerisatdispersionen |
| US6162571A (en) | 1998-10-02 | 2000-12-19 | Xerox Corporation | Unsymmetrical perylene dimers |
| US6348595B1 (en) * | 1999-10-27 | 2002-02-19 | Ciba Specialty Chemicals Corporation | Process for preparing |
| US6265243B1 (en) * | 1999-03-29 | 2001-07-24 | Lucent Technologies Inc. | Process for fabricating organic circuits |
| US6252245B1 (en) * | 1999-03-29 | 2001-06-26 | Howard Edan Katz | Device comprising n-channel semiconductor material |
| US6165661A (en) * | 1999-05-21 | 2000-12-26 | Xerox Corporation | Perylene compositions |
| DE19940708A1 (de) * | 1999-08-27 | 2001-03-01 | Basf Ag | Thermochrome Rylenfarbstoffe |
| DE19941253A1 (de) * | 1999-08-31 | 2001-03-08 | Basf Ag | Glanzpigmente mit absorbierender, niedrigbrechender Beschichtung |
| DE10013188A1 (de) * | 2000-03-17 | 2001-09-20 | Basf Ag | Kristallisationsmodifikatoren auf der Basis von Perylenderivaten |
| US6287738B1 (en) * | 2000-05-25 | 2001-09-11 | Xerox Corporation | Photoconductive imaging members |
| US6194110B1 (en) | 2000-07-13 | 2001-02-27 | Xerox Corporation | Imaging members |
| US6585914B2 (en) * | 2000-07-24 | 2003-07-01 | Northwestern University | N-type thiophene semiconductors |
| WO2002009201A1 (en) * | 2000-07-24 | 2002-01-31 | Northwestern University | n-TYPE THIOPHENE SEMICONDUCTORS |
| DE10038672A1 (de) | 2000-08-08 | 2002-05-29 | Heinz Langhals | Neue Fluoreszenzlabels: die Synthese von Perylen-3:4,9-tricarbonsäureimiden |
| DE10039232A1 (de) * | 2000-08-11 | 2002-02-21 | Basf Ag | Flüssigkristalline Perylen-3,4:9,10-tetracarbonsäurediimide |
| DE10039643A1 (de) * | 2000-08-14 | 2002-02-28 | Max Planck Gesellschaft | Funktionalisierte Perylentetracarbonsäurediimide |
| GB0028317D0 (en) * | 2000-11-21 | 2001-01-03 | South Bank Univ Entpr Ltd | Electroluminescent device incorporating polyaniline |
| DE10108156A1 (de) * | 2001-02-20 | 2002-08-29 | Basf Ag | Rylenderivate |
| DE10108601A1 (de) * | 2001-02-22 | 2002-09-05 | Basf Ag | Thermochrome Rylenfarbstoffe |
| JP4315609B2 (ja) | 2001-04-05 | 2009-08-19 | 富士フイルム株式会社 | 液晶組成物、それを用いた液晶素子およびアゾ化合物 |
| JP2003041144A (ja) * | 2001-07-27 | 2003-02-13 | Yokohama Tlo Co Ltd | 黒色ペリレン系顔料およびその製造方法 |
| JP2003041145A (ja) * | 2001-07-27 | 2003-02-13 | Yokohama Tlo Co Ltd | 黒色ペリレン系顔料およびその製造方法 |
| DE10148172B4 (de) | 2001-09-28 | 2007-11-15 | Qimonda Ag | Fluoreszierende Naphthalin-1,4,5,8-tetracarbonsäurebisimide mit elektronenschiebendem Substituenten am Kern |
| AU2003221969A1 (en) * | 2002-04-19 | 2003-11-03 | 3M Innovative Properties Company | Materials for organic electronic devices |
| DE10218618A1 (de) * | 2002-04-25 | 2003-11-06 | Basf Ag | Verfahren zur Herstellung von Perylen-3,4:9,10-tetracarbonsäuredimiden und Perylen-3,4:9,10-tetracarbonsäuredianhydrid sowie von Naphthalin-1,8-dicarbonsäureimiden |
| JP4078113B2 (ja) | 2002-05-10 | 2008-04-23 | キヤノン株式会社 | ナフタレンテトラカルボン酸ジイミド化合物の製造方法 |
| US6656651B1 (en) * | 2002-05-22 | 2003-12-02 | Xerox Corporation | Photoconductive members |
| DE10225595A1 (de) * | 2002-06-07 | 2003-12-18 | Basf Ag | 1,6,9,14-Tetrasubstituierte Terrylentetracarbonsäurediimide |
| DE10226181A1 (de) * | 2002-06-12 | 2003-12-24 | Basf Ag | Verfahren zur Überführung von Perylen-3,4:9,10-tetracarbonsäurediimide in eine für die Anwendung als Fluoreszenzfarbmittel geeignete Form |
| US6794102B2 (en) * | 2002-07-17 | 2004-09-21 | Xerox Corporation | Naphthalene tetracarboxylic diimide dimers |
| DE10238994A1 (de) * | 2002-08-20 | 2004-02-26 | Basf Ag | Rylenfarbstoffe |
| JP3977207B2 (ja) | 2002-08-30 | 2007-09-19 | キヤノン株式会社 | 電子写真感光体の製造方法 |
| JP2004093802A (ja) | 2002-08-30 | 2004-03-25 | Canon Inc | 電子写真感光体、プロセスカートリッジおよび電子写真装置 |
| DE10243906A1 (de) * | 2002-09-20 | 2004-04-01 | Basf Ag | 9-Cyanosubstituierte Perylen-3,4-dicarbonsäuremonoimide |
| JP4189199B2 (ja) | 2002-10-29 | 2008-12-03 | 三井化学株式会社 | 有機太陽電池 |
| US6986811B2 (en) * | 2003-01-31 | 2006-01-17 | Basf Aktiengesellschaft | Perylene derivatives and their application as dispersants |
| JP4547201B2 (ja) | 2003-07-16 | 2010-09-22 | 三井化学株式会社 | 新規なナフタレンカルボン酸誘導体、および該化合物を用いた電子写真感光体、電子写真装置 |
| US7175922B2 (en) * | 2003-10-22 | 2007-02-13 | Eastman Kodak Company | Aggregate organic light emitting diode devices with improved operational stability |
| US7119360B2 (en) * | 2003-10-29 | 2006-10-10 | Max-Plank-Society | Light-emitting polymers and electronic devices using such polymers |
| US20050171252A1 (en) * | 2004-02-04 | 2005-08-04 | Basf Aktiengesellschaft | Use of naphthalin-1,8-dicarboxylic acid monoimides |
| ES2321307T3 (es) | 2003-11-14 | 2009-06-04 | Basf Se | Uso de derivados de 4-ciano-neftaleno-1,8-dicarboximida y compuestos relacionados para proteger material organico de los dañinos de la luz. |
| JP4208881B2 (ja) * | 2003-12-26 | 2009-01-14 | キヤノン株式会社 | 電子写真感光体、プロセスカートリッジおよび電子写真装置 |
| JP4227514B2 (ja) | 2003-12-26 | 2009-02-18 | キヤノン株式会社 | 電子写真感光体、該電子写真感光体を有するプロセスカートリッジ及び電子写真装置 |
| JP4723812B2 (ja) | 2004-01-22 | 2011-07-13 | 三井化学株式会社 | ナフタレンカルボン酸誘導体を用いた有機薄膜トランジスタ |
| DE102004003734A1 (de) | 2004-01-23 | 2005-08-11 | Basf Ag | Verfahren zur Herstellung von Terrylen-3,4:11,12-tetracarbonsäurediimiden durch Di-rektsynthese |
| DE102004003735A1 (de) | 2004-01-23 | 2005-08-11 | Basf Ag | Verfahren zur Herstellung von Terrylen-3,4:11,12-tetracarbonsäurediimiden |
| WO2005076815A2 (en) * | 2004-01-26 | 2005-08-25 | Northwestern University | PERYLENE n-TYPE SEMICONDUCTORS AND RELATED DEVICES |
| CN1918239B (zh) | 2004-02-11 | 2010-05-05 | 巴斯福股份公司 | 黑色苝系颜料 |
| US7763727B2 (en) | 2004-03-29 | 2010-07-27 | Mitsui Chemicals, Inc. | Compound and organic electronic device using the same |
| JP2006028027A (ja) | 2004-07-12 | 2006-02-02 | Mitsui Chemicals Inc | テトラカルボン酸誘導体、および該化合物を用いた電子写真感光体、電子写真装置 |
| US20060141287A1 (en) * | 2004-08-19 | 2006-06-29 | Eastman Kodak Company | OLEDs with improved operational lifetime |
| DE102004041604A1 (de) | 2004-08-26 | 2006-03-02 | Basf Ag | Verfahren zur Herstellung von Quaterrylen-3,4:13,14-tetracarbonsäurediimiden durch Direktsynthese |
| DE102004048729A1 (de) | 2004-10-05 | 2006-04-06 | Basf Ag | Verfahren zur Herstellung von halogenierten Rylencarbonsäureimiden |
| DE102004054303A1 (de) | 2004-11-09 | 2006-05-11 | Basf Ag | Verfahren zur Herstellung von Perylen-3,4-dicarbonsäureimiden |
| DE102004060033A1 (de) | 2004-12-14 | 2006-06-29 | Wella Ag | Verwendung von fluoreszierenden Polymeren zur Behandlung menschlicher Haare |
| US7326956B2 (en) * | 2004-12-17 | 2008-02-05 | Eastman Kodak Company | Fluorine-containing N,N′-diaryl perylene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors |
| US7198977B2 (en) | 2004-12-21 | 2007-04-03 | Eastman Kodak Company | N,N′-di(phenylalky)-substituted perylene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
| US8039625B2 (en) | 2005-03-01 | 2011-10-18 | Georgia Tech Research Corporation | Coronene charge-transport materials, methods of fabrication thereof, and methods of use thereof |
| US20060210898A1 (en) * | 2005-03-16 | 2006-09-21 | Nusrallah Jubran | Charge transport materials having at least a 1,3,6,8-tetraoxo-1,3,6,8-tetrahydrobenzo[lmn][3,8]phenanthroline-2,7-diyl group |
| US7579619B2 (en) | 2005-04-20 | 2009-08-25 | Eastman Kodak Company | N,N′-di(arylalkyl)-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
| US7371492B2 (en) * | 2005-07-28 | 2008-05-13 | Eastman Kodak Company | Vinyl polymer photoconductive elements |
| US7629605B2 (en) | 2005-10-31 | 2009-12-08 | Eastman Kodak Company | N-type semiconductor materials for thin film transistors |
| US7422777B2 (en) | 2005-11-22 | 2008-09-09 | Eastman Kodak Company | N,N′-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
| DE102005061997A1 (de) | 2005-12-23 | 2007-07-05 | Basf Ag | Naphthalintetracarbonsäurederivate und deren Verwendung |
| WO2007093643A1 (de) | 2006-02-17 | 2007-08-23 | Basf Se | Fluorierte rylentetracarbonsäurederivate und deren verwendung |
| US7569693B2 (en) | 2006-06-12 | 2009-08-04 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
| US7947837B2 (en) | 2006-10-25 | 2011-05-24 | Polyera Corporation | Organic semiconductor materials and methods of preparing and use thereof |
| US7892454B2 (en) | 2006-11-17 | 2011-02-22 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
| US7804087B2 (en) | 2006-12-07 | 2010-09-28 | Eastman Kodak Company | Configurationally controlled N,N'-Dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors |
| CN101622253B (zh) | 2007-01-08 | 2015-04-29 | 破立纪元有限公司 | 用于制备基于芳烃-双(二羧酰亚胺)的半导体材料的方法和用于制备它们的相关中间体 |
| WO2008091670A2 (en) | 2007-01-24 | 2008-07-31 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
-
2007
- 2007-11-19 EP EP07862121.6A patent/EP2086974B1/en not_active Not-in-force
- 2007-11-19 US US11/986,019 patent/US7902363B2/en active Active
- 2007-11-19 JP JP2009537237A patent/JP5380296B2/ja not_active Expired - Fee Related
- 2007-11-19 WO PCT/US2007/024189 patent/WO2008063609A2/en not_active Ceased
Non-Patent Citations (4)
| Title |
|---|
| BROOKS B. A. ET AL.: "Angewandte Chemie. International Edition", vol. 43, 2004, WILEY VCH VERLAG, article "High-Moblity Air-Stable n-Type Semiconductors with Processing Versatility: Dicyanoperylene-3,4:9, 10-bis (dicarboxiamides", pages: 6363 - 6366 |
| BROOKS B. A. ET AL.: "Chemistry of Materials", vol. 19, 29 May 2007, AMERICAN CHEMICAL SOCIETY, article "Cyanonaphthalene Diimide Semiconductors for Air-Stable, Flexible, and Optically Transparent c-Channel Field_Effect Transistors", pages: 2703 - 2705 |
| CHEN, S. ET AL.: "Oligothiophene-Functionalised Perylene Bisimide System; Synthesis, Characterisation, and Electrochemical Polymerisation Properties", CHEMISTRY OF MATERIALS, vol. 17, 2005, pages 2208 - 2215 |
| YOON, M-H. ET AL., PNAS, vol. 102, no. 13, 2005, pages 4678 - 4682 |
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| EP3828170A4 (en) * | 2018-07-26 | 2021-12-15 | Livzon New North River Pharmaceutical Co., Ltd. | PROCESS FOR THE SAFE PREPARATION OF PIMAVANSERIN AND ITS TARTRATE SALT USING TRIPHOSGEN |
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| US11091447B2 (en) | 2020-01-03 | 2021-08-17 | Berg Llc | UBE2K modulators and methods for their use |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2010510228A (ja) | 2010-04-02 |
| EP2086974B1 (en) | 2013-07-24 |
| JP5380296B2 (ja) | 2014-01-08 |
| WO2008063609A3 (en) | 2008-09-12 |
| US20080185577A1 (en) | 2008-08-07 |
| EP2086974A2 (en) | 2009-08-12 |
| US7902363B2 (en) | 2011-03-08 |
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