WO2003105226A1 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- WO2003105226A1 WO2003105226A1 PCT/JP2003/006151 JP0306151W WO03105226A1 WO 2003105226 A1 WO2003105226 A1 WO 2003105226A1 JP 0306151 W JP0306151 W JP 0306151W WO 03105226 A1 WO03105226 A1 WO 03105226A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pad
- potential
- semiconductor device
- circuit
- lead
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/50—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
- H01L23/49513—Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49517—Additional leads
- H01L23/49531—Additional leads the additional leads being a wiring board
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05554—Shape in top view being square
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29005—Structure
- H01L2224/29007—Layer connector smaller than the underlying bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/3201—Structure
- H01L2224/32012—Structure relative to the bonding area, e.g. bond pad
- H01L2224/32014—Structure relative to the bonding area, e.g. bond pad the layer connector being smaller than the bonding area, e.g. bond pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/4501—Shape
- H01L2224/45012—Cross-sectional shape
- H01L2224/45015—Cross-sectional shape being circular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48253—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a potential ring of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48257—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/485—Material
- H01L2224/48505—Material at the bonding interface
- H01L2224/48599—Principal constituent of the connecting portion of the wire connector being Gold (Au)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/485—Material
- H01L2224/48505—Material at the bonding interface
- H01L2224/48599—Principal constituent of the connecting portion of the wire connector being Gold (Au)
- H01L2224/486—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/48638—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/48639—Silver (Ag) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/494—Connecting portions
- H01L2224/4943—Connecting portions the connecting portions being staggered
- H01L2224/49431—Connecting portions the connecting portions being staggered on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/494—Connecting portions
- H01L2224/4943—Connecting portions the connecting portions being staggered
- H01L2224/49433—Connecting portions the connecting portions being staggered outside the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/852—Applying energy for connecting
- H01L2224/85201—Compression bonding
- H01L2224/85205—Ultrasonic bonding
- H01L2224/85207—Thermosonic bonding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/85399—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/85399—Material
- H01L2224/854—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/85438—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/85439—Silver (Ag) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01011—Sodium [Na]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01015—Phosphorus [P]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01083—Bismuth [Bi]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/07802—Adhesive characteristics other than chemical not being an ohmic electrical conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/1016—Shape being a cuboid
- H01L2924/10162—Shape being a cuboid with a square active surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19107—Disposition of discrete passive components off-chip wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Definitions
- the present invention relates to a semiconductor device using a bus bar or a ring-shaped passper, and more particularly, to a layout of a semiconductor chip and an arrangement of a bus par or a ring-shaped passper.
- a BGA (Ball Grid Array) type semiconductor device using a multilayer wiring board is described in, for example, JP-A-2002-190488 and JP-A-2002-270723. Although it has been adopted as a semiconductor device, the cost of a multi-layered wiring board with microfabrication has been high and the total cost performance has been low.
- a CSP (Chip Size Pack age) type semiconductor device using a tape wiring substrate having a single-layer wiring is described in, for example, Japanese Patent Application Laid-Open No. H11-54658, which is almost equivalent to the conventional chip size.
- the number of external terminals increases according to the number of electrodes on the semiconductor chip. was there . Therefore, there was a trade-off between the increase in the number of chip electrodes and the increase in the package size due to the increase in the number of pins, and the number of chip electrodes was greatly restricted, resulting in low total cost performance.
- the inventor has studied a structure of a semiconductor device having a superior total cost performance as compared with the conventional BGA / CSP.
- the present applicant has a first viewpoint "the ends of a plurality of leads are connected" and a second viewpoint "connecting a power supply or GND between a plurality of leads and a chip. A bar to do this ”.
- Japanese Patent Application Laid-Open No. H9-1252072 paragraph 20, FIG. 8, FIG. 9
- Japanese Patent Application Laid-Open No. 11-16816 paragraph 61, FIG. 3
- BGA and CSP are said to be suitable for increasing the number of external pins with the increasing functionality of integrated circuits (ICs). No consideration has been given to the subject of the present application to deal with it. Also, no study has been made on the power supply drop problem of internal power supply voltage routing and package combinations.
- Another object of the present invention is to provide a semiconductor device which is reduced in size.
- the present invention provides a semiconductor chip having a main surface, a back surface, a plurality of electrodes formed on the main surface, a plurality of inner leads arranged around the semiconductor chip, and a plurality of inner leads.
- a plurality of integrally formed leads, a plurality of bonding wires connected to the plurality of electrodes and the plurality of inner leads, respectively, and a semiconductor chip, a plurality of inner leads, and a plurality of bonding wires are sealed.
- a portion where the plurality of inner leads and the plurality of bonding wires are connected is arranged in a staggered manner, and the plurality of inner leads are connected to the plurality of bonding wires. The portion is fixed via an adhesive layer on a substrate sealed inside the resin sealing body.
- the present invention has a first circuit portion including a transistor having a current path between the first potential and the second potential, and a current path between the third potential and the fourth potential.
- a second circuit portion including a transistor, a first pad for supplying the first potential to the first circuit portion, and a second pad for supplying the second potential to the first circuit portion.
- a first lead that is arranged between the inner leads and supplies the first potential to the first circuit unit.
- FIG. 1 is a cross-sectional view showing an example of a chip mounting structure of the minimum size in the semiconductor device (QFP) according to the first embodiment of the present invention.
- FIG. 2 is a cross-sectional view showing an example of a chip mounting structure of the maximum size in the QFP.
- FIGS. 3 to 6 are cross-sectional views each showing a structure of a QFP according to a modification of the first embodiment of the present invention.
- FIG. 7 is an example of a frame structure of a lead frame used for assembling the QFP shown in FIG.
- FIG. 8 is a rear view of the frame body shown in FIG. 7, and
- FIG. 9 is a partial plan view showing the structure of a lead frame manufactured by attaching a tape member to the frame body shown in FIG.
- FIG. 10 is a rear view of the lead frame shown in FIG. 9, FIG. 11 is a partial plan view showing the structure of the lead frame shown in FIG. 9 after cutting the first connecting portion, and FIG. 12 is a lead frame shown in FIG. FIG. 13 is a second connection portion of the lead frame shown in FIG. Partial plan view showing the structure after cutting, Fig. 14 is the back view of the lead frame shown in Fig. 13, and Fig. 15 is the part showing the minimum and maximum chip sizes that can be mounted on the lead frame shown in Fig. 13.
- FIG. 16 is a partial plan view showing an example of a structure after wire bonding when a semiconductor chip of the minimum size is mounted on the lead frame shown in FIG. 13, and FIG. 17 is a view showing the structure of the lead frame shown in FIG. FIG.
- FIG. 18 is a partial plan view showing an example of a structure after wire bonding when a semiconductor chip of the maximum size is mounted, and FIG. 18 shows a structure of a frame body of a lead frame according to a modification of the first embodiment of the present invention.
- FIG. 19 is a rear view of the frame body shown in FIG. 18;
- FIG. 20 is a partial plan view showing a structure of a lead frame manufactured by attaching a tape member to the frame body shown in FIG. 18;
- Fig. 21 shows the lead frame shown in Fig. 20.
- FIG. 22 is a partial plan view showing the structure of the lead frame shown in FIG. 20 after cutting the first connecting portion.
- FIG. 23 is a rear view of the lead frame shown in FIG. 4 is the figure FIG.
- FIG. 20 is a partial plan view showing the structure of the lead frame after cutting the second connection portion
- FIG. 25 is a rear view of the lead frame shown in FIG. 24
- FIG. 26 is a view of the lead frame shown in FIG.
- FIG. 27 is a partial plan view showing a minimum chip size and a maximum chip size that can be mounted
- FIG. 27 is a partial plan view showing an example of a structure after wire bonding when a minimum size semiconductor chip is mounted on the lead frame shown in FIG. 24
- FIG. 28 is a partial plan view showing an example of a structure after wire bonding when a semiconductor chip having the maximum size is mounted on the lead frame shown in FIG. 24,
- FIG. 29 is a modification of the first embodiment of the present invention.
- FIG. 29 is a modification of the first embodiment of the present invention.
- FIG. 30 is a partial plan view showing the structure of the frame body of the example lead frame.
- FIG. 30 is a partial back view showing the structure of a lead frame manufactured by attaching a tape member to the frame body shown in FIG. 29.
- 31 is the lead frame shown in Fig. 30.
- FIG. 32 is a partial side view showing an example of a punching method using a punch when the lead frame shown in FIG. 13 is manufactured.
- 33 is a partial side view showing an example of the coining method after punching shown in FIG. 32
- FIG. 34 is a partial cross-sectional view showing the structure of a lead frame according to a modification of the first embodiment of the present invention, and FIG. FIG.
- FIG. 36 is a cross-sectional view showing an example of a minimum-size chip mounting structure in the semiconductor device (QFP) according to the second embodiment of the present invention.
- FIG. 36 is a cross-sectional view illustrating a maximum-size chip mounting in the semiconductor device (QFP) according to the second embodiment of the present invention.
- FIG. 37 is a cross-sectional view showing an example of the structure
- FIG. 37 is a cross-sectional view showing a structure of a QFP according to a modification of the second embodiment of the present invention
- FIG. 38 is a cross-sectional view of a lead frame used for assembling the QFP shown in FIG.
- FIG. 39 is a partial plan view showing an example of the structure of the frame body.
- FIG. 40 is a partial plan view showing the structure of a lead frame manufactured by attaching a tape member to the frame shown in FIG. 38
- FIG. 41 is a lead frame shown in FIG.
- FIG. 42 is a partial plan view showing the structure of the lead frame shown in FIG. 40 after cutting the connecting portion
- FIG. 43 is a rear view of the lead frame shown in FIG. 42
- FIG. Fig. 45 is a partial plan view showing the minimum and maximum chip sizes that can be mounted on the lead frame shown in Fig. 45.Fig. 45 shows the structure after wire bonding when the minimum size semiconductor chip is mounted on the lead frame shown in Fig. 42.
- FIG. 46 is a partial plan view showing an example
- FIG. 46 is a partial plan view showing an example
- FIG. 46 is a partial plan view showing an example of a structure after wire bonding when a semiconductor chip of the maximum size is mounted on the lead frame shown in FIG. 42
- FIG. 47, FIG. FIG. 49 shows the implementation of the present invention.
- Structure of the lead frame according to the modification of the embodiment 2 50 is a partial plan view showing an example of the wire bonding state of the lead frame shown in FIG. 49
- FIG. 51 is a structure of a lead frame according to a modification of the second embodiment of the present invention.
- 52 is a connection correspondence diagram showing an example of a connection state when the lead frame shown in FIG. 51 is used
- FIG. 53 is a semiconductor device (QFN) according to another embodiment of the present invention.
- FIG. 54 is a cross-sectional view showing a structure of a QFP according to a modification of the second embodiment of the present invention
- FIG. 55 is a cross-sectional view showing an example of the QFP shown in FIG. 54
- FIG. 56 is a layout diagram in which a bus bar is separated between a digital circuit portion and an analog circuit portion
- FIG. 57 is a cross-sectional view of the semiconductor device taken along line A-A of FIG. 56
- FIG. 56 is a cross-sectional view of the semiconductor device taken along line BB.
- Fig. 61 is a cross-sectional view taken along line A-A of Fig. 56 when the present invention is applied to QFN
- Fig. 62 is a bus bar separated for digital and analog circuits.
- FIG. 63 is a layout diagram in which the analog circuit is separated into one power supply system, and the digital circuit is separated into two power supply systems.
- Fig. 64 is the power supply of the digital circuit connected to the bus, and the analog circuit is connected to the inner lead.
- Figure 65 shows the layout of the digital circuit separated into two power supply circuits,
- Figure 66 shows the circuit diagram of Figure 65, and
- Figure 67 shows the staggered arrangement of the pads of Figure 56.
- Fig. 68 is a modified example of Fig. 67
- Fig. 69 is a cross-sectional view taken along line A-A of Fig. 68
- Fig. 70 is an IO pad, power supply, and pad alternately Fig.
- FIG. 71 shows the inside by wire bonding Partial plan view showing wire bonding when the internal step-down circuit is used in the circuit where the step-down circuit can be selected.
- Figure 72 shows the internal step-down circuit used in the circuit where the internal step-down circuit can be selected by wire bonding.
- Partial plan view showing wire bonding without wiring Figure 73 is a circuit diagram that allows selection of the internal step-down circuit, and Figure 74 is the center of the chip when the pads around the chip and the internal circuit are connected by lead-out wiring
- FIG. 75 shows a semiconductor device according to the ninth embodiment of the present invention.
- FIG. 76 is a plan view showing a lead pattern and a part of a wiring state.
- FIG. 76 shows a lead frame used in the semiconductor device shown in FIG. Form of implementation of the plan view showing an example of the structure, Figure 7 7 invention
- FIG. 78 is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device of state 10;
- FIG. 78 is a plan view showing an example of the structure of a lead frame used in the semiconductor device shown in FIG. 77; Is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device of Embodiment 11 of the present invention.
- FIG. 76 is a plan view showing a lead pattern and a part of a wiring state.
- FIG. 76 shows a lead frame used in the semiconductor device shown in FIG.
- FIG. 78 is a plan view showing an example of the structure of a lead frame used in
- FIG. 80 is a lead pattern and a part of a wiring state of the semiconductor device of Embodiment 12 of the present invention.
- FIG. 81 is a plan view showing an example of the structure of the lead frame used in the semiconductor device shown in FIG. 80, and FIG. 82 is a chip inside the semiconductor device shown in FIG.
- FIG. 83 is an enlarged partial plan view showing an example of a connection state between a circuit and a bus bar.
- FIG. 83 is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device of Embodiment 13 of the present invention.
- FIG. 84 is a plan view showing an example of the structure of a lead frame used in the semiconductor device shown in FIG. 83, and FIG.
- FIG. 85 is a view showing a part of a lead pattern and a part of the semiconductor device according to Embodiment 14 of the present invention.
- FIG. 86 is a plan view and a power supply drop diagram showing a lead pattern and a part of the wiring state in the semiconductor device of Embodiment 15 of the present invention.
- 87 is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device of Embodiment 16 of the present invention.
- FIG. 88 is a plan view showing a lead pattern in the semiconductor device of Embodiment 17 of the present invention.
- FIG. 89 is a plan view showing part of the wiring state, FIG.
- FIG. 89 is a plan view showing a lead pattern and part of the wiring state in the semiconductor device of Embodiment 18 of the present invention
- FIG. 0 is the semiconductor device shown in Fig. 89
- FIG. 91 is an enlarged partial plan view showing an example of a connection and a wire state between a circuit in a chip and a bus bar in FIG. 91.
- FIG. 91 is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device according to the embodiment 19 of the present invention.
- FIG. 92 is a plan view showing a lead pattern and a part of a wiring state in the semiconductor device according to Embodiment 20 of the present invention.
- the constituent elements are not necessarily essential unless otherwise specified and in cases where it is considered essential in principle. Needless to say.
- the semiconductor device of the first embodiment is a resin-sealed type and is assembled using a lead frame 1.
- a QFP having a relatively large number of pins is used.
- (Quad Flat Package) 6 is explained. First, the configuration of the QFP 6 shown in FIG. 1 will be described.
- a plurality of inner leads 1 b extending around the semiconductor chip 2, and the semiconductor chip 2 is mounted and joined to the tip of each of the inner leads 1 b.
- a bonding wire 4 for electrically connecting the pad 2 a which is a surface electrode formed on the main surface 2 b of the semiconductor chip 2, with the corresponding inner lead 1 b.
- the tape member 5 is joined to the wire connection surface 1f, which is the main surface of each inner lead 1b, and the tape member 5 is arranged above the inner lead 1b. Have been.
- the tape member 5 has a shape corresponding to the inner lead 1b row. Therefore, in the QFP 6, the tape member 5 has a quadrangular shape.
- the tape member 5 is insulative, and is joined to the tip of each inner lead 1b via an adhesive layer 5a formed on the tape member 5.
- the adhesive layer 5a is formed of, for example, an acrylic adhesive.
- the tape member 5 has a chip mounting function, and the semiconductor chip 2 is fixed to the chip supporting surface 5b in a region surrounded by the tips of the respective inner leads 1b via the silver paste 8. .
- the semiconductor chip 2 is mounted via the silver paste 8 on the chip supporting surface 5b opposite to the bonding surface 5c of the tape member 5 with the inner lead 1b.
- each of the four inner leads lb four corners corresponding to the corners of the semiconductor chip 2 are each provided with a corner lead 1 g extending to near the center of the tape member 5 as shown in FIG. Have been. That is, a corner corresponding to the corner of the semiconductor chip 2 is adjacent to a group of a plurality of inner leads 1 b connected by the first connecting portion 1 d corresponding to each side of the semiconductor chip 2. Lead 1 g is placed. Therefore, the tape member 5 is also supported by the four corner leads 1 g, and the semiconductor chip 2 is mounted on the four corner leads 1 g via the tape member 5 and the silver paste 8. ing.
- the tape member 5 has a first through hole 5e and a second through hole 5f.
- the first through hole 5e is formed along the column direction of the inner leads 1b adjacent to the tip of each inner lead lb. Therefore, four first through holes 5 e are formed corresponding to each side of the rectangular tape member 5.
- the second through-hole 5f is formed near the center of the QFP 6, and is arranged on the back surface 2c of the semiconductor chip 2 as shown in FIG.
- each inner lead 1 b is coated with a silver plating 7 for connecting a wire 4 such as a gold wire to a region extending from the inner end to the outer side. ing. Therefore, the silver plating 7 is covered up to the area outside the tape member 5. It must be covered to the extent that wire bonding is possible. As a result, in the QFP 6 according to the first embodiment, the wire 4 is connected to the area of the outer surface of the tape member 5 where the silver plating 7 is covered on the wire connection surface 1 f of each inner lead 1 b. Have been.
- FIG. 1 shows a case where the smallest sized semiconductor chip 2 is mounted
- FIG. 2 shows a case where the largest sized semiconductor chip 2 is mounted.
- semiconductor chips 2 of various sizes can be mounted, and the versatility of the lead frame 1 shown in FIG. 14 is enhanced.
- FIGS. 3 to 6 show the structure of the QFP 6 according to a modification of the first embodiment.
- FIGS. 3 and 4 show a QFP 6 having a structure in which a heat spreader 5 d is provided in place of the tape member 5 in FIG. 1.
- the heat spreader 5 d enhances heat dissipation. .
- an adhesive layer 5a is provided on both the front and back surfaces of the heat spreader 5d, and the inner lead 1b and the heat spreader 5d are bonded via the adhesive layer 5a.
- the chip 2 is fixed via the silver paste 8.
- Fig. 5 shows the surface excluding the cut surface of each inner lead 1b and each outer lead 1c.
- QFP 6 covered with palladium plating 9.
- FIG. 6 shows a structure in which the semiconductor chip 2 is mounted so as to protrude beyond the tape member 5 in the QFP 6 shown in FIG. That is, since the tape member 5 is disposed above the inner lead 1b, the semiconductor chip 2 mounted further above the tape member 5 can be mounted even if it is larger than the tape member 5, and the main surface 2 is larger than the tape member 5.
- 1 shows a structure in which a semiconductor chip 2 having a large b is mounted.
- a frame body 1a as shown in FIG. 7 is prepared.
- the frame body 1a is a thin metal member, and includes a plurality of inner leads 1b arranged corresponding to the rows of pads 2a of the semiconductor chip 2 to be mounted, and a plurality of inner leads 1b formed integrally therewith. Excluding the first lead 1c, the first connecting part 1d for integrally connecting the tips of the plurality of inner leads 1b to each other, and the inner lead 1b connected by the first connecting part 1d, and at least QFP.
- the other plurality of inner leads 1 b including the inner lead lb (corner lead lg) arranged at the corner of 6 are integrally connected to each other, and the second inner lead 1 b is arranged inside the first connecting portion 1 d. It has a connecting portion 1e.
- the first connecting portion 1d for connecting the tips of the plurality of inner leads 1b corresponding to one side of the semiconductor chip 2 and the first connecting portion At the approximate center of the package inside the part 1d, there is a second connecting part 1e for connecting the corner leads 1g, which are four inner leads 1b arranged at the corners.
- the frame body 1a is made of, for example, copper or the like, and the wire connection surface 1f of each inner lead 1b is formed in a region from the tip end thereof to a place where connection with the wire 4 is performed. Silver plating 7 is coated. At this time, the first connecting portion 1d is also covered with silver plating 7.
- the surface opposite to the wire connection surface 1f of the frame body 1a (hereinafter referred to as the back surface lk) is covered with silver plating 7 as shown in FIG. Not.
- the distal ends of the plurality of inner leads 1b, the first connecting portion 1d, and the second connecting portion 1 are connected to the wire connecting surfaces 1f of the plurality of inner leads 1b. e and tape member 5 are attached.
- the tape member 5 is attached to the tip of the wire connecting surface 1f of the inner lead 1b, the first connecting portion 1d, and the second connecting portion 1e.
- FIG. 10 shows the structure of the frame body 1a viewed from the back 1k side.
- first connecting portion 1d is cut along the tips of the plurality of inner leads 1b, and the second connecting portion 1e is cut.
- the cutting related to the first connecting part 1d and the cutting related to the second connecting part 1e are performed separately.
- first, the first connecting portion 1 d shown in FIG. 10 is cut, and the first connecting portion 1 d is removed from the frame body 1 a to remove the four first connecting portions 1 d.
- the through holes 5e By forming the through holes 5e, the distal ends of the inner leads 1b are made independent as shown in FIG.
- each corner lead 1 g is made independent.
- the cutting of the first connecting portion 1d and the second connecting portion 1e the second connecting portion 1e is cut and removed first, and then the cutting of the first connecting portion 1d is performed.
- the first connecting portion 1d and the second connecting portion 1e may be cut at the same time. Simultaneous cutting enables efficient cutting.
- the corners 1 g arranged at the four corners extend to near the center of the tape member 5, the strength of the tape hanging portion 5 g is increased. Degree of rigidity, and the rigidity of the entire tape member 5 can be increased. Thus, it is possible to prevent the tape member 5 from undulating at the time of cutting the second connecting portion 1e, and to improve the yield in manufacturing the lead frame 1.
- the lead frame 1 can be manufactured without lowering the yield.
- die bonding for mounting the semiconductor chip 2 on the surface of the tape member 5 opposite to the bonding surface 5c with the inner lead 1b is performed.
- a silver paste 8 is applied on the tape member 5, and the semiconductor chip 2 is fixed by the silver paste 8.
- wire bonding is performed to connect the pads 2 a of the semiconductor chip 2 and the corresponding inner leads 1 b by wires 4.
- the outer peripheral portion of the tape member 5 on the wire connecting surface 1f of the inner lead 1b has a silvered 7 Connect the wire 4 to the formation location.
- the tape member 5 is attached to the wire connection surface 1 f side of each inner lead lb, and the tape member 5 is attached above each inner lead 1 b. Since they are arranged, the respective inner leads 1b can be arranged directly on the bonding stage during wire bonding.
- the tape member 5 can be made of a relatively soft acrylic, polyimide, epoxy, rubber, or the like.
- An adhesive layer 5a such as an adhesive may be formed, and even in this case, the second bonding can be performed reliably.
- Acrylic adhesives are inexpensive, reducing the cost of leadframe 1. Can be reduced.
- the semiconductor chip 2 and the plurality of wires 4 are resin-sealed using a sealing resin to form a sealing portion 3.
- each of the plurality of outer leads 1c is cut and separated from the lead frame 1, and the outer leads 1c are bent to complete the assembly of the QFP 6.
- FIG. 15 shows the minimum chip mounting area 17 and the maximum chip mounting area 18 in the lead frame 1 shown in FIG. 13. Further, FIG. 16 shows the mounting of the smallest semiconductor chip 2.
- FIG. 17 shows a structure in which the largest semiconductor chip 2 is mounted and wire bonding is performed.
- the lead frame 1 used in the first embodiment can mount the semiconductor chips 2 of various sizes, and can enhance the versatility of the lead frame 1.
- the tape member 5 since the tape member 5 is disposed above the inner lead 1b, as shown in the QFP 6 in FIG. 6, the tape member 5 must be protruded from the tape member 5 and a semiconductor chip 2 larger than the tape member 5 must be mounted. And the versatility of the lead frame 1 can be further improved.
- FIGS. 18 and 19 show a frame body 1a of a modified example, in which the number of inner leads 1b connected by the second connecting portion 1e is increased to eight.
- the number of inner leads 1b connected by the second connecting portion 1e is increased to eight.
- the four inner leads 1b corner leads lg
- the eight inner leads 1b are connected by the second connecting portion 1e.
- the first connecting portion Id is arranged near the center between the corners. Therefore, the structure is divided on both sides, and a total of eight first connecting portions d are formed.
- the wire connection surface 1f side of the inner lead 1b is coated with silver plating 7 as in FIG.
- FIGS. 20 and 21 show a state in which the tape member 5 is attached.
- FIG. 22 shows a state in which the first connecting portion 1d is cut to form eight first through holes 5e
- FIG. 23 is a rear view thereof.
- FIG. 24 shows a state in which the second connecting portion 1 e is cut to form one second through hole 5 f to assemble the lead frame 1
- FIG. 25 is a rear view thereof. .
- the first connecting portion 1d and the second connecting portion 1e shown in FIG. 21 may be cut at the same time, or one of them may be cut first. You may cut and then cut the other.
- FIGS. 26 to 28 show the chip mountable range and the wire bonding state thereof.
- Figure 26 shows the minimum chip mounting area 17 and the maximum chip mounting area 18 of the lead frame 1 shown in Figure 24, and Figure 27 shows the mounting of the smallest semiconductor chip 2.
- FIG. 28 shows a structure in which the largest semiconductor chip 2 is mounted and wire bonding is performed.
- a total of eight inner leads 1 b including four corner leads 1 g extend to near the center of the tape member 5, so that the rigidity of the tape member 5 can be further increased.
- FIG. 29 shows a frame body 1 a for forming the lead frame 1 of the modified example shown in FIG. 31, and includes a plurality of inner leads 1 b and a plurality of arter leads 1 formed integrally therewith. c, a first connecting portion 1 d for integrally connecting the tips of the plurality of inner leads 1 b to each other, and a package adjacent to the plurality of inner leads 1 b group connected by the first connecting portion 1 d.
- the inner lead 1b (corner lead lg) arranged at the corner is connected to the first connecting part 1d, and the inner lead 1b (corner lead lg) is arranged inside the first connecting part 1d.
- a number of second connecting portions 1e is arranged.
- the corner lead 1g force provided at the four corners and the corner lead lg are not connected, but are connected via the adjacent first connection 1d and second connection 1e, respectively.
- the second connecting portion 1e is arranged so as to extend in a U-shape closer to the inner center than the first connecting portion 1d.
- the first connecting portion 1d is cut along the tips of the plurality of inner leads 1b to remove the first connecting portion 1d from the frame body 1a.
- the four first through holes 5e shown in FIG. 1 are formed, and the lead frame 1 is manufactured. That is, by cutting off the four first connecting portions 1 d in the frame body 1 a shown in FIG. 30, each of the plurality of inner leads 1 b including the It will be separated as shown.
- the lead frame 1 of the tape member 5 (each inner lead 1 b is The semiconductor chip 2 is mounted on the side opposite to the surface on which it is arranged), and wire bonding and cutting of the resin-encapsulated outer lead 1c are performed. Assemble the semiconductor device.
- the lead frame 1 of the modified example shown in FIG. 31 can increase the strength of the tape hanging portion 5 g, but the extension amount of the second connecting portion 1 e near the inner center is relatively small. Since it is small, it is effective when a high-strength tape member 5 made of glass epoxy resin or the like is used.
- FIG. 32 shows the punching direction when the first connecting portion 1 d and the second connecting portion 1 e are punched in the manufacture of the lead frame 1, and the tips of the plurality of inner leads lb are shown.
- a frame body 1a integrally formed by the first connecting portion 1d is prepared, a tape member 5 is attached to the frame body 1a, the frame body 1a is arranged on the die 13 and then, The first connecting portion 1d is punched out from the surface on the chip mounting side along the tips of the plurality of inner leads 1b by using a punching punch 12 and cut, and the first connecting portion 1d is cut from the frame body 1a to the first Remove the connection 1d.
- the cutting burrs 14 can be made to protrude from the frame body 1a or the surface opposite to the chip mounting side of the tape member 5, and the tape member 5 and the semiconductor chip can be bonded during die bonding. It is possible to prevent adverse effects such as cutting burrs 14 entering between the two.
- the punching it is preferable to coin the joint between the inner lead 1b and the tape member 5 using a block 15 or the like as shown in FIG. 33, whereby the cut formed by the cutting is cut.
- the burrs 14 can be crushed to flatten the cut portion.
- FIG. 34 shows that the tape member 5 is pasted to the frame body 1 a by using the tape member 5 on which the thermoplastic adhesive layer 5 a is formed in advance, and the inner lead 1 b and the tape member 5 are attached. The bonding of the semiconductor chip 2 and the tape member 5 is performed via a thermoplastic adhesive layer 5a. QFP 6 assembled using such a lead frame 1 is shown in a modification of FIG.
- thermoplastic adhesive layer 5a By forming the thermoplastic adhesive layer 5a on the tape member 5 in advance, a die bonding material is not required, so that the cost can be reduced and the die bonding process can be simplified.
- the base material of the tape member 5 is made of, for example, a polyimide resin having high heat resistance.
- a lead frame 1 in which a thermoplastic adhesive layer 5a is formed in advance on a tape member 5 as shown in FIG. 34, a plurality of inner leads 1b are formed. It is preferable that the tip is fixed by a dedicated jig or the like to perform die bonding. This is to prevent problems such as the thermoplastic adhesive being softened by heat during die bonding and the movement of each inner lead 1b to change the lead position.
- each inner lead 1b since the vicinity of the tip of each inner lead 1b does not need to be heated, it is possible to prevent the occurrence of troubles such as movement of each inner lead 1b and change of the lead position.
- the lead frame 1 may be manufactured using the frame body 1a in which the entire surface is previously covered with the palladium plating 9 (see FIG. 5), and the QFP 6 may be assembled using the lead frame 1.
- palladium has a higher adhesive strength to the inner lead fixing adhesive compared to copper, etc.
- the tape member 5 and the inner lead 1b are not easily peeled off at the time of punching with the punch 12 shown below.
- silver plating 7 and exterior plating are not required.
- palladium has a higher melting point than copper, etc. Can be. This makes it possible to implement Pb-free mounting.
- the semiconductor device of the second embodiment shown in FIGS. 35, 36, and 37 has a multi-pin structure in which the semiconductor chip 2 is mounted on the tape member 5, similarly to the QFP 6 of the first embodiment.
- the QFP 16 is different from the QFP 6 of the first embodiment in that the semiconductor chip 2 is mounted on the same surface as the joining surface 5c of the tape member 5 with the inner lead 1b. That is. That is, the tape member 5 is attached to the lower side of the inner lead 1b, and the semiconductor chip 2 is mounted on the tape member 5.
- bar lead that is a common lead (one bus bar lead) for strengthening (stabilizing) the power supply and ground.
- the QFP 16 of the second embodiment has a multi-pin structure and is effective for strengthening the power supply and the ground.
- the power supply and the ground exposed from the sealing portion 3 as external terminals are provided.
- the power supply and ground are strengthened (stabilized) without increasing the number of pins.
- the QFP 16 shown in FIG. 35 is composed of a first par lead 1 h, which is a ring-shaped common lead arranged inside the inner lead 1 b group, and a first par lead 1 h. h and connected at four corners, and a first through hole 5e formed between the first bar lead 1h and the tip of each inner lead 1b.
- the semiconductor chip 2 having the smallest size corresponding to the smallest mountable size is mounted on the tape member 5.
- connection by the wire 4 is performed between each pad 2a of the semiconductor chip 2 and the corresponding inner lead 1b, and furthermore, the ground / This is also performed between the power supply pad 2a and the first par lead 1h.
- FIG. 36 shows a structure in which the largest semiconductor chip 2 corresponding to the largest mountable size is mounted on the QFP 16 shown in FIG. 35.
- connection by the wire 4 is performed between each pad 2 a of the semiconductor chip 2 and the corresponding inner lead 1 b, and the ground or the ground of the semiconductor chip 2 is provided. This is also performed between the power supply pad 2a and the first bar lead 1h, and also between the first bar lead 1h and the inner lead 1b.
- the ground or power pad 2a of the semiconductor chip 2 is connected to the common ground or power terminal via the first bar lead 1h which is the common lead, and the first bar lead 1h has four Connected to an external mounting board or the like via a corner lead 1 g.
- a frame body 1a as shown in FIG. 38 is prepared.
- the frame body 1a includes a plurality of inner leads 1b arranged substantially corresponding to the rows of pads 2a of the semiconductor chip 2 to be mounted, and a plurality of data leads 1c integrally formed therewith.
- a connecting portion 1 j for integrally connecting the tips of the plurality of inner leads 1 b to each other, and the other four corners arranged at the corners adjacent to the plurality of inner leads connected by the connecting portion 1 j.
- the lead 1 g is integrally connected to each other, and has a ring-shaped first bar lead 1 h disposed inside the connecting portion 1 j.
- a connecting portion 1 j connecting the tips of the plurality of inner leads 1 b corresponding to one side of the semiconductor chip 2, and an inner side of the connecting portion 1 j.
- a ring-shaped first bar lead 1h connecting the corner leads 1g, which are four inner leads 1b arranged at the corners.
- the frame body la the area from the tip to the point where the wire connection is made on the wire connection surface 1f of each inner lead 1b including the four corner leads 1g is provided with silver plating. Is coated. At this time, the connecting part 1 j and the first pearl 1 h are also covered with silver plating 7.
- the back surface 1 k of the frame body 1 a is not covered with the silver plating 7 as shown in FIG. 38.
- Fig. 41 shows the structure of the frame 1a viewed from the back 1k side after the tape member shell divination.
- connecting portion 1j is cut along the tips of the plurality of inner leads 1b to remove the connecting portion 1j from the frame body 1a, and the four first through holes 5 as shown in FIG. form e.
- the lead frame 1 as shown in FIGS. 42 and 43 is manufactured.
- the first par lead 1h which is a common lead
- the first through holes 5e so that the chip mounting area of the tape member 5 is provided.
- the rigidity of the bar lead, which is a common lead can be improved because the rigidity of the bar lead, which is a common lead, can be increased because the corner leads 1 g arranged at the four corners are integrally connected by the ring-shaped first bar lead 1 h. .
- die bonding for mounting the semiconductor chip 2 on the same surface as the joining surface 5c of the tape member 5 with the inner lead 1b is performed.
- the semiconductor chip 2 is fixed by a silver paste 8.
- wire bonding for connecting the pads 2 a of the semiconductor chip 2 and the corresponding inner leads 1 b with the wires 4 is performed.
- the wire 4 is connected to the silver plating 7 forming portion of the wire connecting surface 1f of the inner lead 1b. I do.
- the semiconductor chip 2 and the plurality of wires 4 are resin-sealed using a sealing resin to form a sealing portion 3.
- each of the plurality of outer leads 1c is cut and separated from the lead frame 1, and the outer leads 1c are bent and formed to complete the assembly of the QFP16.
- FIG. 44 shows the minimum chip mounting area 17 and the maximum chip mounting area 18 in the lead frame 1 shown in FIG. 42
- FIG. 45 shows the mounting of the smallest semiconductor chip 2
- FIG. 46 shows a structure in which the largest semiconductor chip 2 is mounted and wire bonding is performed.
- the semiconductor chips 2 of various sizes can be mounted, and the versatility of the lead frame 1 can be improved.
- the lead frame 1 shown in FIG. 42 four corner leads 1 g are integrally connected to the ring-shaped first par lead 1 h, so that the first par lead 1 h is connected to one common power supply or one It will be used as a common ground.
- the power supply and the ground can be strengthened without increasing the number of power supply ground terminals exposed from the sealing portion 3 as external terminals.
- a common lead that is a power supply or ground bus line 50 is connected to each side of a square semiconductor chip.
- a space for eight inner leads is required. It becomes an impediment factor for the purpose of reducing or shortening the wire length.
- the rigidity of the entire tape member 5 can be increased.
- the QFP 16 of the second embodiment is very effective for a multi-pin package.
- the lead frame 1 of the modified example shown in FIG. 47 has a reduced number of pins of the lead frame 1 shown in FIG. 42, and the other structure is the same as that of FIG.
- the lead frame 1 of the modified example shown in FIG. 48 is a case where a second bar lead 1i serving as a common lead is provided outside the first bar lead 1h.
- a semiconductor device is manufactured by using a frame body 1a having a second par lead 1i having both ends connected to an inner lead 1b between a connecting portion 1j and a first bar lead 1h shown in FIG. After attaching the tape member 5 and cutting and removing the connecting portion 1j, the connecting portion 1j was connected to both ends of the second bar lead 1i of the plurality of inner leads 1b arranged in one row.
- the connecting portion 1 j is cut so that the connection between the inner lead 1 b and the second bar lead 1 i remains, and the connection between the plurality of inner leads 1 b and the connecting portion 1 j disposed inside the inner lead 1 b is lost.
- the lead frame 1 is manufactured by removing the connecting portion 1j from 1a to form four first through holes 5e.
- the connecting portion 1j is left on the tape member 5, and after the tape member 5 and the frame body 1a are pasted, the connecting portion 1j is cut. Instead, the ends of the plurality of inner leads 1b connected to the connecting portion 1j are cut along the connecting portion 1j such that the connecting portion 1j remains on the tape member 5.
- FIGS. 51 and 52 show the correspondence between the connection of the pad 2 a on the chip and the connection of the inner lead 1 b when the lead frame 1 of another modification of the second embodiment is used.
- This shows an example of the lead usage status.
- the pad number (primary side) is S (1) ⁇ '
- the lead number (secondary side) is 1 ⁇ ⁇ ⁇ 1 0 is 0.
- the leads with the meshing numbers are used as power or ground.
- FIG. 55 is a diagram related to a modified example of the case, and the structure shown in FIG. 55 is a partially enlarged plan view of the modified example shown in FIG.
- the bonding positions of the wires 4 on the inner leads and on the semiconductor chip are arranged in a staggered manner, and the loop height of the outer wire 4 is made higher than the loop height of the inner wire 4 so that the wire
- the inventor of the present invention discloses a technique for preventing a defect due to contact between wires or contact between a wire 4 and a jig for wire bonding by securing a space between wires and a position between positions where the wires 4 are bonded.
- the length of the wires 4 forming the outer loop is longer than in the case where the bonding positions of the wires 4 are arranged in a straight line. Phenomenon occurs.
- the wire 4 having a long length and a loop shape is liable to be deformed during the resin sealing step in the transfer molding method, and it is difficult to prevent a failure due to contact between the wires.
- the above invention is not limited to such a case, and one of a portion for bonding the wire 4 on the inner lead 1b and a portion for bonding the wire 4 on the semiconductor chip 2 is described. Even in the case where only the wires are arranged in a staggered manner, the effect of reducing the wire loop length can be achieved by fixing the tip of the inner lead 1 b on the tape substrate 5 and making the tip of the inner lead 1 b finer. It can be applied even when it is obtained.
- the QFPs 6 and 16 have been described as semiconductor devices. However, if the semiconductor device can be assembled using a lead frame, a modification of FIG. A QFN (Quad Flat Non-leaded Package) 10 as shown in the example may be used.
- QFN Quad Flat Non-leaded Package
- the QFN 10 is a small semiconductor package in which a part of the inner lead 1 b embedded in the sealing portion 3 is exposed as a connected portion 1 m on the back surface 3 a of the sealing portion 3. It has a structure that connects the connection part lm to the solder 11.
- the method of manufacturing the semiconductor device according to the first or second embodiment can be applied to such a small QFN 10.
- Embodiments 3 to 8 will be described.
- the present invention is applied to a Quad FlatPackage (QFP) in which gull-wing-shaped leads protrude from four side surfaces of the package.
- QFP Quad FlatPackage
- the package shape is fixed and the number of pins can be increased by reducing the lead pitch.
- the present invention is also applicable to Quad Flat No n—Leaded Package (QFN) in which the structure inside the resin-sealed package is almost the same as QFP, but the leads do not protrude from the side of the package. It is.
- QFN Quad Flat No n—Leaded Package
- the description is omitted in the embodiment since it is the same as QFP, the present invention is also applicable to a QuadFPlatKapcegewithHeatsink (HQFP) in which a heat sink is attached to the QFP.
- HQFP QuadFPlatKapcegewithHeatsink
- the semiconductor device according to the third embodiment shown in FIGS. 56 to 58 has a semiconductor chip 22, a lead 21a (an inner lead 21b, a lead 21a, a base 25 (mainly using an insulating tape member or a heat spreader base)).
- Autalead 21 c) goldtalead 21 c
- busbar 2 Id A type of QFP 26 that can be referred to as a par lead or simply a lead.
- the pass bar 21d includes ones for the digital power supplies Vd dDl, Vd dD2, V ss D, and the analog power supplies Vd dA1, Vd dA2, and Vs sA.
- the wire 24 (usually a gold wire) connecting the pad 22a and the lead 21a is short because the step between the semiconductor chip 22 and the lead 21a is small, and the contact is poor at the time of bonding. Also, the flow of the wire 24 during resin sealing hardly occurs.
- the base material 25 is bonded to the semiconductor chip 22, the lead 21a, and the bus bar 21d via an adhesive layer 25a formed on the upper surface.
- the adhesive layer 25a is made of, for example, an acrylic adhesive.
- the plurality of leads 21a and the busbars 21d are originally bonded to the base material 25 in a state of being integrated as a lead frame, and then punched together with the base material 25 at the portion where the cutout portions 21f are connected. Cut off.
- the bus bar cut part 21g integrated with the cut part 21f cuts the bus par 21d near the boundary between the digital circuit part 22c and the analog circuit part 22e to make it electrically insulated. . Since the cut part 21f and the bus bar cut part 21g are integrated, they can be punched at once.
- the bus bar cut portion 21h is based on the connected portion to cut the inner bus bar 21d (Vd dDl, Vd dD 2) integrated with the outer bus bar 2Id (V ss D). It is stamped out with the material 25.
- a plurality of leads 21 a have an analog circuit input 2 k and an analog circuit output. 2 Includes 1, digital circuit input 2 i and digital circuit output 2 j. There are also leads 21a that are connected to the power supplies (Vd dD1, Vd dD2, VssD, VddAl, VddA2, VssA).
- the semiconductor chip 22 includes a digital input / output circuit section 22b operated by a digital power supply (V dd D1, V ss D) and a digital circuit section 22c operated by a digital power supply (V dd D2, V ss D).
- Memory 22h typically SRAM: Static Random Access Memory), non-volatile ROM (Read Only Memory), etc.
- Power supply Vd dAl, V ss A
- analog input / output circuit 22 d analog power supply (Vd dA2, V ss A) operated analog circuit 22 e, and pad 22 a .
- circuits are not particularly limited, but are typically composed of N-type MOS (Metal Oxide Semiconduc) transistors and P-type MOS transistors formed on silicon chips using integrated circuit technology.
- MOS Metal Oxide Semiconduc
- the present invention is not limited to this, and may be formed by a bipolar transistor process or a Bi-CMOS process.
- the digital input / output circuit section 22b is connected to a pad 22a for supplying VddD1 and VssD via wiring (not shown).
- the digital circuit section 22 c is connected to the pad 22 a that supplies V dd D 2 and V ss D
- the analog input / output circuit section 22 d is connected to V dd A 1 and V ss A
- the analog circuit section 22 e is connected to V dd A 2 And V ss A for supplying the pad 22a.
- the outermost bus bar 2 Id (V ss D, V ss A) has a lead portion 21 e (four corners in FIG. 56) having a similar shape to the lead 21 a, and through this lead portion 21 e. Power is supplied.
- the inner bus bar 2 Id (Vd dD1, Vdd d2, VddAl, VddA2) is connected to the power supply lead 2la by wire bonding. As shown by the wires 24 near the four corners in FIG. 56, in this case, one lead 21a and the bus bar 21d are connected by two wires 24 in order to lower the impedance.
- connection position between the power supply lead 21a and the pass bar 21d is to be rotated by 90 or 180 degrees, even if the package is rotated and mounted, the power supply Since there is no danger of inverting and GND, device destruction can be prevented.
- the connection position between the power supply lead 21a and the bus bar 21d is arranged at the end of each side, but is not limited to the end.
- the leads 21a, the bus pads 21d, and the semiconductor chips 22 having the silver plating 27 on the upper surface are adhered to the upper surface of the base material 25 by the adhesive layer 25a.
- a silver paste 28 is applied to the lower surface of the semiconductor chip 22.
- Each bus par 21d and the inner lead 21b are arranged separately and insulated. After the inner lead 21b and the base material 25 are bonded, the inner lead 21b and the base material 25 are punched by the cut portion 21f.
- the pad 22a, the inner lead 21b and the bus bar 21d are connected by a wire 24 such as a gold wire by wire bonding. Further, all parts except the outer leads 21 c are sealed with the resin 23.
- the analog power supply and the digital power supply are separated and insulated by the bus bar cut section 21 g.
- FIG. 59 is a circuit diagram of the digital / analog mixed circuit of FIG.
- the digital circuit is divided into two power supplies and the analog circuit is divided into two power supplies.
- the digital first circuit unit DC1 and the digital second circuit unit DC2 are circuit units in the digital circuit unit 22c in FIG.
- the IODC which is the digital input / output circuit section 22b, receives the digital signal InD from the outside, converts the level, and sends it to the internal circuit DC2.
- the signal amplitude of the IODC is typically between VssD and VddLl, and the signal amplitude of DC2 is smaller and between VssD and VddL2.
- the signal from the internal circuit DC2 is level-converted by IODC and output to the outside.
- DC 1 exchanges digital signals with AC and DC 2 which are analog circuit sections 22 e.
- the DC 2 exchanges digital signals with the DC 1 and the IODC (digital input / output circuit unit 22b).
- DC 1 and DC 2 are circuit units in the digital circuit unit 22c of FIG.
- the analog circuit 22 e typically includes an AZD converter that converts an external analog signal InA into a digital signal and sends it to DC 1, and an analog signal that converts the digital signal from DC 1 to an analog signal.
- the A / D converter has an AZD converter analog section ADA to which an external analog signal InA is input, and an AZD converter digital section ADD that receives a signal from the ADA and outputs a signal to DC 1.
- the D / A converter consists of a D / A converter digital section DAD to which the signal from DC 1 is input, and a D / A converter analog section DA A which receives the signal from the DAD and outputs an external hair signal Out A. Including.
- VddD D2 of the digital circuit section 22c and the internal power supply VddA2 of the analog circuit section 22e are separated, the same potential is usually supplied.
- Digital times The external power supply Vd dDl of the circuit section 22c and the external power supply VddAl of the analog circuit section 22e need only satisfy Vd dDl> Vd dD2, VddA1> VddA2.
- the GND side power supply VssD of the digital circuit section 22c and the GND side power supply VssA of the analog circuit section 22e are also separated but supplied with the same potential.
- an example is shown in which the GND side is separated into digital VssD and analog VssA, but they may be common.
- Vd dAl and Vd dDl, and VssA and VssD are separated in a package sealed with the resin 23 .
- VddAl and VddD1 are connected to an external power supply V1 (high potential side)
- VssA and VssD are connected to a power supply V2 (low potential side).
- FIG. 60 is a layout diagram in the case where the present invention is applied to the QFN 30 of a type in which the outer leads 21c do not protrude on the chip surface.
- FIG. 61 is a sectional view taken along line AA of FIG. The structure is almost the same as that of QF P26, except that the lead 21a does not protrude from the side of the package. The tip of the lead 21a protrudes from the back surface of the package (the back surface in the plan view of FIG. 60), and the solder 29 is attached.
- a power supply pass bar 21 d is provided between the inner lead 21 b and the semiconductor chip 22.
- the number of pads 22a can be greatly increased. This is because the wire bonding to the bus bar 21d can be connected irrespective of the pitch of the inner leads 21b. This is because it is possible to increase the number of people.
- the power supply pad 22a By connecting the power supply pad 22a to the bus par 21d, the power supply lead 21a is greatly reduced. As a result, the number of leads 21 a that can be used for signals is increased, and the number of pads 22 a for signals is also increased.
- the pass bar 21d is separated according to the circuit arrangement in the semiconductor chip 22.
- a separate power supply can be supplied for each circuit unit.
- the circuit layout has become closer due to the miniaturization of LSIs (Large Scale Integrated circuits), and noise countermeasures have become an important issue.
- the digital circuit section 22 It is important to separate the power supply between the digital circuit 22c and the analog circuit 22e so that the noise generated by the analog circuit 22e and the noise generated by the analog circuit 22e do not affect each other. is there.
- the power supply wiring that supplies power to the circuit section (for example, VL that is the power supply wiring 22 g that supplies V dd D 2 to DC and the memory 22 h) is connected to the circuit section on the semiconductor chip 22. Even if it does not rotate along the outer circumference, a sufficient current supply capability can be obtained by connecting to the low impedance bus par 21d. Conventionally, the impedance was lowered by circling the power supply wiring VL along the outer periphery of the circuit section.As shown in Fig. 56, the signal wiring up to now has been replaced by the power supply wiring on the ring.
- the lower or upper layer of the layer was crossed and wired in a different layer from the power wiring layer, multiple types of wiring can be separated in the same wiring layer by separating and arranging the power wiring VL without going around And the number of wiring layers can be reduced. It is also possible to lay out the power supply wiring V L and the signal wiring 22 f as SL on the same wiring layer.
- the power supply wiring is circulated and the power supply layer is formed in another layer, so that the degree of freedom of the signal wiring 22 f can be increased.
- the wide bus bar 21 d can be replaced with the peripheral wiring, so that the power supply wiring area on the semiconductor chip 22 can be reduced.
- the wiring becomes relatively thin, so that the present invention is particularly effective.
- the type in which the four corners of the lead 21a are integrated with the pass bar 21d (the type in which power supply pins are arranged at the four corners as a package) is originally a semiconductor chip 22 with a pad arrangement.
- the design change of the semiconductor chip 22 is small and convenient.
- the arrangement of pad 22a is such that power supply pads V ss, V dd 1 (V dd D 1, V dd A 1), V dd 2 (V dd D2, V dd A 2) and signal pad IO are Vss, I0, I0, IO, Vddl, I0, I0, IO, Vdd2, I0, IO, IO, Vss
- V ss power supply pads
- FIG. 62 is a modified example of the layout diagram in which the pass bar 21d is separated by the digital circuit section 22c and the analog circuit section 22e in FIG. Even if the present invention is applied to the semiconductor chip 22 having a circuit arrangement different from that shown in FIG. 56, an appropriate arrangement can be obtained only by changing the position at which the bus bar 21d is separated by the cut portion 21f.
- the double wires 24 for the Vdd1 and VddAl power sources and the double wire 24 for the (1 (102 ddA2) power source are arranged adjacent to each other. In this way, wire bonding is performed at separate positions, and power is supplied from remote positions, thereby dispersing the current consumption in each circuit and further reducing the resistance. Shows the case of double, but more than that is fine.
- FIG. 63 is a modification of FIG. FIG. 2 is a layout diagram in which an analog circuit is separated into one power supply system (VddA, VssA), and a digital circuit is separated into two power supply systems (VddLl, VssDl system and VddL2, VssD2 system).
- VddA, VssA power supply system
- VddLl, VssDl system and VddL2, VssD2 system VddL2, VssD2 system.
- the outermost bus bar 21d is separated into V ss D 1 and V ss D 2 and used for digital.
- the bus bar cut part 21 g integrated with the cut part 21 f is electrically separated from the bus par 21 d by punching the corner of the outermost bus bar 21 d together with the base material 25. are doing.
- the bus bar cut portion 21h in Fig. 63 cuts the inner pass bar 21d integrated with the outer pass bar 21d (separates Vd dDl and Vd dD2, Vd dAl and Vd dA2).
- the pass bar 21d is cut near the boundary between the digital circuit section 22c and the analog circuit section 22e (separating Vd dDl and Vd d Al, Vd dD 2 and Vd d A2).
- FIG. 63 shows an example in which the outermost busbar 21d is separated by the cutout portion 21f and the integrated busbar cut portion 21g.
- the digital input / output circuit portion (IODC) 22b and the digital circuit portion (DC ) If the GND side is common in 22c, it is not necessary to separate them.
- the outermost pass bar 21d is used in a ring shape.
- FIG. 64 is a layout diagram in which the ring-shaped bus par 21 d of FIG. 56 is used for digital without making a cut.
- IODC digital input / output circuit
- DC digital circuit
- IOAC analog input / output circuit
- AC analog circuit
- the present invention when the present invention is applied, basically, only the power supply pad may be connected to the bus bar 21d without changing the conventional circuit configuration and the arrangement in the chip. Needless to say, this can be achieved by appropriately selecting the arrangement of the bus bars 21d according to the circuit arrangement configuration.
- FIG. 65 is a diagram in which the digital circuit is divided into two power supply circuit sections and laid out
- FIG. 66 is a circuit diagram of the digital circuit in FIG.
- the power supply separation as in the fourth embodiment is performed, for example, when DC 1 and DC 2 are operating at different internal voltages (the internal voltage of D 1 ⁇ the internal voltage of D 2). It is effective to protect.
- D 1 internal voltage 1.5 V
- D 2 internal voltage 3.3 V This is the case.
- the number of power supplies is smaller than that of FIG. 56, FIG. 62 and FIG.
- the number of busbars -21d may be increased, or a triple passbar 21d may be used.
- bus bar 21d Although various forms and arrangement methods of the bus bar 21d have been shown from FIG. 56 to FIG. 66, various modifications are conceivable depending on the circuit layout method without being limited to the form and method shown in the drawings.
- the ring-shaped bus bar 21d does not necessarily have to be arranged in a square shape along the sides of the chip semiconductor chip 22, and may be arranged in an octagon surrounding the semiconductor chip 22.
- the pads 22a can be arranged up to the corners of the semiconductor chip 22.
- the connection between the outer bus bar 21 d and the inner bus bar 21 d is separated.
- the bus bar cut section 21 g or the bus bar power section 21 h is not limited to the corner of the bus bar 21 d. good.
- the number of bus bars 21d may be increased or decreased according to the number of power supplies. In the embodiment, the example in which the bus bar 21d is double or triple (three to six) is shown, but the present invention is not limited to this. Since at least one bus bar 21d is effective, for example, one bus bar may be used.
- the number and shape of the plurality of leads 21a shown in the figure are not limited to these, and various types can be considered. Further, the shape and size of the semiconductor chip 22 are not limited to the example shown in the present embodiment, and can be realized using various chips.
- FIG. 67 shows that the pads 22a of the semiconductor device of FIG. 56 are arranged in a zigzag pattern.
- FIG. 4 is a diagram showing wire bonding in a staggered manner to the bus bar 21 b and the bus bar 21 d. A part of the wire bonding is shown in an enlarged view.
- the power supply pad 22 a connected to the pass bar 21 d by the wire 24 is arranged on the first column L 1, and the signal pad 22 a connected to the inner lead 21 b is It is located on the second row L2.
- FIG. 68 is a modification of FIG. 67
- FIG. 69 is a cross-sectional view taken along line AA of FIG.
- a double-type bus bar 21 d separated by four sides was used.
- the signal pad 22 a connected to the inner lead 21 b by the wire 24 is arranged in L1 on the first row on the chip end side, and connected to the bus bar 21 d.
- the power supply pad 22a is arranged on the second row L2 inside the chip. In this case, both the signal pad 22a and the power supply pad 22a can be prevented from having a long wire bonding distance.
- Fig. 67 to Fig. 69 show examples of pad staggered arrangement.
- the number of bus bars 21d may be increased or decreased according to the number of power supplies, and bus par 21d may not be placed on all sides. good.
- the shape is not limited to the illustrated one, and various modifications can be considered.
- the pads 22a of the entire chip need not be arranged in a zigzag pattern, but may be a part.
- the signal pad 22a is located on the inside, but may be on the chip end side.
- the signal pad 22a is located on the chip end side, but may be located on the inside. .
- FIG. 70 is a diagram in which signal pads 22a (IO) and power supply pads 22a (Vdd, Vss) are alternately arranged.
- Bus par 2 1 d for power supply between inner lead 2 1 b and semiconductor chip 22 The number of power supply pads 22a can be greatly increased by providing the power supply. As a result, the power supply pads 22a, which are conventionally arranged every few pads, can be arranged every other pad, and the power supply can be strengthened. Furthermore, crosstalk noise between signals can be removed. ⁇ Also, it is sufficient to fix the NC (non-connect) pins that are left over by the power supply bus to the appropriate power supply on the lead side, thereby increasing the distance between signals, reducing interference noise, or when operating the input / output buffer. Needless to say, this is effective in reducing power supply noise.
- FIGS. 67 to 69 show the case where the pads 22a are arranged in a staggered manner and the wire bonding positions of the bus bars 21d and the inner leads 21b are also in a staggered manner, as shown in FIG. 70. Wire bonding may be staggered only on the b side.
- FIG. 71 and FIG. 72 are layout diagrams of a circuit in which the internal step-down circuit can be selected or non-selectable by wire bonding.
- the method of wire bonding differs between the case where the internal step-down circuit 22i shown in FIG. 71 is used and the case where the internal step-down circuit 22i shown in FIG. 72 is not used.
- the internal power supply wiring 22 k (Vdd 2 AL) connected to the circuit section A is separated from the internal power supply wiring 22 j (Vdd 2 BL) connected to the circuit section B.
- the external power supply Vddl is stepped down to Vdd2A using the internal step-down circuit 22i and supplied to the circuit section A.
- a lead 24 a for supplying the external power supply V ddl is connected to a bus bar 21 d for supplying Vd dl via a wire 24, and a pad A 22 p connected to the bus bar 21 d for supplying V dd 1 and the internal step-down circuit 22 i Is connected.
- the package KB 22 q connected to the internal step-down circuit 22 i via the internal power supply wiring 22 k (Vd d 2 AL) is used to supply Vdd 2 A for supplying the internal power Vdd 2 A to the circuit section A. Bonded to busbar 21d.
- the internal power is supplied to the circuit unit A from the pass bar 21 d for supplying Vdd 2 A without using the internal step-down circuit 22 i.
- the bus bar 21 d for supplying Vdd 2 A and the pad B 22 q are connected in the same manner as in FIG. Unlike Fig. 71, the internal power
- the lead 21a to which the source Vdd2A is supplied and the pass bar 21d for supplying Vdd2A are connected.
- the pad A22p is not wire-bonded, but may be connected to a bus bar 21d for supplying Vdd2A power.
- FIG. 73 is a circuit diagram of the selectable internal step-down circuit 22i of FIGS. 71 and 72. Although the internal step-down circuit 22i in FIGS. 71 and 72 is shown in a schematic diagram, a specific example is shown here. P 1 and P 2 indicate P-type MOS transistors, and N 1 indicates an N-type MOS transistor.
- the pad A 22p is bonded to the high-potential side H (Vdd1).
- Vdd1 the high-potential side H
- P1 is turned off
- N1 is turned on
- the comparison circuit 22r operates between Vddl and Vss.
- P2 reduces Vdd1 to VddD2 and supplies it to the digital circuit section 22c (see FIG. 56) which is an internal circuit.
- FIGS. 71 to 73 the internal step-down circuit 22i connected to the circuit A has been described as an example, but the present invention can be applied to other internal circuits in a similar manner.
- FIG. 7 is a layout diagram in a case where the pad 22a at the end and the bus bar 21d are wire-bonded in two steps.
- a lead wire from the memory (ME) 22 is connected to a bus bar 21 d for supplying Vdd2.
- the pad 22a provided in the analog circuit section (AC) 22e is directly wire-bonded to the bus bar 21d for supplying Vd dA2.
- the pad 22a provided in the digital circuit (DC) 22c is used to supply V dd D 2
- the wire is bonded to the pass pad 21 d for supplying V dd D 2 via the pad 22 a of the pad.
- the connection method as described above can reduce the impedance since the diameter of the wire 24 and the bus bar 21 d are larger in area than the wiring width in the chip, and have the effect of reducing the power supply drop of the internal circuit. . This is effective in addition to the power ring that normally circulates around the circuit, especially when there is a problem of power drop in the internal circuit.
- the pass bar 21 d is effective for power supply, but the pad 22 a of the semiconductor chip 22 is fixed at a predetermined level on the manufacturing side. It is needless to say that this bus par 21d can be used as a level fixing terminal.
- the plan views explaining the respective lead patterns in the semiconductor devices (QFPs) of Embodiments 9 to 20 show the connection state of the wires 24 of only some of the pads 22 a of the semiconductor chip 22. However, for the sake of explanation, the connection state of the wire 24 of the other pad 22a is omitted, but the wire 24 is actually connected to the other pad 22a (however, Wire 24 may not be connected to all pads 22a, and there may be non-contact pads 22a) o
- the semiconductor chip 22 in which the power supply pads 22a are relatively gathered at the corners is mounted.
- the power supply pads 22a at the corners are connected to the bus bar.
- 21 d is connected to the wire 24, and the wire 24 is connected to the inner lead 21 b disposed near the corner.
- the angle of entry of the wire 24 into the pad 22a of the semiconductor chip 22 can be reduced, and the pad interval near the chip corner can be reduced. As a result, the number of pads that can be arranged can be increased.
- the pad 22a and the inner lead 21b are not directly connected by the wire 24 but are connected via the pass bar 21d.
- the wire 24 can be shortened, and the wire flow during resin sealing can be reduced.
- FIG. 76 shows the structure of the lead frame 1 used in the semiconductor device shown in FIG. 75.
- the chip mounting area of the tape member 5, that is, the innermost ring-shaped bus bar 21d is shown in FIG.
- a tab 21 i serving as a chip mounting portion is attached to the inner area.
- the tab 2 1 i is connected to the four suspension leads 2 1 j, but the suspension lead 2 1] is separated from the innermost ring-shaped bus bar 2 1 d by the suspension lead cut section 21 k Being insulated.
- the tabs 21 i and the suspension leads 21 j made of a metal plate such as copper are attached to the chip mounting area of the tape member 5 in this manner, the strength of the chip mounting area of the tape member 5 can be increased. Thus, the flatness of the tape member 5 can be improved, and the die bonding property can be improved.
- the frame structure shown in FIG. 76 has a small tab structure in which the size of the tabs 21 i is smaller than the main surface of the semiconductor chip 22. Since 23 (see FIG. 56) goes around the back surface of the chip, the degree of adhesion between the resin 23 and the back surface of the chip can be improved, and the reflow crack resistance of the semiconductor device (QFP) can be improved.
- the lead pattern of the semiconductor device shown in FIG. 77 has a quadruple pass bar 21 d arranged around the semiconductor chip 22, and the resin sealing body shown in FIG.
- Five busbars 21 d are drawn out from almost the center in the lead arrangement direction on each of the four sides, and are connected to the outer leads 21c, respectively, and one busbar 21 is also provided at each of the four corners. d is pulled out each Is connected to the Autalead 21c. That is, the structure is such that the power supply pins are gathered and arranged mainly near the center on each side of the resin 23 of the semiconductor device.
- the width as a group of busbars 21 d (for five busbars) can be increased, so that the lead resistance can be reduced, and the L component can be reduced. Can be improved.
- the plurality of pass bars 2 through the outer leads 21c for the power supply and the plurality of wires 24 are provided. 1 d, and from each bus bar 2 1 d to the power supply pad 2 2 a via the wire 24, the wire connection to the power supply pad 22 a can be connected at any position can do.
- the position of the power supply pad 22a can be arranged at a suitable position and the power supply pad 22a can be connected to the pass bar 21d at the nearest position, thereby reducing the wiring resistance. Can be achieved.
- the frame structure shown in FIG. 78 also has a structure in which a tab 21 i made of a metal plate and a suspension lead 21 j are attached to the chip mounting area of the tape member 5.
- the flatness and die-bonding properties can be improved by increasing the strength of the chip mounting area.
- the four suspension leads 21j supporting the tabs 21i and the innermost busbars 21d are connected, so that the strength of the tape member 5 can be further increased. Can be. Since the tab 21i is connected to the innermost busbar 21d via the suspension lead 21j, an insulating die bond material should be used when insulating the chip back surface from the tab 21i. When electrically connecting the back surface of the chip and the tab 21i, use a conductive die bonding material.
- the frame structure shown in FIG. 78 also has a small tab structure, the degree of adhesion between the resin 23 and the back surface of the chip can be improved, and the reflow and crack resistance of the semiconductor device (QFP) can be improved. Can be achieved.
- the lead pattern of the semiconductor device shown in FIG. 79 is a case where four power supply pins (Vdd, Vss, Vddq, Vssq) are arranged at the four corners of the semiconductor device in the lead pattern shown in FIG. .
- the angle of entry of the wire 24 into the pad 22a of the semiconductor chip 22 can be reduced, and the pad interval in the vicinity of the chip corner can be reduced. As a result, the number of pads that can be arranged can be increased.
- the number of power supply pads 22a can be reduced.
- the power supply pins are arranged at four corners, power can be supplied from the four corners, and the power supply operation margin of the circuit can be secured by balancing the amount of potential drop.
- the lead pattern of the semiconductor device illustrated in FIG. 80 is a case where power is supplied from one corner of the semiconductor device.
- the A circuit (point A in Fig. 80) is located near the power supply side as shown in Fig. 82, and is far from the supply side! Compare the changes in the power supply potentials of V dd and V ss with the B circuit (point B in Fig. 80) and the B circuit arranged on the opposite side (point B in Fig. 80). As the distance from the supply side increases from point to point B, Vdd decreases, Vss increases, and the width of both decreases, but the reference level (Vr ef.) Can be kept constant at the center and V ref When the is input from outside, the symmetry of the power supply can be improved in terms of reference.
- the circuit A and the circuit B are suitable for a circuit in which a reference level is externally input and used, for example, an analog circuit or a differential amplifier circuit (a comparison circuit 22r shown in FIG. 73).
- the power may be supplied from two or more adjacent auta leads 21c through the pass bar 21d.
- the wire 24 may be directly connected to the inner lead 21b.
- FIG. 81 shows the structure of the lead frame 1 used in the semiconductor device shown in FIG. 80.
- the chip mounting area of the tape member 5, that is, the inside of the inner ring-shaped bus bar 21 d is shown.
- a tab 21 i as a chip mounting portion is attached to the area.
- the tab 21 i has a large tab structure having a size substantially equal to or larger than the semiconductor chip 22, and is separated from the inner ring-shaped pass bar 21 d by a suspended lead cut portion 21 k. Insulated.
- the tab 21 i made of a metal plate such as copper is attached to the chip mounting area of the tape member 5 in this manner, the strength of the chip mounting area of the tape member 5 can be increased, and Since the area of the large tab is much larger than that of the small tab structure of 76, the strength of the tape member 5 can be further improved, and its flatness and die bonding property can be further improved.
- the area is large, so that the heat generated from the semiconductor chip 22 can be sufficiently diffused, and the heat dissipation of the semiconductor device can be improved. .
- a conductive adhesive such as an Ag paste or a bonding agent containing conductive particles. Also, as shown in FIG. 81, even when a conductive adhesive or an adhesive containing conductive particles is used as the adhesive for bonding the semiconductor chip 22 onto the tab 21 i, as shown in FIG.
- the lead pattern of the semiconductor device shown in FIG. 83 is a case where power is supplied from two opposing corners of the semiconductor device.
- the potential at point C at the intermediate position has a lower V dd and a higher V ss, so it is compared to the structure where power is supplied from one corner as shown in Figure 80.
- the power supply drop amount can be reduced.
- FIG. 84 shows the structure of the lead frame 1 used in the semiconductor device shown in FIG. 83.
- the tab 21 i made of a metal plate such as copper has almost the same structure as the semiconductor chip 22. Large tab structure of the size of or larger.
- the tap 21i is connected by an inner ring-shaped bus bar 21d and four suspension leads 21j.
- the strength of the tape member 5 can be further increased, and the flatness and the die The bonding property can be further improved.
- the heat generated from the semiconductor chip 22 can be sufficiently diffused, and the heat dissipation of the semiconductor device can be improved.
- a conductive adhesive such as an Ag paste or a bonding agent containing conductive particles.
- conductive paste such as Ag paste is used.
- the substrate potential of the semiconductor chip 22 is shared with the potential of the inner bus bar 21 d. can do.
- the semiconductor chip 22 when the semiconductor chip 22 is mounted on the tab 21 i via an insulating adhesive, the semiconductor chip is used as an insulating film by using the adhesive as an insulating film. Since a capacitance can be formed between the substrate potential of the semiconductor chip 22 and the tab 21 1 i, the substrate potential of the semiconductor chip 22 can be further stabilized, and the substrate potential of the semiconductor chip 22 and the tab 2 1 i can be formed. Since the potential of 1 i is separated, the degree of freedom in designing the semiconductor chip 22 can be improved.
- the common V ss power supply is taken out from the bus bar 21 d to four corners and connected to the outer leads 21 c, respectively, and the V dd power supplies are independent. It has a structure in which each corner is taken out from the bus bar 21d and connected to the outer lead 21c.
- V dd increases from point A to point B, while V s s increases at the intermediate potential of point C, and then decreases again toward point B. .
- the lead pattern of the semiconductor device shown in Fig. 86 is for the case where power (V dd, V ss) is supplied only from the center of one side of the semiconductor device. Potential rises, and V dd falls.
- the reference level (Vref.) can be kept constant at the center, and the symmetry of the power supply can be improved. Therefore, it is suitable for a circuit that uses a reference level inputted from outside, for example, an analog circuit or a differential amplifier circuit (a comparison circuit 22r shown in FIG. 73).
- the power supply side is not limited to one, and power may be supplied from two or four places, and the number of supply points may be increased to achieve low resistance.
- the lead pattern of the semiconductor device shown in FIG. 87 is obtained by separating a bus par 21 d for an analog circuit and a bus par 21 d for a digital circuit by a bus bar cut 21 g.
- the analog circuit pass par 21 d is separated from the digital circuit pass bar 21 d, thereby preventing the noise generated from the digital signal from being picked up by the analog signal. Power supply crosstalk can be reduced.
- the lead pattern of the semiconductor device shown in FIG. 88 is obtained by separating the bus bar 21 d for the analog circuit and the bus par 21 d for the digital circuit by the bus bar cut portion 21 g. Also, an outer lead 21c connected to a bus par 21d for digital circuits on three sides is disposed at the center of the lead row, while one side other than the three sides is connected to a busper 21d for analog circuits. The outer lead 21c is located in the center of the lead row.
- the power is supplied from the opposite sides.
- a power supply lead 21 c drawn from one of the power supply bus bars 21 d at one corner is provided. One of them is arranged, and the other power supply lead 21c drawn from the power supply bus bar 21d is arranged at the opposite corner diagonally opposite to the corner, and is used for a plurality of signals.
- power is supplied to the A circuit and the B circuit from a pair of the outer leads 21c disposed on both sides of the outer lead 21c.
- the circuit A is a circuit arranged in a chip near the point A
- the circuit B is a circuit arranged in a chip near the point B.
- the power supply potential of both V dd and V ss falls from point A to point B, so that the amount of drop of both power supplies is equalized, that is, V
- the amplitude between dd and V ss can be almost constant, and Variations in speed and the like due to a decrease in signal amplitude on the road can be reduced.
- the driving power of the power supply can be increased, which is suitable for, for example, a logic circuit.
- power may be supplied from the four corners, and a pair of power supplies may be used for the analog circuit, so that the influence from the logic circuit can be avoided.
- the lead pattern of the semiconductor device illustrated in FIG. 91 has a structure in which a pair of power supplies (Vdd, Vss) are both supplied from four corners.
- two outer leads 21c connected to the bus bar 21d of a pair of power supplies (Vdd, Vs's) are arranged adjacent to each of the four corners, and from each of the four corners. It has a structure to supply a pair of power supplies (Vdd, Vss).
- the lead pattern of the semiconductor device shown in FIG. 92 is obtained by separating a bus bar 21 d for supplying a pair of power supplies (Vdd, Vss) into a digital system and an analog system by a pass bar cut section 21 g.
- a plurality of outer leads 21c connected to these bus bars 21d are arranged at each of the four corners.
- three digital corners are provided with a pair of digital leads 21c connected to an outer lead 21c, and the other corner is provided with a pair of analog type pass bars 21d.
- An auta lead 21c is connected to the terminal.
- the bus bar 21 surrounding the semiconductor chip 22 has been described by taking as an example the case where the bus bar 2 1 d force S is double and triple is quadruple. , As long as it includes at least a pair of bus pars 2 1 d
- the semiconductor device of the present invention is suitable for a semiconductor package having an outer lead connected to a pass bar, and is particularly suitable for a semiconductor package in which the outer lead extends in four directions.
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003234812A AU2003234812A1 (en) | 2002-06-05 | 2003-05-16 | Semiconductor device |
JP2004512196A JP4149438B2 (ja) | 2002-06-05 | 2003-05-16 | 半導体装置 |
US10/516,417 US7482699B2 (en) | 2002-06-05 | 2003-05-16 | Semiconductor device |
US12/340,733 US20090108422A1 (en) | 2002-06-05 | 2008-12-21 | Semiconductor device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002163743 | 2002-06-05 | ||
JP2002-163743 | 2002-06-05 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/340,733 Continuation US20090108422A1 (en) | 2002-06-05 | 2008-12-21 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003105226A1 true WO2003105226A1 (ja) | 2003-12-18 |
Family
ID=29727550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/006151 WO2003105226A1 (ja) | 2002-06-05 | 2003-05-16 | 半導体装置 |
Country Status (7)
Country | Link |
---|---|
US (2) | US7482699B2 (ja) |
JP (1) | JP4149438B2 (ja) |
KR (1) | KR100958400B1 (ja) |
CN (2) | CN100377347C (ja) |
AU (1) | AU2003234812A1 (ja) |
TW (1) | TW200409331A (ja) |
WO (1) | WO2003105226A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012109411A (ja) * | 2010-11-17 | 2012-06-07 | Canon Inc | 半導体装置及び半導体装置を搭載したプリント基板 |
TWI819960B (zh) * | 2023-02-03 | 2023-10-21 | 瑞昱半導體股份有限公司 | 能夠增加干擾源之間的隔離度的積體電路封裝結構 |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7863737B2 (en) * | 2006-04-01 | 2011-01-04 | Stats Chippac Ltd. | Integrated circuit package system with wire bond pattern |
TWI301316B (en) * | 2006-07-05 | 2008-09-21 | Chipmos Technologies Inc | Chip package and manufacturing method threrof |
TWI302373B (en) * | 2006-07-18 | 2008-10-21 | Chipmos Technologies Shanghai Ltd | Chip package structure |
CN101170104B (zh) * | 2006-10-25 | 2010-05-12 | 南茂科技股份有限公司 | 导线架中具有多段式汇流条的堆叠式芯片封装结构 |
CN101170103B (zh) * | 2006-10-25 | 2010-05-12 | 南茂科技股份有限公司 | 导线架中具有汇流架的堆叠式芯片封装结构 |
JP4353257B2 (ja) * | 2007-02-20 | 2009-10-28 | セイコーエプソン株式会社 | 集積回路装置及び電子機器 |
US20080217759A1 (en) * | 2007-03-06 | 2008-09-11 | Taiwan Solutions Systems Corp. | Chip package substrate and structure thereof |
JP2008294278A (ja) * | 2007-05-25 | 2008-12-04 | Fujitsu Microelectronics Ltd | 半導体装置、リードフレーム、及び半導体装置の実装構造 |
US8283757B2 (en) * | 2007-07-18 | 2012-10-09 | Mediatek Inc. | Quad flat package with exposed common electrode bars |
US7847376B2 (en) * | 2007-07-19 | 2010-12-07 | Renesas Electronics Corporation | Semiconductor device and manufacturing method of the same |
JP5155644B2 (ja) * | 2007-07-19 | 2013-03-06 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP5126231B2 (ja) * | 2007-08-10 | 2013-01-23 | 富士通セミコンダクター株式会社 | 半導体素子の選別取得方法、半導体装置の製造方法及び半導体装置 |
JP2009099709A (ja) * | 2007-10-16 | 2009-05-07 | Nec Electronics Corp | 半導体装置 |
JP5130566B2 (ja) * | 2008-07-01 | 2013-01-30 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP5107839B2 (ja) * | 2008-09-10 | 2012-12-26 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US8383962B2 (en) * | 2009-04-08 | 2013-02-26 | Marvell World Trade Ltd. | Exposed die pad package with power ring |
JP2010258366A (ja) * | 2009-04-28 | 2010-11-11 | Renesas Electronics Corp | 半導体装置 |
US8786063B2 (en) * | 2009-05-15 | 2014-07-22 | Stats Chippac Ltd. | Integrated circuit packaging system with leads and transposer and method of manufacture thereof |
US8553420B2 (en) | 2010-10-19 | 2013-10-08 | Tessera, Inc. | Enhanced stacked microelectronic assemblies with central contacts and improved thermal characteristics |
US8633576B2 (en) | 2011-04-21 | 2014-01-21 | Tessera, Inc. | Stacked chip-on-board module with edge connector |
US8304881B1 (en) | 2011-04-21 | 2012-11-06 | Tessera, Inc. | Flip-chip, face-up and face-down wirebond combination package |
US8928153B2 (en) | 2011-04-21 | 2015-01-06 | Tessera, Inc. | Flip-chip, face-up and face-down centerbond memory wirebond assemblies |
US9013033B2 (en) | 2011-04-21 | 2015-04-21 | Tessera, Inc. | Multiple die face-down stacking for two or more die |
US8952516B2 (en) | 2011-04-21 | 2015-02-10 | Tessera, Inc. | Multiple die stacking for two or more die |
US8970028B2 (en) | 2011-12-29 | 2015-03-03 | Invensas Corporation | Embedded heat spreader for package with multiple microelectronic elements and face-down connection |
JP2013149779A (ja) * | 2012-01-19 | 2013-08-01 | Semiconductor Components Industries Llc | 半導体装置 |
US9666730B2 (en) * | 2014-08-18 | 2017-05-30 | Optiz, Inc. | Wire bond sensor package |
US9754861B2 (en) * | 2014-10-10 | 2017-09-05 | Stmicroelectronics Pte Ltd | Patterned lead frame |
JP6507779B2 (ja) * | 2015-03-26 | 2019-05-08 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、および電子機器 |
US10109563B2 (en) | 2017-01-05 | 2018-10-23 | Stmicroelectronics, Inc. | Modified leadframe design with adhesive overflow recesses |
JP6768569B2 (ja) * | 2017-03-21 | 2020-10-14 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
US11996299B2 (en) * | 2018-10-23 | 2024-05-28 | Mitsubishi Electric Corporation | Methods for manufacturing a semiconductor device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05243472A (ja) * | 1992-02-27 | 1993-09-21 | Nec Ic Microcomput Syst Ltd | 半導体集積回路 |
JPH0637131A (ja) * | 1992-07-15 | 1994-02-10 | Hitachi Ltd | 半導体集積回路装置 |
JPH06252328A (ja) * | 1993-02-23 | 1994-09-09 | Mitsubishi Electric Corp | 半導体素子搭載用のリードフレーム |
US20020053729A1 (en) * | 2000-08-30 | 2002-05-09 | Kumiko Takikawa | Semiconductor device |
US6396142B1 (en) * | 1998-08-07 | 2002-05-28 | Hitachi, Ltd. | Semiconductor device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09252072A (ja) | 1996-03-15 | 1997-09-22 | Shinko Electric Ind Co Ltd | 多層リードフレームおよびその製造方法 |
JPH1154658A (ja) | 1997-07-30 | 1999-02-26 | Hitachi Ltd | 半導体装置及びその製造方法並びにフレーム構造体 |
JPH11168169A (ja) | 1997-12-04 | 1999-06-22 | Hitachi Ltd | リードフレームおよびそれを用いた半導体装置ならびにその製造方法 |
JP3077668B2 (ja) * | 1998-05-01 | 2000-08-14 | 日本電気株式会社 | 半導体装置、半導体装置用リードフレームおよびその製造方法 |
JP3619773B2 (ja) | 2000-12-20 | 2005-02-16 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
JP2002270723A (ja) | 2001-03-12 | 2002-09-20 | Hitachi Ltd | 半導体装置、半導体チップおよび実装基板 |
US6476506B1 (en) * | 2001-09-28 | 2002-11-05 | Motorola, Inc. | Packaged semiconductor with multiple rows of bond pads and method therefor |
-
2003
- 2003-05-16 US US10/516,417 patent/US7482699B2/en not_active Expired - Fee Related
- 2003-05-16 CN CNB038166232A patent/CN100377347C/zh not_active Expired - Fee Related
- 2003-05-16 JP JP2004512196A patent/JP4149438B2/ja not_active Expired - Fee Related
- 2003-05-16 KR KR20047019630A patent/KR100958400B1/ko not_active IP Right Cessation
- 2003-05-16 AU AU2003234812A patent/AU2003234812A1/en not_active Abandoned
- 2003-05-16 WO PCT/JP2003/006151 patent/WO2003105226A1/ja active Application Filing
- 2003-05-16 CN CNB2007100914563A patent/CN100508175C/zh not_active Expired - Fee Related
- 2003-06-05 TW TW92115248A patent/TW200409331A/zh not_active IP Right Cessation
-
2008
- 2008-12-21 US US12/340,733 patent/US20090108422A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05243472A (ja) * | 1992-02-27 | 1993-09-21 | Nec Ic Microcomput Syst Ltd | 半導体集積回路 |
JPH0637131A (ja) * | 1992-07-15 | 1994-02-10 | Hitachi Ltd | 半導体集積回路装置 |
JPH06252328A (ja) * | 1993-02-23 | 1994-09-09 | Mitsubishi Electric Corp | 半導体素子搭載用のリードフレーム |
US6396142B1 (en) * | 1998-08-07 | 2002-05-28 | Hitachi, Ltd. | Semiconductor device |
US20020053729A1 (en) * | 2000-08-30 | 2002-05-09 | Kumiko Takikawa | Semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012109411A (ja) * | 2010-11-17 | 2012-06-07 | Canon Inc | 半導体装置及び半導体装置を搭載したプリント基板 |
TWI819960B (zh) * | 2023-02-03 | 2023-10-21 | 瑞昱半導體股份有限公司 | 能夠增加干擾源之間的隔離度的積體電路封裝結構 |
Also Published As
Publication number | Publication date |
---|---|
CN1669138A (zh) | 2005-09-14 |
TWI298533B (ja) | 2008-07-01 |
US20060186528A1 (en) | 2006-08-24 |
CN101026142A (zh) | 2007-08-29 |
TW200409331A (en) | 2004-06-01 |
KR100958400B1 (ko) | 2010-05-18 |
AU2003234812A8 (en) | 2003-12-22 |
AU2003234812A1 (en) | 2003-12-22 |
KR20050026397A (ko) | 2005-03-15 |
US7482699B2 (en) | 2009-01-27 |
US20090108422A1 (en) | 2009-04-30 |
CN100508175C (zh) | 2009-07-01 |
JPWO2003105226A1 (ja) | 2005-10-13 |
JP4149438B2 (ja) | 2008-09-10 |
CN100377347C (zh) | 2008-03-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003105226A1 (ja) | 半導体装置 | |
US6348400B1 (en) | Method and apparatus for implementing selected functionality on an integrated circuit device | |
US5530292A (en) | Semiconductor device having a plurality of chips | |
US8212343B2 (en) | Semiconductor chip package | |
EP2104142B1 (en) | Semiconductor chip package | |
JPH113984A (ja) | 半導体集積回路装置 | |
JP2004363458A (ja) | 半導体装置 | |
US6329710B1 (en) | Integrated circuit package electrical enhancement | |
US20060081972A1 (en) | Fine pitch grid array type semiconductor device | |
JP2983620B2 (ja) | 半導体装置及びその製造方法 | |
JPH10173087A (ja) | 半導体集積回路装置 | |
JP2012084817A (ja) | 半導体装置 | |
KR950014121B1 (ko) | 반도체 장치 | |
JPS6240752A (ja) | 半導体装置 | |
JPH09148478A (ja) | 半導体集積回路装置 | |
KR20060046922A (ko) | 고속 신호 처리가 가능한 반도체 칩 패키지 | |
JPH04163952A (ja) | 樹脂封止型半導体装置用リードフレーム | |
JP2006128331A (ja) | 半導体装置 | |
JPH0595018A (ja) | 半導体装置の製造方法 | |
JPH08316403A (ja) | リードフレームおよびそれを用いた半導体集積回路装置 | |
JPH06224253A (ja) | 半導体装置 | |
JP2005303185A (ja) | 半導体装置 | |
JPH03171759A (ja) | 半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004512196 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020047019630 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20038166232 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 1020047019630 Country of ref document: KR |
|
122 | Ep: pct application non-entry in european phase | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2006186528 Country of ref document: US Ref document number: 10516417 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 10516417 Country of ref document: US |