WO2001097278A1 - Solder bump and wire bonding by infrared heating - Google Patents
Solder bump and wire bonding by infrared heating Download PDFInfo
- Publication number
- WO2001097278A1 WO2001097278A1 PCT/US2000/032700 US0032700W WO0197278A1 WO 2001097278 A1 WO2001097278 A1 WO 2001097278A1 US 0032700 W US0032700 W US 0032700W WO 0197278 A1 WO0197278 A1 WO 0197278A1
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- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- bonding
- die
- heating
- flip
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/1579—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
Definitions
- a first die is attached to a substrate, such as a metal lead frame or a laminated plastic or ceramic circuit board, as with epoxy or polyimide paste or film tape, and a second die is attached to the top surface of the first die, also with epoxy or polyimide paste or film tape.
- a wire bonding operation is then carried out, wherein gold or copper wires are fused to bonding pads on the top surfaces of the substrate and the dies, typically using ultrasonics and heat.
- a heater block is commonly employed to conductively preheat the substrate from the bottom.
- the wire bonding i.e., soldering of the wire ends
- the substrate is a thin metal lead frame having good heat conductivity, such as a copper lead frame
- this conventional methodology is problematic for other types of substrates.
- thick laminated plastic or ceramic substrates that are slower to heat up may not be brought up to the proper temperature for wire bonding by the block heater within the available time period for pre- heating (e.g., about 4 seconds or less, depending on the speed of the wire bonder and the number of wires per die assembly).
- the intensity and wavelength of infrared heaters 230 is determined such that the desired temperature profile is achieved; e.g., the temperature of substrate top surface 240a reaches the bonding temperature of about 200 degrees Centigrade within the necessary ramp-up time of, e.g., about 0.66 seconds, depending on the speed of die bonder 200 and the desired throughput.
- the wavelength of the infrared radiation is determined by the material of substrate 240.
- Conductive heater 210 is used in conjunction with infrared heaters 230 to facilitate achievement of the desired die bonding temperature and temperature profile. Referring now to Fig. 2A, in operation, substrate 240 is pre-heated by conductive heater
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020077003602A KR100747134B1 (ko) | 2000-06-12 | 2000-12-01 | 적외선 가열에 의한 솔더 범프 및 와이어 본딩 |
| EP00988009A EP1290725A1 (en) | 2000-06-12 | 2000-12-01 | Solder bump and wire bonding by infrared heating |
| KR1020027016900A KR100747131B1 (ko) | 2000-06-12 | 2000-12-01 | 적외선 가열에 의한 솔더 범프 및 와이어 본딩 |
| JP2002511381A JP2004503939A (ja) | 2000-06-12 | 2000-12-01 | 赤外線加熱によるはんだバンプおよびワイヤボンディング |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/592,275 US6384366B1 (en) | 2000-06-12 | 2000-06-12 | Top infrared heating for bonding operations |
| US09/592,275 | 2000-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2001097278A1 true WO2001097278A1 (en) | 2001-12-20 |
Family
ID=24370021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2000/032700 Ceased WO2001097278A1 (en) | 2000-06-12 | 2000-12-01 | Solder bump and wire bonding by infrared heating |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6384366B1 (enExample) |
| EP (1) | EP1290725A1 (enExample) |
| JP (1) | JP2004503939A (enExample) |
| KR (2) | KR100747134B1 (enExample) |
| CN (1) | CN1229857C (enExample) |
| TW (1) | TW529111B (enExample) |
| WO (1) | WO2001097278A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8444044B2 (en) | 2008-03-10 | 2013-05-21 | Micron Technology, Inc. | Apparatus and methods for forming wire bonds |
| WO2019168902A1 (en) * | 2018-02-28 | 2019-09-06 | Raytheon Company | A system and method for reworking a flip chip mounted on an electronic device using a mill to remove the chip and replacing the chip with a new chip in the milled area |
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|---|---|---|---|---|
| DE10147789B4 (de) * | 2001-09-27 | 2004-04-15 | Infineon Technologies Ag | Vorrichtung zum Verlöten von Kontakten auf Halbleiterchips |
| US7288472B2 (en) * | 2004-12-21 | 2007-10-30 | Intel Corporation | Method and system for performing die attach using a flame |
| JP2006261519A (ja) * | 2005-03-18 | 2006-09-28 | Sharp Corp | 半導体装置及びその製造方法 |
| US7677432B2 (en) * | 2005-05-03 | 2010-03-16 | Texas Instruments Incorporated | Spot heat wirebonding |
| US20080152829A1 (en) * | 2006-12-20 | 2008-06-26 | Dean Roy E | Coating compositions, coatings formed therefrom and methods of making the same |
| CN102054658B (zh) * | 2009-10-30 | 2013-03-27 | 日月光封装测试(上海)有限公司 | 封装打线工艺的加热治具及其方法 |
| US7871860B1 (en) * | 2009-11-17 | 2011-01-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of semiconductor packaging |
| KR101739752B1 (ko) * | 2010-11-05 | 2017-05-26 | 삼성전자 주식회사 | 와이어 본딩 장치 및 이를 이용한 와이어 본딩 방법 |
| US8533936B1 (en) | 2011-01-26 | 2013-09-17 | Western Digital (Fremont), Llc | Systems and methods for pre-heating adjacent bond pads for soldering |
| US8440503B1 (en) * | 2011-11-16 | 2013-05-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for performing reflow in bonding processes |
| CN102915933A (zh) * | 2012-09-11 | 2013-02-06 | 厦门锐迅达电子有限公司 | 一种祼晶的表面贴装焊接工艺 |
| CN109003969A (zh) * | 2018-08-21 | 2018-12-14 | 佛山市国星光电股份有限公司 | 一种基于高密度显示的cob封装方法、系统及cob器件 |
| US11410961B2 (en) | 2020-03-17 | 2022-08-09 | Micron Technology, Inc. | Methods and apparatus for temperature modification in bonding stacked microelectronic components and related substrates and assemblies |
| US11804467B2 (en) * | 2020-06-25 | 2023-10-31 | Micron Technology, Inc. | Radiative heat collective bonder and gangbonder |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61168233A (ja) * | 1985-01-21 | 1986-07-29 | Hitachi Ltd | 半導体装置の修理方法 |
| JPH02310939A (ja) * | 1989-05-25 | 1990-12-26 | Toshiba Corp | ワイヤーボンディング方法 |
| GB2244374A (en) * | 1990-05-22 | 1991-11-27 | Stc Plc | Radiation beam bonding of semiconductor device contacts |
| JPH04151844A (ja) * | 1990-09-05 | 1992-05-25 | Nec Corp | アウターリードボンディング装置 |
| JPH05335377A (ja) * | 1992-05-29 | 1993-12-17 | Shibuya Kogyo Co Ltd | 半導体チップボンダにおけるチップ加熱機構 |
| US5305944A (en) * | 1992-04-23 | 1994-04-26 | Mitsubishi Denki Kabushiki Kaisha | Bonding method and bonding apparatus |
| US5346857A (en) * | 1992-09-28 | 1994-09-13 | Motorola, Inc. | Method for forming a flip-chip bond from a gold-tin eutectic |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4170326A (en) * | 1978-01-09 | 1979-10-09 | Gte Automatic Electric Laboratories Incorporated | Method and holding fixture for soldering lead frames to hybrid substrates |
| JPS5565443A (en) * | 1978-11-10 | 1980-05-16 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
| US4915565A (en) * | 1984-03-22 | 1990-04-10 | Sgs-Thomson Microelectronics, Inc. | Manipulation and handling of integrated circuit dice |
| JPS62188233A (ja) * | 1986-02-13 | 1987-08-17 | Matsushima Kogyo Co Ltd | 半導体ボンデイング装置 |
| JPH0238046B2 (ja) * | 1986-12-27 | 1990-08-28 | Sakamoto Tetsukosho Jugen | Kanjozainosenkosochi |
| JPS63232438A (ja) * | 1987-03-20 | 1988-09-28 | Matsushita Electric Ind Co Ltd | ワイヤボンデイング方法 |
| JPH0296394A (ja) * | 1988-09-30 | 1990-04-09 | Matsushita Electric Ind Co Ltd | はんだ付けリフロー方法 |
| JPH05109811A (ja) * | 1991-10-15 | 1993-04-30 | Mitsubishi Electric Corp | ワイヤボンデイング装置 |
| JPH05243722A (ja) * | 1992-02-28 | 1993-09-21 | Nec Corp | 半導体装置の実装方法 |
| JP3583462B2 (ja) * | 1993-04-05 | 2004-11-04 | フォード モーター カンパニー | 電子成分のための微小はんだ付け装置および方法 |
| US5783025A (en) * | 1994-06-07 | 1998-07-21 | Texas Instruments Incorporated | Optical diebonding for semiconductor devices |
| US6041994A (en) * | 1994-06-07 | 2000-03-28 | Texas Instruments Incorporated | Rapid and selective heating method in integrated circuit package assembly by means of tungsten halogen light source |
| JPH1050766A (ja) * | 1996-08-02 | 1998-02-20 | Toshiba Corp | フェース・ダウン・ボンディング方法およびその装置 |
| JPH10189643A (ja) * | 1996-12-18 | 1998-07-21 | Texas Instr Inc <Ti> | タングステン・ハロゲン光源を用いる集積回路パッケージ・アッセンブリの高速及び選択的加熱方法 |
| JPH118270A (ja) * | 1997-06-16 | 1999-01-12 | Tokai Rika Co Ltd | 半導体チップの搭載方法、チップオンチップ構造体の製造方法及びチップオンボード構造体の製造方法 |
| JP3344289B2 (ja) * | 1997-07-18 | 2002-11-11 | 松下電器産業株式会社 | バンプ付ワークの実装方法 |
-
2000
- 2000-06-12 US US09/592,275 patent/US6384366B1/en not_active Expired - Lifetime
- 2000-12-01 WO PCT/US2000/032700 patent/WO2001097278A1/en not_active Ceased
- 2000-12-01 KR KR1020077003602A patent/KR100747134B1/ko not_active Expired - Fee Related
- 2000-12-01 EP EP00988009A patent/EP1290725A1/en active Pending
- 2000-12-01 KR KR1020027016900A patent/KR100747131B1/ko not_active Expired - Fee Related
- 2000-12-01 CN CNB008196419A patent/CN1229857C/zh not_active Expired - Fee Related
- 2000-12-01 JP JP2002511381A patent/JP2004503939A/ja active Pending
-
2001
- 2001-06-05 TW TW090113541A patent/TW529111B/zh not_active IP Right Cessation
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61168233A (ja) * | 1985-01-21 | 1986-07-29 | Hitachi Ltd | 半導体装置の修理方法 |
| JPH02310939A (ja) * | 1989-05-25 | 1990-12-26 | Toshiba Corp | ワイヤーボンディング方法 |
| GB2244374A (en) * | 1990-05-22 | 1991-11-27 | Stc Plc | Radiation beam bonding of semiconductor device contacts |
| JPH04151844A (ja) * | 1990-09-05 | 1992-05-25 | Nec Corp | アウターリードボンディング装置 |
| US5305944A (en) * | 1992-04-23 | 1994-04-26 | Mitsubishi Denki Kabushiki Kaisha | Bonding method and bonding apparatus |
| JPH05335377A (ja) * | 1992-05-29 | 1993-12-17 | Shibuya Kogyo Co Ltd | 半導体チップボンダにおけるチップ加熱機構 |
| US5346857A (en) * | 1992-09-28 | 1994-09-13 | Motorola, Inc. | Method for forming a flip-chip bond from a gold-tin eutectic |
Non-Patent Citations (4)
| Title |
|---|
| PATENT ABSTRACTS OF JAPAN vol. 010, no. 376 (E - 464) 13 December 1986 (1986-12-13) * |
| PATENT ABSTRACTS OF JAPAN vol. 015, no. 106 (E - 1044) 13 March 1991 (1991-03-13) * |
| PATENT ABSTRACTS OF JAPAN vol. 016, no. 435 (E - 1263) 10 September 1992 (1992-09-10) * |
| PATENT ABSTRACTS OF JAPAN vol. 018, no. 158 (E - 1525) 16 March 1994 (1994-03-16) * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8444044B2 (en) | 2008-03-10 | 2013-05-21 | Micron Technology, Inc. | Apparatus and methods for forming wire bonds |
| WO2019168902A1 (en) * | 2018-02-28 | 2019-09-06 | Raytheon Company | A system and method for reworking a flip chip mounted on an electronic device using a mill to remove the chip and replacing the chip with a new chip in the milled area |
| US11330746B2 (en) | 2018-02-28 | 2022-05-10 | Raytheon Company | Device and method for reworking flip chip components |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100747134B1 (ko) | 2007-08-09 |
| US6384366B1 (en) | 2002-05-07 |
| JP2004503939A (ja) | 2004-02-05 |
| EP1290725A1 (en) | 2003-03-12 |
| TW529111B (en) | 2003-04-21 |
| KR20070034630A (ko) | 2007-03-28 |
| CN1229857C (zh) | 2005-11-30 |
| CN1454393A (zh) | 2003-11-05 |
| KR100747131B1 (ko) | 2007-08-09 |
| KR20030011887A (ko) | 2003-02-11 |
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