WO2001097278A1 - Solder bump and wire bonding by infrared heating - Google Patents

Solder bump and wire bonding by infrared heating Download PDF

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Publication number
WO2001097278A1
WO2001097278A1 PCT/US2000/032700 US0032700W WO0197278A1 WO 2001097278 A1 WO2001097278 A1 WO 2001097278A1 US 0032700 W US0032700 W US 0032700W WO 0197278 A1 WO0197278 A1 WO 0197278A1
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WIPO (PCT)
Prior art keywords
substrate
bonding
die
heating
flip
Prior art date
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Ceased
Application number
PCT/US2000/032700
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English (en)
French (fr)
Inventor
Pak C. Wong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
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Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Priority to KR1020077003602A priority Critical patent/KR100747134B1/ko
Priority to EP00988009A priority patent/EP1290725A1/en
Priority to KR1020027016900A priority patent/KR100747131B1/ko
Priority to JP2002511381A priority patent/JP2004503939A/ja
Publication of WO2001097278A1 publication Critical patent/WO2001097278A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/15786Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787Ceramics, e.g. crystalline carbides, nitrides or oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/1579Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy

Definitions

  • a first die is attached to a substrate, such as a metal lead frame or a laminated plastic or ceramic circuit board, as with epoxy or polyimide paste or film tape, and a second die is attached to the top surface of the first die, also with epoxy or polyimide paste or film tape.
  • a wire bonding operation is then carried out, wherein gold or copper wires are fused to bonding pads on the top surfaces of the substrate and the dies, typically using ultrasonics and heat.
  • a heater block is commonly employed to conductively preheat the substrate from the bottom.
  • the wire bonding i.e., soldering of the wire ends
  • the substrate is a thin metal lead frame having good heat conductivity, such as a copper lead frame
  • this conventional methodology is problematic for other types of substrates.
  • thick laminated plastic or ceramic substrates that are slower to heat up may not be brought up to the proper temperature for wire bonding by the block heater within the available time period for pre- heating (e.g., about 4 seconds or less, depending on the speed of the wire bonder and the number of wires per die assembly).
  • the intensity and wavelength of infrared heaters 230 is determined such that the desired temperature profile is achieved; e.g., the temperature of substrate top surface 240a reaches the bonding temperature of about 200 degrees Centigrade within the necessary ramp-up time of, e.g., about 0.66 seconds, depending on the speed of die bonder 200 and the desired throughput.
  • the wavelength of the infrared radiation is determined by the material of substrate 240.
  • Conductive heater 210 is used in conjunction with infrared heaters 230 to facilitate achievement of the desired die bonding temperature and temperature profile. Referring now to Fig. 2A, in operation, substrate 240 is pre-heated by conductive heater

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
PCT/US2000/032700 2000-06-12 2000-12-01 Solder bump and wire bonding by infrared heating Ceased WO2001097278A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020077003602A KR100747134B1 (ko) 2000-06-12 2000-12-01 적외선 가열에 의한 솔더 범프 및 와이어 본딩
EP00988009A EP1290725A1 (en) 2000-06-12 2000-12-01 Solder bump and wire bonding by infrared heating
KR1020027016900A KR100747131B1 (ko) 2000-06-12 2000-12-01 적외선 가열에 의한 솔더 범프 및 와이어 본딩
JP2002511381A JP2004503939A (ja) 2000-06-12 2000-12-01 赤外線加熱によるはんだバンプおよびワイヤボンディング

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/592,275 US6384366B1 (en) 2000-06-12 2000-06-12 Top infrared heating for bonding operations
US09/592,275 2000-06-12

Publications (1)

Publication Number Publication Date
WO2001097278A1 true WO2001097278A1 (en) 2001-12-20

Family

ID=24370021

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Application Number Title Priority Date Filing Date
PCT/US2000/032700 Ceased WO2001097278A1 (en) 2000-06-12 2000-12-01 Solder bump and wire bonding by infrared heating

Country Status (7)

Country Link
US (1) US6384366B1 (enExample)
EP (1) EP1290725A1 (enExample)
JP (1) JP2004503939A (enExample)
KR (2) KR100747134B1 (enExample)
CN (1) CN1229857C (enExample)
TW (1) TW529111B (enExample)
WO (1) WO2001097278A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8444044B2 (en) 2008-03-10 2013-05-21 Micron Technology, Inc. Apparatus and methods for forming wire bonds
WO2019168902A1 (en) * 2018-02-28 2019-09-06 Raytheon Company A system and method for reworking a flip chip mounted on an electronic device using a mill to remove the chip and replacing the chip with a new chip in the milled area

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10147789B4 (de) * 2001-09-27 2004-04-15 Infineon Technologies Ag Vorrichtung zum Verlöten von Kontakten auf Halbleiterchips
US7288472B2 (en) * 2004-12-21 2007-10-30 Intel Corporation Method and system for performing die attach using a flame
JP2006261519A (ja) * 2005-03-18 2006-09-28 Sharp Corp 半導体装置及びその製造方法
US7677432B2 (en) * 2005-05-03 2010-03-16 Texas Instruments Incorporated Spot heat wirebonding
US20080152829A1 (en) * 2006-12-20 2008-06-26 Dean Roy E Coating compositions, coatings formed therefrom and methods of making the same
CN102054658B (zh) * 2009-10-30 2013-03-27 日月光封装测试(上海)有限公司 封装打线工艺的加热治具及其方法
US7871860B1 (en) * 2009-11-17 2011-01-18 Taiwan Semiconductor Manufacturing Company, Ltd. Method of semiconductor packaging
KR101739752B1 (ko) * 2010-11-05 2017-05-26 삼성전자 주식회사 와이어 본딩 장치 및 이를 이용한 와이어 본딩 방법
US8533936B1 (en) 2011-01-26 2013-09-17 Western Digital (Fremont), Llc Systems and methods for pre-heating adjacent bond pads for soldering
US8440503B1 (en) * 2011-11-16 2013-05-14 Taiwan Semiconductor Manufacturing Company, Ltd. Methods for performing reflow in bonding processes
CN102915933A (zh) * 2012-09-11 2013-02-06 厦门锐迅达电子有限公司 一种祼晶的表面贴装焊接工艺
CN109003969A (zh) * 2018-08-21 2018-12-14 佛山市国星光电股份有限公司 一种基于高密度显示的cob封装方法、系统及cob器件
US11410961B2 (en) 2020-03-17 2022-08-09 Micron Technology, Inc. Methods and apparatus for temperature modification in bonding stacked microelectronic components and related substrates and assemblies
US11804467B2 (en) * 2020-06-25 2023-10-31 Micron Technology, Inc. Radiative heat collective bonder and gangbonder

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61168233A (ja) * 1985-01-21 1986-07-29 Hitachi Ltd 半導体装置の修理方法
JPH02310939A (ja) * 1989-05-25 1990-12-26 Toshiba Corp ワイヤーボンディング方法
GB2244374A (en) * 1990-05-22 1991-11-27 Stc Plc Radiation beam bonding of semiconductor device contacts
JPH04151844A (ja) * 1990-09-05 1992-05-25 Nec Corp アウターリードボンディング装置
JPH05335377A (ja) * 1992-05-29 1993-12-17 Shibuya Kogyo Co Ltd 半導体チップボンダにおけるチップ加熱機構
US5305944A (en) * 1992-04-23 1994-04-26 Mitsubishi Denki Kabushiki Kaisha Bonding method and bonding apparatus
US5346857A (en) * 1992-09-28 1994-09-13 Motorola, Inc. Method for forming a flip-chip bond from a gold-tin eutectic

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4170326A (en) * 1978-01-09 1979-10-09 Gte Automatic Electric Laboratories Incorporated Method and holding fixture for soldering lead frames to hybrid substrates
JPS5565443A (en) * 1978-11-10 1980-05-16 Mitsubishi Electric Corp Manufacture of semiconductor device
US4915565A (en) * 1984-03-22 1990-04-10 Sgs-Thomson Microelectronics, Inc. Manipulation and handling of integrated circuit dice
JPS62188233A (ja) * 1986-02-13 1987-08-17 Matsushima Kogyo Co Ltd 半導体ボンデイング装置
JPH0238046B2 (ja) * 1986-12-27 1990-08-28 Sakamoto Tetsukosho Jugen Kanjozainosenkosochi
JPS63232438A (ja) * 1987-03-20 1988-09-28 Matsushita Electric Ind Co Ltd ワイヤボンデイング方法
JPH0296394A (ja) * 1988-09-30 1990-04-09 Matsushita Electric Ind Co Ltd はんだ付けリフロー方法
JPH05109811A (ja) * 1991-10-15 1993-04-30 Mitsubishi Electric Corp ワイヤボンデイング装置
JPH05243722A (ja) * 1992-02-28 1993-09-21 Nec Corp 半導体装置の実装方法
JP3583462B2 (ja) * 1993-04-05 2004-11-04 フォード モーター カンパニー 電子成分のための微小はんだ付け装置および方法
US5783025A (en) * 1994-06-07 1998-07-21 Texas Instruments Incorporated Optical diebonding for semiconductor devices
US6041994A (en) * 1994-06-07 2000-03-28 Texas Instruments Incorporated Rapid and selective heating method in integrated circuit package assembly by means of tungsten halogen light source
JPH1050766A (ja) * 1996-08-02 1998-02-20 Toshiba Corp フェース・ダウン・ボンディング方法およびその装置
JPH10189643A (ja) * 1996-12-18 1998-07-21 Texas Instr Inc <Ti> タングステン・ハロゲン光源を用いる集積回路パッケージ・アッセンブリの高速及び選択的加熱方法
JPH118270A (ja) * 1997-06-16 1999-01-12 Tokai Rika Co Ltd 半導体チップの搭載方法、チップオンチップ構造体の製造方法及びチップオンボード構造体の製造方法
JP3344289B2 (ja) * 1997-07-18 2002-11-11 松下電器産業株式会社 バンプ付ワークの実装方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61168233A (ja) * 1985-01-21 1986-07-29 Hitachi Ltd 半導体装置の修理方法
JPH02310939A (ja) * 1989-05-25 1990-12-26 Toshiba Corp ワイヤーボンディング方法
GB2244374A (en) * 1990-05-22 1991-11-27 Stc Plc Radiation beam bonding of semiconductor device contacts
JPH04151844A (ja) * 1990-09-05 1992-05-25 Nec Corp アウターリードボンディング装置
US5305944A (en) * 1992-04-23 1994-04-26 Mitsubishi Denki Kabushiki Kaisha Bonding method and bonding apparatus
JPH05335377A (ja) * 1992-05-29 1993-12-17 Shibuya Kogyo Co Ltd 半導体チップボンダにおけるチップ加熱機構
US5346857A (en) * 1992-09-28 1994-09-13 Motorola, Inc. Method for forming a flip-chip bond from a gold-tin eutectic

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 010, no. 376 (E - 464) 13 December 1986 (1986-12-13) *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 106 (E - 1044) 13 March 1991 (1991-03-13) *
PATENT ABSTRACTS OF JAPAN vol. 016, no. 435 (E - 1263) 10 September 1992 (1992-09-10) *
PATENT ABSTRACTS OF JAPAN vol. 018, no. 158 (E - 1525) 16 March 1994 (1994-03-16) *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8444044B2 (en) 2008-03-10 2013-05-21 Micron Technology, Inc. Apparatus and methods for forming wire bonds
WO2019168902A1 (en) * 2018-02-28 2019-09-06 Raytheon Company A system and method for reworking a flip chip mounted on an electronic device using a mill to remove the chip and replacing the chip with a new chip in the milled area
US11330746B2 (en) 2018-02-28 2022-05-10 Raytheon Company Device and method for reworking flip chip components

Also Published As

Publication number Publication date
KR100747134B1 (ko) 2007-08-09
US6384366B1 (en) 2002-05-07
JP2004503939A (ja) 2004-02-05
EP1290725A1 (en) 2003-03-12
TW529111B (en) 2003-04-21
KR20070034630A (ko) 2007-03-28
CN1229857C (zh) 2005-11-30
CN1454393A (zh) 2003-11-05
KR100747131B1 (ko) 2007-08-09
KR20030011887A (ko) 2003-02-11

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