TW529111B - Top infrared heating for bonding operations - Google Patents
Top infrared heating for bonding operations Download PDFInfo
- Publication number
- TW529111B TW529111B TW090113541A TW90113541A TW529111B TW 529111 B TW529111 B TW 529111B TW 090113541 A TW090113541 A TW 090113541A TW 90113541 A TW90113541 A TW 90113541A TW 529111 B TW529111 B TW 529111B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- bonding
- infrared
- heater
- flip chip
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 26
- 229910000679 solder Inorganic materials 0.000 claims abstract description 22
- 239000013078 crystal Substances 0.000 claims description 15
- 239000004065 semiconductor Substances 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 7
- 239000002650 laminated plastic Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000002079 cooperative effect Effects 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 239000013305 flexible fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- -1 structures Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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Description
經濟部智慧財產局員工消費合作社印製 529111 A7 五、發明說明(1 ) [發明之領域] 本發明係有關一種在組裝操作中,加熱半導體元件及 電路板之方法與裝置,特別是應用於堆疊式裸晶組件的引 線接合及倒裝晶片焊接上。 [技術背景] 在習知的堆疊式裸晶(die)封裝技術上,第一裸晶係藉 由環氧樹脂(epoxy)、聚亞醯胺(p〇lyimide)糊或薄膠帶來附 著於例如金屬引線架或層壓塑膠或陶瓷電路板之基板上, 且第二裸晶亦藉由環氧樹脂、聚亞醯胺糊或薄膠帶來附著 於該第一裸晶之上表面。接著是引線接合操作的完成其 中金製或銅製的引線熔接在基板及裸晶上表面之接合片 (bonding pads)上,典型的作法係利用超音波及加熱。為了 將基板及裸晶加熱到適當溫度以利引線接合,典型的作法 是以约攝氏190度的溫度,利用加熱器塊的傳導,從基板 的底部開始預熱。換s之,雖然引線接合(即引線端點的焊 接)發生在基板及裸晶之上表面,但它們仍是由底部開始加 熱的。 當基板為具有良好熱傳導率的薄金屬引線架時,例如 鋼引線架,則使用加熱器塊自底部預熱基板可獲得令人滿 意的結果,但是此種習用方法用於其他型式的基板是有問 題的。特別是對於厚的層壓塑膠或陶瓷基板來說,在有效 的預熱時間週期内(例如,約4秒或少於4秒的時間,這要 依引線焊接器的速度及每一裸晶組的引線數而定)使用加 熱器塊加熱是很慢的,無法升高至適當溫度以進行引線接 泰紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) 91698 ---------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 5291 u A7 五、發明說明(2 ) 合。而且,因為裸晶與基板底部相隔很遠,以致其接合區 之加溫比基板更慢,所以使用加熱器塊不可能加溫到較佳 (請先閱讀背面之注意事項再填寫本頁) 的引線接合溫度,必然對引線接合品質及製造良率有不利 影響。 類似的問題亦存在於習用倒裝晶片組裝法,其中半導 體裸晶係直接焊接在基板之上表面上,該基板以塑膠或陶 瓷電路板為代表。該基板上之接合片塗佈有焊料,且焊料 係以「焊錫凸塊」(solder bumps)的方式來處理,在組裝前 附著於裸晶上。利用熱與壓力來熔化基板及裸晶上之焊 料,以將裸晶接合至基板上。典型的倒裝晶片組裝技術係 利用上述之加熱器塊,對基板預熱以部份熔化焊錫凸塊。 然而在堆疊式裸晶組裝時,加熱器塊無法足夠快速升高基 板上表面及焊錫凸塊的溫度以確保在裸晶與基板間的高品 質連接,因此反而影響良率及可靠度。 在此,需要一種方法確保倒裝晶片、裸晶與基板引線 接合的適當加熱,藉以改善製造良率及降低成本。 [發明概述] 經濟部智慧財產局員工消費合作社印製 本發明之優點係提供一種方法與裝置,以可靠加熱基 板及/或裸晶上之接合區,以確保該基板與裸晶間之焊料或 引線接合具有高品質。 本發明之額外優點及其他特徵將在下列敘述中提出, 使得熟悉此項技術者能藉由審查本發明的下列實施例而明 白,或可以從本發明的施行上瞭解。在所附之申請專利範 圍t特別指出之本發明之優點將可以實現與獲。 本紙張&度適用中國國家標準(CNS)A4規格(210 x 297公釐) 2 91698 529111 A7 五、發明說明(3 ) (請先閱讀背面之注意事項再填寫本頁) 依據本發明,為達到前述及其它優點,係利用加熱半 導體裸晶上表面接合區以附著於基板的方法,該方法包括 以紅外線直接照射裸晶上表面以加熱接合區。 本發明之另一方面,為用於實現上述方法的裝置。 藉由以下的詳細敘述,本發明之額外優點對於熟悉此 項技術者而a ’將變成極為顯著的,其中藉由考慮實現本 發明之最佳模式的說明方式,本發明僅顯示及描述較佳實 施例。將可以_解的是’本發明可有其他及不同的實施例, 並且該發明之各目的細節能夠修正於各種不同的明顯方 面,皆不脫離本發明之範圍内,因此,圖式及敘述僅用來 說明,並非對本發明加以限定。 [圖式之簡單說明] 茲參照下列附圖,其中相同的圖式標號代表相同的元 件,並且其中: 第1圖係依據本發明實施例之裝置的側視圖。 第2 A、2B圖係依據本發明實施例之方法連績過程之 經濟部智慧財產局員工消費合作社印製 示意說明圖。 [圖式標號說明] 100 引線接合器 110 加熱器塊(傳導加熱器) 120 焊接頭 130 紅外線加熱器 140 基板 140a 基板上表面 150 下半導體裸晶 150a 裸晶上表面 160 上半導體裸晶 160a 裸晶上表面 170 引線 200 倒裝晶片裸晶接合器 本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) 3 91698 529111 A7 五、發明說明(4 210 傳導加熱器 220 紅外線加熱器 240 基板上表面 240b 焊料 250 焊錫凸塊 230 240a 240c 260 接合頭 倒裝晶片基板 接合片 倒裝晶片裸晶 [發明之詳細說明 用以將引線焊接在堆疊式裸晶封裝與組裝 經濟部智慧財產局員工消費合作社印製 裝彡® ΏI 、休_対裝與組裝倒裝晶片封 、A習用方法,無法可罪加熱基板及/或裸晶上之接合區至 適當溫度,以形成高品質的焊料接點或引線接合,因此降 低製造良率。本發明提出並解決源自習用製程中的問題。 依本發明之實施例的方法,其中堆疊式裸晶封裝之各 稞晶之引線接合區係以紅外線照射來加熱,即在引線接合 處理之前及處理期間以習用紅外線燈或紅外線搶直接照射 該裸晶之上表面。此外,該基板之接合區亦可透過上述紅 外線照射來加熱,而基板之底部可以習用傳導加熱器塊來 預熱。以紅外線照射來加熱裸晶與基板上之上表面,可確 保在所需時間週期内…秒或少於4秒,它們個別的引 線焊接區加熱至適當引線焊接溫度(即,約攝氏190度” 藉此,使尚品質的引線焊接成為可能,並增加引線焊接良率。 依本發明之另一實施例,倒裝晶片所安裝之基板上表 面之接合片區經上述紅外線燈或紅外線搶照射,加熱至所 需溫度約攝氏200度,該倒裝晶片隨後以壓力及紅外線加 熱來接合。此外,該基板底部可以習用傳導加熱器塊來預 本纸張瓦度適用中國國家標準(CNS)A4規格(210 x 297 91698 (請先閱讀背面之注意事項再填寫本頁) 529111 A7 B7 五、發明說明(5 ) 熱。所以’本發明確保該基板上之焊料在適當溫度,以在 接合操作前及接合操作期間進行倒裝晶片接合。結果,本 發明改善位於該倒裝晶片與基板間之焊料接合的品質。 本發明之較佳實施例如第1圖所示。用以引線接合的 發明裝置100,基於習用引線焊接器,如Kulicke & Soffa Industries,Inc·所產之8028型引線焊接器,包括習用傳導 加熱器塊110、習用引線接合頭120及紅外線加熱器ι3〇。 習用堆疊式裸晶封裝結構係利用本發明之方法及裝置來進 行引線接合’其中包括基板140,如陶瓷或層壓塑膠電路 板;下半導體裸晶150及上半導體裸晶ι6〇,典型是以環 氧樹脂黏著劑來使該兩裸晶結合(未圖示)。 紅外線加熱器130係設置於即將進行引線接合的封裝 結構上方,以加熱裸晶150之上表面150a、裸晶ι6〇之上 表面160a,其中每個裸晶包括接合片BP及基板140之「接 合區域」;亦即,基板140之上表面14〇a之部分具有接合 片BP。加熱器130為習用紅外線燈或紅外線搶,或是經特 別設計之最佳化紅外線加熱器,用以在引線接合器丨〇〇上 可獲得之有限空間内進行操作。例如,撓性光纖管線可用 來將紅外線導向基板140及裸晶150、160。 紅外線加熱器130之強度及波長可指定使用,強度最 好使所需溫度曲線能達成;例如,裸晶上表面〗5〇a、16〇a 及基板140之接合區的溫度能達到引線接合溫度,約在4 秒或少於4秒的時間内上升至攝氏19〇度,這要依照引線 接合器100的速度及所需產量而定。紅外線放射的波長係 泰纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) -I?--------tr---------% 經濟部智慧財產局員工消費合作社印製 91698 經 濟 部 智 慧 財 產 局 員 工 消 費 合 作 社 印 製 529111 A7 -------B7 五、發明說明(6 ) 以欲加熱之材料而定,因為有些紅外線波長不被某些材料 吸收(即該波長無法加熱那些材料)。所以,有必要且必須 提供不同波長的紅外線照射來加熱裸晶15〇、16〇(主要為 碎所製成)及基板14〇(以塑膠或陶竟製成)。 傳導加熱器110可用來與紅外線加熱器13〇搭配,使 得依堆疊式裸晶封裝而定之所需引線接合溫度及溫度曲線 更容易達成,例如,若引線接合之堆疊式裸晶封裝1〇〇包 括陶瓷或塑膠基板14〇,則最好使用傳導加熱器11〇以預 熱封裝,而如同上述之紅外線加熱器13〇則用來加熱基板 140及裸晶150、16〇之接合區。然而,若堆疊式裸晶封裝 100包括金屬引線架基板140,則紅外線加熱器13〇就可以 用來直接加熱裸晶表面150a、16〇a,但是不需要加熱基板 表面140a,因為單以傳導加熱器11〇就可以適當加熱薄金 屬基板。 在操作時,堆疊式裸晶封裝以傳導加熱器110預熱, 例如當其他封裝要進行引線接合時,將其移至引線接合頭 120下方位置。當引線接合頭12〇連結引線! 至接合片 BP時,紅外線加熱器130接著對包括接合片Bp之基板14〇 及裸晶150、160之區域加熱至約攝氏19〇度因為接合片 BP由傳導加熱器11〇及/或紅外線加熱器適當加熱, 故引線170可確實焊接到接合片Bp上。 本發明之其他實施例如第2A、2B w所*。用於倒裝 晶片接合的本發明裝置200,是基於習用倒裝晶片裸晶接 合器,如瑞士 ESEC公司所產之奶㈣以型,包括習用傳 本紙張&度適用中國國家標準(CNS)A4規格(210 X 297公---- --------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 91698 6 529111 A7 五、發明說明(7 ) 導加熱器21〇、習用接合頭22〇及紅外線加熱器23〇。習知 的倒裝晶片基板240接合倒裝晶片裸晶25〇則顯示於裸晶 接合器200上,如陶瓷或層壓塑膠電路板。 在將裸晶250加壓至基板24〇上之前,紅外線加熱器 230設置於包含覆蓋有焊料24〇e之接合片24肋的基板2⑽ 上方,以加熱基板240之上表面24〇a。在上述實施例中, 加熱器230為習用紅外線燈或紅外線搶,或可為特別設計 之最佳化紅外線加熱器,以在裸晶接合器2〇〇之可獲得之 有限空間令操作。如先前所述紅外線加熱· 23〇之強度及 波長須指定,如此才可達到所需溫度曲線,例如在〇66秒 的時間内,基板上表面24(^之溫度上升到達約攝氏2〇〇 f的接合溫度,依裸晶接合⑤2〇〇之速度及所需產量而 定,而紅外線放射之波長係以基板24〇的材質而定。傳導 加熱器210可用來與紅外線加熱器23〇搭配,使得所需裸 晶接合溫度及溫度曲線更容易達成。 茲參照第2A圖,在操作時,基板24〇藉由傳導加熱 器210預熱,例如當其他組件進行裸晶接合時,接著將該 裸晶移至運載倒裝晶4 250之裸晶接合頭22〇之下方,該 倒裝晶片250包括有對應接合片鳩的焊錫凸塊26〇。接 著操作紅外線加熱器230以加熱包含接合片24朴之基板上 表面240a至約攝氏2〇〇度,以至少部分溶化在接合片 b上之谭料24Gc。接著,裸晶接合頭22(>降下(如第⑼圖 所不)並將接合片鳩廢向焊錫凸塊26〇。該焊錫凸塊26〇 接著與覆蓋於接合片鳩上之輝料鳩一起溶化,以將 7 線 •本紙張尺度適用巾國國家標準(CNS)A4規格⑵G X 297公爱) 91698 529111 A7 B7 五、發明說明(8 ) 倒裝片250接合至基板240上。因為接合片24〇b在裸晶接 合前,由傳導加熱器210及紅外線加熱器13〇適當加熱, 故倒裝晶片250與接合片240b間的連接品質很高,結果改 善了製造良率及可靠度。 本發明可應用習用材料、方法及設備來實施。因此, 這些材料、設備及方法的細節並未在此詳細提出。為了使 能完全了解本發明,在前述說明中,提出了許多特定的細 節,如特定的材料、結構、化學製品及過程等。然而,本 發明並不僅限於以上述特定細節來實施。在其他實例方 面,為了不使不必要地遮掩了本發明之特徵,故眾所周知 的製程架構並未詳細敘述。 在此僅揭露本發明之較佳實施例及一些多用途的範 例,如此可了解本發明在其他不同組合及環境下皆可實 施,且任何可行的變化及修正皆在於此陳述之本發明概念 的範圍之内。 --------------------訂---------$· (請先閱讀背面之注意事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 本紙張又度適用中國國家標準(CNS)A4規格(210 X 297公釐) 8 91698
Claims (1)
- 529111)¾ f/年/〇丨 條正/ g正/補患 H3 申請專利範圍修正本 1 一括 (91年10月25曰) 1 · 一種加熱附著於基板上 體稞晶之上表面之接合 口口 方法,該方法包括以紅外線昭身+ %、 1緣如、射该稞晶之上表面, 以加熱該接合區達大約攝氏19〇Pm 1 衣面 2 , ^ ^ ^ 僻內190度約4秒鐘或稍短。 人如申钼專利範圍第1項 姑μ主 貞(方法,包括以紅外線照射該基 不反上表面之接合區。 3·如申請專利範圍第丨項之方法, 曰々^ ± 匕括虽紅外線照射該裸 曰曰之上表面時,將引線附接於該接合區。 4· 一種將倒裝晶片組裝於基板之 ^ a括以紅外線照射 邊&板之上表面,以加埶玆其姑 τ囬 刀…4基板上表面之接合區,該接 合區包括焊料,該方法包括: 將含有焊料之倒裝晶片置放於該焊接區;以及 對该倒裝晶片加壓以熔化接合區與倒裴晶片之焊 料並且將倒裝晶片黏附於該基板上。 干 經濟部中央標準局員工福利委員會印製 5. —種用以加熱附著於基板之半導體裸晶之上表面之接 合區之裝置,該裝置包括: 紅外線加熱器,用紅外線照射該裸晶 丨不日日工表面來加埶 該接合區·,以及 … 第二加熱器,用來加熱該基板之底表面; 其中該紅外線加熱器和該第二加熱器加熱該接合 區達大約攝氏i 9〇度約4秒鐘或稍短。 6·如申請專利範圍第5項之裝置,包括第二加熱器,用以 5291H H3 加熱該基板之底面。 7·如申請專利範圍第5項之梦 ^ ^ , 凌置,其中该紅外線加熱器亦 可加熱該基板上表面之接合區。 8·如申請專利範圍第6項之穿罟甘士 # a τ 展置,其中該紅外線加熱器與 5亥弟一加熱器在約四秒或 及夕於四秒的時間内,加熱該接 合區至約攝氏190度。 9·如申請專利範圍第5項之裝置, 衣置其中该紅外線加熱器包 括紅外線燈或紅外線搶。 10.一種將倒裝晶片組裝於基板之方法,包括: 以紅外線照射該基板之 而+社人 加熱該基板上表 接a區,其中該接合區包括焊料; 將該含有焊料之倒裝晶片置放於接合區;以及 對該倒裝晶片和該基板加壓以溶化該接人區與^ 倒裝晶片之焊料,並且將該倒裝晶片黏附於:反:。 經濟部中央標準局員工福利委員會印製
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JP (1) | JP2004503939A (zh) |
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CN (1) | CN1229857C (zh) |
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JP2006261519A (ja) * | 2005-03-18 | 2006-09-28 | Sharp Corp | 半導体装置及びその製造方法 |
US7677432B2 (en) * | 2005-05-03 | 2010-03-16 | Texas Instruments Incorporated | Spot heat wirebonding |
US20080152829A1 (en) * | 2006-12-20 | 2008-06-26 | Dean Roy E | Coating compositions, coatings formed therefrom and methods of making the same |
SG155779A1 (en) * | 2008-03-10 | 2009-10-29 | Micron Technology Inc | Apparatus and methods of forming wire bonds |
CN102054658B (zh) * | 2009-10-30 | 2013-03-27 | 日月光封装测试(上海)有限公司 | 封装打线工艺的加热治具及其方法 |
US7871860B1 (en) * | 2009-11-17 | 2011-01-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of semiconductor packaging |
KR101739752B1 (ko) * | 2010-11-05 | 2017-05-26 | 삼성전자 주식회사 | 와이어 본딩 장치 및 이를 이용한 와이어 본딩 방법 |
US8533936B1 (en) | 2011-01-26 | 2013-09-17 | Western Digital (Fremont), Llc | Systems and methods for pre-heating adjacent bond pads for soldering |
US8440503B1 (en) * | 2011-11-16 | 2013-05-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods for performing reflow in bonding processes |
CN102915933A (zh) * | 2012-09-11 | 2013-02-06 | 厦门锐迅达电子有限公司 | 一种祼晶的表面贴装焊接工艺 |
EP3759733A1 (en) | 2018-02-28 | 2021-01-06 | Raytheon Company | A system and method for reworking a flip chip mounted on an electronic device using a mill to remove the chip and replacing the chip with a new chip in the milled area |
CN109003969A (zh) * | 2018-08-21 | 2018-12-14 | 佛山市国星光电股份有限公司 | 一种基于高密度显示的cob封装方法、系统及cob器件 |
US11410961B2 (en) * | 2020-03-17 | 2022-08-09 | Micron Technology, Inc. | Methods and apparatus for temperature modification in bonding stacked microelectronic components and related substrates and assemblies |
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US6384366B1 (en) | 2002-05-07 |
KR100747131B1 (ko) | 2007-08-09 |
CN1229857C (zh) | 2005-11-30 |
KR20070034630A (ko) | 2007-03-28 |
KR20030011887A (ko) | 2003-02-11 |
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KR100747134B1 (ko) | 2007-08-09 |
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