WO2001059022A1 - Liquide de revetement sensible aux infrarouges - Google Patents
Liquide de revetement sensible aux infrarouges Download PDFInfo
- Publication number
- WO2001059022A1 WO2001059022A1 PCT/JP2001/000894 JP0100894W WO0159022A1 WO 2001059022 A1 WO2001059022 A1 WO 2001059022A1 JP 0100894 W JP0100894 W JP 0100894W WO 0159022 A1 WO0159022 A1 WO 0159022A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photosensitive resin
- infrared
- acetate
- sleeve
- sensitive layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/18—Coating curved surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
- B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU30597/01A AU755159B2 (en) | 2000-02-09 | 2001-02-08 | Infrared sensitive coating liquid |
DE60114517T DE60114517T2 (de) | 2000-02-09 | 2001-02-08 | Infrarot-empfindliche beschichtungsflüssigkeit |
EP01902811A EP1170343B1 (en) | 2000-02-09 | 2001-02-08 | Infrared sensitive coating liquid |
US09/958,341 US6653046B2 (en) | 2000-02-09 | 2001-02-08 | Infrared sensitive coating liquid |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-31625 | 2000-02-09 | ||
JP2000031625A JP4623452B2 (ja) | 2000-02-09 | 2000-02-09 | 赤外線感受性層を形成する為の塗工液 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001059022A1 true WO2001059022A1 (fr) | 2001-08-16 |
Family
ID=18556359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/000894 WO2001059022A1 (fr) | 2000-02-09 | 2001-02-08 | Liquide de revetement sensible aux infrarouges |
Country Status (6)
Country | Link |
---|---|
US (1) | US6653046B2 (ja) |
EP (1) | EP1170343B1 (ja) |
JP (1) | JP4623452B2 (ja) |
AU (1) | AU755159B2 (ja) |
DE (1) | DE60114517T2 (ja) |
WO (1) | WO2001059022A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10040928A1 (de) * | 2000-08-18 | 2002-02-28 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung lasergravierbarer Flexodruckelemente auf flexiblen metallischen Trägern |
WO2005005147A1 (ja) * | 2003-07-09 | 2005-01-20 | Asahi Kasei Chemicals Corporation | シームレス印刷用凸版材の製造方法及びシームレス印刷用凸版材の製造装置 |
DE102004050277A1 (de) * | 2004-10-14 | 2006-04-27 | Basf Drucksysteme Gmbh | Verfahren und Vorrichtung zur Herstellung von fotopolymerisierbaren, zylindrischen, endlos-nahtlosen Flexodruckelementen |
JP2007148258A (ja) * | 2005-11-30 | 2007-06-14 | Daicel Chem Ind Ltd | レジスト組成物 |
JP5323385B2 (ja) * | 2008-01-30 | 2013-10-23 | 東京応化工業株式会社 | 接着剤組成物、および接着フィルム |
JP5368845B2 (ja) * | 2008-06-17 | 2013-12-18 | 東京応化工業株式会社 | 接着剤組成物、接着フィルムおよび熱処理方法 |
US8123622B1 (en) | 2011-06-03 | 2012-02-28 | Nyko Technologies, Inc. | Lens accessory for video game sensor device |
JP5427225B2 (ja) * | 2011-12-06 | 2014-02-26 | 住友ゴム工業株式会社 | 印刷用樹脂原版の製造方法 |
JP5942327B2 (ja) * | 2012-09-28 | 2016-06-29 | 富士フイルム株式会社 | 円筒状印刷版原版の製造方法、並びに、円筒状印刷版及びその製版方法 |
JP5727526B2 (ja) * | 2013-01-09 | 2015-06-03 | 住友ゴム工業株式会社 | フレキソ印刷版とその製造方法、ならびに液晶パネル用基板の製造方法 |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5548744A (en) | 1978-10-02 | 1980-04-08 | Asahi Chem Ind Co Ltd | Photosensitive elastomer composition |
JPS62160446A (ja) | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | 光重合により架橋されるレリ−フ版体の製造方法 |
JPS62251739A (ja) * | 1986-04-24 | 1987-11-02 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH027056A (ja) | 1988-03-10 | 1990-01-11 | Basf Ag | 凸版印版の製法 |
EP0355789A2 (en) | 1988-08-23 | 1990-02-28 | E.I. Du Pont De Nemours And Company | Process for the production of flexographic printing reliefs |
JPH02255385A (ja) | 1987-09-03 | 1990-10-16 | W R Grace & Co | 光重合体印刷板の洗浄用のテルペンを基にした溶媒 |
JPH05134410A (ja) | 1991-02-15 | 1993-05-28 | Asahi Chem Ind Co Ltd | 感光性エラストマー組成物 |
JPH08305030A (ja) | 1995-05-01 | 1996-11-22 | E I Du Pont De Nemours & Co | 赤外アブレーション性層をもつフレキソグラフ用エレメントおよびフレキソグラフ印刷板の作成方法 |
JPH09166875A (ja) | 1995-10-02 | 1997-06-24 | Basf Lacke & Farben Ag | デジタル情報伝達によるフレキソ印刷板の製造に適当な多層記録素子、およびフレキソ印刷板の製造法 |
JPH1016175A (ja) * | 1996-06-26 | 1998-01-20 | Fuji Photo Film Co Ltd | 平版印刷版原版及びその製版方法 |
EP0908778A2 (en) * | 1997-09-16 | 1999-04-14 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive element for flexographic printing |
JP2000267262A (ja) * | 1999-03-16 | 2000-09-29 | Asahi Chem Ind Co Ltd | 赤外線感受性層を形成するための塗工液 |
JP2000267263A (ja) * | 1999-03-16 | 2000-09-29 | Asahi Chem Ind Co Ltd | フレキソ印刷用感光性構成体 |
JP2000267264A (ja) * | 1999-03-18 | 2000-09-29 | Asahi Chem Ind Co Ltd | 感光性樹脂スリーブ構成体 |
EP1069472A1 (en) * | 1999-07-15 | 2001-01-17 | Eastman Kodak Company | Coating composition for a protecting layer for gelatin based photographic products containing a 1H-pyrazolo-[1,5-b][1,2,4]-triazole-type magenta coupler |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4845008A (en) | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
EP0720057A4 (en) * | 1994-07-11 | 1997-01-22 | Konishiroku Photo Ind | INITIAL ELEMENT FOR LITHOGRAPHIC PLATE AND PROCESS FOR PREPARING SAID PLATE |
JP3482484B2 (ja) | 1994-09-16 | 2003-12-22 | 株式会社リコー | 顔料混合物、その製造方法、その顔料混合物を含有する感光層塗工液、及びその顔料混合物を含有する電子写真感光体 |
US6030750A (en) * | 1995-10-24 | 2000-02-29 | Agfa-Gevaert. N.V. | Method for making a lithographic printing plate involving on press development |
US5879861A (en) * | 1996-04-23 | 1999-03-09 | Agfa-Gevaert, N.V. | Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask |
US5919600A (en) * | 1997-09-03 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Thermal waterless lithographic printing plate |
EP0901902A3 (en) | 1997-09-12 | 1999-03-24 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition for use with an infrared laser |
JP4080068B2 (ja) * | 1997-09-16 | 2008-04-23 | 旭化成ケミカルズ株式会社 | フレキソ印刷版用感光性構成体 |
JP3403936B2 (ja) | 1997-10-07 | 2003-05-06 | シャープ株式会社 | 電子写真用トナー |
US6083663A (en) * | 1997-10-08 | 2000-07-04 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
US6004728A (en) * | 1997-10-08 | 1999-12-21 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
US6060218A (en) * | 1997-10-08 | 2000-05-09 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
US6251563B1 (en) * | 1997-10-08 | 2001-06-26 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
US6235451B1 (en) * | 1997-10-08 | 2001-05-22 | Agfa-Gevaert | Method for making positive working printing plates from a heat mode sensitive image element |
US6153352A (en) * | 1997-12-10 | 2000-11-28 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor and a method for producing a planographic printing plate |
US5950542A (en) * | 1998-01-29 | 1999-09-14 | Kodak Polychrome Graphics Llc | Direct write waterless imaging member with improved ablation properties and methods of imaging and printing |
US6153353A (en) * | 1998-03-14 | 2000-11-28 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive imaging element |
US6447977B2 (en) * | 1998-04-15 | 2002-09-10 | Agfa-Gevaert | Heat mode sensitive imaging element for making positive working printing plates |
US6358669B1 (en) * | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
US6352812B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
DE60000470T2 (de) * | 1999-07-13 | 2004-05-06 | Basf Drucksysteme Gmbh | Flexodruckelement mit einer durch IR Bestrahlung ablativen, hochempfindlichen Schicht |
US6245481B1 (en) * | 1999-10-12 | 2001-06-12 | Gary Ganghui Teng | On-press process of lithographic plates having a laser sensitive mask layer |
JP3769171B2 (ja) * | 2000-05-17 | 2006-04-19 | 東京応化工業株式会社 | フレキソ印刷版製造用多層感光材料 |
US6245486B1 (en) * | 2000-06-30 | 2001-06-12 | Gary Ganghui Teng | Method for imaging a printing plate having a laser ablatable mask layer |
US6451505B1 (en) * | 2000-08-04 | 2002-09-17 | Kodak Polychrome Graphics Llc | Imageable element and method of preparation thereof |
US6410208B1 (en) * | 2001-04-18 | 2002-06-25 | Gary Ganghui Teng | Lithographic printing plates having a thermo-deactivatable photosensitive layer |
-
2000
- 2000-02-09 JP JP2000031625A patent/JP4623452B2/ja not_active Expired - Lifetime
-
2001
- 2001-02-08 WO PCT/JP2001/000894 patent/WO2001059022A1/ja active IP Right Grant
- 2001-02-08 US US09/958,341 patent/US6653046B2/en not_active Expired - Lifetime
- 2001-02-08 DE DE60114517T patent/DE60114517T2/de not_active Expired - Lifetime
- 2001-02-08 AU AU30597/01A patent/AU755159B2/en not_active Ceased
- 2001-02-08 EP EP01902811A patent/EP1170343B1/en not_active Expired - Lifetime
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5548744A (en) | 1978-10-02 | 1980-04-08 | Asahi Chem Ind Co Ltd | Photosensitive elastomer composition |
JPS62160446A (ja) | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | 光重合により架橋されるレリ−フ版体の製造方法 |
JPS62251739A (ja) * | 1986-04-24 | 1987-11-02 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPH02255385A (ja) | 1987-09-03 | 1990-10-16 | W R Grace & Co | 光重合体印刷板の洗浄用のテルペンを基にした溶媒 |
JPH027056A (ja) | 1988-03-10 | 1990-01-11 | Basf Ag | 凸版印版の製法 |
EP0355789A2 (en) | 1988-08-23 | 1990-02-28 | E.I. Du Pont De Nemours And Company | Process for the production of flexographic printing reliefs |
JPH05134410A (ja) | 1991-02-15 | 1993-05-28 | Asahi Chem Ind Co Ltd | 感光性エラストマー組成物 |
JPH08305030A (ja) | 1995-05-01 | 1996-11-22 | E I Du Pont De Nemours & Co | 赤外アブレーション性層をもつフレキソグラフ用エレメントおよびフレキソグラフ印刷板の作成方法 |
JPH09166875A (ja) | 1995-10-02 | 1997-06-24 | Basf Lacke & Farben Ag | デジタル情報伝達によるフレキソ印刷板の製造に適当な多層記録素子、およびフレキソ印刷板の製造法 |
JPH1016175A (ja) * | 1996-06-26 | 1998-01-20 | Fuji Photo Film Co Ltd | 平版印刷版原版及びその製版方法 |
EP0908778A2 (en) * | 1997-09-16 | 1999-04-14 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive element for flexographic printing |
JP2000267262A (ja) * | 1999-03-16 | 2000-09-29 | Asahi Chem Ind Co Ltd | 赤外線感受性層を形成するための塗工液 |
JP2000267263A (ja) * | 1999-03-16 | 2000-09-29 | Asahi Chem Ind Co Ltd | フレキソ印刷用感光性構成体 |
JP2000267264A (ja) * | 1999-03-18 | 2000-09-29 | Asahi Chem Ind Co Ltd | 感光性樹脂スリーブ構成体 |
EP1069472A1 (en) * | 1999-07-15 | 2001-01-17 | Eastman Kodak Company | Coating composition for a protecting layer for gelatin based photographic products containing a 1H-pyrazolo-[1,5-b][1,2,4]-triazole-type magenta coupler |
Non-Patent Citations (1)
Title |
---|
See also references of EP1170343A4 |
Also Published As
Publication number | Publication date |
---|---|
DE60114517D1 (de) | 2005-12-08 |
US20020187429A1 (en) | 2002-12-12 |
AU3059701A (en) | 2001-08-20 |
EP1170343B1 (en) | 2005-11-02 |
JP2001220537A (ja) | 2001-08-14 |
EP1170343A1 (en) | 2002-01-09 |
AU755159B2 (en) | 2002-12-05 |
EP1170343A4 (en) | 2004-11-10 |
DE60114517T2 (de) | 2006-07-27 |
JP4623452B2 (ja) | 2011-02-02 |
US6653046B2 (en) | 2003-11-25 |
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