DE60114517D1 - Infrarot-empfindliche beschichtungsflüssigkeit - Google Patents

Infrarot-empfindliche beschichtungsflüssigkeit

Info

Publication number
DE60114517D1
DE60114517D1 DE60114517T DE60114517T DE60114517D1 DE 60114517 D1 DE60114517 D1 DE 60114517D1 DE 60114517 T DE60114517 T DE 60114517T DE 60114517 T DE60114517 T DE 60114517T DE 60114517 D1 DE60114517 D1 DE 60114517D1
Authority
DE
Germany
Prior art keywords
infrared
photosensitive resin
coating liquid
infrared sensitive
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60114517T
Other languages
English (en)
Other versions
DE60114517T2 (de
Inventor
Shuji Kozaki
Shusaku Tabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Chemicals Corp
Original Assignee
Asahi Kasei Chemicals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Chemicals Corp filed Critical Asahi Kasei Chemicals Corp
Application granted granted Critical
Publication of DE60114517D1 publication Critical patent/DE60114517D1/de
Publication of DE60114517T2 publication Critical patent/DE60114517T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165—Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE60114517T 2000-02-09 2001-02-08 Infrarot-empfindliche beschichtungsflüssigkeit Expired - Lifetime DE60114517T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000031625A JP4623452B2 (ja) 2000-02-09 2000-02-09 赤外線感受性層を形成する為の塗工液
JP2000031625 2000-02-09
PCT/JP2001/000894 WO2001059022A1 (fr) 2000-02-09 2001-02-08 Liquide de revetement sensible aux infrarouges

Publications (2)

Publication Number Publication Date
DE60114517D1 true DE60114517D1 (de) 2005-12-08
DE60114517T2 DE60114517T2 (de) 2006-07-27

Family

ID=18556359

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60114517T Expired - Lifetime DE60114517T2 (de) 2000-02-09 2001-02-08 Infrarot-empfindliche beschichtungsflüssigkeit

Country Status (6)

Country Link
US (1) US6653046B2 (de)
EP (1) EP1170343B1 (de)
JP (1) JP4623452B2 (de)
AU (1) AU755159B2 (de)
DE (1) DE60114517T2 (de)
WO (1) WO2001059022A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
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DE10040928A1 (de) * 2000-08-18 2002-02-28 Basf Drucksysteme Gmbh Verfahren zur Herstellung lasergravierbarer Flexodruckelemente auf flexiblen metallischen Trägern
WO2005005147A1 (ja) * 2003-07-09 2005-01-20 Asahi Kasei Chemicals Corporation シームレス印刷用凸版材の製造方法及びシームレス印刷用凸版材の製造装置
DE102004050277A1 (de) * 2004-10-14 2006-04-27 Basf Drucksysteme Gmbh Verfahren und Vorrichtung zur Herstellung von fotopolymerisierbaren, zylindrischen, endlos-nahtlosen Flexodruckelementen
JP2007148258A (ja) * 2005-11-30 2007-06-14 Daicel Chem Ind Ltd レジスト組成物
JP5323385B2 (ja) * 2008-01-30 2013-10-23 東京応化工業株式会社 接着剤組成物、および接着フィルム
JP5368845B2 (ja) * 2008-06-17 2013-12-18 東京応化工業株式会社 接着剤組成物、接着フィルムおよび熱処理方法
US8123622B1 (en) 2011-06-03 2012-02-28 Nyko Technologies, Inc. Lens accessory for video game sensor device
JP5427225B2 (ja) * 2011-12-06 2014-02-26 住友ゴム工業株式会社 印刷用樹脂原版の製造方法
CN104661821A (zh) * 2012-09-28 2015-05-27 富士胶片株式会社 圆筒状印刷版原版的制造方法、以及圆筒状印刷版及其制版方法
JP5727526B2 (ja) * 2013-01-09 2015-06-03 住友ゴム工業株式会社 フレキソ印刷版とその製造方法、ならびに液晶パネル用基板の製造方法

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JPS607261B2 (ja) 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
DE3600116A1 (de) 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen
JPS62251739A (ja) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd 感光性組成物
US4845008A (en) 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
US4847182A (en) 1987-09-03 1989-07-11 W. R. Grace & Co. Method for developing a photopolymer printing plate using a developer comprising terpene hydrocarbons
DE3807929A1 (de) 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
EP0433374B1 (de) 1988-08-23 1996-04-10 E.I. Du Pont De Nemours And Company Verfahren zur herstellung von flexographischen druckreliefs
JP3144870B2 (ja) 1991-02-15 2001-03-12 旭化成株式会社 感光性エラストマー組成物
EP0720057A4 (de) * 1994-07-11 1997-01-22 Konishiroku Photo Ind Lithographische druckform sowie verfahren zur herstellung einer druckplatte
JP3482484B2 (ja) 1994-09-16 2003-12-22 株式会社リコー 顔料混合物、その製造方法、その顔料混合物を含有する感光層塗工液、及びその顔料混合物を含有する電子写真感光体
US6238837B1 (en) * 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer
DE19536805A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Zur Herstellung von Flexodruckplatten durch digitale Informationsübertragung geeignetes mehrschichtiges Aufzeichnungselement
US6030750A (en) * 1995-10-24 2000-02-29 Agfa-Gevaert. N.V. Method for making a lithographic printing plate involving on press development
US5879861A (en) * 1996-04-23 1999-03-09 Agfa-Gevaert, N.V. Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask
JPH1016175A (ja) * 1996-06-26 1998-01-20 Fuji Photo Film Co Ltd 平版印刷版原版及びその製版方法
US5919600A (en) * 1997-09-03 1999-07-06 Kodak Polychrome Graphics, Llc Thermal waterless lithographic printing plate
EP0901902A3 (de) 1997-09-12 1999-03-24 Fuji Photo Film Co., Ltd. Positiv arbeitende lichtempfindliche Zusammensetzung für Infrarot Bebilderung
JP4080068B2 (ja) * 1997-09-16 2008-04-23 旭化成ケミカルズ株式会社 フレキソ印刷版用感光性構成体
EP0908778B1 (de) * 1997-09-16 2002-11-27 Asahi Kasei Kabushiki Kaisha Lichtempfindliches Element für den Flexodruck
JP3403936B2 (ja) 1997-10-07 2003-05-06 シャープ株式会社 電子写真用トナー
US6083663A (en) * 1997-10-08 2000-07-04 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive image element
US6004728A (en) * 1997-10-08 1999-12-21 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive image element
US6251563B1 (en) * 1997-10-08 2001-06-26 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive image element
US6060218A (en) * 1997-10-08 2000-05-09 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive image element
US6235451B1 (en) * 1997-10-08 2001-05-22 Agfa-Gevaert Method for making positive working printing plates from a heat mode sensitive image element
US6153352A (en) * 1997-12-10 2000-11-28 Fuji Photo Film Co., Ltd. Planographic printing plate precursor and a method for producing a planographic printing plate
US5950542A (en) * 1998-01-29 1999-09-14 Kodak Polychrome Graphics Llc Direct write waterless imaging member with improved ablation properties and methods of imaging and printing
US6153353A (en) * 1998-03-14 2000-11-28 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive imaging element
US6447977B2 (en) * 1998-04-15 2002-09-10 Agfa-Gevaert Heat mode sensitive imaging element for making positive working printing plates
US6352812B1 (en) * 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6358669B1 (en) * 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
JP2000267263A (ja) * 1999-03-16 2000-09-29 Asahi Chem Ind Co Ltd フレキソ印刷用感光性構成体
JP2000267262A (ja) * 1999-03-16 2000-09-29 Asahi Chem Ind Co Ltd 赤外線感受性層を形成するための塗工液
JP2000267264A (ja) * 1999-03-18 2000-09-29 Asahi Chem Ind Co Ltd 感光性樹脂スリーブ構成体
DE60000470T2 (de) * 1999-07-13 2004-05-06 Basf Drucksysteme Gmbh Flexodruckelement mit einer durch IR Bestrahlung ablativen, hochempfindlichen Schicht
US6165653A (en) * 1999-07-15 2000-12-26 Eastman Kodak Company Protecting layer for gelatin based photographic products containing 1H-pyrazolo[1,5,-b][1,2,4]triazole-type magenta coupler
US6245481B1 (en) * 1999-10-12 2001-06-12 Gary Ganghui Teng On-press process of lithographic plates having a laser sensitive mask layer
JP3769171B2 (ja) * 2000-05-17 2006-04-19 東京応化工業株式会社 フレキソ印刷版製造用多層感光材料
US6245486B1 (en) * 2000-06-30 2001-06-12 Gary Ganghui Teng Method for imaging a printing plate having a laser ablatable mask layer
US6451505B1 (en) * 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6410208B1 (en) * 2001-04-18 2002-06-25 Gary Ganghui Teng Lithographic printing plates having a thermo-deactivatable photosensitive layer

Also Published As

Publication number Publication date
WO2001059022A1 (fr) 2001-08-16
EP1170343A1 (de) 2002-01-09
US20020187429A1 (en) 2002-12-12
DE60114517T2 (de) 2006-07-27
AU3059701A (en) 2001-08-20
JP2001220537A (ja) 2001-08-14
EP1170343A4 (de) 2004-11-10
JP4623452B2 (ja) 2011-02-02
AU755159B2 (en) 2002-12-05
EP1170343B1 (de) 2005-11-02
US6653046B2 (en) 2003-11-25

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Legal Events

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