WO1998041566A1 - Compose de silicium et son procede de fabrication - Google Patents
Compose de silicium et son procede de fabrication Download PDFInfo
- Publication number
- WO1998041566A1 WO1998041566A1 PCT/JP1998/001098 JP9801098W WO9841566A1 WO 1998041566 A1 WO1998041566 A1 WO 1998041566A1 JP 9801098 W JP9801098 W JP 9801098W WO 9841566 A1 WO9841566 A1 WO 9841566A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- type
- ladder
- weight
- parts
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/10—Equilibration processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
Definitions
- the present invention relates to a silicone compound and a method for producing the same.
- Polyvinyl siloxane is excellent in heat resistance, electrical insulation, etc., and is used for coating materials, sealing materials, and interlayer insulating films. It is used for other purposes.
- polysilsesquioxane is phenyl trichlorosilan hydrolyzed in an organic solvent to form phenyl.
- the product is obtained by heating the hydrolyzed product in a solvent free of water by using an alkylation rearrangement and condensation catalyst and subjecting it to dehydration polycondensation.
- an alkylation rearrangement and condensation catalyst and subjecting it to dehydration polycondensation.
- the kama type octaphenyl silsesquioxane is separated, and the rearrangement is performed again.
- a phenylene siloxane sample polymer having a low intrinsic viscosity obtained by heat polymerization using a condensation catalyst or, further, using an alkaline rearrangement and condensation catalyst.
- the purpose of this method is to improve the storage stability or to control the molecular weight of polyorganosilsesquioxane by inactivating the reactivity of
- the main purpose of this method is to add a cylinoleic agent to stop the polycondensation reaction of polyorganosilsesquioxane, so to speak, end blocking.
- the encapsulation methods include a polyorganosilsesquioxane and a triorganochloro which once synthesized contain an unreacted silanol group.
- Polyorganosilsesquioxane containing a terminal hydroxy group was synthesized, and this was synthesized with Trionoleganomonoalkanol.
- JP-A-57-12,057, JP-A-60110,726) and a method for performing triorganomonochloro
- a method for carrying out a dehydrochlorination reaction with silane Japanese Patent Application Laid-Open No. 59-213,728,.
- a terminal hydroxy hydroxyl group is also available.
- a method of reacting xan and hexanoreganodisilazane (EURO. PAT. No. 0516144 A1; Japanese Patent Application Laid-Open No. 4-353, 521) is also known. .
- organotrichlorosilane is disclosed.
- ladder-type polyorganosilsesquioxane which is then hydrolyzed and then polymerized using an alkali rearrangement and condensation catalyst.
- JP-A-57-18,729 and JP-A-59-213,728 the terminal is closed in an an-like manner, and Almost no hydroxyl group is present, and the above-described method of introducing a reactive functional group only at the terminal cannot be employed.
- the present invention does not contain a defect or a silane group as a branched structure inside, has excellent storage stability, and has reproducibility of physical properties such as heat resistance.
- Polyorganosilskysquioxane with a reactive functional group at the end of the molecular chain and polyorganosilsky with a hydroxyl group at the end The purpose of the present invention is to provide a method for producing polyorganosinolesquioxane that is simple and suitable for industrial production without going through oxosan.
- the present inventors have conducted intensive studies in order to achieve the above object, and as a result, have found that the terminal is closed in an an-like manner and does not have a hydroxyl group. If an equilibrium reaction between squioxane and a disiloxane compound having a reactive functional group is used in the presence of an Al-catalyst, the reactive end of the molecular chain is The present inventors have found that a polyorganosilsesquioxane having a functional group X can be easily synthesized, and completed the present invention.
- the silicone compound of the present invention has the following general formula (1)
- n is an integer of 2 to 500
- an an-type and / or a ladder-type polyolefin having no silane group represented by ⁇ All or part of the Sio at the molecular chain end of nirucil silsquioxane is represented by the following general formula (2) CH :
- the method for producing a silicone compound of the present invention is characterized in that the terminal is closed in the shape of an herb and the herb does not contain a silanol group.
- the silicone compound according to the present invention has the general formula described above.
- the anion-type and / or ladder-type polyphenylene silsesquioxane represented by (1) is entirely or partially represented by the general formula (2) It consists of a structural formula with a triorganosilyl group having a reactive functional group X represented by the following formula, and is usually measured by GPC. It has a weight-average molecular weight Mw of 800 to 100,000 in terms of polystyrene.
- Specific structural formulas include the an-type structure shown in the following structural formula (4), the ladder structure shown in the structural formula (5), and the structural formula (6).
- Another example is a ladder structure with one end closed like an an.
- Y is a triorgano group having a reactive functional group X represented by the general formula (2) described above.
- a silyl group, and n is the same as that shown in the above-mentioned general formula (1).
- the production conditions in particular, the disiloxane at the time of the equilibration reaction and the polysillucose squioxane having an an-type or Z- or ladder-structure having a closed end, are preferred.
- a mixture of two or more, particularly three of them is also included.
- an ano-type octaphenylsinoresesquioxane is used as the starting material, and cesium hydroxide (Cs0H) is used as the catalyst for the reaction.
- Cs0H cesium hydroxide
- a relatively reactive (highly soluble) dinroxane compound is obtained.
- the depolymerization reaction generates an active species in which C s' is added to one of S 10, and this silanolite anion is an an Octaphenylsilyl. Nucleophilic attack of one end S i of sesquioxane binds to one end.
- the active species is transferred to Ansil-type and disiloxane (and vice versa).
- the chain transfer proceeds, and as a result, a reactive functional group is present at some or all of both ends.
- An anan-type structure is obtained.
- the chain grows (and the molecular weight increases as the An type opens and the molecular weight increases), resulting in an An type at one end and a reactive functional group at a part of the other end.
- Polyphenylene-norethesquioxane consisting of a ladder-type structure having a reactive functional group at all of its terminals due to the type-1 structure and further chain transfer proceeds .
- the above-mentioned equilibrium reaction proceeds in a mixed state of an anna type structure, a ladder type structure with one end closed in an anna shape, a ladder type type structure, etc. From this, a certain composition, which is an equilibrium point depending on the mixing ratio (concentration) of the anan type (or ladder type) and disiloxane, and the temperature and the alkaline concentration (Mixture or one or two or more).
- the above-mentioned chain growth and chain transfer reaction can be stopped by stopping heating and lowering the reaction temperature to room temperature, and then obtaining a mixture of methanol, ethanol and the like.
- the reaction solution is placed in a solvent such as hydrocarbons, hexane, etc., or acetonitrile, etc.
- a lagou-type and / or a kettle-type polyphenylsilsesquioxane containing a reactive functional group at the desired end can be obtained. Unreacted raw materials and catalysts can be separated and purified.
- the terminal is closed in an an-like manner, and the guanine-type or Z- or lanthanum-containing compound containing no silane group.
- the type 1 polysilsquioxane is a vinyl compound. Tricyclosilan is hydrolyzed in an organic solvent to give phenyl trihydroxysilan, which is heated using an alkaline rearrangement and condensation catalyst and subjected to dehydration condensation polymerization.
- the disiloxane compound used in the present invention has a reactive functional group X represented by the above-mentioned general formula (3).
- a reactive functional group X represented by the above-mentioned general formula (3).
- dimethyl alcohol chlorinyl silane and aryl olefin (meta) acrylate are catalyzed by chlorophyllic acid.
- a hydrosilylation reaction, followed by hydrolysis and polycondensation whereby the compound having (B) as the substituent X can be easily obtained. It is.
- Al metal hydroxides such as lithium, sodium hydroxide, hydroxylamine, etc., or tetramethylammonium hydroxide Xide, Tetraethylammonium Hydroxide, Penzinole Retri Methylene Lemonmonide Hydroxide, Penzinoleto Ammonia salts such as lithium hydroxide and hydroxide, etc., tetrahydrophosphonium hydroxide, tetrazide Uses tetra-no-regano-phosphonide compounds such as ethanol-phos-pho-d-no-monoxide it can .
- an ammonium hydroxide salt or the like is selected.
- the reaction temperature is set to 130 ° C or higher for the purpose of shortening the reaction time and the equilibrium reaction is performed, ammonium hydroxide salts and the like are decomposed.
- Alkali metal hydroxides are preferably used, and among them, cesium hydroxide, which has high reactivity, is preferably used.
- the amount of the alkali rearrangement and condensation catalyst used in the present invention is preferably in the range of 0.01 to 20% by weight based on the weight of the raw material disiloxane compound. No.
- the yield of the target substance is very small, and when the content is more than 20% by weight, the ladder type and / or the anor-type polysilyl skeletal dye is obtained.
- the side reaction that the oxane alone increases to a high molecular weight proceeds sufficiently, separation and purification by the operation of reprecipitating the desired product, these by-products and the catalyst become difficult.
- the organic solvent used in the present invention include benzene, toluene, xylene, ethylene glycol, and methyl alcohol.
- a non-polar solvent such as benzene, tonolene, or xylene is selected as the organic solvent, and an an-type octa-fat having a low solubility is selected.
- Nylsilssquioxane and a highly soluble disiloxane compound are combined with sodium hydroxide or tetramethylammonium hydroxa.
- an alkaline catalyst such as an amide
- the ladder-type and Z-or-an-polyphenylsilsesquioxane T units represented by the general formula (1) described above and the general formula (3)
- the equilibrium reaction between the dinroxane compounds under the Al-catalyst proceeds according to the above-described example reaction mechanism. However, this is the so-called anor-type and / or ladder-type porphyrinsilsyl squioxane ring-opening or hyper-molecular quantification reaction. Because of the competitive relationship with, it is necessary to prioritize the former as much as possible.
- the reaction in the present invention is basically an equilibrium reaction, the ladder type, Z or an type having a reactive functional group at the intended terminal is used.
- the weight average molecular weight Mw , yield and production rate of phenylsilsesquioxane depend on the reaction temperature, reaction time, the addition ratio of both raw materials, the amount of catalyst used, and the like. It is preferable to do it under the conditions described below, since it is decided by itself.
- the weight ratio (BZA) of the addition amount A of the kiln-type and / or ladder-type polyphenylsilsesquioxane to the addition amount B of the dinloxane compound is: 0.01 ⁇ BZA ⁇ 100, and more preferably, 0.01 ⁇ Z ⁇ ⁇ ⁇ 10.
- ⁇ 0.01 or less
- almost no reactive functional group is introduced, and a side reaction for increasing the molecular weight by itself takes precedence.
- the B / A force is 100 or more, a kettle type and / or ladder type polyolefin siloxane containing a reactive functional group at the terminal is selective.
- the equilibration reaction in the present invention is carried out under higher temperature conditions, whereby the solubility of the alkaline catalyst in the siloxane bond is increased, and the reaction rate and the reaction rate are increased.
- the reaction yield tends to be large, but conversely, disiloxane and ladder type and / or anan type polyphenylinolecinolessesquioxa
- the difference in reactivity between the catalyst and the Al catalyst becomes smaller, and the reaction selectivity decreases. That is, a ladder-type and / or anori-type polysilsesquioxane alone induces a side reaction in which the molecular weight is increased. Therefore, the reaction temperature is preferably in the range of 60 to 200 ° C, more preferably in the range of 100 to 150 ° C.
- an epoxy group, a methyl acryl group, or the like may be a functional group if the reaction temperature is too high. Since a self-polymerization reaction occurs between them, it is necessary to reduce the reaction temperature or, in some cases, add a polymerization inhibitor or the like.
- the reaction time varies slightly depending on the reaction temperature and stirring efficiency, but in order to achieve the target equilibration reaction sufficiently, the reaction time should be within the range of 1 to 72 Time is preferred.
- phenyl trichlorosilan is hydrolyzed in an organic solvent to give phenyl trihydroxy silane, and the alcoholic property is reduced.
- An octaphenyl silsesquioxane obtained by heating and dehydration polycondensation using a rearrangement and condensation catalyst, and a ladder having no silane group Type 1 phenylsiloxane prepolymers, or those obtained by further polymerizing them using an alkylation rearrangement and condensation catalyst, and having a lagoon type with a flaky end.
- Ethyl silsesquioxane polymer and reactive functionality By reacting a dinroxane compound having a group with an equilibrium reaction by heating in an organic solvent in the presence of an alkali rearrangement and condensation catalyst, a reactive functional group is formed. This is a production method that can directly synthesize poly (vinyl silsesquioxane) at the terminal and is applicable to various reactive functional group species. Also
- the ladder-type and Z- or an-type polysilsesquioxane synthesized therefrom are internally defective and have a branched structure as a silane. It has the structural formulas shown in formulas (4) to (6) that do not contain a group, has excellent storage stability, and has good reproducibility of physical properties such as heat resistance. can get .
- FIG. 1 shows the infrared absorption spectrum of the An-type octaphenylsilsesquioxane obtained in Reference Example 1.
- We two Le shea Rousset scan Kio key Sa emissions resulting et a in Reference Example 1 - shows the MAS ⁇ NMR.
- FIG. 3 shows the infrared absorption spectrum of the ladder-type phenylpolysiloxane prepomer obtained in Reference Example 1.
- Figure 4 is a Reference Example 2 to give et a la da first die off We two Lupo Li Shi b hexa emissions flop Les volume of Li Ma one 2 9 S i MAS - shows the NMR.
- FIG. 5 shows the infrared absorption spectrum of the methacrylyl group-containing octabutyl silsesquioxane obtained in Example 1 of the present invention. Is shown.
- FIG. 6 shows an 'H-NMR spectrum of a methacrylyl group-containing octaphenylsilsquioxane containing a methacrylyl group obtained in Example 1 of the present invention.
- FIG. 7 shows the methacryl group obtained in Example 1 of the present invention. Containing Hettsui type O-click data off We of two Le Shi Ruse scan key O key support down ': i C- MAS
- Figure 8 is a meta click Li Le-containing ⁇ O pin definition off We two resulting et a in Example 1 of the present invention Le shea Rousset scan key O key Sa emissions of 2 S i MAS
- FIG. 9 shows the infrared absorption spectrum of the methacrylyl-containing ladder-type polysilsesquioxane obtained in Example 2 of the present invention. Show.
- FIG. 10 shows the 'H-NMR spectrum of the methacrylyl group-containing ladder type polysilsyl squioxane obtained in Example 2 of the present invention. Is shown.
- FIG. 11 shows the infrared absorption spectrum of the epoxy group-containing ladder type 1 polysilsesquioxane obtained in Example 3 of the present invention. Show.
- FIG. 12 shows the ⁇ -NMR spectrum of the epoxy-containing ladder type polysilylsquioxane obtained in Example 3 of the present invention. Indicates a toll.
- FIG. 13 shows an infrared absorption spectrum of an amino group-containing ladder type polysilane squioxane obtained in Example 4 of the present invention. .
- FIG. 14 is a graph showing the ⁇ -NMR spectrum of the amino-containing ladder type polyphenylene non-squioxane obtained in Example 4 of the present invention. Show.
- FIG. 15 shows an infrared absorption spectrum of a vinyl group-containing ladder type polyvinyl phenol resin obtained in Example 6 of the present invention.
- FIG. 16 shows a 1 H-NMR spectrum of a vinyl-containing ladder-type polyvinyl succinoxane obtained in Example 6 of the present invention. Is shown.
- FIG. 17 shows the infrared absorption spectrum of the hydroxyl group-containing ladder type polyphenylsilsesquioxane obtained in Example 7 of the present invention. Indicates a toll.
- This example is directed to a method for producing a ladder-type silsesquioxane polymer having an an end by using the method described in Japanese Patent Publication No. 40-15, 989. Is shown.
- 20 parts of the silica type squisoxane produced in Reference Example 1 26 parts of 0-dichlorobenzene, and 26 parts of caustic 0.
- the mixture was heated to the reflux temperature (about 180.degree. C.) for about 1 hour until a homogeneous solution was obtained.
- the solution is cooled to room temperature, and about 100 parts of n-hexane is added to the solution to form a ladder-type ferro-polyester having no silane group. I got the siloxane prepolymer.
- the final polymerized ladder-type phenylsilsesquioxane polymer having an anodate-like end is converted to about 10 volumes of benzene per 1 volume of the reaction mixture.
- Glacial acetic acid was added in an amount sufficient to dissolve in zen and neutralize caustic.
- a polymer is precipitated by adding methanol thereto, and the polymer is vacuum-dried.
- the ladder type polyolefin having an intrinsic viscosity of 1.08 d 1 / g and having an end-like shape is obtained.
- Nylsilsquioxane polymer was obtained.
- the white powder of Anto-type octaphenylsilsesquioxane did not dissolve in toluene, but gradually dissolved as the reaction proceeded. All later dissolved.
- the solution was cooled to room temperature, and unreacted unreacted cesium hydroxide was removed by filtration.
- the solution was poured into 500 parts by weight of methanol, and the metal was added to the end. A silylated polyphenylsilsesquioxane having a acryl group was precipitated.
- the precipitate is filtered off, dried in vacuo and dried in vacuo to form a single-structure, single-cooked, poly (silyl) polyphenylsilase having a methacrylyl group at the end of a white solid.
- KB r By tablet method This filtrate and measuring the infrared absorption scan Bae click preparative le analysis, as shown in FIG. 5 S i - C f; H f, 1 absorption that will be assigned to 5 9 5 cm 1 and 1 4 3 0 cm ′, absorption capacity attributable to the antisymmetric stretching vibration of S i-0-S i, which was observed at 1 1 35 cm 1 and 1 0 2 0 cm 1 , It was found that few had a ladder structure and most of them had a kettle-type structure. In addition, the absorption attributed to Si0H was not observed at 3400 cm '.
- the mixture was poured into 0.000 parts by weight to precipitate a silylated polysilsesquioxane having a methacrylyl group at a terminal.
- the precipitate is filtered off and dried in vacuo to give a white solid with a methacrylyl-terminated ladder type polysilylated polyphenylsilsesquioxane. 72 parts by weight was obtained.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 40000.
- the absorption attributed to S i -0H was a force not observed at 3400 cm 1 .
- An an-octaphenyl produced in Reference Example 1 in a reaction vessel 20% by weight and 1,3-bis (3-glycidyl propyl) _1,1,3,3-tetramethyl selenium 18 parts by weight of siloxane, 80 parts by weight of tonolene, and 0.4 parts by weight of hydroxylamine are charged, and the mixture is stirred vigorously at the reflux temperature and heated for 5 hours.
- the white powder of An-type octaphenylsilsesquioxane did not dissolve in toluene, but was strong and gradually dissolved as the reaction proceeded. After 5 hours, all had dissolved.
- the solution was cooled to room temperature, and unreacted unreacted cesium hydroxide was removed by filtration. Then, the solution was poured into 100,000 parts by weight of methanol, and the solution was added to the terminal. A silylated polysilsesquioxane having an epoxy group was precipitated. The precipitate is filtered off, dried in vacuo, and dried in vacuo. Ladder-type silylated polysilsesquioxide having an epoxy group at the end of a white solid. 33 parts by weight of hexane were obtained.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 2500.
- This filtrate and measuring the infrared absorption scan Bae click preparative le analysis as shown in FIG. 1 1 S i - C 6 H 5 1 absorption that will be assigned to 5 9 5 cm 'and 1 4 3 0 cm
- the absorption attributed to the antisymmetric stretching vibration of Si-0-Si which indicates that the oligomer has many ladder-like structures, is 1135 cm1 and Observed at 104 cm 1 .
- the absorption attributed to S i -0H was not observed at 3400 cnr '.
- Example 4 In the reaction vessel, 20 parts by weight of the an-octaphenylsilsesquioxane prepared in Reference Example 1 and 1,3-bis (3-aminopopenole) were added. ) 20 parts by weight of 1,1,3,3-tetramethylresin siloxane, 80 parts by weight of benzene, and 0.1 part by weight of cesium hydroxide are charged. This mixture was stirred vigorously at the reflux temperature and heated for 14 hours. The solution is cooled to room temperature, and unreacted unreacted cesium hydroxide and anan-octaphenylsilsesquioxane are removed by filtration.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 40000.
- This filtrate and measuring the infrared absorption scan Bae click preparative Honoré analysis, S i as shown in FIG. 1 3 - C 6 H 5 Ru is attributed to absorption 1 5 9 5 cm ' ⁇ beauty 1 4 3 0
- the absorption attributable to the antisymmetric stretching vibration of S i -0-S i which indicates that the oligomer has many ladder structures, is 1 135 cm ' and it was observed to 1 0 4 5 cm 1.
- S i - absorption that will be attributed to 0H 3 4 0 0 observed cm 1 Lena force one was.
- the solution is cooled to room temperature, and unreacted unreacted cesium hydroxide is removed by filtration.
- the solution is poured into 100 parts by weight of n-hexane, and the terminal A silylated polyphenylsilssquioxane having a phenol group was precipitated.
- the precipitate is filtered off, dried in vacuo, and dried in vacuo to form a ladder-type poly (vinyl phenol) resin with a methyl group at the end of a white solid. 12 parts by weight of hexane were obtained.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 500,000.
- the Anto-type octaf X-nil prepared in Reference Example 1 9.6 weight parts and 1,3_ bis (vinyl)-1,1,3,3-tetramethylsiloxan 4.6 parts by weight Parts by weight, 50 parts by weight of toluene and 0.2 parts by weight of cesium hydroxide were charged, and the mixture was stirred vigorously at the reflux temperature and heated for 8.5 hours. The solution was cooled to room temperature, and the unreacted unreacted hydroxyl and anion-type octaphenylsynolessquioxane were removed by filtration.
- the resulting mixture was poured into 500 parts by weight of the toluene to precipitate silylated polyphenylsilsesquioxane having a vinyl group at a terminal.
- the precipitated product is separated by filtration and dried under vacuum to obtain a white solid having a vinyl group at the end of a ladder-type silicone resin. 7 parts by weight of san were obtained.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 370,000.
- This filtrate and measuring the infrared absorption spelling click preparative le analysis, S as shown in FIG. 1 5 i - C 6 H 5 Ru is attributed to absorption 1 5 9 5 cm 1 and 1 4 3 0 cm
- the absorption attributed to the antisymmetric stretching vibration of S i -0-S i which indicates that the oligo sesame has many ladder structures, is 1 1 3 5 cm 1 and it was observed to 1 0 4 5 cm 1.
- the absorption attributed to Si-0H was not observed at 3400 cm '.
- the solution was cooled to room temperature, and unreacted unreacted hydroxylated cesium was removed by filtration. Then, 100 parts by weight of methanol and 400 parts by weight of water were removed.
- the mixture was poured into a mixed solution of the above to precipitate a silica-terminated polyolefin resin having a hydroxy group at the terminal. The precipitate is filtered off, dried in a vacuum, and dried to give a ladder-type silylated polyphenylsilsesquioxane with a hydroxy group at the end 10 weight O got part
- the weight average molecular weight, Mw , in terms of polystyrene was measured by GPC and found to be about 140,000.
- This filtrate and measuring the infrared absorption spelling click preparative le analysis, S i as shown in FIG. 1 7 - C 6 H 5 Ru is attributed to absorption 1 5 9 5 cm 1 and 1 4 3 0 cm
- the absorption attributed to the antisymmetric stretching vibration of Si-0-Si, which indicates that the oligomer has many ladder structures, is shown in Fig. 1. and it was observed to 1 0 4 5 cm 1.
- S i - absorption that will be attributed to 0H was one Lena Kaka observed 3 4 0 0 cm 1.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 10,000.
- This filtrate and measuring the infrared absorption scan Bae click preparative le analysis the absorption Si -C Ru is attributed to 6 H 5 Osamuchikaraku 1 5 9 5 cm 'and 1 4 3 0 cm 1, or the absorption port re M a is Ru is attributed to the antisymmetric stretching vibration of Si -0- Si to indicate that that having a ladder structure was observed in 1 1 3 5 cm 1 and 1 0 4 5 cm 1
- the absorption attributed to Si-0H was a force not observed at 3400 cm '.
- Ladder-type polysiloxane preparation without silane group produced in Reference Example 2 in 50 parts by weight of xylene Lima (Polystyrene equivalent weight average molecular weight Mw 10000 by GPC) 10 parts by weight and 1,3 bis (3-glycidoxypropinole)-1, 50 parts by weight of 1,3,3-tetramethylresin siloxane are dissolved, 0.05 parts by weight of sodium hydroxide is added, and the mixture is heated to the reflux temperature. And heated for 72 hours. The solution was cooled to room temperature, and unreacted unreacted sodium hydroxide was removed by filtration. Then, the solution was poured into 100 parts by weight of acetonitrile resin, and then poured.
- xylene Lima Polystyrene equivalent weight average molecular weight Mw 10000 by GPC
- 1,3 bis (3-glycidoxypropinole)-1 50 parts by weight of 1,3,3-tetramethylresin siloxane are dissolved, 0.05
- Silylated polysilsesquioxane having an epoxy group at the end was precipitated.
- the precipitated product is separated by filtration and dried in vacuo to form a white solid with an epoxy group at the end of the ladder.
- the ladder type is silinated polyphenylenesilyl sesquioxane. 13 parts by weight were obtained.
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 300,000. This filtrate and measuring the infrared absorption spelling click preparative le analysis, S i - to C 6 H absorbed Ru is attributed to r) Chikaraku 1 5 9 5 cm 1 and 1 4 3 0 cm 1, was or The absorption attributed to the antisymmetric stretching vibration of S i -0- S i, which indicates that the polymer has a ladder structure, is 1135 cm 1 and 1045 cnT The absorption attributable to Si-0H was observed at 340 cm-'and was not observed at 340 cm-'.
- the solution was cooled to room temperature, and the insoluble unreacted L-hydroxyl sulfide was removed by filtration. Then, 100 parts by weight of methanol and 400 parts by weight of water were added. Poured into the mixed solution in parts by weight to precipitate sedimented polysulfide silsesquioxane with a maleol capping group at the end. The product is filtered off, dried in vacuum, and ladder type silylated polyolefin with a mercapto group at the end. 10 weight Got the part
- the weight average molecular weight Mw in terms of polystyrene was measured by GPC and found to be about 1500.
- This filtrate and measuring the infrared absorption spelling click preparative le analysis S i - to C 6 H 5 Ru is attributed to absorption 1 5 9 5 cm 'and 1 4 3 0 cm', or ⁇ O
- the absorptions attributed to the antisymmetric stretching vibrations of Si-O-Si, which indicate that the ladder has many ladder structures, are 1 1 3 5 cm 1 and 10 4 5 cm — 1 Observed at Also, S i - absorption that will be attributed to 0H 3 4 0 0 observed cm 1 Lena force, one was.
- a polyhydroxyl group containing a terminal hydroxy group is provided.
- Noresilesquioxane is synthesized through a reaction route that does not pass through once, and has various reactive functional groups at its ends.
- Kokixan can be synthesized directly and simply. Further, the silylidopolysilsesquioxane synthesized thereby has a defect in which a silanol group is contained as a branched structure.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/381,045 US6284858B1 (en) | 1997-03-14 | 1998-03-16 | Silicone compounds and process for producing the same |
KR10-1999-7008360A KR100504288B1 (ko) | 1997-03-14 | 1998-03-16 | 실리콘 화합물 및 그 제조 방법 |
EP98907245A EP0967237B1 (en) | 1997-03-14 | 1998-03-16 | Silicone compounds and process for producing the same |
DE69818644T DE69818644T2 (de) | 1997-03-14 | 1998-03-16 | Silikonzusammensetzungen und verfahren zu deren herstellung |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP06090497A JP4118973B2 (ja) | 1997-03-14 | 1997-03-14 | シリコーン化合物及びその製造方法 |
JP9/60904 | 1997-03-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998041566A1 true WO1998041566A1 (fr) | 1998-09-24 |
Family
ID=13155823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1998/001098 WO1998041566A1 (fr) | 1997-03-14 | 1998-03-16 | Compose de silicium et son procede de fabrication |
Country Status (6)
Country | Link |
---|---|
US (1) | US6284858B1 (ja) |
EP (1) | EP0967237B1 (ja) |
JP (1) | JP4118973B2 (ja) |
KR (1) | KR100504288B1 (ja) |
DE (1) | DE69818644T2 (ja) |
WO (1) | WO1998041566A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000059987A1 (fr) * | 1999-03-30 | 2000-10-12 | Nippon Steel Chemical Co., Ltd. | Resine de silicone et composition de resine photosensible contenant cette resine de silicone |
WO2000076634A1 (en) * | 1999-06-11 | 2000-12-21 | Gas Separation Technology, Inc. | Porous gas permeable material for gas separation |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100722731B1 (ko) * | 1999-03-31 | 2007-05-29 | 미쓰비시 마테리알 가부시키가이샤 | 다면체 유기규소 화합물 및 그의 제조방법 |
ATE341556T1 (de) * | 1999-08-04 | 2006-10-15 | Hybrid Plastics | Verfahren zur herstellung polyhedrischer oligomerer silsesquioxane |
KR100624603B1 (ko) * | 2000-03-31 | 2006-09-19 | 히다치 가세고교 가부시끼가이샤 | 신규한 실리콘 중합체의 제조 방법, 이 방법에 의해제조된 실리콘 중합체, 열경화성 수지 조성물, 수지 필름,절연 재료 부착 금속박, 양면 금속박 부착 절연 필름,금속장 적층판, 다층 금속장 적층판 및 다층 프린트 배선판 |
WO2001094355A1 (en) * | 2000-06-06 | 2001-12-13 | Board Of Trustees Of The University Of Illinois | Cross-coupling reaction of organosilicon nucleophiles |
JP4381636B2 (ja) * | 2001-11-05 | 2009-12-09 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
SG102047A1 (en) | 2002-05-02 | 2004-02-27 | Dso Nat Lab | Ladder-like silicone polymers |
JP4158457B2 (ja) * | 2002-08-27 | 2008-10-01 | チッソ株式会社 | ケイ素化合物含有複合材料および記録素子 |
CN100339408C (zh) | 2003-03-27 | 2007-09-26 | 新日铁化学株式会社 | 硅树脂组合物及其模塑体 |
JP4306317B2 (ja) * | 2003-04-24 | 2009-07-29 | チッソ株式会社 | 液晶配向膜形成用ワニス、液晶配向膜および液晶表示素子 |
JP4734832B2 (ja) * | 2003-05-14 | 2011-07-27 | ナガセケムテックス株式会社 | 光素子用封止材 |
JP4396139B2 (ja) * | 2003-05-27 | 2010-01-13 | チッソ株式会社 | シルセスキオキサン骨格を有するポリマーおよびその薄膜の形成方法 |
JP4602842B2 (ja) * | 2005-06-07 | 2010-12-22 | 東京応化工業株式会社 | 反射防止膜形成用組成物、それを用いた反射防止膜 |
JP4781780B2 (ja) * | 2005-10-27 | 2011-09-28 | 信越化学工業株式会社 | 光関連デバイス封止用樹脂組成物およびその硬化物ならびに半導体素子の封止方法 |
JP5459929B2 (ja) * | 2005-11-14 | 2014-04-02 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | ケイ素含有ポリマーおよびそのポリマーから形成される光導波路 |
KR101494850B1 (ko) * | 2007-02-16 | 2015-02-23 | 신닛테츠 수미킨 가가쿠 가부시키가이샤 | 관능기를 가지는 케이지 개열형 실록산수지와 그 제조방법 |
JP5403730B2 (ja) * | 2008-03-07 | 2014-01-29 | 株式会社Adeka | 低誘電性絶縁膜、プラズマディスプレイおよびその製造方法 |
CN102027047B (zh) | 2008-05-16 | 2013-02-13 | 日本电气株式会社 | 金属氧化物基微粒及其制造方法以及树脂组合物 |
JPWO2009139462A1 (ja) | 2008-05-16 | 2011-09-22 | 日本電気株式会社 | 有機シリコン化合物およびシリカ系微粒子形成用材料 |
JP5773131B2 (ja) * | 2011-03-02 | 2015-09-02 | 荒川化学工業株式会社 | チオール基含有シルセスキオキサンの製造方法ならびにチオール基含有シルセスキオキサンを含む硬化性樹脂組成物、当該硬化物、およびこれらから誘導される各種物品 |
WO2015130143A1 (ko) * | 2014-02-28 | 2015-09-03 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
WO2015130145A1 (ko) * | 2014-02-28 | 2015-09-03 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
WO2015130144A1 (ko) * | 2014-02-28 | 2015-09-03 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
KR102363819B1 (ko) * | 2014-02-28 | 2022-02-17 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자 및 이의 제조방법 |
WO2015133864A1 (ko) * | 2014-03-07 | 2015-09-11 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자를 포함하는 열가소성 수지 조성물 |
KR102325278B1 (ko) * | 2014-03-07 | 2021-11-16 | 주식회사 동진쎄미켐 | 실세스퀴옥산 복합 고분자를 포함하는 열가소성 수지 조성물 |
US10280336B2 (en) * | 2014-03-31 | 2019-05-07 | Dongjin Semichem Co., Ltd. | Coating method for preventing bending phenomenon of substrate |
CN109942819A (zh) * | 2019-03-28 | 2019-06-28 | 北京理工大学 | 一种直链梯形聚苯基硅倍半氧烷的制备方法 |
CN114867794B (zh) * | 2019-12-31 | 2023-10-27 | 株式会社东进世美肯 | 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0232356A (ja) * | 1988-07-21 | 1990-02-02 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH04185641A (ja) * | 1990-11-20 | 1992-07-02 | Fujitsu Ltd | 耐熱性樹脂組成物と絶縁膜の製造方法 |
JPH04353521A (ja) * | 1991-05-30 | 1992-12-08 | Toray Dow Corning Silicone Co Ltd | オルガノポリシルセスキオキサンおよびその製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3017386A (en) * | 1959-01-21 | 1962-01-16 | Gen Electric | Benzene soluble phenyl silsesquioxanes |
JPS5146599B2 (ja) | 1973-05-28 | 1976-12-09 | ||
JPS5011199A (ja) | 1973-05-28 | 1975-02-05 | ||
JPS5011198A (ja) | 1973-05-29 | 1975-02-05 | ||
US3944520A (en) * | 1974-04-18 | 1976-03-16 | Andrianov Kuzma A | Cyclolinear polyorganosiloxanes and method for preparing same |
JPS531000B2 (ja) * | 1974-04-22 | 1978-01-13 | ||
JPS6017214B2 (ja) | 1977-01-14 | 1985-05-01 | ジェイエスアール株式会社 | 可溶性メチルポリシロキサンおよびその製造法 |
JPS5712057A (en) | 1980-06-26 | 1982-01-21 | Hitachi Chem Co Ltd | Preparation of silicone compound |
JPS5850657B2 (ja) | 1980-07-09 | 1983-11-11 | 日立化成工業株式会社 | 末端ヒドロキシフェニルラダ−ポリシロキサンの製造法 |
JPS59213728A (ja) | 1983-05-17 | 1984-12-03 | Mitsubishi Electric Corp | シリコ−ン化合物の製造法 |
JPS60110726A (ja) | 1983-11-18 | 1985-06-17 | Mitsubishi Electric Corp | シリコ−ン化合物の製法 |
JPS61221232A (ja) | 1985-03-28 | 1986-10-01 | Fujitsu Ltd | シリル化ポリオルガノシルセスキオキサンの製法 |
JPS62215944A (ja) | 1986-03-18 | 1987-09-22 | Fujitsu Ltd | 感光性耐熱樹脂組成物及び絶縁層形成方法 |
JPS6313446A (ja) | 1986-07-03 | 1988-01-20 | Fujitsu Ltd | デ−タ誤り訂正回路 |
JPH0395227A (ja) * | 1989-09-07 | 1991-04-19 | Shin Etsu Chem Co Ltd | アミノ基含有ポリシロキサンの製造方法 |
JP2915480B2 (ja) | 1990-03-30 | 1999-07-05 | 昭和電工株式会社 | 紫外線硬化性組成物 |
JP2892774B2 (ja) | 1990-05-30 | 1999-05-17 | 昭和電工株式会社 | 被覆ポリカーボネート成形品の製造方法 |
JPH0770321A (ja) | 1993-09-01 | 1995-03-14 | Showa Denko Kk | 反応性ポリメチルシルセスキオキサン |
-
1997
- 1997-03-14 JP JP06090497A patent/JP4118973B2/ja not_active Expired - Fee Related
-
1998
- 1998-03-16 WO PCT/JP1998/001098 patent/WO1998041566A1/ja active IP Right Grant
- 1998-03-16 US US09/381,045 patent/US6284858B1/en not_active Expired - Lifetime
- 1998-03-16 KR KR10-1999-7008360A patent/KR100504288B1/ko not_active IP Right Cessation
- 1998-03-16 DE DE69818644T patent/DE69818644T2/de not_active Expired - Lifetime
- 1998-03-16 EP EP98907245A patent/EP0967237B1/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0232356A (ja) * | 1988-07-21 | 1990-02-02 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH04185641A (ja) * | 1990-11-20 | 1992-07-02 | Fujitsu Ltd | 耐熱性樹脂組成物と絶縁膜の製造方法 |
JPH04353521A (ja) * | 1991-05-30 | 1992-12-08 | Toray Dow Corning Silicone Co Ltd | オルガノポリシルセスキオキサンおよびその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP0967237A4 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000059987A1 (fr) * | 1999-03-30 | 2000-10-12 | Nippon Steel Chemical Co., Ltd. | Resine de silicone et composition de resine photosensible contenant cette resine de silicone |
US6767983B1 (en) | 1999-03-30 | 2004-07-27 | Nippon Steel Chemical Co., Ltd. | Silicone resin and photosensitive resin composition containing the same |
WO2000076634A1 (en) * | 1999-06-11 | 2000-12-21 | Gas Separation Technology, Inc. | Porous gas permeable material for gas separation |
US6425936B1 (en) | 1999-06-11 | 2002-07-30 | Gas Separatation Technology, Inc. | Porous gas permeable material for gas separation |
US6558455B2 (en) * | 1999-06-11 | 2003-05-06 | Gas Separation Technology Inc. | Porous gas permeable material for gas separation |
US6866697B2 (en) * | 1999-06-11 | 2005-03-15 | Gas Separation Technology, Inc. | Porous gas permeable material for gas separation |
US7314504B2 (en) | 1999-06-11 | 2008-01-01 | Gas Separation Technology, Inc. | Porous gas permeable material for gas separation |
Also Published As
Publication number | Publication date |
---|---|
EP0967237A1 (en) | 1999-12-29 |
JPH10251407A (ja) | 1998-09-22 |
EP0967237B1 (en) | 2003-10-01 |
JP4118973B2 (ja) | 2008-07-16 |
DE69818644T2 (de) | 2004-08-05 |
KR100504288B1 (ko) | 2005-07-28 |
DE69818644D1 (de) | 2003-11-06 |
EP0967237A4 (en) | 2000-01-12 |
KR20000076264A (ko) | 2000-12-26 |
US6284858B1 (en) | 2001-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO1998041566A1 (fr) | Compose de silicium et son procede de fabrication | |
KR100962056B1 (ko) | 오가노하이드로겐실리콘 화합물 | |
EP1493746B1 (en) | Multi-functional cyclic siloxane compound, siloxane-based polymer prepared from the compound and process for preparing dielectric film by using the polymer | |
EP0542484B1 (en) | Organosilicon compounds and compositions containing them | |
US5331020A (en) | Organosilicon compounds and compositions containing them | |
JP2003523422A (ja) | ポリオルガノシルセスキオキサン及びその製造方法 | |
EP0927736B1 (en) | Silphenylene polymer and composition containing same | |
JP2733514B2 (ja) | アルコキシ官能樹脂類及びそれらを含む組成物 | |
CN114929784B (zh) | 低硅氧烷环含量的官能化q-t-硅氧烷基聚合物材料和制备方法 | |
CN100393730C (zh) | 多官能环状硅酸盐(或酯)化合物,由该化合物制得的基于硅氧烷的聚合物和使用该聚合物制备绝缘膜的方法 | |
WO2010062695A2 (en) | Properties tailoring in silsesquioxanes | |
US7479509B2 (en) | Low dielectric organosilicate polymer composite | |
JPH07228701A (ja) | ケイ素原子結合水素原子含有シリコーン樹脂の製造方法 | |
JP3801208B2 (ja) | 硬化性ポリメチルシルセスキオキサン組成物 | |
US20160229962A1 (en) | Silicone chain extender | |
JP2003517072A (ja) | トリフル酸又はトリフル酸誘導体を主体とした触媒系で触媒された重合によるポリオルガノシロキサンを製造するための方法 | |
CN115803366B (zh) | 制备聚硅氧烷的前体、聚硅氧烷及其制备方法、聚硅氧烷树脂及其制备方法和光电子器件 | |
RU2277106C1 (ru) | Гидридфункциональные полициклические кремнийорганические полимеры и способ их получения | |
JP2739222B2 (ja) | 高エネルギー線硬化用オルガノポリシロキサンおよびその製造方法 | |
JP3110127B2 (ja) | 分岐ポリシロキサンの製造方法 | |
US5516871A (en) | Diphenylsiloxane oligomers functionalized at both terminals and methods for the preparation thereof | |
JP2001181398A (ja) | 含ケイ素重合体およびその製造方法 | |
JP3584482B2 (ja) | 新規シリコーン化合物とその製造法 | |
JPH08253590A (ja) | (メタ)アクリロイルオキシル基含有オルガノポリシロキサンの製造方法 | |
JP2024099131A (ja) | アクリル基及びアルケニル基含有オルガノポリシロキサン及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1998907245 Country of ref document: EP Ref document number: 09381045 Country of ref document: US Ref document number: 1019997008360 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 1998907245 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1019997008360 Country of ref document: KR |
|
WWG | Wipo information: grant in national office |
Ref document number: 1998907245 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 1019997008360 Country of ref document: KR |