KR100962056B1 - 오가노하이드로겐실리콘 화합물 - Google Patents
오가노하이드로겐실리콘 화합물 Download PDFInfo
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- KR100962056B1 KR100962056B1 KR1020047017589A KR20047017589A KR100962056B1 KR 100962056 B1 KR100962056 B1 KR 100962056B1 KR 1020047017589 A KR1020047017589 A KR 1020047017589A KR 20047017589 A KR20047017589 A KR 20047017589A KR 100962056 B1 KR100962056 B1 KR 100962056B1
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 74
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- 238000006243 chemical reaction Methods 0.000 claims description 52
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 46
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- 125000000524 functional group Chemical group 0.000 claims description 33
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- 239000006260 foam Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-L fumarate(2-) Chemical class [O-]C(=O)\C=C\C([O-])=O VZCYOOQTPOCHFL-OWOJBTEDSA-L 0.000 description 1
- XLYMOEINVGRTEX-UHFFFAOYSA-N fumaric acid monoethyl ester Natural products CCOC(=O)C=CC(O)=O XLYMOEINVGRTEX-UHFFFAOYSA-N 0.000 description 1
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 1
- 150000004687 hexahydrates Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 230000002779 inactivation Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- NKHAVTQWNUWKEO-IHWYPQMZSA-N methyl hydrogen fumarate Chemical compound COC(=O)\C=C/C(O)=O NKHAVTQWNUWKEO-IHWYPQMZSA-N 0.000 description 1
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 229940074369 monoethyl fumarate Drugs 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- XUIMIQQOPSSXEZ-OUBTZVSYSA-N silicon-29 atom Chemical compound [29Si] XUIMIQQOPSSXEZ-OUBTZVSYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- JMTMWSZLPHDWBQ-UHFFFAOYSA-N tetrakis[ethenyl(dimethyl)silyl] silicate Chemical compound C=C[Si](C)(C)O[Si](O[Si](C)(C)C=C)(O[Si](C)(C)C=C)O[Si](C)(C)C=C JMTMWSZLPHDWBQ-UHFFFAOYSA-N 0.000 description 1
- CKMVRBFKYLMXHU-UHFFFAOYSA-N tetrakis[hex-1-enyl(dimethyl)silyl] silicate Chemical compound CCCCC=C[Si](C)(C)O[Si](O[Si](C)(C)C=CCCCC)(O[Si](C)(C)C=CCCCC)O[Si](C)(C)C=CCCCC CKMVRBFKYLMXHU-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005628 tolylene group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- JNRUXZIXAXHXTN-UHFFFAOYSA-N trimethyl(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)C JNRUXZIXAXHXTN-UHFFFAOYSA-N 0.000 description 1
- ZGBHPZUKKNSAOS-UHFFFAOYSA-N tris(ethenyl)borane Chemical compound C=CB(C=C)C=C ZGBHPZUKKNSAOS-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
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- Chemical & Material Sciences (AREA)
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Silicon Polymers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims (22)
- 분자당 하나 이상의 규소 결합된 수소원자를 함유하는 화학식 I의 오가노하이드로겐실리콘 화합물.화학식 I상기 화학식 I에서,R은 각각 독립적으로 수소원자 및 지방족 불포화도를 함유하지 않는 탄소수 1 내지 20의 1가 탄화수소 그룹으로부터 선택되고,a는 1 내지 18의 정수이고,b는 1 내지 19의 정수이고,a+b는 3 내지 20의 정수이고,X는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 -Z-R4 그룹으로부터 독립적으로 선택되고, 여기서 Z는 각각 독립적으로 산소 및 탄소수 2 내지 20의 2가 탄화수소 그룹으로부터 선택되고, R4 그룹은 각각 독립적으로 -BRuY2-u 및 화학식 II의 그룹으로부터 선택되며,화학식 II(Y3-nRnSiO1/2)c(Y2-oRoSiO2/2)d(Y1-pRpSiO3/2)e(SiO4/2)f(CRqY1-q)g(CRrY2-r)h(O(CRsY2-s))i(CRtY3-t)j이들 화학식에서,B는 붕소이고,R은 각각 상기 정의된 바와 같고,c+d+e+f+g+h+i+j는 2 이상이고,n은 0 내지 3의 정수이고,o는 0 내지 2의 정수이고,p는 0 내지 1의 정수이고,q는 0 내지 1의 정수이고,r은 0 내지 2의 정수이고,s는 0 내지 2의 정수이고,t는 0 내지 3의 정수이고,u는 0 내지 2의 정수이고,Y는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 Z-G 그룹으로부터 독립적으로 선택되고, 여기서, Z는 상기 정의된 바와 같고, G는 각각 화학식 III의 사이클로실록산이며,화학식 III상기 화학식 III에서,R 및 X는 상기 정의된 바와 같고,k는 0 내지 18의 정수이고,m은 0 내지 18의 정수이고,k+m은 2 내지 20의 정수이고,단, 화학식 II에서, Y 그룹 중의 하나는 R4 그룹을 화학식 I의 사이클로실록산에 결합시키는 Z 그룹에 의해 치환되고, 추가로 (a) 화학식 I의 하나 이상의 X 그룹은 -Z-R4 그룹이고, (b) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 e+f+g+h+i+j가 0이고 d가 0 초과이면, 하나 이상의 d 단위(즉, Y2-oRoSiO2/2)는 하나의 -Z-G 그룹을 함유하거나, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (c) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 d+e+f+g+h+i+j가 0이면, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (d) g+h+i+j가 0 초과이면, c+d+e+f는 0 초과이다.
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- (1) (A) 분자당 2개 이상의 SiH 결합을 포함하는 화학식 의 오가노하이드로겐 사이클로실록산 하나 이상과 (B) 분자당 하나 이상의 지방족 불포화도 또는 하나 이상의 하이드록시 그룹을 포함하는 화학식 BRuA3-u 또는 화학식 (A3-nRnSiO1/2)c(A2-oRoSiO2/2)d(A1-pRpSiO3/2)e(SiO4/2)f(CRqA1-q)g(CRrA2-r)h(O(CRsA2-s))i(CRtA3-t)j의 그룹의 화합물 하나 이상을 (A) 성분에서의 SiH 결합 대 (B) 성분의 지방족 불포화도 또는 하이드록시 그룹의 비가 2.5:1 이상이도록 혼합하는 단계;(2) (A) 성분과 (B) 성분을 (C) 촉매의 존재하에 반응시켜 분자당 하나 이상의 SiH 결합을 갖는 화학식 I의 오가노하이드로겐실리콘 화합물을 포함하는 반응 혼합물을 형성하는 단계;(3) 임의로, 억제제를 반응 혼합물에 첨가하는 단계; 및(4) 임의로, 오가노하이드로겐실리콘 화합물을 분리하는 단계를 추가로 포함하는, 하나 이상의 규소 결합된 수소를 갖는 오가노하이드로겐실리콘 화합물의 제조방법.화학식 I상기 화학식 I 및 (1) 단계에서 언급된 화학식들에서,R은 각각 독립적으로 수소원자 및 지방족 불포화도를 함유하지 않는 탄소수 1 내지 20의 1가 탄화수소 그룹으로부터 선택되고,a는 1 내지 18의 정수이고,b는 1 내지 19의 정수이고,a+b는 3 내지 20의 정수이고,X는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 -Z-R4 그룹으로부터 독립적으로 선택되고, 여기서 Z는 각각 독립적으로 산소 및 탄소수 2 내지 20의 2가 탄화수소 그룹으로부터 선택되고, R4 그룹은 각각 독립적으로 -BRuY2-u 및 화학식 II의 그룹으로부터 선택되며,화학식 II(Y3-nRnSiO1/2)c(Y2-oRoSiO2/2)d(Y1-pRpSiO3/2)e(SiO4/2)f(CRqY1-q)g(CRrY2-r)h(O(CRsY2-s))i(CRtY3-t)j이들 화학식에서,B는 붕소이고,R은 각각 상기 정의된 바와 같고,c+d+e+f+g+h+i+j는 2 이상이고,n은 0 내지 3의 정수이고,o는 0 내지 2의 정수이고,p는 0 내지 1의 정수이고,q는 0 내지 1의 정수이고,r은 0 내지 2의 정수이고,s는 0 내지 2의 정수이고,t는 0 내지 3의 정수이고,u는 0 내지 2의 정수이고,A는 각각 독립적으로 하이드록시 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 탄화수소 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 옥시탄화수소 그룹, 및 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹으로부터 선택되고,단, 하나 이상의 A 그룹은 지방족 불포화도 또는 하이드록시 그룹을 갖고,Y는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 Z-G 그룹으로부터 독립적으로 선택되고, 여기서, Z는 상기 정의된 바와 같고, G는 각각 화학식 III의 사이클로실록산이고,화학식 III상기 화학식 III에서,R 및 X는 상기 정의된 바와 같고,k는 0 내지 18의 정수이고,m은 0 내지 18의 정수이고,k+m은 2 내지 20의 정수이고,단, 화학식 II에서, Y 그룹 중의 하나는 R4 그룹을 화학식 I의 사이클로실록산에 결합시키는 Z 그룹에 의해 치환되고, 추가로 (a) 화학식 I의 하나 이상의 X 그룹은 -Z-R4 그룹이고, (b) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 e+f+g+h+i+j가 0이고 d가 0 초과이면, 하나 이상의 d 단위(즉, Y2-oRoSiO2/2)는 하나의 -Z-G 그룹을 함유하거나, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (c) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 d+e+f+g+h+i+j가 0이면, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (d) g+h+i+j가 0 초과이면, c+d+e+f는 0 초과이다.
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- (2') (B) 분자당 하나 이상의 지방족 불포화도 또는 하나 이상의 하이드록시 그룹을 포함하는 화학식 BRuA3-u 또는 화학식 (A3-nRnSiO1/2)c(A2-oRoSiO2/2)d(A1-pRpSiO3/2)e(SiO4/2)f(CRqA1-q)g(CRrA2-r)h(O(CRsA2-s))i(CRtA3-t)j의 그룹의 화합물 하나 이상을 (A) 성분에서의 SiH 결합 대 (B) 성분의 지방족 불포화도 또는 하이드록시 그룹의 비가 2.5:1 이상이도록 SiH 예비혼합물에 첨가하여 반응을 수행하여 분자당 하나 이상의 SiH 결합을 갖는 화학식 I의 오가노하이드로겐실리콘 화합물을 포함하는 반응 혼합물을 형성하는 단계;(3') 임의로, 억제제를 반응 혼합물에 첨가하는 단계; 및(4') 임의로, 오가노하이드로겐실리콘 화합물을 분리하는 단계를 추가로 포함하는, 하나 이상의 규소 결합된 수소를 갖는 오가노하이드로겐실리콘 화합물의 제조방법.화학식 I상기 화학식 I 및 (1') 단계 및 (2') 단계에서 언급된 화학식들에서,B는 붕소이고,R은 각각 독립적으로 수소원자 및 지방족 불포화도를 함유하지 않는 탄소수 1 내지 20의 1가 탄화수소 그룹으로부터 선택되고,a는 1 내지 18의 정수이고,b는 1 내지 19의 정수이고,a+b는 3 내지 20의 정수이고,X는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 -Z-R4 그룹으로부터 독립적으로 선택되고, 여기서 Z는 각각 독립적으로 산소 및 탄소수 2 내지 20의 2가 탄화수소 그룹으로부터 선택되고, R4 그룹은 각각 독립적으로 -BRuY2-u 및 화학식 II의 그룹으로부터 선택되며,화학식 II(Y3-nRnSiO1/2)c(Y2-oRoSiO2/2)d(Y1-pRpSiO3/2)e(SiO4/2)f(CRqY1-q)g(CRrY2-r)h(O(CRsY2-s))i(CRtY3-t)j이들 화학식에서,B는 붕소이고,R은 각각 상기 정의된 바와 같고,c+d+e+f+g+h+i+j는 2 이상이고,n은 0 내지 3의 정수이고,o는 0 내지 2의 정수이고,p는 0 내지 1의 정수이고,q는 0 내지 1의 정수이고,r은 0 내지 2의 정수이고,s는 0 내지 2의 정수이고,t는 0 내지 3의 정수이고,u는 0 내지 2의 정수이고,A는 각각 독립적으로 하이드록시 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 탄화수소 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 옥시탄화수소 그룹, 및 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹으로부터 선택되고,단, 하나 이상의 A 그룹은 지방족 불포화도 또는 하이드록시 그룹을 갖고,Y는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 Z-G 그룹으로부터 독립적으로 선택되고, 여기서, Z는 상기 정의된 바와 같고, G는 각각 화학식 III의 사이클로실록산이며,화학식 III상기 화학식 III에서,R 및 X는 상기 정의된 바와 같고,k는 0 내지 18의 정수이고,m은 0 내지 18의 정수이고,k+m은 2 내지 20의 정수이고,단, 화학식 II에서, Y 그룹 중의 하나는 R4 그룹을 화학식 I의 사이클로실록산에 결합시키는 Z 그룹에 의해 치환되고, 추가로 (a) 화학식 I의 하나 이상의 X 그룹은 -Z-R4 그룹이고, (b) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 e+f+g+h+i+j가 0이고 d가 0 초과이면, 하나 이상의 d 단위(즉, Y2-oRoSiO2/2)는 하나의 -Z-G 그룹을 함유하거나, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (c) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 d+e+f+g+h+i+j가 0이면, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (d) g+h+i+j가 0 초과이면, c+d+e+f는 0 초과이다.
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- (1") (B) 분자당 하나 이상의 지방족 불포화도 또는 하나 이상의 하이드록시 그룹을 포함하는 화학식 BRuA3-u 또는 화학식 (A3-nRnSiO1/2)c(A2-oRoSiO2/2)d(A1-pRpSiO3/2)e(SiO4/2)f(CRqA1-q)g(CRrA2-r)h(O(CRsA2-s))i(CRtA3-t)j의 그룹의 화합물 하나 이상과 (C) 촉매를 혼합하여 각각 지방족 불포화 예비혼합물 또는 하이드록시 예비혼합물을 형성하는 단계;(2") 지방족 불포화 예비혼합물 또는 하이드록시 예비혼합물을 (A) 분자당 2개 이상의 SiH 결합을 포함하는 화학식 의 오가노하이드로겐 사이클로실록산 하나 이상에 (A) 성분에서의 SiH 결합 대 (B) 성분의 지방족 불포화도 또는 하이드록시 그룹의 비가 2.5:1 이상이도록 첨가하여 반응을 수행하여 분자당 하나 이상의 SiH 결합을 갖는 화학식 I의 오가노하이드로겐실리콘 화합물을 포함하는 반응 혼합물을 형성하는 단계;(3") 임의로, 억제제를 반응 혼합물에 첨가하는 단계; 및(4") 임의로, 오가노하이드로겐실리콘 화합물을 분리하는 단계를 추가로 포함하는, 하나 이상의 규소 결합된 수소를 갖는 오가노하이드로겐실리콘 화합물의 제조방법.화학식 I상기 화학식 I 및 (1") 단계 및 (2") 단계에서 언급된 화학식들에서,B는 붕소이고,R은 각각 독립적으로 수소원자 및 지방족 불포화도를 함유하지 않는 탄소수 1 내지 20의 1가 탄화수소 그룹으로부터 선택되고,a는 1 내지 18의 정수이고,b는 1 내지 19의 정수이고,a+b는 3 내지 20의 정수이고,X는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 -Z-R4 그룹으로부터 독립적으로 선택되고, 여기서 Z는 각각 독립적으로 산소 및 탄소수 2 내지 20의 2가 탄화수소 그룹으로부터 선택되고, R4 그룹은 각각 독립적으로 -BRuY2-u 및 화학식 II의 그룹으로부터 선택되며,화학식 II(Y3-nRnSiO1/2)c(Y2-oRoSiO2/2)d(Y1-pRpSiO3/2)e(SiO4/2)f(CRqY1-q)g(CRrY2-r)h(O(CRsY2-s))i(CRtY3-t)j이들 화학식에서,B는 붕소이고,R은 각각 상기 정의된 바와 같고,c+d+e+f+g+h+i+j는 2 이상이고,n은 0 내지 3의 정수이고,o는 0 내지 2의 정수이고,p는 0 내지 1의 정수이고,q는 0 내지 1의 정수이고,r은 0 내지 2의 정수이고,s는 0 내지 2의 정수이고,t는 0 내지 3의 정수이고,u는 0 내지 2의 정수이고,A는 각각 독립적으로 하이드록시 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 탄화수소 그룹, 하나 이상의 지방족 불포화도를 갖는 탄소수 2 내지 약 20의 1가 옥시탄화수소 그룹, 및 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹으로부터 선택되고,단, 하나 이상의 A 그룹은 지방족 불포화도 또는 하이드록시 그룹을 갖고,Y는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹 및 실릴 그룹으로부터 선택된 작용성 그룹 및 Z-G 그룹으로부터 독립적으로 선택되고, 여기서, Z는 상기 정의된 바와 같고, G는 각각 화학식 III의 사이클로실록산이며,화학식 III상기 화학식 III에서,R 및 X는 상기 정의된 바와 같고,k는 0 내지 18의 정수이고,m은 0 내지 18의 정수이고,k+m은 2 내지 20의 정수이고,단, 화학식 II에서, Y 그룹 중의 하나는 R4 그룹을 화학식 I의 사이클로실록산에 결합시키는 Z 그룹에 의해 치환되고, 추가로 (a) 화학식 I의 하나 이상의 X 그룹은 -Z-R4 그룹이고, (b) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 e+f+g+h+i+j가 0이고 d가 0 초과이면, 하나 이상의 d 단위(즉, Y2-oRoSiO2/2)는 하나의 -Z-G 그룹을 함유하거나, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (c) Z가 2가 탄화수소 그룹이고 a가 1이고 c가 2이고 d+e+f+g+h+i+j가 0이면, c 단위(즉, Y3-nRnSiO1/2)는 -Z-G 그룹을 전혀 갖지 않거나 둘 이상의 -Z-G 그룹을 함유하고, (d) g+h+i+j가 0 초과이면, c+d+e+f는 0 초과이다.
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US6605734B2 (en) | 2001-12-07 | 2003-08-12 | Dow Corning Corporation | Alkene-platinum-silyl complexes |
JP4726383B2 (ja) * | 2002-02-15 | 2011-07-20 | 信越化学工業株式会社 | 放射線硬化性シリコーンゴム組成物および接着性シリコーンエラストマーフィルム |
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2003
- 2003-04-29 CN CNB038125099A patent/CN100334134C/zh not_active Expired - Lifetime
- 2003-04-29 EP EP03728589A patent/EP1499661B1/en not_active Expired - Lifetime
- 2003-04-29 JP JP2004501487A patent/JP4755824B2/ja not_active Expired - Lifetime
- 2003-04-29 WO PCT/US2003/013203 patent/WO2003093349A1/en active IP Right Grant
- 2003-04-29 US US10/512,750 patent/US7429636B2/en not_active Expired - Lifetime
- 2003-04-29 AT AT03728589T patent/ATE363504T1/de not_active IP Right Cessation
- 2003-04-29 DE DE60314126T patent/DE60314126T2/de not_active Expired - Lifetime
- 2003-04-29 AU AU2003234276A patent/AU2003234276A1/en not_active Abandoned
- 2003-04-29 KR KR1020047017589A patent/KR100962056B1/ko active IP Right Grant
- 2003-04-30 MY MYPI20031647A patent/MY129816A/en unknown
Non-Patent Citations (1)
Title |
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Bulletin of the Chemical Society of Japan, Vol.38 , No.12(1965), pp.2182-2186. |
Also Published As
Publication number | Publication date |
---|---|
DE60314126T2 (de) | 2008-01-31 |
AU2003234276A1 (en) | 2003-11-17 |
US20050256286A1 (en) | 2005-11-17 |
US7429636B2 (en) | 2008-09-30 |
MY129816A (en) | 2007-05-31 |
CN100334134C (zh) | 2007-08-29 |
WO2003093349A1 (en) | 2003-11-13 |
ATE363504T1 (de) | 2007-06-15 |
KR20040106442A (ko) | 2004-12-17 |
EP1499661A1 (en) | 2005-01-26 |
CN1656152A (zh) | 2005-08-17 |
DE60314126D1 (de) | 2007-07-12 |
JP2005523980A (ja) | 2005-08-11 |
JP4755824B2 (ja) | 2011-08-24 |
EP1499661B1 (en) | 2007-05-30 |
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