USD877101S1 - Target profile for a physical vapor deposition chamber target - Google Patents

Target profile for a physical vapor deposition chamber target Download PDF

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Publication number
USD877101S1
USD877101S1 US29/639,953 US201829639953F USD877101S US D877101 S1 USD877101 S1 US D877101S1 US 201829639953 F US201829639953 F US 201829639953F US D877101 S USD877101 S US D877101S
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target
vapor deposition
physical vapor
deposition chamber
profile
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William R. Johanson
Kirankumar Neelasandra Savandaiah
Prashant Prabhakar Prabhu
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/639,953 priority Critical patent/USD877101S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: PRABHU, PRASHANT PRABHAKAR, SAVANDAIAH, KIRANKUMAR, JOHANSON, WILLIAM
Priority to JPD2018-19579F priority patent/JP1640252S/ja
Priority to JPD2019-5062F priority patent/JP1651699S/ja
Priority to TW107305358F priority patent/TWD202101S/zh
Priority to TW108303594F priority patent/TWD203691S/zh
Priority to US29/726,094 priority patent/USD902165S1/en
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US29/639,953 2018-03-09 2018-03-09 Target profile for a physical vapor deposition chamber target Active USD877101S1 (en)

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US29/639,953 USD877101S1 (en) 2018-03-09 2018-03-09 Target profile for a physical vapor deposition chamber target
JPD2018-19579F JP1640252S (cs) 2018-03-09 2018-09-07
JPD2019-5062F JP1651699S (cs) 2018-03-09 2018-09-07
TW107305358F TWD202101S (zh) 2018-03-09 2018-09-10 用於物理氣相沉積腔室靶材的靶材輪廓
TW108303594F TWD203691S (zh) 2018-03-09 2018-09-10 用於物理氣相沉積腔室靶材的靶材輪廓
US29/726,094 USD902165S1 (en) 2018-03-09 2020-02-28 Target profile for a physical vapor deposition chamber target

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JP (2) JP1651699S (cs)
TW (2) TWD203691S (cs)

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USD894137S1 (en) * 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD904640S1 (en) * 2019-01-21 2020-12-08 Applied Materials, Inc. Substrate carrier
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD917003S1 (en) * 2018-06-06 2021-04-20 JMA Outdoors, Inc. Simulating target
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11415396B2 (en) 2017-11-06 2022-08-16 JMA Outdoors, Inc. Apparatus for generating a vitals target
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD981970S1 (en) * 2021-03-04 2023-03-28 Kokusai Electric Corporation Substrate mounting plate for substrate processing apparatus
USD992615S1 (en) * 2018-12-07 2023-07-18 Tokyo Electron Limited Focus ring
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1012051S1 (en) * 2019-06-17 2024-01-23 Tokyo Electron Limited Electrostatic chuck for semiconductor manufacturing device
US12125728B2 (en) 2019-01-21 2024-10-22 Applied Materials, Inc. Substrate carrier
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1072774S1 (en) * 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate

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USD1012873S1 (en) * 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
USD1037778S1 (en) 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate

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