US11352457B2 - Fluorine-containing compound having unsaturated bond, and surface modifier using the same - Google Patents
Fluorine-containing compound having unsaturated bond, and surface modifier using the same Download PDFInfo
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- US11352457B2 US11352457B2 US16/025,014 US201816025014A US11352457B2 US 11352457 B2 US11352457 B2 US 11352457B2 US 201816025014 A US201816025014 A US 201816025014A US 11352457 B2 US11352457 B2 US 11352457B2
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- fluorine
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 171
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 65
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 56
- 239000011737 fluorine Substances 0.000 title claims abstract description 56
- 239000003607 modifier Substances 0.000 title claims abstract description 23
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 43
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 21
- 229920000642 polymer Polymers 0.000 claims description 52
- -1 amine salt Chemical class 0.000 claims description 29
- 239000000178 monomer Substances 0.000 claims description 24
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 14
- 125000006551 perfluoro alkylene group Chemical group 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 150000002148 esters Chemical class 0.000 claims description 11
- 125000001153 fluoro group Chemical group F* 0.000 claims description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 8
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 claims description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 8
- 150000002430 hydrocarbons Chemical group 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 6
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 6
- 150000003863 ammonium salts Chemical class 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 5
- 239000005977 Ethylene Substances 0.000 claims description 5
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 5
- 125000005504 styryl group Chemical group 0.000 claims description 5
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 claims description 4
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 claims description 4
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 229920001451 polypropylene glycol Polymers 0.000 claims description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 3
- 150000001993 dienes Chemical class 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 229920001567 vinyl ester resin Polymers 0.000 claims description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 claims description 2
- LIFLRQVHKGGNSG-UHFFFAOYSA-N 2,3-dichlorobuta-1,3-diene Chemical compound ClC(=C)C(Cl)=C LIFLRQVHKGGNSG-UHFFFAOYSA-N 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 claims description 2
- SJWKGDGUQTWDRV-UHFFFAOYSA-N 2-Propenyl heptanoate Chemical compound CCCCCCC(=O)OCC=C SJWKGDGUQTWDRV-UHFFFAOYSA-N 0.000 claims description 2
- RCSBILYQLVXLJG-UHFFFAOYSA-N 2-Propenyl hexanoate Chemical compound CCCCCC(=O)OCC=C RCSBILYQLVXLJG-UHFFFAOYSA-N 0.000 claims description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000004801 4-cyanophenyl group Chemical group [H]C1=C([H])C(C#N)=C([H])C([H])=C1* 0.000 claims description 2
- 235000021357 Behenic acid Nutrition 0.000 claims description 2
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 claims description 2
- 239000005639 Lauric acid Substances 0.000 claims description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 claims description 2
- 235000021355 Stearic acid Nutrition 0.000 claims description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 2
- 229940116226 behenic acid Drugs 0.000 claims description 2
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000005670 ethenylalkyl group Chemical group 0.000 claims description 2
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 claims description 2
- 239000000194 fatty acid Substances 0.000 claims description 2
- 229930195729 fatty acid Natural products 0.000 claims description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 2
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 claims description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 2
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 claims description 2
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 claims description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 claims description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 claims description 2
- 229960002446 octanoic acid Drugs 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- DQVOTEHORLHPRW-UHFFFAOYSA-N prop-2-enyl decanoate Chemical compound CCCCCCCCCC(=O)OCC=C DQVOTEHORLHPRW-UHFFFAOYSA-N 0.000 claims description 2
- 235000019260 propionic acid Nutrition 0.000 claims description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 claims description 2
- 239000008117 stearic acid Substances 0.000 claims description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 claims description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical class NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims 2
- 229910052727 yttrium Inorganic materials 0.000 claims 2
- 238000007334 copolymerization reaction Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 35
- 239000002904 solvent Substances 0.000 description 103
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 77
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 74
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 64
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 60
- 239000000126 substance Substances 0.000 description 54
- 238000006243 chemical reaction Methods 0.000 description 50
- 230000015572 biosynthetic process Effects 0.000 description 45
- 239000003153 chemical reaction reagent Substances 0.000 description 44
- 238000003756 stirring Methods 0.000 description 44
- 239000011521 glass Substances 0.000 description 43
- 238000003786 synthesis reaction Methods 0.000 description 43
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 42
- 239000000243 solution Substances 0.000 description 41
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 38
- 238000004293 19F NMR spectroscopy Methods 0.000 description 33
- 238000005160 1H NMR spectroscopy Methods 0.000 description 33
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 32
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 32
- 229910052757 nitrogen Inorganic materials 0.000 description 30
- 239000000047 product Substances 0.000 description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 26
- 239000012295 chemical reaction liquid Substances 0.000 description 26
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 24
- 239000003795 chemical substances by application Substances 0.000 description 24
- 239000012044 organic layer Substances 0.000 description 21
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 20
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 19
- 238000000034 method Methods 0.000 description 17
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 17
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 16
- 125000005739 1,1,2,2-tetrafluoroethanediyl group Chemical group FC(F)([*:1])C(F)(F)[*:2] 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 239000003480 eluent Substances 0.000 description 15
- 239000000945 filler Substances 0.000 description 14
- 239000000741 silica gel Substances 0.000 description 14
- 229910002027 silica gel Inorganic materials 0.000 description 14
- 239000012074 organic phase Substances 0.000 description 13
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 238000004817 gas chromatography Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000012986 modification Methods 0.000 description 11
- 230000004048 modification Effects 0.000 description 11
- 239000002244 precipitate Substances 0.000 description 11
- NPYFTLUCMKQHSY-UHFFFAOYSA-N 3,3,4,4,5,5,6,6-octafluoro-8-iodooct-1-ene Chemical compound [H]C([H])=C([H])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C([H])([H])C([H])([H])I NPYFTLUCMKQHSY-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 230000005587 bubbling Effects 0.000 description 10
- 229910052740 iodine Inorganic materials 0.000 description 10
- 239000005871 repellent Substances 0.000 description 10
- 238000010898 silica gel chromatography Methods 0.000 description 10
- KPLLPQGGCBTDNH-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,9,9,10,10,11,11,12,12,12-henicosafluoro-1,8-diiodododecane Chemical compound FC(C(C(C(C(C(CC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)I)(F)F)(F)F)(F)F)(F)F)(F)F)(I)F KPLLPQGGCBTDNH-UHFFFAOYSA-N 0.000 description 9
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 238000003379 elimination reaction Methods 0.000 description 9
- 238000005227 gel permeation chromatography Methods 0.000 description 9
- 239000011630 iodine Substances 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000003505 polymerization initiator Substances 0.000 description 8
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 7
- BRZRFFLMZGLNDQ-UHFFFAOYSA-N FC(C(C(C(C(C(C=CC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(I)F Chemical compound FC(C(C(C(C(C(C=CC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(I)F BRZRFFLMZGLNDQ-UHFFFAOYSA-N 0.000 description 7
- 125000005647 linker group Chemical group 0.000 description 7
- KCHUXIXMEBQBGP-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6,9,9,10,10,11,11,12,12-henicosafluoro-7,12-diiodododecane Chemical compound FC(C(C(C(CC(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)I)(F)F)(F)F)(F)F)(I)F KCHUXIXMEBQBGP-UHFFFAOYSA-N 0.000 description 6
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- WAEFSJVSUZKZOK-UHFFFAOYSA-N Cl[Si](CCC(C(C(C(C=CC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(Cl)Cl Chemical compound Cl[Si](CCC(C(C(C(C=CC(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(Cl)Cl WAEFSJVSUZKZOK-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 6
- 239000012043 crude product Substances 0.000 description 6
- 238000010908 decantation Methods 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- FZTRDYSPWWJCOF-UHFFFAOYSA-N perfluorooctyl phosphate Chemical compound OP(O)(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F FZTRDYSPWWJCOF-UHFFFAOYSA-N 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 238000000967 suction filtration Methods 0.000 description 6
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 6
- 239000005052 trichlorosilane Substances 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 5
- 235000002597 Solanum melongena Nutrition 0.000 description 5
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 5
- 239000004210 ether based solvent Substances 0.000 description 5
- CBOIHMRHGLHBPB-UHFFFAOYSA-N hydroxymethyl Chemical compound O[CH2] CBOIHMRHGLHBPB-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000010414 supernatant solution Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- 238000000023 Kugelrohr distillation Methods 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 4
- 239000012975 dibutyltin dilaurate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- SFLRURCEBYIKSS-UHFFFAOYSA-N n-butyl-2-[[1-(butylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound CCCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCCC SFLRURCEBYIKSS-UHFFFAOYSA-N 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000007342 radical addition reaction Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 4
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 4
- ABMRDVOOSZAZMO-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6,9,9,10,10,11,11,12,12,13,13,14,14-pentacosafluoro-7,14-diiodotetradecane Chemical compound FC(C(C(C(C(C(CC(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)I)(F)F)(F)F)(F)F)(F)F)(F)F)(I)F ABMRDVOOSZAZMO-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- LFCKBRDAZRKJNH-JYFKKSCTSA-N C=CC.CC(I)CCI.ICI.O=BP.[2H][3H] Chemical compound C=CC.CC(I)CCI.ICI.O=BP.[2H][3H] LFCKBRDAZRKJNH-JYFKKSCTSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 3
- LGTLXDJOAJDFLR-UHFFFAOYSA-N diethyl chlorophosphate Chemical compound CCOP(Cl)(=O)OCC LGTLXDJOAJDFLR-UHFFFAOYSA-N 0.000 description 3
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- 150000004687 hexahydrates Chemical class 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 3
- 230000003472 neutralizing effect Effects 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 3
- 125000005499 phosphonyl group Chemical group 0.000 description 3
- CASUWPDYGGAUQV-UHFFFAOYSA-M potassium;methanol;hydroxide Chemical compound [OH-].[K+].OC CASUWPDYGGAUQV-UHFFFAOYSA-M 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 3
- 235000010262 sodium metabisulphite Nutrition 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- BULLJMKUVKYZDJ-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluoro-6-iodohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)I BULLJMKUVKYZDJ-UHFFFAOYSA-N 0.000 description 2
- JOQDDLBOAIKFQX-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluoro-1,6-diiodohexane Chemical compound FC(F)(I)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)I JOQDDLBOAIKFQX-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 2
- SMEIBDDIZJNVLQ-HLCCOSJVSA-N C/C=C/CCC(I)CO.C/C=C/CCCCO.CCCC[SnH](CCCC)CCCC Chemical compound C/C=C/CCC(I)CO.C/C=C/CCCCO.CCCC[SnH](CCCC)CCCC SMEIBDDIZJNVLQ-HLCCOSJVSA-N 0.000 description 2
- UZBYTRYZYNXMKT-SFRQHTGFSA-N C/C=C/CCC(I)CO.C/C=C/CI.C=CCO Chemical compound C/C=C/CCC(I)CO.C/C=C/CI.C=CCO UZBYTRYZYNXMKT-SFRQHTGFSA-N 0.000 description 2
- RQTLDDTVTJTABU-LGGQBIODSA-M C/C=C/CI.CC(I)CCI.CO.O[K] Chemical compound C/C=C/CI.CC(I)CCI.CO.O[K] RQTLDDTVTJTABU-LGGQBIODSA-M 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- WPKWPKDNOPEODE-UHFFFAOYSA-N bis(2,4,4-trimethylpentan-2-yl)diazene Chemical compound CC(C)(C)CC(C)(C)N=NC(C)(C)CC(C)(C)C WPKWPKDNOPEODE-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 239000011698 potassium fluoride Substances 0.000 description 2
- 238000012673 precipitation polymerization Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- DBGVGMSCBYYSLD-UHFFFAOYSA-N tributylstannane Chemical compound CCCC[SnH](CCCC)CCCC DBGVGMSCBYYSLD-UHFFFAOYSA-N 0.000 description 2
- SKRWRXWNQFQGRU-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluorooctane Chemical compound CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SKRWRXWNQFQGRU-UHFFFAOYSA-N 0.000 description 1
- SLGOCMATMKJJCE-UHFFFAOYSA-N 1,1,1,2-tetrachloro-2,2-difluoroethane Chemical compound FC(F)(Cl)C(Cl)(Cl)Cl SLGOCMATMKJJCE-UHFFFAOYSA-N 0.000 description 1
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- JILAKKYYZPDQBE-UHFFFAOYSA-N 1,1,2,2,3,3,4,4-octafluoro-1,4-diiodobutane Chemical compound FC(F)(I)C(F)(F)C(F)(F)C(F)(F)I JILAKKYYZPDQBE-UHFFFAOYSA-N 0.000 description 1
- PDCBZHHORLHNCZ-UHFFFAOYSA-N 1,4-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(C(F)(F)F)C=C1 PDCBZHHORLHNCZ-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- GFKOWYOUZOVVTP-UHFFFAOYSA-N 2-[2-[(4-carboxy-2-cyano-7,7,7-trifluoroheptan-2-yl)diazenyl]-2-cyanopropyl]-5,5,5-trifluoropentanoic acid Chemical compound FC(F)(F)CCC(C(O)=O)CC(C)(C#N)N=NC(C)(CC(CCC(F)(F)F)C(O)=O)C#N GFKOWYOUZOVVTP-UHFFFAOYSA-N 0.000 description 1
- QUPSHWOTFDBQPR-UHFFFAOYSA-N 2-[2-[(4-carboxy-2-cyano-7,7,8,8,9,9,10,10,10-nonafluorodecan-2-yl)diazenyl]-2-cyanopropyl]-5,5,6,6,7,7,8,8,8-nonafluorooctanoic acid Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(C(O)=O)CC(C)(C#N)N=NC(C)(CC(CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(O)=O)C#N QUPSHWOTFDBQPR-UHFFFAOYSA-N 0.000 description 1
- OCEQIBZEKFFFOA-UHFFFAOYSA-N 2-[2-[(4-carboxy-2-cyano-7,7,8,8,9,9,10,10,11,11,12,12,12-tridecafluorododecan-2-yl)diazenyl]-2-cyanopropyl]-5,5,6,6,7,7,8,8,9,9,10,10,10-tridecafluorodecanoic acid Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(C(O)=O)CC(C)(C#N)N=NC(C)(CC(CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(O)=O)C#N OCEQIBZEKFFFOA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- CKSAKVMRQYOFBC-UHFFFAOYSA-N 2-cyanopropan-2-yliminourea Chemical compound N#CC(C)(C)N=NC(N)=O CKSAKVMRQYOFBC-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- BHYVPLASKPLRRX-UHFFFAOYSA-N 2-methyl-1-pyrrolidin-1-ylpropan-1-imine Chemical compound CC(C)C(=N)N1CCCC1 BHYVPLASKPLRRX-UHFFFAOYSA-N 0.000 description 1
- LYPGJGCIPQYQBW-UHFFFAOYSA-N 2-methyl-2-[[2-methyl-1-oxo-1-(prop-2-enylamino)propan-2-yl]diazenyl]-n-prop-2-enylpropanamide Chemical compound C=CCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCC=C LYPGJGCIPQYQBW-UHFFFAOYSA-N 0.000 description 1
- FYQFWFHDPNXORA-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooct-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C FYQFWFHDPNXORA-UHFFFAOYSA-N 0.000 description 1
- CDXFIRXEAJABAZ-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CDXFIRXEAJABAZ-UHFFFAOYSA-N 0.000 description 1
- IGGDHHHKQANRAY-UHFFFAOYSA-N 3,3,4,4,5,5,6,6-octafluoro-1,8-diiodooctane Chemical compound ICCC(F)(F)C(F)(F)C(F)(F)C(F)(F)CCI IGGDHHHKQANRAY-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- BSXGCUHREZFSRY-UHFFFAOYSA-N 3-[[1-amino-2-[[1-amino-1-(2-carboxyethylimino)-2-methylpropan-2-yl]diazenyl]-2-methylpropylidene]amino]propanoic acid;tetrahydrate Chemical compound O.O.O.O.OC(=O)CCNC(=N)C(C)(C)N=NC(C)(C)C(=N)NCCC(O)=O BSXGCUHREZFSRY-UHFFFAOYSA-N 0.000 description 1
- UCFSYHMCKWNKAH-UHFFFAOYSA-N 4,4,5,5-tetramethyl-1,3,2-dioxaborolane Chemical compound CC1(C)OBOC1(C)C UCFSYHMCKWNKAH-UHFFFAOYSA-N 0.000 description 1
- AUASWBPNSOKWFZ-YSZMSMLYSA-N C/C(F)=C/C=C(\F)CCCO.C1=CCCCC1.C1CCC(CC2CCCCC2)CC1.C1CCOC1.C=CC/C(F)=C/CC Chemical compound C/C(F)=C/C=C(\F)CCCO.C1=CCCCC1.C1CCC(CC2CCCCC2)CC1.C1CCOC1.C=CC/C(F)=C/CC AUASWBPNSOKWFZ-YSZMSMLYSA-N 0.000 description 1
- PNLMKMQLVYQTRZ-PYVQLSEQSA-N C/C(F)=C/C=C(\F)CCCO.C=C(C)C(=O)Cl.C=C(C)C(=O)OCCC/C(F)=C/C=C(/C)F Chemical compound C/C(F)=C/C=C(\F)CCCO.C=C(C)C(=O)Cl.C=C(C)C(=O)OCCC/C(F)=C/C=C(/C)F PNLMKMQLVYQTRZ-PYVQLSEQSA-N 0.000 description 1
- ZZEONTVTMMFSIU-OTDBEEGXSA-N C/C(F)=C/CCCCCO.C1CCOC1.CC(I)CCCC(I)CO Chemical compound C/C(F)=C/CCCCCO.C1CCOC1.CC(I)CCCC(I)CO ZZEONTVTMMFSIU-OTDBEEGXSA-N 0.000 description 1
- AHSIZBDVEDLWCJ-RSOKAEOZSA-N C/C(F)=C/CCCCCO.CCO[Si](CCCNC(=O)OCCCCC/C=C(/C)F)(OCC)OCC Chemical compound C/C(F)=C/CCCCCO.CCO[Si](CCCNC(=O)OCCCCC/C=C(/C)F)(OCC)OCC AHSIZBDVEDLWCJ-RSOKAEOZSA-N 0.000 description 1
- KRTXHAGOYSRIMG-XZJQCACISA-N C/C=C/CCCCO.C/C=C/CCCCOC(=O)CCCC[Si](OCC)(OCC)OCC.ClCCl Chemical compound C/C=C/CCCCO.C/C=C/CCCCOC(=O)CCCC[Si](OCC)(OCC)OCC.ClCCl KRTXHAGOYSRIMG-XZJQCACISA-N 0.000 description 1
- VMYDDNBJRHIIBD-XQHVRGAUSA-N C/C=C/CCCCO.C/C=C/CCCCO[PH](=O)OO Chemical compound C/C=C/CCCCO.C/C=C/CCCCO[PH](=O)OO VMYDDNBJRHIIBD-XQHVRGAUSA-N 0.000 description 1
- ZNUNPQMFUKJYAI-SRUUJQCNSA-N C/C=C/CCCCO.C=C(C)C(=O)Cl.C=C(C)C(=O)OCCCC/C=C/C Chemical compound C/C=C/CCCCO.C=C(C)C(=O)Cl.C=C(C)C(=O)OCCCC/C=C/C ZNUNPQMFUKJYAI-SRUUJQCNSA-N 0.000 description 1
- VRLMWBYZHMXGIK-CAOJPPNESA-N C/C=C/CCCCO.C=CC(=O)Cl.C=CC(=O)OCCCC/C=C/C Chemical compound C/C=C/CCCCO.C=CC(=O)Cl.C=CC(=O)OCCCC/C=C/C VRLMWBYZHMXGIK-CAOJPPNESA-N 0.000 description 1
- RWQXFDCDNDYNGI-NUQCMOQFSA-N C/C=C/CCC[Si](Cl)(Cl)Cl.C=CC/C=C/C Chemical compound C/C=C/CCC[Si](Cl)(Cl)Cl.C=CC/C=C/C RWQXFDCDNDYNGI-NUQCMOQFSA-N 0.000 description 1
- XJWPATOWKUWSRA-JLMMQWLNSA-N C1CCOC1.C=CCCCI.ICCCCCI.[2H]B[U] Chemical compound C1CCOC1.C=CCCCI.ICCCCCI.[2H]B[U] XJWPATOWKUWSRA-JLMMQWLNSA-N 0.000 description 1
- HWWXDXJPKBDNKH-PNCUNQJRSA-N C=C(C)C(=O)Cl.C=C(C)C(=O)OCCC/C(F)=C/CC.CC/C=C(\F)CCCO Chemical compound C=C(C)C(=O)Cl.C=C(C)C(=O)OCCC/C(F)=C/CC.CC/C=C(\F)CCCO HWWXDXJPKBDNKH-PNCUNQJRSA-N 0.000 description 1
- ZMQOITGOLMVBPF-WQASOHKUSA-M C=CC/C(F)=C/C=C(/C)F.C=CC/C(F)=C/CC.CO.O[K] Chemical compound C=CC/C(F)=C/C=C(/C)F.C=CC/C(F)=C/CC.CO.O[K] ZMQOITGOLMVBPF-WQASOHKUSA-M 0.000 description 1
- OYMOYMYZFUUJCP-NEWAROFUSA-N C=CC/C(F)=C/C=C(\F)CCCCC.CCCCC/C(F)=C/C=C(\F)CCC[Si](Cl)(Cl)Cl Chemical compound C=CC/C(F)=C/C=C(\F)CCCCC.CCCCC/C(F)=C/C=C(\F)CCC[Si](Cl)(Cl)Cl OYMOYMYZFUUJCP-NEWAROFUSA-N 0.000 description 1
- QDWJSWJBQOGVAP-WVFQECCXSA-N C=CC/C(F)=C/CC.CC/C=C(\F)CCCO.CC1(C)OBOC1(C)C Chemical compound C=CC/C(F)=C/CC.CC/C=C(\F)CCCO.CC1(C)OBOC1(C)C QDWJSWJBQOGVAP-WVFQECCXSA-N 0.000 description 1
- NJMIXRULACDAEW-NKJDMQJLSA-N C=CC/C(F)=C/CC.CC/C=C(\F)CCC[Si](Cl)(Cl)Cl Chemical compound C=CC/C(F)=C/CC.CC/C=C(\F)CCC[Si](Cl)(Cl)Cl NJMIXRULACDAEW-NKJDMQJLSA-N 0.000 description 1
- VQDJEBGIQFGMEP-NICWXBJYSA-N C=CC/C(F)=C/CC.CC/C=C(\F)CCC[Si](OCC)(OCC)OCC Chemical compound C=CC/C(F)=C/CC.CC/C=C(\F)CCC[Si](OCC)(OCC)OCC VQDJEBGIQFGMEP-NICWXBJYSA-N 0.000 description 1
- YNEXNGWNOJQYCY-OFTMVVGLSA-N C=CC/C=C/C.CCC(I)CCCI.[2H]B[U] Chemical compound C=CC/C=C/C.CCC(I)CCCI.[2H]B[U] YNEXNGWNOJQYCY-OFTMVVGLSA-N 0.000 description 1
- MUQSRBCIISDELY-JYFKKSCTSA-N C=CCCCI.CCC(I)CCCI.CI.O=BP.[2H][3H] Chemical compound C=CCCCI.CCC(I)CCCI.CI.O=BP.[2H][3H] MUQSRBCIISDELY-JYFKKSCTSA-N 0.000 description 1
- OVUVTLCLKUCRHI-VEJXSURTSA-N C=CCO.CC(CCCC(I)CO)CC(I)CO.CC(I)CCCC(I)CO.CC(I)CCI.CCCCCC(I)CO.O=BP.[2H][3H] Chemical compound C=CCO.CC(CCCC(I)CO)CC(I)CO.CC(I)CCCC(I)CO.CC(I)CCI.CCCCCC(I)CO.O=BP.[2H][3H] OVUVTLCLKUCRHI-VEJXSURTSA-N 0.000 description 1
- WHYINPVCBIANFI-HWYGZJMKSA-N CCCCC/C(F)=C/C=C(\F)CCCO.CCCCC/C(F)=C/C=C(\F)CCCOC(=O)CCCC[Si](OCC)(OCC)OCC.ClCCl Chemical compound CCCCC/C(F)=C/C=C(\F)CCCO.CCCCC/C(F)=C/C=C(\F)CCCOC(=O)CCCC[Si](OCC)(OCC)OCC.ClCCl WHYINPVCBIANFI-HWYGZJMKSA-N 0.000 description 1
- LUSNMNIWWCWURA-UHFFFAOYSA-N CCCO.CCCO[PH](=O)OO Chemical compound CCCO.CCCO[PH](=O)OO LUSNMNIWWCWURA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 101150065749 Churc1 gene Proteins 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 208000033962 Fontaine progeroid syndrome Diseases 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229920001730 Moisture cure polyurethane Polymers 0.000 description 1
- QVHMSMOUDQXMRS-UHFFFAOYSA-N PPG n4 Chemical compound CC(O)COC(C)COC(C)COC(C)CO QVHMSMOUDQXMRS-UHFFFAOYSA-N 0.000 description 1
- 102100038239 Protein Churchill Human genes 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- ALBJGICXDBJZGK-UHFFFAOYSA-N [1-[(1-acetyloxy-1-phenylethyl)diazenyl]-1-phenylethyl] acetate Chemical compound C=1C=CC=CC=1C(C)(OC(=O)C)N=NC(C)(OC(C)=O)C1=CC=CC=C1 ALBJGICXDBJZGK-UHFFFAOYSA-N 0.000 description 1
- LXEKPEMOWBOYRF-UHFFFAOYSA-N [2-[(1-azaniumyl-1-imino-2-methylpropan-2-yl)diazenyl]-2-methylpropanimidoyl]azanium;dichloride Chemical compound Cl.Cl.NC(=N)C(C)(C)N=NC(C)(C)C(N)=N LXEKPEMOWBOYRF-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002519 antifouling agent Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- MCQRPQCQMGVWIQ-UHFFFAOYSA-N boron;methylsulfanylmethane Chemical compound [B].CSC MCQRPQCQMGVWIQ-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229940069096 dodecene Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002497 iodine compounds Chemical class 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- GEJHIUFJTCYNSC-UHFFFAOYSA-N methyl 1-[(1-methoxycarbonylcyclohexyl)diazenyl]cyclohexane-1-carboxylate Chemical compound C1CCCCC1(C(=O)OC)N=NC1(C(=O)OC)CCCCC1 GEJHIUFJTCYNSC-UHFFFAOYSA-N 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- WVFLGSMUPMVNTQ-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-[[1-(2-hydroxyethylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCO WVFLGSMUPMVNTQ-UHFFFAOYSA-N 0.000 description 1
- BUGISVZCMXHOHO-UHFFFAOYSA-N n-[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]-2-[[1-[[1,3-dihydroxy-2-(hydroxymethyl)propan-2-yl]amino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCC(CO)(CO)NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC(CO)(CO)CO BUGISVZCMXHOHO-UHFFFAOYSA-N 0.000 description 1
- WMRNGPYHLQSTDL-UHFFFAOYSA-N n-cyclohexyl-2-[[1-(cyclohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound C1CCCCC1NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC1CCCCC1 WMRNGPYHLQSTDL-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002954 polymerization reaction product Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 150000003109 potassium Chemical class 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- XTUSEBKMEQERQV-UHFFFAOYSA-N propan-2-ol;hydrate Chemical compound O.CC(C)O XTUSEBKMEQERQV-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
- 229940029284 trichlorofluoromethane Drugs 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/60—Releasing, lubricating or separating agents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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Definitions
- the present invention relates to a novel fluorine-containing compound having an unsaturated bond, which is useful as a raw material of a surface modifier or the like.
- Fluorine has unique properties such as a high electronegativity and a low polarizability, and is used as an element useful for functional materials utilizing properties such as heat resistance, chemical resistance, water repellency/oil repellency, a low friction property and a low refraction property.
- a compound having a perfluoroalkyl group having 8 or more carbon atoms has been heretofore used for functional products imparting water repellency and/or oil repellency, but such a compound has been problematic in terms of accumulation in the environment and the human body, and hazardousness.
- a method which includes forming a compound having a perfluoroalkyl group whose fluorine is partially replaced with hydrogen, and thus using the compound as a structure of a perfluoroalkyl group unit having 6 or less carbon atoms, which is deemed to be low in accumulation in the living body, for a modifier (see, for example, Patent Document 2 and Patent Document 3).
- Patent Document 1 International Publication No. WO 2009/087981
- Patent Document 2 Japanese Patent No. 5146455
- Patent Document 3 Japanese Patent Laid-Open No. 2014-040373
- the present invention provides a novel fluorine-containing compound serving as a new material exerting excellent, high water-repellent and oil-repellent effects and having an enhanced surface modification performance as compared with a conventional one, as well as a surface modifier using the compound.
- the present inventors have found that a compound containing a fluorine-containing long-chain group having an unsaturated bond, shown below, is used for surface modification to result in a high water-repellent and oil-repellent performance, thereby leading to completion of the present invention.
- the present invention is an invention according to a fluorine-containing compound represented by the following general formula (1) or the following general formula (2), or the following general formula (5):
- Rf 1 (CR 1 ⁇ CR 2 —X—Rf 2 ) n —Y—Z (1)
- Rf 1 represents a perfluoroalkyl group having 1 to 6 carbon atoms, with a CF 3 terminal,
- Rf 2 represents a perfluoroalkylene group having 1 to 6 carbon atoms
- R 1 and R 2 each independently represent a hydrogen atom or a fluorine atom
- n an integer of 1 to 5
- X is absent in the formula (1) or in the formula (2), or represents CH 2 , O or S,
- Y represents a linking group
- Z represents any structure of the following (i) to (iii):
- M 1 and M 2 each independently represent a hydrogen atom, an ammonium salt, an organic amine salt, or an alkyl group having 1 to 4 carbon atoms;
- L represents a hydrolyzable group or a hydroxyl group
- L′ represents a hydrocarbon group having 1 to 6 carbon atoms
- k represents an integer of 1 to 3
- the L and L′ groups may be different from or the same as each other.
- the present invention relates to the fluorine-containing compound wherein Rf 2 represents a linear perfluoroalkylene group having 1 to 6 carbon atoms: Rf 3 —(CF ⁇ CR 3 —CR 4 ⁇ CF—Rf 4 ) n —Y—Z (5)
- Rf 3 represents a perfluoroalkyl group having 1 to 5 carbon atoms, with a CF 3 terminal,
- Rf 4 represents a perfluoroalkylene group having 1 to 5 carbon atoms
- R 3 and R 4 each independently represent a hydrogen atom or a fluorine atom
- n an integer of 1 to 5
- Y represents a linking group
- Z represents any structure of the following (i) to (iii):
- M 3 and M 4 each independently represent a hydrogen atom, an ammonium salt, an organic amine salt, or an alkyl group having 1 to 4 carbon atoms;
- L represents a hydrolyzable group or a hydroxyl group
- L′ represents a hydrocarbon group having 1 to 6 carbon atoms
- k represents an integer of 1 to 3
- the L and L′ groups may be different from or the same as each other.
- the present invention relates to the fluorine-containing compound described above wherein Rf 4 represents a linear perfluoroalkylene group having 1 to 5 carbon atoms.
- the present invention relates to the fluorine-containing compound wherein Y is represented by the following general formula (8): (CH 2 ) l —Q—(CH 2 ) m (8)
- a —CH ⁇ CH— structure is optionally included instead of —CH 2 CH 2 —;
- Q is absent in the formula (8), or represents —OCONH—, —CONH—, —O—, —NH—, —CO—O—, —O—CO—, —NHCONH— or —C 6 H 4 —.
- the present invention relates to the fluorine-containing compound wherein R 1 and/or R 2 represent(s) a hydrogen atom, and R 3 and/or R 4 represent(s) a hydrogen atom.
- the present invention relates to the fluorine-containing compound wherein X is absent in the formula (1) or in the formula (2), or represents CH 2 .
- the present invention relates to the fluorine-containing compound wherein the hydrolyzable group L represents Cl or OR 5 wherein R 5 represents an alkyl group having 1 to 4 carbon atoms.
- the present invention relates to a surface modifier comprising the novel fluorine compound described above.
- the fluorine-containing compound of the present invention is represented by the following general formula (1) or the following general formula (2).
- Rf 1 (CR 1 ⁇ CR 2 —X—Rf 2 ) n —Y—Z (1)
- Rf 1 (X—CR 1 ⁇ CR 2 —Rf 2 ) n —Y—Z (2)
- an Rf 1 group is a perfluoroalkyl group having 1 to 6 carbon atoms, with a CF 3 terminal. While the structure may have a branched structure, it is considered that a linear perfluoroalkyl group easily has a self-assembled structure to easily form a monolayer on a glass surface, and therefore a linear perfluoroalkyl group is preferable.
- an Rf 2 group is a perfluoroalkylene group having 1 to 6 carbon atoms. While the structure may have a branched structure, a linear perfluoroalkylene group is preferable.
- Specific structures of the portion Rf 1 —(CR 1 ⁇ CR 2 —X—Rf 2 ) n — in the general formula (1) and the general formula (2) include C 2 F 5 —CH ⁇ CH—C 4 F 8 —, C 2 F 5 —CH ⁇ CF—C 4 F 8 —, C 2 F 5 —CF ⁇ CH—C 4 F 8 —, C 2 F 5 —CF ⁇ CF—C 4 F 8 —, C 2 F 5 —(CH ⁇ CH—C 4 F 8 ) 2 —, C 2 F 5 —(CH ⁇ CH—C 4 F 8 ) 3 —, C 2 F 5 —CH ⁇ CH—C 6 F 12 —, C 4 F 9 —CH ⁇ CH—C 4 F 8 —, C 4 F 9 —CH ⁇ CH—C 6 F 12 , C 6 F 13 —CH ⁇ CH—C 4 F 8 —, C 6 F 13 —CH ⁇ CH—C 6 F 12 —, C 2 F 5 —CH ⁇ CH—C 4 F 8 —, CF
- Such structures can be each obtained by performing radical addition of an iodinated compound in the form of a combination of Rf 1 —I and CHR 1 ⁇ CR 2 —Rf 2 —I, or Rf 1 —CR 1 ⁇ CHR 2 and I—Rf 2 —I, or the like, and thereafter subjecting a structural portion of —CF 2 —CIR 1 —CHR 2 CF 2 — generated, to an HI-elimination or IF-elimination reaction.
- a terminal iodine located opposite to the Rf 1 end can be treated with a proper reagent to thereby introduce a group such as olefin, alcohol or amine.
- the “terminal iodine located opposite to the Rf 1 end” here means, for example, I (iodine) adjacent to C 4 F 8 in the case of C 6 F 13 —CH ⁇ CH—C 4 F 8 —I, and means an unreacted terminal iodine remaining after the addition reaction, located at the Rf 2 side.
- Rf 1 —CR 1 ⁇ CR 2 —Rf 2 —I can be subjected to addition with ethylene, Rf 1 —CR 1 ⁇ CR 2 —Rf 2 —CH 2 CH 2 I consequently obtained can be hydrolyzed to synthesize Rf 1 —CR 1 ⁇ CR 2 —Rf 2 —CH 2 CH 2 OH, and thereafter Rf 1 —CR 1 ⁇ CR 2 —Rf 2 —CH 2 CH 2 OH can be bound to a proper introduction material of a Z group, such as chlorophosphoric acid ester, acryloyl chloride or isocyanate group-containing trialkoxysilane according to a known method to thereby provide a fluorine-containing compound of interest.
- a Z group such as chlorophosphoric acid ester, acryloyl chloride or isocyanate group-containing trialkoxysilane according to a known method to thereby provide a fluorine-containing compound of interest.
- R 1 and R 2 each independently represent a hydrogen atom or a fluorine atom and n represents an integer of 1 to 5. Further preferably, R 1 and/or R 2 represent(s) a hydrogen atom.
- X is absent in the general formula (1) or the general formula (2), or represents CH 2 , O or S. That is, X can impart high improvement performance, even when X is absent or represents CH 2 , O or S, as long as an olefin compound represented by the general formula (1) or the general formula (2) is obtained.
- the general formula (1) and the general formula (2) each represent Rf 1 —(CR 1 ⁇ CR 2 —Rf 2 ) n —Y—Z.
- the formula (1) represents Rf 1 —(CR 1 ⁇ CR 2 —CH 2 —Rf 2 ) n —Y—Z and the formula (2) represents Rf 1 —(CH 2 —CR 1 ⁇ CR 2 —Rf 2 ) n —Y—Z.
- Rf 1 —I and CHR 1 ⁇ CR 2 —Rf 2 —I or Rf 1 —CR 1 ⁇ CHR 2 and I—Rf 2 —I can be subjected to radical addition and thereafter HI-elimination to thereby synthesize Rf 1 —CR 1 ⁇ CR 2 —Rf 2 —I.
- Rf 1 —CFR 1 —CR 2 ⁇ CH 2 and I—Rf 2 —I or Rf 1 —I and CH 2 ⁇ CHR 1 —CFR 2 —Rf 2 —I can be subjected to radical addition and thereafter an IF-elimination reaction to thereby synthesize Rf 1 —CR 1 ⁇ CR 2 —CH 2 —Rf 2 —I or Rf 1 —CH 2 —CR 1 ⁇ CR 2 —Rf 2 —I, respectively.
- a compound where X ⁇ O or S can be obtained by dehydrohalogenation of a compound represented by Rf 1 —X—CR 1 R 3 —CR 2 R 4 —Rf 2 —I or Rf 1 —CR 1 R 3 —CR 2 R 4 —X—Rf 2 —I (one of R 3 and R 4 represents H and the other thereof represents an element selected from Cl, Br and I).
- Z in the general formula (1) and the general formula (2) represents a surface modification group represented by the following general formula (3) or the following general formula (4).
- M 1 and M 2 each independently represent a hydrogen atom, an ammonium salt, an organic amine salt, or an alkyl group having 1 to 4 carbon atoms.
- fluorine-containing compound of the present invention is represented by the following general formula (5): Rf 3 —(CF ⁇ CR 3 —CR 4 ⁇ CF—Rf 4 ) n —Y—Z (5)
- an Rf 3 group is a perfluoroalkyl group having 1 to 5 carbon atoms, with a CF 3 terminal. While the structure may have a branched structure, it is considered that a linear perfluoroalkyl group easily has a self-assembled structure to easily form a monolayer on a glass surface, and therefore a linear perfluoroalkyl group is preferable.
- an Rf 4 group is a perfluoroalkylene group having 1 to 5 carbon atoms. While the structure may have a branched structure, a linear perfluoroalkylene group is preferable.
- Such structures can be each obtained by performing radical addition of an iodine compound in the form of a combination of Rf 3 —CF 2 —I and CHR 3 ⁇ CR 4 —CF 2 —Rf 4 —I, or Rf 3 CF 2 —CR 3 ⁇ CHR 4 and I—CF 2 —Rf 4 —I, or the like and thereafter subjecting a structural portion of —CF 2 —CIR 3 —CHR 4 CF 2 — generated, to an HI-elimination or IF-elimination reaction.
- a terminal iodine located opposite to the Rf 3 end can be treated with a proper reaction test material to thereby introduce a group such as olefin, alcohol or amine.
- the “terminal iodine located opposite to the Rf 3 end” here means, for example, I (iodine) adjacent to C 5 F 10 in the case of C 5 F 11 —CF ⁇ CH—CH ⁇ CF—C 5 F 10 —I, and means an unreacted terminal iodine remaining after the addition reaction, located closer to Rf 4 .
- the resulting Rf 3 —CF ⁇ CR 3 —CHR 4 —CF 2 —Rf 4 —I can be further subjected to HF-elimination to provide Rf 3 —CF ⁇ CR 3 —CR 4 ⁇ CF—Rf 4 —I, thereafter Rf 3 —CF ⁇ CR 3 —CR 4 ⁇ CF—Rf 4 —I can be further subjected to addition with ethylene, the resulting Rf 3 —CF ⁇ CR 3 —CR 4 ⁇ CF—Rf 4 —CH 2 CH 2 I can be hydrolyzed to synthesize Rf 3 —CR 3 ⁇ CR 4 —Rf 4 —CH 2 CH 2 OH, and thereafter Rf 3 —CR 3 ⁇ CR 4 —Rf 4 —CH 2 CH 2 OH can be bound to a proper introduction material
- R 3 and R 4 each independently represent a hydrogen atom or a fluorine atom and n represents an integer of 1 to 5. Further preferably, R 3 and/or R 4 represent(s) a hydrogen atom.
- Z in the general formula (5) represents a surface modification group represented by the following general formula (6) or the following general formula (7).
- M 3 and M 4 each independently represent a hydrogen atom, an ammonium salt, an organic amine salt, or an alkyl group having 1 to 4 carbon atoms.
- Such a functional group having an olefin structure sandwiched between perfluoroalkyl chains can be bound to a surface modification group Z via a linking group Y also serving as a spacer portion, thereby synthesizing a compound of interest.
- the linking group Y is represented by the following general formula (8). (CH 2 ) 1 —Q—(CH 2 ) m (8)
- the sum of l and m is an integer of 2 to 6; and when l and/or m represents 2 or more, a —CH ⁇ CH— structure is optionally included instead of —CH 2 CH 2 —.
- Q is absent in the general formula (8), or represents —OCONH—, —CONH—, —O—, —NH—, —CO—O—, —O—CO—, —NHCONH— or —C 6 H 4 —.
- Q here represents —C 6 H 4 —
- examples can include an ortho-isomer, a meta-isomer and a para-isomer, and a para-isomer is preferable in terms of the structure thereof.
- Q is present in the linking group Y, thereby exerting the effect of allowing an intermolecular hydrogen bond and/or ⁇ - ⁇ interaction of Q to act to easily form a unimolecular arrangement of molecules.
- Q is preferably absent in order to enhance dispersion of a fluorine-containing group in a polymer, and therefore proper Q is needed to be selected depending on the intended use.
- formation can be easily made according to a conventionally known technique.
- formation can be made by a reaction of a compound having an isocyanate group at 0.9 to 1.1 times relative to a fluorine-containing alcohol derivative in no solvent or an organic solvent such as dichloromethane or tetrahydrofuran at 1 to 10 times by weight by use of 0.1 to 5 mol % of di-n-butyltin dilaurate or the like as a catalyst at 0° C. to 50° C.
- the surface modification group Z is a free phosphonyl group (—P( ⁇ O)(OH) 2 ) or a phosphoric acid group (—OP( ⁇ O)(OH) 2 ), or an ester or salt thereof
- the surface of a metal can be modified and use as a release material of a mold or the like can be made.
- Z can also represent a polymerizable group.
- Z represents a polymerizable group
- the surface of a resin, a film and the like can be modified.
- the polymerizable group is also not particularly limited in terms of the type thereof, and may be, for example, a vinyl group, an allyl group, a styryl group, a methacryloyl group or an acryloyl group.
- Z can also represent SiL k L′ (3-k) .
- L represents a hydrolyzable group or a hydroxyl group
- L′ represents a hydrocarbon group having 1 to 6 carbon atoms
- k represents an integer of 1 to 3.
- the L and L′ groups may be different from or the same as each other.
- examples include Cl and OR 5 wherein R 5 represents an alkyl group having 1 to 6 carbon atoms.
- a hydrosilane compound having Si—H can also be used as a bonding group.
- L′ represents a hydrocarbon group having 1 to 6 carbon atoms, and examples include methyl, ethyl, propyl, vinyl and allyl groups.
- the L and L′ groups may be different from or the same as each other.
- the compound described in the present invention can be used to thereby impart water-repellent and oil-repellent properties to the surface of a material, and can be used as a surface modifier.
- the post-treatment after production of the fluorine-containing compound represented by each of the general formulas (1), (2) and (5) of the present invention can be performed according to a well-known method, and the fluorine-containing compound as a product of interest represented by each of the general formulas (1), (2) and (5) as well as the surface modifier using the compound can be obtained by, for example, obtaining the product of interest by distillation or the like, or obtaining a crude product by a known method such as neutralization, solvent extraction, drying, filtration, condensation or the like, and purifying the crude product by recrystallization, column chromatography or the like.
- fluorine-containing compound represented by each of the general formulas (1), (2) and (5) of the invention can be used in a modifier as it is, the fluorine-containing compound can also be used with being mixed with other material.
- fluorine-containing compound can be used with being dissolved in an organic solvent.
- Modification of the surface of a resin or film in the present invention can be achieved by polymerizing a compound (monomer A) having a polymerizable group described in the present invention and a monomer B having at least one polymerizable group in the molecule in the presence of a polymerization initiator C to provide a fluorine-containing polymer.
- Examples of the monomer B include the following compounds (X 1 ) to (X 9 ):
- acetic acid propionic acid, caprylic acid, lauric acid, stearic acid, behenic acid and the like;
- styrene-based compounds styrene, ⁇ -methylstyrene, p-methylstyrene and the like;
- the monomer B is preferably a (meth)acrylic acid ester, in particular, a (meth)acrylic acid alkyl ester.
- the number of carbon atoms in such an alkyl group is preferably 1 to 30, more preferably 1 to 20.
- the monomer B not only a non-fluorine monomer, for example, a (meth)acrylic acid ester, but also a halogen monomer (in particular, a chlorine- or fluorine-containing monomer, for example, vinyl chloride, vinylidene fluoride or tetrafluoroethylene) may be used.
- a non-fluorine monomer for example, a (meth)acrylic acid ester
- a halogen monomer in particular, a chlorine- or fluorine-containing monomer, for example, vinyl chloride, vinylidene fluoride or tetrafluoroethylene
- the amount of the monomer B to be used is preferably 1 to 1000 parts by weight, more preferably 10 to 100 parts by weight per 100 parts by weight of the monomer A.
- an azo-based polymerization initiator is preferably used as the polymerization initiator C.
- the azo-based polymerization initiator include the following compounds (Y 1 ) to (Y 6 ):
- 2,2′-azobisisobutyronitrile 2,2′-azobis(2-methylbutyronitrile), 2,2′-azobis(2,4-dimethylvaleronitrile), 1,1′-azobis(1-cyclohexanecarbonitrile), 2,2′-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2-(carbamoylazo)isobutyronitrile and the like;
- an initiator having a substituent relatively low in polarity is desirable from the viewpoint of the surface energy of a fluorine-containing highly branched polymer to be obtained, and in particular, 2,2′-azobis(2,4-dimethylvaleronitrile), dimethyl 2,2′-azobisisobutyrate or 2,2′-azobis(2,4,4-trimethylpentane) is preferable.
- the polymerization initiator C is used in an amount of 0.1 to 200 mol % based on the total molar number of the monomer A and the monomer B, and is preferably used in an amount of 0.5 to 100 mol %, more preferably 0.5 to 50 mol %, most preferably 0.5 to 20 mol %.
- organic solvent examples include aromatic hydrocarbon-based solvents such as benzene, toluene, xylene, ethyl benzene and tetralin; aliphatic or alicyclic hydrocarbon-based solvents such as n-hexane, n-heptane, mineral spirit and cyclohexane; halogen-based solvents such as methyl chloride, methyl bromide, methyl iodide, methylene dichloride, chloroform, carbon tetrachloride, trichloroethylene, perchloroethylene and o-dichlorobenzene; ester-based or ester ether-based solvents such as ethyl acetate, butyl acetate, methoxy butyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate and propylene glycol monomethyl ether acetate; ether-based solvents such as diethyl
- the content of the organic solvent in the entire polymerization reaction product is preferably 1 to 100 parts by mass, further preferably 5 to 50 parts by mass per part by mass of the monomer A.
- the polymerization reaction is performed at ordinary pressure, under a pressurized and sealed condition, or under reduced pressure, and is preferably performed at ordinary pressure from the viewpoint of simplicity of an apparatus and an operation.
- the reaction is preferably performed under an atmosphere of an inert gas such as N 2 .
- the temperature of the polymerization reaction is preferably 50 to 200° C., further preferably 70 to 150° C.
- the resulting fluorine-containing polymer is recovered according to any method and, if necessary, subjected to a post-treatment such as washing.
- a post-treatment such as washing.
- the method for recovering a polymer from a reaction solution include a method such as reprecipitation.
- the weight average molecular weight (hereinafter, abbreviated as Mw) of the resulting fluorine-containing polymer is preferably 1,000 to 200,000, further preferably 2,000 to 100,000, most preferably 5,000 to 60,000 in terms of polystyrene by gel permeation chromatography (GPC).
- Preparation of a release agent by use of the phosphonyl group- or phosphoric acid (ester) group-containing compound obtained in the present invention is performed by dilution with water or an organic solvent so as to provide an aqueous solution, an aqueous dispersion liquid or an organic solvent solution having a concentration of about 0.01 to 30% by weight, preferably about 0.05 to 3% by weight.
- the organic solvent used is at least one of alcohols such as methanol, ethanol, n-propanol and isopropanol, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ethers such as diethyl ether, diisopropyl ether, dioxane and tetrahydrofuran, esters such as ethyl acetate and butyl acetate, polyols or ethers thereof, such as ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, tripropylene glycol, tetrapropylene glycol, diethylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether and glycerin, polyhydric alcohol derivatives such as methyl cellosolve, ethyl cellosolve, methyl carbitol
- the organic solvent can also be here used in combination with water.
- release agent can also be, if necessary, added an amine-based neutralizing agent such as triethylamine, triethanolamine, tris(2-hydroxyethyl)amine and morpholine, various surfactants for improving wettability of the release agent, such as an ionic surfactant and a nonionic surfactant, silicone oil and silicone varnish for further improving releasability and lubricity, and the like.
- the amine-based neutralizing agent is used in a proportion of about 0.01 to 300% by weight in the total amount of the amine-based neutralizing agent, a phosphonyl group- or phosphoric acid group-containing compound, and water, an organic solvent, or both of them.
- the mold can be coated with the release agent solution by any method commonly used, such as coating by dipping, spraying, brush coating, aerosol propelling or an impregnated cloth.
- the molding material formed in the mold coated with the release agent include resins such as polyurethane, polycarbonate, an epoxy resin, a phenol resin, a polyimide resin and a vinyl chloride resin, and rubbers such as natural rubber, chloroprene rubber and fluororubber.
- the present invention can provide a fluorine-containing compound having a different structure from that of a conventional modification material compound and exerting extremely high water-repellent and oil-repellent effects, as well as a surface modifier using the compound.
- GC-MS GCMS-QP2010Plus (Shimadzu Corporation)
- a 100-ml eggplant flask was charged with 150 g (294 mol) of 3,3,4,4,5,5,6,6-octafluoro-1,8-diiodooctane ( ⁇ 1 ) (reagent of SynQuest Laboratories) and 150 g of THF, and dissolved. After cooling to 5° C. or less, a liquid in which 44.8 g (294 mmol) of diazabicycloundecene was dissolved in 25 g of THF was placed over 1 hour with stirring.
- the resulting light yellow slurry was heated and dissolved in hexane and thereafter crystallized by cooling, a crystal precipitated was removed, and the solvent of a filtrate was removed under reduced pressure and thereafter distillated under reduced pressure, to provide 52.9 g of light pink oily compound (1).
- a 150-ml SUS autoclave was charged with 61.3 g (137.4 mmol) of 1-iodoperfluorohexane ( ⁇ 2 ) (reagent of Tokyo Chemical Industry Co., Ltd.), 50.0 g (130.9 mmol) of 3,3,4,4,5,5,6,6-octafluoro-8-iodo-1-octene (1) and 0.19 g (1.3 mmol) of di-tert-butyl peroxide, the autoclave was sufficiently purged with nitrogen, and thereafter the temperature was raised to conduct the reaction at 120° C. for 2 hours with stirring.
- reaction liquid was subjected to distillation under reduced pressure, to provide 26.7 g of compound (2) being a colorless and transparent liquid as a fraction at 85 to 90° C. (2 kPa).
- the reaction was conducted at room temperature with stirring overnight, and thereafter 100 g of a 1% by weight hydrochloric acid solution was added to separate an aqueous phase.
- An organic phase was washed with water, 1% by weight potassium hydrogen carbonate, and saturated saline, thereafter the solvent was removed, and the resultant was treated with silica and then subjected to distillation under reduced pressure, to obtain 19.0 g of compound (3) being a colorless and transparent liquid as a fraction at 90 to 94° C. (2 kPa).
- the yield was 90.1%.
- a 150-ml SUS autoclave was charged with 88.42 g (0.36 mol) of 3,3,4,4,5,5,6,6,6-nonafluoro-1-octene ( ⁇ 3 ) (reagent of Tokyo Chemical Industry Co., Ltd.), 199.00 g (0.36 mol) of 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluoro-1,6-diiodohexane ( ⁇ 4 ) (produced by Tosoh F-Tech, Inc.) and 0.53 g (0.004 mol) of di-tert-butyl peroxide, and the autoclave was purged with nitrogen.
- a 100-ml eggplant flask was charged with 10.00 g (14.45 mmol) of compound (5) and 7.7 g of an aqueous 25% by weight sodium disulfite solution, and the flask was sufficiently purged with nitrogen.
- the inner temperature was raised to 70° C., and a solution in which 0.05 g (0.30 mmol) of azobisisobutyronitrile was dissolved in 1.01 g (17.34 mmol) of allyl alcohol ( ⁇ 5 ) was slowly dropped under vigorous stirring over 1 hour with the inner temperature being kept at 75 to 85° C. After the dropping, the reaction was performed at 75° C. for 16 hours, and thereafter the resultant was treated at 100° C. for 10 minutes.
- a 150-ml SUS autoclave was charged with 31.24 g (0.090 mol) of 3,3,4,4,5,5,6,6,7,7,8,8,8-nonafluoro-1-decene ( ⁇ 6 ) (reagent of Tokyo Chemical Industry Co., Ltd.), and 50.00 g (0.090 mol) of 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluoro-1,6-diiodohexane ( ⁇ 4 ) (produced by Tosoh F-Tech, Inc.) and 0.13 g (0.001 mol) of di-tert-butyl peroxide, and the autoclave was purged with nitrogen.
- a 100-ml two-necked flask was charged with 65.21 g of a mixture including (8) obtained in the reaction, and 55.71 g of a 10% potassium hydroxide-methanol solution was dropped under room temperature over 15 minutes. After the reaction at room temperature for 1 hour, the reaction liquid was washed with 50 g of water, 50 g of an aqueous 10% ammonium chloride solution and 50 g of saturated saline. The organic layer was diluted with dichloromethane. Furthermore, the organic layer was washed with g of 1% hydrochloric acid, 40 g of water and 40 g of saturated saline. The resulting organic layer was subjected to distillation under reduced pressure, to obtain 21.69 g of compound (9) as a fraction at 108° C. and 0.8 kPa. The yield was 31.1%.
- a 100-ml eggplant flask was charged with 10.00 g (12.95 mmol) of compound (9) and 6.9 g of an aqueous 25% by weight sodium disulfite solution, and the flask was sufficiently purged with nitrogen.
- the inner temperature was raised to 70° C., and a solution in which 0.04 g (0.27 mmol) of azobisisobutyronitrile was dissolved in 0.90 g (15.54 mmol) of allyl alcohol ( ⁇ 5 ) was slowly dropped under vigorous stirring over 1 hour with the inner temperature being kept at 75 to 85° C. After the dropping, the reaction was performed with stirring at 75° C. for 16 hours, and thereafter the resultant was treated at 100° C. for 10 minutes.
- a 150-ml SUS autoclave was charged with 76 g (0.22 mol) of 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluoro-1-octene ( ⁇ 6 ) (reagent of Tokyo Chemical Industry Co., Ltd.), and 200 g (0.44 mol) of 1,1,2,2,3,3,4,4-octafluoro-1,4-diiodobutane ( ⁇ 7 ) (produced by Tosoh F-Tech, Inc.) and 0.65 g (0.004 mol) of di-tert-butyl peroxide, and the autoclave was purged with nitrogen.
- a 100-ml eggplant flask was charged with 27.75 g (34.7 mmol) of compound (12) and 18.5 g of an aqueous 25% by weight sodium disulfite solution, and the flask was sufficiently purged with nitrogen.
- the inner temperature was raised to 70° C., and a solution in which 0.12 g (0.73 mmol) of azobisisobutyronitrile was dissolved in 4.03 g (69.4 mmol) of allyl alcohol ( ⁇ 5 ) was slowly dropped under vigorous stirring over 2 hours with the inner temperature being kept at 75 to 85° C. After the dropping, the reaction was performed with stirring at 75° C. for 16 hours, and thereafter the resultant was treated at 100° C. for 10 minutes.
- the crude product included 19.3% of raw material (12), 17.2% of reduced product (14) with one iodine and 10.6% of 2-adduct (15). Each calculation was made depending on the area percentage by GC.
- the resulting orange oily product was purified and separated by a silica column chromatographic method (filler: silica gel 60N produced by Kanto Kagaku, eluent: dichloromethane) to obtain 0.32 g of compound (20).
- the yield from compound (12) was 1.5%.
- a 500-ml three-necked flask was charged with 6.09 g (225.90 mol) of an aluminum powder (reagent of Wako Pure Chemical Industries, Ltd.), 5.37 g (22.59 mmol) of nickel chloride hexahydrate (reagent of Wako Pure Chemical Industries, Ltd.), 177 g of acetonitrile and 40.00 g (113.0 mmol) of 3,3,4,4,5,5,6,6,7,7,8,8-dodecafluorooctadecyl-1,9-diene ( ⁇ 8 ) (produced by Tosoh F-Tech, Inc.), and 50.37 g (446.0 mol) of 1-iodo-1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexane ( ⁇ 2 ) was dropped under room temperature over 15 minutes.
- a 10-ml vial was charged with 5.00 g of compound (17), and 4.67 g of a 10% potassium hydroxide-methanol solution was dropped under room temperature over 5 minutes. After the reaction at room temperature for 1 hour, the reaction liquid was washed with 5 g of an aqueous 10% ammonium chloride solution, 5 g of water and 5 g of saturated saline. The resulting organic layer was condensed under reduced pressure to obtain 4.46 g of compound (19). The yield was 93.9%.
- the resulting compound (20) was analyzed, and the following results were obtained.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 1.00 g (1.7 mmol) of compound (3), 0.004 g (0.01 mmol) of chloroplatinic acid hexahydrate (reagent of Wako Pure Chemical Industries, Ltd.) and 0.45 g (3.3 mmol) of trichlorosilane (reagent of Tokyo Chemical Industry Co., Ltd.), and the reaction was performed under stirring at 50° C. for 3 days.
- the reaction was conducted with stirring at room temperature for 2 hours, and purification was performed by a silica column chromatographic method (filler: silica gel 60N produced by Kanto Kagaku, eluent: hexane) to provide 0.33 g of the product of interest (24). The yield was 93.3%.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 1.00 g (1.53 mmol) of compound (17), 0.008 g (0.02 mmol) of chloroplatinic acid hexahydrate (reagent of Wako Pure Chemical Industries, Ltd.) and 0.31 g (2.29 mmol) of trichlorosilane (reagent of Tokyo Chemical Industry Co., Ltd.), and the reaction was performed under stirring at 50° C. for 15 hours.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 2.00 g (3.06 mmol) of compound (17), 0.012 g (0.03 mmol) of a Karstedt catalyst (reagent of Tokyo Chemical Industry Co., Ltd.) and 0.60 g (3.67 mmol) of triethoxysilane (reagent of Tokyo Chemical Industry Co., Ltd.), and the reaction was performed under stirring at 80° C. for 15 hours.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 1.00 g (1.63 mmol) of compound (19), 0.008 g (0.02 mmol) of chloroplatinic acid hexahydrate (reagent of Wako Pure Chemical Industries, Ltd.) and 0.33 g (2.44 mmol) of trichlorosilane (reagent of Tokyo Chemical Industry Co., Ltd.), and the reaction was performed under stirring at 50° C. for 15 hours.
- the reaction was conducted under a nitrogen atmosphere with stirring at room temperature for 65 hours, purification was performed by a silica column chromatographic method (filler: silica gel 60N produced by Kanto Kagaku, eluent: hexane-ethyl acetate 95/5 (volume/volume)) to provide 0.75 g of the compound of interest (28).
- the yield was 55.3%.
- the resulting compound (28) was analyzed, and the following results were obtained.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 1.00 g (1.42 mmol) of compound (11), 4.7 g of dichloromethane and 0.22 g (2.13 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.28 g (2.13 mmol) of methacryloyl chloride ( ⁇ 12 ) (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 0.50 g (0.71 mmol) of compound (11), 2.4 g of dichloromethane and 0.11 g (1.07 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.12 g (1.07 mmol) of acryloyl chloride ( ⁇ 13 ) (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 0.50 g (0.74 mmol) of compound (18), 2.5 g of dichloromethane and 0.11 g (1.12 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.15 g (1.12 mmol) of methacryloyl chloride ( ⁇ 12 ) (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 0.44 g (0.67 mmol) of compound (20), 2.2 g of dichloromethane and 0.10 g (1.01 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.13 g (1.01 mmol) of methacryloyl chloride ( ⁇ 12 ) (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 1.00 g (1.42 mmol) of compound (11), 4.7 g of dichloromethane and 0.43 g (4.26 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.74 g (4.26 mmol) of diethyl chlorophosphate (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 0.50 g (0.74 mmol) of compound (18), 2.5 g of dichloromethane and 0.23 g (2.23 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.39 g (2.23 mmol) of diethyl chlorophosphate (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes. After the reaction was performed under stirring at room temperature for 1 hour, the solvent was removed by nitrogen bubbling, and the reaction liquid was diluted with 20 g of diisopropyl ether and washed with 20 g of saturated saline three times.
- a glass pressure-resistant tube (manufactured by Ace Glass Inc.: 40 ml) was charged with 0.25 g (0.39 mmol) of compound (20), 1.3 g of dichloromethane and 0.12 g (1.18 mmol) of triethylamine (reagent of Wako Pure Chemical Industries, Ltd.), and 0.39 g (2.23 mmol) of diethyl chlorophosphate (reagent of Tokyo Chemical Industry Co., Ltd.) was dropped under stirring at 0° C. over 5 minutes. After the reaction was performed under stirring at room temperature for 1 hour, the solvent was removed by nitrogen bubbling, and the reaction liquid was diluted with 20 g of diisopropyl ether and washed with 20 g of saturated saline three times.
- the yield was 86.5%.
- a glass slide (manufactured by Matsunami Glass Ind., Ltd., size: 76 mm ⁇ 26 mm ⁇ 1.2 mm) was immersed in a saturated potassium hydroxide-isopropyl alcohol solution at room temperature for 17 hours, washed with water and dried at 60° C. for 2 hours before use, and the resultant was immediately used as a pre-treated glass.
- This pre-treated glass was treated with being stirred and immersed in a surface modifier solution, in which compound (21) synthesized in Example 8 was dissolved in a chloroform solvent so as to be in an amount of 0.3% by weight, at 50° C. for 2 hours.
- the glass was taken out from the modification solution, an excessive surface modifier attached to the glass surface was wiped off by Novec (registered trademark) 7100 (produced by 3M) and water, and thereafter the resultant was treated at 150° C. for 2 hours to provide a surface-modified glass substrate.
- the contact angle was determined by dropping 1 ⁇ L of a droplet onto the surface of the surface-modified glass substrate, imaging the resultant as viewed edge-on, and subjecting the resulting projected image to a ⁇ /2 method.
- the contact angle was measured by using compound (22) synthesized in Example 9 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (23) synthesized in Example 10 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (24) synthesized in Example 11 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (25) synthesized in Example 12 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (26) synthesized in Example 13 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (27) synthesized in Example 14 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using compound (28) synthesized in Example 15 instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the contact angle was measured by using CF 3 (CF 2 ) 5 CH 2 CH 2 Si (OMe) 3 (produced by Sigma-Aldrich) as a comparative agent instead of compound (21) to modify the surface of the glass slide in the same manner as in Example 24.
- the remaining precipitate was again dissolved in 3.5 g of tetrahydrofuran, and the solution was added to 42.4 g of hexane to reprecipitate a polymer.
- the precipitate was subjected to suction filtration, and dried in vacuum to provide 0.92 g of the product of interest (polymer 1) as a white powder.
- the yield was 60.5%.
- the weight average molecular weight Mw and the dispersibility Mw/Mn of the resulting product of interest, in terms of polystyrene measured by GPC, were 17,000 and 1.5, respectively.
- the remaining precipitate was again dissolved in 3.5 g of tetrahydrofuran, and the solution was added to 42.4 g of hexane to reprecipitate a polymer.
- the precipitate was subjected to suction filtration, and dried in vacuum to provide 0.95 g of the product of interest (polymer 2) as a white powder.
- the yield was 61.7%.
- the weight average molecular weight Mw and the dispersibility Mw/Mn of the resulting product of interest, in terms of polystyrene measured by GPC, were 32,000 and 2.0, respectively.
- the remaining precipitate was again dissolved in 3.5 g of tetrahydrofuran, and the solution was added to 42.4 g of hexane to reprecipitate a polymer.
- the precipitate was subjected to suction filtration, and dried in vacuum to provide 0.85 g of the product of interest (polymer 3) as a white powder.
- the yield was 55.2%.
- the weight average molecular weight Mw and the dispersibility Mw/Mn of the resulting product of interest, in terms of polystyrene measured by GPC, were 18,000 and 1.7, respectively.
- the remaining precipitate was again dissolved in 3.5 g of tetrahydrofuran, and the solution was added to 42.4 g of hexane to reprecipitate a polymer.
- the precipitate was subjected to suction filtration, and dried in vacuum to provide 0.81 g of the product of interest (polymer 4) as a white powder.
- the yield was 52.6%.
- the weight average molecular weight Mw and the dispersibility Mw/Mn of the resulting product of interest, in terms of polystyrene measured by GPC, were 19,000 and 1.6, respectively.
- the reaction liquid was dropped to 151.5 g of hexane to precipitate a polymer, and the supernatant solution was subjected to decantation. The remaining precipitate was again dissolved in 12.5 g of tetrahydrofuran, and the solution was added to 151.5 g of hexane to reprecipitate a polymer. The precipitate was subjected to suction filtration, and dried in vacuum to provide 2.01 g of the product of interest (polymer 5) as a white powder. The yield was 52.2%.
- the weight average molecular weight Mw and the dispersibility Mw/Mn of the resulting product of interest, in terms of polystyrene measured by GPC, were 21,000 and 2.0, respectively.
- a thin film was formed in the same manner as in Example 36 by use of polymer 2 synthesized in Example 33 instead of polymer 1, and the contact angle thereof was measured.
- a thin film was formed in the same manner as in Example 36 by use of polymer 3 synthesized in Example 34 instead of polymer 1, and the contact angle thereof was measured.
- a thin film was formed in the same manner as in Example 36 by use of polymer 4 synthesized in Example 35 instead of polymer 1, and the contact angle thereof was measured.
- a thin film was formed in the same manner as in Example 36 by use of polymer 5 synthesized in Comparative Example 3 instead of polymer 1, and the contact angle thereof was measured.
- An aqueous release agent solution including 0.5% by weight of compound (33) obtained in Example 20, 49.8% by weight of pure water and 49.7% by weight of isopropanol was prepared.
- the release agent solution was used to perform evaluation of releasability according to the following measurement method.
- a polyurethane prepolymer and a curing agent were poured into a mold (made of aluminum, 60 mm in diameter and 50 mm in depth) coated with the release agent, and cured under a heated and pressurized condition, and thereafter the load at which a molded product was released from the mold was measured by a push-pull scale.
- the releasability in a case where the load required was less than 10 N was rated as “Excellent”, that in a case where the load was 10 N or more and less than 20 N was rated as “Good”, that in a case where the load was 20 N or more and less than 50 N rated as “Fair”, and that in a case where the load was 50 N or more was rated as “Poor”.
- the number of times where releasing was possible under a load of less than 50 N under the same condition was measured and defined as the repeatability.
- novel fluorine-containing compound and the surface modifier using the compound, of the present invention exhibit high water repellency and oil repellency, and can be utilized in surface modifiers such as a release agent and a antifouling agent.
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JP2021100940A (ja) | 2021-07-08 |
JP7003310B2 (ja) | 2022-01-20 |
KR102159824B1 (ko) | 2020-09-25 |
KR20180091877A (ko) | 2018-08-16 |
EP3401298B1 (en) | 2021-09-08 |
WO2017119371A1 (ja) | 2017-07-13 |
CN108473399A (zh) | 2018-08-31 |
JP6920214B2 (ja) | 2021-08-18 |
JPWO2017119371A1 (ja) | 2018-11-08 |
CN108473399B (zh) | 2022-04-01 |
US20180305484A1 (en) | 2018-10-25 |
EP3401298A1 (en) | 2018-11-14 |
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