UA95809C2 - Способ осаждения слабопроводящих слоев (варианты) - Google Patents

Способ осаждения слабопроводящих слоев (варианты)

Info

Publication number
UA95809C2
UA95809C2 UAA200901382A UAA200901382A UA95809C2 UA 95809 C2 UA95809 C2 UA 95809C2 UA A200901382 A UAA200901382 A UA A200901382A UA A200901382 A UAA200901382 A UA A200901382A UA 95809 C2 UA95809 C2 UA 95809C2
Authority
UA
Ukraine
Prior art keywords
target
low conductivity
magnetic field
depositon
variants
Prior art date
Application number
UAA200901382A
Other languages
English (en)
Ukrainian (uk)
Inventor
Юрген РАММ
Бено ВИДРИГ
Кристиан ВОЛЬРАБ
Original Assignee
Эрликон Трейдинг Аг, Трюббах
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Эрликон Трейдинг Аг, Трюббах filed Critical Эрликон Трейдинг Аг, Трюббах
Publication of UA95809C2 publication Critical patent/UA95809C2/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Abstract

Предложен способ получения слабопроводящих, в частности электроизолирующих, слоев по меньшей мере на одной детали при помощи вакуумного нанесения покрытий, при котором между по меньшей мере одним анодом и катодом дугового источника в атмосфере, содержащей реактивный газ, создают электрический дуговой разряд и на поверхности электрически соединенной с катодом мишени создают лишь небольшое, в основном, перпендикулярно поверхности мишени внешнее магнитное поле для поддержки процесса испарения, причем мера повторного покрывания поверхности мишени при помощи других источников покрытия составляет менее 10 %, или магнитное поле создают магнитной системой, которая содержит по меньшей мере одну аксиально поляризированную катушку с похожей с периферией мишени геометрией.
UAA200901382A 2006-07-19 2007-07-12 Способ осаждения слабопроводящих слоев (варианты) UA95809C2 (ru)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH11662006 2006-07-19

Publications (1)

Publication Number Publication Date
UA95809C2 true UA95809C2 (ru) 2011-09-12

Family

ID=37174179

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA200901382A UA95809C2 (ru) 2006-07-19 2007-07-12 Способ осаждения слабопроводящих слоев (варианты)

Country Status (20)

Country Link
US (1) US8197648B2 (ru)
EP (2) EP2041331B1 (ru)
JP (1) JP5306198B2 (ru)
KR (1) KR101361234B1 (ru)
CN (1) CN101490305B (ru)
AU (1) AU2007276186B2 (ru)
BR (1) BRPI0714437B1 (ru)
CA (1) CA2657726C (ru)
ES (1) ES2527877T3 (ru)
HK (1) HK1129910A1 (ru)
IL (1) IL196488A (ru)
MX (1) MX2009000593A (ru)
MY (1) MY167043A (ru)
NZ (1) NZ573694A (ru)
PT (1) PT2041331E (ru)
RU (1) RU2461664C2 (ru)
TW (1) TWI411696B (ru)
UA (1) UA95809C2 (ru)
WO (1) WO2008009619A1 (ru)
ZA (1) ZA200900374B (ru)

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ES2377225T3 (es) * 2008-09-19 2012-03-23 OERLIKON TRADING AG, TRÜBBACH Método para producir capas de óxido metálico mediante vaporización por arco
DE102009022982A1 (de) * 2009-05-28 2010-12-02 Oerlikon Trading Ag, Trübbach Verfahren zum Aufbringen eines Hochtemperaturschmiermittels
EP2456905B1 (en) 2009-07-22 2017-12-27 Oerlikon Trading AG, Trübbach Method for producing coatings with a single composite target
EP2369031B1 (de) 2010-03-18 2016-05-04 Oerlikon Trading AG, Trübbach Beschichtung auf nial2o4 basis in spinellstruktur
DE102010042828A1 (de) * 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren
HUE046095T2 (hu) * 2011-09-30 2020-01-28 Oerlikon Surface Solutions Ag Pfaeffikon Alumínium-titán-nitrid-bevonat, a gépi mûveletek során fokozott kopásállósághoz módosított morfológiával, és ennek módszere
MX369729B (es) * 2013-04-30 2019-11-20 Nippon Itf Inc Fuente de evaporación por arco.
EP3394320B1 (en) 2015-12-22 2020-07-29 Sandvik Intellectual Property AB Method of producing a pvd layer and a coated cutting tool
MY189225A (en) * 2016-04-22 2022-01-31 Oerlikon Surface Solutions Ag Pfaffikon Ticn having reduced growth defects by means of hipims
EP3556901B1 (en) * 2018-04-20 2021-03-31 Plansee Composite Materials Gmbh Vacuum arc source
DE102018112335A1 (de) * 2018-05-23 2019-11-28 Hartmetall-Werkzeugfabrik Paul Horn Gmbh Magnetronsputtervorrichtung
RU2761900C1 (ru) * 2021-02-08 2021-12-13 Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук Магнетронное распылительное устройство
CN114324369B (zh) * 2022-03-11 2022-06-07 北京新研创能科技有限公司 双极板表面划痕检测系统及方法

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Also Published As

Publication number Publication date
EP2041331B1 (de) 2014-10-22
WO2008009619A1 (de) 2008-01-24
CA2657726C (en) 2015-05-26
KR20090031904A (ko) 2009-03-30
AU2007276186A1 (en) 2008-01-24
TWI411696B (zh) 2013-10-11
EP2041331A1 (de) 2009-04-01
EP2599891A3 (de) 2013-08-07
JP2009543951A (ja) 2009-12-10
RU2009105668A (ru) 2010-08-27
AU2007276186B2 (en) 2012-03-01
CN101490305B (zh) 2014-02-12
BRPI0714437A2 (pt) 2013-03-12
US8197648B2 (en) 2012-06-12
MY167043A (en) 2018-08-02
IL196488A0 (en) 2009-09-22
JP5306198B2 (ja) 2013-10-02
RU2461664C2 (ru) 2012-09-20
ZA200900374B (en) 2010-04-28
MX2009000593A (es) 2009-04-07
WO2008009619A9 (de) 2009-04-16
IL196488A (en) 2014-11-30
NZ573694A (en) 2012-02-24
HK1129910A1 (en) 2009-12-11
ES2527877T3 (es) 2015-02-02
CA2657726A1 (en) 2008-01-24
BRPI0714437B1 (pt) 2018-06-05
US20090166188A1 (en) 2009-07-02
PT2041331E (pt) 2015-01-14
KR101361234B1 (ko) 2014-02-11
TW200806803A (en) 2008-02-01
EP2599891A2 (de) 2013-06-05
CN101490305A (zh) 2009-07-22

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