ES2527877T3 - Procedimiento para el depósito de capas eléctricamente aislantes - Google Patents

Procedimiento para el depósito de capas eléctricamente aislantes Download PDF

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Publication number
ES2527877T3
ES2527877T3 ES07787450.1T ES07787450T ES2527877T3 ES 2527877 T3 ES2527877 T3 ES 2527877T3 ES 07787450 T ES07787450 T ES 07787450T ES 2527877 T3 ES2527877 T3 ES 2527877T3
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ES
Spain
Prior art keywords
target
component
procedure
insulating layers
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES07787450.1T
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English (en)
Inventor
Jürgen RAMM
Beno Widrig
Christian Wohlrab
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Application granted granted Critical
Publication of ES2527877T3 publication Critical patent/ES2527877T3/es
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Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Abstract

Procedimiento para la obtención de capas aislantes sobre al menos una herramienta por medio de un recubrimiento en vacío, en el que se establece una descarga eléctrica de arco entre al menos un ánodo y un cátodo de una fuente de arco en una atmósfera, que contenga un gas reactivo, y generando en la superficie de un blanco conectado eléctricamente con el cátodo un campo magnético exterior, que comprende una componente Bz perpendicular a la superficie del blanco y una componente Br radial o paralela al la superficie menor que aquella, para la asistencia del proceso de vaporización, por el hecho de que un sistema magnético formado por al menos una bobina polarizada axialmente se ataca con la corriente de excitación, caracterizado porque el sistema magnético posee una forma geométrica y un tamaño análogos a los del blanco y porque en la superficie del blanco se elige la componente Bz perpendicular en un margen entre 3 y 50 Gauss.

Description

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Claims (1)

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ES07787450.1T 2006-07-19 2007-07-12 Procedimiento para el depósito de capas eléctricamente aislantes Active ES2527877T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH11662006 2006-07-19
CH11662006 2006-07-19
PCT/EP2007/057179 WO2008009619A1 (de) 2006-07-19 2007-07-12 Verfahren zum abscheiden elektrisch isolierender schichten

Publications (1)

Publication Number Publication Date
ES2527877T3 true ES2527877T3 (es) 2015-02-02

Family

ID=37174179

Family Applications (1)

Application Number Title Priority Date Filing Date
ES07787450.1T Active ES2527877T3 (es) 2006-07-19 2007-07-12 Procedimiento para el depósito de capas eléctricamente aislantes

Country Status (20)

Country Link
US (1) US8197648B2 (es)
EP (2) EP2041331B1 (es)
JP (1) JP5306198B2 (es)
KR (1) KR101361234B1 (es)
CN (1) CN101490305B (es)
AU (1) AU2007276186B2 (es)
BR (1) BRPI0714437B1 (es)
CA (1) CA2657726C (es)
ES (1) ES2527877T3 (es)
HK (1) HK1129910A1 (es)
IL (1) IL196488A (es)
MX (1) MX2009000593A (es)
MY (1) MY167043A (es)
NZ (1) NZ573694A (es)
PT (1) PT2041331E (es)
RU (1) RU2461664C2 (es)
TW (1) TWI411696B (es)
UA (1) UA95809C2 (es)
WO (1) WO2008009619A1 (es)
ZA (1) ZA200900374B (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2377225T3 (es) * 2008-09-19 2012-03-23 OERLIKON TRADING AG, TRÜBBACH Método para producir capas de óxido metálico mediante vaporización por arco
DE102009022982A1 (de) * 2009-05-28 2010-12-02 Oerlikon Trading Ag, Trübbach Verfahren zum Aufbringen eines Hochtemperaturschmiermittels
EP2456905B1 (en) 2009-07-22 2017-12-27 Oerlikon Trading AG, Trübbach Method for producing coatings with a single composite target
EP2369031B1 (de) 2010-03-18 2016-05-04 Oerlikon Trading AG, Trübbach Beschichtung auf nial2o4 basis in spinellstruktur
DE102010042828A1 (de) * 2010-10-22 2012-04-26 Walter Ag Target für Lichtbogenverfahren
HUE046095T2 (hu) * 2011-09-30 2020-01-28 Oerlikon Surface Solutions Ag Pfaeffikon Alumínium-titán-nitrid-bevonat, a gépi mûveletek során fokozott kopásállósághoz módosított morfológiával, és ennek módszere
MX369729B (es) * 2013-04-30 2019-11-20 Nippon Itf Inc Fuente de evaporación por arco.
EP3394320B1 (en) 2015-12-22 2020-07-29 Sandvik Intellectual Property AB Method of producing a pvd layer and a coated cutting tool
MY189225A (en) * 2016-04-22 2022-01-31 Oerlikon Surface Solutions Ag Pfaffikon Ticn having reduced growth defects by means of hipims
EP3556901B1 (en) * 2018-04-20 2021-03-31 Plansee Composite Materials Gmbh Vacuum arc source
DE102018112335A1 (de) * 2018-05-23 2019-11-28 Hartmetall-Werkzeugfabrik Paul Horn Gmbh Magnetronsputtervorrichtung
RU2761900C1 (ru) * 2021-02-08 2021-12-13 Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук Магнетронное распылительное устройство
CN114324369B (zh) * 2022-03-11 2022-06-07 北京新研创能科技有限公司 双极板表面划痕检测系统及方法

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JPS63501646A (ja) * 1985-09-30 1988-06-23 ユニオン　カ−バイド　コ−ポレ−シヨン 真空室内でコ−テイングをア−ク蒸着する為の装置及び方法
EP0285745B1 (de) 1987-03-06 1993-05-26 Balzers Aktiengesellschaft Verfahren und Vorrichtungen zum Vakuumbeschichten mittels einer elektrischen Bogenentladung
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Also Published As

Publication number Publication date
UA95809C2 (ru) 2011-09-12
EP2041331B1 (de) 2014-10-22
WO2008009619A1 (de) 2008-01-24
CA2657726C (en) 2015-05-26
KR20090031904A (ko) 2009-03-30
AU2007276186A1 (en) 2008-01-24
TWI411696B (zh) 2013-10-11
EP2041331A1 (de) 2009-04-01
EP2599891A3 (de) 2013-08-07
JP2009543951A (ja) 2009-12-10
RU2009105668A (ru) 2010-08-27
AU2007276186B2 (en) 2012-03-01
CN101490305B (zh) 2014-02-12
BRPI0714437A2 (pt) 2013-03-12
US8197648B2 (en) 2012-06-12
MY167043A (en) 2018-08-02
IL196488A0 (en) 2009-09-22
JP5306198B2 (ja) 2013-10-02
RU2461664C2 (ru) 2012-09-20
ZA200900374B (en) 2010-04-28
MX2009000593A (es) 2009-04-07
WO2008009619A9 (de) 2009-04-16
IL196488A (en) 2014-11-30
NZ573694A (en) 2012-02-24
HK1129910A1 (en) 2009-12-11
CA2657726A1 (en) 2008-01-24
BRPI0714437B1 (pt) 2018-06-05
US20090166188A1 (en) 2009-07-02
PT2041331E (pt) 2015-01-14
KR101361234B1 (ko) 2014-02-11
TW200806803A (en) 2008-02-01
EP2599891A2 (de) 2013-06-05
CN101490305A (zh) 2009-07-22

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