TWI688431B - 膜形成方法及膜形成裝置 - Google Patents

膜形成方法及膜形成裝置 Download PDF

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Publication number
TWI688431B
TWI688431B TW106126538A TW106126538A TWI688431B TW I688431 B TWI688431 B TW I688431B TW 106126538 A TW106126538 A TW 106126538A TW 106126538 A TW106126538 A TW 106126538A TW I688431 B TWI688431 B TW I688431B
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TW
Taiwan
Prior art keywords
substrate
inkjet head
pattern
film
minimum size
Prior art date
Application number
TW106126538A
Other languages
English (en)
Chinese (zh)
Other versions
TW201805069A (zh
Inventor
野本剛
岡本裕司
Original Assignee
日商住友重機械工業股份有限公司
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Application filed by 日商住友重機械工業股份有限公司 filed Critical 日商住友重機械工業股份有限公司
Publication of TW201805069A publication Critical patent/TW201805069A/zh
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Publication of TWI688431B publication Critical patent/TWI688431B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J11/00—Devices or arrangements  of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
    • B41J11/008—Controlling printhead for accurately positioning print image on printing material, e.g. with the intention to control the width of margins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J29/00—Details of, or accessories for, typewriters or selective printing mechanisms not otherwise provided for
    • B41J29/38—Drives, motors, controls or automatic cut-off devices for the entire printing mechanism
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Ink Jet (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW106126538A 2016-08-10 2017-08-07 膜形成方法及膜形成裝置 TWI688431B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-157066 2016-08-10
JP2016157066A JP6862041B2 (ja) 2016-08-10 2016-08-10 膜形成方法及び膜形成装置

Publications (2)

Publication Number Publication Date
TW201805069A TW201805069A (zh) 2018-02-16
TWI688431B true TWI688431B (zh) 2020-03-21

Family

ID=61162803

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106126538A TWI688431B (zh) 2016-08-10 2017-08-07 膜形成方法及膜形成裝置

Country Status (5)

Country Link
JP (1) JP6862041B2 (ja)
KR (1) KR20190040960A (ja)
CN (1) CN109475895A (ja)
TW (1) TWI688431B (ja)
WO (1) WO2018030256A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020039952A1 (ja) * 2018-08-22 2020-02-27 東京エレクトロン株式会社 描画装置および描画方法
CN111565519B (zh) * 2020-06-02 2021-08-17 锡凡半导体无锡有限公司 一种印刷无感光蚀工艺
EP4209280A4 (en) * 2020-09-03 2024-02-28 Konica Minolta Inc METHOD FOR PATTERN FORMATION

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003329828A (ja) * 2002-03-06 2003-11-19 Seiko Epson Corp 液状物の吐出方法、液状物の吐出装置、カラーフィルタの製造方法およびカラーフィルタ、液晶表示装置、エレクトロルミネッセンス装置の製造方法およびエレクトロルミネッセンス装置、並びにプラズマディスプレイパネルの製造方法およびプラズマディスプレイ
JP2011051225A (ja) * 2009-09-01 2011-03-17 Olympus Corp 画像記録装置の記録不良検査方法
JP2012236152A (ja) * 2011-05-12 2012-12-06 Shibaura Mechatronics Corp 液滴塗布装置及び液滴塗布方法
TW201617140A (zh) * 2014-06-25 2016-05-16 柯尼卡美能達股份有限公司 圖案形成方法、附透明導電膜基材、裝置及電子機器
TWI541073B (zh) * 2011-02-21 2016-07-11 Toray Eng Co Ltd Coating method and coating device

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Publication number Priority date Publication date Assignee Title
JPS5797277A (en) 1980-12-09 1982-06-16 Nec Corp Television video audio simultaneous transmitter
JP2007190770A (ja) * 2006-01-18 2007-08-02 Fujifilm Corp インクジェット描画装置および方法
JP2009255007A (ja) * 2008-04-21 2009-11-05 Hitachi Ltd パターン形成方法、これによる基板の製造方法、基板、並びにパターン形成装置
JP2013071085A (ja) * 2011-09-28 2013-04-22 Minebea Co Ltd パターン形成方法
JP6053459B2 (ja) * 2012-11-01 2016-12-27 住友重機械工業株式会社 基板製造方法及び基板製造装置
JP2015026655A (ja) * 2013-07-25 2015-02-05 住友重機械工業株式会社 薄膜形成方法及び薄膜形成装置
JP6085578B2 (ja) * 2014-03-11 2017-02-22 住友重機械工業株式会社 膜形成方法及び膜形成装置
CN105499069B (zh) * 2014-10-10 2019-03-08 住友重机械工业株式会社 膜形成装置及膜形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003329828A (ja) * 2002-03-06 2003-11-19 Seiko Epson Corp 液状物の吐出方法、液状物の吐出装置、カラーフィルタの製造方法およびカラーフィルタ、液晶表示装置、エレクトロルミネッセンス装置の製造方法およびエレクトロルミネッセンス装置、並びにプラズマディスプレイパネルの製造方法およびプラズマディスプレイ
JP2011051225A (ja) * 2009-09-01 2011-03-17 Olympus Corp 画像記録装置の記録不良検査方法
TWI541073B (zh) * 2011-02-21 2016-07-11 Toray Eng Co Ltd Coating method and coating device
JP2012236152A (ja) * 2011-05-12 2012-12-06 Shibaura Mechatronics Corp 液滴塗布装置及び液滴塗布方法
TW201617140A (zh) * 2014-06-25 2016-05-16 柯尼卡美能達股份有限公司 圖案形成方法、附透明導電膜基材、裝置及電子機器

Also Published As

Publication number Publication date
CN109475895A (zh) 2019-03-15
JP6862041B2 (ja) 2021-04-21
TW201805069A (zh) 2018-02-16
JP2018026443A (ja) 2018-02-15
KR20190040960A (ko) 2019-04-19
WO2018030256A1 (ja) 2018-02-15

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