TWI575314B - 感光性黑色樹脂組成物及樹脂黑矩陣基板 - Google Patents
感光性黑色樹脂組成物及樹脂黑矩陣基板 Download PDFInfo
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- TWI575314B TWI575314B TW102110423A TW102110423A TWI575314B TW I575314 B TWI575314 B TW I575314B TW 102110423 A TW102110423 A TW 102110423A TW 102110423 A TW102110423 A TW 102110423A TW I575314 B TWI575314 B TW I575314B
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- Prior art keywords
- resin
- resin composition
- substrate
- oxetane
- photosensitive
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- VFHDDANHQLKHJQ-UHFFFAOYSA-N prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C VFHDDANHQLKHJQ-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229930004725 sesquiterpene Natural products 0.000 description 1
- 150000004354 sesquiterpene derivatives Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-N sodium;hydron;carbonate Chemical compound [Na+].OC(O)=O UIIMBOGNXHQVGW-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical group CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012068902 | 2012-03-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201348864A TW201348864A (zh) | 2013-12-01 |
| TWI575314B true TWI575314B (zh) | 2017-03-21 |
Family
ID=49259451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102110423A TWI575314B (zh) | 2012-03-26 | 2013-03-25 | 感光性黑色樹脂組成物及樹脂黑矩陣基板 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5333696B1 (ko) |
| KR (1) | KR101998449B1 (ko) |
| CN (1) | CN104204945B (ko) |
| SG (1) | SG11201405096WA (ko) |
| TW (1) | TWI575314B (ko) |
| WO (1) | WO2013146183A1 (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11603458B2 (en) | 2020-09-29 | 2023-03-14 | Echem Solutions Corp. | Black resin composition, cured film, and black filter |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI544281B (zh) * | 2014-11-25 | 2016-08-01 | 奇美實業股份有限公司 | 黑色矩陣用之感光性樹脂組成物及其應用 |
| TWI613486B (zh) * | 2014-08-01 | 2018-02-01 | Toppan Printing Co Ltd | 黑色電極基板、黑色電極基板之製造方法、及顯示裝置 |
| TWI564657B (zh) * | 2014-08-28 | 2017-01-01 | Chi Mei Corp | Photosensitive resin composition for color filter and its application |
| JP6607682B2 (ja) * | 2015-03-05 | 2019-11-20 | 日鉄ケミカル＆マテリアル株式会社 | 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル |
| WO2016194619A1 (ja) * | 2015-05-29 | 2016-12-08 | 住友ベークライト株式会社 | 着色感光性樹脂組成物、着色パターンまたはブラックマトリクス、カラーフィルタ、液晶表示装置または固体撮像素子およびカラーフィルタの製造方法 |
| KR102431444B1 (ko) | 2015-07-14 | 2022-08-11 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
| JPWO2019059169A1 (ja) * | 2017-09-22 | 2020-09-03 | 東レ株式会社 | 透明感光性樹脂組成物、フォトスペーサー、液晶表示装置、フォトスペーサーの製造方法、液晶表示装置の製造方法および透明感光性樹脂組成物のレンズスキャン露光への使用 |
| JP6842560B2 (ja) * | 2017-09-26 | 2021-03-17 | 富士フイルム株式会社 | 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置 |
| KR102229633B1 (ko) * | 2017-12-26 | 2021-03-17 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
| KR102284582B1 (ko) * | 2018-04-04 | 2021-08-02 | 삼성에스디아이 주식회사 | 적색 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
| KR20210115795A (ko) * | 2020-03-16 | 2021-09-27 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1892425A (zh) * | 2005-07-05 | 2007-01-10 | 太阳油墨股份有限公司 | 着色感光性树脂组合物及其固化物 |
| TW201040151A (en) * | 2009-03-30 | 2010-11-16 | Jsr Corp | Coloring composition, color filter, and color liquid crystal display element |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3230800B2 (ja) | 1997-03-06 | 2001-11-19 | 日本化薬株式会社 | 黒色感放射線性樹脂組成物、黒色硬化膜及びブラックマトリックス |
| JP3921730B2 (ja) | 1997-04-08 | 2007-05-30 | 三菱化学株式会社 | カラーフィルター用光重合性組成物 |
| JP2005258460A (ja) | 1999-09-17 | 2005-09-22 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| JP2001228610A (ja) | 2000-02-15 | 2001-08-24 | Showa Denko Kk | 感光性樹脂組成物及び硬化皮膜の製造方法 |
| EP1276011B1 (en) * | 2000-03-29 | 2004-05-26 | Kanagawa University | Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with the same |
| JP4034588B2 (ja) * | 2001-12-25 | 2008-01-16 | 旭化成ケミカルズ株式会社 | 感光性を有する着色性組成物およびその硬化物 |
| JP2004347916A (ja) | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | カラーフィルタ形成用感光性着色組成物およびカラーフィルタ |
| JP2006008740A (ja) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | 紫外線硬化型樹脂組成物 |
| JP4763390B2 (ja) * | 2005-09-05 | 2011-08-31 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP4706560B2 (ja) | 2006-05-29 | 2011-06-22 | Ｊｓｒ株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 |
| JP4947300B2 (ja) * | 2007-06-14 | 2012-06-06 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法 |
| JP2011048064A (ja) * | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
| JP5515714B2 (ja) * | 2009-12-16 | 2014-06-11 | Ｊｓｒ株式会社 | 着色組成物、カラーフィルタおよびカラー液晶表示素子 |
| KR20110130151A (ko) * | 2010-05-27 | 2011-12-05 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
| JP2012008262A (ja) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、およびそれを備えた表示装置 |
| KR20120002864A (ko) * | 2010-07-01 | 2012-01-09 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
| KR20130016375A (ko) * | 2010-07-02 | 2013-02-14 | 도레이 카부시키가이샤 | 감광성 수지 조성물, 감광성 수지 조성물 필름 및 이들을 이용한 반도체 장치 |
-
2013
- 2013-03-08 SG SG11201405096WA patent/SG11201405096WA/en unknown
- 2013-03-08 KR KR1020147025452A patent/KR101998449B1/ko active IP Right Grant
- 2013-03-08 WO PCT/JP2013/056437 patent/WO2013146183A1/ja active Application Filing
- 2013-03-08 CN CN201380014533.9A patent/CN104204945B/zh not_active Expired - Fee Related
- 2013-03-08 JP JP2013514481A patent/JP5333696B1/ja not_active Expired - Fee Related
- 2013-03-25 TW TW102110423A patent/TWI575314B/zh not_active IP Right Cessation
Patent Citations (2)
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|---|---|---|---|---|
| CN1892425A (zh) * | 2005-07-05 | 2007-01-10 | 太阳油墨股份有限公司 | 着色感光性树脂组合物及其固化物 |
| TW201040151A (en) * | 2009-03-30 | 2010-11-16 | Jsr Corp | Coloring composition, color filter, and color liquid crystal display element |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11603458B2 (en) | 2020-09-29 | 2023-03-14 | Echem Solutions Corp. | Black resin composition, cured film, and black filter |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104204945B (zh) | 2017-10-03 |
| WO2013146183A1 (ja) | 2013-10-03 |
| CN104204945A (zh) | 2014-12-10 |
| SG11201405096WA (en) | 2014-11-27 |
| KR101998449B1 (ko) | 2019-07-09 |
| JPWO2013146183A1 (ja) | 2015-12-10 |
| JP5333696B1 (ja) | 2013-11-06 |
| TW201348864A (zh) | 2013-12-01 |
| KR20140148377A (ko) | 2014-12-31 |
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