TWI575314B - 感光性黑色樹脂組成物及樹脂黑矩陣基板 - Google Patents
感光性黑色樹脂組成物及樹脂黑矩陣基板 Download PDFInfo
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- TWI575314B TWI575314B TW102110423A TW102110423A TWI575314B TW I575314 B TWI575314 B TW I575314B TW 102110423 A TW102110423 A TW 102110423A TW 102110423 A TW102110423 A TW 102110423A TW I575314 B TWI575314 B TW I575314B
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- Prior art keywords
- resin
- resin composition
- substrate
- oxetane
- photosensitive
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- VFHDDANHQLKHJQ-UHFFFAOYSA-N prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C VFHDDANHQLKHJQ-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 229930004725 sesquiterpene Natural products 0.000 description 1
- 150000004354 sesquiterpene derivatives Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-N sodium;hydron;carbonate Chemical compound [Na+].OC(O)=O UIIMBOGNXHQVGW-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical group CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012068902 | 2012-03-26 |
Publications (2)
Publication Number | Publication Date |
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TW201348864A TW201348864A (zh) | 2013-12-01 |
TWI575314B true TWI575314B (zh) | 2017-03-21 |
Family
ID=49259451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102110423A TWI575314B (zh) | 2012-03-26 | 2013-03-25 | 感光性黑色樹脂組成物及樹脂黑矩陣基板 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5333696B1 (ko) |
KR (1) | KR101998449B1 (ko) |
CN (1) | CN104204945B (ko) |
SG (1) | SG11201405096WA (ko) |
TW (1) | TWI575314B (ko) |
WO (1) | WO2013146183A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11603458B2 (en) | 2020-09-29 | 2023-03-14 | Echem Solutions Corp. | Black resin composition, cured film, and black filter |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI544281B (zh) * | 2014-11-25 | 2016-08-01 | 奇美實業股份有限公司 | 黑色矩陣用之感光性樹脂組成物及其應用 |
TWI613486B (zh) * | 2014-08-01 | 2018-02-01 | Toppan Printing Co Ltd | 黑色電極基板、黑色電極基板之製造方法、及顯示裝置 |
TWI564657B (zh) * | 2014-08-28 | 2017-01-01 | Chi Mei Corp | Photosensitive resin composition for color filter and its application |
JP6607682B2 (ja) * | 2015-03-05 | 2019-11-20 | 日鉄ケミカル&マテリアル株式会社 | 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル |
JPWO2016194619A1 (ja) * | 2015-05-29 | 2018-03-22 | 住友ベークライト株式会社 | 着色感光性樹脂組成物、着色パターンまたはブラックマトリクス、カラーフィルタ、液晶表示装置または固体撮像素子およびカラーフィルタの製造方法 |
KR102431444B1 (ko) | 2015-07-14 | 2022-08-11 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
CN111149058B (zh) * | 2017-09-22 | 2024-03-08 | 东丽株式会社 | 透明感光性树脂组合物及其应用、光刻间隔物和液晶显示装置及其制造方法 |
JP6842560B2 (ja) * | 2017-09-26 | 2021-03-17 | 富士フイルム株式会社 | 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置 |
KR102229633B1 (ko) * | 2017-12-26 | 2021-03-17 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
KR102284582B1 (ko) * | 2018-04-04 | 2021-08-02 | 삼성에스디아이 주식회사 | 적색 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
KR20210115795A (ko) * | 2020-03-16 | 2021-09-27 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
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CN1892425A (zh) * | 2005-07-05 | 2007-01-10 | 太阳油墨股份有限公司 | 着色感光性树脂组合物及其固化物 |
TW201040151A (en) * | 2009-03-30 | 2010-11-16 | Jsr Corp | Coloring composition, color filter, and color liquid crystal display element |
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JP3230800B2 (ja) | 1997-03-06 | 2001-11-19 | 日本化薬株式会社 | 黒色感放射線性樹脂組成物、黒色硬化膜及びブラックマトリックス |
JP3921730B2 (ja) | 1997-04-08 | 2007-05-30 | 三菱化学株式会社 | カラーフィルター用光重合性組成物 |
JP2005258460A (ja) | 1999-09-17 | 2005-09-22 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
JP2001228610A (ja) | 2000-02-15 | 2001-08-24 | Showa Denko Kk | 感光性樹脂組成物及び硬化皮膜の製造方法 |
CN100454142C (zh) * | 2000-03-29 | 2009-01-21 | 学校法人神奈川大学 | 光固化性和热固化性树脂组合物、其感光性干薄膜及使用其的图案形成方法 |
JP4034588B2 (ja) * | 2001-12-25 | 2008-01-16 | 旭化成ケミカルズ株式会社 | 感光性を有する着色性組成物およびその硬化物 |
JP2004347916A (ja) | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | カラーフィルタ形成用感光性着色組成物およびカラーフィルタ |
JP2006008740A (ja) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | 紫外線硬化型樹脂組成物 |
JP4763390B2 (ja) * | 2005-09-05 | 2011-08-31 | 東京応化工業株式会社 | 感光性樹脂組成物 |
JP4706560B2 (ja) | 2006-05-29 | 2011-06-22 | Jsr株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 |
JP4947300B2 (ja) * | 2007-06-14 | 2012-06-06 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法 |
JP2011048064A (ja) * | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
JP5515714B2 (ja) * | 2009-12-16 | 2014-06-11 | Jsr株式会社 | 着色組成物、カラーフィルタおよびカラー液晶表示素子 |
KR20110130151A (ko) * | 2010-05-27 | 2011-12-05 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
JP2012008262A (ja) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、およびそれを備えた表示装置 |
KR20120002864A (ko) * | 2010-07-01 | 2012-01-09 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
WO2012002134A1 (ja) * | 2010-07-02 | 2012-01-05 | 東レ株式会社 | 感光性樹脂組成物、感光性樹脂組成物フィルムおよびこれらを用いた半導体装置 |
-
2013
- 2013-03-08 SG SG11201405096WA patent/SG11201405096WA/en unknown
- 2013-03-08 JP JP2013514481A patent/JP5333696B1/ja not_active Expired - Fee Related
- 2013-03-08 WO PCT/JP2013/056437 patent/WO2013146183A1/ja active Application Filing
- 2013-03-08 CN CN201380014533.9A patent/CN104204945B/zh not_active Expired - Fee Related
- 2013-03-08 KR KR1020147025452A patent/KR101998449B1/ko active IP Right Grant
- 2013-03-25 TW TW102110423A patent/TWI575314B/zh not_active IP Right Cessation
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TW201040151A (en) * | 2009-03-30 | 2010-11-16 | Jsr Corp | Coloring composition, color filter, and color liquid crystal display element |
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US11603458B2 (en) | 2020-09-29 | 2023-03-14 | Echem Solutions Corp. | Black resin composition, cured film, and black filter |
Also Published As
Publication number | Publication date |
---|---|
CN104204945A (zh) | 2014-12-10 |
CN104204945B (zh) | 2017-10-03 |
KR20140148377A (ko) | 2014-12-31 |
JPWO2013146183A1 (ja) | 2015-12-10 |
JP5333696B1 (ja) | 2013-11-06 |
WO2013146183A1 (ja) | 2013-10-03 |
KR101998449B1 (ko) | 2019-07-09 |
TW201348864A (zh) | 2013-12-01 |
SG11201405096WA (en) | 2014-11-27 |
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