TWI575314B - 感光性黑色樹脂組成物及樹脂黑矩陣基板 - Google Patents

感光性黑色樹脂組成物及樹脂黑矩陣基板 Download PDF

Info

Publication number
TWI575314B
TWI575314B TW102110423A TW102110423A TWI575314B TW I575314 B TWI575314 B TW I575314B TW 102110423 A TW102110423 A TW 102110423A TW 102110423 A TW102110423 A TW 102110423A TW I575314 B TWI575314 B TW I575314B
Authority
TW
Taiwan
Prior art keywords
resin
resin composition
substrate
oxetane
photosensitive
Prior art date
Application number
TW102110423A
Other languages
English (en)
Chinese (zh)
Other versions
TW201348864A (zh
Inventor
相原涼介
井上欣彥
Original Assignee
東麗股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東麗股份有限公司 filed Critical 東麗股份有限公司
Publication of TW201348864A publication Critical patent/TW201348864A/zh
Application granted granted Critical
Publication of TWI575314B publication Critical patent/TWI575314B/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0755Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW102110423A 2012-03-26 2013-03-25 感光性黑色樹脂組成物及樹脂黑矩陣基板 TWI575314B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012068902 2012-03-26

Publications (2)

Publication Number Publication Date
TW201348864A TW201348864A (zh) 2013-12-01
TWI575314B true TWI575314B (zh) 2017-03-21

Family

ID=49259451

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102110423A TWI575314B (zh) 2012-03-26 2013-03-25 感光性黑色樹脂組成物及樹脂黑矩陣基板

Country Status (6)

Country Link
JP (1) JP5333696B1 (ko)
KR (1) KR101998449B1 (ko)
CN (1) CN104204945B (ko)
SG (1) SG11201405096WA (ko)
TW (1) TWI575314B (ko)
WO (1) WO2013146183A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11603458B2 (en) 2020-09-29 2023-03-14 Echem Solutions Corp. Black resin composition, cured film, and black filter

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI544281B (zh) * 2014-11-25 2016-08-01 奇美實業股份有限公司 黑色矩陣用之感光性樹脂組成物及其應用
TWI613486B (zh) * 2014-08-01 2018-02-01 Toppan Printing Co Ltd 黑色電極基板、黑色電極基板之製造方法、及顯示裝置
TWI564657B (zh) * 2014-08-28 2017-01-01 Chi Mei Corp Photosensitive resin composition for color filter and its application
JP6607682B2 (ja) * 2015-03-05 2019-11-20 日鉄ケミカル&マテリアル株式会社 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル
JPWO2016194619A1 (ja) * 2015-05-29 2018-03-22 住友ベークライト株式会社 着色感光性樹脂組成物、着色パターンまたはブラックマトリクス、カラーフィルタ、液晶表示装置または固体撮像素子およびカラーフィルタの製造方法
KR102431444B1 (ko) 2015-07-14 2022-08-11 삼성디스플레이 주식회사 액정 표시 장치 및 그 제조 방법
CN111149058B (zh) * 2017-09-22 2024-03-08 东丽株式会社 透明感光性树脂组合物及其应用、光刻间隔物和液晶显示装置及其制造方法
JP6842560B2 (ja) * 2017-09-26 2021-03-17 富士フイルム株式会社 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置
KR102229633B1 (ko) * 2017-12-26 2021-03-17 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
KR102284582B1 (ko) * 2018-04-04 2021-08-02 삼성에스디아이 주식회사 적색 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
KR20210115795A (ko) * 2020-03-16 2021-09-27 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1892425A (zh) * 2005-07-05 2007-01-10 太阳油墨股份有限公司 着色感光性树脂组合物及其固化物
TW201040151A (en) * 2009-03-30 2010-11-16 Jsr Corp Coloring composition, color filter, and color liquid crystal display element

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3230800B2 (ja) 1997-03-06 2001-11-19 日本化薬株式会社 黒色感放射線性樹脂組成物、黒色硬化膜及びブラックマトリックス
JP3921730B2 (ja) 1997-04-08 2007-05-30 三菱化学株式会社 カラーフィルター用光重合性組成物
JP2005258460A (ja) 1999-09-17 2005-09-22 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2001228610A (ja) 2000-02-15 2001-08-24 Showa Denko Kk 感光性樹脂組成物及び硬化皮膜の製造方法
CN100454142C (zh) * 2000-03-29 2009-01-21 学校法人神奈川大学 光固化性和热固化性树脂组合物、其感光性干薄膜及使用其的图案形成方法
JP4034588B2 (ja) * 2001-12-25 2008-01-16 旭化成ケミカルズ株式会社 感光性を有する着色性組成物およびその硬化物
JP2004347916A (ja) 2003-05-23 2004-12-09 Toyo Ink Mfg Co Ltd カラーフィルタ形成用感光性着色組成物およびカラーフィルタ
JP2006008740A (ja) * 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
JP4763390B2 (ja) * 2005-09-05 2011-08-31 東京応化工業株式会社 感光性樹脂組成物
JP4706560B2 (ja) 2006-05-29 2011-06-22 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4947300B2 (ja) * 2007-06-14 2012-06-06 Jsr株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法
JP2011048064A (ja) * 2009-08-26 2011-03-10 Asahi Kasei E-Materials Corp 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Jsr株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
KR20110130151A (ko) * 2010-05-27 2011-12-05 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치
JP2012008262A (ja) * 2010-06-23 2012-01-12 Fujifilm Corp 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、およびそれを備えた表示装置
KR20120002864A (ko) * 2010-07-01 2012-01-09 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치
WO2012002134A1 (ja) * 2010-07-02 2012-01-05 東レ株式会社 感光性樹脂組成物、感光性樹脂組成物フィルムおよびこれらを用いた半導体装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1892425A (zh) * 2005-07-05 2007-01-10 太阳油墨股份有限公司 着色感光性树脂组合物及其固化物
TW201040151A (en) * 2009-03-30 2010-11-16 Jsr Corp Coloring composition, color filter, and color liquid crystal display element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11603458B2 (en) 2020-09-29 2023-03-14 Echem Solutions Corp. Black resin composition, cured film, and black filter

Also Published As

Publication number Publication date
CN104204945A (zh) 2014-12-10
CN104204945B (zh) 2017-10-03
KR20140148377A (ko) 2014-12-31
JPWO2013146183A1 (ja) 2015-12-10
JP5333696B1 (ja) 2013-11-06
WO2013146183A1 (ja) 2013-10-03
KR101998449B1 (ko) 2019-07-09
TW201348864A (zh) 2013-12-01
SG11201405096WA (en) 2014-11-27

Similar Documents

Publication Publication Date Title
TWI575314B (zh) 感光性黑色樹脂組成物及樹脂黑矩陣基板
KR101682825B1 (ko) 감광성 수지 조성물, 이를 이용하여 형성된 패턴 및 이를 포함하는 디스플레이 패널
JP4821206B2 (ja) カラーフィルター用感光性着色組成物、およびカラーフィルター
TWI425042B (zh) 黑色樹脂組成物、樹脂黑矩陣、彩色濾光片、及液晶顯示裝置
JP5577659B2 (ja) 感光性黒色樹脂組成物、樹脂ブラックマトリクス基板、カラーフィルター基板および液晶表示装置
JP7255182B2 (ja) ネガ型感光性樹脂組成物、硬化膜、並びに有機elディスプレイ及びその製造方法
JP6575919B2 (ja) 樹脂組成物およびそれを用いて製造されたブラックバンクを含むディスプレイ装置
TWI719016B (zh) 著色感光性樹脂組合物、濾色器及具備其之圖像顯示裝置
TWI675257B (zh) 著色樹脂組成物、著色膜、裝飾基板及觸控面板
CN103558734B (zh) 感光性树脂组合物和固化膜
US9733563B2 (en) Photosensitive resin composition and photosensitive material comprising the same
KR20080107298A (ko) 블랙 레지스트용 감광성 수지 조성물 및 이것을 이용한차광막 및 컬러 필터
JP2006259716A (ja) 感光性着色組成物およびカラーフィルター
TWI597530B (zh) Resin black matrix substrate and touch panel
TW201506091A (zh) 觸控面板用黑色樹脂組成物
JP2015001654A (ja) 積層樹脂ブラックマトリクス基板の製造方法
JP2017126058A (ja) 赤色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよび前記カラーフィルタを備えた表示装置
KR20190089849A (ko) 유기 el 표시 장치
JP2009204641A (ja) カラーフィルター用感光性着色組成物、およびカラーフィルター
JP5668118B2 (ja) 感光性樹脂組成物及び硬化膜
TWI535742B (zh) Photosensitive resin composition for color filter and its application
KR102213643B1 (ko) 착색 감광성 수지 조성물
WO2022172780A1 (ja) ネガ型感光性樹脂組成物、硬化膜および有機el表示装置
JP2011169934A (ja) 黒色アルカリ現像型感光性組成物、カラーフィルタ基板、及び液晶表示装置
KR102397093B1 (ko) 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 표시장치

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees