CN104204945B - 感光性黑色树脂组合物及树脂黑色矩阵基板 - Google Patents
感光性黑色树脂组合物及树脂黑色矩阵基板 Download PDFInfo
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- CN104204945B CN104204945B CN201380014533.9A CN201380014533A CN104204945B CN 104204945 B CN104204945 B CN 104204945B CN 201380014533 A CN201380014533 A CN 201380014533A CN 104204945 B CN104204945 B CN 104204945B
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- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000003209 petroleum derivative Substances 0.000 description 1
- XHTWKNPMPDIELI-UHFFFAOYSA-N phenylmethoxysilane Chemical compound [SiH3]OCC1=CC=CC=C1 XHTWKNPMPDIELI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 208000007578 phototoxic dermatitis Diseases 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- UQMGAWUIVYDWBP-UHFFFAOYSA-N silyl acetate Chemical compound CC(=O)O[SiH3] UQMGAWUIVYDWBP-UHFFFAOYSA-N 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012068902 | 2012-03-26 | ||
| JP2012-068902 | 2012-03-26 | ||
| PCT/JP2013/056437 WO2013146183A1 (ja) | 2012-03-26 | 2013-03-08 | 感光性黒色樹脂組成物及び樹脂ブラックマトリックス基板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104204945A CN104204945A (zh) | 2014-12-10 |
| CN104204945B true CN104204945B (zh) | 2017-10-03 |
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|---|---|---|---|
| CN201380014533.9A Expired - Fee Related CN104204945B (zh) | 2012-03-26 | 2013-03-08 | 感光性黑色树脂组合物及树脂黑色矩阵基板 |
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|---|---|
| JP (1) | JP5333696B1 (ko) |
| KR (1) | KR101998449B1 (ko) |
| CN (1) | CN104204945B (ko) |
| SG (1) | SG11201405096WA (ko) |
| TW (1) | TWI575314B (ko) |
| WO (1) | WO2013146183A1 (ko) |
Families Citing this family (12)
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|---|---|---|---|---|
| TWI544281B (zh) * | 2014-11-25 | 2016-08-01 | 奇美實業股份有限公司 | 黑色矩陣用之感光性樹脂組成物及其應用 |
| TWI613486B (zh) * | 2014-08-01 | 2018-02-01 | Toppan Printing Co Ltd | 黑色電極基板、黑色電極基板之製造方法、及顯示裝置 |
| TWI564657B (zh) * | 2014-08-28 | 2017-01-01 | Chi Mei Corp | Photosensitive resin composition for color filter and its application |
| JP6607682B2 (ja) * | 2015-03-05 | 2019-11-20 | 日鉄ケミカル＆マテリアル株式会社 | 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル |
| CN107615167A (zh) * | 2015-05-29 | 2018-01-19 | 住友电木株式会社 | 着色感光性树脂组合物、着色图案或黑矩阵、滤色器、液晶显示装置或固体摄像元件和滤色器的制造方法 |
| KR102431444B1 (ko) | 2015-07-14 | 2022-08-11 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
| WO2019059169A1 (ja) * | 2017-09-22 | 2019-03-28 | 東レ株式会社 | 透明感光性樹脂組成物、フォトスペーサー、液晶表示装置、フォトスペーサーの製造方法、液晶表示装置の製造方法および透明感光性樹脂組成物のレンズスキャン露光への使用 |
| WO2019064993A1 (ja) * | 2017-09-26 | 2019-04-04 | 富士フイルム株式会社 | 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置 |
| KR102229633B1 (ko) * | 2017-12-26 | 2021-03-17 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
| KR102284582B1 (ko) * | 2018-04-04 | 2021-08-02 | 삼성에스디아이 주식회사 | 적색 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
| KR20210115795A (ko) * | 2020-03-16 | 2021-09-27 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
| TWI744014B (zh) | 2020-09-29 | 2021-10-21 | 新應材股份有限公司 | 黑色樹脂組成物、硬化膜以及黑色濾光片 |
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| CN1420998A (zh) * | 2000-03-29 | 2003-05-28 | 学校法人神奈川大学 | 光固化性·热固化性树脂组合物、其感光性干薄膜及使用其的图型形成方法 |
| CN101324755A (zh) * | 2007-06-14 | 2008-12-17 | Jsr株式会社 | 感放射线性树脂组合物、层间绝缘膜和微透镜及其形成方法 |
| CN102103328A (zh) * | 2009-12-16 | 2011-06-22 | Jsr株式会社 | 着色组合物、滤色器和彩色液晶显示元件 |
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| JP3230800B2 (ja) | 1997-03-06 | 2001-11-19 | 日本化薬株式会社 | 黒色感放射線性樹脂組成物、黒色硬化膜及びブラックマトリックス |
| JP3921730B2 (ja) | 1997-04-08 | 2007-05-30 | 三菱化学株式会社 | カラーフィルター用光重合性組成物 |
| JP2005258460A (ja) | 1999-09-17 | 2005-09-22 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| JP2001228610A (ja) | 2000-02-15 | 2001-08-24 | Showa Denko Kk | 感光性樹脂組成物及び硬化皮膜の製造方法 |
| JP4034588B2 (ja) * | 2001-12-25 | 2008-01-16 | 旭化成ケミカルズ株式会社 | 感光性を有する着色性組成物およびその硬化物 |
| JP2004347916A (ja) | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | カラーフィルタ形成用感光性着色組成物およびカラーフィルタ |
| JP2006008740A (ja) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | 紫外線硬化型樹脂組成物 |
| JP4809006B2 (ja) * | 2005-07-05 | 2011-11-02 | 太陽ホールディングス株式会社 | 着色感光性樹脂組成物及びその硬化物 |
| JP4763390B2 (ja) * | 2005-09-05 | 2011-08-31 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP4706560B2 (ja) | 2006-05-29 | 2011-06-22 | Ｊｓｒ株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子 |
| WO2010116653A1 (ja) * | 2009-03-30 | 2010-10-14 | Jsr株式会社 | 着色組成物、カラーフィルタ及びカラー液晶表示素子 |
| JP2011048064A (ja) * | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
| KR20110130151A (ko) * | 2010-05-27 | 2011-12-05 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
| JP2012008262A (ja) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | 着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、およびそれを備えた表示装置 |
| KR20120002864A (ko) * | 2010-07-01 | 2012-01-09 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
| SG186462A1 (en) * | 2010-07-02 | 2013-01-30 | Toray Industries | Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film |
-
2013
- 2013-03-08 SG SG11201405096WA patent/SG11201405096WA/en unknown
- 2013-03-08 WO PCT/JP2013/056437 patent/WO2013146183A1/ja active Application Filing
- 2013-03-08 CN CN201380014533.9A patent/CN104204945B/zh not_active Expired - Fee Related
- 2013-03-08 JP JP2013514481A patent/JP5333696B1/ja not_active Expired - Fee Related
- 2013-03-08 KR KR1020147025452A patent/KR101998449B1/ko active IP Right Grant
- 2013-03-25 TW TW102110423A patent/TWI575314B/zh not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1420998A (zh) * | 2000-03-29 | 2003-05-28 | 学校法人神奈川大学 | 光固化性·热固化性树脂组合物、其感光性干薄膜及使用其的图型形成方法 |
| CN101324755A (zh) * | 2007-06-14 | 2008-12-17 | Jsr株式会社 | 感放射线性树脂组合物、层间绝缘膜和微透镜及其形成方法 |
| CN102103328A (zh) * | 2009-12-16 | 2011-06-22 | Jsr株式会社 | 着色组合物、滤色器和彩色液晶显示元件 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104204945A (zh) | 2014-12-10 |
| JPWO2013146183A1 (ja) | 2015-12-10 |
| TW201348864A (zh) | 2013-12-01 |
| SG11201405096WA (en) | 2014-11-27 |
| TWI575314B (zh) | 2017-03-21 |
| JP5333696B1 (ja) | 2013-11-06 |
| KR101998449B1 (ko) | 2019-07-09 |
| WO2013146183A1 (ja) | 2013-10-03 |
| KR20140148377A (ko) | 2014-12-31 |
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