SG11201405096WA - Photosensitive black resin composition and resin black matrix substrate - Google Patents
Photosensitive black resin composition and resin black matrix substrateInfo
- Publication number
- SG11201405096WA SG11201405096WA SG11201405096WA SG11201405096WA SG11201405096WA SG 11201405096W A SG11201405096W A SG 11201405096WA SG 11201405096W A SG11201405096W A SG 11201405096WA SG 11201405096W A SG11201405096W A SG 11201405096WA SG 11201405096W A SG11201405096W A SG 11201405096WA
- Authority
- SG
- Singapore
- Prior art keywords
- resin
- black
- matrix substrate
- resin composition
- photosensitive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012068902 | 2012-03-26 | ||
| PCT/JP2013/056437 WO2013146183A1 (en) | 2012-03-26 | 2013-03-08 | Photosensitive black resin composition and resin black matrix substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201405096WA true SG11201405096WA (en) | 2014-11-27 |
Family
ID=49259451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201405096WA SG11201405096WA (en) | 2012-03-26 | 2013-03-08 | Photosensitive black resin composition and resin black matrix substrate |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5333696B1 (en) |
| KR (1) | KR101998449B1 (en) |
| CN (1) | CN104204945B (en) |
| SG (1) | SG11201405096WA (en) |
| TW (1) | TWI575314B (en) |
| WO (1) | WO2013146183A1 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI544281B (en) * | 2014-11-25 | 2016-08-01 | 奇美實業股份有限公司 | Photosensitive resin composition for black matrix and application thereof |
| TWI613486B (en) * | 2014-08-01 | 2018-02-01 | Toppan Printing Co Ltd | Black electrode substrate, method of manufacturing black electrode substrate, and display device |
| TWI564657B (en) * | 2014-08-28 | 2017-01-01 | Chi Mei Corp | Photosensitive resin composition for color filter and its application |
| JP6607682B2 (en) * | 2015-03-05 | 2019-11-20 | 日鉄ケミカル＆マテリアル株式会社 | Black resin composition for light-shielding film, substrate with light-shielding film having light-shielding film obtained by curing said composition, and color filter and touch panel having said substrate with light-shielding film |
| CN107615167A (en) * | 2015-05-29 | 2018-01-19 | 住友电木株式会社 | The manufacture method of photosensitive composition, colored pattern or black matrix, colour filter, liquid crystal display device or solid-state imager and colour filter |
| KR102431444B1 (en) | 2015-07-14 | 2022-08-11 | 삼성디스플레이 주식회사 | Liquid crystal display device and method of manufacturing the same |
| WO2019059169A1 (en) * | 2017-09-22 | 2019-03-28 | 東レ株式会社 | Transparent photosensitive resin composition, photospacer, liquid crystal display device, method for producing photospacer, method for producing liquid crystal display device, and use of transparent photosensitive resin composition for lens scan exposure |
| KR102442301B1 (en) * | 2017-09-26 | 2022-09-13 | 후지필름 가부시키가이샤 | Structure, composition for forming barrier ribs, solid-state imaging device, and image display device |
| KR102229633B1 (en) * | 2017-12-26 | 2021-03-17 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using the same and color filter |
| KR102284582B1 (en) * | 2018-04-04 | 2021-08-02 | 삼성에스디아이 주식회사 | Red photosensitive resin composition, photosensitive resin layer using the same and color filter |
| KR20210115795A (en) * | 2020-03-16 | 2021-09-27 | 동우 화인켐 주식회사 | Black Photosensitive Resin Composition, Black Matrix and Display Device |
| TWI744014B (en) | 2020-09-29 | 2021-10-21 | 新應材股份有限公司 | Black resin composition, cured film, and black filter |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3230800B2 (en) | 1997-03-06 | 2001-11-19 | 日本化薬株式会社 | Black radiation-sensitive resin composition, black cured film and black matrix |
| JP3921730B2 (en) | 1997-04-08 | 2007-05-30 | 三菱化学株式会社 | Photopolymerizable composition for color filter |
| JP2005258460A (en) | 1999-09-17 | 2005-09-22 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed circuit board |
| JP2001228610A (en) | 2000-02-15 | 2001-08-24 | Showa Denko Kk | Photosensitive resin composition and method for producing cured film |
| CN100454142C (en) * | 2000-03-29 | 2009-01-21 | 学校法人神奈川大学 | Photocurable/thermosetting resin composition, photosensitive dry film formed therefrom, and method of forming pattern with same |
| JP4034588B2 (en) * | 2001-12-25 | 2008-01-16 | 旭化成ケミカルズ株式会社 | Photosensitive coloring composition and cured product thereof |
| JP2004347916A (en) | 2003-05-23 | 2004-12-09 | Toyo Ink Mfg Co Ltd | Photosensitive color composition for forming color filter, and color filter |
| JP2006008740A (en) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | Ultraviolet curable resin composition |
| JP4809006B2 (en) * | 2005-07-05 | 2011-11-02 | 太陽ホールディングス株式会社 | Colored photosensitive resin composition and cured product thereof |
| JP4763390B2 (en) * | 2005-09-05 | 2011-08-31 | 東京応化工業株式会社 | Photosensitive resin composition |
| JP4706560B2 (en) | 2006-05-29 | 2011-06-22 | Ｊｓｒ株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
| JP4947300B2 (en) * | 2007-06-14 | 2012-06-06 | Ｊｓｒ株式会社 | Radiation-sensitive resin composition, interlayer insulating film, microlens and method for forming them |
| KR101602005B1 (en) * | 2009-03-30 | 2016-03-17 | 제이에스알 가부시끼가이샤 | Coloring composition, color filter, and color liquid crystal display element |
| JP2011048064A (en) * | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | Photosensitive resin composition and laminate, and electromagnetic wave shield and transparent conductive substrate using the same |
| JP5515714B2 (en) * | 2009-12-16 | 2014-06-11 | Ｊｓｒ株式会社 | Coloring composition, color filter and color liquid crystal display element |
| KR20110130151A (en) * | 2010-05-27 | 2011-12-05 | 동우 화인켐 주식회사 | A black photosensitive resin composition, color filter and liquid crystal display device having the same |
| JP2012008262A (en) * | 2010-06-23 | 2012-01-12 | Fujifilm Corp | Colored photosensitive resin composition, pattern forming method, manufacturing method of color filter, color filter, and display device comprising the same |
| KR20120002864A (en) * | 2010-07-01 | 2012-01-09 | 동우 화인켐 주식회사 | A black photosensitive resin composition, color filter and liquid crystal display device having the same |
| WO2012002134A1 (en) * | 2010-07-02 | 2012-01-05 | 東レ株式会社 | Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film |
-
2013
- 2013-03-08 WO PCT/JP2013/056437 patent/WO2013146183A1/en active Application Filing
- 2013-03-08 KR KR1020147025452A patent/KR101998449B1/en active IP Right Grant
- 2013-03-08 CN CN201380014533.9A patent/CN104204945B/en not_active Expired - Fee Related
- 2013-03-08 JP JP2013514481A patent/JP5333696B1/en active Active
- 2013-03-08 SG SG11201405096WA patent/SG11201405096WA/en unknown
- 2013-03-25 TW TW102110423A patent/TWI575314B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140148377A (en) | 2014-12-31 |
| JPWO2013146183A1 (en) | 2015-12-10 |
| WO2013146183A1 (en) | 2013-10-03 |
| CN104204945A (en) | 2014-12-10 |
| KR101998449B1 (en) | 2019-07-09 |
| TW201348864A (en) | 2013-12-01 |
| TWI575314B (en) | 2017-03-21 |
| JP5333696B1 (en) | 2013-11-06 |
| CN104204945B (en) | 2017-10-03 |
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