TWI675257B - 著色樹脂組成物、著色膜、裝飾基板及觸控面板 - Google Patents
著色樹脂組成物、著色膜、裝飾基板及觸控面板 Download PDFInfo
- Publication number
- TWI675257B TWI675257B TW105109675A TW105109675A TWI675257B TW I675257 B TWI675257 B TW I675257B TW 105109675 A TW105109675 A TW 105109675A TW 105109675 A TW105109675 A TW 105109675A TW I675257 B TWI675257 B TW I675257B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- group
- colored
- polymer dispersant
- film
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 73
- 239000000758 substrate Substances 0.000 title claims abstract description 21
- 238000004040 coloring Methods 0.000 claims abstract description 55
- 239000002270 dispersing agent Substances 0.000 claims abstract description 41
- 229920000642 polymer Polymers 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 37
- 229920001721 polyimide Polymers 0.000 claims abstract description 28
- 239000009719 polyimide resin Substances 0.000 claims abstract description 21
- 239000003960 organic solvent Substances 0.000 claims abstract description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000003396 thiol group Chemical group [H]S* 0.000 claims abstract description 7
- 125000000542 sulfonic acid group Chemical group 0.000 claims abstract description 5
- -1 amine salt Chemical class 0.000 claims description 50
- 239000011347 resin Substances 0.000 claims description 47
- 229920005989 resin Polymers 0.000 claims description 47
- 239000002253 acid Substances 0.000 claims description 27
- 150000001412 amines Chemical class 0.000 claims description 26
- 229920002098 polyfluorene Polymers 0.000 claims description 17
- 125000000524 functional group Chemical group 0.000 claims description 14
- 125000000962 organic group Chemical group 0.000 claims description 10
- 239000012860 organic pigment Substances 0.000 claims description 10
- 238000005401 electroluminescence Methods 0.000 claims description 8
- 239000001023 inorganic pigment Substances 0.000 claims description 7
- 239000002904 solvent Substances 0.000 claims description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920000193 polymethacrylate Polymers 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 229920000768 polyamine Polymers 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 9
- 230000000087 stabilizing effect Effects 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 53
- 239000006185 dispersion Substances 0.000 description 35
- 239000000049 pigment Substances 0.000 description 34
- 150000001875 compounds Chemical class 0.000 description 32
- 239000006229 carbon black Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 19
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 19
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 18
- 239000000126 substance Substances 0.000 description 18
- 150000002466 imines Chemical class 0.000 description 16
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 16
- 239000007787 solid Substances 0.000 description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 239000011324 bead Substances 0.000 description 15
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 15
- 239000003999 initiator Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- 150000008065 acid anhydrides Chemical class 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000002243 precursor Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 235000013824 polyphenols Nutrition 0.000 description 7
- 239000000565 sealant Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- 150000003512 tertiary amines Chemical group 0.000 description 7
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000013256 coordination polymer Substances 0.000 description 6
- 150000004985 diamines Chemical class 0.000 description 6
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 6
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 125000005605 benzo group Chemical group 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 125000002619 bicyclic group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000006059 cover glass Substances 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000007857 hydrazones Chemical class 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 3
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- BMIAZROFYUGBEL-UHFFFAOYSA-N (1-phenylcyclopentyl)benzene Chemical compound C1CCCC1(C=1C=CC=CC=1)C1=CC=CC=C1 BMIAZROFYUGBEL-UHFFFAOYSA-N 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- 229940018563 3-aminophenol Drugs 0.000 description 2
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Natural products CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- AUNAPVYQLLNFOI-UHFFFAOYSA-L [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O Chemical compound [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O AUNAPVYQLLNFOI-UHFFFAOYSA-L 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 238000006358 imidation reaction Methods 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 150000007529 inorganic bases Chemical class 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- FYCDKSZYLQMRAV-UHFFFAOYSA-N octane-1,1,1,2-tetracarboxylic acid Chemical compound CCCCCCC(C(O)=O)C(C(O)=O)(C(O)=O)C(O)=O FYCDKSZYLQMRAV-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- KFWWAKPBJLACGL-UHFFFAOYSA-N (1-hydroxycyclohexyl) acetate Chemical compound CC(=O)OC1(O)CCCCC1 KFWWAKPBJLACGL-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- OWSKJORLRSWYGK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) propanoate Chemical compound CCC(=O)OCCC(C)(C)OC OWSKJORLRSWYGK-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 1
- QTPLEVOKSWEYAC-UHFFFAOYSA-N 1,2-diphenyl-9h-fluorene Chemical compound C=1C=CC=CC=1C1=C2CC3=CC=CC=C3C2=CC=C1C1=CC=CC=C1 QTPLEVOKSWEYAC-UHFFFAOYSA-N 0.000 description 1
- ZOMLUNRKXJYKPD-UHFFFAOYSA-N 1,3,3-trimethyl-2-[2-(2-methylindol-3-ylidene)ethylidene]indole;hydrochloride Chemical compound [Cl-].C1=CC=C2C(C)(C)C(/C=C/C=3C4=CC=CC=C4NC=3C)=[N+](C)C2=C1 ZOMLUNRKXJYKPD-UHFFFAOYSA-N 0.000 description 1
- QCGOYKXFFGQDFY-UHFFFAOYSA-M 1,3,3-trimethyl-2-[3-(1,3,3-trimethylindol-1-ium-2-yl)prop-2-enylidene]indole;chloride Chemical compound [Cl-].CC1(C)C2=CC=CC=C2N(C)\C1=C\C=C\C1=[N+](C)C2=CC=CC=C2C1(C)C QCGOYKXFFGQDFY-UHFFFAOYSA-M 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
- WRIPQWSXTCYDFU-UHFFFAOYSA-N 1-[4-[9-[4-(2-hydroxy-3-prop-1-enoxypropoxy)-3-methylphenyl]fluoren-9-yl]-2-methylphenoxy]-3-prop-1-enoxypropan-2-ol Chemical compound CC=1C=C(C=CC1OCC(COC=CC)O)C1(C2=CC=CC=C2C=2C=CC=CC12)C1=CC(=C(C=C1)OCC(COC=CC)O)C WRIPQWSXTCYDFU-UHFFFAOYSA-N 0.000 description 1
- KHUFHLFHOQVFGB-UHFFFAOYSA-N 1-aminoanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2N KHUFHLFHOQVFGB-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- NKNIZOPLGAJLRV-UHFFFAOYSA-N 2,2-diphenylpropane-1,1-diamine Chemical compound C=1C=CC=CC=1C(C(N)N)(C)C1=CC=CC=C1 NKNIZOPLGAJLRV-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- KPYPNTLKDIYIKB-UHFFFAOYSA-N 2,3-dichloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(Cl)C(Cl)=C2 KPYPNTLKDIYIKB-UHFFFAOYSA-N 0.000 description 1
- ILTGLWXJMQLBBI-UHFFFAOYSA-N 2,6-bis(ethoxymethyl)-4-methylphenol Chemical compound CCOCC1=CC(C)=CC(COCC)=C1O ILTGLWXJMQLBBI-UHFFFAOYSA-N 0.000 description 1
- KUMMBDBTERQYCG-UHFFFAOYSA-N 2,6-bis(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CO)=C1 KUMMBDBTERQYCG-UHFFFAOYSA-N 0.000 description 1
- VRMKFAFIVOVETG-UHFFFAOYSA-N 2,6-bis(methoxymethyl)-4-methylphenol Chemical compound COCC1=CC(C)=CC(COC)=C1O VRMKFAFIVOVETG-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- BXVXPASMKWYBFD-UHFFFAOYSA-N 2-[[2-hydroxy-3-(hydroxymethyl)-5-methylphenyl]methyl]-6-(hydroxymethyl)-4-methylphenol Chemical compound CC1=CC(CO)=C(O)C(CC=2C(=C(CO)C=C(C)C=2)O)=C1 BXVXPASMKWYBFD-UHFFFAOYSA-N 0.000 description 1
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 1
- UZSDRHVOBLQYCX-UHFFFAOYSA-N 2-amino-6-hydroxybenzoic acid Chemical compound NC1=CC=CC(O)=C1C(O)=O UZSDRHVOBLQYCX-UHFFFAOYSA-N 0.000 description 1
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- VRVRGVPWCUEOGV-UHFFFAOYSA-N 2-aminothiophenol Chemical compound NC1=CC=CC=C1S VRVRGVPWCUEOGV-UHFFFAOYSA-N 0.000 description 1
- MEOUGBCVAWNDPJ-UHFFFAOYSA-N 2-benzofuran-1,3-dione;2-methyloxirane Chemical compound CC1CO1.C1=CC=C2C(=O)OC(=O)C2=C1 MEOUGBCVAWNDPJ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- FAVWXKQADKRESO-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-1-ene Chemical compound CC=C.CC(=C)C(O)=O FAVWXKQADKRESO-UHFFFAOYSA-N 0.000 description 1
- HHCHLHOEAKKCAB-UHFFFAOYSA-N 2-oxaspiro[3.5]nonane-1,3-dione Chemical compound O=C1OC(=O)C11CCCCC1 HHCHLHOEAKKCAB-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- MDHSNKZWXYLUFH-UHFFFAOYSA-N 3,5-dihydroxy-2,6-dimethylheptan-4-one Chemical compound CC(C)C(O)C(=O)C(O)C(C)C MDHSNKZWXYLUFH-UHFFFAOYSA-N 0.000 description 1
- XBTHNZXADRSYPR-UHFFFAOYSA-N 3-(1,1,1,3,3,3-hexafluoro-2-phenylpropan-2-yl)benzene-1,2-diamine Chemical compound NC1=CC=CC(C(C=2C=CC=CC=2)(C(F)(F)F)C(F)(F)F)=C1N XBTHNZXADRSYPR-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- AJHPGXZOIAYYDW-UHFFFAOYSA-N 3-(2-cyanophenyl)-2-[(2-methylpropan-2-yl)oxycarbonylamino]propanoic acid Chemical compound CC(C)(C)OC(=O)NC(C(O)=O)CC1=CC=CC=C1C#N AJHPGXZOIAYYDW-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- BLLZRZSUCFRYLX-UHFFFAOYSA-N 3-[[[3-aminopropyl(dimethyl)silyl]amino]-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)N[Si](C)(C)CCCN BLLZRZSUCFRYLX-UHFFFAOYSA-N 0.000 description 1
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 1
- GIMFLOOKFCUUOQ-UHFFFAOYSA-N 3-amino-4-hydroxy-1,2-dihydropyrimidin-6-one Chemical compound NN1CN=C(O)C=C1O GIMFLOOKFCUUOQ-UHFFFAOYSA-N 0.000 description 1
- ZAJAQTYSTDTMCU-UHFFFAOYSA-N 3-aminobenzenesulfonic acid Chemical compound NC1=CC=CC(S(O)(=O)=O)=C1 ZAJAQTYSTDTMCU-UHFFFAOYSA-N 0.000 description 1
- KFFUEVDMVNIOHA-UHFFFAOYSA-N 3-aminobenzenethiol Chemical compound NC1=CC=CC(S)=C1 KFFUEVDMVNIOHA-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- OVCAFYQPRDRRCX-UHFFFAOYSA-N 3-ethoxypropanoic acid ethyl acetate Chemical compound C(C)(=O)OCC.C(C)OCCC(=O)O OVCAFYQPRDRRCX-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- RSFDFESMVAIVKO-UHFFFAOYSA-N 3-sulfanylbenzoic acid Chemical compound OC(=O)C1=CC=CC(S)=C1 RSFDFESMVAIVKO-UHFFFAOYSA-N 0.000 description 1
- QMWGSOMVXSRXQX-UHFFFAOYSA-N 3-sulfobenzoic acid Chemical compound OC(=O)C1=CC=CC(S(O)(=O)=O)=C1 QMWGSOMVXSRXQX-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- IHZXTIBMKNSJCJ-UHFFFAOYSA-N 3-{[(4-{[4-(dimethylamino)phenyl](4-{ethyl[(3-sulfophenyl)methyl]amino}phenyl)methylidene}cyclohexa-2,5-dien-1-ylidene)(ethyl)azaniumyl]methyl}benzene-1-sulfonate Chemical compound C=1C=C(C(=C2C=CC(C=C2)=[N+](C)C)C=2C=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S(O)(=O)=O)=C1 IHZXTIBMKNSJCJ-UHFFFAOYSA-N 0.000 description 1
- ACZGCWSMSTYWDQ-UHFFFAOYSA-N 3h-1-benzofuran-2-one Chemical compound C1=CC=C2OC(=O)CC2=C1 ACZGCWSMSTYWDQ-UHFFFAOYSA-N 0.000 description 1
- AIVVXPSKEVWKMY-UHFFFAOYSA-N 4-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AIVVXPSKEVWKMY-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- LFNFPWYUXXLMGE-UHFFFAOYSA-N 4-[4-[1-[4-(4-aminophenoxy)phenyl]-9H-fluoren-2-yl]phenoxy]aniline Chemical compound NC1=CC=C(OC2=CC=C(C=C2)C2=C(C=3CC4=CC=CC=C4C=3C=C2)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 LFNFPWYUXXLMGE-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- KIFDSGGWDIVQGN-UHFFFAOYSA-N 4-[9-(4-aminophenyl)fluoren-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 KIFDSGGWDIVQGN-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-PZFLKRBQSA-N 4-amino-3,5-ditritiobenzoic acid Chemical compound [3H]c1cc(cc([3H])c1N)C(O)=O ALYNCZNDIQEVRV-PZFLKRBQSA-N 0.000 description 1
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 1
- WCDSVWRUXWCYFN-UHFFFAOYSA-N 4-aminobenzenethiol Chemical compound NC1=CC=C(S)C=C1 WCDSVWRUXWCYFN-UHFFFAOYSA-N 0.000 description 1
- ABJQKDJOYSQVFX-UHFFFAOYSA-N 4-aminonaphthalen-1-ol Chemical compound C1=CC=C2C(N)=CC=C(O)C2=C1 ABJQKDJOYSQVFX-UHFFFAOYSA-N 0.000 description 1
- WUBBRNOQWQTFEX-UHFFFAOYSA-N 4-aminosalicylic acid Chemical compound NC1=CC=C(C(O)=O)C(O)=C1 WUBBRNOQWQTFEX-UHFFFAOYSA-N 0.000 description 1
- CCTOEAMRIIXGDJ-UHFFFAOYSA-N 4-hydroxy-2-benzofuran-1,3-dione Chemical compound OC1=CC=CC2=C1C(=O)OC2=O CCTOEAMRIIXGDJ-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- FLVQOAUAIBIIGO-UHFFFAOYSA-N 4-hydroxybutyl acetate Chemical class CC(=O)OCCCCO FLVQOAUAIBIIGO-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- WVYWICLMDOOCFB-UHFFFAOYSA-N 4-methyl-2-pentanol Chemical compound CC(C)CC(C)O WVYWICLMDOOCFB-UHFFFAOYSA-N 0.000 description 1
- LMJXSOYPAOSIPZ-UHFFFAOYSA-N 4-sulfanylbenzoic acid Chemical compound OC(=O)C1=CC=C(S)C=C1 LMJXSOYPAOSIPZ-UHFFFAOYSA-N 0.000 description 1
- HWAQOZGATRIYQG-UHFFFAOYSA-N 4-sulfobenzoic acid Chemical compound OC(=O)C1=CC=C(S(O)(=O)=O)C=C1 HWAQOZGATRIYQG-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- ZBIBQNVRTVLOHQ-UHFFFAOYSA-N 5-aminonaphthalen-1-ol Chemical compound C1=CC=C2C(N)=CC=CC2=C1O ZBIBQNVRTVLOHQ-UHFFFAOYSA-N 0.000 description 1
- FSBRKZMSECKELY-UHFFFAOYSA-N 5-aminonaphthalen-2-ol Chemical compound OC1=CC=C2C(N)=CC=CC2=C1 FSBRKZMSECKELY-UHFFFAOYSA-N 0.000 description 1
- FPKNJPIDCMAIDW-UHFFFAOYSA-N 5-aminonaphthalene-1-carboxylic acid Chemical compound C1=CC=C2C(N)=CC=CC2=C1C(O)=O FPKNJPIDCMAIDW-UHFFFAOYSA-N 0.000 description 1
- XVOBQVZYYPJXCK-UHFFFAOYSA-N 5-aminonaphthalene-2-carboxylic acid Chemical compound OC(=O)C1=CC=C2C(N)=CC=CC2=C1 XVOBQVZYYPJXCK-UHFFFAOYSA-N 0.000 description 1
- YDEUKNRKEYICTH-UHFFFAOYSA-N 5-aminoquinolin-8-ol Chemical compound C1=CC=C2C(N)=CC=C(O)C2=N1 YDEUKNRKEYICTH-UHFFFAOYSA-N 0.000 description 1
- NYYMNZLORMNCKK-UHFFFAOYSA-N 5-hydroxynaphthalene-1-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1O NYYMNZLORMNCKK-UHFFFAOYSA-N 0.000 description 1
- SMAMQSIENGBTRV-UHFFFAOYSA-N 5-hydroxynaphthalene-2-carboxylic acid Chemical compound OC1=CC=CC2=CC(C(=O)O)=CC=C21 SMAMQSIENGBTRV-UHFFFAOYSA-N 0.000 description 1
- VTUGNNIWJSWUSP-UHFFFAOYSA-N 5-sulfanylnaphthalene-1-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1S VTUGNNIWJSWUSP-UHFFFAOYSA-N 0.000 description 1
- NQSLRCGJQDKCHO-UHFFFAOYSA-N 5-sulfanylnaphthalene-2-carboxylic acid Chemical compound SC1=CC=CC2=CC(C(=O)O)=CC=C21 NQSLRCGJQDKCHO-UHFFFAOYSA-N 0.000 description 1
- ZMFWEWMHABZQNB-UHFFFAOYSA-N 6-acetyloxyhexyl acetate Chemical compound CC(=O)OCCCCCCOC(C)=O ZMFWEWMHABZQNB-UHFFFAOYSA-N 0.000 description 1
- QYFYIOWLBSPSDM-UHFFFAOYSA-N 6-aminonaphthalen-1-ol Chemical compound OC1=CC=CC2=CC(N)=CC=C21 QYFYIOWLBSPSDM-UHFFFAOYSA-N 0.000 description 1
- SERBLGFKBWPCJD-UHFFFAOYSA-N 6-aminonaphthalen-2-ol Chemical compound C1=C(O)C=CC2=CC(N)=CC=C21 SERBLGFKBWPCJD-UHFFFAOYSA-N 0.000 description 1
- CKSZZOAKPXZMAT-UHFFFAOYSA-N 6-aminonaphthalene-1-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=CC(N)=CC=C21 CKSZZOAKPXZMAT-UHFFFAOYSA-N 0.000 description 1
- NZTPZUIIYNYZKT-UHFFFAOYSA-N 6-aminonaphthalene-2-carboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(N)=CC=C21 NZTPZUIIYNYZKT-UHFFFAOYSA-N 0.000 description 1
- ZYSOYLBBCYWEMB-UHFFFAOYSA-N 7-aminonaphthalen-1-ol Chemical compound C1=CC=C(O)C2=CC(N)=CC=C21 ZYSOYLBBCYWEMB-UHFFFAOYSA-N 0.000 description 1
- WSUYONLKFXZZRV-UHFFFAOYSA-N 7-aminonaphthalen-2-ol Chemical compound C1=CC(O)=CC2=CC(N)=CC=C21 WSUYONLKFXZZRV-UHFFFAOYSA-N 0.000 description 1
- BFBAHPDPLUEECU-UHFFFAOYSA-N 7-aminonaphthalene-1-carboxylic acid Chemical compound C1=CC=C(C(O)=O)C2=CC(N)=CC=C21 BFBAHPDPLUEECU-UHFFFAOYSA-N 0.000 description 1
- NBPYPKQPLKDTKB-UHFFFAOYSA-N 7-aminonaphthalene-2-carboxylic acid Chemical compound C1=CC(C(O)=O)=CC2=CC(N)=CC=C21 NBPYPKQPLKDTKB-UHFFFAOYSA-N 0.000 description 1
- ZPCQQOXOXNMOIJ-UHFFFAOYSA-N 8-hydroxynaphthalene-2-carboxylic acid Chemical compound C1=CC=C(O)C2=CC(C(=O)O)=CC=C21 ZPCQQOXOXNMOIJ-UHFFFAOYSA-N 0.000 description 1
- PRRFQAVIPFFRRL-UHFFFAOYSA-N 8-sulfanylnaphthalene-2-carboxylic acid Chemical compound C1=CC=C(S)C2=CC(C(=O)O)=CC=C21 PRRFQAVIPFFRRL-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- KSXJRXNHRYSLLC-UHFFFAOYSA-N 9H-fluorene prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.C1=CC=C2CC3=CC=CC=C3C2=C1 KSXJRXNHRYSLLC-UHFFFAOYSA-N 0.000 description 1
- DXKZEUUVPWJJCX-UHFFFAOYSA-N 9h-fluorene;hydrochloride Chemical compound Cl.C1=CC=C2CC3=CC=CC=C3C2=C1 DXKZEUUVPWJJCX-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- CIURCIMZEPBPPG-UHFFFAOYSA-N CC(CCC)OC(C)COC(C)CO Chemical compound CC(CCC)OC(C)COC(C)CO CIURCIMZEPBPPG-UHFFFAOYSA-N 0.000 description 1
- VXXJPRMLSOWMOQ-UHFFFAOYSA-N CCCCCCCCCCCCC1=CN(CCO)C(CC(O)=O)=N1 Chemical compound CCCCCCCCCCCCC1=CN(CCO)C(CC(O)=O)=N1 VXXJPRMLSOWMOQ-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- HMEKVHWROSNWPD-UHFFFAOYSA-N Erioglaucine A Chemical compound [NH4+].[NH4+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C(=CC=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 HMEKVHWROSNWPD-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical class C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- ICHSXLKXJJJZBD-UHFFFAOYSA-N NC=1C=C(OC2=CC=C(C=C2)C2=C(C=3CC4=CC=CC=C4C3C=C2)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 Chemical compound NC=1C=C(OC2=CC=C(C=C2)C2=C(C=3CC4=CC=CC=C4C3C=C2)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 ICHSXLKXJJJZBD-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- SZKKRCSOSQAJDE-UHFFFAOYSA-N Schradan Chemical group CN(C)P(=O)(N(C)C)OP(=O)(N(C)C)N(C)C SZKKRCSOSQAJDE-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GAMYVSCDDLXAQW-AOIWZFSPSA-N Thermopsosid Natural products O(C)c1c(O)ccc(C=2Oc3c(c(O)cc(O[C@H]4[C@H](O)[C@@H](O)[C@H](O)[C@H](CO)O4)c3)C(=O)C=2)c1 GAMYVSCDDLXAQW-AOIWZFSPSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- KEUCYUPOICDBOG-UHFFFAOYSA-N [2-(aminomethyl)-5-bicyclo[2.2.1]heptanyl]methanamine Chemical compound C1C2C(CN)CC1C(CN)C2 KEUCYUPOICDBOG-UHFFFAOYSA-N 0.000 description 1
- OTKFKCIRTBTDKK-UHFFFAOYSA-N [3-(aminomethyl)-5-bicyclo[2.2.1]heptanyl]methanamine Chemical compound C1C(CN)C2C(CN)CC1C2 OTKFKCIRTBTDKK-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 1
- IVEXDOIWMBPBKW-UHFFFAOYSA-N [Si].[Zn].[Co] Chemical compound [Si].[Zn].[Co] IVEXDOIWMBPBKW-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001334 alicyclic compounds Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 229960004909 aminosalicylic acid Drugs 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 1
- 229940063953 ammonium lauryl sulfate Drugs 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- UHHXUPJJDHEMGX-UHFFFAOYSA-K azanium;manganese(3+);phosphonato phosphate Chemical compound [NH4+].[Mn+3].[O-]P([O-])(=O)OP([O-])([O-])=O UHHXUPJJDHEMGX-UHFFFAOYSA-K 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- FYBYQXQHBHTWLP-UHFFFAOYSA-N bis(silyloxysilyloxy)silane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH2]O[SiH3] FYBYQXQHBHTWLP-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 239000004161 brilliant blue FCF Substances 0.000 description 1
- 235000012745 brilliant blue FCF Nutrition 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 229910000152 cobalt phosphate Inorganic materials 0.000 description 1
- AIOWANYIHSOXQY-UHFFFAOYSA-N cobalt silicon Chemical compound [Si].[Co] AIOWANYIHSOXQY-UHFFFAOYSA-N 0.000 description 1
- NNSIWZRTNZEWMS-UHFFFAOYSA-N cobalt titanium Chemical compound [Ti].[Co] NNSIWZRTNZEWMS-UHFFFAOYSA-N 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical class CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- YPWYKIZLWMBFKH-UHFFFAOYSA-N diamino(diphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](N)(N)C1=CC=CC=C1 YPWYKIZLWMBFKH-UHFFFAOYSA-N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ORTUEUNRBVDDFY-UHFFFAOYSA-N diethoxy-methyl-(3-propoxypropyl)silane Chemical compound CCCOCCC[Si](C)(OCC)OCC ORTUEUNRBVDDFY-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-O diphenylsulfanium Chemical compound C=1C=CC=CC=1[SH+]C1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-O 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- LGWXIBBJZQOXSO-UHFFFAOYSA-L disodium 5-acetamido-4-hydroxy-3-[(2-methylphenyl)diazenyl]naphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].OC1=C2C(NC(=O)C)=CC(S([O-])(=O)=O)=CC2=CC(S([O-])(=O)=O)=C1N=NC1=CC=CC=C1C LGWXIBBJZQOXSO-UHFFFAOYSA-L 0.000 description 1
- NJPXFJXCALXJCX-UHFFFAOYSA-L disodium 7-anilino-3-[[4-[(2,4-dimethyl-6-sulfonatophenyl)diazenyl]-2,5-dimethylphenyl]diazenyl]-4-hydroxynaphthalene-2-sulfonate Chemical compound [Na+].[Na+].Cc1cc(C)c(N=Nc2cc(C)c(cc2C)N=Nc2c(O)c3ccc(Nc4ccccc4)cc3cc2S([O-])(=O)=O)c(c1)S([O-])(=O)=O NJPXFJXCALXJCX-UHFFFAOYSA-L 0.000 description 1
- FTZLWXQKVFFWLY-UHFFFAOYSA-L disodium;2,5-dichloro-4-[3-methyl-5-oxo-4-[(4-sulfonatophenyl)diazenyl]-4h-pyrazol-1-yl]benzenesulfonate Chemical compound [Na+].[Na+].CC1=NN(C=2C(=CC(=C(Cl)C=2)S([O-])(=O)=O)Cl)C(=O)C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 FTZLWXQKVFFWLY-UHFFFAOYSA-L 0.000 description 1
- NJDNXYGOVLYJHP-UHFFFAOYSA-L disodium;2-(3-oxido-6-oxoxanthen-9-yl)benzoate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=CC(=O)C=C2OC2=CC([O-])=CC=C21 NJDNXYGOVLYJHP-UHFFFAOYSA-L 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- 229960002017 echothiophate Drugs 0.000 description 1
- BJOLKYGKSZKIGU-UHFFFAOYSA-N ecothiopate Chemical compound CCOP(=O)(OCC)SCC[N+](C)(C)C BJOLKYGKSZKIGU-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229930003944 flavone Natural products 0.000 description 1
- 150000002212 flavone derivatives Chemical class 0.000 description 1
- 235000011949 flavones Nutrition 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- WPEOOEIAIFABQP-UHFFFAOYSA-N hexanedioic acid;hexane-1,6-diol Chemical compound OCCCCCCO.OC(=O)CCCCC(O)=O WPEOOEIAIFABQP-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 235000019239 indanthrene blue RS Nutrition 0.000 description 1
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical compound C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 1
- COHYTHOBJLSHDF-BUHFOSPRSA-N indigo dye Chemical compound N\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-BUHFOSPRSA-N 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- WTFXARWRTYJXII-UHFFFAOYSA-N iron(2+);iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[Fe+2].[Fe+3].[Fe+3] WTFXARWRTYJXII-UHFFFAOYSA-N 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- KBOPZPXVLCULAV-UHFFFAOYSA-N mesalamine Chemical compound NC1=CC=C(O)C(C(O)=O)=C1 KBOPZPXVLCULAV-UHFFFAOYSA-N 0.000 description 1
- 229960004963 mesalazine Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- VAWFFNJAPKXVPH-UHFFFAOYSA-N naphthalene-1,6-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC2=CC(C(=O)O)=CC=C21 VAWFFNJAPKXVPH-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- OBJNZHVOCNPSCS-UHFFFAOYSA-N naphtho[2,3-f]quinazoline Chemical compound C1=NC=C2C3=CC4=CC=CC=C4C=C3C=CC2=N1 OBJNZHVOCNPSCS-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 235000012736 patent blue V Nutrition 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920000962 poly(amidoamine) Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229940088417 precipitated calcium carbonate Drugs 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- UWGCNDBLFSEBDW-UHFFFAOYSA-M sodium;4-[[4-(diethylamino)phenyl]-(4-diethylazaniumylidenecyclohexa-2,5-dien-1-ylidene)methyl]naphthalene-2,7-disulfonate Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C2=CC=C(C=C2C=C(C=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 UWGCNDBLFSEBDW-UHFFFAOYSA-M 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- IWZLBIVZPIDURM-UHFFFAOYSA-N trimethoxy(3-prop-1-enoxypropyl)silane Chemical compound CO[Si](OC)(OC)CCCOC=CC IWZLBIVZPIDURM-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- WDWBPYFNRWQKNZ-UHFFFAOYSA-K trisodium 5-[(4-anilino-6-chloro-1,3,5-triazin-2-yl)amino]-4-hydroxy-3-[(2-sulfonatophenyl)diazenyl]naphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(S([O-])(=O)=O)=CC(NC=3N=C(NC=4C=CC=CC=4)N=C(Cl)N=3)=C2C(O)=C1N=NC1=CC=CC=C1S([O-])(=O)=O WDWBPYFNRWQKNZ-UHFFFAOYSA-K 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- VHBFFQKBGNRLFZ-UHFFFAOYSA-N vitamin p Natural products O1C2=CC=CC=C2C(=O)C=C1C1=CC=CC=C1 VHBFFQKBGNRLFZ-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
- C08G73/1053—Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the tetracarboxylic moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1082—Partially aromatic polyimides wholly aromatic in the tetracarboxylic moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/124—Insulating layers formed between TFT elements and OLED elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Human Computer Interaction (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
本發明提供一種著色樹脂組成物,其藉由含有具有特定構造之聚醯亞胺樹脂而達成顯著之耐熱性,且同時藉由使著色材高度地分散穩定化而可形成可靠性優異之著色膜。本發明係一種著色樹脂組成物,其含有(A)具有包含酚性羥基、磺酸基或硫醇基之結構單元之鹼可溶性聚醯亞胺樹脂、(B)著色材、(C)高分子分散劑、及(D)有機溶劑。由本發明之組成物獲得之經圖案化之著色層可用於裝飾基板、觸控面板、有機EL顯示裝置等。
Description
本發明係關於一種著色樹脂組成物、著色膜、裝飾基板及觸控面板。
近年來,智慧型手機或平板個人電腦(PC,Personal Computer)等使用投影型靜電電容式觸控面板之行動機器正急速普及。投影型靜電電容式觸控面板通常於畫面區域形成有氧化銦錫(ITO,Indium Tin Oxide)膜之圖案,於其周邊部進而形成有鉬等之金屬配線部。並且,為了遮蓋此種金屬配線部,於投影型靜電電容式觸控面板之覆蓋玻璃之內側形成黑色或白色等之遮光圖案之情況較多。
觸控面板之方式大致分為於覆蓋玻璃與液晶面板之間形成觸控面板層之Out-cell型、於液晶面板上形成觸控面板層之On-cell型、於液晶面板之內部形成觸控面板層之In-cell型、及直接於覆蓋玻璃形成觸控面板層之全貼合觸控技術(OGS,One Glass Solution)型,就可較習知型之Out-cell型進一步實現薄型化及輕量化之方面而言,正積極開發OGS型之觸控面板(專利文獻1)。
於OGS型之觸控面板中,於覆蓋玻璃上形成遮光圖案後於高熱下形成ITO電極等,故而對遮光圖案要求較高之耐熱性,進而,亦一併要求ITO電極之圖案化步驟中之耐化學品性。
雖已知有數種利用使用含有Cardo樹脂之感光性之樹脂組成物之光微影法,形成耐熱性及耐化學品性優異之黑色遮光圖案之技術(專利文獻2及3),但仍進一步要求耐熱性等。另一方面,為了獲得耐熱性及耐化學品性更優異之遮光圖案,亦嘗試獲得使著色材分散於聚醯亞胺樹脂中而成之組成物(專利文獻4及5)。
[專利文獻1]日本專利特開2009-301767號公報
[專利文獻2]日本專利特開2012-145699號公報
[專利文獻3]日本專利特開2014-099159號公報
[專利文獻4]日本專利特開2005-162905號公報
[專利文獻5]日本專利特開2009-051891號公報
然而,可使聚醯亞胺樹脂溶解之有機溶劑限定於N-甲基吡咯啶酮或γ-丁內酯等高極性溶劑,於此種高極性溶劑中,著色材、尤其是經表面處理或者由樹脂被覆之有機顏料或碳黑之分散穩定化極其困難,而無法控制所形成之遮光圖案之顏色特性或絕緣性之情況成為問題。
因此,本發明之目的在於提供一種著色樹脂組成物,其可形成藉由含有具有特定構造之聚醯亞胺樹脂而達成顯著之耐熱性,且同時藉由使著色材高度地分散穩定化而可靠性優異之著色膜。
本發明者等人進行了努力研究,結果發現,於具有特定構造之聚醯亞胺樹脂、高分子分散劑及有機溶劑之混合物中分散有著色材之著色樹脂組成物對於解決上述問題極其有效,從而完成了本發明。
即,本發明具有以下構成。
(1)本發明提供一種著色樹脂組成物,其含有(A)具有下述通式(1)所表示之結構單元之鹼可溶性聚醯亞胺樹脂、(B)著色材、(C)高分子分散劑、及(D)有機溶劑。
(通式(1)中,R1表示4~10價之有機基,R2表示2~8價之有機基,R3及R4分別獨立地表示酚性羥基、磺酸基、硫醇基或羧基,p及q分別獨立地表示0~6之整數,p與q之和為1以上)。
又,具有以下之本發明之較佳之態樣。
(2)如(1)之著色樹脂組成物,其中上述(C)高分子分散劑不具有酸價而具有胺價。
(3)如(1)或(2)之著色樹脂組成物,其中上述(C)高分子分散劑具有三級胺基或含氮雜環之鹼性官能基。
(4)如(1)至(3)中任一項之著色樹脂組成物,其中上述(D)有機溶
劑以乙酸酯系溶劑作為主成分。
(5)如(1)至(4)中任一項之著色樹脂組成物,其中上述(B)著色材為有機顏料及/或無機顏料。
又,作為著色膜具有以下態樣。
(6)一種著色膜,其係上述任一著色樹脂組成物之硬化物。
並且,作為利用上述著色膜之特長者,具有以下者。
(7)一種裝飾基板,其具備上述著色膜。
(8)一種觸控面板,其具備上述裝飾基板。
(9)一種有機電致發光(EL,Electroluminescence)顯示裝置,其於驅動電路上之平坦化層及第一電極上之絕緣層之至少一層上具有上述著色膜。
根據本發明之著色樹脂組成物,可形成藉由使著色材高度地分散穩定化而提高了可靠性,且具備顯著之耐熱性之著色膜。
本發明之著色樹脂組成物之特徵在於含有(A)具有特定之結構單元之鹼可溶性聚醯亞胺樹脂、(B)著色劑、(C)高分子分散劑、及(D)有機溶劑。
本發明之著色樹脂組成物含有(A)具有下述通式(1)所表示之結構單元之鹼可溶性聚醯亞胺樹脂。
[化2]
(通式(1)中,R1表示4~10價之有機基,R2表示2~8價之有機基,R3及R4分別獨立地表示酚性羥基、磺酸基或硫醇基,p及q分別獨立地表示0~6之整數)。
作為鹼可溶性聚醯亞胺樹脂,較佳為於既定之時間內溶解於氫氧化鉀等無機鹼及氫氧化四甲基銨(TMAH)等有機鹼中者。具體而言,通常較佳為於23℃下使樹脂浸漬於足量之0.05%KOH水溶液或足量之2.38%TMAH水溶液中時於2分鐘以內溶解者。
再者,本發明中所使用之鹼可溶性聚醯亞胺樹脂無需完全經醯亞胺化,例如亦包含10%以下未經醯亞胺化者。
通式(1)中,R1-(R3)p表示作為原料之酸二酐經醯亞胺化後之殘基。R1為4~10價之有機基,較佳為具有芳香族環或環狀脂肪族基之碳原子數5~40之有機基。
作為酸二酐,例如可列舉以下者、及其等之芳香族環或環狀脂肪族基之氫之1~6個經R3取代而成者。均苯四甲酸二酐、3,3',4,4'-聯苯四羧酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、雙(3,4-二羧基苯基)碸二酐、雙(3,4-二羧基苯基)醚二酐或者2,2-雙(3,4-二羧基苯基)六氟丙烷二酐等芳香族四羧酸二酐;丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、雙環[2.2.2]-7-辛烯-四羧酸二酐或者雙
環[2.2.2]辛烷四羧酸二酐等脂肪族之四羧酸二酐。
為了提高著色樹脂組成物之保存穩定性,較佳為雙(3,4-二羧基苯基)醚二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、雙環[2.2.2]-7-辛烯-四羧酸二酐、雙環[2.2.2]辛烷四羧酸二酐、通式(2)所表示之酸二酐、以及該等之氫之一部分或全部經R3取代而成者。
(通式(2)中,R5表示單鍵、氧原子、硫原子、CH2、C(CF3)2、C(CH3)2、SO2或二苯基環戊烷,R6及R7分別獨立地表示氫原子、羥基或硫醇基)。
若以其他形式表現R1,則較佳為將苯、聯苯、二苯基烷烴、二苯甲酮、二苯基碸、二苯醚、碳數5~8之環烷烴、以及自通式(2)之化合物中去除酸酐基後之構造作為骨架之官能基。又,於該官能基具有數個苯環之情況,較佳為2個酸酐基於不同之苯環具有鍵。
通式(1)中,R2-(R4)q表示二胺進行醯亞胺化反應後之殘基,R2為2~8價之有機基,較佳為具有芳香族環或環狀脂肪族基之碳原子數5~40之有機基。
作為二胺,例如可列舉:間苯二胺、對苯二胺、1,4-
雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(4-胺基苯氧基)苯基]丙烷、雙[4-(4-胺基苯氧基)苯基]六氟丙烷、雙[4-(3-胺基苯氧基)苯基]碸、9,9-雙(4-胺基苯基)茀、2,5-雙(胺基甲基)雙環[2.2.1]庚烷、2,6-雙(胺基甲基)雙環[2.2.1]庚烷、二胺基二苯醚、二胺基二苯基碸、二胺基二苯甲烷、二胺基二苯基丙烷、二胺基二苯基六氟丙烷、二胺基二苯基硫醚、聯苯胺或者2,2'-雙三氟聯苯胺、或下述通式(3)或(4)所表示之二胺及該等之取代物。
(通式(3)及(4)中,R5表示單鍵、氧原子、硫黃原子、CH2、C(CF3)2、C(CH3)2、SO2或二苯基環戊烷,R6及R7分別獨立地表示氫原子、羥基或硫醇基)。
若以其他形式表現R2,則較佳為將苯、聯苯、茀、二苯基烷烴、二苯甲酮、二苯基碸、二苯醚、二苯基硫醚、碳數5~8之環烷烴、以及自通式(3)及(4)之化合物中去除胺基後之化合物作為骨架之官能基。又,於該官能基具有數個苯環之情況下,較佳
為2個胺基於不同之苯環具有鍵。
具有通式(1)所表示之結構單元之鹼可溶性聚醯亞胺樹脂較佳為於主鏈末端具有選自由羧基、酚性羥基、磺酸基及硫醇基所組成之群中之具有活性氫之極性基。該等具有活性氫之極性基向主鏈末端之導入,可藉由使用具有具活性氫之極性基之末端密封劑而達成。作為此種末端密封劑,例如可列舉:單胺、酸酐、單羧酸、單醯氯化合物或單活性酯化合物。
作為用作末端密封劑之單胺,可列舉以下者。5-胺基-8-羥基喹啉、1-羥基-7-胺基萘、1-羥基-6-胺基萘、1-羥基-5-胺基萘、1-羥基-4-胺基萘、2-羥基-7-胺基萘、2-羥基-6-胺基萘、2-羥基-5-胺基萘、1-羧基-7-胺基萘、1-羧基-6-胺基萘、1-羧基-5-胺基萘、2-羧基-7-胺基萘、2-羧基-6-胺基萘、2-羧基-5-胺基萘、2-胺基苯甲酸、3-胺基苯甲酸、4-胺基苯甲酸、4-胺基水楊酸、5-胺基水楊酸、6-胺基水楊酸、2-胺基苯磺酸、3-胺基苯磺酸、4-胺基苯磺酸、3-胺基-4,6-二羥基嘧啶、2-胺基苯酚、3-胺基苯酚、4-胺基苯酚、2-胺基苯硫酚、3-胺基苯硫酚或4-胺基苯硫酚。
作為用作末端密封劑之酸酐、單羧酸、單醯氯化合物及單活性酯化合物,可列舉以下者。
作為酸酐,係鄰苯二甲酸酐、馬來酸酐、耐地酸(Nadic acid)酐、環己烷二羧酸酐或者3-羥基鄰苯二甲酸酐等酸酐。作為單羧酸,係3-羧基苯酚、4-羧基苯酚、3-羧基苯硫酚、4-羧基苯硫酚、1-羥基-7-羧基萘、1-羥基-6-羧基萘、1-羥基-5-羧基萘、1-巰基-7-羧基萘、1-巰基-6-羧基萘、1-巰基-5-羧基萘、3-羧基苯磺酸、4-羧基苯磺酸等。
作為單醯氯化合物,係上述單羧酸之羧基經醯氯化而成者。
作為單醯氯化合物,係對苯二甲酸、鄰苯二甲酸、馬來酸、環己烷二羧酸、1,5-二羧基萘、1,6-二羧基萘、1,7-二羧基萘或者2,6-二羧基萘等之二羧酸類之羧基之僅一個經醯氯化而成者。
作為活性酯化合物,係藉由上述單醯氯化合物與N-羥基苯并三唑或N-羥基-5-降烯-2,3-二羧基醯亞胺之反應而獲得者。
用作末端密封劑之單胺之比例相對於總胺成分,較佳為0.1~60莫耳%,更佳為1~40莫耳%。用作末端密封劑之酸酐、單羧酸、單醯氯化合物或單活性酯化合物之比例相對於二胺成分,較佳為0.1~100莫耳%,更佳為5~90莫耳%。
進而,為了提高使本發明之著色樹脂組成物硬化而成之著色膜與基板等之密接性,可於不降低耐熱性之範圍內將R2或R5設為具有矽氧烷構造之脂肪族之取代基。作為此種鹼可溶性聚醯亞胺樹脂,例如可列舉包含1~10莫耳%之雙(3-胺基丙基)四甲基二矽氧烷或雙(對胺基苯基)八甲基五矽氧烷作為二胺成分之鹼可溶性聚醯亞胺樹脂。
作為本發明之著色樹脂組成物,除通式(1)所表示之鹼可溶性聚醯亞胺樹脂以外,亦可添加其他鹼可溶性樹脂。作為其他鹼可溶性樹脂,並無特別限制,可列舉:聚醯亞胺樹脂、丙烯酸系樹脂、矽氧烷樹脂、Cardo樹脂等。作為通式(1)所表示之鹼可溶性聚醯亞胺樹脂占鹼可溶性樹脂之比例,只要根據所需之耐熱性或分散穩定性等適當決定即可,較佳為10質量%以上,更佳為50質量
%以上。
作為鹼可溶性聚醯亞胺樹脂之製造方法,例示以下方法。首先,係利用例如以下方法獲得聚醯亞胺前驅物之步驟。
(a)於低溫下使四羧酸二酐與二胺化合物(其一部分被換成單胺化合物)反應之方法。
(b)於低溫下使四羧酸二酐(其一部分被換成酸酐、單醯氯化合物或單活性酯化合物)與二胺化合物反應之方法。
(c)使四羧酸二酐與醇反應而獲得二酯化合物,其後使二酯化合物與二胺(其一部分被換成單胺化合物)於縮合劑之存在下反應之方法。
(d)使四羧酸二酐與醇反應而獲得二酯。其後,使反應物中所存在之剩餘之二羧酸醯氯化。接下來,使其生成物與二胺化合物(其一部分被換成單胺化合物)反應之方法。
進而,係利用以下方法獲得聚醯亞胺樹脂之步驟。
(a)利用公知之方法,使所獲得之聚醯亞胺前驅物完全醯亞胺化之方法。
(b)將使所獲得之聚醯亞胺前驅物,進一步進行醯亞胺化之反應於中途停止醯亞胺化反應,而向醯亞胺導入未反應構造之方法。
(c)將經完全醯亞胺化之聚醯亞胺樹脂進行混合而導入一部分醯亞胺構造之方法。
此外,亦可利用使四羧酸二酐與二異氰酸酯化合物於高溫下反應,並利用脫碳酸反應製造聚醯亞胺之方法。
關於鹼可溶性聚醯亞胺樹脂之重量平均分子量,為了提高使本發明之著色樹脂組成物硬化而成之著色膜之耐化學品性
或對鹼性顯影液之溶解性,較佳為5000~100000,更佳為10000~70000。
本發明之著色樹脂組成物含有(B)著色材。所謂(B)著色材,係於電子資訊材料之領域中通常使用之有機顏料、無機顏料或染料。為了提高使本發明之著色樹脂組成物硬化而成之著色膜之耐熱性或可靠性,較佳為有機顏料或無機顏料。
作為有機顏料,可列舉以下者。吡咯并吡咯二酮系顏料、偶氮、雙偶氮、多偶氮等偶氮系顏料;酞菁銅、鹵化酞菁銅、無金屬酞菁等酞菁系顏料;胺基蒽醌、二胺基二蒽醌、蒽嘧啶、黃士酮、花蒽酮、陰丹士林、皮蒽酮、紫蒽酮等蒽醌系顏料;此外,喹吖酮系顏料、二系顏料、紫環酮系顏料、苝系顏料、硫代靛藍系顏料、異吲哚啉系顏料、異吲哚啉酮系顏料、喹啉黃系顏料、士林系顏料或金屬錯合物系顏料。
作為無機顏料,可列舉以下者。氧化鈦、鋅白、硫化鋅、鉛白、碳酸鈣、沈澱性硫酸鋇、白碳、鋁白、高嶺黏土、滑石、膨潤土、黑色氧化鐵、鎘紅、鐵丹、鉬紅、鉬橙、鉻紅、鉻黃、鎘黃、黃色氧化鈦、鈦黃、氧化鉻、鉻綠、鈦鈷綠、鈷綠、鈷鉻綠、維多利亞綠、群青、鐵藍、鈷藍、天藍、鈷矽藍、鈷鋅矽藍、錳紫、鈷紫。
作為染料,可例示:偶氮染料、蒽醌染料、縮合多環芳香族羰基染料、靛藍類染料、碳陽離子染料、酞菁染料、次甲基染料、聚次甲基染料。
作為紅色之顏料,例如可列舉:顏料紅9、48、97、122、123、144、149、166、168、177、179、180、192、209、215、
216、217、220、223、224、226、227、228、240、254(數值均為色指數(以下為「CI」編號))。
作為橙色之顏料,例如可列舉:顏料橙13、36、38、43、51、55、59、61、64、65、71。
作為黃色之顏料,例如可列舉:顏料黃12、13、17、20、24、83、86、93、95、109、110、117、125、129、137、138、139、147、148、150、153、154、166、168、185(數值均為CI編號)。
作為紫色之顏料,可列舉:顏料紫19、23、29、30、32、37、40、50(數值均為CI編號)。
作為藍色之顏料,可列舉:顏料藍15、15:3、15:4、15:6、22、60、64(數值均為CI編號)。
作為綠色之顏料,例如可列舉:顏料綠7、10、36或58(數值均為CI編號)。
作為黑色之顏料,例如可列舉:黑色有機顏料、混色有機顏料或無機顏料等。作為黑色有機顏料,例如可列舉:碳黑、苝黑、苯胺黑、苯并呋喃酮系顏料。作為混色有機顏料,可列舉將具有紅、藍、綠、紫、黃色、洋紅或青色之顏色之2種以上之顏料混合而製成近似黑色化者。
作為無機顏料,可列舉以下者。石墨;鈦、銅、鐵、錳、鈷、鉻、鎳、鋅、鈣、銀等金屬之微粒子;及上述金屬之氧化物、複合氧化物、硫化物、氮化物及氮氧化物。其中,較佳為具有較高之遮光性之碳黑及氮氧化鈦。
作為白色之顏料,例如可列舉:二氧化鈦、碳酸鋇、
氧化鋯、碳酸鈣、硫酸鋇、鋁白、二氧化矽。
作為染料,可列舉以下者。
直接紅2、4、9、23、26、28、31、39、62、63、72、75、76、79、80、81、83、84、89、92、95、111、173、184、207、211、212、214、218、221、223、224、225、226、227、232、233、240、241、242、243、247;酸性紅35、42、51、52、57、62、80、82、111、114、118、119、127、128、131、143、145、151、154、157、158、211、249、254、257、261、263、266、289、299、301、305、319、336、337、361、396、397;反應性紅3、13、17、19、21、22、23、24、29、35、37、40、41、43、45、49、55;鹼性紅12、13、14、15、18、22、23、24、25、27、29、35、36、38、39、45、46;直接紫7、9、47、48、51、66、90、93、94、95、98、100、101;酸性紫5、9、11、34、43、47、48、51、75、90、103、126;反應性紫1、3、4、5、6、7、8、9、16、17、22、23、24、26、27、33、34;鹼性紫1、2、3、7、10、15、16、20、21、25、27、28、35、37、39、40、48;直接黃8、9、11、12、27、28、29、33、35、39、41、44、50、53、58、59、68、87、93、95、96、98、100、106、108、109、110、130、142、144、161、163;
酸性黃17、19、23、25、39、40、42、44、49、50、61、64、76、79、110、127、135、143、151、159、169、174、190、195、196、197、199、218、219、222、227;反應性黃2、3、13、14、15、17、18、23、24、25、26、27、29、35、37、41、42;鹼性黃1、2、4、11、13、14、15、19、21、23、24、25、28、29、32、36、39、40;酸性綠16;酸性藍9、45、80、83、90、185;鹼性橙21、23(數值均為CI編號)。
本發明之著色材樹脂組成物所含有之著色材/樹脂成分之質量比較佳為90/10~20/80,更佳為90/10~40/60。此處所謂樹脂成分,係指將鹼可溶性聚醯亞胺樹脂及高分子分散劑等添加劑、以及視情況進而添加之高分子化合物合併之樹脂成分。若樹脂成分過少,則存在著色材之分散穩定性變得不充分之情況。另一方面,若著色材過少,則存在使本發明之著色樹脂組成物硬化而成之著色膜之著色變得不充分之情況。
本發明之著色樹脂組成物含有(C)高分子分散劑。藉由含有(C)高分子分散劑,可使著色材均勻且穩定地分散於樹脂組成物中。作為(C)高分子分散劑,例如可列舉:聚酯系高分子分散劑、丙烯酸系高分子分散劑、聚胺基甲酸乙酯系高分子分散劑、聚烯丙胺系高分子分散劑或碳二醯亞胺系分散劑。
作為高分子分散劑,較佳為主鏈包含聚胺、聚醚、聚酯、聚胺基甲酸乙酯、聚(甲基)丙烯酸酯等,且側鏈具有選自胺、羧酸、磷酸、胺鹽、羧酸鹽、磷酸鹽等中之具有極性之官能基之聚
合物。認為側鏈所存在之極性官能基吸附於顏料,聚合物之主鏈利用立體阻礙效應防止著色劑彼此接觸,結果使著色劑之分散穩定化。
作為具有極性官能基之聚合物,存在僅具有胺價者、僅具有酸價者、具有胺價及酸價者、以及既不具有胺價亦不具有酸價者。作為本發明之高分子分散劑,較佳為具有胺價者。高分子分散劑亦可具有酸價,但較佳為不具有酸價而僅具有胺價者。再者,作為高分子分散劑之胺價,較佳為10mgKOH/g以上且100mgKOH/g以下,更佳為10mgKOH/g以上且60mgKOH/g以下。於胺價較低之情況下,具有難以獲得分散穩定化效果之傾向,於胺價較高之情況下,具有感光性樹脂組成物對鹼性顯影液之溶解性降低而圖案加工性變差之傾向。
作為僅具有胺價之分散劑之具體例,可列舉以下者。
「DISPERBYK」(商品名)102、160、161、162、2163、164、2164、166、167、168、2000、2050、2150、2155、9075、9077;BYK-LP N6919、BYK-LP N21116或者BYK-LP N21234(以上任一者均為BYK-Chemie公司製造);「EFKA」(商品名)4015、4020、4046、4047、4050、4055、4060、4080、4300、4330、4340、4400、4401、4402、4403、4800(以上任一者均為BASF公司製造);「Ajisper」(註冊商標)PB711(Ajinomoto Fine-Techno公司製造);「SOLSPERSE」(註冊商標)13240、13940、20000、71000或76500(以上任一者均為Lubrizol公司製造)。
於僅具有胺價之分散劑中,較佳為具有三級胺基或吡
啶、嘧啶、吡、三聚異氰酸酯等含氮雜環等之鹼性官能基者。作為具有三級胺基或含氮雜環之鹼性官能基之高分子分散劑,可列舉以下者。
可列舉:「DISPERBYK」164、167、BYK-LP N6919;BYK-LP N21116;「SOLSPERSE」20000。
作為具有胺價及酸價之高分子分散劑,例如為「DISPERBYK」(商品名)142、145、2001、2010、2020、2025或者9076、Anti-Terra-205(以上任一者均為BYK-Chemie公司製造)、「Solsperse」(註冊商標)24000(Lubrizol公司製造)、Ajisper(註冊商標)PB821、PB880或者PB881(以上任一者均為Ajinomoto Fine-Techno公司製造)或「SOLSPERSE」(註冊商標)9000、11200、13650、24000SC、24000GR、32000、32500、32550、326000、33000、34750、35100、35200、37500、39000或者56000(Lubrizol公司製造)。
作為高分子分散劑之量,為了維持耐熱性並且提高分散穩定性,於樹脂成分中所占之比例於可行之範圍內較佳為較少之比率,具體而言,相對於樹脂成分之總量,較佳為1~50質量%,更佳為1~30質量%。另一方面,相對於著色材之總量,較佳為1~100質量%,更佳為3~30質量%。又,作為該高分子分散劑之重量平均分子量,較佳為1000以上且100000以下,更佳為3000以上且50000以下。於分子量較低之情況下,會產生無法獲得充分之分散穩定化之效果之問題,於分子量較高之情況下,會產生對鹼性顯影液之溶解性降低之問題。
本發明之著色樹脂組成物含有(D)有機溶劑。作為(D)
有機溶劑,例如可列舉:醚類、乙酸酯類、酯類、酮類、芳香族烴類、醯胺類或醇類之化合物。
更具體而言,可列舉以下者。乙二醇單甲醚、乙二醇單乙醚、乙二醇單-正丙醚、乙二醇單-正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單-正丙醚、二乙二醇單-正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單-正丙醚、丙二醇單-正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單-正丙醚、二丙二醇單-正丁醚、二丙二醇二甲醚、二丙二醇甲基-正丁醚、三丙二醇單甲醚、三丙二醇單乙醚、二乙二醇二甲醚、二乙二醇甲基乙基醚、二乙二醇二乙醚及四氫呋喃等醚類。
亦可使用以下酯化合物。乙酸丁酯、乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、乙酸3-甲氧基丁酯、乙二醇單丁醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二乙二醇單丁醚乙酸酯、乙酸環己二醇酯、丙二醇二乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯(以下稱為「PGMEA」)、二丙二醇甲醚乙酸酯、乙酸3-甲氧基-3-甲基-1-丁酯、1,4-丁二醇二乙酸酯、1,3-丁二醇二乙酸酯或者1,6-己二醇二乙酸酯等乙酸酯。甲基乙基酮、環己酮、2-庚酮或者3-庚酮等酮類。2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷基酯類。2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、乙酸3-甲氧基丁酯、乙酸3-甲基-3-甲氧基丁酯、丙酸3-甲基-3-甲氧基丁酯、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙
酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯或者2-側氧丁酸乙酯等。
此外,亦可使用以下溶劑。甲苯、二甲苯等芳香族烴類。N-甲基吡咯啶酮、N,N-二甲基甲醯胺及N,N-二甲基乙醯胺等醯胺類。丁基醇、異丁基醇、戊醇、4-甲基-2-戊醇、3-甲基-2-丁醇、3-甲基-3-甲氧基丁醇及二丙酮醇等醇類。
再者,為了使高分子分散劑與顏料之相互作用更有效,較佳為將有機溶劑之溶解性參數SP值設為適當之範圍。作為SP值,較佳為7.5以上且10.0以下,較佳為8.5以上且10.0以下,此種溶劑於溶劑中較佳為包含50質量%以上,進而較佳為70質量%以上。於SP值較低之情況下,具有高分子分散劑或鹼可溶性樹脂難以溶解而難以分散之傾向,於SP值較高之情況下,具有高分子分散劑所帶來之分散穩定化之效果減小之傾向。
其中,為了使著色材進一步分散穩定化,較佳為使用乙酸酯類。具體而言,乙酸酯類之化合物占本發明之著色樹脂組成物所含有之全部(D)有機溶劑之比例較佳為50~100質量%,更佳為70~100質量%。
伴隨著供著色膜形成之基板之大型化,利用模嘴塗佈裝置進行塗佈逐漸成為主流。為了實現該塗佈方法中之較佳之揮發性及乾燥性,(D)有機溶劑較佳為混合有兩種以上之化合物而成者。為了使本發明之著色樹脂組成物之塗佈膜之膜厚均勻並使表面之平滑性及黏著性良好,沸點為150~200℃之有機溶劑之比例相對
於全部(D)有機溶劑較佳為30~75質量%。
關於(D)有機溶劑相對於本發明之著色樹脂組成物之總固形份之比例,相對於總固形份100質量份,較佳為20~800質量份,更佳為30~500質量份。
本發明之著色樹脂組成物含有(E)光聚合性化合物及(F)光聚合起始劑,藉此對著色樹脂組成物賦予感光性。
作為(E)光聚合性化合物,例如可列舉多官能基或者單官能基之單體或低聚物。此處,所謂官能基,係指聚合性基,較佳為碳-碳之雙鍵。
作為多官能基單體及多官能基低聚物,可列舉以下者。作為(甲基)丙烯酸系化合物,係雙酚A二環氧丙醚(甲基)丙烯酸酯、聚(甲基)丙烯酸胺基甲酸酯、改質雙酚A環氧(甲基)丙烯酸酯、己二酸1,6-己二醇(甲基)丙烯酸酯、鄰苯二甲酸酐環氧丙烷(甲基)丙烯酸酯、偏苯三甲酸二乙二醇(甲基)丙烯酸酯、松香改質環氧基二(甲基)丙烯酸酯、醇酸改質(甲基)丙烯酸酯、茀二丙烯酸酯系低聚物、三丙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、雙酚A二環氧丙醚二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三丙烯醯基縮甲醛、季戊四醇四(甲基)丙烯酸酯或者其酸改質體、二季戊四醇六(甲基)丙烯酸酯或者其酸改質體、二季戊四醇五(甲基)丙烯酸酯及其酸改質體、2,2-雙[4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]丙烷、雙[4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]甲烷、雙[4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]碸、雙[4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]醚、4,4'-雙[4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]環己烷、9,9-雙[4-(3-丙烯醯
氧基-2-羥基丙氧基)苯基]茀、9,9-雙[3-甲基-4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]茀、9,9-雙[3-氯-4-(3-丙烯醯氧基-2-羥基丙氧基)苯基]茀、雙苯氧基乙醇茀二丙烯酸酯、雙苯氧基乙醇茀二甲基丙烯酸酯、雙甲酚茀二丙烯酸酯或雙甲酚茀二甲基丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯與二季戊四醇六(甲基)丙烯酸酯之縮聚物。
藉由適當選擇該等多官能基單體、單官能基單體或低聚物並將其等組合,可調整所獲得之感光性之著色樹脂組成物之感度或加工性等特性。其中,為了提高感度,較佳為具有3個以上之聚合性基之化合物,進而更佳為具有5個以上之聚合性基之化合物。進而較佳為二季戊四醇六(甲基)丙烯酸酯或者二季戊四醇五(甲基)丙烯酸酯或其酸改質體。又,為了提高顯影性及加工性,亦較佳為使多元酸羧酸或其酸酐與具有2個環氧丙醚基之環氧化合物及甲基丙烯酸系之反應物反應而獲得之含不飽和基之鹼可溶性單體。進而,為了控制顯影時之圖案形狀,分子中具有數個芳香環且具有極有助於撥水性之茀環之(甲基)丙烯酸酯之併用亦有用。
作為光聚合性化合物之量,相對於樹脂成分之總量,較佳為1~70質量%,更佳為20~50質量%。於添加量較少之情況下,無法獲得充分之感光特性而加工變得困難,於添加量較多之情況下,所形成之膜之硬化收縮增大,會因膜應力而導致與基材之密接性降低或膜產生褶皺,故而欠佳。
作為(F)光自由基聚合起始劑,較佳為烷基苯酮系光聚合起始劑或肟酯系光聚合起始劑。
作為烷基苯酮系光聚合起始劑,例如可列舉:α-胺烷基苯酮系光聚合起始劑或α-羥烷基苯酮系光聚合起始劑。為了進一
步提高感度,較佳為α-胺烷基苯酮系光聚合起始劑。作為α-胺烷基苯酮系光聚合起始劑,例如可列舉:2,2-二乙氧基苯乙酮、2-甲基-1-(4-甲基噻吩基)-2-啉基丙烷-1-酮、「Irgacure」(註冊商標)369即2-苄基-2-二甲基胺基-1-(4-啉基苯基)-丁酮及「Irgacure」(註冊商標)379即2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-啉基)苯基]-1-丁酮、1-羥基環己基苯基酮(以上任一者均為BASF(股)製造);及2-羥基-2-甲基-1-苯基丙烷-1-酮。
作為肟酯系光聚合起始劑,例如可列舉:「Irgacure」(註冊商標)OXE01即1,2-辛二酮、1-[4-(苯硫基)-2-(鄰苯甲醯基肟)]及「Irgacure」(註冊商標)OXE02即乙酮、1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(鄰乙醯基肟);及「ADEKA」(註冊商標)Optomer N-1818、N-1919及「ADEKA ArcLuz」NCI-831(以上任一者均為ADEKA(股)製造)。
除該等光聚合起始劑以外,亦可併用二苯甲酮系化合物、9-氧硫系化合物、咪唑系化合物、苯并噻唑系化合物、苯并唑系化合物、咔唑系化合物、三系化合物及磷系化合物、以及鈦酸酯等無機系光聚合起始劑等。作為此種光聚合起始劑,可列舉以下者。二苯甲酮、N,N'-四乙基-4,4'-二胺基二苯甲酮、4-甲氧基-4'-二甲基胺基二苯甲酮、安息香、安息香甲醚、安息香異丁醚、苄基二甲基縮酮、α-羥基異丁基苯酮、9-氧硫、2-氯9-氧硫 、第三丁基蒽醌、1-氯蒽醌、2,3-二氯蒽醌、3-氯-2-甲基蒽醌、2-乙基蒽醌、1,4-萘醌、9,10-菲醌、1,2-苯蒽醌、1,4-二甲基蒽醌、2-苯基蒽醌、2-(鄰氯苯基)-4,5-二苯基咪唑二聚物、2-巰基苯并噻唑、2-巰基苯并唑及4-(對甲氧基苯基)-2,6-二-(三氯甲基)-對稱三
。
作為光聚合起始劑之量,相對於樹脂成分之總量,較佳為0.1~40質量%,於將兩種以上之光聚合起始劑混合使用之情況下,較佳為合計為0.2~60質量%。
為了提高使本發明之著色樹脂組成物硬化而成之著色膜之可靠性或耐化學品性,本發明之著色樹脂組成物較佳為含有熱交聯性化合物。作為具有1個熱交聯性基之熱交聯性化合物,可列舉以下者。ML-26X、ML-24X、ML-236TMP、4-羥甲基3M6C、ML-MC或者ML-TBC(以上任一者均為本州化學工業(股)製造)及P-α型苯并(四國化成工業(股)製造)。
作為具有2個熱交聯性基之熱交聯性化合物,可列舉以下者。DM-BI25X-F、46DMOC、46DMOIPP或者46DMOEP(以上任一者均為旭有機材工業(股)製造);DML-MBPC、DML-MBOC、DML-OCHP、DML-PC、DML-PCHP、DML-PTBP、DML-34X、DML-EP、DML-POP、DML-OC、二羥甲基-Bis-C、二羥甲基-BisOC-P、DML-BisOC-Z、DML-BisOCHP-Z、DML-PFP、DML-PSBP、DML-MB25、DML-MTrisPC、DML-Bis25X-34XL或者DML-Bis25X-PCHP(以上任一者均為本州化學工業(股)製造);NIKALAC MX-290(三和化學(股)製造);B-α型苯并或者B-m型苯并(以上任一者均為四國化成工業(股)製造);及2,6-二甲氧基甲基-4-第三丁基苯酚、2,6-二甲氧基甲基-對甲酚或2,6-二乙醯氧基甲基對甲酚。
作為具有3個熱交聯性基之熱交聯性化合物,可列舉以下者。TriML-P、TriML-35XL或TriML-TrisCR-HAP(以上任一者
均為本州化學工業(股)製造)。
作為具有4個熱交聯性基之熱交聯性化合物,可列舉以下者。TM-BIP-A(旭有機材工業(股)製造);TML-BP、TML-HQ、TML-pp-BPF、TML-BPA或者TMOM-BP(以上任一者均為本州化學工業(股)製造);及「NIKALAC」MX-280、「NIKALAC」MX-270(以上任一者均為三和化學(股)製造)。
作為具有6個熱交聯性基之熱交聯性化合物,可列舉以下者。HML-TPPHBA、HML-TPHAP(以上任一者均為本州化學工業(股)製造);及「NIKALAC」MW-390、「NIKALAC」MW-100LM(以上任一者均為三和化學(股)製造)。
其中,較佳為具有2個以上之熱交聯性基者,較佳為脂環式系之化合物即「NIKALAC」MX-280或者「NIKALAC」MX-270或B-α型苯并或者B-m型苯并、具有6個熱交聯性基之「NIKALAC」MW-390、「NIKALAC」MW-100LM。
本發明之著色樹脂組成物為了控制其鹼顯影性,可含有具有酚性羥基之化合物。再者,此處所言之具有酚性羥基之化合物與通式(1)所示之聚醯胺被區分開來。
作為具有酚性羥基之化合物,可列舉以下者。Bis-Z、BisOC-Z、BisOPP-Z、BisP-CP、Bis26X-Z、BisOTBP-Z、BisOCHP-Z、BisOCR-CP、BisP-MZ、BisP-EZ、Bis26X-CP、BisP-PZ、BisP-IPZ、BisCR-IPZ、BisOCP-IPZ、BisOIPP-CP、Bis26X-IPZ、BisOTBP-CP、TekP-4HBPA(四P-DO-BPA)、TrisP-HAP、TrisP-PA、BisOFP-Z、BisRS-2P、BisPG-26X、BisRS-3P、BisOC-OCHP、BisPC-OCHP、Bis25X-OCHP、Bis26X-OCHP、BisOCHP-OC、Bis236T-OCHP、亞
甲基三-FR-CR、BisRS-26X或者BisRS-OCHP(以上任一者均為本州化學工業(股)製造);及BIR-OC、BIP-PC、BIR-PC、BIR-PTBP、BIR-PCHP、BIP-BIOC-F、4PC、BIR-BIPC-F、TEP-BIP-A(以上任一者均為旭有機材工業(股)製造)。
其中,較佳為Bis-Z、BisP-EZ、TekP-4HBPA、TrisP-HAP、TrisP-PA、BisOCHP-Z、BisP-MZ、BisP-PZ、BisP-IPZ、BisOCP-IPZ、BisP-CP、BisRS-2P、BisRS-3P、BisP-OCHP、亞甲基三-FR-CR、BisRS-26X、BIP-PC、BIR-PC、BIR-PTBP或BIR-BIPC-F。進而較佳為Bis-Z、TekP-4HBPA、TrisP-HAP、TrisP-PA、BisRS-2P、BisRS-3P、BIR-PC、BIR-PTBP或BIR-BIPC-F。
關於具有酚性羥基之化合物相對於樹脂成分之比例,相對於樹脂成分100質量份,較佳為1~60質量份,更佳為3~50質量份。
本發明之著色樹脂組成物為了提高使本發明之著色樹脂組成物硬化而成之著色膜與基板之密接性,亦可含有密接性改良劑。作為密接性改良劑,較佳為矽烷偶合劑。作為矽烷偶合劑,例如可列舉具有乙烯基、環氧基、苯乙烯基、甲基丙烯醯氧基、丙烯醯氧基或胺基等官能基之烴基及烷氧基等水解性基鍵結於矽原子而成者。可列舉以下者。3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、
N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基)丙基胺、3-巰基丙基三甲氧基矽烷、3-脲基丙基三乙氧基矽烷、3-異氰酸酯基丙基三乙氧基矽烷或對苯乙烯基三甲氧基矽烷。
本發明之著色樹脂組成物為了提高其塗佈性或塗佈膜之表面之平滑性或者防止貝納得穴流,亦可含有界面活性劑。界面活性劑相對於顏料之比例較佳為0.001~10質量%,更佳為0.01~1質量%。作為界面活性劑,可列舉以下者。可列舉:月桂基硫酸銨、聚氧乙烯烷基醚硫酸三乙醇胺等陰離子界面活性劑;硬脂胺乙酸酯、月桂基三甲基氯化銨等陽離子界面活性劑;月桂基二甲基氧化胺、月桂基羧甲基羥乙基咪唑鎓甜菜鹼等兩性界面活性劑;聚氧乙烯月桂醚、聚氧乙烯硬脂醚或者山梨醇酐單硬脂酸酯等非離子界面活性劑;及將聚二甲基矽氧烷等作為主骨架之聚矽氧系界面活性劑或氟系界面活性劑。
作為本發明之著色材樹脂組成物之製造方法,例如可列舉使用分散機使著色材分散於鹼可溶性聚醯亞胺樹脂之溶液之方法。
作為分散機,可列舉球磨機、珠磨機、砂磨機、3根輥磨機或高速度衝擊研磨機。為了實現分散效率化及微分散化,較佳為珠磨機。作為珠磨機,可列舉共球磨機、籃式研磨機、針磨機或戴諾磨(DYNO-Mill)。作為珠磨機之珠粒,例如可列舉氧化鈦珠粒、氧化鋯珠或鋯石珠粒。作為珠磨機之珠粒直徑,較佳為0.01~
5.0mm,更佳為0.03~1.0mm。於著色材之一次粒徑及一次粒子凝聚而形成之二次粒子之粒徑較小之情況下,較小為0.03~0.10mm之微小之珠粒。於此情況下,較佳為可將微小之珠粒與分散液分離之離心分離方式之具備隔片之珠磨機。另一方面,於使包含次微米程度之粗大粒子之著色材分散之情況下,為了獲得充分之粉碎力,較佳為0.10mm以上之珠粒。
繼而,關於使本發明之著色樹脂組成物硬化而形成耐著色膜之方法,列舉負型之感光性之著色樹脂組成物為例進行說明。
將感光性之著色樹脂組成物塗佈於基板上而獲得塗佈膜。作為基板,例如可列舉鈉玻璃、無鹼玻璃或者石英玻璃等透明基板、矽晶圓、陶瓷類之基板或砷化鎵基板。作為塗佈著色樹脂組成物之方法,例如可列舉使用旋轉器之旋轉塗佈、噴霧塗佈、模嘴塗佈或輥塗。塗佈膜之膜厚根據塗佈方法等適當決定即可,通常將乾燥後之膜厚設為1~150μm。
將所獲得之塗佈膜進行乾燥而獲得乾燥膜。乾燥通常係藉由利用烘箱或者加熱板而進行之加熱乾燥、風乾、減壓乾燥、或紅外線照射等於50~150℃下進行1分鐘~數小時(例如5小時)。
隔著具有所需圖案之遮罩對所獲得之乾燥膜照射化學射線,使之曝光而獲得曝光膜。作為所照射之化學射線,例如可列舉紫外線、可見光線、電子束或X射線。較佳為對本發明之著色樹脂組成物照射水銀燈之i射線(365nm)、h射線(405nm)或g射線(436nm)。
利用鹼性顯影液等使所獲得之曝光膜顯影而去除未
曝光部,獲得圖案。作為鹼性顯影液,可使用以下所列舉之鹼性化合物之水溶液。氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、矽酸鈉、偏矽酸鈉、氨水等無機鹼類;乙基胺、正丙基胺等一級胺;二乙基胺、二正丙基胺等二級胺;三乙胺、甲基二乙基胺等三級胺;氫氧化四甲基銨(TMAH)等氫氧化四烷基銨類;膽鹼等四級銨鹽;三乙醇胺、二乙醇胺、單乙醇胺、二甲基胺基乙醇、二乙基胺基乙醇等醇胺類;及吡咯、哌啶、1,8-二氮雙環[5,4,0]-7-十一烯、1,5-二氮雙環[4,3,0]-5-壬烷、啉等環狀胺類。
鹼性顯影液中之鹼性化合物之濃度通常為0.01~50質量%,較佳為0.02~10質量%,更佳為0.02~1質量%。又,為了使顯影後之圖案形狀變得更加良好,亦可添加0.1~5質量%添加之非離子系界面活性劑等界面活性劑。進而於顯影液為鹼性水溶液之情況下,亦可於顯影液中添加乙醇、γ-丁內酯、二甲基甲醯胺或N-甲基-2-吡咯啶酮等水溶性有機溶劑。
作為顯影之方法,可列舉浸漬法、噴霧法、覆液法。亦可利用純水等對所獲得之圖案進行沖洗。
藉由對所獲得之圖案進行加熱處理(後烘烤),可獲得經圖案化之著色膜。該加熱處理通常係於空氣或者氮環境下或真空狀態下並於150~300℃下連續或階段性地進行0.25~5小時。
本發明之著色樹脂組成物中之含有黑色之著色材者可較佳地利用於液晶顯示裝置等所具備之彩色濾光片之黑矩陣等遮光圖像、有機EL顯示器內部之著色間隔壁、或觸控面板所具備之裝飾基板之著色膜之形成。
進而,使本發明之著色樹脂組成物硬化而成之硬化膜
具有較高之耐熱性,因此可較佳地用作依序具有供薄膜電晶體(TFT,Thin-Film Transistor)形成之基板、驅動電路上之平坦化層、第一電極上之絕緣層及顯示元件之顯示裝置之平坦化層或絕緣層。作為該構成之顯示裝置,可列舉液晶顯示裝置或有機EL顯示裝置等。於對平坦化層或絕緣層要求更高之耐熱性或低釋氣性之有機EL顯示裝置中可更佳地使用。
以下,列舉其實施例及比較例對本發明詳細地進行說明,但本發明並不限定於該等。
於乾燥氮氣流下將30.03g之2,2-雙(3-胺基-4-羥基苯基)六氟丙烷(0.082莫耳)、1.24g之1,3-雙(3-胺基丙基)四甲基二矽氧烷(0.005莫耳)、及作為末端密封劑之2.73g之3-胺基苯酚(0.025莫耳)溶解於100g之N-甲基-2-吡咯啶酮(以下稱為「NMP」),並向其中添加31.02g之雙(3,4-二羧基苯基)醚二酐(0.10莫耳)及30g之NMP後於20℃下攪拌1小時,進而一面去除水一面於180℃下攪拌4小時。反應結束後,將反應液投入2L之水中,藉由過濾收集所生成之沈澱物並利用水洗淨3次,於80℃之真空乾燥機中乾燥20小時而獲得聚醯亞胺樹脂(P-1)。
將138.2g之4,4'-二胺基苯醚(0.30莫耳)、161.7g之對苯二胺(0.65莫耳)、及28.6g之雙(3-胺基丙基)四甲基二矽氧烷(0.05莫耳)
與2082.6g之γ-丁內酯及2082.6g之NMP混合,並向其中添加711.7g之3,3',4,4'-氧雙鄰苯二甲羧酸二酐(0.9975莫耳),於80℃下攪拌3小時。向其中添加1.1g之馬來酸酐(0.02莫耳),進而於80℃下攪拌1小時,獲得固形份濃度20質量%之聚醯亞胺前驅物(P-2)溶液。
合成甲基丙烯酸甲酯/甲基丙烯酸/苯乙烯之共聚合體(質量比30/40/30)。相對於該共聚合體100質量份,添加甲基丙烯酸環氧丙酯40質量份。其是甲基丙烯酸之羧基與甲基丙烯酸環氧丙酯之環氧基之反應。將反應物於純化水中再次沈澱並對其進行過濾及乾燥,藉此獲得重量平均分子量(Mw)15,000、酸價110(mgKOH/g)之丙烯酸系樹脂(P-3)。
將表面經磺酸基修飾之175g之碳黑(TPK1227;Cabot製造)、57.5g之聚醯亞胺樹脂(P-1)、33.7g之DISPERBYK-167及733.8g之丙二醇單甲醚乙酸酯(以下稱為「PGMEA」)進行混合,並利用homo mixer(Primix製造)攪拌20分鐘,獲得預分散液。將所獲得之預分散液供給至具備填充有75%之0.30mmΦ氧化鋯珠(YTZ BALL;NETSUREN製造)之離心分離隔片之Ultra Apex Mill(壽工業製造),並以旋轉速度8m/s使之分散3小時,獲得固形份濃度25質量%、著色材/樹脂(質量比)=70/30之碳黑分散液(Bk-1)。再者,高分子分散劑DISPERBYK-167之胺價為12.5mgKOH/g,無酸價,且具有三聚異氰酸酯環作為顏料吸附基。又,PGMEA之SP值為8.7。
向514.3g之碳黑分散液(Bk-1)中添加將71.1g之聚醯亞胺樹脂(P-1)及3.0g之BYK333(聚矽氧系界面活性劑;BYK-Chemie公司製造)PGMEA溶液(10質量%)溶解於411.6g之PGMEA中而成之溶液,獲得總固形份濃度20質量%、著色材/樹脂成分(質量比)=45/55之黑色樹脂組成物1。
利用旋轉器(1H-DS;Mikasa(股)製造)將所獲得之黑色樹脂組成物1塗佈於無鹼玻璃基板(AN100)上,並將塗佈膜於100℃下預烘烤2分鐘後,於230℃下後烘烤30分鐘,形成膜厚為1.0μm之黑色膜1。對該黑色膜1進行以下之各評價。將結果示於表1。
使用光學濃度計(361TVisual;X-Rite公司製造)分別測定黑色膜1之入射光及穿透光之強度,並根據以下之式(X)算出遮光性OD值。
OD值=logI0(I0/I)…式(X)
I0:入射光強度
I:穿透光強度。
使用高電阻電阻率計(「Hiresta」(註冊商標)UP;三菱化學製造)測定黑色膜1之表面電阻率(Ω/□)。
使用接觸式膜厚計(「DEKTAK」(註冊商標)150;ULVAC公司銷售)並以觸針壓力5mg測定黑色膜1之表面粗糙度(nm)。
以將黑色膜1削取成約10mg者作為試樣,測定加熱減量率(%)。更具體而言,使用熱重量測定裝置(TGA-50;島津製作所公司製造)一面以50mL/min進行氮氣沖洗,一面以10℃/min之升溫速度使溫度到達至300℃為止,分別測定於300℃下保持30分鐘時之到達300℃時之試樣之質量、300℃之保持結束時之試樣之質量,根據其等之值算出加熱減量率(%)。
使用56.2g之BYK-LP N6919代替「DISPERBYK」BYK-167,並將PGMEA之質量設為711.3g,除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-2)。再者,高分子分散劑BYK-LP N6919之胺價為72mgKOH/g,無酸價,且具有三級胺作為顏料吸附基。
使用碳黑分散液(Bk-2),除此以外,以與實施例1相同之方式獲得黑色樹脂組成物2。使用所獲得之黑色樹脂組成物2進行與實施例1同樣之評價。將結果示於表1。
使用43.8g之BYK-LP N21116代替「DISPERBYK」BYK-167,並將PGMEA之質量設為723.7g,除此以外,以與實施例1相同之
方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-3)。高分子分散劑BYK-LP N21116之胺價為32mgKOH/g,無酸價,且具有三級胺且四級銨鹽作為顏料吸附基。
使用碳黑分散液(Bk-3),除此以外,以與實施例1相同之方式獲得黑色樹脂組成物3。使用所獲得之黑色樹脂組成物3進行與實施例1同樣之評價。將結果示於表1。
使用38.1g之「DISPERBYK」BYK-2001代替「DISPERBYK」BYK-167,並將PGMEA之質量設為729.4g,除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-4)。再者,高分子分散劑「DISPERBYK」BYK-2001之胺價為29mgKOH/g,酸價為19mg/KOH,且具有四級銨鹽作為顏料吸附基。
使用碳黑分散液(Bk-4),除此以外,以與實施例1相同之方式獲得黑色樹脂組成物4。使用所獲得之黑色樹脂組成物4進行與實施例1同樣之評價。將結果示於表1。
於有機黑「Irgaphor」Black S0100CF(BASF公司製造)150.0g中混合聚醯亞胺樹脂(P-1)75.0g、「SOLSPERSE」20000(Lubrizol公司製造)25.0g、及乙酸3-甲氧基丁酯(以下稱為「MBA」)750g,除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=60/40之有機黑色分散液(Bk-5)。再者,高
分子分散劑「SOLSPERSE」20000之胺價為29mgKOH/g,無酸價,且具有三級胺作為顏料吸附基。又,MBA之SP值為8.7。
將聚醯亞胺樹脂(P-1)100g及BYK333(聚矽氧系界面活性劑;BYK-Chemie公司製造)PGMEA溶液(10質量%)3.0g及PGMEA497g溶解於有機黑色分散液(Bk-5)400g中,獲得總固形份濃度20質量%、著色材/樹脂成分(質量比)=30/70之黑色樹脂組成物5。使用所獲得之黑色樹脂組成物5進行與實施例1同樣之評價。將結果示於表1。
將聚醯亞胺樹脂(P-1)之質量設為91.2g,且並未添加高分子分散劑(「DISPERBYK」-167),除此以外,以與實施例1相同之方式而欲獲得碳黑分散液,但由於在使用Ultra Apex Mill之分散中碳黑凝聚而黏度過分上升,故而無法獲得碳黑分散液。
分別使用375g之聚醯亞胺前驅物(P-2)溶液代替聚醯亞胺樹脂(P-1),使用450g之NMP代替PGMEA,除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-7)。再者,NMP之SP值成為11.0。
向257.1g之碳黑分散液(Bk-4)中添加178.6g之聚醯亞胺前驅物(P-2)溶液、563.3g之NMP及作為界面活性劑之1g之LC951(楠本化成製造),獲得總固形份濃度10質量%、顏料/樹脂成分(質量比)=45/55之黑色樹脂組成物7。
使用所獲得之黑色樹脂組成物7進行與實施例1同樣之評價。將結果示於表1。
使用375g之聚醯亞胺前驅物(P-2)溶液代替聚醯亞胺樹脂(P-1),並將PGMEA之質量設為450g,進而並未添加高分子分散劑(「DISPERBYK」-167),除此以外,以與實施例1相同之方式而欲獲得碳黑分散液,但於利用homo mixer之攪拌中樹脂成分析出而無法獲得碳黑分散液。
使用57.5g之丙烯酸系聚合物(P-3)代替聚醯亞胺樹脂(P-1),除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-8)。
使用碳黑分散液(Bk-8),除此以外,以與實施例1相同之方式獲得黑色樹脂組成物8。使用所獲得之黑色樹脂組成物8進行與實施例1同樣之評價。將結果示於表1。
使用101.8g之具有茀骨架之環氧丙烯酸酯之酸酐縮聚物之PGMEA溶液(P-4)(固形份濃度56.5質量%;V259ME;新日鐵化學(股)製造)代替聚醯亞胺樹脂(P-1),並將PGMEA之質量設為689.5g,除此以外,以與實施例1相同之方式獲得固形份濃度25質量%、著色材/樹脂成分(質量比)=70/30之碳黑分散液(Bk-9)。
使用碳黑分散液(Bk-9),除此以外,以與實施例1相同之方式獲得黑色樹脂組成物9。使用所獲得之黑色樹脂組成物9進行與實施例1同樣之評價。將結果示於表1。
向499.5g之碳黑分散液(Bk-1)中添加將19.2g之聚醯亞胺樹脂(P-1)、47.9g之二季戊四醇六丙烯酸酯、作為光自由基聚合起始劑之5.8g之「Adeka Arkls」NCI-831(ADEKA(股)製造)、作為密接性改良劑之2.0g之KBM503(信越化學(股)製造)及2.0g之BYK333溶解於425.4g之PGMEA中而成之溶液,獲得固形份濃度20質量%、顏料/樹脂(質量比)=45/55之感光性之黑色樹脂組成物10。
利用旋轉器將所獲得之感光性之黑色樹脂組成物10塗佈於無鹼玻璃基板上,並使塗佈膜於100℃下乾燥2分鐘後,使用光罩對準曝光機PEM-6M(Union光學(股)製造)隔著光罩進行曝光(200mJ/cm2)。使用0.045質量%KOH水溶液使其顯影,接下來進行純水洗淨,並於230℃下進行30分鐘後烘烤,形成膜厚為1.0μm之黑色膜10。對該黑色膜10進行與實施例1同樣之評價。將結果示於表1。
得知使實施例所記載之黑色性組成物及10硬化而形成之黑色膜之遮光性、絕緣性及表面之平滑性(表面粗糙度)優異,組成物中之顏料之分散狀態極其良好。進而得知形成加熱減量率(%)亦非常低,自塗佈膜之脫氣極少,耐熱性優異之著色膜。
本發明之著色樹脂組成物可較佳地利用於形成觸控面板所具備之裝飾基板之著色膜、及有機EL顯示裝置之著色絕緣層。
Claims (8)
- 一種著色樹脂組成物,其含有:(A)包含下述通式(1)所表示之結構單元之鹼可溶性聚醯亞胺樹脂;(B)著色材;(C)高分子分散劑;及(D)有機溶劑;上述(B)著色材,與含有上述(A)鹼可溶性聚醯亞胺樹脂及上述(C)高分子分散劑之樹脂成分之質量比,係90/10~20/80;上述(C)高分子分散劑係具有選自聚胺、聚醚、聚酯、聚胺基甲酸乙酯、聚(甲基)丙烯酸酯之主鏈,且側鏈具有選自胺及胺鹽之具有極性之官能基,且上述(C)高分子分散劑具有胺價;上述(D)有機溶劑係含有乙酸酯系溶劑70~100質量%以上,且乙酸酯系溶劑之SP值為8.5以上且10.0以下;
- 如請求項1之著色樹脂組成物,其中,上述(C)高分子分散劑不具有酸價而具有胺價。
- 如請求項1之著色樹脂組成物,其中,上述(C)高分子分散劑具有三級胺基或含氮雜環之鹼性官能基。
- 如請求項1之著色樹脂組成物,其中,上述(B)著色材為有機顏料及/或無機顏料。
- 一種著色膜,其係請求項1至4中任一項之著色樹脂組成物之硬化物。
- 一種裝飾基板,其具備請求項5之著色膜。
- 一種觸控面板,其具備請求項6之裝飾基板。
- 一種有機電致發光(EL,Electroluminescence)顯示裝置,其於驅動電路上之平坦化層及第一電極上之絕緣層之至少一層上具有請求項5之著色膜。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-068208 | 2015-03-30 | ||
JP2015068208 | 2015-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201701076A TW201701076A (zh) | 2017-01-01 |
TWI675257B true TWI675257B (zh) | 2019-10-21 |
Family
ID=57006830
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105109675A TWI675257B (zh) | 2015-03-30 | 2016-03-28 | 著色樹脂組成物、著色膜、裝飾基板及觸控面板 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20180039176A1 (zh) |
JP (1) | JP6172395B2 (zh) |
KR (1) | KR101799819B1 (zh) |
CN (1) | CN107406673B (zh) |
SG (1) | SG11201707367VA (zh) |
TW (1) | TWI675257B (zh) |
WO (1) | WO2016158672A1 (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6418248B2 (ja) * | 2015-09-30 | 2018-11-07 | 東レ株式会社 | ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置、並びにその製造方法 |
WO2018123853A1 (ja) | 2016-12-26 | 2018-07-05 | 東レ株式会社 | 有機el表示装置 |
JP6991712B2 (ja) * | 2016-12-28 | 2022-01-12 | 日鉄ケミカル&マテリアル株式会社 | 着色ポリイミドフィルム、カバーレイフィルム、銅張積層板及び回路基板 |
KR102008766B1 (ko) * | 2017-01-31 | 2019-08-09 | 주식회사 엘지화학 | 가요성 기판 제조용 적층체 및 이를 이용한 가요성 기판의 제조방법 |
JP6891880B2 (ja) * | 2017-03-28 | 2021-06-18 | 東レ株式会社 | 感光性樹脂組成物、硬化膜、硬化膜を具備する素子、硬化膜を具備する有機el表示装置、硬化膜の製造方法、および有機el表示装置の製造方法 |
CN110392864B (zh) | 2017-03-29 | 2023-05-23 | 东丽株式会社 | 负型感光性树脂组合物、固化膜、具备固化膜的元件及有机el显示器、以及其制造方法 |
WO2018216571A1 (ja) * | 2017-05-24 | 2018-11-29 | 東レ株式会社 | 透明樹脂組成物、透明被膜および透明樹脂被覆ガラス基板 |
JP2018205605A (ja) * | 2017-06-07 | 2018-12-27 | 三菱ケミカル株式会社 | 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明 |
WO2019065902A1 (ja) | 2017-09-29 | 2019-04-04 | 東レ株式会社 | 感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機elディスプレイ、並びに有機elディスプレイの製造方法 |
US20210191264A1 (en) | 2017-10-31 | 2021-06-24 | Toray Industries, Inc. | Negative photosensitive resin composition, cured film, and organic el display and manufacturing method therefor |
KR102244472B1 (ko) * | 2018-03-07 | 2021-04-23 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 화소 격벽층 및 디스플레이 장치 |
JP2020061063A (ja) * | 2018-10-12 | 2020-04-16 | 住友化学株式会社 | 光学積層体及びその製造方法 |
WO2020090567A1 (ja) | 2018-10-31 | 2020-05-07 | 住友化学株式会社 | 硬化性組成物、膜、積層体及び表示装置 |
JP7322753B2 (ja) * | 2020-03-03 | 2023-08-08 | 東レ株式会社 | 感光性樹脂組成物、遮光層及びタッチセンサーパネル |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060159839A1 (en) * | 2003-06-02 | 2006-07-20 | Toray Industries, Inc. | Photosensitive resin composition, electronic component using the same, and display using same |
US20100193784A1 (en) * | 2009-02-04 | 2010-08-05 | Sony Corporation | Thin-film transistor and display device |
US20100309151A1 (en) * | 2009-06-04 | 2010-12-09 | Au Optronics Corp. | Touch panel and method for manufacturing the same |
US20140011125A1 (en) * | 2011-03-25 | 2014-01-09 | Yoshihiko Inoue | Black resin composition, resin black matrix substrate, and touch panel |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5756260A (en) * | 1993-02-16 | 1998-05-26 | Sumitomo Bakelite Company Limited | Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same |
JP4360168B2 (ja) * | 2002-10-01 | 2009-11-11 | 東レ株式会社 | ポジ型感光性樹脂組成物 |
JP2007023149A (ja) * | 2005-07-15 | 2007-02-01 | National Institute Of Advanced Industrial & Technology | 導電性が制御されたカーボンナノチューブ分散ポリイミド |
JP5191197B2 (ja) | 2007-09-27 | 2013-04-24 | 富士フイルム株式会社 | 加工顔料、それを用いた顔料分散組成物及び着色感光性組成物、並びにカラーフィルタ |
JP2010195879A (ja) * | 2009-02-24 | 2010-09-09 | Nitto Denko Corp | カーボンブラック分散液およびこれを用いた半導電性ポリイミドベルトの製造方法 |
JP5523919B2 (ja) | 2009-08-31 | 2014-06-18 | 富士フイルム株式会社 | 着色組成物、着色感光性組成物、カラーフィルタ、固体撮像素子、及び液晶表示素子 |
CN102985876A (zh) * | 2010-07-14 | 2013-03-20 | 株式会社Lg化学 | 正型光敏树脂组合物及包含其的有机发光装置遮屏 |
CN102336910B (zh) * | 2010-07-14 | 2015-04-08 | 株式会社Lg化学 | 可低温固化的聚酰亚胺树脂及其制备方法 |
CN103797418B (zh) * | 2011-06-24 | 2017-06-13 | 东京应化工业株式会社 | 一种负型感光性树脂组合物、图案形成方法、固化膜、绝缘膜、滤色器及显示装置 |
WO2013024849A1 (ja) * | 2011-08-18 | 2013-02-21 | 東レ株式会社 | ポリアミド酸樹脂組成物、ポリイミド樹脂組成物およびポリイミドオキサゾール樹脂組成物ならびにそれらを含有するフレキシブル基板 |
JP2013181136A (ja) * | 2012-03-02 | 2013-09-12 | Fuji Xerox Co Ltd | ポリイミド前駆体組成物、無端ベルトの製造方法、及び画像形成装置 |
CN102827526B (zh) * | 2012-08-23 | 2015-04-15 | 京东方科技集团股份有限公司 | 高阻抗材料以及包括该材料的显示基板黑矩阵和液晶显示装置 |
-
2016
- 2016-03-24 KR KR1020177020675A patent/KR101799819B1/ko active IP Right Grant
- 2016-03-24 JP JP2016534265A patent/JP6172395B2/ja active Active
- 2016-03-24 WO PCT/JP2016/059409 patent/WO2016158672A1/ja active Application Filing
- 2016-03-24 CN CN201680016918.2A patent/CN107406673B/zh active Active
- 2016-03-24 SG SG11201707367VA patent/SG11201707367VA/en unknown
- 2016-03-28 TW TW105109675A patent/TWI675257B/zh active
-
2017
- 2017-09-26 US US15/715,985 patent/US20180039176A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060159839A1 (en) * | 2003-06-02 | 2006-07-20 | Toray Industries, Inc. | Photosensitive resin composition, electronic component using the same, and display using same |
US20100193784A1 (en) * | 2009-02-04 | 2010-08-05 | Sony Corporation | Thin-film transistor and display device |
US20100309151A1 (en) * | 2009-06-04 | 2010-12-09 | Au Optronics Corp. | Touch panel and method for manufacturing the same |
US20140011125A1 (en) * | 2011-03-25 | 2014-01-09 | Yoshihiko Inoue | Black resin composition, resin black matrix substrate, and touch panel |
Also Published As
Publication number | Publication date |
---|---|
KR20170124530A (ko) | 2017-11-10 |
US20180039176A1 (en) | 2018-02-08 |
JPWO2016158672A1 (ja) | 2017-04-27 |
SG11201707367VA (en) | 2017-10-30 |
WO2016158672A1 (ja) | 2016-10-06 |
CN107406673B (zh) | 2019-09-06 |
KR101799819B1 (ko) | 2017-11-21 |
CN107406673A (zh) | 2017-11-28 |
JP6172395B2 (ja) | 2017-08-02 |
TW201701076A (zh) | 2017-01-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI675257B (zh) | 著色樹脂組成物、著色膜、裝飾基板及觸控面板 | |
CN108885399B (zh) | 负型感光性树脂组合物、固化膜、具备固化膜的显示装置、及其制造方法 | |
TWI425042B (zh) | 黑色樹脂組成物、樹脂黑矩陣、彩色濾光片、及液晶顯示裝置 | |
TWI575314B (zh) | 感光性黑色樹脂組成物及樹脂黑矩陣基板 | |
TWI708995B (zh) | 具有間隔件功能之遮光膜用之感光性樹脂組成物、遮光膜、液晶顯示裝置、具有間隔件功能之遮光膜用之感光性樹脂組成物的製造方法、遮光膜之製造方法、及液晶顯示裝置之製造方法 | |
TW201441676A (zh) | 黑矩陣基板及其製造方法、彩色濾光片基板、發光裝置、液晶顯示裝置以及彩色濾光片的製造方法 | |
CN111263917A (zh) | 负型感光性树脂组合物、固化膜以及有机el显示器及其制造方法 | |
JP2014058672A (ja) | 着色剤分散液 | |
TWI597530B (zh) | Resin black matrix substrate and touch panel | |
JP2015068893A (ja) | 樹脂ブラックマトリクス基板 | |
TWI627498B (zh) | 彩色光阻組成物、彩色濾光片、液晶顯示裝置及有機el顯示裝置 | |
WO2014208348A1 (ja) | タッチパネル用黒色樹脂組成物 | |
TW201817749A (zh) | 負型感光性樹脂組成物、硬化膜、具備硬化膜之元件、具備元件之顯示裝置、及有機el顯示器 | |
JP2015001654A (ja) | 積層樹脂ブラックマトリクス基板の製造方法 | |
TWI709818B (zh) | 具有間隔件功能的遮光膜用的感光性樹脂組成物、遮光膜、液晶顯示裝置、具有間隔件功能的遮光膜用的感光性樹脂組成物的製造方法、遮光膜的製造方法以及液晶顯示裝置的製造方法 | |
TWI757428B (zh) | 著色組成物、使用其之彩色濾光片基板及顯示裝置 | |
JP6330412B2 (ja) | 遮光膜形成基板及びタッチパネル | |
JP2015001655A (ja) | 積層樹脂ブラックマトリックス基板 | |
JP6331314B2 (ja) | フレキシブルカラーフィルター、その製造方法ならびにそれを用いたフレキシブル発光デバイス | |
JP2015194647A (ja) | カラーフィルター用着色樹脂組成物 | |
JP2015194646A (ja) | カラーフィルター用着色樹脂組成物 | |
WO2018025417A1 (ja) | 着色樹脂組成物、着色膜、加飾基板及びタッチパネル | |
JP2015152878A (ja) | カラーフィルター用着色樹脂組成物 | |
JP2014186066A (ja) | 着色樹脂組成物 | |
JP2016161847A (ja) | カラーフィルター用着色樹脂組成物 |