TWI538020B - 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法 - Google Patents

自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法 Download PDF

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Publication number
TWI538020B
TWI538020B TW100131097A TW100131097A TWI538020B TW I538020 B TWI538020 B TW I538020B TW 100131097 A TW100131097 A TW 100131097A TW 100131097 A TW100131097 A TW 100131097A TW I538020 B TWI538020 B TW I538020B
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TW
Taiwan
Prior art keywords
reaction
boron
temperature
reaction zone
zone
Prior art date
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TW100131097A
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English (en)
Chinese (zh)
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TW201218254A (en
Inventor
帛爾歐雷格
瓊斯愛德華Ｅ
比迪奇藍吉威
史溫尼約瑟夫Ｄ
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安特格利斯公司
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Publication of TW201218254A publication Critical patent/TW201218254A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0285—Heating or cooling the reactor
    • H10P30/20—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
    • B01J8/0446—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical
    • B01J8/0461—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical annular shaped beds
    • B01J8/0465—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical annular shaped beds the beds being concentric
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/06—Boron halogen compounds
    • C01B35/061—Halides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00433—Controlling the temperature using electromagnetic heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00539—Pressure

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
TW100131097A 2010-08-30 2011-08-30 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法 TWI538020B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37837510P 2010-08-30 2010-08-30

Publications (2)

Publication Number Publication Date
TW201218254A TW201218254A (en) 2012-05-01
TWI538020B true TWI538020B (zh) 2016-06-11

Family

ID=45697555

Family Applications (2)

Application Number Title Priority Date Filing Date
TW100131097A TWI538020B (zh) 2010-08-30 2011-08-30 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法
TW105109704A TWI575574B (zh) 2010-08-30 2011-08-30 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW105109704A TWI575574B (zh) 2010-08-30 2011-08-30 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法

Country Status (7)

Country Link
US (2) US9205392B2 (enExample)
EP (1) EP2612349A4 (enExample)
JP (2) JP5908476B2 (enExample)
KR (1) KR101902022B1 (enExample)
CN (2) CN103201824B (enExample)
TW (2) TWI538020B (enExample)
WO (1) WO2012030679A2 (enExample)

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TWI583442B (zh) 2011-10-10 2017-05-21 恩特葛瑞斯股份有限公司 Ｂ２ｆ４之製造程序
US10744426B2 (en) 2015-12-31 2020-08-18 Crystaphase Products, Inc. Structured elements and methods of use
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CN110656024B (zh) * 2018-06-29 2024-06-04 厦门大学 微流控芯片和生化检测装置
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Also Published As

Publication number Publication date
KR101902022B1 (ko) 2018-09-27
US9205392B2 (en) 2015-12-08
EP2612349A4 (en) 2016-09-14
US20160107136A1 (en) 2016-04-21
EP2612349A2 (en) 2013-07-10
CN106237934A (zh) 2016-12-21
WO2012030679A3 (en) 2012-07-05
KR20130101035A (ko) 2013-09-12
TWI575574B (zh) 2017-03-21
US9764298B2 (en) 2017-09-19
JP2013542901A (ja) 2013-11-28
CN106237934B (zh) 2019-08-27
US20120051994A1 (en) 2012-03-01
JP5908476B2 (ja) 2016-04-26
WO2012030679A2 (en) 2012-03-08
JP2016120496A (ja) 2016-07-07
TW201630055A (zh) 2016-08-16
CN103201824A (zh) 2013-07-10
CN103201824B (zh) 2016-09-07
TW201218254A (en) 2012-05-01

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