TWI489205B - 包含不同寫入共聚單體之光聚合物調配物 - Google Patents

包含不同寫入共聚單體之光聚合物調配物 Download PDF

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Publication number
TWI489205B
TWI489205B TW099137565A TW99137565A TWI489205B TW I489205 B TWI489205 B TW I489205B TW 099137565 A TW099137565 A TW 099137565A TW 99137565 A TW99137565 A TW 99137565A TW I489205 B TWI489205 B TW I489205B
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Taiwan
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weight
photopolymer formulation
acrylate
writing
photopolymer
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TW099137565A
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English (en)
Chinese (zh)
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TW201133139A (en
Inventor
Marc-Stephan Weiser
Friedrich-Karl Bruder
Thomas Roelle
Thomas Faecke
Dennis Hoenel
Joerg Hofmann
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Bayer Materialscience Ag
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08Processes
    • C08G18/10Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/42Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/4236Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups
    • C08G18/4238Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups derived from dicarboxylic acids and dialcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/42Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/4266Polycondensates having carboxylic or carbonic ester groups in the main chain prepared from hydroxycarboxylic acids and/or lactones
    • C08G18/4269Lactones
    • C08G18/4277Caprolactone and/or substituted caprolactone
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/42Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/44Polycarbonates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • C08G18/4825Polyethers containing two hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • C08G18/4833Polyethers containing oxyethylene units
    • C08G18/4837Polyethers containing oxyethylene units and other oxyalkylene units
    • C08G18/485Polyethers containing oxyethylene units and other oxyalkylene units containing mixed oxyethylene-oxypropylene or oxyethylene-higher oxyalkylene end groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • C08G18/4854Polyethers containing oxyalkylene groups having four carbon atoms in the alkylene group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/77Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78Nitrogen
    • C08G18/7806Nitrogen containing -N-C=0 groups
    • C08G18/7818Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups
    • C08G18/7831Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups containing biuret groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/77Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78Nitrogen
    • C08G18/7806Nitrogen containing -N-C=0 groups
    • C08G18/7818Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups
    • C08G18/7837Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups containing allophanate groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/77Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78Nitrogen
    • C08G18/7875Nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring
    • C08G18/7887Nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring having two nitrogen atoms in the ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/77Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78Nitrogen
    • C08G18/79Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
    • C08G18/791Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
    • C08G18/792Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups formed by oligomerisation of aliphatic and/or cycloaliphatic isocyanates or isothiocyanates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403Layers; Shape, structure or physical properties thereof
    • G11B7/24035Recording layers
    • G11B7/24044Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0016Plasticisers
    • GPHYSICS
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    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026Recording materials or recording processes
    • G03H2001/0264Organic recording material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00Recording materials or recording processes
    • G03H2260/12Photopolymer

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Holo Graphy (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
TW099137565A 2009-11-03 2010-11-02 包含不同寫入共聚單體之光聚合物調配物 TWI489205B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP09013769 2009-11-03

Publications (2)

Publication Number Publication Date
TW201133139A TW201133139A (en) 2011-10-01
TWI489205B true TWI489205B (zh) 2015-06-21

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Family Applications (1)

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TW099137565A TWI489205B (zh) 2009-11-03 2010-11-02 包含不同寫入共聚單體之光聚合物調配物

Country Status (7)

Country Link
US (1) US8889322B2 (https=)
EP (1) EP2497083B1 (https=)
JP (1) JP5638085B2 (https=)
KR (1) KR101782182B1 (https=)
CN (1) CN102667935B (https=)
TW (1) TWI489205B (https=)
WO (1) WO2011054797A1 (https=)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102171267B (zh) * 2008-10-01 2014-09-03 拜尔材料科学股份公司 基于自显影聚合物的体全息记录用介质
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
RU2542981C9 (ru) * 2009-11-03 2015-12-10 Байер Матириальсайенс Аг Способ изготовления голографических сред
EP2496617B1 (de) * 2009-11-03 2015-02-25 Bayer Intellectual Property GmbH Urethane als additive in einer photopolymer-formulierung
WO2011054795A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
CN102741925B (zh) * 2009-11-03 2015-12-16 拜尔材料科学股份公司 生产全息膜的方法
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
US8808946B2 (en) * 2009-11-03 2014-08-19 Bayer Materialscience Ag Urethane acrylate having a high refractive index and reduced double bond density
PL2317511T3 (pl) 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
WO2011095442A1 (de) * 2010-02-02 2011-08-11 Bayer Materialscience Ag Photopolymer-formulierung mit ester-basierten schreibmonomeren
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
EP2766902A1 (de) 2011-10-12 2014-08-20 Bayer Intellectual Property GmbH Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
KR20140082692A (ko) 2011-10-12 2014-07-02 바이엘 인텔렉쳐 프로퍼티 게엠베하 폴리우레탄-기재 광중합체 제제에서의 사슬 전달 시약
EP2613318B1 (de) 2012-01-05 2014-07-30 Bayer Intellectual Property GmbH Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht
EP2613319A1 (de) 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag ハロー防止層を有するホログラフィック記録媒体およびその製造
PL3058423T3 (pl) 2013-10-17 2018-09-28 Covestro Deutschland Ag Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TG
TWI684782B (zh) * 2014-08-01 2020-02-11 德商拜耳材料科學股份有限公司 含光聚合物層與基材層之層狀結構
US10241402B2 (en) * 2014-12-12 2019-03-26 Covestro Deutschland Ag Naphthyl acrylates as writing monomers for photopolymers
CN107750379A (zh) * 2015-06-23 2018-03-02 科思创德国股份有限公司 作为光引发剂的新型三嗪及其制备
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
US11535713B2 (en) 2016-08-23 2022-12-27 The Regents Of The University Of Colorado, A Body Corporate Network polymers and methods of making and using same
KR102009421B1 (ko) 2017-04-25 2019-08-12 주식회사 엘지화학 포토폴리머 조성물
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含uv硬化性黏著層的塑膠膜
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
JP2020519943A (ja) 2017-05-09 2020-07-02 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag ホログラフィック露光用のフォトポリマー層と高耐性コーティング層を含むホログラフィック媒体
EP3622352B1 (de) 2017-05-09 2025-07-23 Covestro Deutschland AG System aus zwei trocken übertragbaren uv-härtenden lackschichten für den schutz eines hologramms in einem photopolymer-folienverbund
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
KR102268129B1 (ko) * 2017-10-16 2021-06-22 주식회사 엘지화학 비반응성 불소계 화합물 및 이를 포함하는 광중합성 조성물
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
KR102244648B1 (ko) 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
DE102018207251B4 (de) * 2018-05-09 2025-10-16 Bundesdruckerei Gmbh Verfahren zum Herstellen eines Sicherheitselements mit zwei Sicherheitsmerkmalen und Verwendung des Verfahrens
WO2019237117A1 (en) 2018-06-08 2019-12-12 The Regents Of The University Of Colorado, A Body Corporate High dynamic range two-stage photopolymers
US12391780B2 (en) 2019-02-18 2025-08-19 The Regents Of The University Of Colorado, A Body Corporate Network polymers and methods of making and using same
US20200354594A1 (en) * 2019-05-08 2020-11-12 Facebook Technologies, Llc Thermally reversible and reorganizable crosslinking polymers for volume bragg gratings
CN111045295B (zh) * 2019-12-25 2023-10-31 杭州光粒科技有限公司 金属纳米颗粒掺杂的光致聚合物组合物以及光栅
CN113527143B (zh) * 2020-04-20 2023-06-20 杭州光粒科技有限公司 书写单体及其制备方法以及光致聚合物组合物及其光栅
US20230228993A1 (en) 2020-06-15 2023-07-20 Saint-Gobain Glass France Composite pane with a holographic element and method for the production thereof
WO2021254872A1 (de) 2020-06-15 2021-12-23 Saint-Gobain Glass France Verbundscheibe mit einem holographischen element und verfahren zu deren herstellung
CN121195304A (zh) 2023-03-29 2025-12-23 三菱化学株式会社 全息记录用感光性组合物、全息记录介质、聚合物、大容量存储器、光学元件、ar导光板以及ar眼镜
WO2026084847A1 (en) * 2024-10-15 2026-04-23 Nitto Denko Corporation Mesh size control of holographic photopolymer and method for making the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200846379A (en) * 2007-02-05 2008-12-01 Nippon Steel Chemical Co Volume phase hologram recording material and optical information recording medium

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3374869D1 (en) * 1983-09-22 1988-01-21 Toray Industries Resin material for plastic lens and lens composed thereof
EP0223587B1 (en) 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
JP3339873B2 (ja) * 1992-03-23 2002-10-28 大日本印刷株式会社 ホログラム形成材料
US5470813A (en) 1993-11-23 1995-11-28 Arco Chemical Technology, L.P. Double metal cyanide complex catalysts
US5712216A (en) 1995-05-15 1998-01-27 Arco Chemical Technology, L.P. Highly active double metal cyanide complex catalysts
JP3050769B2 (ja) * 1994-03-18 2000-06-12 シャープ株式会社 液晶表示素子及びその製造方法
GB9410578D0 (en) * 1994-05-26 1994-07-13 London Hospital Med Coll Novel (meth)acrylate monomers and denture base compositions prepared therefrom
US5482908A (en) 1994-09-08 1996-01-09 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5679710A (en) * 1994-11-01 1997-10-21 London Hospital Medical College High refractive index and/or radio-opaque resins systems
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
US5545601A (en) 1995-08-22 1996-08-13 Arco Chemical Technology, L.P. Polyether-containing double metal cyanide catalysts
US5627120A (en) 1996-04-19 1997-05-06 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5714428A (en) 1996-10-16 1998-02-03 Arco Chemical Technology, L.P. Double metal cyanide catalysts containing functionalized polymers
JP3951344B2 (ja) * 1997-03-19 2007-08-01 Jsr株式会社 感光性樹脂組成物
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
DE19905611A1 (de) 1999-02-11 2000-08-17 Bayer Ag Doppelmetallcyanid-Katalysatoren für die Herstellung von Polyetherpolyolen
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
US6403702B1 (en) * 1999-12-03 2002-06-11 Bayer Corporation Diurethane plasticizer containing one-shot polyurethane cast elastomers
AU2002223792A1 (en) * 2000-11-10 2002-05-21 Durand Technology Limited Optical recording materials
JP2003165807A (ja) * 2001-11-30 2003-06-10 Sumitomo Chem Co Ltd 光散乱シート用樹脂組成物及びそれの液晶表示分野への使用
JP4071525B2 (ja) * 2002-04-08 2008-04-02 メモリーテック株式会社 光情報記録媒体
JP2003307733A (ja) * 2002-04-18 2003-10-31 Nitto Denko Corp 反射型液晶表示装置
US6864019B2 (en) 2002-06-27 2005-03-08 Imation Corp. Recording material formulations for holographic media
US20060128822A1 (en) * 2002-07-30 2006-06-15 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
JP4095474B2 (ja) 2003-03-13 2008-06-04 株式会社東芝 光情報記録媒体および情報記録方法
JP4466141B2 (ja) * 2003-09-17 2010-05-26 コニカミノルタエムジー株式会社 ホログラフィック記録用組成物、ホログラフィック記録メディア、ホログラフィック記録方法及びホログラフィック情報メディア
JP4466140B2 (ja) 2003-11-27 2010-05-26 コニカミノルタエムジー株式会社 ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア
JPWO2005078531A1 (ja) * 2004-02-13 2007-10-18 東亞合成株式会社 体積型ホログラム記録材料および体積ホログラム記録媒体
JP2005241820A (ja) * 2004-02-25 2005-09-08 Toshiba Corp ホログラム記録媒体及びその記録方法
EP1746469A1 (en) * 2004-05-10 2007-01-24 Konica Minolta Medical & Graphic Inc. Holographic recording medium, holographic recording method, and holographic information medium
JP2006152105A (ja) * 2004-11-29 2006-06-15 Jsr Corp 光硬化性樹脂組成物及び光学部材
US8941904B2 (en) * 2005-07-04 2015-01-27 Dai Nippon Printing Co., Ltd. Hologram sheet and hologram observation sheet using same, and blinding device
TW200702954A (en) * 2005-07-11 2007-01-16 Toagosei Co Ltd Volume hologram recording material, the method of processing thereof and the recording medium
JP2007041160A (ja) * 2005-08-01 2007-02-15 Fujifilm Corp 光記録用組成物及び光記録媒体
JP2008081726A (ja) * 2006-08-30 2008-04-10 Sanyo Electric Co Ltd 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子
JP4785001B2 (ja) * 2007-03-20 2011-10-05 日本電信電話株式会社 光記録媒体
US8192898B2 (en) * 2007-03-30 2012-06-05 Daikin Industries, Ltd. Composition for fluorine-containing volume holographic data recording material and fluorine-containing volume holographic data recording media made of same
JPWO2008123302A1 (ja) * 2007-03-30 2010-07-15 ダイキン工業株式会社 含フッ素体積型ホログラム記録用感光性組成物ならびにそれを用いた含フッ素体積型ホログラム記録用感光性媒体および含フッ素体積型ホログラム
CN101034257B (zh) * 2007-04-06 2010-09-08 上海复旦天臣新技术有限公司 用于全息记录的感光薄膜及其制备方法
DE602008005437D1 (de) 2007-04-11 2011-04-21 Bayer Materialscience Ag Strahlungsvernetzende und wärmevernetzende pu-systeme auf der basis von isocyanat-reaktiven blockcopolymeren
WO2008125201A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Radiation-crosslinking and thermally crosslinking pu systems comprising iminooxadiazinedione
JP5495238B2 (ja) * 2007-04-11 2014-05-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト ホログラフィ用途用の有利な記録媒体
CN101668782A (zh) * 2007-04-11 2010-03-10 拜尔材料科学股份公司 具有高折射指数的芳族脲烷丙烯酸酯类
JP2008268514A (ja) * 2007-04-19 2008-11-06 Fujifilm Corp 光記録用組成物およびホログラフィック記録媒体
WO2009067788A1 (en) * 2007-11-27 2009-06-04 Southbourne Investments Ltd. Holographic recording medium
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
DE502008002161D1 (de) * 2008-08-08 2011-02-10 Bayer Materialscience Ag Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
CN102171267B (zh) * 2008-10-01 2014-09-03 拜尔材料科学股份公司 基于自显影聚合物的体全息记录用介质
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200997A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
KR101720807B1 (ko) * 2008-10-01 2017-03-28 코베스트로 도이칠란드 아게 홀로그래피 매체의 제조를 위한 예비중합체-기재 폴리우레탄 제제
IL200995A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218744A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien
EP2218743A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
JP2010230911A (ja) * 2009-03-26 2010-10-14 Tdk Corp 光学デバイス
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
TW201133264A (en) * 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
US8808946B2 (en) * 2009-11-03 2014-08-19 Bayer Materialscience Ag Urethane acrylate having a high refractive index and reduced double bond density
RU2542981C9 (ru) * 2009-11-03 2015-12-10 Байер Матириальсайенс Аг Способ изготовления голографических сред
EP2496549B1 (de) * 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
CN102741925B (zh) * 2009-11-03 2015-12-16 拜尔材料科学股份公司 生产全息膜的方法
WO2011054795A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Fluorurethane als additive in einer photopolymer-formulierung
EP2496617B1 (de) * 2009-11-03 2015-02-25 Bayer Intellectual Property GmbH Urethane als additive in einer photopolymer-formulierung
PL2317511T3 (pl) * 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
WO2011095442A1 (de) * 2010-02-02 2011-08-11 Bayer Materialscience Ag Photopolymer-formulierung mit ester-basierten schreibmonomeren
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
RU2013110226A (ru) * 2010-08-11 2014-09-20 Байер Интеллектуэль Проперти Гмбх Дифункциональные (мет)-акрилатные пишущие мономеры
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200846379A (en) * 2007-02-05 2008-12-01 Nippon Steel Chemical Co Volume phase hologram recording material and optical information recording medium

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