PL3058423T3 - Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TG - Google Patents
Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TGInfo
- Publication number
- PL3058423T3 PL3058423T3 PL14783851T PL14783851T PL3058423T3 PL 3058423 T3 PL3058423 T3 PL 3058423T3 PL 14783851 T PL14783851 T PL 14783851T PL 14783851 T PL14783851 T PL 14783851T PL 3058423 T3 PL3058423 T3 PL 3058423T3
- Authority
- PL
- Poland
- Prior art keywords
- borates
- low
- holographic media
- photopolymer formulation
- producing holographic
- Prior art date
Links
- 150000001642 boronic acid derivatives Chemical class 0.000 title 1
- 238000009472 formulation Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/62—Quaternary ammonium compounds
- C07C211/63—Quaternary ammonium compounds having quaternised nitrogen atoms bound to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
- C07D213/20—Quaternary compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/037—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements with quaternary ring nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0248—Volume holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Polyurethanes Or Polyureas (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13189138 | 2013-10-17 | ||
| EP14783851.0A EP3058423B1 (de) | 2013-10-17 | 2014-10-13 | Photopolymer-formulierung zur herstellung holographischer medien mit boraten mit niedriger tg |
| PCT/EP2014/071877 WO2015055576A1 (de) | 2013-10-17 | 2014-10-13 | Photopolymer-formulierung zur herstellung holographischer medien mit boraten mit niedriger tg |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL3058423T3 true PL3058423T3 (pl) | 2018-09-28 |
Family
ID=49356353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL14783851T PL3058423T3 (pl) | 2013-10-17 | 2014-10-13 | Formulacja fotopolimerowa do wytwarzania mediów holograficznych z boranami o niskiej TG |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US10001703B2 (pl) |
| EP (1) | EP3058423B1 (pl) |
| JP (1) | JP6446446B2 (pl) |
| KR (1) | KR102315409B1 (pl) |
| CN (1) | CN105814487B (pl) |
| ES (1) | ES2679543T3 (pl) |
| PL (1) | PL3058423T3 (pl) |
| TR (1) | TR201809751T4 (pl) |
| TW (1) | TW201527865A (pl) |
| WO (1) | WO2015055576A1 (pl) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016539023A (ja) * | 2013-10-30 | 2016-12-15 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | 基板及びフォトポリマー膜を含む複合体 |
| TWI698326B (zh) | 2015-01-14 | 2020-07-11 | 德商科思創德意志股份有限公司 | 以全相光學元件製備光學鑄件之方法及光學鑄件 |
| US11078218B2 (en) | 2016-11-09 | 2021-08-03 | Covestro Deutschland Ag | Process for the production of triaryl organoborates |
| US11098066B2 (en) | 2016-11-09 | 2021-08-24 | Covestro Deutschland Ag | Method for producing triarylorganoborates |
| KR102499972B1 (ko) | 2016-11-09 | 2023-02-15 | 코베스트로 도이칠란트 아게 | 트리아릴-유기 보레이트를 제조하는 방법 |
| WO2018105537A1 (ja) * | 2016-12-08 | 2018-06-14 | 株式会社日本触媒 | 光ルイス酸発生剤 |
| KR102239212B1 (ko) | 2018-12-14 | 2021-04-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| CN115280204B (zh) * | 2020-09-14 | 2023-11-10 | 株式会社Lg化学 | 全息光学元件及用于制造其的方法 |
| WO2023156485A1 (de) | 2022-02-21 | 2023-08-24 | Covestro Deutschland Ag | Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen |
| WO2023156482A1 (de) | 2022-02-21 | 2023-08-24 | Covestro Deutschland Ag | Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit |
| WO2023156484A1 (de) | 2022-02-21 | 2023-08-24 | Covestro Deutschland Ag | Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich |
| CN115322186A (zh) * | 2022-08-17 | 2022-11-11 | 南京工业大学 | 一种光动力抑菌剂及其制备方法和应用 |
| WO2024052256A1 (de) | 2022-09-07 | 2024-03-14 | Covestro Deutschland Ag | Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS5313239B2 (pl) * | 1973-10-26 | 1978-05-09 | ||
| US4033905A (en) * | 1975-11-05 | 1977-07-05 | Rca Corporation | Method for increasing the conductivity of electrically resistive organic materials |
| EP0223587B1 (en) | 1985-11-20 | 1991-02-13 | The Mead Corporation | Photosensitive materials containing ionic dye compounds as initiators |
| US5153100A (en) * | 1990-08-27 | 1992-10-06 | E. I. Du Pont De Nemours And Company | Borate coinitiators for photopolymerizable compositions |
| JPH0967406A (ja) * | 1995-09-04 | 1997-03-11 | Toppan Printing Co Ltd | 光重合性組成物 |
| TW467933B (en) | 1995-11-24 | 2001-12-11 | Ciba Sc Holding Ag | Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof |
| MY132867A (en) | 1995-11-24 | 2007-10-31 | Ciba Specialty Chemicals Holding Inc | Acid-stable borates for photopolymerization |
| AU717137B2 (en) * | 1995-11-24 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Borate coinitiators for photopolymerization |
| TW466256B (en) * | 1995-11-24 | 2001-12-01 | Ciba Sc Holding Ag | Borate photoinitiator compounds and compositions comprising the same |
| JPH09241614A (ja) * | 1996-03-04 | 1997-09-16 | Toyo Ink Mfg Co Ltd | 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物 |
| US6165686A (en) * | 1997-05-22 | 2000-12-26 | Showa Denko K.K. | Photocurable composition and color reversion preventing method |
| US6218076B1 (en) * | 1997-08-26 | 2001-04-17 | Showa Denko K.K. | Stabilizer for organic borate salts and photosensitive composition containing the same |
| JP4005258B2 (ja) * | 1999-03-15 | 2007-11-07 | 富士フイルム株式会社 | 光重合性組成物、感光感熱記録材料及び画像記録方法 |
| JP2003114520A (ja) * | 2001-10-05 | 2003-04-18 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
| JP2003321476A (ja) * | 2002-05-01 | 2003-11-11 | Fuji Photo Film Co Ltd | 有機ボレート塩の製造方法 |
| JP2003322968A (ja) * | 2002-05-01 | 2003-11-14 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
| US7678507B2 (en) * | 2006-01-18 | 2010-03-16 | Inphase Technologies, Inc. | Latent holographic media and method |
| TW200830050A (en) * | 2006-09-21 | 2008-07-16 | Fujifilm Corp | Resist composition and pattern-forming method using the same |
| RU2009141367A (ru) * | 2007-04-11 | 2011-05-20 | Байер МатириальСайенс АГ (DE) | Ароматические уретанакрилаты, имеющие высокий показатель преломления |
| IL200997A0 (en) | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Special polyether-based polyurethane formulations for the production of holographic media |
| EP2218743A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme |
| EP2497083B1 (de) | 2009-11-03 | 2013-12-25 | Bayer Intellectual Property GmbH | Photopolymer-formulierung mit verschiedenen schreibcomonomeren |
| ES2453267T3 (es) | 2009-11-03 | 2014-04-07 | Bayer Intellectual Property Gmbh | Procedimiento de fabricación de una película holográfica |
| WO2011054799A2 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Urethane als additive in einer photopolymer-formulierung |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| WO2013053792A1 (de) * | 2011-10-12 | 2013-04-18 | Bayer Intellectual Property Gmbh | Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| PL2613318T3 (pl) * | 2012-01-05 | 2014-12-31 | Bayer Ip Gmbh | Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową |
-
2014
- 2014-10-13 US US15/029,080 patent/US10001703B2/en active Active
- 2014-10-13 PL PL14783851T patent/PL3058423T3/pl unknown
- 2014-10-13 KR KR1020167012505A patent/KR102315409B1/ko active IP Right Grant
- 2014-10-13 WO PCT/EP2014/071877 patent/WO2015055576A1/de active Application Filing
- 2014-10-13 TR TR2018/09751T patent/TR201809751T4/tr unknown
- 2014-10-13 EP EP14783851.0A patent/EP3058423B1/de active Active
- 2014-10-13 CN CN201480069298.XA patent/CN105814487B/zh active Active
- 2014-10-13 JP JP2016523204A patent/JP6446446B2/ja active Active
- 2014-10-13 ES ES14783851.0T patent/ES2679543T3/es active Active
- 2014-10-15 TW TW103135608A patent/TW201527865A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ES2679543T3 (es) | 2018-08-28 |
| KR102315409B1 (ko) | 2021-10-21 |
| US10001703B2 (en) | 2018-06-19 |
| US20160252808A1 (en) | 2016-09-01 |
| JP6446446B2 (ja) | 2018-12-26 |
| WO2015055576A1 (de) | 2015-04-23 |
| KR20160072158A (ko) | 2016-06-22 |
| CN105814487B (zh) | 2019-11-08 |
| CN105814487A (zh) | 2016-07-27 |
| EP3058423A1 (de) | 2016-08-24 |
| TR201809751T4 (tr) | 2018-07-23 |
| TW201527865A (zh) | 2015-07-16 |
| EP3058423B1 (de) | 2018-04-18 |
| JP2016537452A (ja) | 2016-12-01 |
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