CN102667935B - 具有不同书写共聚单体的光聚合物制剂 - Google Patents

具有不同书写共聚单体的光聚合物制剂 Download PDF

Info

Publication number
CN102667935B
CN102667935B CN201080060489.1A CN201080060489A CN102667935B CN 102667935 B CN102667935 B CN 102667935B CN 201080060489 A CN201080060489 A CN 201080060489A CN 102667935 B CN102667935 B CN 102667935B
Authority
CN
China
Prior art keywords
formulation according
photopolymer formulation
weight
acrylate
writing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201080060489.1A
Other languages
English (en)
Chinese (zh)
Other versions
CN102667935A (zh
Inventor
M-S.魏泽
F-K.布鲁德
T.罗勒
T.费克
D.赫内尔
J.霍夫曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Bayer Intellectual Property GmbH
Original Assignee
Bayer MaterialScience AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer MaterialScience AG filed Critical Bayer MaterialScience AG
Publication of CN102667935A publication Critical patent/CN102667935A/zh
Application granted granted Critical
Publication of CN102667935B publication Critical patent/CN102667935B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08—Processes
    • C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/4236—Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups
    • C08G18/4238—Polycondensates having carboxylic or carbonic ester groups in the main chain containing only aliphatic groups derived from dicarboxylic acids and dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/4266—Polycondensates having carboxylic or carbonic ester groups in the main chain prepared from hydroxycarboxylic acids and/or lactones
    • C08G18/4269—Lactones
    • C08G18/4277—Caprolactone and/or substituted caprolactone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/44—Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4825—Polyethers containing two hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4833—Polyethers containing oxyethylene units
    • C08G18/4837—Polyethers containing oxyethylene units and other oxyalkylene units
    • C08G18/485—Polyethers containing oxyethylene units and other oxyalkylene units containing mixed oxyethylene-oxypropylene or oxyethylene-higher oxyalkylene end groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4854—Polyethers containing oxyalkylene groups having four carbon atoms in the alkylene group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/7806—Nitrogen containing -N-C=0 groups
    • C08G18/7818—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups
    • C08G18/7831—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups containing biuret groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/7806—Nitrogen containing -N-C=0 groups
    • C08G18/7818—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups
    • C08G18/7837—Nitrogen containing -N-C=0 groups containing ureum or ureum derivative groups containing allophanate groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/7875—Nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring
    • C08G18/7887—Nitrogen containing heterocyclic rings having at least one nitrogen atom in the ring having two nitrogen atoms in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
    • C08G18/78—Nitrogen
    • C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
    • C08G18/791—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
    • C08G18/792—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups formed by oligomerisation of aliphatic and/or cycloaliphatic isocyanates or isothiocyanates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0016—Plasticisers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Holo Graphy (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
CN201080060489.1A 2009-11-03 2010-11-02 具有不同书写共聚单体的光聚合物制剂 Active CN102667935B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013769.6 2009-11-03
EP09013769 2009-11-03
PCT/EP2010/066594 WO2011054797A1 (de) 2009-11-03 2010-11-02 Photopolymer-formulierung mit verschiedenen schreibcomonomeren

Publications (2)

Publication Number Publication Date
CN102667935A CN102667935A (zh) 2012-09-12
CN102667935B true CN102667935B (zh) 2016-01-20

Family

ID=41665175

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080060489.1A Active CN102667935B (zh) 2009-11-03 2010-11-02 具有不同书写共聚单体的光聚合物制剂

Country Status (7)

Country Link
US (1) US8889322B2 (https=)
EP (1) EP2497083B1 (https=)
JP (1) JP5638085B2 (https=)
KR (1) KR101782182B1 (https=)
CN (1) CN102667935B (https=)
TW (1) TWI489205B (https=)
WO (1) WO2011054797A1 (https=)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
US20110207029A1 (en) * 2008-10-01 2011-08-25 Bayer Materialscience Ag Media for volume-holographic recording based on self-developing polymer
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
ES2446344T3 (es) * 2009-11-03 2014-03-07 Bayer Intellectual Property Gmbh Procedimiento para la producción de una película holográfica
PT2497085E (pt) * 2009-11-03 2014-03-27 Bayer Ip Gmbh Processo para a produção de um filme holográfico
ES2433235T3 (es) * 2009-11-03 2013-12-10 Bayer Intellectual Property Gmbh Fluorouretanos como aditivos en una formulación de fotopolímero
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
JP5925687B2 (ja) * 2009-11-03 2016-05-25 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ ホログラフィック媒体の製造方法
EP2317511B1 (de) 2009-11-03 2012-03-07 Bayer MaterialScience AG Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
WO2013053792A1 (de) 2011-10-12 2013-04-18 Bayer Intellectual Property Gmbh Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen
US20140255824A1 (en) 2011-10-12 2014-09-11 Bayer Intellectual Property Gmbh Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
EP2613319A1 (de) 2012-01-05 2013-07-10 Bayer MaterialScience AG Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht
PL2613318T3 (pl) 2012-01-05 2014-12-31 Bayer Ip Gmbh Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
EP2700510B1 (de) * 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ハロー防止層を有するホログラフィック記録媒体およびその製造
WO2015055576A1 (de) 2013-10-17 2015-04-23 Bayer Materialscience Ag Photopolymer-formulierung zur herstellung holographischer medien mit boraten mit niedriger tg
TWI684782B (zh) * 2014-08-01 2020-02-11 德商拜耳材料科學股份有限公司 含光聚合物層與基材層之層狀結構
KR102583200B1 (ko) * 2014-12-12 2023-09-27 코베스트로 도이칠란트 아게 광중합체에 대한 기록 단량체로서의 나프틸 아크릴레이트
CN107750379A (zh) * 2015-06-23 2018-03-02 科思创德国股份有限公司 作为光引发剂的新型三嗪及其制备
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
EP3504251B1 (en) 2016-08-23 2026-03-25 The Regents of the University of Colorado, a Body Corporate Network polymers and methods of making and using same
KR102009421B1 (ko) 2017-04-25 2019-08-12 주식회사 엘지화학 포토폴리머 조성물
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
JP2020519943A (ja) 2017-05-09 2020-07-02 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ホログラフィック露光用のフォトポリマー層と高耐性コーティング層を含むホログラフィック媒体
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
KR20200006988A (ko) 2017-05-09 2020-01-21 코베스트로 도이칠란트 아게 광중합체 필름 복합체에서의 홀로그램의 보호를 위한 2개의 건조-적용가능한 uv-경화성 래커 층으로 이루어지는 시스템
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
KR102268129B1 (ko) * 2017-10-16 2021-06-22 주식회사 엘지화학 비반응성 불소계 화합물 및 이를 포함하는 광중합성 조성물
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
KR102244648B1 (ko) 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
DE102018207251B4 (de) * 2018-05-09 2025-10-16 Bundesdruckerei Gmbh Verfahren zum Herstellen eines Sicherheitselements mit zwei Sicherheitsmerkmalen und Verwendung des Verfahrens
US12071515B2 (en) 2018-06-08 2024-08-27 The Regents Of The University Of Colorado, A Body Corporate High dynamic range two-stage photopolymers
US12391780B2 (en) 2019-02-18 2025-08-19 The Regents Of The University Of Colorado, A Body Corporate Network polymers and methods of making and using same
US20200354594A1 (en) * 2019-05-08 2020-11-12 Facebook Technologies, Llc Thermally reversible and reorganizable crosslinking polymers for volume bragg gratings
CN111045295B (zh) * 2019-12-25 2023-10-31 杭州光粒科技有限公司 金属纳米颗粒掺杂的光致聚合物组合物以及光栅
CN113527143B (zh) * 2020-04-20 2023-06-20 杭州光粒科技有限公司 书写单体及其制备方法以及光致聚合物组合物及其光栅
CN114144243A (zh) 2020-06-15 2022-03-04 法国圣戈班玻璃厂 具有全息元件的复合玻璃板以及制造方法
CN114144244B (zh) 2020-06-15 2023-09-26 法国圣戈班玻璃厂 具有全息元件的复合玻璃板和制造方法
JPWO2024204550A1 (https=) 2023-03-29 2024-10-03

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
WO2008096712A1 (ja) * 2007-02-05 2008-08-14 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録材料及び光情報記録媒体
WO2008122226A1 (en) * 2007-04-06 2008-10-16 Shanghai Fudan Techsun New Technology Co. Ltd. Sensitive membrane for reflecting hologram record and preparation method thereof
WO2008125201A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Radiation-crosslinking and thermally crosslinking pu systems comprising iminooxadiazinedione
WO2008125229A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
CN101320208A (zh) * 2008-07-21 2008-12-10 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
US20080312403A1 (en) * 2007-04-11 2008-12-18 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index

Family Cites Families (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0134861B1 (en) * 1983-09-22 1987-12-09 Toray Industries, Inc. Resin material for plastic lens and lens composed thereof
EP0223587B1 (en) 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
JP3339873B2 (ja) * 1992-03-23 2002-10-28 大日本印刷株式会社 ホログラム形成材料
US5712216A (en) 1995-05-15 1998-01-27 Arco Chemical Technology, L.P. Highly active double metal cyanide complex catalysts
US5470813A (en) 1993-11-23 1995-11-28 Arco Chemical Technology, L.P. Double metal cyanide complex catalysts
JP3050769B2 (ja) * 1994-03-18 2000-06-12 シャープ株式会社 液晶表示素子及びその製造方法
GB9410578D0 (en) * 1994-05-26 1994-07-13 London Hospital Med Coll Novel (meth)acrylate monomers and denture base compositions prepared therefrom
US5482908A (en) 1994-09-08 1996-01-09 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5679710A (en) * 1994-11-01 1997-10-21 London Hospital Medical College High refractive index and/or radio-opaque resins systems
US5545601A (en) 1995-08-22 1996-08-13 Arco Chemical Technology, L.P. Polyether-containing double metal cyanide catalysts
US5627120A (en) 1996-04-19 1997-05-06 Arco Chemical Technology, L.P. Highly active double metal cyanide catalysts
US5714428A (en) 1996-10-16 1998-02-03 Arco Chemical Technology, L.P. Double metal cyanide catalysts containing functionalized polymers
JP3951344B2 (ja) * 1997-03-19 2007-08-01 Ｊｓｒ株式会社 感光性樹脂組成物
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
DE19905611A1 (de) 1999-02-11 2000-08-17 Bayer Ag Doppelmetallcyanid-Katalysatoren für die Herstellung von Polyetherpolyolen
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
US6403702B1 (en) * 1999-12-03 2002-06-11 Bayer Corporation Diurethane plasticizer containing one-shot polyurethane cast elastomers
JP4535309B2 (ja) * 2000-11-10 2010-09-01 デュランド テクノロジー リミテッド 光学記録材料
JP2003165807A (ja) * 2001-11-30 2003-06-10 Sumitomo Chem Co Ltd 光散乱シート用樹脂組成物及びそれの液晶表示分野への使用
JP4071525B2 (ja) * 2002-04-08 2008-04-02 メモリーテック株式会社 光情報記録媒体
JP2003307733A (ja) * 2002-04-18 2003-10-31 Nitto Denko Corp 反射型液晶表示装置
US6864019B2 (en) * 2002-06-27 2005-03-08 Imation Corp. Recording material formulations for holographic media
WO2004011522A1 (ja) * 2002-07-30 2004-02-05 Toagosei Co., Ltd. ホログラム記録用組成物およびその硬化方法ならびに硬化物
JP4095474B2 (ja) 2003-03-13 2008-06-04 株式会社東芝 光情報記録媒体および情報記録方法
JP4466141B2 (ja) * 2003-09-17 2010-05-26 コニカミノルタエムジー株式会社 ホログラフィック記録用組成物、ホログラフィック記録メディア、ホログラフィック記録方法及びホログラフィック情報メディア
JP4466140B2 (ja) 2003-11-27 2010-05-26 コニカミノルタエムジー株式会社 ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア
US20070172742A1 (en) * 2004-02-13 2007-07-26 Kentarou Yachi Volume hologram recording material and volume hologram recording medium
JP2005241820A (ja) * 2004-02-25 2005-09-08 Toshiba Corp ホログラム記録媒体及びその記録方法
JPWO2005109114A1 (ja) * 2004-05-10 2008-03-21 コニカミノルタエムジー株式会社 ホログラフィック記録メディア、ホログラフィック記録方法及びホログラフィック情報メディア
JP2006152105A (ja) * 2004-11-29 2006-06-15 Jsr Corp 光硬化性樹脂組成物及び光学部材
US8941904B2 (en) * 2005-07-04 2015-01-27 Dai Nippon Printing Co., Ltd. Hologram sheet and hologram observation sheet using same, and blinding device
TW200702954A (en) * 2005-07-11 2007-01-16 Toagosei Co Ltd Volume hologram recording material, the method of processing thereof and the recording medium
JP2007041160A (ja) * 2005-08-01 2007-02-15 Fujifilm Corp 光記録用組成物及び光記録媒体
JP2008081726A (ja) * 2006-08-30 2008-04-10 Sanyo Electric Co Ltd 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子
JP4785001B2 (ja) * 2007-03-20 2011-10-05 日本電信電話株式会社 光記録媒体
WO2008123302A1 (ja) * 2007-03-30 2008-10-16 Daikin Industries, Ltd. 含フッ素体積型ホログラム記録用感光性組成物ならびにそれを用いた含フッ素体積型ホログラム記録用感光性媒体および含フッ素体積型ホログラム
US8192898B2 (en) * 2007-03-30 2012-06-05 Daikin Industries, Ltd. Composition for fluorine-containing volume holographic data recording material and fluorine-containing volume holographic data recording media made of same
BRPI0810833B1 (pt) 2007-04-11 2018-09-18 Bayer Materialscience Ag composições de poliuretano, plásticos poliméricos, e meios holográfico
JP2008268514A (ja) * 2007-04-19 2008-11-06 Fujifilm Corp 光記録用組成物およびホログラフィック記録媒体
WO2009067788A1 (en) * 2007-11-27 2009-06-04 Southbourne Investments Ltd. Holographic recording medium
ATE493383T1 (de) 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
IL200997A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200996A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200995A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200722A0 (en) * 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
CA2738835A1 (en) * 2008-10-01 2010-04-08 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
US20110207029A1 (en) * 2008-10-01 2011-08-25 Bayer Materialscience Ag Media for volume-holographic recording based on self-developing polymer
EP2218744A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien
EP2218743A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2218742A1 (de) * 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2219073B1 (de) * 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
JP2010230911A (ja) * 2009-03-26 2010-10-14 Tdk Corp 光学デバイス
JP5925687B2 (ja) * 2009-11-03 2016-05-25 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ ホログラフィック媒体の製造方法
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
ES2433235T3 (es) * 2009-11-03 2013-12-10 Bayer Intellectual Property Gmbh Fluorouretanos como aditivos en una formulación de fotopolímero
PT2497085E (pt) * 2009-11-03 2014-03-27 Bayer Ip Gmbh Processo para a produção de um filme holográfico
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
ES2446344T3 (es) * 2009-11-03 2014-03-07 Bayer Intellectual Property Gmbh Procedimiento para la producción de una película holográfica
WO2011054818A2 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
EP2317511B1 (de) * 2009-11-03 2012-03-07 Bayer MaterialScience AG Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv
US9057950B2 (en) * 2010-02-02 2015-06-16 Bayer Intellectual Property Gmbh Photopolymer formulation having ester-based writing monomers
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
KR20130099932A (ko) * 2010-08-11 2013-09-06 바이엘 인텔렉쳐 프로퍼티 게엠베하 이관능성 (메트)아크릴레이트 기록 단량체
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
WO2008096712A1 (ja) * 2007-02-05 2008-08-14 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録材料及び光情報記録媒体
WO2008122226A1 (en) * 2007-04-06 2008-10-16 Shanghai Fudan Techsun New Technology Co. Ltd. Sensitive membrane for reflecting hologram record and preparation method thereof
WO2008125201A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Radiation-crosslinking and thermally crosslinking pu systems comprising iminooxadiazinedione
WO2008125229A1 (en) * 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
US20080312403A1 (en) * 2007-04-11 2008-12-18 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index
US20090185470A1 (en) * 2007-04-11 2009-07-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
CN101320208A (zh) * 2008-07-21 2008-12-10 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法

Also Published As

Publication number Publication date
KR20130006421A (ko) 2013-01-16
KR101782182B1 (ko) 2017-09-26
EP2497083B1 (de) 2013-12-25
WO2011054797A1 (de) 2011-05-12
CN102667935A (zh) 2012-09-12
TW201133139A (en) 2011-10-01
US8889322B2 (en) 2014-11-18
JP5638085B2 (ja) 2014-12-10
JP2013510204A (ja) 2013-03-21
EP2497083A1 (de) 2012-09-12
TWI489205B (zh) 2015-06-21
US20120231377A1 (en) 2012-09-13

Similar Documents

Publication Publication Date Title
CN102667935B (zh) 具有不同书写共聚单体的光聚合物制剂
CN102792377B (zh) 具有可调节的机械模量Guv的光聚合物配制品
CN102870157B (zh) 生产全息膜的方法
CN102667934B (zh) 作为光聚合物制剂中的添加剂的氟代氨基甲酸酯
TWI477525B (zh) 具有低交聯密度之光聚合物調配物
US8852829B2 (en) Prepolymer-based polyurethane formulations for producing holographic media
US8361678B2 (en) Special polyether-based polyurethane formulations for the production of holographic media
JP5635250B2 (ja) ホログラフィック媒体を製造するためのポリエーテル系ポリウレタン組成物
US9057950B2 (en) Photopolymer formulation having ester-based writing monomers

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20160627

Address after: German Monheim

Patentee after: BAYER INTELLECTUAL PROPERTY GmbH

Address before: Germany Leverkusen

Patentee before: BAYER MATERIALSCIENCE AG

Effective date of registration: 20160627

Address after: Leverkusen, Germany

Patentee after: COVESTRO DEUTSCHLAND AG

Address before: German Monheim

Patentee before: BAYER INTELLECTUAL PROPERTY GmbH